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NL162214B - PHOTOPOLYMERIZABLE ELEMENT. - Google Patents

PHOTOPOLYMERIZABLE ELEMENT.

Info

Publication number
NL162214B
NL162214B NL7113639A NL7113639A NL162214B NL 162214 B NL162214 B NL 162214B NL 7113639 A NL7113639 A NL 7113639A NL 7113639 A NL7113639 A NL 7113639A NL 162214 B NL162214 B NL 162214B
Authority
NL
Netherlands
Prior art keywords
photopolymerizable element
photopolymerizable
Prior art date
Application number
NL7113639A
Other languages
Dutch (nl)
Other versions
NL7113639A (en
NL162214C (en
Original Assignee
Du Pont
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Du Pont filed Critical Du Pont
Publication of NL7113639A publication Critical patent/NL7113639A/xx
Publication of NL162214B publication Critical patent/NL162214B/en
Application granted granted Critical
Publication of NL162214C publication Critical patent/NL162214C/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/34—Imagewise removal by selective transfer, e.g. peeling away
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
NL7113639A 1970-10-05 1971-10-05 PHOTOPOLYMERISABLE ELEMENT. NL162214C (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US7818170A 1970-10-05 1970-10-05

Publications (3)

Publication Number Publication Date
NL7113639A NL7113639A (en) 1972-04-07
NL162214B true NL162214B (en) 1979-11-15
NL162214C NL162214C (en) 1980-04-15

Family

ID=22142437

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7113639A NL162214C (en) 1970-10-05 1971-10-05 PHOTOPOLYMERISABLE ELEMENT.

Country Status (7)

Country Link
JP (1) JPS545684B1 (en)
BE (1) BE773495A (en)
CA (1) CA973417A (en)
DE (1) DE2149025C3 (en)
FR (1) FR2110962A5 (en)
GB (1) GB1360081A (en)
NL (1) NL162214C (en)

Also Published As

Publication number Publication date
DE2149025A1 (en) 1972-04-06
JPS545684B1 (en) 1979-03-20
CA973417A (en) 1975-08-26
DE2149025C3 (en) 1978-12-14
FR2110962A5 (en) 1972-06-02
NL7113639A (en) 1972-04-07
GB1360081A (en) 1974-07-17
BE773495A (en) 1972-04-05
DE2149025B2 (en) 1973-12-06
NL162214C (en) 1980-04-15

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Legal Events

Date Code Title Description
V1 Lapsed because of non-payment of the annual fee