NO163366B - NEW 2-AMINOTIAZOLD DERIVATIVES AND PROCEDURES FOR PREPARING THEREOF. - Google Patents
NEW 2-AMINOTIAZOLD DERIVATIVES AND PROCEDURES FOR PREPARING THEREOF. Download PDFInfo
- Publication number
- NO163366B NO163366B NO85854279A NO854279A NO163366B NO 163366 B NO163366 B NO 163366B NO 85854279 A NO85854279 A NO 85854279A NO 854279 A NO854279 A NO 854279A NO 163366 B NO163366 B NO 163366B
- Authority
- NO
- Norway
- Prior art keywords
- group
- acid
- stated
- formula
- aminothiazole derivative
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims description 7
- -1 methylthiocarbonyl group Chemical group 0.000 claims description 27
- 150000003839 salts Chemical class 0.000 claims description 13
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 claims description 12
- 125000003277 amino group Chemical group 0.000 claims description 11
- RAIPHJJURHTUIC-UHFFFAOYSA-N 1,3-thiazol-2-amine Chemical class NC1=NC=CS1 RAIPHJJURHTUIC-UHFFFAOYSA-N 0.000 claims description 8
- 238000006243 chemical reaction Methods 0.000 claims description 8
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims description 6
- 125000005843 halogen group Chemical group 0.000 claims description 6
- 125000006372 monohalo methyl group Chemical group 0.000 claims description 6
- 125000002485 formyl group Chemical group [H]C(*)=O 0.000 claims description 4
- 238000002360 preparation method Methods 0.000 claims description 4
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 claims description 3
- 125000004691 alkyl thio carbonyl group Chemical group 0.000 claims description 2
- 239000007795 chemical reaction product Substances 0.000 claims description 2
- 150000001875 compounds Chemical class 0.000 description 19
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 15
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 description 12
- 239000000203 mixture Substances 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 7
- 239000013078 crystal Substances 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 6
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 6
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N DMSO Substances CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 5
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 5
- 229910052794 bromium Inorganic materials 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- QSJXEFYPDANLFS-UHFFFAOYSA-N Diacetyl Chemical compound CC(=O)C(C)=O QSJXEFYPDANLFS-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 4
- 229910052801 chlorine Inorganic materials 0.000 description 4
- 230000002140 halogenating effect Effects 0.000 description 4
- 230000026030 halogenation Effects 0.000 description 4
- 238000005658 halogenation reaction Methods 0.000 description 4
- 238000002844 melting Methods 0.000 description 4
- 230000008018 melting Effects 0.000 description 4
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 4
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 3
- GZCRCGNZLNWBSK-UHFFFAOYSA-N 1-(2-amino-1,3-thiazol-4-yl)-2-chloroethanone Chemical compound NC1=NC(C(=O)CCl)=CS1 GZCRCGNZLNWBSK-UHFFFAOYSA-N 0.000 description 3
- ZULMJJCZPOPPGF-UHFFFAOYSA-N 1-bromo-4-chlorobutane-2,3-dione Chemical compound ClCC(=O)C(=O)CBr ZULMJJCZPOPPGF-UHFFFAOYSA-N 0.000 description 3
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- CPELXLSAUQHCOX-UHFFFAOYSA-N Hydrogen bromide Chemical class Br CPELXLSAUQHCOX-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 239000011541 reaction mixture Substances 0.000 description 3
- 238000010992 reflux Methods 0.000 description 3
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 3
- 235000017557 sodium bicarbonate Nutrition 0.000 description 3
- 239000012453 solvate Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 150000003585 thioureas Chemical class 0.000 description 3
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- AHPSZWVDPABXPI-UHFFFAOYSA-N 1-chlorobutane-2,3-dione Chemical compound CC(=O)C(=O)CCl AHPSZWVDPABXPI-UHFFFAOYSA-N 0.000 description 2
- VMASTYPGLHRVNL-UHFFFAOYSA-N 2-(2-amino-1,3-thiazol-4-yl)-2-oxoacetic acid Chemical class NC1=NC(C(=O)C(O)=O)=CS1 VMASTYPGLHRVNL-UHFFFAOYSA-N 0.000 description 2
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 2
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- OKKJLVBELUTLKV-MZCSYVLQSA-N Deuterated methanol Chemical compound [2H]OC([2H])([2H])[2H] OKKJLVBELUTLKV-MZCSYVLQSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- PCLIMKBDDGJMGD-UHFFFAOYSA-N N-bromosuccinimide Chemical compound BrN1C(=O)CCC1=O PCLIMKBDDGJMGD-UHFFFAOYSA-N 0.000 description 2
- JRNVZBWKYDBUCA-UHFFFAOYSA-N N-chlorosuccinimide Chemical compound ClN1C(=O)CCC1=O JRNVZBWKYDBUCA-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- 125000003710 aryl alkyl group Chemical group 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- WQOXQRCZOLPYPM-UHFFFAOYSA-N dimethyl disulfide Chemical compound CSSC WQOXQRCZOLPYPM-UHFFFAOYSA-N 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 235000019253 formic acid Nutrition 0.000 description 2
- 239000012442 inert solvent Substances 0.000 description 2
- 229910052740 iodine Inorganic materials 0.000 description 2
- 239000011630 iodine Substances 0.000 description 2
- JPJALAQPGMAKDF-UHFFFAOYSA-N selenium dioxide Chemical compound O=[Se]=O JPJALAQPGMAKDF-UHFFFAOYSA-N 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- YBBRCQOCSYXUOC-UHFFFAOYSA-N sulfuryl dichloride Chemical compound ClS(Cl)(=O)=O YBBRCQOCSYXUOC-UHFFFAOYSA-N 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- WYIVDYGTKGEJLC-UHFFFAOYSA-N 2,3-dioxobutanoic acid Chemical compound CC(=O)C(=O)C(O)=O WYIVDYGTKGEJLC-UHFFFAOYSA-N 0.000 description 1
- ITKDMXICMMZJGI-UHFFFAOYSA-N 2-amino-1-(4-chloro-1,3-thiazol-2-yl)ethanone Chemical compound NCC(=O)C=1SC=C(N=1)Cl ITKDMXICMMZJGI-UHFFFAOYSA-N 0.000 description 1
