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NL2023879A - Apparatus for and method of controlling introduction of euv target material into an euv chamber - Google Patents

Apparatus for and method of controlling introduction of euv target material into an euv chamber Download PDF

Info

Publication number
NL2023879A
NL2023879A NL2023879A NL2023879A NL2023879A NL 2023879 A NL2023879 A NL 2023879A NL 2023879 A NL2023879 A NL 2023879A NL 2023879 A NL2023879 A NL 2023879A NL 2023879 A NL2023879 A NL 2023879A
Authority
NL
Netherlands
Prior art keywords
euv
target material
chamber
controlling introduction
introduction
Prior art date
Application number
NL2023879A
Other languages
Dutch (nl)
Inventor
Wilhelmus Driessen Theodorus
Uwe Herbert Trees Dietmar
Romeo Estomih Mushi Simon
Andrew Sams Benjamin
Medina Oseguera Alfonso
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of NL2023879A publication Critical patent/NL2023879A/en

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/003—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state
    • H05G2/005—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state containing a metal as principal radiation generating component
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/003—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state
    • H05G2/006—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state details of the ejection system, e.g. constructional details of the nozzle

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)

Abstract

Apparatus for and method of controlling introduction of EUV target material into an EUV chamber in which the EUV target material is selectively prevented from entering the EUV chamber when the EUV target material is not needed for the formation of a plasma in the EUV chamber such as during periods when a dispenser of the EUV material is initially started or is being tuned.

Claims (1)

1. Een inrichting ingericht voor het belichten van een substraat.1. A device arranged for exposing a substrate.
NL2023879A 2018-09-26 2019-09-23 Apparatus for and method of controlling introduction of euv target material into an euv chamber NL2023879A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201862736651P 2018-09-26 2018-09-26
US201962901340P 2019-09-17 2019-09-17

Publications (1)

Publication Number Publication Date
NL2023879A true NL2023879A (en) 2020-05-01

Family

ID=68172277

Family Applications (1)

Application Number Title Priority Date Filing Date
NL2023879A NL2023879A (en) 2018-09-26 2019-09-23 Apparatus for and method of controlling introduction of euv target material into an euv chamber

Country Status (5)

Country Link
EP (1) EP3858114A1 (en)
KR (1) KR102759799B1 (en)
CN (1) CN112772000A (en)
NL (1) NL2023879A (en)
WO (1) WO2020069001A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023126105A1 (en) * 2021-12-29 2023-07-06 Asml Netherlands B.V. Debris mitigation in an extreme ultraviolet light source

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7405416B2 (en) 2005-02-25 2008-07-29 Cymer, Inc. Method and apparatus for EUV plasma source target delivery
US7372056B2 (en) 2005-06-29 2008-05-13 Cymer, Inc. LPP EUV plasma source material target delivery system
CN100391316C (en) * 2003-03-18 2008-05-28 皇家飞利浦电子股份有限公司 Device for and method of generating extreme ultraviolet and/or soft X-ray radiation by means of a plasma
DE102004037521B4 (en) * 2004-07-30 2011-02-10 Xtreme Technologies Gmbh Device for providing target material for generating short-wave electromagnetic radiation
JP5156192B2 (en) * 2006-01-24 2013-03-06 ギガフォトン株式会社 Extreme ultraviolet light source device
US8513629B2 (en) 2011-05-13 2013-08-20 Cymer, Llc Droplet generator with actuator induced nozzle cleaning
JP5001055B2 (en) * 2007-04-20 2012-08-15 株式会社小松製作所 Extreme ultraviolet light source device
US7872245B2 (en) * 2008-03-17 2011-01-18 Cymer, Inc. Systems and methods for target material delivery in a laser produced plasma EUV light source
DE102009020776B4 (en) * 2009-05-08 2011-07-28 XTREME technologies GmbH, 37077 Arrangement for the continuous production of liquid tin as emitter material in EUV radiation sources
EP2443517B1 (en) * 2009-08-27 2013-01-16 ASML Netherlands B.V. Spectral purity filter and method for manufacturing a spectral purity filter
CN102782582A (en) * 2010-03-12 2012-11-14 Asml荷兰有限公司 Radiation source, lithographic apparatus and device manufacturing method
CN102210997B (en) * 2010-04-08 2013-05-08 内蒙古科技大学 Single-particle high-speed drop generator
US8263953B2 (en) * 2010-04-09 2012-09-11 Cymer, Inc. Systems and methods for target material delivery protection in a laser produced plasma EUV light source
CN103217869B (en) * 2013-03-28 2015-04-15 华中科技大学 Liquid tin target generator for laser plasma extreme ultraviolet light source
CN103217870B (en) * 2013-04-19 2014-08-13 中国科学院上海光学精密机械研究所 Droplet target control system guided by laser beam
CN103286031B (en) * 2013-05-16 2015-07-22 中国科学院光电研究院 High-frequency and high-speed micron-sized droplet generating device
JP6283684B2 (en) * 2013-11-07 2018-02-21 ギガフォトン株式会社 Extreme ultraviolet light generator and control method of extreme ultraviolet light generator
US9338870B2 (en) * 2013-12-30 2016-05-10 Asml Netherlands B.V. Extreme ultraviolet light source
US9232623B2 (en) * 2014-01-22 2016-01-05 Asml Netherlands B.V. Extreme ultraviolet light source
US10481498B2 (en) * 2015-12-17 2019-11-19 Asml Netherlands B.V. Droplet generator for lithographic apparatus, EUV source and lithographic apparatus

Also Published As

Publication number Publication date
EP3858114A1 (en) 2021-08-04
CN112772000A (en) 2021-05-07
KR20210063349A (en) 2021-06-01
WO2020069001A1 (en) 2020-04-02
KR102759799B1 (en) 2025-01-23

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