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NL159815B - Werkwijze voor het vervaardigen van een van een geisoleer- de stuurelektrode voorziene veldeffecttransistor met n-type kanaal. - Google Patents

Werkwijze voor het vervaardigen van een van een geisoleer- de stuurelektrode voorziene veldeffecttransistor met n-type kanaal.

Info

Publication number
NL159815B
NL159815B NL7501529.A NL7501529A NL159815B NL 159815 B NL159815 B NL 159815B NL 7501529 A NL7501529 A NL 7501529A NL 159815 B NL159815 B NL 159815B
Authority
NL
Netherlands
Prior art keywords
procedure
manufacture
field effect
effect transistor
control electrode
Prior art date
Application number
NL7501529.A
Other languages
English (en)
Other versions
NL7501529A (nl
Inventor
Willis George Watrous Jr
Original Assignee
Intel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Intel Corp filed Critical Intel Corp
Publication of NL7501529A publication Critical patent/NL7501529A/nl
Publication of NL159815B publication Critical patent/NL159815B/nl

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/13Semiconductor regions connected to electrodes carrying current to be rectified, amplified or switched, e.g. source or drain regions
    • H10D62/149Source or drain regions of field-effect devices
    • H10D62/151Source or drain regions of field-effect devices of IGFETs 
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/482Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of lead-in layers inseparably applied to the semiconductor body (electrodes)
    • H01L23/485Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of lead-in layers inseparably applied to the semiconductor body (electrodes) consisting of layered constructions comprising conductive layers and insulating layers, e.g. planar contacts
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/01Manufacture or treatment
    • H10D30/021Manufacture or treatment of FETs having insulated gates [IGFET]
    • H10D30/0223Manufacture or treatment of FETs having insulated gates [IGFET] having source and drain regions or source and drain extensions self-aligned to sides of the gate
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D99/00Subject matter not provided for in other groups of this subclass
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/301Electrical effects
    • H01L2924/3011Impedance
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/04Dopants, special
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/06Gettering
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/133Reflow oxides and glasses
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/167Two diffusions in one hole
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00Semiconductor device manufacturing: process
    • Y10S438/978Semiconductor device manufacturing: process forming tapered edges on substrate or adjacent layers
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/53Means to assemble or disassemble
    • Y10T29/53909Means comprising hand manipulatable tool
    • Y10T29/53913Aligner or center

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
NL7501529.A 1974-03-13 1975-02-10 Werkwijze voor het vervaardigen van een van een geisoleer- de stuurelektrode voorziene veldeffecttransistor met n-type kanaal. NL159815B (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/450,773 US3986903A (en) 1974-03-13 1974-03-13 Mosfet transistor and method of fabrication

Publications (2)

Publication Number Publication Date
NL7501529A NL7501529A (nl) 1975-09-16
NL159815B true NL159815B (nl) 1979-03-15

Family

ID=23789430

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7501529.A NL159815B (nl) 1974-03-13 1975-02-10 Werkwijze voor het vervaardigen van een van een geisoleer- de stuurelektrode voorziene veldeffecttransistor met n-type kanaal.

Country Status (7)

Country Link
US (2) US3986903A (nl)
JP (1) JPS50127581A (nl)
CA (1) CA1038967A (nl)
DE (1) DE2509315A1 (nl)
FR (1) FR2264398B1 (nl)
GB (1) GB1496413A (nl)
NL (1) NL159815B (nl)