- MARXMDRWROUXMD-UHFFFAOYSA-N 2-bromoisoindole-1,3-dione Chemical compound C1=CC=C2C(=O)N(Br)C(=O)C2=C1 MARXMDRWROUXMD-UHFFFAOYSA-N 0.000 description 1
- WDRFYIPWHMGQPN-UHFFFAOYSA-N 2-chloroisoindole-1,3-dione Chemical compound C1=CC=C2C(=O)N(Cl)C(=O)C2=C1 WDRFYIPWHMGQPN-UHFFFAOYSA-N 0.000 description 1
- BMYNFMYTOJXKLE-UHFFFAOYSA-N 3-azaniumyl-2-hydroxypropanoate Chemical compound NCC(O)C(O)=O BMYNFMYTOJXKLE-UHFFFAOYSA-N 0.000 description 1
- 125000004080 3-carboxypropanoyl group Chemical group O=C([*])C([H])([H])C([H])([H])C(O[H])=O 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 125000002252 acyl group Chemical group 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 125000005103 alkyl silyl group Chemical group 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 239000003242 anti bacterial agent Substances 0.000 description 1
- 229940088710 antibiotic agent Drugs 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 125000001584 benzyloxycarbonyl group Chemical group C(=O)(OCC1=CC=CC=C1)* 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 125000005997 bromomethyl group Chemical group 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 150000001734 carboxylic acid salts Chemical class 0.000 description 1
- 239000012320 chlorinating reagent Substances 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 125000002668 chloroacetyl group Chemical group ClCC(=O)* 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000004508 fractional distillation Methods 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 239000005457 ice water Substances 0.000 description 1
- 125000001841 imino group Chemical group [H]N=* 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 125000005928 isopropyloxycarbonyl group Chemical group [H]C([H])([H])C([H])(OC(*)=O)C([H])([H])[H] 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 235000010755 mineral Nutrition 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- KVBGVZZKJNLNJU-UHFFFAOYSA-N naphthalene-2-sulfonic acid Chemical compound C1=CC=CC2=CC(S(=O)(=O)O)=CC=C21 KVBGVZZKJNLNJU-UHFFFAOYSA-N 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- UYWQUFXKFGHYNT-UHFFFAOYSA-N phenylmethyl ester of formic acid Natural products O=COCC1=CC=CC=C1 UYWQUFXKFGHYNT-UHFFFAOYSA-N 0.000 description 1
- 125000000612 phthaloyl group Chemical group C(C=1C(C(=O)*)=CC=CC1)(=O)* 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000012286 potassium permanganate Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 125000006239 protecting group Chemical group 0.000 description 1
- 238000007363 ring formation reaction Methods 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-N sulfonic acid Chemical compound OS(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-N 0.000 description 1
- NBNBICNWNFQDDD-UHFFFAOYSA-N sulfuryl dibromide Chemical compound BrS(Br)(=O)=O NBNBICNWNFQDDD-UHFFFAOYSA-N 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- YNJBWRMUSHSURL-UHFFFAOYSA-N trichloroacetic acid Chemical compound OC(=O)C(Cl)(Cl)Cl YNJBWRMUSHSURL-UHFFFAOYSA-N 0.000 description 1
- 125000004044 trifluoroacetyl group Chemical group FC(C(=O)*)(F)F 0.000 description 1
- 125000002221 trityl group Chemical group [H]C1=C([H])C([H])=C([H])C([H])=C1C([*])(C1=C(C(=C(C(=C1[H])[H])[H])[H])[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
- C07C45/61—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups
- C07C45/63—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by introduction of halogen; by substitution of halogen atoms by other halogen atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
- C07C45/78—Separation; Purification; Stabilisation; Use of additives
- C07C45/79—Separation; Purification; Stabilisation; Use of additives by solid-liquid treatment; by chemisorption
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
- C07C45/78—Separation; Purification; Stabilisation; Use of additives
- C07C45/81—Separation; Purification; Stabilisation; Use of additives by change in the physical state, e.g. crystallisation
- C07C45/82—Separation; Purification; Stabilisation; Use of additives by change in the physical state, e.g. crystallisation by distillation
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
- C07C49/04—Saturated compounds containing keto groups bound to acyclic carbon atoms
- C07C49/16—Saturated compounds containing keto groups bound to acyclic carbon atoms containing halogen
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D277/00—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings
- C07D277/02—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings not condensed with other rings
- C07D277/20—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
- C07D277/32—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D277/38—Nitrogen atoms
- C07D277/40—Unsubstituted amino or imino radicals
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D277/00—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings
- C07D277/02—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings not condensed with other rings
- C07D277/20—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
- C07D277/32—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D277/38—Nitrogen atoms
- C07D277/44—Acylated amino or imino radicals
- C07D277/48—Acylated amino or imino radicals by radicals derived from carbonic acid, or sulfur or nitrogen analogues thereof, e.g. carbonylguanidines
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Transition And Organic Metals Composition Catalysts For Addition Polymerization (AREA)
Description
Foreliggende oppfinnelse angår en ny forbindelse som The present invention relates to a new compound which
er egnet for fremstilling av et 2-(2-(aminotiazol-4-yl)-glyoksylsyrederivat eller et salt av dette, og en fremgangs- is suitable for the production of a 2-(2-(aminothiazol-4-yl)-glyoxylic acid derivative or a salt thereof, and a process
måte for fremstilling av denne forbindelse. method for producing this compound.
