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PL2790205T3 - Urządzenie zasilające do obróbki plazmowej - Google Patents

Urządzenie zasilające do obróbki plazmowej

Info

Publication number
PL2790205T3
PL2790205T3 PL14167841T PL14167841T PL2790205T3 PL 2790205 T3 PL2790205 T3 PL 2790205T3 PL 14167841 T PL14167841 T PL 14167841T PL 14167841 T PL14167841 T PL 14167841T PL 2790205 T3 PL2790205 T3 PL 2790205T3
Authority
PL
Poland
Prior art keywords
power supply
supply device
plasma processing
plasma
processing
Prior art date
Application number
PL14167841T
Other languages
English (en)
Inventor
Albert Bulliard
Benoit Fragnière
Joël Oehen
Original Assignee
Solvix Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=40790439&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=PL2790205(T3) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Solvix Gmbh filed Critical Solvix Gmbh
Publication of PL2790205T3 publication Critical patent/PL2790205T3/pl

Links

Classifications

    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02H—EMERGENCY PROTECTIVE CIRCUIT ARRANGEMENTS
    • H02H3/00—Emergency protective circuit arrangements for automatic disconnection directly responsive to an undesired change from normal electric working condition with or without subsequent reconnection ; integrated protection
    • H02H3/38—Emergency protective circuit arrangements for automatic disconnection directly responsive to an undesired change from normal electric working condition with or without subsequent reconnection ; integrated protection responsive to both voltage and current; responsive to phase angle between voltage and current
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32018—Glow discharge
    • H01J37/32045—Circuits specially adapted for controlling the glow discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3444—Associated circuits
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02H—EMERGENCY PROTECTIVE CIRCUIT ARRANGEMENTS
    • H02H1/00—Details of emergency protective circuit arrangements
    • H02H1/06—Arrangements for supplying operative power

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
PL14167841T 2009-02-17 2009-02-17 Urządzenie zasilające do obróbki plazmowej PL2790205T3 (pl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP09405031.7A EP2219205B1 (en) 2009-02-17 2009-02-17 A power supply device for plasma processing
EP14167841.7A EP2790205B1 (en) 2009-02-17 2009-02-17 A power supply device for plasma processing

Publications (1)

Publication Number Publication Date
PL2790205T3 true PL2790205T3 (pl) 2018-10-31

Family

ID=40790439

Family Applications (2)

Application Number Title Priority Date Filing Date
PL14167841T PL2790205T3 (pl) 2009-02-17 2009-02-17 Urządzenie zasilające do obróbki plazmowej
PL13175148T PL2648209T3 (pl) 2009-02-17 2009-02-17 Urządzenie zasilające do obróbki plazmowej

Family Applications After (1)

Application Number Title Priority Date Filing Date
PL13175148T PL2648209T3 (pl) 2009-02-17 2009-02-17 Urządzenie zasilające do obróbki plazmowej

Country Status (3)

Country Link
US (5) US8542471B2 (pl)
EP (3) EP2648209B1 (pl)
PL (2) PL2790205T3 (pl)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
PL2790205T3 (pl) * 2009-02-17 2018-10-31 Solvix Gmbh Urządzenie zasilające do obróbki plazmowej
DE102010031568B4 (de) 2010-07-20 2014-12-11 TRUMPF Hüttinger GmbH + Co. KG Arclöschanordnung und Verfahren zum Löschen von Arcs
CA2855496C (en) * 2011-12-05 2018-10-23 Abb Technology Ag Method for eliminating an arc driven by means of at least one phase voltage source of a converter circuit
AU2013404028B2 (en) * 2013-10-29 2017-04-06 Halliburton Energy Services, Inc. Safety cable for downhole communications
US10624158B2 (en) 2014-10-21 2020-04-14 Ultraflex International Inc. Radio frequency heating apparatus using direct-digital radio frequency power control and fine-tune power control
US11051369B2 (en) 2014-10-21 2021-06-29 Ultraflex International, Inc. Radio frequency heating apparatus using direct-digital radio frequency power control and fine-tune power control
EP3035365A1 (en) * 2014-12-19 2016-06-22 TRUMPF Huettinger Sp. Z o. o. Method of detecting an arc occurring during the power supply of a plasma process, control unit for a plasma power supply, and plasma power supply
EP3054472A1 (en) * 2015-02-03 2016-08-10 TRUMPF Huettinger Sp. Z o. o. Arc treatment device and method therefor
DE102015117232B4 (de) * 2015-10-09 2018-06-14 Phoenix Contact Gmbh & Co. Kg Elektrische Schutzschaltung
EP3796362A1 (en) 2019-09-23 2021-03-24 TRUMPF Huettinger Sp. Z o. o. Method of plasma processing a substrate in a plasma chamber and plasma processing system
US11823867B2 (en) * 2021-05-20 2023-11-21 Kaufman & Robinson, Inc. Load current derived switch timing of switching resonant topology
WO2023224860A1 (en) * 2022-05-16 2023-11-23 Diversified Technologies, Inc. A passively activated switch system for a high-current coil

