SE0600631L - Apparatus and method of continuous coating in continuous deposition line - Google Patents
Apparatus and method of continuous coating in continuous deposition lineInfo
- Publication number
- SE0600631L SE0600631L SE0600631A SE0600631A SE0600631L SE 0600631 L SE0600631 L SE 0600631L SE 0600631 A SE0600631 A SE 0600631A SE 0600631 A SE0600631 A SE 0600631A SE 0600631 L SE0600631 L SE 0600631L
- Authority
- SE
- Sweden
- Prior art keywords
- deposition
- target
- zone
- continuous
- normal
- Prior art date
Links
- 230000008021 deposition Effects 0.000 title abstract 10
- 239000011248 coating agent Substances 0.000 title abstract 4
- 238000000576 coating method Methods 0.000 title abstract 4
- 238000000034 method Methods 0.000 title abstract 4
- 239000000758 substrate Substances 0.000 abstract 5
- 238000005530 etching Methods 0.000 abstract 3
- 238000005299 abrasion Methods 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 238000011144 upstream manufacturing Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
- C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/225—Oblique incidence of vaporised material on substrate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
A continuous roll-to-roll deposition coating apparatus and a method to continuous coat an edge of a strip substrate are disclosed. The invention is aimed at accomplishing a hard and abrasion resistant coated metal strip with improved adhesion between a dense coating and the substrate.The deposition coating apparatus, comprises: a vacuum process chamber (114) including an etching zone (116) upstream of a deposition zone (118);at least one ion assisted etcher(120) in the etching zone; and at least one deposition apparatus (122) in the deposition zone,wherein the at least one deposition apparatus includes at least one target (124), wherein the strip substrate, in travelling through the vacuum process chamber, projects a first edge region (140) toward the at least one ion assisted etcher in the etching zone and projects the first edge region toward the target of the at least one deposition apparatus in the deposition zone, wherein the first edge region of the strip substrate includes at least a first angled surface (142) tapered from a first proximal position (144) toward a first distal position, the first proximal position closer to a centre region of the strip substrate than the first distal position, the first angled surface having a first surface normal (150), and wherein the target of the at least one deposition apparatus includes a target surface (126) having a target normal(128) and is angled with respect to the first angled surface so that the target normal intersects the first surface normal at an angle a, where a is greater than or equal to 90 degrees.
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE0600631A SE529426C2 (en) | 2006-03-21 | 2006-03-21 | Apparatus and method of continuous coating in continuous deposition line |
JP2009501384A JP2009530500A (en) | 2006-03-21 | 2007-03-02 | Edge coating in continuous deposition line |
EP07716098A EP1999293A4 (en) | 2006-03-21 | 2007-03-02 | Edge coating in continuous deposition line |
CN2007800102183A CN101405432B (en) | 2006-03-21 | 2007-03-02 | Edge coating in continuous deposition line |
PCT/SE2007/050124 WO2007108757A1 (en) | 2006-03-21 | 2007-03-02 | Edge coating in continuous deposition line |
CA002645924A CA2645924A1 (en) | 2006-03-21 | 2007-03-02 | Edge coating in continuous deposition line |
KR1020087023078A KR20080102224A (en) | 2006-03-21 | 2007-03-02 | Blade coating in continuous lamination line |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE0600631A SE529426C2 (en) | 2006-03-21 | 2006-03-21 | Apparatus and method of continuous coating in continuous deposition line |
Publications (2)
Publication Number | Publication Date |
---|---|
SE0600631L true SE0600631L (en) | 2007-08-07 |
SE529426C2 SE529426C2 (en) | 2007-08-07 |
Family
ID=38323926
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SE0600631A SE529426C2 (en) | 2006-03-21 | 2006-03-21 | Apparatus and method of continuous coating in continuous deposition line |
Country Status (7)
Country | Link |
---|---|
EP (1) | EP1999293A4 (en) |
JP (1) | JP2009530500A (en) |
KR (1) | KR20080102224A (en) |
CN (1) | CN101405432B (en) |
CA (1) | CA2645924A1 (en) |
SE (1) | SE529426C2 (en) |
WO (1) | WO2007108757A1 (en) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SE531749C2 (en) * | 2007-09-17 | 2009-07-28 | Seco Tools Ab | Method of precipitating durable layers on cemented carbide with arc evaporation and cathode with Ti3SiC2 as the main component |