Derivater av 2-(2-aminotiazol-4-yl)glyoksylsyre med den generelie forme1: Derivatives of 2-(2-aminothiazol-4-yl)glyoxylic acid of the general form1:
hvor R<1> er en, eventuelt beskyttet, aminogruppe, er nyttige utgangsmaterialer for fremstilling av forskjellige cefalo- where R<1> is an, optionally protected, amino group, are useful starting materials for the preparation of various cephalo-
sporin antibiotika. For fremstilling av disse utgangsmaterialer er det hittil kjent (1) en fremgangsmåte hvor en ester av 2-[2-(beskyttet eller ubeskyttet)aminotiazol-4-yl]eddiksyre oksyderes med selendioksyd eller kaliumpermanganat (utlagt japansk patentsøknad Kokai nr. 125.190/77 eller 5.193/78) og (2) en fremgangsmåte hvor en ester av acetylglyoksylsyre halogeneres og det resulterende halogeneringsprodukt etter omsetning med tiourea, hydrolyseres (utlagt japansk patent- trace antibiotics. For the production of these starting materials, there is up to now known (1) a method in which an ester of 2-[2-(protected or unprotected)aminothiazol-4-yl]acetic acid is oxidized with selenium dioxide or potassium permanganate (exposed Japanese patent application Kokai no. 125,190/77 or 5,193/78) and (2) a method in which an ester of acetylglyoxylic acid is halogenated and the resulting halogenation product, after reaction with thiourea, is hydrolyzed (issued Japanese patent
søknad Kokai nr. 112.895/78 og 154.785/79). application Kokai no. 112.895/78 and 154.785/79).
For å komme frem til en ny fremgangsmåte for fremstilling To arrive at a new method of manufacture
av en forbindelse med formel (I), er det av søkerne gjennom- of a compound of formula (I), it is of the applicants through-
ført et omfattende forskningsprogram. Dette har resultert i en ny fremstillingsprosess som er gjenstand for stamansøk- conducted an extensive research program. This has resulted in a new manufacturing process which is the subject of a standard application
ningen 832178 (patent 161114). patent 832178 (patent 161114).
Ifølge stamansøkningen kan 2-(2-aminotiazol-4-yl)glyoksyl-syrederivater med den generelle formel (I) eller salter derav, fremstilles ved å benytte følgende syntese-trinn: According to the parent application, 2-(2-aminothiazol-4-yl)glyoxylic acid derivatives with the general formula (I) or salts thereof can be prepared by using the following synthesis steps:
i 1 2 hvor R er som angitt ovenfor; X er et halogenatom og R en alkyl- eller aralkylgruppe. in 1 2 where R is as indicated above; X is a halogen atom and R an alkyl or aralkyl group.
Beskyttelsesgrupper for aminogruppen i R , innbefatter alle grupper som vanligvis benyttes som amino-beskyttende grupper som f.eks. lett avspaltbare acylgrupper så som triklor-etoksykarbonyl, tribrometoksykarbonyl, benzyloksykarbonyl, p-toluensulfonyl, p-nitrobenzyloksykarbonyl, o-brombenzyloksy-karbonyl, (mono-, di-, tri-)kloracetyl, trifluoracetyl, formyl, tert.-amyloksykarbony1, tert.-butoksykarbonyl, p-metoksybenzyloksykarbonyl, 3,4-metoksybenzyloksykarbonyl, 4-(fenylazo)-benzyloksykarbonyl, 4-(4-metoksyfenylazo)benzyloksykarbonyl, (pyridin-1-oksyd-2-y1)metoksykarbonyl, 2-furyloksykarbony1, difenylmetoksykarbonyl, 1,1-dimetylpropoksykarbonyl, isoprop-oksykarbonyl, 1-cyklopropyletbksykarbony1, ftaloyl, succinyl, 1- adamantyloksykarbonyl, 8-kinolyloksykarbony1 og lignende. Videre kan det dessuten benyttes andre lett avspaltbare grupper så som trityl, o-nitrofenylsulfeny1, 2,4-dinitrofenyl-sulfenyl, 2-hydroksybenzyliden, 2-hydroksy-5-klorbenzyliden, 2- hydroksy-1-naftylmetylen, 3-hydroksy-4-pyridylmetylen, 1-metoksykarbonyl-2-propyliden, 1^etoksykarbony1-2-propyliden, 3- etoksykarbonyl-2-butyliden, 1-acetyl-2-propyliden, 1-benzoyl-2-propyliden, 1 -[N-(2-metoksyfeny1)karbamoyl]-2-propyliden, 1 _ rn_(4-metoksyfeny1)-karbamoyl]-2-propyliden, 2-etoksy-karbonylcykloheksyliden, 2-etoksykarbonylcyklopentyliden, 2-acetylcykloheksyliden, 3,3-dimetyl-5-oksocykloheksyliden, (di-, tri-)alkylsilylgrupper og lignende. Protecting groups for the amino group in R include all groups that are usually used as amino-protecting groups such as e.g. easily cleavable acyl groups such as trichloroethoxycarbonyl, tribromomethoxycarbonyl, benzyloxycarbonyl, p-toluenesulfonyl, p-nitrobenzyloxycarbonyl, o-bromobenzyloxycarbonyl, (mono-, di-, tri-)chloroacetyl, trifluoroacetyl, formyl, tert.