Family Cites Families (151)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3867669A (en) 1974-01-11 1975-02-18 Yakov Lvovich Krasik Power source with a sparkproof output
US4271369A (en) 1975-06-10 1981-06-02 The United States Of America As Represented By The United States Department Of Energy Homopolar machine for reversible energy storage and transfer systems
US4276507A (en) 1975-06-10 1981-06-30 U.S. Department Of Energy Homopolar machine for reversible energy storage and transfer systems
US4299678A (en) 1979-07-23 1981-11-10 Spin Physics, Inc. Magnetic target plate for use in magnetron sputtering of magnetic films
DE3010099A1 (de) 1980-02-25 1981-09-03 BBC AG Brown, Boveri & Cie., Baden, Aargau Elektronische schutzschaltung
US4459629A (en) 1981-11-23 1984-07-10 General Electric Company Electric circuit breaker utilizing semiconductor diodes for facilitating interruption
US4484243A (en) 1982-09-30 1984-11-20 General Electric Company Protective circuit arrangement for a sheathed heating element
US4540607A (en) 1983-08-08 1985-09-10 Gould, Inc. Selective LPCVD tungsten deposition by the silicon reduction method
US4585986A (en) 1983-11-29 1986-04-29 The United States Of America As Represented By The Department Of Energy DC switching regulated power supply for driving an inductive load
US4557819A (en) 1984-07-20 1985-12-10 Varian Associates, Inc. System for igniting and controlling a wafer processing plasma
BG41745A1 (en) 1984-12-29 1987-08-14 Minchev Device for discontinuing of arc dicharges in gas dicharge vessel
US4589123A (en) 1985-02-27 1986-05-13 Maxwell Laboratories, Inc. System for generating soft X rays
US4740858A (en) 1985-08-06 1988-04-26 Mitsubishi Denki Kabushiki Kaisha Zero-current arc-suppression dc circuit breaker
JPS62267080A (ja) * 1985-09-04 1987-11-19 サ−マル・ダイナミクス・コ−ポレ−シヨン プラズマト−チしや断回路
DE3538494A1 (de) 1985-10-30 1987-05-07 Boehringer Andreas Aus einer gleichspannungsquelle gespeiste elektrische schaltungsanordnung zur versorgung eines verbraucherzweipols mit eingepraegtem, jedoch unterbrechbarem gleichstrom oder eingepraegtem, jedoch unterbrechbarem, blockfoermigem wechselstrom mit einstellbarer begrenzung der spannungen am verbraucherzweipol und an den verwendeten elektronischen einwegschaltern
US4870529A (en) 1986-10-31 1989-09-26 Displaytek, Inc. Active arc protection circuit
US4901621A (en) 1987-07-09 1990-02-20 Gt-Devices Superconducting projectile for a rail gun and the combination of a rail gun with a superconducting projectile
US4871421A (en) 1988-09-15 1989-10-03 Lam Research Corporation Split-phase driver for plasma etch system
US4936960A (en) 1989-01-03 1990-06-26 Advanced Energy Industries, Inc. Method and apparatus for recovery from low impedance condition during cathodic arc processes
EP0383962A1 (de) 1989-02-20 1990-08-29 Hauzer Holding B.V. Hochspannungsgleichrichter und zugeordnete Steuerelektronik
US5241152A (en) 1990-03-23 1993-08-31 Anderson Glen L Circuit for detecting and diverting an electrical arc in a glow discharge apparatus
US5275083A (en) 1990-05-14 1994-01-04 The United States Of America As Represented By The United States Department Of Energy Skirted projectiles for railguns
DE9109503U1 (de) 1991-07-31 1991-10-17 Magtron Magneto Elektronische Geraete Gmbh, 7583 Ottersweier Schaltungsanordnung für ein Stromversorgungsgerät für Geräte und Anlagen der Plasma- und Oberflächentechnik
