RU2010114072A

RU2010114072A - METHOD FOR APPLICATION OF NANOCOMPOSITE COATING ON SURFACE OF PRODUCTS

Info

Publication number: RU2010114072A
Application number: RU2010114072/02A
Authority: RU
Inventors: Вячеслав Алексеевич Рыженков (RU); Вячеслав Алексеевич Рыженков; Геннадий Викторович Качалин (RU); Геннадий Викторович Качалин; Константин Сергеевич Медведев (RU); Константин Сергеевич Медведев; Александр Феликсович Медников (RU); Александр Феликсович Медников
Priority date: 2010-04-12
Filing date: 2010-04-12
Publication date: 2011-10-20
Also published as: RU2437963C1

Abstract

1. Способ нанесения нанокомпозитного покрытия на поверхность изделия, включающий очистку изделий и вакуумной камеры в среде инертного газа, ионное травление и ионно-плазменное азотирование поверхностей изделий, нанесения покрытия методом физического осаждения из паровой фазы, отличающийся тем, что после ионно-плазменного азотирования дополнительно проводят ионное травление поверхности изделия, при этом ионно-плазменное азотирование с последующим ионным травлением осуществляют в N этапов, где N - целое число и N≥1. ! 2. Способ нанесения нанокомпозитного покрытия на поверхность изделия по п.1, отличающийся тем, что проводят предварительный нагрев вакуумной камеры с одновременной откачкой воздуха. ! 3. Способ нанесения нанокомпозитного покрытия на поверхность изделия по п.2, отличающийся тем, что наносят на поверхности изделия микрослой из титана, алюминия и кремния общей толщиной 0,4-0,6 мкм, причем указанный микрослой состоит из нанослоев этих материалов толщиной 1-100 нм, нанесение микрослоя осуществляют последовательным прохождением изделия перед магнетронами с мишенями из указанных материалов. ! 4. Способ нанесения нанокомпозитного покрытия на поверхность изделия по п.3, отличающийся тем, что подают в камеру азот и наносят на поверхности изделия микрослой из нитридов титана, алюминия, кремния общей толщиной 2,5-3 мкм, причем указанный микрослой состоит из нанослоев нитридов этих материалов толщиной 1-100 нм, нанесение микрослоя осуществляют последовательным прохождением изделия перед магнетронами с мишенями из указанных материалов. ! 5. Способ нанесения нанокомпозитного покрытия на поверхность изделия по п.3, � 1. The method of applying a nanocomposite coating on the surface of the product, including cleaning products and a vacuum chamber in an inert gas environment, ion etching and ion-plasma nitriding of product surfaces, coating by physical vapor deposition method, characterized in that after ion-plasma nitriding, conduct ion etching of the surface of the product, while ion-plasma nitriding followed by ion etching is carried out in N stages, where N is an integer and N≥1. ! 2. The method of applying a nanocomposite coating to the surface of the product according to claim 1, characterized in that they carry out preliminary heating of the vacuum chamber with simultaneous pumping of air. ! 3. The method of applying a nanocomposite coating to the surface of the product according to claim 2, characterized in that a microlayer of titanium, aluminum and silicon with a total thickness of 0.4-0.6 microns is applied to the surface of the product, said microlayer consisting of nanolayers of these materials with a thickness of 1 -100 nm, the deposition of a microlayer is carried out by sequential passage of the product in front of magnetrons with targets from these materials. ! 4. The method of applying a nanocomposite coating to the surface of the product according to claim 3, characterized in that nitrogen is introduced into the chamber and a microlayer of titanium, aluminum, silicon nitrides with a total thickness of 2.5-3 microns is applied to the surface of the product, said microlayer consisting of nanolayers nitrides of these materials with a thickness of 1-100 nm, the deposition of a microlayer is carried out by sequential passage of the product in front of magnetrons with targets from these materials. ! 5. The method of applying a nanocomposite coating to the surface of the product according to claim 3, �

Claims

1. The method of applying a nanocomposite coating on the surface of the product, including cleaning products and a vacuum chamber in an inert gas environment, ion etching and ion-plasma nitriding of product surfaces, coating by physical vapor deposition method, characterized in that after ion-plasma nitriding, conduct ion etching of the surface of the product, while ion-plasma nitriding followed by ion etching is carried out in N stages, where N is an integer and N≥1.

2. The method of applying a nanocomposite coating to the surface of the product according to claim 1, characterized in that they carry out preliminary heating of the vacuum chamber with simultaneous pumping of air.

3. The method of applying a nanocomposite coating to the surface of the product according to claim 2, characterized in that a microlayer of titanium, aluminum and silicon with a total thickness of 0.4-0.6 microns is applied to the surface of the product, said microlayer consisting of nanolayers of these materials with a thickness of 1 -100 nm, the deposition of a microlayer is carried out by sequential passage of the product in front of magnetrons with targets from these materials.

4. The method of applying a nanocomposite coating to the surface of the product according to claim 3, characterized in that nitrogen is introduced into the chamber and a microlayer of titanium, aluminum, silicon nitrides with a total thickness of 2.5-3 microns is applied to the surface of the product, said microlayer consisting of nanolayers nitrides of these materials with a thickness of 1-100 nm, the deposition of a microlayer is carried out by sequential passage of the product in front of magnetrons with targets from these materials.

5. The method of applying a nanocomposite coating to the surface of an article according to claim 3, characterized in that titanium, aluminum and silicon nitrides are simultaneously applied to form a microlayer in the form of an amorphous matrix of silicon nitride with solid inclusions of titanium and aluminum nitrides.