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KR970025778U - Solution supply device for semiconductor manufacturing equipment - Google Patents

Solution supply device for semiconductor manufacturing equipment

Info

Publication number
KR970025778U
KR970025778U KR2019950032607U KR19950032607U KR970025778U KR 970025778 U KR970025778 U KR 970025778U KR 2019950032607 U KR2019950032607 U KR 2019950032607U KR 19950032607 U KR19950032607 U KR 19950032607U KR 970025778 U KR970025778 U KR 970025778U
Authority
KR
South Korea
Prior art keywords
supply device
semiconductor manufacturing
manufacturing equipment
solution supply
solution
Prior art date
Application number
KR2019950032607U
Other languages
Korean (ko)
Other versions
KR200142848Y1 (en
Inventor
장세진
박성희
Original Assignee
엘지반도체주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 엘지반도체주식회사 filed Critical 엘지반도체주식회사
Priority to KR2019950032607U priority Critical patent/KR200142848Y1/en
Publication of KR970025778U publication Critical patent/KR970025778U/en
Application granted granted Critical
Publication of KR200142848Y1 publication Critical patent/KR200142848Y1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
KR2019950032607U 1995-11-08 1995-11-08 Solution supplying system of semiconductor fabrication apparatus KR200142848Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019950032607U KR200142848Y1 (en) 1995-11-08 1995-11-08 Solution supplying system of semiconductor fabrication apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019950032607U KR200142848Y1 (en) 1995-11-08 1995-11-08 Solution supplying system of semiconductor fabrication apparatus

Publications (2)

Publication Number Publication Date
KR970025778U true KR970025778U (en) 1997-06-20
KR200142848Y1 KR200142848Y1 (en) 1999-06-01

Family

ID=19428327

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019950032607U KR200142848Y1 (en) 1995-11-08 1995-11-08 Solution supplying system of semiconductor fabrication apparatus

Country Status (1)

Country Link
KR (1) KR200142848Y1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20000026455A (en) * 1998-10-20 2000-05-15 윤종용 Sprayer of photoresist
KR100475028B1 (en) * 1998-01-05 2005-06-01 삼성전자주식회사 Photoresist Coating Device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100475028B1 (en) * 1998-01-05 2005-06-01 삼성전자주식회사 Photoresist Coating Device
KR20000026455A (en) * 1998-10-20 2000-05-15 윤종용 Sprayer of photoresist

Also Published As

Publication number Publication date
KR200142848Y1 (en) 1999-06-01

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Legal Events

Date Code Title Description
A201 Request for examination
UA0108 Application for utility model registration

Comment text: Application for Utility Model Registration

Patent event code: UA01011R08D

Patent event date: 19951108

UA0201 Request for examination

Patent event date: 19951108

Patent event code: UA02012R01D

Comment text: Request for Examination of Application

UG1501 Laying open of application
E902 Notification of reason for refusal
UE0902 Notice of grounds for rejection

Comment text: Notification of reason for refusal

Patent event code: UE09021S01D

Patent event date: 19980831

E701 Decision to grant or registration of patent right
UE0701 Decision of registration

Patent event date: 19981218

Comment text: Decision to Grant Registration

Patent event code: UE07011S01D

REGI Registration of establishment
UR0701 Registration of establishment

Patent event date: 19990118

Patent event code: UR07011E01D

Comment text: Registration of Establishment

UR1002 Payment of registration fee

Start annual number: 1

End annual number: 3

Payment date: 19990119

UG1601 Publication of registration
UR1001 Payment of annual fee

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End annual number: 4

UR1001 Payment of annual fee

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