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KR960002513A - Position detection device and acoustooptic modulation device using this device - Google Patents

Position detection device and acoustooptic modulation device using this device Download PDF

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Publication number
KR960002513A
KR960002513A KR1019950014600A KR19950014600A KR960002513A KR 960002513 A KR960002513 A KR 960002513A KR 1019950014600 A KR1019950014600 A KR 1019950014600A KR 19950014600 A KR19950014600 A KR 19950014600A KR 960002513 A KR960002513 A KR 960002513A
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South Korea
Prior art keywords
acoustooptic
medium
light
light beams
traveling waves
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KR1019950014600A
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Korean (ko)
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히데오 미주타니
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오노 시게오
가부시끼가이샤 니콘
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Publication of KR960002513A publication Critical patent/KR960002513A/en

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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/708Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049Technique, e.g. interferometric

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

본 발명이 목적은 광학계의 조절이 용이하고 다중 파장의 빛을 사용할 수 있는 특징을 유지하면서 단순하 구조로 저주파수의 맥놀이 신호를 얻는 데에 있다. 백색 광원으로부터의 광속은 회절 격자에 의해 두 개의 광속으로 분산되며, 이 두 개의 광속은 릴레이 광학계로 인도되어 음향 과학 변조 장치(AOM)로 소정의 교차각으로 입사된다. 약간 상이한 주파수를 갖는 추진 신호는 반대 방향으로 AOM에 제공되며, 서로로부터의 적은 주파수를 갖는 두 개의 회절광속이 AOM으로부터 방출된다. 두 회절된 광속은 소정의 교차 각으로 레티클 및 웨이퍼 상의 회절 격자 표지로 대물 렌즈를 통해 적용됨으로써 헤테로다인 간섭 기술에 의해 위치 검출을 수행한다.An object of the present invention is to obtain a beat signal of a low frequency with a simple structure while maintaining the characteristics that the optical system can be easily adjusted and use light of multiple wavelengths. The luminous flux from the white light source is dispersed into two luminous fluxes by the diffraction grating, which are led to the relay optical system and are incident at a predetermined crossing angle into the acoustic scientific modulation device (AOM). Propulsion signals with slightly different frequencies are provided to the AOM in opposite directions, and two diffraction beams with less frequencies from each other are emitted from the AOM. The two diffracted beams are applied through an objective lens with a diffraction grating label on the reticle and wafer at a predetermined crossing angle to perform position detection by heterodyne interference technique.

Description

위치 검출 장치 및 이 장치를 사용한 음향 광학 변조 장치Position detection device and acoustooptic modulation device using this device

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제1도는 본 발명에 따르는 제1실시예로서 투영 노광 장치의 개략적 구조를 도시한 구조도,1 is a structural diagram showing a schematic structure of a projection exposure apparatus as a first embodiment according to the present invention;

제2도 및 제3도는 각각의 회절 격자 표지를 도시한 확대 평면도.2 and 3 are enlarged plan views showing respective diffraction grating markers.

Claims (12)

