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NL2003118A1 - Alignment system, lithographic system and method. - Google Patents

Alignment system, lithographic system and method. Download PDF

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Publication number
NL2003118A1
NL2003118A1 NL2003118A NL2003118A NL2003118A1 NL 2003118 A1 NL2003118 A1 NL 2003118A1 NL 2003118 A NL2003118 A NL 2003118A NL 2003118 A NL2003118 A NL 2003118A NL 2003118 A1 NL2003118 A1 NL 2003118A1
Authority
NL
Netherlands
Prior art keywords
lithographic
alignment
alignment system
lithographic system
Prior art date
Application number
NL2003118A
Other languages
English (en)
Inventor
Everhardus Mos
Henricus Megens
Maurits Van Der Schaar
Hubertus Simons
Scott Middlebrooks
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of NL2003118A1 publication Critical patent/NL2003118A1/nl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/705—Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
NL2003118A 2008-07-14 2009-07-03 Alignment system, lithographic system and method. NL2003118A1 (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US8038308P 2008-07-14 2008-07-14

Publications (1)

Publication Number Publication Date
NL2003118A1 true NL2003118A1 (nl) 2010-01-18

Family

ID=41401575

Family Applications (1)

Application Number Title Priority Date Filing Date
NL2003118A NL2003118A1 (nl) 2008-07-14 2009-07-03 Alignment system, lithographic system and method.

Country Status (3)

Country Link
US (1) US8706442B2 (nl)
NL (1) NL2003118A1 (nl)
WO (1) WO2010006935A2 (nl)

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US11175593B2 (en) 2018-04-26 2021-11-16 Asml Netherlands B.V. Alignment sensor apparatus for process sensitivity compensation
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CN114450638B (zh) 2019-09-27 2024-07-30 Asml控股股份有限公司 量测系统和相控阵列照射源
CN114902142A (zh) 2019-12-30 2022-08-12 Asml荷兰有限公司 光刻设备、量测系统、照射源及其方法
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KR20230011408A (ko) 2020-06-18 2023-01-20 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치, 계측 시스템, 및 그의 방법
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KR20230054384A (ko) 2020-08-26 2023-04-24 에이에스엠엘 홀딩 엔.브이. 리소그래피 장치, 계측 시스템, 및 오차 정정을 위한 세기 불균형 측정
US20230400782A1 (en) 2020-11-04 2023-12-14 Asml Holding N.V. Polarization selection metrology system, lithographic apparatus, and methods thereof
WO2022112064A1 (en) 2020-11-24 2022-06-02 Asml Holding N.V. Multiple objectives metrology system, lithographic apparatus, and methods thereof
WO2022122560A1 (en) 2020-12-08 2022-06-16 Asml Netherlands B.V. Metrology system and coherence adjusters
US20240094641A1 (en) 2020-12-10 2024-03-21 Asml Holding N.V. Intensity order difference based metrology system, lithographic apparatus, and methods thereof
US20240036485A1 (en) 2020-12-23 2024-02-01 ASML Netheriands B. V. Lithographic apparatus, metrology systems, and methods thereof
JP2024503585A (ja) 2021-01-19 2024-01-26 エーエスエムエル ホールディング エヌ．ブイ． リソグラフィアライメント装置における強度を測定するためのシステム及び方法
EP4060409A1 (en) * 2021-03-16 2022-09-21 ASML Netherlands B.V. Novel interface definition for lithographic apparatus
EP4298481A1 (en) * 2021-02-25 2024-01-03 ASML Netherlands B.V. Novel interface definition for lithographic apparatus
US20240152059A1 (en) * 2021-04-08 2024-05-09 Asml Netherlands B.V. A method for modeling measurement data over a substrate area and associated apparatuses
EP4071554A1 (en) * 2021-04-08 2022-10-12 ASML Netherlands B.V. A method for modeling measurement data over a substrate area and associated apparatuses
WO2022258275A1 (en) 2021-06-07 2022-12-15 Asml Netherlands B.V. Integrated optical alignment sensors
KR20240018488A (ko) 2021-06-08 2024-02-13 에이에스엠엘 홀딩 엔.브이. 계측 시스템, 시간적 및 공간적 가간섭성 스크램블러 및 그 방법
CN117581161A (zh) 2021-07-13 2024-02-20 Asml控股股份有限公司 具有用于污染物检测和显微镜检查的相控阵列的量测系统
CN117836722A (zh) 2021-08-20 2024-04-05 Asml荷兰有限公司 用于不均匀表面的补偿光学系统、量测系统、光刻设备及其方法
EP4338009A1 (en) * 2021-10-21 2024-03-20 KLA Corporation Induced displacements for improved overlay error metrology
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WO2023126173A1 (en) 2021-12-28 2023-07-06 Asml Netherlands B.V. An optical system implemented in a system for fast optical inspection of targets
JP2025506442A (ja) 2022-02-07 2025-03-11 エーエスエムエル ネザーランズ ビー．ブイ． 検査装置、モータ駆動アパーチャ、およびバックグラウンドの方法
IL314826A (en) 2022-03-02 2024-10-01 Asml Netherlands Bv Test device, linear beam device and method
WO2023198444A1 (en) 2022-04-15 2023-10-19 Asml Netherlands B.V. Metrology apparatus with configurable printed optical routing for parallel optical detection
KR20250008062A (ko) 2022-05-12 2025-01-14 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치용 가동 스테이지
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WO2024022839A1 (en) 2022-07-25 2024-02-01 Asml Netherlands B.V. Metrology system using multiple radiation spots
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Also Published As

Publication number Publication date
WO2010006935A3 (en) 2010-03-11
WO2010006935A2 (en) 2010-01-21
US8706442B2 (en) 2014-04-22
US20110196646A1 (en) 2011-08-11

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