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KR970023640A - Pattern formation method of optical path control device - Google Patents

Pattern formation method of optical path control device Download PDF

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Publication number
KR970023640A
KR970023640A KR1019950038510A KR19950038510A KR970023640A KR 970023640 A KR970023640 A KR 970023640A KR 1019950038510 A KR1019950038510 A KR 1019950038510A KR 19950038510 A KR19950038510 A KR 19950038510A KR 970023640 A KR970023640 A KR 970023640A
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South Korea
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forming
silicon wafer
sacrificial layer
substrate
membrane
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KR0174456B1 (en
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전용배
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배순훈
대우전자 주식회사
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G02B26/0858—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting means being moved or deformed by piezoelectric means

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Micromachines (AREA)

Abstract

본 발명은 구동 기판 및 비구동 기판으로 나누어진 실리콘 웨이퍼상에 광로 조절 장치를 소정 형상으로 패터닝시키는 방법에 관한 것으로, 전기 접점 단자로 작용하는 패드가 복수개 형성된 실리콘 웨이퍼상에 보호층 및 스톱층을 순차적으로형성시키는 단계와, 상기 스톱층상에 소정 형상의 희생층을 형성시키는 단계와, 상기 희생층상에 멤브레인을 형성시키는단계와, 상기 실리콘 웨이퍼의 구동 기판상에 하부 전극, 변형부 및 상부 전극을 순차적으로 형성시키고 패터닝시키는 단계와, 그리고 상기 구동 기판상에 형성된 상기 희생층을 제거하는 단계로 이루어지며 이에 의해서 상기 희생층의 습식 식각 제거시 상기 보호층이 화학적 손상을 받는 것을 방지시켜서 패드를 양호하게 절연시킨다.The present invention relates to a method for patterning an optical path control device into a predetermined shape on a silicon wafer divided into a driving substrate and a non-driven substrate. Forming sequentially, forming a sacrificial layer having a predetermined shape on the stop layer, forming a membrane on the sacrificial layer, and forming a lower electrode, a deformable portion, and an upper electrode on a driving substrate of the silicon wafer. Forming and patterning sequentially, and removing the sacrificial layer formed on the drive substrate, thereby preventing the protective layer from being chemically damaged during the wet etching of the sacrificial layer. Insulate it.

Description

광로 조절 장치의 패턴 형성 방법Pattern formation method of optical path control device

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

제3(가)도 내지 제3(나)도는 본 발명에 따른 광로 조절 장치의 패턴 형성 방법을 순차적으로 도시한 공정도.3 (a) to 3 (b) is a process diagram sequentially showing a pattern forming method of the optical path control apparatus according to the present invention.

Claims (6)

복수개의 액츄에이터가 형성되는 구동 기판(310)과 상기 액츄에이터(340)가 형성되지 않느 비구동 기판(310a)으로 나누어진 실리콘 웨이퍼(300)상에 광로 조절 장치를 패터닝시키는 방법에 있어서, 전기적 접점 단자로 작용하는 패드(320)가 복수개 형성된 실리콘 웨이퍼(300)상에 보호층(331) 및 스톱층(332)을 순차적으로 형성시키는 단계와, 상기 스톱층(332)상에 소정 형상의 희생층(341)을 형성시키는 단계와, 상기 희생층(341)상에 멤브레인(342)을 형성시키는단계와, 상기 멤브레인(342)상에 하부 전극(343), 변형부(344) 및 상부 전극(345)을 순차적으로 형성시키고 패터닝시켜서 액츄에이터(340)를 형성시키는 단계와, 그리고 상기 구동 기판(310)상에 형성된 상기 희생층(341)의 일부를 제거하는 단계로 이루어진 것을 특징으로 하는 광로 조절 장치의 패턴 형성 방법.In a method for patterning an optical path control device on a silicon wafer 300 divided into a driving substrate 310 on which a plurality of actuators are formed and a non-driven substrate 310a on which the actuators 340 are not formed, an electrical contact terminal Sequentially forming a protective layer 331 and a stop layer 332 on the silicon wafer 300 having a plurality of pads 320 serving as a plurality of pads 320, and a sacrificial layer having a predetermined shape on the stop layer 332. 341, forming a membrane 342 on the sacrificial layer 341, a lower electrode 343, a deformable portion 344, and an upper electrode 345 on the membrane 342. Forming an actuator 340 by sequentially forming and patterning the pattern, and removing a portion of the sacrificial layer 341 formed on the driving substrate 310. Forming method. 제1항에 있어서, 상기 멤브레인(342)은 상기 실리콘 웨이퍼(300)의 비구동 기판(310a)상에 잔존하는 것을 특징으로 하는 광로 조절 장치의 패턴 형성 방법.The method of claim 1, wherein the membrane (342) remains on the non-driven substrate (310a) of the silicon wafer (300). 제2항에 있어서, 상기 멤브레인(342)은 상기 실리콘 웨이퍼(300)의 구동 기판(310)과 비구동 기판(310a)사이의 경계 부분에 소정 두께로 잔존하는 것을 특징으로 하는 광로 조절 장치의 패턴 형성 방법.3. The pattern of the optical path control apparatus of claim 2, wherein the membrane 342 remains at a predetermined thickness at a boundary portion between the driving substrate 310 and the non-driving substrate 310a of the silicon wafer 300. Forming method. 제1항에 있어서, 상기 멤브레인(342)의 조성은 상기 스톱층(332)의 조성과 동일한 것을 특징으로 하는 광로 조절 장치의 패턴 형성 방법.The method of claim 1, wherein the composition of the membrane (342) is the same as the composition of the stop layer (332). 제1항에 있어서, 상기 액츄에이터(340)는 상기 실리콘 웨이퍼(300)의 구동 기판(310)상에 형성되는 것을특징으로 하는 광로 조절 장치의 패턴 형성방법.The method of claim 1, wherein the actuator (340) is formed on a driving substrate (310) of the silicon wafer (300). 제1항에 있어서, 상기 실리콘 웨이퍼(300)의 비구동 기판(310a) 상에 상기 희생층(341)의 일부가 잔존하는것을 특징으로 하는 광로 조절 장치의 패턴 형성 방법.The method of claim 1, wherein a part of the sacrificial layer (341) remains on the non-driven substrate (310a) of the silicon wafer (300). ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019950038510A 1995-10-31 1995-10-31 Pattern formation method of optical path control device Expired - Fee Related KR0174456B1 (en)

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KR1019950038510A KR0174456B1 (en) 1995-10-31 1995-10-31 Pattern formation method of optical path control device

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Application Number Priority Date Filing Date Title
KR1019950038510A KR0174456B1 (en) 1995-10-31 1995-10-31 Pattern formation method of optical path control device

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KR970023640A true KR970023640A (en) 1997-05-30
KR0174456B1 KR0174456B1 (en) 1999-03-20

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8088432B2 (en) 2009-08-28 2012-01-03 Uljin-gun (Uljin County) Instant food-type soybean paste blended with sea urchin eggs and method of manufacturing the same

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101755508B1 (en) 2015-12-08 2017-07-19 현대자동차 주식회사 Exhaust connecting unit for catalytic converter and manufacturing method in the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8088432B2 (en) 2009-08-28 2012-01-03 Uljin-gun (Uljin County) Instant food-type soybean paste blended with sea urchin eggs and method of manufacturing the same

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