SG10201402670UA - An apparatus and method for wafer stacking - Google Patents
An apparatus and method for wafer stackingInfo
- Publication number
- SG10201402670UA SG10201402670UA SG10201402670UA SG10201402670UA SG10201402670UA SG 10201402670U A SG10201402670U A SG 10201402670UA SG 10201402670U A SG10201402670U A SG 10201402670UA SG 10201402670U A SG10201402670U A SG 10201402670UA SG 10201402670U A SG10201402670U A SG 10201402670UA
- Authority
- SG
- Singapore
- Prior art keywords
- wafer stacking
- stacking
- wafer
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68721—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by edge clamping, e.g. clamping ring
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/20—Deposition of semiconductor materials on a substrate, e.g. epitaxial growth solid phase epitaxy
- H01L21/2003—Deposition of semiconductor materials on a substrate, e.g. epitaxial growth solid phase epitaxy characterised by the substrate
- H01L21/2007—Bonding of semiconductor wafers to insulating substrates or to semiconducting substrates using an intermediate insulating layer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67718—Changing orientation of the substrate, e.g. from a horizontal position to a vertical position
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SG10201402670UA SG10201402670UA (en) | 2014-05-27 | 2014-05-27 | An apparatus and method for wafer stacking |
PCT/SG2015/050126 WO2015183197A1 (en) | 2014-05-27 | 2015-05-27 | An apparatus and method for wafer stacking |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SG10201402670UA SG10201402670UA (en) | 2014-05-27 | 2014-05-27 | An apparatus and method for wafer stacking |
Publications (1)
Publication Number | Publication Date |
---|---|
SG10201402670UA true SG10201402670UA (en) | 2015-12-30 |
Family
ID=54699388
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG10201402670UA SG10201402670UA (en) | 2014-05-27 | 2014-05-27 | An apparatus and method for wafer stacking |
Country Status (2)
Country | Link |
---|---|
SG (1) | SG10201402670UA (en) |
WO (1) | WO2015183197A1 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109051686B (en) * | 2018-09-29 | 2020-08-04 | 苏州精濑光电有限公司 | Workpiece operation method |
WO2024104594A1 (en) | 2022-11-18 | 2024-05-23 | Ev Group E. Thallner Gmbh | Method and device for bonding substrates |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0269924A (en) * | 1988-09-05 | 1990-03-08 | Sumitomo Electric Ind Ltd | How to bond the boards together |
JP2006332563A (en) * | 2005-05-30 | 2006-12-07 | Nikon Corp | Wafer conveyor, wafer lamination conveyor and method for manufacturing laminated semiconductor device |
JP5445160B2 (en) * | 2010-01-18 | 2014-03-19 | 株式会社ニコン | Wafer processing apparatus, wafer processing method, and device manufacturing method |
JP5707950B2 (en) * | 2011-01-13 | 2015-04-30 | 株式会社ニコン | Substrate overlay apparatus and substrate overlay method |
-
2014
- 2014-05-27 SG SG10201402670UA patent/SG10201402670UA/en unknown
-
2015
- 2015-05-27 WO PCT/SG2015/050126 patent/WO2015183197A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
WO2015183197A1 (en) | 2015-12-03 |
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