-amyloxycarbonyl, tert. -butoxycarbonyl, p-methoxybenzyloxycarbonyl, 3,4-methoxybenzyloxycarbonyl, 4-(phenylazo)-benzyloxycarbonyl, 4-(4-methoxyphenylazo)benzyloxycarbonyl, (pyridine-1-oxide-2-y1)methoxycarbonyl, 2-furyloxycarbonyl, diphenylmethoxycarbonyl, 1 ,1-dimethylpropoxycarbonyl, isopropoxycarbonyl, 1-cyclopropylethoxycarbonyl, phthaloyl, succinyl, 1-adamantyloxycarbonyl, 8-quinolyloxycarbonyl and the like. Furthermore, other easily cleavable groups such as trityl, o-nitrophenylsulfenyl1, 2,4-dinitrophenylsulfenyl, 2-hydroxybenzylidene, 2-hydroxy-5-chlorobenzylidene, 2-hydroxy-1-naphthylmethylene, 3-hydroxy-4 -pyridylmethylene, 1-methoxycarbonyl-2-propylidene, 1^ethoxycarbonyl-2-propylidene, 3-ethoxycarbonyl-2-butylidene, 1-acetyl-2-propylidene, 1-benzoyl-2-propylidene, 1-[N-(2 -methoxypheny1)carbamoyl]-2-propylidene, 1_rn_(4-methoxypheny1)carbamoyl]-2-propylidene, 2-ethoxycarbonylcyclohexylidene, 2-ethoxycarbonylcyclopentylidene, 2-acetylcyclohexylidene, 3,3-dimethyl-5-oxocyclohexylidene, (di-, tri-)alkylsilyl groups and the like.
Halogenatomet kan være fluor, klor, brom eller jod. The halogen atom can be fluorine, chlorine, bromine or iodine.
Som alkylgruppe for R 2kan det f.eks. benyttes lavere alkylgrupper så som metyl, etyl, n-propyl og lignende, og som aralkylgruppe for R 2, f.eks. ar-lavere-alkylgrupper så som en benzylgruppe og lignende. As an alkyl group for R 2, it can e.g. lower alkyl groups such as methyl, ethyl, n-propyl and the like are used, and as an aralkyl group for R 2, e.g. ar lower alkyl groups such as a benzyl group and the like.
Saltene av forbindelsen med formel (I) innbefatter salter The salts of the compound of formula (I) include salts
i aminogruppen eller karboksylgruppen. Som aminogruppe-salter kan det for eksempel benyttes salter med en mineralsyre så in the amino group or the carboxyl group. As amino group salts, salts with a mineral acid can be used, for example
som saltsyre, hydrogenbromidsyre, flusssyre, svovelsyre eller lignende; salter med en organisk karboksylsyre som f.eks. oksal-syre, maursyre, trikloreddiksyre, trifluoreddiksyre, eller salter med en sulfonsyre som metansulfonsyre, p-toluensulfon-syre, 1- eller 2-naftalensulfonsyre eller lignende. Som karboksylsyre-salter kan det benyttes salter med et alkali-metall som f.eks. natrium eller kalium eller med jordalkalie-metaller som kalsium, magnesium eller lignende. such as hydrochloric acid, hydrobromic acid, hydrofluoric acid, sulfuric acid or the like; salts with an organic carboxylic acid such as oxalic acid, formic acid, trichloroacetic acid, trifluoroacetic acid, or salts with a sulphonic acid such as methanesulphonic acid, p-toluenesulphonic acid, 1- or 2-naphthalenesulphonic acid or the like. As carboxylic acid salts, salts with an alkali metal such as e.g. sodium or potassium or with alkaline earth metals such as calcium, magnesium or the like.
Uttrykket "salt av forbindelsen med den generelle formel (II) eller (III)" betyr et salt med aminogruppen i formel (II) eller (III) og innbefatter de salter som er omtalt som aminogruppe-salter av forbindelsen med formel (I). The expression "salt of the compound of the general formula (II) or (III)" means a salt with the amino group in formula (II) or (III) and includes those salts referred to as amino group salts of the compound of formula (I).
Ifølge oppfinnelsen tilveiebringes et 2-aminotiazolderivat med den generelle formel: According to the invention, a 2-aminothiazole derivative with the general formula is provided:
hvor R<1> er en aminogruppe som eventuelt er beskyttet med en formylgruppe og R <3>er en monohalogenmetyl- eller en c^_^~ alkyltiokarbonyl-gruppe. where R<1> is an amino group which is optionally protected with a formyl group and R<3> is a monohalomethyl or a c^_^~ alkylthiocarbonyl group.
