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NO891062D0 - POSITIVE PHOTOGRAPHIC COMPOSITION. - Google Patents

POSITIVE PHOTOGRAPHIC COMPOSITION.

Info

Publication number
NO891062D0
NO891062D0 NO891062A NO891062A NO891062D0 NO 891062 D0 NO891062 D0 NO 891062D0 NO 891062 A NO891062 A NO 891062A NO 891062 A NO891062 A NO 891062A NO 891062 D0 NO891062 D0 NO 891062D0
Authority
NO
Norway
Prior art keywords
positive photographic
photographic composition
composition
positive
photographic
Prior art date
Application number
NO891062A
Other languages
Norwegian (no)
Other versions
NO891062L (en
Inventor
Richard Michael Lazarus
Edward Joseph Reardon
Sunit Suresh Dixit
Original Assignee
Thiokol Morton Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thiokol Morton Inc filed Critical Thiokol Morton Inc
Publication of NO891062D0 publication Critical patent/NO891062D0/en
Publication of NO891062L publication Critical patent/NO891062L/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
NO89891062A 1988-03-31 1989-03-13 POSITIVE PHOTOGRAPHIC COMPOSITION. NO891062L (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US17570688A 1988-03-31 1988-03-31
US22908888A 1988-08-05 1988-08-05

Publications (2)

Publication Number Publication Date
NO891062D0 true NO891062D0 (en) 1989-03-13
NO891062L NO891062L (en) 1989-10-02

Family

ID=26871494

Family Applications (1)

Application Number Title Priority Date Filing Date
NO89891062A NO891062L (en) 1988-03-31 1989-03-13 POSITIVE PHOTOGRAPHIC COMPOSITION.

Country Status (8)

Country Link
EP (1) EP0336605B1 (en)
JP (1) JPH0778627B2 (en)
KR (1) KR940001550B1 (en)
AU (1) AU3127689A (en)
DE (1) DE68909084T2 (en)
DK (1) DK155289A (en)
IL (1) IL89632A (en)
NO (1) NO891062L (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02110462A (en) * 1988-06-21 1990-04-23 Mitsubishi Kasei Corp Positive type photoresist
JPH04328747A (en) * 1991-03-27 1992-11-17 Internatl Business Mach Corp <Ibm> Photoresist composition coated evenly
DE4209343A1 (en) * 1992-03-23 1993-09-30 Hoechst Ag 1,2-naphthoquinone-2-diazide-sulfonic acid ester, radiation-sensitive composition prepared therefrom and radiation-sensitive recording material
KR100341563B1 (en) * 1992-03-23 2002-10-25 제이에스알 가부시끼가이샤 Resist Coating Composition
US5612164A (en) * 1995-02-09 1997-03-18 Hoechst Celanese Corporation Positive photoresist composition comprising a mixed ester of trishydroxyphenyl ethane and a mixed ester of trihydroxybenzophenone
KR100363273B1 (en) * 2000-07-29 2002-12-05 주식회사 동진쎄미켐 Photoresist composition for liquid crystal display circuit board
KR101324645B1 (en) * 2006-05-08 2013-11-01 주식회사 동진쎄미켐 Photoresist composition
JP2017088675A (en) * 2015-11-05 2017-05-25 Dic株式会社 Novolac type phenolic hydroxyl group-containing resin and resist material

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3274354D1 (en) * 1981-06-22 1987-01-08 Hunt Chem Corp Philip A Novolak resin and a positive photoresist composition containing the same
JPS5817112A (en) * 1981-06-22 1983-02-01 フイリツプ・エイ・ハント・ケミカル・コ−ポレイシヨン Positive novolak photoresist composition and blend
DE3220816A1 (en) * 1982-06-03 1983-12-08 Merck Patent Gmbh, 6100 Darmstadt LIGHT SENSITIVE COMPONENTS FOR POSITIVELY WORKING PHOTORESIST MATERIALS
JPH0658529B2 (en) * 1983-08-17 1994-08-03 三菱化成株式会社 Positive-type cresol lunovolak photoresist composition
JPS61141441A (en) * 1984-12-14 1986-06-28 Tokyo Ohka Kogyo Co Ltd Positive photoresist composition
US4626492A (en) * 1985-06-04 1986-12-02 Olin Hunt Specialty Products, Inc. Positive-working o-quinone diazide photoresist composition containing a dye and a trihydroxybenzophenone compound
JPS62123444A (en) * 1985-08-07 1987-06-04 Japan Synthetic Rubber Co Ltd Radiation sensitive resinous composition
JPS63184745A (en) * 1987-01-27 1988-07-30 Sumitomo Chem Co Ltd Positive photoresist composition

Also Published As

Publication number Publication date
KR940001550B1 (en) 1994-02-24
AU3127689A (en) 1989-10-05
EP0336605A3 (en) 1990-07-25
DE68909084T2 (en) 1994-01-13
JPH0778627B2 (en) 1995-08-23
IL89632A (en) 1993-01-31
EP0336605B1 (en) 1993-09-15
IL89632A0 (en) 1989-09-10
DK155289A (en) 1989-10-01
DE68909084D1 (en) 1993-10-21
JPH0210348A (en) 1990-01-16
EP0336605A2 (en) 1989-10-11
DK155289D0 (en) 1989-03-30
NO891062L (en) 1989-10-02
KR900003680A (en) 1990-03-26

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