SE7514083L - Anordning for programmerad uppritning av monster pa ett substrat - Google Patents

Anordning for programmerad uppritning av monster pa ett substrat

Info

Publication number: SE7514083L
Authority: SE; Sweden
Prior art keywords: substrate; controlling; image; line; register
Prior art date: 1974-12-13

Application number

SE7514083A

Other languages

Unknown language ( )

English (en)

Other versions

SE403412B (sv

Inventor

J Trotel

Original Assignee

Thomson Csf

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1974-12-13

Filing date

1975-12-12

Publication date

1976-06-14

1975-12-12 Application filed by Thomson Csf filed Critical Thomson Csf

1976-06-14 Publication of SE7514083L publication Critical patent/SE7514083L/sv

1978-08-14 Publication of SE403412B publication Critical patent/SE403412B/sv

Classifications

- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/302—Controlling tubes by external information, e.g. programme control
- H01J37/3023—Programme control
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/3002—Details
- H01J37/3007—Electron or ion-optical systems

Landscapes

Chemical & Material Sciences (AREA)
Analytical Chemistry (AREA)
Electron Beam Exposure (AREA)
Image Input (AREA)

SE7514083A 1974-12-13 1975-12-12 Anordning for programmerad uppritning av monster pa ett substrat SE403412B (sv)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
FR7441130A FR2294489A1 (fr)	1974-12-13	1974-12-13	Dispositif pour le trace programme de dessins par bombardement de particules

Publications (2)

Publication Number	Publication Date
SE7514083L true SE7514083L (sv)	1976-06-14
SE403412B SE403412B (sv)	1978-08-14

Family

ID=9146138

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
SE7514083A SE403412B (sv)	1974-12-13	1975-12-12	Anordning for programmerad uppritning av monster pa ett substrat

Country Status (7)

Country	Link
US (1)	US4051381A (sv)
JP (2)	JPS5185826A (sv)
DE (1)	DE2556151C2 (sv)
FR (1)	FR2294489A1 (sv)
GB (1)	GB1529819A (sv)
NL (1)	NL7514441A (sv)
SE (1)	SE403412B (sv)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
FR2339909A1 (fr) *	1976-01-30	1977-08-26	Thomson Csf	Systeme pour le dessin programme par bombardement de particules
FR2361190A1 (fr) *	1976-08-09	1978-03-10	Zeiss Carl Fa	Procede et dispositif d'usinage a froid par faisceau electronique
JPS5394773A (en) *	1977-01-31	1978-08-19	Cho Lsi Gijutsu Kenkyu Kumiai	Method of connecting graph in charged beam exposing device
JPS5493364A (en) *	1977-12-30	1979-07-24	Fujitsu Ltd	Exposure system for electron beam
JPS5577142A (en) *	1978-12-07	1980-06-10	Toshiba Corp	Electron beam exposure apparatus
JPS55146931A (en) *	1979-05-04	1980-11-15	Hitachi Ltd	Depicting method by electronic beam
US4310743A (en) *	1979-09-24	1982-01-12	Hughes Aircraft Company	Ion beam lithography process and apparatus using step-and-repeat exposure
US4382186A (en) *	1981-01-12	1983-05-03	Energy Sciences Inc.	Process and apparatus for converged fine line electron beam treatment of objects
JPS57174467A (en) *	1981-04-20	1982-10-27	Inoue Japax Res Inc	Ion working device
DD203429A1 (de) *	1981-08-03	1983-10-19	Eichhorn Hans Guenther	Schaltungsanordnung zur steuerung eines korpuskularstrahls
JPS58105543A (ja) *	1981-12-03	1983-06-23	エテック・システムズ・インコーポレイテッド	ゲ−トアレ−特徴描写のための方法
JPS5941831A (ja) *	1982-08-31	1984-03-08	Toshiba Corp	電子ビ−ム描画方法
GB8415623D0 (en) *	1984-06-19	1984-07-25	Nixon W C	Charged particle sources
US4673794A (en) *	1985-05-10	1987-06-16	National Research Institute For Metals	Electron beam welding method
US4740904A (en) *	1985-11-01	1988-04-26	Nagle John B	Line following system and process
JPS6394623A (ja) *	1986-10-09	1988-04-25	Hitachi Ltd	描画装置
US4929838A (en) *	1988-02-16	1990-05-29	Fujitsu Limited	Magnetic object lens for an electron beam exposure apparatus which processes a wafer carried on a continuously moving stage
JP2501726B2 (ja) *	1991-10-08	1996-05-29	インターナショナル・ビジネス・マシーンズ・コーポレイション	コンピュ―タ・イメ―ジ生成装置及びデ―タ減縮方法
DE19642116C2 (de) *	1996-10-12	2000-12-07	Fraunhofer Ges Forschung	Verfahren zur strukturierten Energieübertragung mit Elektronenstrahlen
DE102017213608B4 (de)	2017-08-04	2020-06-18	Tayyar Bayrakci	Gleichstromzyklonabscheider
US20220390828A1 (en) *	2021-06-07	2022-12-08	United Microelectronics Corp.	Method of making mask pattern and method of forming pattern in layer

