NL159815B - Werkwijze voor het vervaardigen van een van een geisoleer- de stuurelektrode voorziene veldeffecttransistor met n-type kanaal. - Google Patents
Werkwijze voor het vervaardigen van een van een geisoleer- de stuurelektrode voorziene veldeffecttransistor met n-type kanaal.Info
- Publication number
- NL159815B NL159815B NL7501529.A NL7501529A NL159815B NL 159815 B NL159815 B NL 159815B NL 7501529 A NL7501529 A NL 7501529A NL 159815 B NL159815 B NL 159815B
- Authority
- NL
- Netherlands
- Prior art keywords
- procedure
- manufacture
- field effect
- effect transistor
- control electrode
- Prior art date
Links
- 102000004129 N-Type Calcium Channels Human genes 0.000 title 1
- 108090000699 N-Type Calcium Channels Proteins 0.000 title 1
- 230000005669 field effect Effects 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/13—Semiconductor regions connected to electrodes carrying current to be rectified, amplified or switched, e.g. source or drain regions
- H10D62/149—Source or drain regions of field-effect devices
- H10D62/151—Source or drain regions of field-effect devices of IGFETs
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/482—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of lead-in layers inseparably applied to the semiconductor body (electrodes)
- H01L23/485—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of lead-in layers inseparably applied to the semiconductor body (electrodes) consisting of layered constructions comprising conductive layers and insulating layers, e.g. planar contacts
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/01—Manufacture or treatment
- H10D30/021—Manufacture or treatment of FETs having insulated gates [IGFET]
- H10D30/0223—Manufacture or treatment of FETs having insulated gates [IGFET] having source and drain regions or source and drain extensions self-aligned to sides of the gate
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D99/00—Subject matter not provided for in other groups of this subclass
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
- H01L2924/3011—Impedance
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/04—Dopants, special
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/06—Gettering
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/133—Reflow oxides and glasses
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/167—Two diffusions in one hole
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/978—Semiconductor device manufacturing: process forming tapered edges on substrate or adjacent layers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/53—Means to assemble or disassemble
- Y10T29/53909—Means comprising hand manipulatable tool
- Y10T29/53913—Aligner or center
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US05/450,773 US3986903A (en) | 1974-03-13 | 1974-03-13 | Mosfet transistor and method of fabrication |
Publications (2)
Publication Number | Publication Date |
---|---|
NL7501529A NL7501529A (nl) | 1975-09-16 |
NL159815B true NL159815B (nl) | 1979-03-15 |
Family
ID=23789430
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL7501529.A NL159815B (nl) | 1974-03-13 | 1975-02-10 | Werkwijze voor het vervaardigen van een van een geisoleer- de stuurelektrode voorziene veldeffecttransistor met n-type kanaal. |
Country Status (7)
Country | Link |
---|---|
US (2) | US3986903A (nl) |
JP (1) | JPS50127581A (nl) |
CA (1) | CA1038967A (nl) |
DE (1) | DE2509315A1 (nl) |
FR (1) | FR2264398B1 (nl) |
GB (1) | GB1496413A (nl) |
NL (1) | NL159815B (nl) |
