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NL271850A - - Google Patents

Info

Publication number
NL271850A
NL271850A NL271850DA NL271850A NL 271850 A NL271850 A NL 271850A NL 271850D A NL271850D A NL 271850DA NL 271850 A NL271850 A NL 271850A
Authority
NL
Netherlands
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication of NL271850A publication Critical patent/NL271850A/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F3/00—Brightening metals by chemical means
    • C23F3/04—Heavy metals
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C23F1/32—Alkaline compositions
    • C23F1/40—Alkaline compositions for etching other metallic material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Weting (AREA)
NL271850D 1961-02-03 NL271850A (cs)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DES72354A DE1199098B (de) 1961-02-03 1961-02-03 Verfahren zum AEtzen von im wesentlichen einkristallinen Halbleiterkoerpern

Publications (1)

Publication Number Publication Date
NL271850A true NL271850A (cs)

Family

ID=7503134

Family Applications (1)

Application Number Title Priority Date Filing Date
NL271850D NL271850A (cs) 1961-02-03

Country Status (5)

Country Link
US (1) US3266961A (cs)
BE (1) BE613425A (cs)
CH (1) CH401633A (cs)
DE (1) DE1199098B (cs)
NL (1) NL271850A (cs)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1079430A (en) * 1965-05-06 1967-08-16 Maxbo Ab A method and apparatus for heat sealing or cutting thermoplastic material
US3977071A (en) * 1969-09-29 1976-08-31 Texas Instruments Incorporated High depth-to-width ratio etching process for monocrystalline germanium semiconductor materials
DE2214197C3 (de) * 1972-03-23 1982-01-14 Siemens AG, 1000 Berlin und 8000 München Verfahren zum Ätzen von PN-Übergänge enthaltenden Halbleiterscheiben
JPS583374B2 (ja) * 1977-06-15 1983-01-21 超エル・エス・アイ技術研究組合 シリコン単結晶の処理方法
JPS54110783A (en) * 1978-02-20 1979-08-30 Hitachi Ltd Semiconductor substrate and its manufacture
US4918030A (en) * 1989-03-31 1990-04-17 Electric Power Research Institute Method of forming light-trapping surface for photovoltaic cell and resulting structure
US5564409A (en) * 1995-06-06 1996-10-15 Corning Incorporated Apparatus and method for wire cutting glass-ceramic wafers
US5913980A (en) * 1996-04-10 1999-06-22 Ebara Solar, Inc. Method for removing complex oxide film growth on silicon crystal

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE471989A (cs) * 1941-07-16
US2809103A (en) * 1953-11-10 1957-10-08 Sylvania Electric Prod Fabrication of semiconductor elements
GB894255A (en) * 1957-05-02 1962-04-18 Sarkes Tarzian Semiconductor devices and method of manufacturing them
US3041226A (en) * 1958-04-02 1962-06-26 Hughes Aircraft Co Method of preparing semiconductor crystals

Also Published As

Publication number Publication date
DE1199098B (de) 1965-08-19
BE613425A (fr) 1962-08-02
US3266961A (en) 1966-08-16
CH401633A (de) 1965-10-31

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