Forbindelsen med formel (VIII) innbefatter til en viss The compound of formula (VIII) includes to a certain extent
grad de tidligere omtalte forbindelser med formel (II) og (III). degree the previously mentioned compounds of formula (II) and (III).
Monohalogenmetylgruppen i R"^, kan f. eks. være en klormetylgruppe, en brommetylgruppe, en jodmetylgruppe og lignende. C1_4-alkyltiokarbonylgruppen kan f.eks. være en metyltio-karbonylgruppe, en etyltiokarbonylgruppe, en n-propyltiokarbonyl-gruppe og lignende. The monohalomethyl group in R"^ can, for example, be a chloromethyl group, a bromomethyl group, an iodomethyl group and the like. The C1-4-alkylthiocarbonyl group can, for example, be a methylthiocarbonyl group, an ethylthiocarbonyl group, an n-propylthiocarbonyl group and the like.
Blant forbindelser med den generelle formel (VIII) er forbindelser hvor R 3 er en klormetyl- eller metyltiokarbonyl-gruppe, spesielt foretrukket. Among compounds of the general formula (VIII), compounds where R 3 is a chloromethyl or methylthiocarbonyl group are particularly preferred.
Når det When it
-gruppen i hver av de ovenfor nevnte generelle formler, forekommer disse i form av de nedenfor viste tautomerer, som også omfattes av oppfinnelsen: hvor R"<*>"<9> er en iminogruppe som eventuelt er beskyttet med en formylgruppe, og R^" er som ovenfor angitt. Ifølge oppfinnelsen fremstilles forbindelsen med formel VIII hvor R1 er en aminogruppe ved at et 1,4-dihalogenbutan-2,3-dion med den generelle formel 1 2a hvor X og X , som er forskjellige, er halogenatomer, omsettes med tiourea med formelen: -group in each of the above-mentioned general formulas, these occur in the form of the tautomers shown below, which are also covered by the invention: where R"<*>"<9> is an imino group which is optionally protected with a formyl group, and R ^" is as indicated above. According to the invention, the compound of formula VIII where R1 is an amino group is prepared by a 1,4-dihalobutane-2,3-dione of the general formula 1 2a where X and X, which are different, are halogen atoms , is reacted with thiourea with the formula:
og reaksjonsproduktet, om nødvendig, omsettes med et di-C^_^-alkylsulfoksyd, idet omsetningen med et tiourea fortrinnsvis foretas ved -50°C til 10°C, and the reaction product, if necessary, is reacted with a di-C^_^-alkyl sulfoxide, the reaction with a thiourea being preferably carried out at -50°C to 10°C,
Fremstilling av forbindelsen med formel VIII hvor R^ er monohalogenmetyl er illustrert i det følgende reaksjonsskjema. Preparation of the compound of formula VIII where R 1 is monohalomethyl is illustrated in the following reaction scheme.
hvor X1 og X2a, som er forskjellige, er halogenatomer og where X1 and X2a, which are different, are halogen atoms and
R<1> har den ovenfor angitte betydning. R<1> has the above meaning.
X<2a> i den generelle formel (Via) betyr et halogenatom som fluor, klor, brom eller jod. X<2a> in the general formula (Via) means a halogen atom such as fluorine, chlorine, bromine or iodine.
Halogeneringen for å oppnå et 1-halogen-butan-2,3-dion The halogenation to obtain a 1-halo-butane-2,3-dione
med den generelle formel (V) fra butan-2,3-dion med formel (IV) og et 1,4-dihalogenbutan-2,3-dion med formel (Via) fra et 1-halogenbutan-2,3-dion (V) foretas under like betingelser. Halogeneringen kan for eksempel foretas under eller uten nærvær av et reaksjonsinert løsningsmiddel, f.eks. et aromatisk hydrokarbon så som benzen, toluen, xylen eller lignende, en eter som dietyleter, diisopropyleter, tetrahydrofuran, dioksan eller lignende, et halogenert hydrokarbon som metylenklorid, kloroform, karbontetraklorid, dikloretan eller lignende, en karboksylsyre som eddiksyre eller lignende eller en blanding av disse løsningsmidler. Som halogeneringsmiddel kan vanlig anvendte midler for halogenering av parafiner benyttes. Som kloreringsmiddel kommer f.eks. klor, sulforylklorid, N-klor-succinimid, N-klorftalimid og lignende på tale. Som bromerings-middel kan brom, sulfurylbromid, N-bromsuccinimid, N-brom-ftalimid og lignende anvendes. Halogeneringsmidlet benyttes with the general formula (V) from butane-2,3-dione of formula (IV) and a 1,4-dihalobutane-2,3-dione of formula (Via) from a 1-halobutane-2,3-dione ( V) is carried out under the same conditions. The halogenation can, for example, be carried out with or without the presence of a reaction-inert solvent, e.g. an aromatic hydrocarbon such as benzene, toluene, xylene or the like, an ether such as diethyl ether, diisopropyl ether, tetrahydrofuran, dioxane or the like, a halogenated hydrocarbon such as methylene chloride, chloroform, carbon tetrachloride, dichloroethane or the like, a carboxylic acid such as acetic acid or the like or a mixture of these solvents. As a halogenating agent, commonly used agents for halogenating paraffins can be used. As a chlorinating agent, e.g. chlorine, sulphoryl chloride, N-chlorosuccinimide, N-chlorophthalimide and the like in speech. Bromine, sulfuryl bromide, N-bromosuccinimide, N-bromophthalimide and the like can be used as brominating agents. The halogenating agent is used
fortrinnsvis i n\entjder som er omtrent ekvinolare med forbindelse (IV), resp. forbindelse (V). Reaksjonsbetingelsene vil bl. a. avhenge av det anvendte halogeneringsmiddel, men reaksjonen foretas vanligvis ved en temperatur på fra 10°C opp til løsningsmidlets kokepunkt i løpet av 30 minutter til 10 timer. preferably in n\entjders which are approximately equinolar with compound (IV), resp. connection (V). The reaction conditions will, among other things, a. depend on the halogenating agent used, but the reaction is usually carried out at a temperature of from 10°C up to the boiling point of the solvent within 30 minutes to 10 hours.
