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SE344246B - - Google Patents

Info

Publication number
SE344246B
SE344246B SE1569/68A SE156968A SE344246B SE 344246 B SE344246 B SE 344246B SE 1569/68 A SE1569/68 A SE 1569/68A SE 156968 A SE156968 A SE 156968A SE 344246 B SE344246 B SE 344246B
Authority
SE
Sweden
Application number
SE1569/68A
Inventor
A Deutsch
W Herrick
Original Assignee
Gen Aniline & Film Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gen Aniline & Film Corp filed Critical Gen Aniline & Film Corp
Publication of SE344246B publication Critical patent/SE344246B/xx

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00Etching metallic material by chemical means
    • C23F1/02Local etching
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Computer Hardware Design (AREA)
  • Mechanical Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Power Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • ing And Chemical Polishing (AREA)
SE1569/68A 1967-02-07 1968-02-06 SE344246B (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US61441267A 1967-02-07 1967-02-07

Publications (1)

Publication Number Publication Date
SE344246B true SE344246B (de) 1972-04-04

Family

ID=24461153

Family Applications (1)

Application Number Title Priority Date Filing Date
SE1569/68A SE344246B (de) 1967-02-07 1968-02-06

Country Status (8)

Country Link
US (1) US3594243A (de)
JP (1) JPS4822568B1 (de)
CH (1) CH495569A (de)
DE (1) DE1622285A1 (de)
FR (1) FR1555957A (de)
GB (1) GB1215353A (de)
NL (1) NL6801727A (de)
SE (1) SE344246B (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3894163A (en) * 1971-03-08 1975-07-08 Western Electric Co Additives to negative photoresists which increase the sensitivity thereof
US3770433A (en) * 1972-03-22 1973-11-06 Bell Telephone Labor Inc High sensitivity negative electron resist
US3865597A (en) * 1973-03-26 1975-02-11 Western Electric Co Additives to negative photoresists which increase the sensitivity thereof
JPS51116893A (en) * 1975-04-08 1976-10-14 Ube Ind Ltd Photo-setting compositions
US4087569A (en) * 1976-12-20 1978-05-02 International Business Machines Corporation Prebaking treatment for resist mask composition and mask making process using same
DE3322011A1 (de) * 1983-06-18 1984-12-20 Continental Gummi-Werke Ag, 3000 Hannover Verfahren zur herstellung von hochdruckformen
WO1989003816A1 (en) * 1987-10-16 1989-05-05 Gaf Corporation Divinyl epoxy ethers
CN106624662A (zh) * 2017-01-25 2017-05-10 李振羽 复合底电磁锅的制作方法、专用装置和电磁锅

Also Published As

Publication number Publication date
CH495569A (de) 1970-08-31
DE1622285A1 (de) 1970-10-22
JPS4822568B1 (de) 1973-07-06
GB1215353A (en) 1970-12-09
FR1555957A (de) 1969-01-31
US3594243A (en) 1971-07-20
NL6801727A (de) 1968-08-08

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