KR970063337A - 전자원과 그 전자원을 구비한 전자선 조사장치 - Google Patents
전자원과 그 전자원을 구비한 전자선 조사장치 Download PDFInfo
- Publication number
- KR970063337A KR970063337A KR1019970004201A KR19970004201A KR970063337A KR 970063337 A KR970063337 A KR 970063337A KR 1019970004201 A KR1019970004201 A KR 1019970004201A KR 19970004201 A KR19970004201 A KR 19970004201A KR 970063337 A KR970063337 A KR 970063337A
- Authority
- KR
- South Korea
- Prior art keywords
- electron
- electron source
- cathode
- less
- tip
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010894 electron beam technology Methods 0.000 title claims abstract 7
- 230000005684 electric field Effects 0.000 claims 2
- 238000000605 extraction Methods 0.000 claims 2
- 239000000523 sample Substances 0.000 abstract 2
- 238000000635 electron micrograph Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/06—Sources
- H01J2237/063—Electron sources
- H01J2237/06308—Thermionic sources
- H01J2237/06316—Schottky emission
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
- Electron Beam Exposure (AREA)
Abstract
Description
Claims (4)
- 바늘형상의 음극과, 상기 음극으로부터 전자를 인출하기 위한 전계를 인가하는 인출전극과, 상기 음극과 인출전극의 사이에 설치되며 전자선의 양을 제어하는 제어전극을 구비하는 전자원으로서, 상기 음극의 선단각을 15도 미만으로 한 것을 특징으로 하는 전자원.
- 제1항에 있어서, 상기 음극의 선단형상을 0.5㎛ 미만을 선단 곡률반경으로 한 것을 특징으로 하는 전자원.
- 선단각을 15도 미만으로 한 바늘형상의 음극과, 상기 음극으로부터 전자를 인출하기 위한 전계를 형성하는 인출전극과, 상기 음극과 인출전극의 사이에 배치되며 전자선의 양을 제어하는 제어전극을 구비한 전자원을 가지는 전자선 조사장치로서, 상기 인출전극에 일정한 정전압을 인가하면서 상기 제어전극에 부전압을 인가하고, 상기 부전압치를 변화시키기 위한 제어수단을 구비하여 이루어지는 것을 특징으로 하는 전자선 조사장치.
- 제3항에 있어서, 상기 음극의 선단형상을 0.5㎛미만의 선단 곡률반경으로 한 것을 특징으로 하는 전자선 조사장치.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4966696 | 1996-02-14 | ||
JP8-049666 | 1996-02-14 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR970063337A true KR970063337A (ko) | 1997-09-12 |
KR100505378B1 KR100505378B1 (ko) | 2005-10-21 |
Family
ID=12837505
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019970004201A Expired - Lifetime KR100505378B1 (ko) | 1996-02-14 | 1997-02-13 | 전자원과그전자원을구비한전자선조사장치 |
Country Status (4)
Country | Link |
---|---|
US (1) | US5834781A (ko) |
EP (1) | EP0790633B1 (ko) |
KR (1) | KR100505378B1 (ko) |
DE (1) | DE69709554T2 (ko) |
Families Citing this family (31)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2000068970A1 (fr) * | 1999-05-11 | 2000-11-16 | Hitachi, Ltd. | Appareil a faisceau electronique, et inspection d'un canon a electrons |
JP4261806B2 (ja) * | 2002-02-15 | 2009-04-30 | 株式会社日立ハイテクノロジーズ | 電子線装置及びその高電圧放電防止方法 |
US6798126B2 (en) * | 2002-05-03 | 2004-09-28 | Fei Company | High angular intensity Schottky electron point source |
KR100523840B1 (ko) * | 2003-08-27 | 2005-10-27 | 한국전자통신연구원 | 전계 방출 소자 |
GB2414856B (en) * | 2004-06-03 | 2008-11-12 | Nanobeam Ltd | Charged particle gun |
US20060196853A1 (en) * | 2005-03-04 | 2006-09-07 | The Regents Of The University Of California | Micro-joining using electron beams |
US9257257B2 (en) * | 2006-06-30 | 2016-02-09 | Shimadzu Corporation | Electron beam control method, electron beam generating apparatus, apparatus using the same, and emitter |
GB2483182B (en) * | 2006-06-30 | 2012-04-18 | Shimadzu Corp | Electron beam generating appparatus and electron emitters |
DE102011013262A1 (de) | 2011-03-07 | 2012-09-13 | Adlantis Dortmund Gmbh | Ionisationsquelle und Nachweisgerät für Spurengase |
WO2012127963A1 (ja) | 2011-03-18 | 2012-09-27 | 電気化学工業株式会社 | 電子銃又はイオン銃の取扱方法および収容体 |
US9349562B2 (en) | 2011-12-29 | 2016-05-24 | Elwha Llc | Field emission device with AC output |
JP6278897B2 (ja) * | 2011-12-29 | 2018-02-14 | エルファー エルエルシー | 電界放出デバイスのための装置と方法 |
US8810161B2 (en) | 2011-12-29 | 2014-08-19 | Elwha Llc | Addressable array of field emission devices |
US9646798B2 (en) | 2011-12-29 | 2017-05-09 | Elwha Llc | Electronic device graphene grid |
US9018861B2 (en) | 2011-12-29 | 2015-04-28 | Elwha Llc | Performance optimization of a field emission device |
US8692226B2 (en) | 2011-12-29 | 2014-04-08 | Elwha Llc | Materials and configurations of a field emission device |