US5281321A (en) 1991-08-20 1994-01-25 Leybold Aktiengesellschaft Device for the suppression of arcs
DE4127504A1 (de) 1991-08-20 1993-02-25 Leybold Ag Einrichtung zur unterdrueckung von lichtboegen
US5349166A (en) 1991-10-31 1994-09-20 Engineering & Research Associates, Inc. RF generator for plastic tubing sealers
US5525199A (en) 1991-11-13 1996-06-11 Optical Corporation Of America Low pressure reactive magnetron sputtering apparatus and method
US5415757A (en) 1991-11-26 1995-05-16 Leybold Aktiengesellschaft Apparatus for coating a substrate with electrically nonconductive coatings
DE4202425C2 (de) 1992-01-29 1997-07-17 Leybold Ag Verfahren und Vorrichtung zum Beschichten eines Substrats, insbesondere mit elektrisch nichtleitenden Schichten
CH689767A5 (de) 1992-03-24 1999-10-15 Balzers Hochvakuum Verfahren zur Werkstueckbehandlung in einer Vakuumatmosphaere und Vakuumbehandlungsanlage.
US5418707A (en) 1992-04-13 1995-05-23 The United States Of America As Represented By The United States Department Of Energy High voltage dc-dc converter with dynamic voltage regulation and decoupling during load-generated arcs
US5307004A (en) 1992-07-06 1994-04-26 Carsten Bruce W Soft switching boost and buck regulators
WO1994008067A1 (en) 1992-09-30 1994-04-14 Advanced Energy Industries, Inc. Topographically precise thin film coating system
DE4232840A1 (de) 1992-09-30 1994-03-31 Siemens Ag Hochfrequenzangeregter Laser für hohe Eingangsleistungen, insbesondere CO¶2¶-Bandleiterlaser
DE4233720C2 (de) 1992-10-07 2001-05-17 Leybold Ag Einrichtung für die Verhinderung von Überschlägen in Vakuum-Zerstäubungsanlagen
DE4235914A1 (de) 1992-10-23 1994-04-28 Juergen Prof Dr Engemann Vorrichtung zur Erzeugung von Mikrowellenplasmen
US6217717B1 (en) 1992-12-30 2001-04-17 Advanced Energy Industries, Inc. Periodically clearing thin film plasma processing system
US5427669A (en) 1992-12-30 1995-06-27 Advanced Energy Industries, Inc. Thin film DC plasma processing system
US5718813A (en) 1992-12-30 1998-02-17 Advanced Energy Industries, Inc. Enhanced reactive DC sputtering system
US5698082A (en) 1993-08-04 1997-12-16 Balzers Und Leybold Method and apparatus for coating substrates in a vacuum chamber, with a system for the detection and suppression of undesirable arcing
US6258219B1 (en) 1993-09-09 2001-07-10 Applied Materials, Inc. Two-step deposition process for preventing arcs
US5488535A (en) 1994-01-26 1996-01-30 Illinois Tool Works Inc. Arc suppressor for sidactors
US5573596A (en) 1994-01-28 1996-11-12 Applied Materials, Inc. Arc suppression in a plasma processing system
US5651865A (en) 1994-06-17 1997-07-29 Eni Preferential sputtering of insulators from conductive targets
DE4438463C1 (de) 1994-10-27 1996-02-15 Fraunhofer Ges Forschung Verfahren und Schaltung zur bipolaren pulsförmigen Energieeinspeisung in Niederdruckplasmen
DE4441206C2 (de) 1994-11-19 1996-09-26 Leybold Ag Einrichtung für die Unterdrückung von Überschlägen in Kathoden-Zerstäubungseinrichtungen
US5535906A (en) 1995-01-30 1996-07-16 Advanced Energy Industries, Inc. Multi-phase DC plasma processing system
US5584972A (en) 1995-02-01 1996-12-17 Sony Corporation Plasma noise and arcing suppressor apparatus and method for sputter deposition