Halogeneringen foretas fortrinnsvis på den måte at forbindelse (IV) først kloreres med sulfurylklorid til en forbindelse med formel (V), hvor X<1> er et kloratom, som deretter omsettes med brom til en forbindelse med formel (Via) hvor X<2a >er et bromatom. The halogenation is preferably carried out in such a way that compound (IV) is first chlorinated with sulfuryl chloride to a compound of formula (V), where X<1> is a chlorine atom, which is then reacted with bromine to a compound of formula (Via) where X<2a >is a bromine atom.
For deretter å oppnå en forbindelse med den generelle formel (II) hvor R 3 er monohalogenmetyl, ved omsetning av et 1,4-dihalogenbutan-2,3-dion, f.eks. 1-brom-4-klorbutan-2,3-dion, med et tiourea-derivat med den generelle formel (VII), foretas reaksjonen i nærvær av et reaksjonsinert løsningsmiddel, f.eks. en alkohol så som metanol, etanol, isopropanol eller lignende, en eter som tetrahydrofuran, dioksan eller lignende, et amid som N,N-dimetylformamid, N,N-dimetylacetamid, heksametyl-fosforsyreamid eller lignende, eller en blanding av en eller flere av disse, eventuelt også i blanding med vann. Mengden av tiourea-derivatet (VII) kan utgjøre 0,90 mol eller mer, fortrinnsvis 0,95-1,00 mol, per mol av forbindelse (Via). Denne ringslutningsreaksjon tar vanligvis fra 5 minutter til 20 timer ved en reaksjonstemperatur på -50° til 10°C. In order to then obtain a compound of the general formula (II) where R 3 is monohalomethyl, by reacting a 1,4-dihalobutane-2,3-dione, e.g. 1-bromo-4-chlorobutane-2,3-dione, with a thiourea derivative of the general formula (VII), the reaction is carried out in the presence of a reaction-inert solvent, e.g. an alcohol such as methanol, ethanol, isopropanol or the like, an ether such as tetrahydrofuran, dioxane or the like, an amide such as N,N-dimethylformamide, N,N-dimethylacetamide, hexamethylphosphoric acid amide or the like, or a mixture of one or more of these, possibly also in a mixture with water. The amount of the thiourea derivative (VII) may amount to 0.90 mol or more, preferably 0.95-1.00 mol, per mol of compound (Via). This ring closure reaction usually takes from 5 minutes to 20 hours at a reaction temperature of -50° to 10°C.
Fremstilling av forbindelsene med formel VIII er illustrert i de følgende eksempler. Den videre omdannelse er illustrert i stamansøkningen. Preparation of the compounds of formula VIII is illustrated in the following examples. The further transformation is illustrated in the original application.
Eksempel 1 Example 1
(1) Til en orarørt løsning av 172 g butan-2,3-dion i 172 ml benzen ble det ved 60°C i løpet av 3 timer dråpevis tilsatt 163 ml sulfurylklorid. Etter endt tilsetning ble omrøringen fortsatt i 1 time ved samme temperatur og deretter 1 time under tilbakeløpsbetingelser. Etter fraksjonert destillasjon under redusert trykk ble det oppnådd 124 g (51,5% utb<y>tte) 1-klorbutan-2,3-dion med et kokepunkt på 53,5-55,0°C/14 mm Hg. (1) To an unstirred solution of 172 g of butane-2,3-dione in 172 ml of benzene, 163 ml of sulfuryl chloride was added dropwise at 60°C over the course of 3 hours. After the addition was complete, stirring was continued for 1 hour at the same temperature and then 1 hour under reflux conditions. After fractional distillation under reduced pressure, 124 g (51.5% yield) of 1-chlorobutane-2,3-dione with a boiling point of 53.5-55.0°C/14 mm Hg were obtained.