US8810131B2 (en) | 2011-12-29 | 2014-08-19 | Elwha Llc | Field emission device with AC output |
US8970113B2 (en) | 2011-12-29 | 2015-03-03 | Elwha Llc | Time-varying field emission device |
US8946992B2 (en) | 2011-12-29 | 2015-02-03 | Elwha Llc | Anode with suppressor grid |
US8575842B2 (en) | 2011-12-29 | 2013-11-05 | Elwha Llc | Field emission device |
US8928228B2 (en) | 2011-12-29 | 2015-01-06 | Elwha Llc | Embodiments of a field emission device |
US9171690B2 (en) | 2011-12-29 | 2015-10-27 | Elwha Llc | Variable field emission device |
US9627168B2 (en) | 2011-12-30 | 2017-04-18 | Elwha Llc | Field emission device with nanotube or nanowire grid |
US9659735B2 (en) | 2012-09-12 | 2017-05-23 | Elwha Llc | Applications of graphene grids in vacuum electronics |
US9659734B2 (en) | 2012-09-12 | 2017-05-23 | Elwha Llc | Electronic device multi-layer graphene grid |
DE102014226812A1 (de) * | 2014-12-22 | 2016-06-23 | Siemens Aktiengesellschaft | Vorrichtung zum Erzeugen eines Elektronenstrahls |
EP3065161B1 (en) * | 2015-01-09 | 2018-11-21 | Technology Research Association For Future Additive Manufacturing | Electron gun, control method and control program thereof, and three-dimensional shaping apparatus |
US11322329B2 (en) | 2018-08-27 | 2022-05-03 | Hitachi High-Tech Corporation | Electron source, method for manufacturing the same, and electron beam device using the same |
US11651929B2 (en) | 2018-12-05 | 2023-05-16 | Hitachi High-Tech Corporation | Charged particle source and charged particle beam device |
EP3905299A4 (en) * | 2018-12-28 | 2022-04-06 | Canon Anelva Corporation | ELECTRON GUN, X-RAY GENERATING DEVICE, AND X-RAY IMAGING DEVICE |
KR102640728B1 (ko) * | 2019-04-18 | 2024-02-27 | 주식회사 히타치하이테크 | 전자원 및 하전 입자선 장치 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5217392B1 (ko) * | 1970-09-18 | 1977-05-14 | ||
US4324999A (en) * | 1980-04-30 | 1982-04-13 | Burroughs Corporation | Electron-beam cathode having a uniform emission pattern |
US4663559A (en) * | 1982-09-17 | 1987-05-05 | Christensen Alton O | Field emission device |
EP0366851B1 (en) * | 1988-11-01 | 1994-02-16 | International Business Machines Corporation | Low-voltage source for narrow electron/ion beams |
US5155412A (en) * | 1991-05-28 | 1992-10-13 | International Business Machines Corporation | Method for selectively scaling a field emission electron gun and device formed thereby |
US5191217A (en) * | 1991-11-25 | 1993-03-02 | Motorola, Inc. | Method and apparatus for field emission device electrostatic electron beam focussing |
JPH0684452A (ja) * | 1992-03-27 | 1994-03-25 | Denki Kagaku Kogyo Kk | 熱電界放射陰極 |
JPH0684451A (ja) * | 1992-03-27 | 1994-03-25 | Denki Kagaku Kogyo Kk | 熱電界放射陰極 |
JPH0684450A (ja) * | 1992-03-27 | 1994-03-25 | Denki Kagaku Kogyo Kk | 熱電界放射陰極 |
US5449968A (en) * | 1992-06-24 | 1995-09-12 | Denki Kagaku Kogyo Kabushiki Kaisha | Thermal field emission cathode |
JP3264775B2 (ja) * | 1994-06-29 | 2002-03-11 | 電気化学工業株式会社 | 熱電界放射電子銃 |
JP3582855B2 (ja) * | 1994-07-22 | 2004-10-27 | 電気化学工業株式会社 | 熱電界放射陰極及びその製造方法 |
US5616926A (en) * | 1994-08-03 | 1997-04-01 | Hitachi, Ltd. | Schottky emission cathode and a method of stabilizing the same |
DE69506375T2 (de) * | 1994-10-03 | 1999-06-17 | Koninklijke Philips Electronics N.V., Eindhoven | Partikel-optisches gerät mit einer elektronenquelle versehen die eine nadel und eine membranartige extraktionselektrode aufweist |
JPH08171879A (ja) * | 1994-12-16 | 1996-07-02 | Hitachi Ltd | ショットキーエミッション電子源の動作温度設定方法 |
-
1997
- 1997-02-06 US US08/796,490 patent/US5834781A/en not_active Expired - Lifetime
- 1997-02-07 DE DE69709554T patent/DE69709554T2/de not_active Expired - Lifetime
- 1997-02-07 EP EP97101980A patent/EP0790633B1/en not_active Expired - Lifetime
- 1997-02-13 KR KR1019970004201A patent/KR100505378B1/ko not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
DE69709554D1 (de) | 2002-02-21 |
EP0790633A3 (en) | 1998-07-08 |
EP0790633B1 (en) | 2002-01-16 |