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JPS5946107B2 (ja) * 1975-06-04 1984-11-10 株式会社日立製作所 Mis型半導体装置の製造法
JPS5232277A (en) * 1975-09-05 1977-03-11 Toshiba Corp Insulated gate type field-effect transistor
JPS5232680A (en) * 1975-09-08 1977-03-12 Toko Inc Manufacturing process of insulation gate-type field-effect semiconduct or device
US4028717A (en) * 1975-09-22 1977-06-07 Ibm Corporation Field effect transistor having improved threshold stability
JPS52115665A (en) * 1976-03-25 1977-09-28 Oki Electric Ind Co Ltd Semiconductor device and its production
JPS53128281A (en) * 1977-04-15 1978-11-09 Hitachi Ltd Insulated gate field effect type semiconductor device for large power
JPS5917529B2 (ja) * 1977-11-29 1984-04-21 富士通株式会社 半導体装置の製造方法
JPS5492175A (en) * 1977-12-29 1979-07-21 Fujitsu Ltd Manufacture of semiconductor device
JPS54147789A (en) * 1978-05-11 1979-11-19 Matsushita Electric Ind Co Ltd Semiconductor divice and its manufacture
JPS5534444A (en) * 1978-08-31 1980-03-11 Fujitsu Ltd Preparation of semiconductor device
JPS5553462A (en) * 1978-10-13 1980-04-18 Int Rectifier Corp Mosfet element
US5191396B1 (en) * 1978-10-13 1995-12-26 Int Rectifier Corp High power mosfet with low on-resistance and high breakdown voltage
DE2902665A1 (de) * 1979-01-24 1980-08-07 Siemens Ag Verfahren zum herstellen von integrierten mos-schaltungen in silizium-gate- technologie
DE2923995C2 (de) * 1979-06-13 1985-11-07 Siemens AG, 1000 Berlin und 8000 München Verfahren zum Herstellen von integrierten MOS-Schaltungen mit MOS-Transistoren und MNOS-Speichertransistoren in Silizium-Gate-Technologie
US4261772A (en) * 1979-07-06 1981-04-14 American Microsystems, Inc. Method for forming voltage-invariant capacitors for MOS type integrated circuit device utilizing oxidation and reflow techniques
JPS56165338A (en) * 1980-05-23 1981-12-18 Nec Corp Semiconductor device and manufacture thereof
JPS5787174A (en) * 1980-11-20 1982-05-31 Seiko Epson Corp Semiconductor integrated circuit device
JPS5827363A (ja) * 1981-08-10 1983-02-18 Fujitsu Ltd 電界効果トランジスタの製造法
US4743564A (en) * 1984-12-28 1988-05-10 Kabushiki Kaisha Toshiba Method for manufacturing a complementary MOS type semiconductor device
KR890004962B1 (ko) * 1985-02-08 1989-12-02 가부시끼가이샤 도오시바 반도체장치 및 그 제조방법
KR900000065B1 (ko) * 1985-08-13 1990-01-19 가부시끼가이샤 도오시바 독출전용 반도체기억장치와 그 제조방법
US4878100A (en) * 1988-01-19 1989-10-31 Texas Instruments Incorporated Triple-implanted drain in transistor made by oxide sidewall-spacer method
JP2675572B2 (ja) * 1988-03-31 1997-11-12 株式会社東芝 半導体集積回路の製造方法
US5021851A (en) * 1988-05-03 1991-06-04 Texas Instruments Incorporated NMOS source/drain doping with both P and As
US5047820A (en) * 1988-09-14 1991-09-10 Micrel, Inc. Semi self-aligned high voltage P channel FET
US4885627A (en) * 1988-10-18 1989-12-05 International Business Machines Corporation Method and structure for reducing resistance in integrated circuits
DE69030433T2 (de) * 1989-12-29 1997-10-09 Sharp Kk Herstellungsmethode für Halbleiterspeicher
IT1250233B (it) * 1991-11-29 1995-04-03 St Microelectronics Srl Procedimento per la fabbricazione di circuiti integrati in tecnologia mos.
US6780718B2 (en) * 1993-11-30 2004-08-24 Stmicroelectronics, Inc. Transistor structure and method for making same
EP0933821B1 (en) * 1994-03-03 2003-04-23 Rohm Corporation Low voltage one transistor flash eeprom cell using fowler-nordheim programming and erase
EP0689238B1 (en) * 1994-06-23 2002-02-20 STMicroelectronics S.r.l. MOS-technology power device manufacturing process
US5817546A (en) * 1994-06-23 1998-10-06 Stmicroelectronics S.R.L. Process of making a MOS-technology power device
US5869371A (en) * 1995-06-07 1999-02-09 Stmicroelectronics, Inc. Structure and process for reducing the on-resistance of mos-gated power devices
US5994210A (en) * 1997-08-12 1999-11-30 National Semiconductor Corporation Method of improving silicide sheet resistance by implanting fluorine
US7043983B2 (en) * 2003-12-15 2006-05-16 Fling William F Horizontal liquid level measuring device
JP2015015384A (ja) * 2013-07-05 2015-01-22 ルネサスエレクトロニクス株式会社 半導体装置およびその製造方法
US9472570B2 (en) * 2014-02-18 2016-10-18 Globalfoundries Inc. Diode biased body contacted transistor

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US3476619A (en) * 1966-09-13 1969-11-04 Motorola Inc Semiconductor device stabilization
US3594241A (en) * 1968-01-11 1971-07-20 Tektronix Inc Monolithic integrated circuit including field effect transistors and bipolar transistors,and method of making
FR2014382B1 (nl) * 1968-06-28 1974-03-15 Motorola Inc
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US3699646A (en) * 1970-12-28 1972-10-24 Intel Corp Integrated circuit structure and method for making integrated circuit structure
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US3725136A (en) * 1971-06-01 1973-04-03 Texas Instruments Inc Junction field effect transistor and method of fabrication
JPS4911583A (nl) * 1972-06-01 1974-02-01
JPS5528434B2 (nl) * 1974-01-29 1980-07-28

Also Published As

Publication number Publication date
JPS50127581A (nl) 1975-10-07
FR2264398B1 (nl) 1979-03-16
GB1496413A (en) 1977-12-30
US4092661A (en) 1978-05-30
DE2509315A1 (de) 1975-09-25
FR2264398A1 (nl) 1975-10-10
US3986903A (en) 1976-10-19
CA1038967A (en) 1978-09-19
NL7501529A (nl) 1975-09-16

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