Families Citing this family (38)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4193080A (en) * | 1975-02-20 | 1980-03-11 | Matsushita Electronics Corporation | Non-volatile memory device |
JPS5946107B2 (ja) * | 1975-06-04 | 1984-11-10 | 株式会社日立製作所 | Mis型半導体装置の製造法 |
JPS5232277A (en) * | 1975-09-05 | 1977-03-11 | Toshiba Corp | Insulated gate type field-effect transistor |
JPS5232680A (en) * | 1975-09-08 | 1977-03-12 | Toko Inc | Manufacturing process of insulation gate-type field-effect semiconduct or device |
US4028717A (en) * | 1975-09-22 | 1977-06-07 | Ibm Corporation | Field effect transistor having improved threshold stability |
JPS52115665A (en) * | 1976-03-25 | 1977-09-28 | Oki Electric Ind Co Ltd | Semiconductor device and its production |
JPS53128281A (en) * | 1977-04-15 | 1978-11-09 | Hitachi Ltd | Insulated gate field effect type semiconductor device for large power |
JPS5917529B2 (ja) * | 1977-11-29 | 1984-04-21 | 富士通株式会社 | 半導体装置の製造方法 |
JPS5492175A (en) * | 1977-12-29 | 1979-07-21 | Fujitsu Ltd | Manufacture of semiconductor device |
JPS54147789A (en) * | 1978-05-11 | 1979-11-19 | Matsushita Electric Ind Co Ltd | Semiconductor divice and its manufacture |
JPS5534444A (en) * | 1978-08-31 | 1980-03-11 | Fujitsu Ltd | Preparation of semiconductor device |
JPS5553462A (en) * | 1978-10-13 | 1980-04-18 | Int Rectifier Corp | Mosfet element |
US5191396B1 (en) * | 1978-10-13 | 1995-12-26 | Int Rectifier Corp | High power mosfet with low on-resistance and high breakdown voltage |
DE2902665A1 (de) * | 1979-01-24 | 1980-08-07 | Siemens Ag | Verfahren zum herstellen von integrierten mos-schaltungen in silizium-gate- technologie |
DE2923995C2 (de) * | 1979-06-13 | 1985-11-07 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zum Herstellen von integrierten MOS-Schaltungen mit MOS-Transistoren und MNOS-Speichertransistoren in Silizium-Gate-Technologie |
US4261772A (en) * | 1979-07-06 | 1981-04-14 | American Microsystems, Inc. | Method for forming voltage-invariant capacitors for MOS type integrated circuit device utilizing oxidation and reflow techniques |
JPS56165338A (en) * | 1980-05-23 | 1981-12-18 | Nec Corp | Semiconductor device and manufacture thereof |
JPS5787174A (en) * | 1980-11-20 | 1982-05-31 | Seiko Epson Corp | Semiconductor integrated circuit device |
JPS5827363A (ja) * | 1981-08-10 | 1983-02-18 | Fujitsu Ltd | 電界効果トランジスタの製造法 |
US4743564A (en) * | 1984-12-28 | 1988-05-10 | Kabushiki Kaisha Toshiba | Method for manufacturing a complementary MOS type semiconductor device |
KR890004962B1 (ko) * | 1985-02-08 | 1989-12-02 | 가부시끼가이샤 도오시바 | 반도체장치 및 그 제조방법 |
KR900000065B1 (ko) * | 1985-08-13 | 1990-01-19 | 가부시끼가이샤 도오시바 | 독출전용 반도체기억장치와 그 제조방법 |
US4878100A (en) * | 1988-01-19 | 1989-10-31 | Texas Instruments Incorporated | Triple-implanted drain in transistor made by oxide sidewall-spacer method |
JP2675572B2 (ja) * | 1988-03-31 | 1997-11-12 | 株式会社東芝 | 半導体集積回路の製造方法 |
US5021851A (en) * | 1988-05-03 | 1991-06-04 | Texas Instruments Incorporated | NMOS source/drain doping with both P and As |
US5047820A (en) * | 1988-09-14 | 1991-09-10 | Micrel, Inc. | Semi self-aligned high voltage P channel FET |
US4885627A (en) * | 1988-10-18 | 1989-12-05 | International Business Machines Corporation | Method and structure for reducing resistance in integrated circuits |
DE69030433T2 (de) * | 1989-12-29 | 1997-10-09 | Sharp Kk | Herstellungsmethode für Halbleiterspeicher |
IT1250233B (it) * | 1991-11-29 | 1995-04-03 | St Microelectronics Srl | Procedimento per la fabbricazione di circuiti integrati in tecnologia mos. |