ES2202439T3 (es) 1995-04-25 2004-04-01 Von Ardenne Anlagentechnik Gmbh Sistema de pulverizacion que utiliza un magnetron cilindrico rotativo alimentado electricamente utilizando corriente alterna.
US5576939A (en) 1995-05-05 1996-11-19 Drummond; Geoffrey N. Enhanced thin film DC plasma power supply
US5616224A (en) 1995-05-09 1997-04-01 Deposition Sciences, Inc. Apparatus for reducing the intensity and frequency of arcs which occur during a sputtering process
US5731565A (en) 1995-07-27 1998-03-24 Lam Research Corporation Segmented coil for generating plasma in plasma processing equipment
US6636545B2 (en) 1996-09-26 2003-10-21 Alexander V. Krasnov Supersonic and subsonic laser with radio frequency excitation
US5584974A (en) 1995-10-20 1996-12-17 Eni Arc control and switching element protection for pulsed dc cathode sputtering power supply
US5708250A (en) 1996-03-29 1998-01-13 Lam Resarch Corporation Voltage controller for electrostatic chuck of vacuum plasma processors
US5725675A (en) 1996-04-16 1998-03-10 Applied Materials, Inc. Silicon carbide constant voltage gradient gas feedthrough
US5917286A (en) 1996-05-08 1999-06-29 Advanced Energy Industries, Inc. Pulsed direct current power supply configurations for generating plasmas
US5882492A (en) 1996-06-21 1999-03-16 Sierra Applied Sciences, Inc. A.C. plasma processing system
US5682067A (en) 1996-06-21 1997-10-28 Sierra Applied Sciences, Inc. Circuit for reversing polarity on electrodes
NL1004215C2 (nl) 1996-10-07 1998-04-10 Avot Beheer Bv Afschermhouder voor een pot- of bakvormige houder.
JP3070004B2 (ja) 1996-11-19 2000-07-24 株式会社ランドマークテクノロジー プラズマ・プロセス監視装置
US6321531B1 (en) 1996-12-18 2001-11-27 Litex, Inc. Method and apparatus for using free radicals to reduce pollutants in the exhaust gases from the combustion of a fuel
WO1998037257A1 (fr) 1997-02-20 1998-08-27 Shibaura Mechatronics Corporation Bloc d'alimentation pour dispositif de pulverisation cathodique
US5864471A (en) * 1997-03-28 1999-01-26 Kammiller; Neil A. Energy recovery circuit for use in a converter
US6174450B1 (en) 1997-04-16 2001-01-16 Lam Research Corporation Methods and apparatus for controlling ion energy and plasma density in a plasma processing system
US5855745A (en) 1997-04-23 1999-01-05 Sierra Applied Sciences, Inc. Plasma processing system utilizing combined anode/ ion source
JP4120974B2 (ja) 1997-06-17 2008-07-16 キヤノンアネルバ株式会社 薄膜作製方法および薄膜作製装置
US6332961B1 (en) 1997-09-17 2001-12-25 Tokyo Electron Limited Device and method for detecting and preventing arcing in RF plasma systems
US5889391A (en) 1997-11-07 1999-03-30 Sierra Applied Sciences, Inc. Power supply having combined regulator and pulsing circuits
US6162332A (en) 1998-05-07 2000-12-19 Taiwan Semiconductor Manufacturing Company, Ltd. Method and apparatus for preventing arcing in sputter chamber
JP3895463B2 (ja) 1998-05-11 2007-03-22 株式会社リコー 薄膜形成方法及び薄膜形成装置
US6046641A (en) 1998-07-22 2000-04-04 Eni Technologies, Inc. Parallel HV MOSFET high power stable amplifier
US6135998A (en) 1999-03-16 2000-10-24 Board Of Trustees Of The Leland Stanford Junior University Method and apparatus for pulsed plasma-mediated electrosurgery in liquid media
DE19937859C2 (de) 1999-08-13 2003-06-18 Huettinger Elektronik Gmbh Elektrische Versorgungseinheit für Plasmaanlagen
US6437963B1 (en) * 1999-09-24 2002-08-20 Efc Systems, Inc. Method and apparatus for controlling power supplied to an electrostatic device
