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MX2010004683A - Un aparato optico para observar detalles estructurales milimetricos o submilimetricos de un objeto con un comportamiento especular. - Google Patents

Un aparato optico para observar detalles estructurales milimetricos o submilimetricos de un objeto con un comportamiento especular.

Info

Publication number
MX2010004683A
MX2010004683A MX2010004683A MX2010004683A MX2010004683A MX 2010004683 A MX2010004683 A MX 2010004683A MX 2010004683 A MX2010004683 A MX 2010004683A MX 2010004683 A MX2010004683 A MX 2010004683A MX 2010004683 A MX2010004683 A MX 2010004683A
Authority
MX
Mexico
Prior art keywords
radiation
structural details
submillimetric
millimetric
observing
Prior art date
Application number
MX2010004683A
Other languages
English (en)
Inventor
Francois Becker
Original Assignee
Signoptic Technologies
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Signoptic Technologies filed Critical Signoptic Technologies
Publication of MX2010004683A publication Critical patent/MX2010004683A/es

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/25—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures by projecting a pattern, e.g. one or more lines, moiré fringes on the object
    • G01B11/2509—Color coding
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/25—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures by projecting a pattern, e.g. one or more lines, moiré fringes on the object
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • G01B11/306—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces for measuring evenness
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/55—Specular reflectivity
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Or Analyzing Materials By The Use Of Ultrasonic Waves (AREA)
  • Lenses (AREA)
  • Optical Elements Other Than Lenses (AREA)

Abstract

Un aparato de observación, por reflejo, de los detalles estructurales de un objeto (2) que exhibe un comportamiento que es por lo menos parcialmente especular, localizado en un área de exposición, la cual incluye: por lo menos una fuente de radiación con una superficie de emisión (6) que posee por lo menos dos zonas diferentes (26, 27) que emiten corrientes de radiación, en donde por lo menos una de las características difiere de una zona a la siguiente; un sistema de proyección óptica que está localizado en línea con una fuente de radicación en relación con la zona de exposición, en la trayectoria de la radiación; un sistema de exposición óptica (18) diseñado para enlazar de manera óptica la apertura de entrada (14) del sistema de proyección óptica y la superficie de emisión (6); una superficie de proyección (10) que está enlazada ópticamente con el objeto en la zona de exposición; y cuya radiación recibida depende de la desviación en el objeto (2).
MX2010004683A 2007-10-29 2008-10-29 Un aparato optico para observar detalles estructurales milimetricos o submilimetricos de un objeto con un comportamiento especular. MX2010004683A (es)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR0758664A FR2923006B1 (fr) 2007-10-29 2007-10-29 Dispositif optique pour l'observation de details structurels millimetriques ou submillimetriques d'un objet a comportement speculaire
US644108P 2008-01-14 2008-01-14
PCT/EP2008/064683 WO2009056571A1 (en) 2007-10-29 2008-10-29 An optical device for observing millimetric or submillimetric structural details of an object with specular behaviour

Publications (1)

Publication Number Publication Date
MX2010004683A true MX2010004683A (es) 2010-06-01

Family

ID=39494340

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2010004683A MX2010004683A (es) 2007-10-29 2008-10-29 Un aparato optico para observar detalles estructurales milimetricos o submilimetricos de un objeto con un comportamiento especular.

Country Status (11)

Country Link
US (1) US8994956B2 (es)
EP (2) EP2894462A1 (es)
JP (1) JP5674470B2 (es)
KR (1) KR101595581B1 (es)
BR (1) BRPI0819124B1 (es)
CA (1) CA2701218C (es)
ES (1) ES2535142T3 (es)
FR (1) FR2923006B1 (es)
MX (1) MX2010004683A (es)
PL (1) PL2220481T3 (es)
WO (1) WO2009056571A1 (es)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8641942B2 (en) * 2010-05-12 2014-02-04 Corning Incorporated Laser scanning systems and methods for measuring extruded ceramic logs
KR101316039B1 (ko) * 2012-05-02 2013-10-10 (주)쎄미시스코 수광장치와 이를 이용한 기판 품질검사장치
TWI622969B (zh) 2012-12-17 2018-05-01 印奈克斯托股份有限公司 用以使用物理特性來標記製造物品的方法及設備
EP3079915A1 (en) 2013-12-09 2016-10-19 Orell Füssli Sicherheitsdruck AG Security document with invisible marking
WO2016071356A1 (en) 2014-11-05 2016-05-12 Medico-Chemical Lab. Aps A ballast water analysis system
KR101745764B1 (ko) 2014-12-30 2017-06-12 주식회사 포스코아이씨티 광학식 판재 표면검사장치 및 판재 표면검사방법
US10724947B2 (en) 2015-04-14 2020-07-28 Cognex Corporation System and method for acquiring images of surface texture
FR3039958B1 (fr) * 2015-08-07 2020-09-18 Arjowiggins Solutions Appareil de numerisation
IL240872A (en) * 2015-08-27 2016-11-30 Elbit Systems Land & C4I Ltd A method and system for discovering object authenticity
CN106682912B (zh) 2015-11-10 2021-06-15 艾普维真股份有限公司 3d结构的认证方法