US6780718B2 (en) * | 1993-11-30 | 2004-08-24 | Stmicroelectronics, Inc. | Transistor structure and method for making same |
EP0933821B1 (en) * | 1994-03-03 | 2003-04-23 | Rohm Corporation | Low voltage one transistor flash eeprom cell using fowler-nordheim programming and erase |
EP0689238B1 (en) * | 1994-06-23 | 2002-02-20 | STMicroelectronics S.r.l. | MOS-technology power device manufacturing process |
US5817546A (en) * | 1994-06-23 | 1998-10-06 | Stmicroelectronics S.R.L. | Process of making a MOS-technology power device |
US5869371A (en) * | 1995-06-07 | 1999-02-09 | Stmicroelectronics, Inc. | Structure and process for reducing the on-resistance of mos-gated power devices |
US5994210A (en) * | 1997-08-12 | 1999-11-30 | National Semiconductor Corporation | Method of improving silicide sheet resistance by implanting fluorine |
US7043983B2 (en) * | 2003-12-15 | 2006-05-16 | Fling William F | Horizontal liquid level measuring device |
JP2015015384A (ja) * | 2013-07-05 | 2015-01-22 | ルネサスエレクトロニクス株式会社 | 半導体装置およびその製造方法 |
US9472570B2 (en) * | 2014-02-18 | 2016-10-18 | Globalfoundries Inc. | Diode biased body contacted transistor |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3476619A (en) * | 1966-09-13 | 1969-11-04 | Motorola Inc | Semiconductor device stabilization |
US3594241A (en) * | 1968-01-11 | 1971-07-20 | Tektronix Inc | Monolithic integrated circuit including field effect transistors and bipolar transistors,and method of making |
FR2014382B1 (nl) * | 1968-06-28 | 1974-03-15 | Motorola Inc | |
DE2040180B2 (de) * | 1970-01-22 | 1977-08-25 | Intel Corp, Mountain View, Calif. (V.St.A.) | Verfahren zur verhinderung von mechanischen bruechen einer duennen, die oberflaeche eines halbleiterkoerpers ueberdeckende isolierschichten ueberziehenden elektrisch leitenden schicht |
US3737347A (en) * | 1970-02-26 | 1973-06-05 | Fairchild Camera Instr Co | Graded impurity profile in epitaxial films to improve integrated circuit performance |
US3756876A (en) * | 1970-10-27 | 1973-09-04 | Cogar Corp | Fabrication process for field effect and bipolar transistor devices |
US3699646A (en) * | 1970-12-28 | 1972-10-24 | Intel Corp | Integrated circuit structure and method for making integrated circuit structure |
US3967981A (en) * | 1971-01-14 | 1976-07-06 | Shumpei Yamazaki | Method for manufacturing a semiconductor field effort transistor |
US3725136A (en) * | 1971-06-01 | 1973-04-03 | Texas Instruments Inc | Junction field effect transistor and method of fabrication |
JPS4911583A (nl) * | 1972-06-01 | 1974-02-01 | ||
JPS5528434B2 (nl) * | 1974-01-29 | 1980-07-28 |
-
1974
- 1974-03-13 US US05/450,773 patent/US3986903A/en not_active Expired - Lifetime
-
1975
- 1975-02-10 NL NL7501529.A patent/NL159815B/nl unknown
- 1975-03-04 DE DE19752509315 patent/DE2509315A1/de not_active Ceased
- 1975-03-04 GB GB8954/75A patent/GB1496413A/en not_active Expired
- 1975-03-06 CA CA221,639A patent/CA1038967A/en not_active Expired
- 1975-03-12 FR FR7507734A patent/FR2264398B1/fr not_active Expired
- 1975-03-13 JP JP50031028A patent/JPS50127581A/ja active Pending
-
1976
- 1976-05-20 US US05/688,466 patent/US4092661A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPS50127581A (nl) | 1975-10-07 |
FR2264398B1 (nl) | 1979-03-16 |
GB1496413A (en) | 1977-12-30 |
US4092661A (en) | 1978-05-30 |
DE2509315A1 (de) | 1975-09-25 |
FR2264398A1 (nl) | 1975-10-10 |
US3986903A (en) | 1976-10-19 |
CA1038967A (en) | 1978-09-19 |
NL7501529A (nl) | 1975-09-16 |
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