DE19949394A1 (de) 1999-10-13 2001-04-19 Balzers Process Systems Gmbh Elektrische Versorgungseinheit und Verfahren zur Reduktion der Funkenbildung beim Sputtern
US6552295B2 (en) 1999-12-20 2003-04-22 Research Triangle Institute Plasma furnace disposal of hazardous wastes
US6433987B1 (en) 1999-12-22 2002-08-13 Square D Company Protected and printed wiring board and method of making same
US6238513B1 (en) 1999-12-28 2001-05-29 International Business Machines Corporation Wafer lift assembly
US7220937B2 (en) 2000-03-17 2007-05-22 Applied Materials, Inc. Plasma reactor with overhead RF source power electrode with low loss, low arcing tendency and low contamination
US7030335B2 (en) 2000-03-17 2006-04-18 Applied Materials, Inc. Plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression
US6894245B2 (en) 2000-03-17 2005-05-17 Applied Materials, Inc. Merie plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression
DE10015244C2 (de) 2000-03-28 2002-09-19 Fraunhofer Ges Forschung Verfahren und Schaltungsanordnung zur pulsförmigen Energieeinspeisung in Magnetronentladungen
TW505939B (en) 2000-03-28 2002-10-11 Kumamoto Technopolis Foundatio Apparatus for detecting plasma anomalous discharge and method of detecting the same
US6507155B1 (en) 2000-04-06 2003-01-14 Applied Materials Inc. Inductively coupled plasma source with controllable power deposition
US6472822B1 (en) 2000-04-28 2002-10-29 Applied Materials, Inc. Pulsed RF power delivery for plasma processing
DE10021440A1 (de) 2000-05-03 2001-11-15 Univ Konstanz Verfahren zur Herstellung einer Solarzelle und nach diesem Verfahren hergestellte Solarzelle
US6447655B2 (en) 2000-05-30 2002-09-10 Alexander D. Lantsman DC plasma power supply for a sputter deposition
US6592710B1 (en) 2001-04-12 2003-07-15 Lam Research Corporation Apparatus for controlling the voltage applied to an electrostatic shield used in a plasma generator
US6577479B1 (en) 2000-08-28 2003-06-10 The Regents Of The University Of California Arc suppression circuit
US6484707B1 (en) 2000-09-29 2002-11-26 Unison Industries, Inc. Method and apparatus for generating a sustained arc at a sparking device
US6447719B1 (en) 2000-10-02 2002-09-10 Johnson & Johnson Power system for sterilization systems employing low frequency plasma
US6524455B1 (en) 2000-10-04 2003-02-25 Eni Technology, Inc. Sputtering apparatus using passive arc control system and method
US20020170678A1 (en) 2001-05-18 2002-11-21 Toshio Hayashi Plasma processing apparatus
SE525231C2 (sv) 2001-06-14 2005-01-11 Chemfilt R & D Ab Förfarande och anordning för att alstra plasma
CN1559103B (zh) * 2001-09-28 2011-07-06 芝浦机械电子株式会社 溅射电源单元
FR2830383B1 (fr) * 2001-10-02 2004-09-10 Somfy Convertisseur de tension
US6708645B1 (en) 2002-04-12 2004-03-23 Compuvac Systems, Inc. Arc resistant high voltage feedthru fitting for a vacuum deposition chamber
US6736944B2 (en) 2002-04-12 2004-05-18 Schneider Automation Inc. Apparatus and method for arc detection
US6879870B2 (en) 2002-04-16 2005-04-12 Steven C. Shannon Method and apparatus for routing harmonics in a plasma to ground within a plasma enhanced semiconductor wafer processing chamber
US7086347B2 (en) 2002-05-06 2006-08-08 Lam Research Corporation Apparatus and methods for minimizing arcing in a plasma processing chamber
US7247221B2 (en) 2002-05-17 2007-07-24 Applied Films Corporation System and apparatus for control of sputter deposition process
