KR930012739A - Manufacturing method of diazo-type photosensitive member raw material - Google Patents
Manufacturing method of diazo-type photosensitive member raw material Download PDFInfo
- Publication number
- KR930012739A KR930012739A KR1019910022029A KR910022029A KR930012739A KR 930012739 A KR930012739 A KR 930012739A KR 1019910022029 A KR1019910022029 A KR 1019910022029A KR 910022029 A KR910022029 A KR 910022029A KR 930012739 A KR930012739 A KR 930012739A
- Authority
- KR
- South Korea
- Prior art keywords
- formula
- compound
- reacted
- reacting
- ammonia
- Prior art date
Links
- 239000002994 raw material Substances 0.000 title abstract 2
- 238000004519 manufacturing process Methods 0.000 title 1
- 150000001875 compounds Chemical class 0.000 claims abstract 16
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims abstract 8
- 238000000034 method Methods 0.000 claims abstract 6
- 229910021529 ammonia Inorganic materials 0.000 claims abstract 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract 2
- 125000000217 alkyl group Chemical group 0.000 claims abstract 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract 2
- 229910052799 carbon Inorganic materials 0.000 claims abstract 2
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract 2
- 125000005843 halogen group Chemical group 0.000 claims abstract 2
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract 2
- 239000001257 hydrogen Substances 0.000 claims abstract 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims abstract 2
- 229910052760 oxygen Inorganic materials 0.000 claims abstract 2
- 239000001301 oxygen Substances 0.000 claims abstract 2
- 239000002184 metal Substances 0.000 claims 1
- 229910044991 metal oxide Inorganic materials 0.000 claims 1
- 150000004706 metal oxides Chemical class 0.000 claims 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
- C07D295/14—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
- C07D295/145—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals with the ring nitrogen atoms and the carbon atoms with three bonds to hetero atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Abstract
본 발명은 다음 일반식(Ⅳ)의 화합물과 다음 일반식(Ⅲ)의 화합물을 반응시켜서 다음 일반식(Ⅱ)의 화합물을 제조한 다음 이 일반식(Ⅱ)의 화합물을 암모니아와 반응시켜서 다음 일반식(Ⅰ)의 화합물을 제조하는 방법에 관한 것이며,The present invention is prepared by reacting a compound of formula (IV) with a compound of formula (III) to prepare a compound of formula (II), and then reacting the compound of formula (II) with ammonia To a method for preparing the compound of formula (I),
식중, R1및 R2는 같거나 다르며, 각각 탄소수 1-4의 잭쇄 또는 측쇄의 알킬 그룹이며, R3는 수소 또는 메틸기이며, Z는 산소 또는 탄소원자이며, X는 할로겐 원자이다.Wherein R 1 and R 2 are the same or different and are each a C 1-4 jack or branched alkyl group, R 3 is hydrogen or a methyl group, Z is oxygen or a carbon atom, and X is a halogen atom.
본 발명의 방법으로 일반식(Ⅰ)의 화합물을 높은 수율과 순도 및 낮은 코스트의 원료를 사용하여 제조할 수 있다.The compounds of general formula (I) can be prepared by the process of the invention using raw materials of high yield, purity and low cost.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.
Claims (5)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019910022029A KR940002713B1 (en) | 1991-12-03 | 1991-12-03 | Process for the preparation of photosensitive diazo-type compounds |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019910022029A KR940002713B1 (en) | 1991-12-03 | 1991-12-03 | Process for the preparation of photosensitive diazo-type compounds |
Publications (2)
Publication Number | Publication Date |
---|---|
KR930012739A true KR930012739A (en) | 1993-07-21 |
KR940002713B1 KR940002713B1 (en) | 1994-03-31 |
Family
ID=19324050
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019910022029A KR940002713B1 (en) | 1991-12-03 | 1991-12-03 | Process for the preparation of photosensitive diazo-type compounds |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR940002713B1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20210108993A (en) * | 2018-12-27 | 2021-09-03 | 다이킨 고교 가부시키가이샤 | Process for the preparation of cyclobutene |
-
1991
- 1991-12-03 KR KR1019910022029A patent/KR940002713B1/en not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20210108993A (en) * | 2018-12-27 | 2021-09-03 | 다이킨 고교 가부시키가이샤 | Process for the preparation of cyclobutene |
Also Published As
Publication number | Publication date |
---|---|
KR940002713B1 (en) | 1994-03-31 |
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Date | Code | Title | Description |
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A201 | Request for examination | ||
PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 19911203 |
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PA0201 | Request for examination |
Patent event code: PA02012R01D Patent event date: 19911203 Comment text: Request for Examination of Application |
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PG1501 | Laying open of application | ||
G160 | Decision to publish patent application | ||
PG1605 | Publication of application before grant of patent |
Comment text: Decision on Publication of Application Patent event code: PG16051S01I Patent event date: 19940307 |
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E701 | Decision to grant or registration of patent right | ||
PE0701 | Decision of registration |
Patent event code: PE07011S01D Comment text: Decision to Grant Registration Patent event date: 19940624 |
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PR0701 | Registration of establishment |
Comment text: Registration of Establishment Patent event date: 19940926 Patent event code: PR07011E01D |
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PR1002 | Payment of registration fee |
Payment date: 19940926 End annual number: 3 Start annual number: 1 |
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FPAY | Annual fee payment |
Payment date: 19970127 Year of fee payment: 4 |
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PR1001 | Payment of annual fee |
Payment date: 19970127 Start annual number: 4 End annual number: 4 |
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LAPS | Lapse due to unpaid annual fee | ||
PC1903 | Unpaid annual fee |