NL7015303A - - Google Patents
Info
- Publication number
- NL7015303A NL7015303A NL7015303A NL7015303A NL7015303A NL 7015303 A NL7015303 A NL 7015303A NL 7015303 A NL7015303 A NL 7015303A NL 7015303 A NL7015303 A NL 7015303A NL 7015303 A NL7015303 A NL 7015303A
- Authority
- NL
- Netherlands
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/20—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by affixing prefabricated conductor pattern
- H05K3/205—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by affixing prefabricated conductor pattern using a pattern electroplated or electroformed on a metallic carrier
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/08—Perforated or foraminous objects, e.g. sieves
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/08—Electroplating with moving electrolyte e.g. jet electroplating
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0393—Flexible materials
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/01—Tools for processing; Objects used during processing
- H05K2203/0104—Tools for processing; Objects used during processing for patterning or coating
- H05K2203/0117—Pattern shaped electrode used for patterning, e.g. plating or etching
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0703—Plating
- H05K2203/0726—Electroforming, i.e. electroplating on a metallic carrier thereby forming a self-supporting structure
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/386—Improvement of the adhesion between the insulating substrate and the metal by the use of an organic polymeric bonding layer, e.g. adhesive
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S204/00—Chemistry: electrical and wave energy
- Y10S204/07—Current distribution within the bath
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Electroplating Methods And Accessories (AREA)
- Laminated Bodies (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US86839069A | 1969-10-22 | 1969-10-22 | |
US00193528A US3809642A (en) | 1969-10-22 | 1971-10-28 | Electroforming apparatus including an anode housing with a perforate area for directing ion flow towards the cathode |
Publications (1)
Publication Number | Publication Date |
---|---|
NL7015303A true NL7015303A (fr) | 1971-04-26 |
Family
ID=26889098
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL7015303A NL7015303A (fr) | 1969-10-22 | 1970-10-19 |
Country Status (6)
Country | Link |
---|---|
US (1) | US3809642A (fr) |
BE (1) | BE757781A (fr) |
DE (1) | DE2051578A1 (fr) |
FR (1) | FR2065467B1 (fr) |
GB (1) | GB1322560A (fr) |
NL (1) | NL7015303A (fr) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3963588A (en) * | 1975-04-21 | 1976-06-15 | United States Steel Corporation | Coalescent-jet apparatus and method for high current density preferential electroplating |
US4183799A (en) * | 1978-08-31 | 1980-01-15 | Production Machinery Corporation | Apparatus for plating a layer onto a metal strip |
US4304641A (en) * | 1980-11-24 | 1981-12-08 | International Business Machines Corporation | Rotary electroplating cell with controlled current distribution |
US4359375A (en) * | 1981-12-09 | 1982-11-16 | Rca Corporation | Anode assembly for electroforming record matrixes |
US4478769A (en) * | 1982-09-30 | 1984-10-23 | Amerace Corporation | Method for forming an embossing tool with an optically precise pattern |
US4534832A (en) * | 1984-08-27 | 1985-08-13 | Emtek, Inc. | Arrangement and method for current density control in electroplating |
US4678545A (en) * | 1986-06-12 | 1987-07-07 | Galik George M | Printed circuit board fine line plating |
US4933049A (en) * | 1989-04-03 | 1990-06-12 | Unisys Corporation | Cradle for supporting printed circuit board between plating manifolds |
US5281325A (en) * | 1992-07-02 | 1994-01-25 | Berg N Edward | Uniform electroplating of printed circuit boards |
US6001235A (en) * | 1997-06-23 | 1999-12-14 | International Business Machines Corporation | Rotary plater with radially distributed plating solution |
US6103096A (en) * | 1997-11-12 | 2000-08-15 | International Business Machines Corporation | Apparatus and method for the electrochemical etching of a wafer |
US6106687A (en) * | 1998-04-28 | 2000-08-22 | International Business Machines Corporation | Process and diffusion baffle to modulate the cross sectional distribution of flow rate and deposition rate |
US6251251B1 (en) | 1998-11-16 | 2001-06-26 | International Business Machines Corporation | Anode design for semiconductor deposition |
US6113759A (en) * | 1998-12-18 | 2000-09-05 | International Business Machines Corporation | Anode design for semiconductor deposition having novel electrical contact assembly |
US6261426B1 (en) | 1999-01-22 | 2001-07-17 | International Business Machines Corporation | Method and apparatus for enhancing the uniformity of electrodeposition or electroetching |
DE10247051A1 (de) * | 2002-10-09 | 2004-04-22 | Polymer Latex Gmbh & Co Kg | Latex und Verfahren zu seiner Herstellung |
US7100954B2 (en) * | 2003-07-11 | 2006-09-05 | Nexx Systems, Inc. | Ultra-thin wafer handling system |
WO2005092043A2 (fr) * | 2004-03-22 | 2005-10-06 | Epic Research Company, Inc. | Procede de fabrication de cartes de circuit imprime |
US9157160B2 (en) | 2013-08-22 | 2015-10-13 | Ashworth Bros., Inc. | System and method for electropolishing or electroplating conveyor belts |
-
0
- BE BE757781D patent/BE757781A/fr unknown
-
1970
- 1970-10-19 NL NL7015303A patent/NL7015303A/xx not_active Application Discontinuation
- 1970-10-20 GB GB4964670A patent/GB1322560A/en not_active Expired
- 1970-10-21 DE DE19702051578 patent/DE2051578A1/de active Pending
- 1970-10-21 FR FR7038052A patent/FR2065467B1/fr not_active Expired
-
1971
- 1971-10-28 US US00193528A patent/US3809642A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
DE2051578A1 (de) | 1971-05-06 |
FR2065467B1 (fr) | 1974-10-11 |
GB1322560A (en) | 1973-07-04 |
BE757781A (fr) | 1971-04-01 |
FR2065467A1 (fr) | 1971-07-30 |
US3809642A (en) | 1974-05-07 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
BV | The patent application has lapsed |