[go: up one dir, main page]

SE509984C2 - Charging system for CVD - Google Patents

Charging system for CVD

Info

Publication number
SE509984C2
SE509984C2 SE9400950A SE9400950A SE509984C2 SE 509984 C2 SE509984 C2 SE 509984C2 SE 9400950 A SE9400950 A SE 9400950A SE 9400950 A SE9400950 A SE 9400950A SE 509984 C2 SE509984 C2 SE 509984C2
Authority
SE
Sweden
Prior art keywords
coating
cvd
insert
inserts
charging system
Prior art date
Application number
SE9400950A
Other languages
Swedish (sv)
Other versions
SE9400950L (en
SE9400950D0 (en
Inventor
Tor Norrgrann
Kjell Paalsson
Bjoern Ljungberg
Original Assignee
Sandvik Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sandvik Ab filed Critical Sandvik Ab
Priority to SE9400950A priority Critical patent/SE509984C2/en
Publication of SE9400950D0 publication Critical patent/SE9400950D0/en
Priority to IL11301595A priority patent/IL113015A/en
Priority to US08/405,782 priority patent/US5576058A/en
Priority to AT95913951T priority patent/ATE169692T1/en
Priority to JP52457995A priority patent/JP3742831B2/en
Priority to PCT/SE1995/000276 priority patent/WO1995025829A1/en
Priority to EP95913951A priority patent/EP0750688B1/en
Priority to DE69504045T priority patent/DE69504045T2/en
Publication of SE9400950L publication Critical patent/SE9400950L/en
Priority to US08/703,966 priority patent/US5759621A/en
Publication of SE509984C2 publication Critical patent/SE509984C2/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Turning (AREA)

Abstract

There is provided a method of coating cutting tool inserts by CVD methods with a completely covering coating. During the coating step, the inserts are resting in contact with the support in only a few tiny spots and sufficient space is allowed around each insert to ascertain optimum coating conditions. In a preferred embodiment, each insert rests on a peg allowing a rational production in larger scale and fully automatic CVD loading.
SE9400950A 1994-03-18 1994-03-18 Charging system for CVD SE509984C2 (en)

Priority Applications (9)

Application Number Priority Date Filing Date Title
SE9400950A SE509984C2 (en) 1994-03-18 1994-03-18 Charging system for CVD
IL11301595A IL113015A (en) 1994-03-18 1995-03-16 Method for coating cutting tool inserts
DE69504045T DE69504045T2 (en) 1994-03-18 1995-03-17 BATCH CHARGING SYSTEM FOR CVD
JP52457995A JP3742831B2 (en) 1994-03-18 1995-03-17 Cutting tool coating method using chemical vapor deposition
AT95913951T ATE169692T1 (en) 1994-03-18 1995-03-17 BATCHLOADING SYSTEM FOR CVD
US08/405,782 US5576058A (en) 1994-03-18 1995-03-17 Batch loading system for CVD
PCT/SE1995/000276 WO1995025829A1 (en) 1994-03-18 1995-03-17 Batch loading system for cvd
EP95913951A EP0750688B1 (en) 1994-03-18 1995-03-17 Batch loading system for cvd
US08/703,966 US5759621A (en) 1994-03-18 1996-08-28 Batch loading system for CVD

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE9400950A SE509984C2 (en) 1994-03-18 1994-03-18 Charging system for CVD

Publications (3)

Publication Number Publication Date
SE9400950D0 SE9400950D0 (en) 1994-03-18
SE9400950L SE9400950L (en) 1995-09-19
SE509984C2 true SE509984C2 (en) 1999-03-29

Family

ID=20393359

Family Applications (1)

Application Number Title Priority Date Filing Date
SE9400950A SE509984C2 (en) 1994-03-18 1994-03-18 Charging system for CVD

Country Status (8)