US6741158B2 (en) * 2002-07-18 2004-05-25 Honeywell International Inc. Magnetically sensed thermostat control
US20040027209A1 (en) 2002-08-09 2004-02-12 Applied Materials, Inc. Fixed matching network with increased match range capabilities
US6808607B2 (en) * 2002-09-25 2004-10-26 Advanced Energy Industries, Inc. High peak power plasma pulsed supply with arc handling
US7026174B2 (en) 2002-09-30 2006-04-11 Lam Research Corporation Method for reducing wafer arcing
JP4447469B2 (ja) 2002-12-27 2010-04-07 株式会社日立国際電気 プラズマ発生装置、オゾン発生装置、基板処理装置、及び半導体デバイスの製造方法
KR100783983B1 (ko) 2003-01-16 2007-12-11 도꾸리쯔교세이호징 가가꾸 기쥬쯔 신꼬 기꼬 고주파 전력 공급장치 및 플라즈마 발생장치
JP4251611B2 (ja) 2003-01-22 2009-04-08 芝浦メカトロニクス株式会社 電源、スパッタ用電源及びスパッタ装置
CA2418836A1 (en) 2003-02-12 2004-08-12 Resorption Canada Ltd. Multiple plasma generator hazardous waste processing system
DE10312549B3 (de) 2003-03-21 2004-08-26 Hüttinger Elektronik Gmbh + Co. Kg Gasentladungsprozess-Spannungsversorgungseinheit
JP2004311965A (ja) 2003-03-26 2004-11-04 Canon Inc 光起電力素子の製造方法
US7247218B2 (en) 2003-05-16 2007-07-24 Applied Materials, Inc. Plasma density, energy and etch rate measurements at bias power input and real time feedback control of plasma source and bias power
US6876205B2 (en) 2003-06-06 2005-04-05 Advanced Energy Industries, Inc. Stored energy arc detection and arc reduction circuit
US20060252283A1 (en) 2003-08-07 2006-11-09 Hitachi Kokusai Electric Inc. Substrate processing apparatus and sustrate processing method
US7015703B2 (en) 2003-08-12 2006-03-21 Scientific Systems Research Limited Radio frequency Langmuir probe
US6967305B2 (en) 2003-08-18 2005-11-22 Mks Instruments, Inc. Control of plasma transitions in sputter processing systems
US7095179B2 (en) 2004-02-22 2006-08-22 Zond, Inc. Methods and apparatus for generating strongly-ionized plasmas with ionizational instabilities
DE102004015090A1 (de) 2004-03-25 2005-11-03 Hüttinger Elektronik Gmbh + Co. Kg Bogenentladungserkennungseinrichtung
US20050258148A1 (en) 2004-05-18 2005-11-24 Nordson Corporation Plasma system with isolated radio-frequency powered electrodes
US7169256B2 (en) 2004-05-28 2007-01-30 Lam Research Corporation Plasma processor with electrode responsive to multiple RF frequencies
US6943317B1 (en) 2004-07-02 2005-09-13 Advanced Energy Industries, Inc. Apparatus and method for fast arc extinction with early shunting of arc current in plasma
US7081598B2 (en) 2004-08-24 2006-07-25 Advanced Energy Industries, Inc. DC-DC converter with over-voltage protection circuit
US7292045B2 (en) 2004-09-04 2007-11-06 Applied Materials, Inc. Detection and suppression of electrical arcing
WO2006036846A1 (en) 2004-09-24 2006-04-06 Zond, Inc. Apparatus for generating high-current electrical discharges
US7262606B2 (en) 2005-03-26 2007-08-28 Huettinger Elektronik Gmbh + Co. Kg Method of arc detection
US7305311B2 (en) 2005-04-22 2007-12-04 Advanced Energy Industries, Inc. Arc detection and handling in radio frequency power applications
EP1720195B1 (de) 2005-05-06 2012-12-12 HÜTTINGER Elektronik GmbH + Co. KG Arcunterdrückungsanordnung
JP3113228U (ja) 2005-06-01 2005-09-02 船井電機株式会社 プラズマテレビジョン
US7265619B2 (en) 2005-07-06 2007-09-04 Raytheon Company Two stage microwave Class E power amplifier