음향 광학 매체; 및 상기 음향 광학 매체의 초음파 작용 영역에서 서로 상이한 주파수의 두 진행파를 발생시키는 초음파 발생 장치로 이루어짐을 특징으로 하여, 여기로 입사되는 광속을 서로 상이한 주파수의 두 광속으로 분산시키기 위한 음향 광학 변조 장치.Acoustooptic media; And an ultrasonic wave generator for generating two traveling waves of different frequencies in the ultrasonic wave working region of the acousto-optical medium, wherein the incident light beams are distributed to two light beams of different frequencies. 제1항에 있어서, 두 진행파가 상기 초음파 작용 영역에서 중첩되는 방식으로 이동함을 특징으로 하는 음향 광학 변조 장치.The acoustooptic modulation device according to claim 1, wherein two traveling waves move in an overlapping manner in the ultrasonic wave action region. 제1항에 있어서, 두 진행파가 상기 초음파 작용 영역에 별개로 존재하는 제1 및 제2영역에서 이동함을 특징으로 하는 음향 광학 변조 장치.The acoustooptic modulation device according to claim 1, wherein two traveling waves move in a first area and a second area which are separately present in the ultrasonic wave action area. 제3항에 있어서, 제1 및 제2영역이 동일한 음향 광학 매체에 존재함을 특징으로 하는 음향 광학 변조 장치.4. The acoustooptic modulation device according to claim 3, wherein the first and second regions are in the same acoustooptic medium. 제3항에 있어서, 제1 및 제2영역이 별개의 음향 광학 매체에 존재함을 특징으로 하는 음향 광학 변조 장치.4. The acoustooptic modulation device of claim 3, wherein the first and second regions are in separate acoustooptic media. 제1항에 있어서, 두 진행파의 이동 방향이 서로 반대임을 특징으로 하는 음향 광학 변조 장치.The acoustooptic modulation device according to claim 1, wherein the moving directions of the two traveling waves are opposite to each other. 제1항에 있어서, 두 진행파의 이동 방향이 서로 일치함을 특징으로 하는 음향 광학 변조 장치.The acoustooptic modulation device according to claim 1, wherein the moving directions of the two traveling waves coincide with each other. 제1항에 있어서, 초음파 발생 장치가 초음파를 발생시키기 위하여 상기 음향 공학 매체의 제1표면에 장착된 트랜스듀서; 및 상기 음향-광학 매체에 대해서 상기 제1표면에 반대인 상기 음향 광학 매체의 제2표면에 장착된 흡음 부재로 이루어짐을 특징으로 하는 음향 광학 변조 장치.The apparatus of claim 1, further comprising: a transducer mounted on a first surface of the acoustic engineering medium for generating ultrasonic waves; And a sound absorbing member mounted to a second surface of the acousto-optical medium opposite the first surface with respect to the acousto-optic medium. 단일 파장의 광속 및 복수 파장의 빛을 포함하는 광속을 제공하기 위한 광원계; 상기 광원게로부터의 광속이 입사되는 음향 광학 매체; 상기 음향 광학 매체의 초음파 작용 영역에서 서로 상이한 주파수의 두 진행성 파장을 발생시키고, 상기 음향 광학 매체로 입사되는 광속을 서로 상이한 주파수의 두 광속으로 분산시킴으로써, 상기 음향 광학 매체로부터 분산되어 방출된 두 고아속을 만들기 위한 초음파 발생 장치; 상기 음향 광학 매체로부터 방출된 두 광속을 집광하여 회절격자상 표지로 집광된 두 광속을 소정의 두 방향에서 측정된 물체위에 적용시키는 대물 광학계; 상기 회절격자상 표지로부터 나타난 복수의 회절 광속에 의해 형성된 간섭광을 광전기적으로 검출하기 위한 광전기 검출 장치; 및 상기 광전기 검출 장치로부터의 검출 신호에 기초하여 측정된 물체의 위치를 검출하기 위한 처리 장치로 이루어짐을 특징으로 하는 위치 검출 장치.A light source system for providing a luminous flux including a luminous flux of a single wavelength and a plurality of wavelengths of light; An acoustooptic medium on which the light beam from the light source is incident; Two orphans dispersed and emitted from the acoustooptic medium by generating two progressive wavelengths of different frequencies in the ultrasonic working region of the acoustooptic medium, and dispersing the light beams incident on the acoustooptic medium into two light beams of different frequencies. An ultrasonic generator for making the genus; An objective optical system for condensing two light beams emitted from the acoustooptic medium and applying the two light beams focused on a diffraction grating label onto an object measured in two predetermined directions; A photoelectric detection device for photoelectrically detecting interference light formed by a plurality of diffraction light fluxes displayed from the diffraction grating label; And a processing device for detecting the position of the object measured based on the detection signal from the photoelectric detection device. 제9항에 있어서, 초음파 작용 영역에서 발생된 두 진행성 파장의 이동 방향이 서로 반대임을 특징으로 하는 위치 검출 장치.10. The position detecting apparatus of claim 9, wherein the moving directions of the two progressive wavelengths generated in the ultrasonic wave operating region are opposite to each other. 제9항에 있어서, 두 진행파가 상기 초음파 작용 영역의 제1 및 제2영역에서 발생하며, 제1 및 제2영역은 서로 인접하고, 상기 두 진행파의 이동 방향이 서로 일치함을 특징으로 하는 위치 검출 장치.10. The position of claim 9, wherein two traveling waves are generated in the first and second regions of the ultrasonic wave operating region, the first and second regions are adjacent to each other, and the moving directions of the two traveling waves coincide with each other. Detection device. 조명 광속을 공급하기 위한 조명 광학계; 상기 조명 광학계로부터의 광속에 의해 조명된 조명 물체를 제공하기 위한 제1스테이지; 노광 물체를 제공하기 위한 제2스테이지; 상기 제1스테이지에 의해 제공된 조명된 물체상의 위치를 상기 제2스테이지에 의해 제공된 노광 물체상의 위치와 결합시키기 위한 투영 광학계; 단일 파장의 광속 및 복수 파장의 빛을 포함하는 광속을 제공하기 위한 광원계; 상기 광원계로부터의 광속이 입사되는 음향 광학 매체; 상기 음향 광학 매체의 초음파 작용 영역에서 서로 상이한 주파수의 두 진행파를 발생시키고, 상기 음향 광학 매체로 입사되는 광속을 서로 상이한 주파수의 두 광속으로 분산시킴으로써, 상기 음향 광학 매체로부터 분산되어 방출된 두 고아속을 만들기 위한 초음파 발생 장치; 상기 음향 광학 매체로부터 방출된 두 광속을 집광하여 회절격자상 표지로 집광된 두 광속을 소정의 두 방향에서 조명된 물체 또는 노광된 물체위에 적용시키는 대물 광학계; 상기 회절격자상 표지로부터 나타난 복수의 회절 광속에 의해 형성된 간섭광을 광전기적으로 검출하기 위한 광전기 검출 장치; 및 상기 광전기 검출 장치로부터 검출 신호에 기초하여 상기 회절격자상 표지에 제공된 조명된 물체 또는 노광된 물체의 위치를 검출하기 위한 처리 장치로 이루어짐을 특징으로 하는 투영 노광 장치.An illumination optical system for supplying an illumination light beam; A first stage for providing an illuminated object illuminated by the luminous flux from said illumination optics; A second stage for providing an exposure object; Projection optics for combining a position on the illuminated object provided by the first stage with a position on the exposed object provided by the second stage; A light source system for providing a luminous flux including a luminous flux of a single wavelength and a plurality of wavelengths of light; An acoustooptic medium on which the light beam from the light source is incident; Two orphan waves dispersed and emitted from the acousto-optical medium by generating two traveling waves of different frequencies in the ultrasonic action region of the acoustooptic medium and dispersing the light beams incident on the acoustooptic medium into two light beams of different frequencies. Ultrasonic generator for making a; An objective optical system for condensing two light beams emitted from the acoustooptic medium and applying the two light beams focused on a diffraction grating label onto a lighted object or an exposed object in two predetermined directions; A photoelectric detection device for photoelectrically detecting interference light formed by a plurality of diffraction light fluxes displayed from the diffraction grating label; And a processing device for detecting a position of an illuminated object or an exposed object provided on the diffraction grating label based on a detection signal from the photoelectric detection device. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019950014600A 1994-06-08 1995-06-02 Position detection device and acoustooptic modulation device using this device KR960002513A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP6126364A JPH07335526A (en) 1994-06-08 1994-06-08 Position detector and acoustooptical modulation element used for the position detector
JP126364/1994 1994-06-08