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE1614635A1 (de) *	1967-10-23	1970-03-26	Siemens Ag	Verfahren zum Herstellen von Fotolackmasken fuer Halbleiterzwecke
US3644700A (en) *	1969-12-15	1972-02-22	Ibm	Method and apparatus for controlling an electron beam
DE2038119C3 (de) *	1970-07-31	1974-01-17	Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt	Lichtzeicheneinrichtung mit einer drehbar gelagerten Objektscheibe. Zusatz zii:1588412
FR39852E (fr) *	1972-06-30	1932-03-24	Ig Farbenindustrie Ag	Procédé de production de colorants solides pour cuve
US3778626A (en) *	1972-07-28	1973-12-11	Western Electric Co	Mechanical scan system for ion implantation
US3894271A (en) *	1973-08-31	1975-07-08	Ibm	Method and apparatus for aligning electron beams
US3866013A (en) *	1973-09-19	1975-02-11	Ibm	Method and apparatus for controlling movable means such as an electron beam
US3914608A (en) *	1973-12-19	1975-10-21	Westinghouse Electric Corp	Rapid exposure of micropatterns with a scanning electron microscope
US3900737A (en) *	1974-04-18	1975-08-19	Bell Telephone Labor Inc	Electron beam exposure system

1974
- 1974-12-13 FR FR7441130A patent/FR2294489A1/fr active Granted
1975
- 1975-12-09 US US05/639,105 patent/US4051381A/en not_active Expired - Lifetime
- 1975-12-10 GB GB50720/75A patent/GB1529819A/en not_active Expired
- 1975-12-11 NL NL7514441A patent/NL7514441A/xx not_active Application Discontinuation
- 1975-12-12 SE SE7514083A patent/SE403412B/sv not_active IP Right Cessation
- 1975-12-12 DE DE2556151A patent/DE2556151C2/de not_active Expired
- 1975-12-13 JP JP50149041A patent/JPS5185826A/ja active Pending
1985
- 1985-08-14 JP JP1985125130U patent/JPS61134034U/ja active Pending

Also Published As

Publication number	Publication date
NL7514441A (nl)	1976-06-15
DE2556151C2 (de)	1987-05-07
DE2556151A1 (de)	1976-06-16
SE403412B (sv)	1978-08-14
FR2294489B1 (sv)	1977-04-08
FR2294489A1 (fr)	1976-07-09
JPS61134034U (sv)	1986-08-21
GB1529819A (en)	1978-10-25
US4051381A (en)	1977-09-27
JPS5185826A (sv)	1976-07-27

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Legal Events

Date	Code	Title	Description
1995-01-31	NUG	Patent has lapsed	Ref document number: 7514083-0 Effective date: 19880923 Format of ref document f/p: F

Date

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Description

1995-01-31

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