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NO953933L - Process control apparatus and apparatus - Google Patents

Process control apparatus and apparatus

Info

Publication number
NO953933L
NO953933L NO953933A NO953933A NO953933L NO 953933 L NO953933 L NO 953933L NO 953933 A NO953933 A NO 953933A NO 953933 A NO953933 A NO 953933A NO 953933 L NO953933 L NO 953933L
Authority
NO
Norway
Prior art keywords
light beam
diffracted
developer
detector
development
Prior art date
Application number
NO953933A
Other languages
Norwegian (no)
Other versions
NO953933D0 (en
Inventor
Gerald Alfred John Reynolds
Jonathan Halliday
Original Assignee
Nimbus Communications Int Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nimbus Communications Int Ltd filed Critical Nimbus Communications Int Ltd
Publication of NO953933D0 publication Critical patent/NO953933D0/en
Publication of NO953933L publication Critical patent/NO953933L/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck
    • G03F7/3028—Imagewise removal using liquid means from a wafer supported on a rotating chuck characterised by means for on-wafer monitoring of the processing
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G11B7/261—Preparing a master, e.g. exposing photoresist, electroforming

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Diaphragms For Electromechanical Transducers (AREA)

Abstract

For å undersøke fremkallingen til et fotoreslst sjikt (2) på en optisk masterdlsk (1) ved et fremkallerfluid (14) er et transparent legeme (4, 35, 50) bragt l kontakt med fremkallerfluldet (14). En lysstråle (6) er ført Inn på den optiske masterdlsken (1) fra en kilde (5) og en dlffraktert stråle (8) passerer gjennom fremkallerfluldet (14) og det transparente legemet (4, 35, 50) til en detektor (9). På denne måten er den optiske banen til den dlffrakterte strålen (8) stabil. Den diffrakterte strålen (8) er fortrinnsvis generert fra den Innfallende lysstrålen (6) ved refleksjon og fortrinnsvis er den en første-ordens diffraktert stråle. Det foretrekkes også at den innfallende lysstrålen (6) moduleres. Fremkallingen av fotoresist- sjiktet blir så overvåket ved å overvåke endringer i den dlffrakterte lysstrålen (8) detektert av detektoren (9).To examine the development of a photoresisted layer (2) on an optical master disk (1) by a developer fluid (14), a transparent body (4, 35, 50) is brought into contact with the developer fluid (14). A light beam (6) is fed into the optical master lamp (1) from a source (5) and a diffracted beam (8) passes through the developer bulb (14) and the transparent body (4, 35, 50) to a detector (9). ). In this way, the optical path of the diffracted beam (8) is stable. The diffracted beam (8) is preferably generated from the incident light beam (6) by reflection and is preferably a first-order diffracted beam. It is also preferred that the incident light beam (6) be modulated. The development of the photoresist layer is then monitored by monitoring changes in the diffracted light beam (8) detected by the detector (9).

NO953933A 1993-04-07 1995-10-03 Process control apparatus and apparatus NO953933L (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB939307239A GB9307239D0 (en) 1993-04-07 1993-04-07 Method and apparatus for process control
PCT/GB1994/000720 WO1994023343A1 (en) 1993-04-07 1994-04-05 Method and apparatus for process control

Publications (2)

Publication Number Publication Date
NO953933D0 NO953933D0 (en) 1995-10-03
NO953933L true NO953933L (en) 1995-10-03

Family

ID=10733474

Family Applications (1)

Application Number Title Priority Date Filing Date
NO953933A NO953933L (en) 1993-04-07 1995-10-03 Process control apparatus and apparatus

Country Status (17)

Country Link
EP (1) EP0695438A1 (en)
JP (1) JPH08508602A (en)
CN (1) CN1120866A (en)
AU (1) AU675125B2 (en)
BR (1) BR9406451A (en)
CA (1) CA2159100A1 (en)
CZ (1) CZ283292B6 (en)
FI (1) FI954769A (en)
GB (1) GB9307239D0 (en)
HU (1) HUT73543A (en)
IL (1) IL109238A (en)
NO (1) NO953933L (en)
NZ (1) NZ263235A (en)
RU (1) RU2107893C1 (en)
SG (1) SG44328A1 (en)
TW (1) TW255966B (en)
WO (1) WO1994023343A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8576686B2 (en) 2005-01-25 2013-11-05 Cinram Group, Inc. Apparatus for multilevel optical recording
US8472020B2 (en) 2005-02-15 2013-06-25 Cinram Group, Inc. Process for enhancing dye polymer recording yields by pre-scanning coated substrate for defects
US7535806B2 (en) 2005-07-07 2009-05-19 Cinram International Inc. Apparatus and method for detecting laser dropout
EP1965383A1 (en) * 2007-03-02 2008-09-03 Singulus Mastering B.V. Diffraction order measurement

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5857843U (en) * 1981-10-16 1983-04-19 パイオニア株式会社 Photoresist wet development equipment
JPS59121337A (en) * 1982-12-24 1984-07-13 Fujitsu Ltd resist developing device
EP0379281A3 (en) * 1989-01-19 1991-03-20 Cosmopolitan Textile Company Limited Web inspecting method and apparatus
JP2861073B2 (en) * 1989-07-05 1999-02-24 ソニー株式会社 Developing device
US5124216A (en) * 1990-07-31 1992-06-23 At&T Bell Laboratories Method for monitoring photoresist latent images
JPH04141840A (en) * 1990-10-01 1992-05-15 Matsushita Electric Ind Co Ltd Automatic developing device for photoresist
JPH04311837A (en) * 1991-04-10 1992-11-04 Tdk Corp Method for developing optical master disk
US5357304A (en) * 1992-03-25 1994-10-18 Sony Corporation Image development apparatus and method

Also Published As

Publication number Publication date
IL109238A (en) 1997-07-13
SG44328A1 (en) 1997-12-19
IL109238A0 (en) 1994-07-31
RU2107893C1 (en) 1998-03-27
JPH08508602A (en) 1996-09-10
AU675125B2 (en) 1997-01-23
HU9502729D0 (en) 1995-11-28
CZ257195A3 (en) 1996-09-11
CA2159100A1 (en) 1994-10-13
HUT73543A (en) 1996-08-28
EP0695438A1 (en) 1996-02-07
CN1120866A (en) 1996-04-17
FI954769A0 (en) 1995-10-06
NO953933D0 (en) 1995-10-03
CZ283292B6 (en) 1998-02-18
BR9406451A (en) 1996-01-02
GB9307239D0 (en) 1993-06-02
WO1994023343A1 (en) 1994-10-13
FI954769A (en) 1995-10-06
TW255966B (en) 1995-09-01
NZ263235A (en) 1996-07-26
AU6384194A (en) 1994-10-24

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