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KR960002513A true KR960002513A (en) 1996-01-26

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KR1019950014600A KR960002513A (en) 1994-06-08 1995-06-02 Position detection device and acoustooptic modulation device using this device

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Cited By (1)

* Cited by examiner, † Cited by third party
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KR100926034B1 (en) * 2007-10-30 2009-11-11 한국과학기술원 Dual-mode Spectral Imaging Method Using Acousto-optic Modulation Filter, Its System and Optical Instruments Using the Same

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GB0617945D0 (en) * 2006-09-12 2006-10-18 Ucl Business Plc Imaging apparatus and methods
GB201006679D0 (en) 2010-04-21 2010-06-09 Ucl Business Plc Methods and apparatus to control acousto-optic deflectors
EP2629133A4 (en) * 2010-10-14 2017-12-13 Nikon Corporation Structured illumination device, structured illumination microscope device, and surface shape measurement device
GB201106787D0 (en) 2011-04-20 2011-06-01 Ucl Business Plc Methods and apparatus to control acousto-optic deflectors
CN102305601B (en) * 2011-05-18 2012-10-10 天津大学 High-precision non-contact measurement method and device for three-dimensional shape of optical free-form surface
JP5958779B2 (en) * 2012-10-12 2016-08-02 株式会社ニコン Microscope and observation method
US9547241B2 (en) * 2013-05-07 2017-01-17 Asml Netherlands B.V. Alignment sensor, lithographic apparatus and alignment method
CN110168423B (en) * 2016-11-11 2022-08-05 徕卡显微系统复合显微镜有限公司 Illumination device and method for illuminating in a microscope and microscope

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100926034B1 (en) * 2007-10-30 2009-11-11 한국과학기술원 Dual-mode Spectral Imaging Method Using Acousto-optic Modulation Filter, Its System and Optical Instruments Using the Same

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