Country Link
US (2) US5576058A (en)
EP (1) EP0750688B1 (en)
JP (1) JP3742831B2 (en)
AT (1) ATE169692T1 (en)
DE (1) DE69504045T2 (en)
IL (1) IL113015A (en)
SE (1) SE509984C2 (en)
WO (1) WO1995025829A1 (en)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE509984C2 (en) * 1994-03-18 1999-03-29 Sandvik Ab Charging system for CVD
JP3192642B2 (en) * 1998-10-02 2001-07-30 住友特殊金属株式会社 Surface treatment support member, surface treatment holder, and surface treatment method
SE514666C2 (en) * 1999-07-05 2001-04-02 Sandvik Ab Method for fixing inserts in PVD coating
FR2819047B1 (en) * 2000-12-28 2003-06-27 Snecma Moteurs MEDIUM SUITABLE FOR THE HEAT TREATMENT OF A METAL PART AND A METHOD OF HEAT TREATMENT
SE527351C2 (en) * 2003-07-10 2006-02-14 Seco Tools Ab Method of coating inserts
JP2007518878A (en) * 2003-12-22 2007-07-12 セコ ツールズ アクティエボラーグ Support object and method for coating a cutting tool
CN101146935A (en) * 2005-01-24 2008-03-19 丹福斯有限公司 A method for coating an object
US7662437B2 (en) * 2005-03-24 2010-02-16 Honeywell International Inc. Template for arranging spacers on a preform and method of densifying a preform including the use of spacers positioned by a template
WO2006112221A1 (en) † 2005-03-30 2006-10-26 Sumitomo Electric Hardmetal Corp. Edge replacement cutter tip
JP4931507B2 (en) * 2005-07-26 2012-05-16 スネクマ Cooling flow path formed in the wall
CN102534565B (en) * 2012-03-22 2013-07-03 株洲欧科亿硬质合金有限公司 Load boat for production of coating knife and application thereof
CN103726031A (en) * 2013-12-24 2014-04-16 成都工具研究所有限公司 Workpiece clamping tool of chemical vapor deposition equipment
JP6337107B2 (en) * 2014-05-28 2018-06-06 京セラ株式会社 Manufacturing method of cutting insert
DE102016211775A1 (en) * 2016-06-29 2018-01-04 Schunk Kohlenstofftechnik Gmbh Workpiece carrier and method for producing a workpiece carrier
WO2018117558A1 (en) * 2016-12-20 2018-06-28 주식회사 티씨케이 Method and apparatus for manufacturing semiconductor manufacturing parts by using jig
WO2018117559A1 (en) * 2016-12-20 2018-06-28 주식회사 티씨케이 Semiconductor manufacturing parts comprising sic deposition layer, and manufacturing method therefor
KR102040378B1 (en) 2016-12-20 2019-11-05 주식회사 티씨케이 Part fabrication method and apparatus for semiconductor manufactoring using jig
KR102051668B1 (en) 2016-12-20 2019-12-04 주식회사 티씨케이 A PART FOR SEMICONDUCTOR MANUFACTORING WITH SiC DEPOSITION LAYER AND MANUFACTORING METHOD THE SAME
US20200255941A1 (en) * 2019-02-11 2020-08-13 Kennametal Inc. Supports for chemical vapor deposition coating applications
KR102642090B1 (en) * 2021-08-24 2024-02-29 주식회사 케이엔제이 Support socket and method for manufacturing a part including a deposition layer