JP5616265B2 (en) | 2011-03-25 | 2014-10-29 | Hoya株式会社 | Thin film deposition method, mask blank manufacturing method, and transfer mask manufacturing method |
SE536952C2 (en) * | 2012-06-25 | 2014-11-11 | Impact Coatings Ab | Continuous roll-to-roll device |
KR102244623B1 (en) * | 2014-04-03 | 2021-04-23 | 어플라이드 머티어리얼스, 인코포레이티드 | Sputtering arrangement for sputtering a material on a substrate surface |
EP3031982B1 (en) * | 2014-12-10 | 2017-03-29 | voestalpine Precision Strip AB | A long life cermet coated crêping blade |
CN107923125B (en) * | 2015-07-02 | 2020-09-11 | 福伊特专利有限公司 | Component of a machine for producing and/or treating a fibrous web and method for producing a coating of a component |
CN105870319B (en) * | 2016-04-26 | 2019-03-05 | 贝骨新材料科技(上海)有限公司 | A kind of roll-to-roll manufacturing method of strip piezoelectric film sensor |
JP7382809B2 (en) * | 2019-12-02 | 2023-11-17 | キヤノントッキ株式会社 | Film-forming method and film-forming equipment |
CN111235539B (en) * | 2020-03-10 | 2021-04-20 | 摩科斯新材料科技(苏州)有限公司 | Method and device for depositing thin film on inner wall of small hole |
CN111424248A (en) * | 2020-05-13 | 2020-07-17 | 沈阳理工大学 | Preparation method of high-temperature oxidation-resistant SiC/ZrC coating on surface of carbon/carbon composite material |
KR20210149266A (en) * | 2020-06-01 | 2021-12-09 | 삼성디스플레이 주식회사 | Substrate fixing device, deposition processing equipment including same, and deposition processing method using same |
CN113808935B (en) * | 2020-06-16 | 2023-12-15 | 中微半导体设备(上海)股份有限公司 | Corrosion-resistant coating forming method and device, plasma component and reaction device |
CN112044706A (en) * | 2020-08-05 | 2020-12-08 | 王华彬 | Coating technology of coating scraper coating |
CN114250436B (en) * | 2020-09-25 | 2024-03-29 | 中微半导体设备(上海)股份有限公司 | Corrosion-resistant coating preparation method, semiconductor part and plasma reaction device |
CN112962078B (en) * | 2021-02-01 | 2023-07-18 | 肇庆宏旺金属实业有限公司 | Coating production line and coating process |
CN118028745B (en) * | 2023-07-27 | 2025-02-25 | 上海超导科技股份有限公司 | Belt conveyor system for ion beam assisted deposition coating device |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56111804A (en) * | 1980-02-09 | 1981-09-03 | Dainippon Printing Co Ltd | Manufacture of body differing in optical property according to direction |
JP3679113B2 (en) * | 1992-12-23 | 2005-08-03 | ウンアクシス バルツェルス アクチェンゲゼルシャフト | Layer deposition method and apparatus |
CN1064294C (en) * | 1994-04-25 | 2001-04-11 | 吉莱特公司 | Amorphous diamond coating of blades |
JPH10330930A (en) * | 1997-05-28 | 1998-12-15 | Victor Co Of Japan Ltd | Sputtering device and production of magnetic head using the same |
JP4641596B2 (en) * | 2000-07-26 | 2011-03-02 | 株式会社アルバック | Sputtering film forming apparatus and film forming method on three-dimensional substrate |
SE519466C2 (en) * | 2000-12-07 | 2003-03-04 | Swedev Ab | Schaber or razor blade with nickel coating including abrasion-resistant particles and method of manufacture |
DE10147708C5 (en) * | 2001-09-27 | 2005-03-24 | Von Ardenne Anlagentechnik Gmbh | target arrangement |
SE527180C2 (en) * | 2003-08-12 | 2006-01-17 | Sandvik Intellectual Property | Rack or scraper blades with abrasion resistant layer and method of manufacture thereof |
SE527386C2 (en) * | 2003-12-23 | 2006-02-21 | Sandvik Intellectual Property | Coated stainless steel strip product with decorative appearance |
EP1815040B1 (en) * | 2004-09-08 | 2016-01-06 | BIC Violex S.A. | Method for deposition of a layer on a razor blade edge and razor blade |
-
2006
- 2006-03-21 SE SE0600631A patent/SE529426C2/en not_active IP Right Cessation
-
2007
- 2007-03-02 KR KR1020087023078A patent/KR20080102224A/en not_active Application Discontinuation
- 2007-03-02 JP JP2009501384A patent/JP2009530500A/en active Pending
- 2007-03-02 EP EP07716098A patent/EP1999293A4/en not_active Withdrawn
- 2007-03-02 WO PCT/SE2007/050124 patent/WO2007108757A1/en active Application Filing
- 2007-03-02 CN CN2007800102183A patent/CN101405432B/en not_active Expired - Fee Related
- 2007-03-02 CA CA002645924A patent/CA2645924A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
EP1999293A4 (en) | 2010-07-21 |
CN101405432A (en) | 2009-04-08 |
KR20080102224A (en) | 2008-11-24 |
SE529426C2 (en) | 2007-08-07 |
EP1999293A1 (en) | 2008-12-10 |
WO2007108757A1 (en) | 2007-09-27 |
CA2645924A1 (en) | 2007-09-27 |
CN101405432B (en) | 2011-04-13 |
JP2009530500A (en) | 2009-08-27 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
NUG | Patent has lapsed |