NL6809093A - - Google Patents

Info

Publication number: NL6809093A
Authority: NL; Netherlands

Application number

NL6809093A

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1967-07-07

Filing date

1968-06-27

Publication date

1969-01-09

1968-06-27 Application filed filed Critical

1969-01-09 Publication of NL6809093A publication Critical patent/NL6809093A/xx

Classifications

- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C247/00—Compounds containing azido groups
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/695—Compositions containing azides as the photosensitive substances
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides

Landscapes

Chemical & Material Sciences (AREA)
Organic Chemistry (AREA)
Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Engineering & Computer Science (AREA)
Materials Engineering (AREA)
Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Photosensitive Polymer And Photoresist Processing (AREA)
Printing Plates And Materials Therefor (AREA)

NL6809093A 1967-07-07 1968-06-27 NL6809093A (xx)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
DE1967K0062758 DE1597614B2 (de)	1967-07-07	1967-07-07	Lichtempfindliche kopiermasse

Publications (1)

Publication Number	Publication Date
NL6809093A true NL6809093A (xx)	1969-01-09

Family

ID=7230771

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
NL6809093A NL6809093A (xx)	1967-07-07	1968-06-27

Country Status (8)

Country	Link
US (1)	US3595656A (xx)
AT (1)	AT283390B (xx)
BE (1)	BE717610A (xx)
DE (1)	DE1597614B2 (xx)
ES (1)	ES355837A1 (xx)
FR (1)	FR1573500A (xx)
GB (1)	GB1223570A (xx)
NL (1)	NL6809093A (xx)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS4833905A (xx) *	1971-09-02	1973-05-15
JPS5140452B2 (xx) *	1973-07-23	1976-11-04
AU476446B2 (en) *	1974-04-18	1976-09-23	Japan Synthetic Rubber Co., Ltd	Photosensitive composition
JPS5934293B2 (ja) *	1977-04-20	1984-08-21	王子製紙株式会社	感光性組成物
IT1138814B (it) *	1980-07-03	1986-09-17	Rca Corp	Metodo per la formazione di disegni superficiali in rilievo con ultravioletto lontano e composizione protettiva fotoosensibile per questo metodo
GB2092164B (en) *	1980-12-17	1984-12-05	Hitachi Ltd	Loght or radiation-sensitive polymer composition
JPS5872139A (ja) *	1981-10-26	1983-04-30	Tokyo Ohka Kogyo Co Ltd	感光性材料
DE3415033C2 (de) *	1983-04-20	1986-04-03	Hitachi Chemical Co., Ltd.	4'-Azidobenzal-2-methoxyacetophenon, Verfahren zu seiner Herstellung und dieses enthaltende photoempfindliche Masse
DE3417607A1 (de) *	1983-05-12	1984-11-15	Hitachi Chemical Co., Ltd.	Verfahren zur herstellung feiner muster
JPS59222833A (ja) *	1983-06-01	1984-12-14	Hitachi Chem Co Ltd	感光性組成物
JPS6042425A (ja) *	1983-08-17	1985-03-06	Toray Ind Inc	化学線感応性重合体組成物
US4711836A (en) *	1984-09-10	1987-12-08	Olin Hunt Specialty Products, Inc.	Development of positive-working photoresist compositions
JPS61166542A (ja) *	1985-01-18	1986-07-28	Hitachi Chem Co Ltd	感光性組成物
JPS62102241A (ja) *	1985-10-30	1987-05-12	Tokyo Ohka Kogyo Co Ltd	感光性組成物
JPH03155554A (ja) *	1989-11-14	1991-07-03	Japan Synthetic Rubber Co Ltd	放射線感応性樹脂組成物
US7173129B2 (en) *	2003-06-06	2007-02-06	Athero Genics, Inc.	Sulfonamide-substituted chalcone derivatives and their use to treat diseases

1967
- 1967-07-07 DE DE1967K0062758 patent/DE1597614B2/de active Granted
1968
- 1968-06-27 NL NL6809093A patent/NL6809093A/xx unknown
- 1968-07-03 US US742141A patent/US3595656A/en not_active Expired - Lifetime
- 1968-07-04 BE BE717610D patent/BE717610A/xx unknown
- 1968-07-04 AT AT641768A patent/AT283390B/de not_active IP Right Cessation
- 1968-07-05 GB GB32270/68A patent/GB1223570A/en not_active Expired
- 1968-07-06 ES ES355837A patent/ES355837A1/es not_active Expired
- 1968-07-08 FR FR1573500D patent/FR1573500A/fr not_active Expired

Also Published As

Publication number	Publication date
AT283390B (de)	1970-08-10
GB1223570A (en)	1971-02-24
DE1597614A1 (de)	1970-05-06
ES355837A1 (es)	1969-12-16
FR1573500A (xx)	1969-07-04
DE1597614B2 (de)	1977-06-23
BE717610A (xx)	1969-01-06
US3595656A (en)	1971-07-27

Publication	Publication Date	Title
AU425114B2 (xx)	1972-06-14
FR1573500A (xx)	1969-07-04
AU342066A (xx)	1968-09-19
AU2454867A (xx)	1969-01-16
AU3189468A (xx)	1969-07-10
AU610966A (xx)	1968-11-28
BE692409A (xx)	1967-06-16
BE692199A (xx)	1967-06-16
BE709583A (xx)	1968-05-30
BE709497A (xx)	1968-05-30
BE702036A (xx)	1968-01-02
BE699502A (xx)	1967-11-16
BE696790A (xx)	1967-09-18
BE695620A (xx)	1967-09-01
BE692780A (xx)	1967-07-03
BE692779A (xx)	1967-07-03
BE692778A (xx)	1967-07-03
BE692577A (xx)	1967-06-16
BE692552A (xx)	1967-07-13
BE692493A (xx)	1967-06-16
BE692492A (xx)	1967-06-16
BE692654A (xx)	1967-07-17
BE692375A (xx)	1967-06-16
BE692374A (xx)	1967-06-16
BE692332A (xx)	1967-06-16