US5834781A (en) | 1998-11-10 |
DE69709554T2 (de) | 2002-10-02 |
KR100505378B1 (ko) | 2005-10-21 |
EP0790633A2 (en) | 1997-08-20 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR970063337A (ko) | 전자원과 그 전자원을 구비한 전자선 조사장치 | |
EP2096661A1 (en) | Cold cathode field emission electron gun and its application to electron beam instruments | |
US4994711A (en) | High brightness solid electrolyte ion source | |
JPH0266840A (ja) | 電子線測定器 | |
EP0037455A2 (en) | Ion source | |
KR950009866A (ko) | 인라인형 칼라 음극선관용 전자총의 전압 인가 방법 및 전극 구조 | |
EP0390118A3 (en) | Field emission scanning electron microsope and method of controlling beam aperture angle | |
US5962961A (en) | Thermal field emission electron gun | |
US4346325A (en) | Electron gun | |
KR950009865A (ko) | 음극선관용 전자총 | |
US3786305A (en) | Field emission electron gun | |
Mousa | Characteristics of tungsten substrate with Al2O3 coatings under UHV conditions | |
KR840006554A (ko) | 음극선관 | |
US2554170A (en) | Electronic lens for microscopes | |
KR960019453A (ko) | 4중극렌즈를 사용한 컬러음극선관 및 이를 구비한 컬러표시장치 | |
KR890016614A (ko) | 브라운관용 전자총 | |
JPH09129166A (ja) | 電子銃 | |
SU785903A1 (ru) | Электронна пушка | |
JPH0535540B2 (ko) | ||
RU1806417C (ru) | Электровакуумный прибор | |
JPS62108442A (ja) | 静電レンズ | |
RU1812576C (ru) | Электронно-лучевой прибор | |
JPH01149345A (ja) | 液体金属イオン源 | |
JPS5457862A (en) | Ion-beam irradiation device | |
SU692430A1 (ru) | Электронна газоразр дна пушка |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 19970213 |
|
PG1501 | Laying open of application | ||
A201 | Request for examination | ||
PA0201 | Request for examination |
Patent event code: PA02012R01D Patent event date: 20011114 Comment text: Request for Examination of Application Patent event code: PA02011R01I Patent event date: 19970213 Comment text: Patent Application |
|
E902 | Notification of reason for refusal | ||
PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20031127 Patent event code: PE09021S01D |
|
E902 | Notification of reason for refusal | ||
PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20040831 Patent event code: PE09021S01D |
|
E701 | Decision to grant or registration of patent right | ||
PE0701 | Decision of registration |
Patent event code: PE07011S01D Comment text: Decision to Grant Registration Patent event date: 20050628 |
|
GRNT | Written decision to grant | ||
PR0701 | Registration of establishment |
Comment text: Registration of Establishment Patent event date: 20050725 Patent event code: PR07011E01D |
|
PR1002 | Payment of registration fee |
Payment date: 20050726 End annual number: 3 Start annual number: 1 |
|
PG1601 | Publication of registration | ||
PR1001 | Payment of annual fee |
Payment date: 20080722 Start annual number: 4 End annual number: 4 |
|
PR1001 | Payment of annual fee |
Payment date: 20090720 Start annual number: 5 End annual number: 5 |
|
PR1001 | Payment of annual fee |
Payment date: 20100719 Start annual number: 6 End annual number: 6 |
|
PR1001 | Payment of annual fee |
Payment date: 20110617 Start annual number: 7 End annual number: 7 |
|
PR1001 | Payment of annual fee |
Payment date: 20120629 Start annual number: 8 End annual number: 8 |
|
FPAY | Annual fee payment |
Payment date: 20130705 Year of fee payment: 9 |
|
PR1001 | Payment of annual fee |
Payment date: 20130705 Start annual number: 9 End annual number: 9 |
|
FPAY | Annual fee payment |
Payment date: 20140707 Year of fee payment: 10 |
|
PR1001 | Payment of annual fee |
Payment date: 20140707 Start annual number: 10 End annual number: 10 |
|
FPAY | Annual fee payment |
Payment date: 20150630 Year of fee payment: 11 |
|
PR1001 | Payment of annual fee |
Payment date: 20150630 Start annual number: 11 End annual number: 11 |
|
FPAY | Annual fee payment |
Payment date: 20160701 Year of fee payment: 12 |
|
PR1001 | Payment of annual fee |
Payment date: 20160701 Start annual number: 12 End annual number: 12 |
|
EXPY | Expiration of term | ||
PC1801 | Expiration of term |