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3496010A (en) * 1966-10-05 1970-02-17 Texas Instruments Inc Machining silicon coating prior to vapor deposition of silicon carbide
US3964937A (en) * 1973-08-13 1976-06-22 Materials Technology Corporation Method of making a composite coating
US4558388A (en) * 1983-11-02 1985-12-10 Varian Associates, Inc. Substrate and substrate holder
JPS6333571A (en) * 1986-07-25 1988-02-13 Nippon Telegr & Teleph Corp <Ntt> Formation of film on spherical body
DE3902532C1 (en) * 1989-01-28 1989-11-23 Krupp Widia Gmbh, 4300 Essen, De
EP0458342A1 (en) * 1990-05-25 1991-11-27 Idemitsu Petrochemical Company Limited Method for preparation of diamond film-coated body
US5393349A (en) * 1991-08-16 1995-02-28 Tokyo Electron Sagami Kabushiki Kaisha Semiconductor wafer processing apparatus
JP2513976B2 (en) * 1991-12-13 1996-07-10 エイ・ティ・アンド・ティ・コーポレーション Coating method for multiple spherical parts
SE509984C2 (en) * 1994-03-18 1999-03-29 Sandvik Ab Charging system for CVD
US5543022A (en) * 1995-01-17 1996-08-06 Hmt Technology Corporation Disc-handling apparatus

Also Published As

Publication number Publication date
ATE169692T1 (en) 1998-08-15
EP0750688A1 (en) 1997-01-02
US5576058A (en) 1996-11-19
JP3742831B2 (en) 2006-02-08
JPH09510507A (en) 1997-10-21
SE9400950L (en) 1995-09-19
US5759621A (en) 1998-06-02
SE9400950D0 (en) 1994-03-18
IL113015A0 (en) 1995-06-29
DE69504045T2 (en) 1998-12-10
WO1995025829A1 (en) 1995-09-28
IL113015A (en) 1998-08-16
DE69504045D1 (en) 1998-09-17
EP0750688B1 (en) 1998-08-12

Similar Documents

Publication Publication Date Title
SE9400950L (en) Charging system for CVD
AU5671096A (en) Methods, nucleotide sequences and host cells for assaying ex ogenous and endogenous protease activity
SG75111A1 (en) System and method for automatically modifying database access methods to insert database object handling instructions
FI942219L (en) Method for relocating a subscriber in a voicemail system
AU2591899A (en) A system, method and article of manufacture for a runtime program regression analysis tool for a simulation engine
KR910001049A (en) DNA sequence encoding a methyl-required yeast alcohol oxidase II regulatory region and a method for preparing the same
DK15089A (en) AMINO-FUNCTIONAL COMPOUNDS, PROCEDURES FOR PREPARING THEM AND DETAILS COMPREHENSIVE TOGETHER.
EP0727482A3 (en) Process for the culture of cells on a support, device therefor and utilisation of said device
ATE46870T1 (en) TIRE.
DE68912661D1 (en) Method and device for cell culture.
GB2310929B (en) Reconfigurable supporting fixture, particularly for a measuring machine, and relative configuration method
DE69607832D1 (en) REACTOR FOR IMMOBILIZED ENZYMS
EE9800240A (en) Method for preparing fermentable must
DE69728787D1 (en) Process of shrinking wool
DE3864761D1 (en) METHOD FOR COMPENSATING THE LOCKING PROBABILITY IN A MOBILE RADIO SYSTEM DIVIDED IN RADIO CELLS.
AU8160287A (en) An apparatus and method for supporting a carcass during pelt removal
FI892690L (en) Method for isolating amblyommin with thrombin inhibitory activity
AU2166700A (en) System and method for finding near matches among records in databases
IL90173A0 (en) Method and system for detecting tire leakages
SG71733A1 (en) Method for rapidly determining an impurity level in a gas source or a gas distribution system
IT8919525A0 (en) APPARATUS AND METHOD FOR AUTOMATICALLY INSTALLING TIGHTENING CLAMPS.
IT1233354B (en) REFURBISHED MILLING TOOL CONSTITUTED BY A SUPPORT AND AN INSERT.
TW364955B (en) The method and apparatus for the control of a production system
DE3673686D1 (en) IMMOBILIZED MALTOOLIGOSACCHARIDE-FORMING AMYLASE AND METHOD FOR PRODUCING MALTOOLIGOSACCHARIDE USING THE SAME ENZYME.
AU6632796A (en) Method and system for processing data carriers

Legal Events

Date Code Title Description
NUG Patent has lapsed