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KR940015665A - Photosensitive resin composition - Google Patents

Photosensitive resin composition Download PDF

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Publication number
KR940015665A
KR940015665A KR1019920026326A KR920026326A KR940015665A KR 940015665 A KR940015665 A KR 940015665A KR 1019920026326 A KR1019920026326 A KR 1019920026326A KR 920026326 A KR920026326 A KR 920026326A KR 940015665 A KR940015665 A KR 940015665A
Authority
KR
South Korea
Prior art keywords
resin composition
photosensitive resin
glycol diacrylate
parts
photopolymerization initiator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
KR1019920026326A
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Korean (ko)
Other versions
KR950012545B1 (en
Inventor
윤종진
서수형
Original Assignee
하기주
주식회사 코오롱
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Filing date
Publication date
Application filed by 하기주, 주식회사 코오롱 filed Critical 하기주
Priority to KR1019920026326A priority Critical patent/KR950012545B1/en
Publication of KR940015665A publication Critical patent/KR940015665A/en
Application granted granted Critical
Publication of KR950012545B1 publication Critical patent/KR950012545B1/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)

Abstract

결합제 고분자, 광중합개시제 및 다관능성 단량체를 포함하여 이루어진 감광성 수지 조성물에 있어서, 상기한 다관능성 단량체로서 트리메틸롤프로판트리아크릴레이트, 테트라메틸렌글리콜 디아크릴레이트, 트리에틸렌글리콜 디아크릴레이트 및 에틸렌글리콜디아크릴레이트를 함께 사용함을 특징으로 하는 감광성 수지 조성물은 폴리에스테르기재 필름에 대한 접착력이 향상되어 텐팅성 및 해상력이 우수하다.In a photosensitive resin composition comprising a binder polymer, a photopolymerization initiator, and a polyfunctional monomer, trimethylolpropane triacrylate, tetramethylene glycol diacrylate, triethylene glycol diacrylate, and ethylene glycol diacryl as the polyfunctional monomers described above. The photosensitive resin composition using a rate together is excellent in the adhesiveness to a polyester base film and excellent in tentability and resolution.

Description

감광성 수지 조성물Photosensitive resin composition

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

Claims (2)

결합제 고분자, 광중합개시제 및 다관능성 단량체를 포함하여 이루어진 감광성 수지 조성물에 있어서, 상기한 다관능성 단량체로서 트리메틸롤 프로판트리아크릴레이트, 테트라메틸렌글리콜디아크릴레이트, 트리에틸렌글리콜 디아크릴레이트 및 에틸렌글리콜디아크릴레이트를 함께 사용함을 특징으로 하는 감광성 수지 조성물.In a photosensitive resin composition comprising a binder polymer, a photopolymerization initiator, and a polyfunctional monomer, trimethylol propane triacrylate, tetramethylene glycol diacrylate, triethylene glycol diacrylate, and ethylene glycol diacryl are mentioned as the multifunctional monomer. The photosensitive resin composition characterized by using together a rate. 제1항에 있어서, 상기 다관능성 단량체의 함량은 전체 수지조성물 100중량부에 대하여 1내지 50중량부 범위내인 것을 특징으로 하는 감광성 수지 조성물.The photosensitive resin composition according to claim 1, wherein the content of the multifunctional monomer is in the range of 1 to 50 parts by weight based on 100 parts by weight of the total resin composition. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019920026326A 1992-12-30 1992-12-30 Photosensitive resin composition Expired - Fee Related KR950012545B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019920026326A KR950012545B1 (en) 1992-12-30 1992-12-30 Photosensitive resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019920026326A KR950012545B1 (en) 1992-12-30 1992-12-30 Photosensitive resin composition

Publications (2)

Publication Number Publication Date
KR940015665A true KR940015665A (en) 1994-07-21
KR950012545B1 KR950012545B1 (en) 1995-10-18

Family

ID=19347474

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019920026326A Expired - Fee Related KR950012545B1 (en) 1992-12-30 1992-12-30 Photosensitive resin composition

Country Status (1)

Country Link
KR (1) KR950012545B1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100415041B1 (en) * 1998-06-24 2004-01-13 제이에스알 가부시끼가이샤 Radiation-Sensitive Composition for Color Filters

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100415041B1 (en) * 1998-06-24 2004-01-13 제이에스알 가부시끼가이샤 Radiation-Sensitive Composition for Color Filters

Also Published As

Publication number Publication date
KR950012545B1 (en) 1995-10-18

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