IR (ublandet) cm"<1>: \ IQ = QM20 IR (unmixed) cm"<1>: \ IQ = QM20
NMR (CDC13) 6-verdier: NMR (CDCl 3 ) 6 values:
(2) Til en omrørt løsning av 120,5 g 1-klorbutan-2,3-dion og 120 ml dikloretan ble det under tilbakeløpsbehandling i 2 timer dråpevis tilsatt 160 g brom. Etter endt tilsetning ble reaksjonsblandingen omrørt videre under tilbakeløpsbetingelser i 30 minutter og deretter avkjølt til 20°C. De utfelte krystaller ble frafiltrert, vasket med dikloretan og deretter tørket, hvorved 109 g (54,6% utbytte) 1-brom-4-klorbutan-2,3-dion med smeltepunkt 120-121,5°C, ble oppnådd. (2) To a stirred solution of 120.5 g of 1-chlorobutane-2,3-dione and 120 ml of dichloroethane, 160 g of bromine were added dropwise under reflux treatment for 2 hours. After the addition was complete, the reaction mixture was stirred further under reflux conditions for 30 minutes and then cooled to 20°C. The precipitated crystals were filtered off, washed with dichloroethane and then dried, whereby 109 g (54.6% yield) of 1-bromo-4-chlorobutane-2,3-dione with a melting point of 120-121.5°C were obtained.
IR (KBr) cm"<1>: VQ = Q 1 760, 1735 IR (KBr) cm"<1>: VQ = Q 1 760, 1735
NMR (CD3OD) 6-verdier: NMR (CD3OD) 6 values:
3,70 (1H, s), 3,83 (1H, s), 4,63 (1H, s), 4,81 (1H, s) (3) En suspensjon av 20,0 g 1-brom-4-klorbutan-2,3-dion i 140 ml etanol ble avkjølt til -35°C og under omrøring tilsatt 7,3 g tiourea. Den resulterende løsning ble omrørt ved den nevnte temperatur i 4 timer, hvorpå temperaturen ble hevet til -20°C over et tidsrom på 30 minutter, og løsningen deretter omrørt videre i 2 timer. Temperaturen ble deretter i løpet av 1,5 timer hevet til 10°C for avsetning av hvite krystaller. Krystallene ble frafiltrert, vasket med etanol og deretter tørket, hvorved 24,9 g (81,8% utbytte) av et 1:1 solvat av etanol og hydrobromidsaltet av 2-amino-4-klor-acetyltiazol, smp. 191°C (dekomp.) ble oppnådd. 3.70 (1H, s), 3.83 (1H, s), 4.63 (1H, s), 4.81 (1H, s) (3) A suspension of 20.0 g of 1-bromo-4 -chlorobutane-2,3-dione in 140 ml of ethanol was cooled to -35°C and, with stirring, 7.3 g of thiourea was added. The resulting solution was stirred at the aforementioned temperature for 4 hours, after which the temperature was raised to -20°C over a period of 30 minutes, and the solution was then further stirred for 2 hours. The temperature was then raised to 10°C over the course of 1.5 hours for deposition of white crystals. The crystals were filtered off, washed with ethanol and then dried, whereby 24.9 g (81.8% yield) of a 1:1 solvate of ethanol and the hydrobromide salt of 2-amino-4-chloro-acetylthiazole, m.p. 191°C (decomp.) was obtained.
IR (KBr) cm <1:>^ C=Q<16>95 IR (KBr) cm <1:>^ C=Q<16>95
NMR (dO,-DMSO) 6-verdier: NMR (dO,-DMSO) 6 values:
1,09 (3H, t, J=7,5Hz CH3CH2OH), 3,54 (2H, q, J=7,5Hz CHjCf^OH) , 1.09 (3H, t, J=7.5Hz CH3CH2OH), 3.54 (2H, q, J=7.5Hz CHjCf^OH) ,
Eksempel 2 Example 2
En omrørt løsning av 30,4 g av 1:1 solvatet av etanol og hydrobromidsalt av 2-amino-4-kloracetyltiazol, 91 ml dimetyl-sulfoksyd og 11,9 g kaliumbromid ble oppvarmet til 30°C og tilsatt 8,9 ml dimetyldisulfid. Den resulterende reaksjons-blanding ble omrørt ved 30-35°C i 2 timer og deretter helt over i 300 ml isvann. A stirred solution of 30.4 g of the 1:1 solvate of ethanol and the hydrobromide salt of 2-amino-4-chloroacetylthiazole, 91 ml of dimethyl sulfoxide and 11.9 g of potassium bromide was heated to 30°C and 8.9 ml of dimethyl disulfide was added . The resulting reaction mixture was stirred at 30-35°C for 2 hours and then poured into 300 ml of ice water.
Blandingens pH ble deretter justert til 5,5 med natriumhydrogenkarbonat. Det avleirede faststoff ble frafiltrert og løst i 80 ml 1N saltsyre, og små mengder uløst materiale fjernet fra løsningen ved filtrering, hvorpå filtratet ble justert til pH 5,5 med natriumhydrogenkarbonat. De avleirede krystaller ble frafiltrert, vasket med vann og tørket, hvor- The pH of the mixture was then adjusted to 5.5 with sodium bicarbonate. The deposited solid was filtered off and dissolved in 80 ml of 1N hydrochloric acid, and small amounts of undissolved material removed from the solution by filtration, after which the filtrate was adjusted to pH 5.5 with sodium bicarbonate. The precipitated crystals were filtered off, washed with water and dried, where-
ved 11,7 g (61,4% utbytte) av 2-(2-aminotiazol-4-yl)tio-glyoksy1-S-syre-metylester med et smeltepunkt på 130°C (dekomp.), ble oppnådd. at 11.7 g (61.4% yield) of 2-(2-aminothiazol-4-yl)thio-glyoxy-1-S-acid methyl ester with a melting point of 130°C (decomp.), was obtained.