Family Cites Families (24)

* Cited by examiner, † Cited by third party
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FR513231A (fr) 1919-04-04 1921-02-10 Emmanuel Amedee Della Santa Boulon graisseur
FR601342A (fr) 1925-07-27 1926-02-27 Perfectionnements apportés aux appareils respiratoires
US3782827A (en) * 1971-08-04 1974-01-01 Itek Corp Optical device for characterizing the surface or other properties of a sample
FR2222666B1 (es) * 1973-03-19 1976-11-05 Thomson Brandt
FR2285990A1 (fr) 1974-09-24 1976-04-23 Kleber Colombes Procede de controle du calandrage d'un tissu metallique
US4030830A (en) * 1976-01-05 1977-06-21 Atlantic Research Corporation Process and apparatus for sensing defects on a smooth surface
JP2790284B2 (ja) * 1988-06-03 1998-08-27 大日本印刷株式会社 周期性パターンの検査方法
WO1997002466A1 (de) * 1995-06-30 1997-01-23 Siemens Aktiengesellschaft Optischer abstandssensor
JP3882588B2 (ja) * 2001-11-12 2007-02-21 株式会社ニコン マーク位置検出装置
JP3867512B2 (ja) * 2000-06-29 2007-01-10 富士ゼロックス株式会社 画像処理装置および画像処理方法、並びにプログラム
FR2817042B1 (fr) * 2000-11-22 2003-06-20 Saint Gobain Procede et dispositif d'analyse de la surface d'un substrat
JP4778156B2 (ja) * 2001-03-23 2011-09-21 オリンパス株式会社 距離情報取得装置又はシステム、パターン投影装置、及び、距離情報取得方法
JP2003042735A (ja) * 2001-08-01 2003-02-13 Minolta Co Ltd ３次元計測方法および装置並びにコンピュータプログラム
JP2004233163A (ja) * 2003-01-29 2004-08-19 Hitachi High-Technologies Corp パターン欠陥検査方法およびその装置
JP2004247349A (ja) * 2003-02-10 2004-09-02 Nikon Corp 位置計測装置及び方法、露光装置、並びにデバイス製造方法
US20040213463A1 (en) * 2003-04-22 2004-10-28 Morrison Rick Lee Multiplexed, spatially encoded illumination system for determining imaging and range estimation
DE10319560A1 (de) * 2003-04-24 2004-11-25 Deutsches Zentrum für Luft- und Raumfahrt e.V. Mobile Ferndetektionsvorrichtung und Ferndetektionsverfahren für Methangasansammlungen
FR2866139B1 (fr) 2004-02-06 2006-04-14 Yann Boutant Procede pour proteger de la lecture directe des informations sensibles, un support porteur de telles informations protegees et un procede de lecture de ces informations protegees
US8943325B2 (en) 2004-02-06 2015-01-27 Signoptic Technologies Savoie Technolac Use of a digital signature obtained from at least one structural characteristic of a material element to protect the direct reading of sensitive data and method for reading this protected data
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KR100669040B1 (ko) * 2005-08-01 2007-01-16 주식회사 나노트론 다중광속을 이용한 곡률 측정 장치와 방법
JP2007139622A (ja) * 2005-11-18 2007-06-07 Olympus Corp ３次元形状計測装置

Also Published As

Publication number Publication date
JP5674470B2 (ja) 2015-02-25
EP2220481B1 (en) 2015-01-21
BRPI0819124A2 (pt) 2017-05-02
EP2894462A1 (en) 2015-07-15
KR20100090281A (ko) 2010-08-13
US8994956B2 (en) 2015-03-31
BRPI0819124B1 (pt) 2019-08-20
CA2701218A1 (en) 2009-05-07
FR2923006A1 (fr) 2009-05-01
JP2011502249A (ja) 2011-01-20
PL2220481T3 (pl) 2016-02-29
CA2701218C (en) 2016-05-31
EP2220481B8 (en) 2015-03-11
ES2535142T3 (es) 2015-05-06
EP2220481A1 (en) 2010-08-25
WO2009056571A1 (en) 2009-05-07
FR2923006B1 (fr) 2010-05-14
KR101595581B1 (ko) 2016-02-18
US20100231894A1 (en) 2010-09-16

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