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NL294370A - - Google Patents

Info

Publication number
NL294370A
NL294370A NL294370DA NL294370A NL 294370 A NL294370 A NL 294370A NL 294370D A NL294370D A NL 294370DA NL 294370 A NL294370 A NL 294370A
Authority
NL
Netherlands
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication of NL294370A publication Critical patent/NL294370A/xx

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/67—Thin-film transistors [TFT]
    • H10D30/674—Thin-film transistors [TFT] characterised by the active materials
    • H10D30/6755—Oxide semiconductors, e.g. zinc oxide, copper aluminium oxide or cadmium stannate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D99/00—Subject matter not provided for in other groups of this subclass
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/106—Masks, special
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/162—Testing steps
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/942—Masking
    • Y10S438/948—Radiation resist
    • Y10S438/949—Energy beam treating radiation resist on semiconductor

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Thin Film Transistor (AREA)
NL294370D 1963-06-20 NL294370A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL294370 1963-06-20

Publications (1)

Publication Number Publication Date
NL294370A true NL294370A (ja)

Family

ID=19754801

Family Applications (1)

Application Number Title Priority Date Filing Date
NL294370D NL294370A (ja) 1963-06-20

Country Status (4)

Country Link
US (1) US3442647A (ja)
DE (1) DE1489162C3 (ja)
GB (1) GB1071576A (ja)
NL (1) NL294370A (ja)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE760223C (de) * 1940-08-14 1953-06-15 Siemens & Halske A G Elektronenmikroskop, dessen Vakuum mit einer elektrisch beheizten Diffusionspumpe aufrechterhalten wird
AT301620B (de) * 1967-10-23 1972-08-15 Siemens Ag Verfahren zum herstellen einer photolackmaske fuer halbleiterzwecke
NL154061B (nl) * 1967-11-04 1977-07-15 Philips Nv Werkwijze voor het vervaardigen van een halfgeleiderinrichting en halfgeleiderinrichting vervaardigd met behulp van de werkwijze.
US3522649A (en) * 1969-04-25 1970-08-04 Werk Fur Bauelemente Der Nachr Method of producing isolated field effect transistors employing pyrolytic graphite
US3619732A (en) * 1969-05-16 1971-11-09 Energy Conversion Devices Inc Coplanar semiconductor switch structure
EP0071244B1 (en) * 1981-07-27 1988-11-23 Kabushiki Kaisha Toshiba Thin-film transistor and method of manufacture therefor
US4404731A (en) * 1981-10-01 1983-09-20 Xerox Corporation Method of forming a thin film transistor
US4678542A (en) * 1986-07-25 1987-07-07 Energy Conversion Devices, Inc. Self-alignment process for thin film diode array fabrication
GB8721193D0 (en) * 1987-09-09 1987-10-14 Wright S W Semiconductor devices
EP0797558B1 (de) * 1994-01-05 2001-11-14 Heraeus Electro-Nite International N.V. Elektrisch leitende verbindung
US7427776B2 (en) * 2004-10-07 2008-09-23 Hewlett-Packard Development Company, L.P. Thin-film transistor and methods
JP5506213B2 (ja) * 2009-03-06 2014-05-28 キヤノン株式会社 半導体素子の形成方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1967057A (en) * 1932-10-25 1934-07-17 Irvine Andrew Art of printing sensitized surfaces
US2914404A (en) * 1953-07-31 1959-11-24 Blaupunkt Werke Gmbh Method of producing two-dimensional circuits or circuit elements on supporting bases
NL241641A (ja) * 1958-07-25
NL241541A (ja) * 1959-07-22
US2981877A (en) * 1959-07-30 1961-04-25 Fairchild Semiconductor Semiconductor device-and-lead structure
NL255517A (ja) * 1959-09-04
US3222173A (en) * 1961-05-15 1965-12-07 Vitramon Inc Method of making an electrical unit
US3313626A (en) * 1962-08-01 1967-04-11 Russeli H Whitney Process of making a lithographic printing plate

Also Published As

Publication number Publication date
GB1071576A (en) 1967-06-07
DE1489162A1 (de) 1969-06-12
DE1489162B2 (de) 1975-01-23
US3442647A (en) 1969-05-06
DE1489162C3 (de) 1975-08-28

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