IR (KBr) cm~1:V'c = 0 1675, 1650 IR (KBr) cm~1:V'c = 0 1675, 1650
NMR (d b-DMSO) 6-verdier: NMR (d b -DMSO) 6 values:
Eksempel 3 Example 3
En blanding av 40,8 g eddiksyreanhydrid og 18,4 g maursyre ble omrørt ved 40-45°C i 1 time. Den resulterende blanding ble tilsatt 20,2 g 2-(2-aminotiazol-4-y1)tioglyoksyl-S-syre-metylester under vannkjøling, hvorpå den resulterende blanding ble omrørt ved 25°C i 1 time. Reaksjonsblandingen ble deretter dråpevis tilsatt 160 ml vann under kjøling med is, hvoretter blandingen ble omrørt under vannkjøling i 30 minutter og de avleirede krystaller frafiltrert. Krystallene ble vasket suksessivt med vann og aceton og deretter tørket, hvorved det ble oppnådd 21,9 g (94,4% utbytte) av 2-(2-formylaminotiazol-4-yl)tioglyoksyl-S-syre-metylester med et smeltepunkt på over 2 3 0°C. A mixture of 40.8 g of acetic anhydride and 18.4 g of formic acid was stirred at 40-45°C for 1 hour. To the resulting mixture was added 20.2 g of 2-(2-aminothiazol-4-yl)thioglyoxyl-S-acid methyl ester under water cooling, whereupon the resulting mixture was stirred at 25°C for 1 hour. The reaction mixture was then added dropwise to 160 ml of water under cooling with ice, after which the mixture was stirred under water cooling for 30 minutes and the precipitated crystals were filtered off. The crystals were washed successively with water and acetone and then dried, whereby 21.9 g (94.4% yield) of 2-(2-formylaminothiazol-4-yl)thioglyoxyl-S-acid methyl ester with a melting point of above 230°C.
IR (KBr) cm"1:VC=0 1960, 1970, 16<50>IR (KBr) cm"1:VC=0 1960, 1970, 16<50>
Eksempel 4 Example 4
I 50 ml vann ble det suspendert 7,8 g av 1:1 solvat av etanol og hydrobromidsalt av 2-amino-4-kloracetyltiazol, og til suspensjonen ble det under omrøring ved 20°C porsjonsvis tilsatt 2,3 g natriumhydrogenkarbonat i løpet av 15 minutter. De avleirede krystaller ble frafiltrert, vasket med 10 ml 7.8 g of a 1:1 solvate of ethanol and hydrobromide salt of 2-amino-4-chloroacetylthiazole were suspended in 50 ml of water, and 2.3 g of sodium hydrogencarbonate were added portionwise to the suspension while stirring at 20°C during 15 minutes. The precipitated crystals were filtered off, washed with 10 ml
vann og deretter tørket, hvorved 4,5 g (98,8% utbytte) 2-amino-4-kloracetyltiazol med et smeltepunkt på 147°C (dekomp.), ble oppnådd. water and then dried, whereby 4.5 g (98.8% yield) of 2-amino-4-chloroacetylthiazole with a melting point of 147°C (decomp.) was obtained.
IR (KBr) cm"<1>: VQ=0 1675, 1600 IR (KBr) cm"<1>: VQ=0 1675, 1600
NMR (d.-DMSO) 6-verdier: NMR (d.-DMSO) 6 values:
Claims (8)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57103109A JPS58222076A (en) | 1982-06-17 | 1982-06-17 | 2-aminothiazole derivative |
JP57103108A JPS58222048A (en) | 1982-06-17 | 1982-06-17 | 1,4-dihalogenobutane-2,3-dione |
JP58078201A JPS59204179A (en) | 1983-05-06 | 1983-05-06 | Method for producing 2-(2-aminothiazol-4-yl)glyoxylic acid derivative or salt thereof |
NO832178A NO161114C (en) | 1982-06-17 | 1983-06-16 | PROCEDURE TE FOR PREPARING GLYOXYLIC ACID DRIVE |
Publications (3)
Publication Number | Publication Date |
---|---|
NO854279L NO854279L (en) | 1983-12-19 |
NO163366B true NO163366B (en) | 1990-02-05 |
NO163366C NO163366C (en) | 1990-05-16 |
Family
ID=40756238
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NO85854280A NO163616C (en) | 1982-06-17 | 1985-10-25 | NEW 1,4-DIHALOGENBUTAN-2,3-DION. |
NO85854279A NO163366C (en) | 1982-06-17 | 1985-10-25 | NEW 2-AMINOTIAZOLD DERIVATIVES AND PROCEDURES FOR PREPARING THEREOF. |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NO85854280A NO163616C (en) | 1982-06-17 | 1985-10-25 | NEW 1,4-DIHALOGENBUTAN-2,3-DION. |
Country Status (1)
Country | Link |
---|---|
NO (2) | NO163616C (en) |
-
1985
- 1985-10-25 NO NO85854280A patent/NO163616C/en unknown
- 1985-10-25 NO NO85854279A patent/NO163366C/en unknown
Also Published As
Publication number | Publication date |
---|---|
NO163366C (en) | 1990-05-16 |
NO854280L (en) | 1983-12-19 |
NO854279L (en) | 1983-12-19 |
NO163616C (en) | 1990-06-27 |
NO163616B (en) | 1990-03-19 |
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