US20070042131A1 (en) 2005-08-22 2007-02-22 Applied Materials, Inc., A Delaware Corporation Non-intrusive plasma monitoring system for arc detection and prevention for blanket CVD films
KR100648707B1 (ko) 2005-10-11 2006-11-23 삼성에스디아이 주식회사 플라즈마 표시 장치 및 이에 사용되는 전원 공급 장치
TWI425767B (zh) 2005-10-31 2014-02-01 Mks Instr Inc 無線電頻率電力傳送系統
DE102006002333A1 (de) 2006-01-18 2007-07-19 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Vorrichtung zum Löschen von Bogenentladungen
US7507977B2 (en) * 2006-03-14 2009-03-24 Axcelis Technologies, Inc. System and method of ion beam control in response to a beam glitch
US7651492B2 (en) 2006-04-24 2010-01-26 Covidien Ag Arc based adaptive control system for an electrosurgical unit
US7445695B2 (en) 2006-04-28 2008-11-04 Advanced Energy Industries Inc. Method and system for conditioning a vapor deposition target
DE102006047243A1 (de) * 2006-05-15 2007-11-22 Infineon Technologies Ag Bordnetz mit mindestens einem Leistungstransistor und Verfahren zum Schutz eines Bordnetzes
US7498908B2 (en) 2006-08-04 2009-03-03 Advanced Energy Industries, Inc High-power PIN diode switch
US7514935B2 (en) 2006-09-13 2009-04-07 Advanced Energy Industries, Inc. System and method for managing power supplied to a plasma chamber
US7795817B2 (en) 2006-11-24 2010-09-14 Huettinger Elektronik Gmbh + Co. Kg Controlled plasma power supply
EP1928009B1 (de) * 2006-11-28 2013-04-10 HÜTTINGER Elektronik GmbH + Co. KG Bogenentladungs-Erkennungseinrichtung, Plasma-Leistungsversorgung und Verfahren zum Erkennen von Bogenentladungen
DE502006009308D1 (de) * 2006-12-14 2011-05-26 Huettinger Elektronik Gmbh Bogenentladungs-Erkennungseinrichtung, Plasma-Leistungsversorgung und Verfahren zum Erkennen von Bogenentladungen
US8217299B2 (en) 2007-02-22 2012-07-10 Advanced Energy Industries, Inc. Arc recovery without over-voltage for plasma chamber power supplies using a shunt switch
EP1978542B1 (de) * 2007-03-08 2010-12-29 HÜTTINGER Elektronik GmbH + Co. KG Verfahren und Vorrichtung zum Unterdrücken von Bogenentladungen beim Betreiben eines Plasmaprozesses
CN101287327B (zh) 2007-04-13 2011-07-20 中微半导体设备(上海)有限公司 射频功率源系统及使用该射频功率源系统的等离子体反应腔室
EP1995818A1 (en) 2007-05-12 2008-11-26 Huettinger Electronic Sp. z o. o Circuit and method for reducing electrical energy stored in a lead inductance for fast extinction of plasma arcs
US8044594B2 (en) 2008-07-31 2011-10-25 Advanced Energy Industries, Inc. Power supply ignition system and method
US8395078B2 (en) 2008-12-05 2013-03-12 Advanced Energy Industries, Inc Arc recovery with over-voltage protection for plasma-chamber power supplies
PL2790205T3 (pl) * 2009-02-17 2018-10-31 Solvix Gmbh Urządzenie zasilające do obróbki plazmowej
US8723423B2 (en) 2011-01-25 2014-05-13 Advanced Energy Industries, Inc. Electrostatic remote plasma source

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EP2219205A1 (en) 2010-08-18
US20100211230A1 (en) 2010-08-19
US20160064923A1 (en) 2016-03-03
US20140254054A1 (en) 2014-09-11
EP2648209B1 (en) 2018-01-03
US9214801B2 (en) 2015-12-15
US8542471B2 (en) 2013-09-24
EP2219205B1 (en) 2014-06-04
US20130271885A1 (en) 2013-10-17
US8837100B2 (en) 2014-09-16
EP2790205B1 (en) 2018-04-04
EP2790205A1 (en) 2014-10-15
PL2648209T3 (pl) 2018-06-29
US8854781B2 (en) 2014-10-07
EP2648209A1 (en) 2013-10-09
US9997903B2 (en) 2018-06-12
US20130221850A1 (en) 2013-08-29

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