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NL8304031A - Werkwijze volgens het volgens een patroon opbrengen van materiaal op een substraat. - Google Patents

Werkwijze volgens het volgens een patroon opbrengen van materiaal op een substraat. Download PDF

Info

Publication number
NL8304031A
NL8304031A NL8304031A NL8304031A NL8304031A NL 8304031 A NL8304031 A NL 8304031A NL 8304031 A NL8304031 A NL 8304031A NL 8304031 A NL8304031 A NL 8304031A NL 8304031 A NL8304031 A NL 8304031A
Authority
NL
Netherlands
Prior art keywords
radiation
lacquer
pattern
conductive layer
electrically conductive
Prior art date
Application number
NL8304031A
Other languages
English (en)
Dutch (nl)
Original Assignee
Western Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co filed Critical Western Electric Co
Publication of NL8304031A publication Critical patent/NL8304031A/nl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G03F7/203—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure comprising an imagewise exposure to electromagnetic radiation or corpuscular radiation

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Diaphragms For Electromechanical Transducers (AREA)
  • Iron Core Of Rotating Electric Machines (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Weting (AREA)
  • Electron Beam Exposure (AREA)
NL8304031A 1982-11-24 1983-11-23 Werkwijze volgens het volgens een patroon opbrengen van materiaal op een substraat. NL8304031A (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US44423882A 1982-11-24 1982-11-24
US44423882 1982-11-24

Publications (1)

Publication Number Publication Date
NL8304031A true NL8304031A (nl) 1984-06-18

Family

ID=23764056

Family Applications (1)

Application Number Title Priority Date Filing Date
NL8304031A NL8304031A (nl) 1982-11-24 1983-11-23 Werkwijze volgens het volgens een patroon opbrengen van materiaal op een substraat.

Country Status (6)

Country Link
JP (1) JPS59105323A (it)
DE (1) DE3342319A1 (it)
FR (1) FR2536549A1 (it)
GB (1) GB2132789A (it)
IT (1) IT1167665B (it)
NL (1) NL8304031A (it)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4028647C2 (de) * 1989-09-09 1997-02-06 Fraunhofer Ges Forschung Verfahren zum Kopieren von Lochmasken
US7348104B2 (en) * 2002-10-03 2008-03-25 Massachusetts Institute Of Technology System and method for fabrication and replication of diffractive optical elements for maskless lithography

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1057105A (en) * 1964-01-23 1967-02-01 Associated Semiconductor Mft An optical mask
US3539408A (en) * 1967-08-11 1970-11-10 Western Electric Co Methods of etching chromium patterns and photolithographic masks so produced
CH552470A (de) * 1967-08-30 1974-08-15 Pigur Karl August Verfahren zur herstellung einer farbigen reproduktionsmaske.
GB1325442A (en) * 1970-08-21 1973-08-01 Sun Printers Ltd Photomechanical processes
GB1530978A (en) * 1976-05-10 1978-11-01 Rca Corp Method for removing material from a substrate
DE2721687C2 (de) * 1977-05-13 1986-11-20 Hoechst Ag, 6230 Frankfurt Verfahren zum Abdecken von Kopiervorlagen mit Masken
JPS5858546A (ja) * 1981-10-02 1983-04-07 Kimoto & Co Ltd 製版用感光性マスク材料

Also Published As

Publication number Publication date
IT8323849A0 (it) 1983-11-23
FR2536549A1 (fr) 1984-05-25
IT8323849A1 (it) 1985-05-23
GB8330864D0 (en) 1983-12-29
JPS59105323A (ja) 1984-06-18
GB2132789A (en) 1984-07-11
IT1167665B (it) 1987-05-13
DE3342319A1 (de) 1984-05-24

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Legal Events

Date Code Title Description
A85 Still pending on 85-01-01
BV The patent application has lapsed