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KR930005113A - 광학 박피 지지장치 및 광학 박피와 그 사용 방법 - Google Patents

광학 박피 지지장치 및 광학 박피와 그 사용 방법 Download PDF

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Publication number
KR930005113A
KR930005113A KR1019920015323A KR920015323A KR930005113A KR 930005113 A KR930005113 A KR 930005113A KR 1019920015323 A KR1019920015323 A KR 1019920015323A KR 920015323 A KR920015323 A KR 920015323A KR 930005113 A KR930005113 A KR 930005113A
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KR
South Korea
Prior art keywords
peel
peeling
frame
support
optical
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Granted
Application number
KR1019920015323A
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English (en)
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KR960014053B1 (ko
Inventor
옌 융-차이
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옌 융-차이
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Publication of KR930005113A publication Critical patent/KR930005113A/ko
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Publication of KR960014053B1 publication Critical patent/KR960014053B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/67346—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders characterized by being specially adapted for supporting a single substrate or by comprising a stack of such individual supports
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Toxicology (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Computer Hardware Design (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Eyeglasses (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Folding Of Thin Sheet-Like Materials, Special Discharging Devices, And Others (AREA)

Abstract

내용 없음.

Description

광학 박피 지지장치 및 광학 박피와 그 사용 방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 지지구가 박피를 수용하는 방법을 도시하는, 본 발명 제1실시예의 부분 확대 사시도,
제2도는 박피 프레임의 내부 주변의 가상선으로 도시되어 있는 제1도 실시예의 평면도, 제3도는 제2도의 선(3-3)을 따라 취해진, 박피의 단면의 도시된 확대 단면도로서, 지지구에서 박피를 제거해야 할때 박피를 잡는데 사용된 조작자의 손가락이 가상선으로 그려져 있는 도면.

Claims (9)

  1. 박피 프레임과 박피 멤브레인으로 만들어진 광학 박피 지지 장치로서, 내측 크기가 박피의 외측 크기보다 약간만 큰, 광학 박피를 제거가능하게 수용하는 중심 배치된 윈도우를 형성하여, 자신과 박피 사이에 마찰 끼워 맞춤이 이루어지게 하고, 박피 프레임의 두께를 벗어나지 않게 내향 연장하는, 박피가 얹힐 수 있는 견부들 포함하며, 박피가 제위치에 완충 지지되도록 윈도우에 내향으로 면하는 바이어스 부분을 더 포함하는 실질직으로 단단한 판형부재로 이루어지는 상기 광학 박피 지지 장치.
  2. 제1항에 있어서, 상기 판형 부재는 박피 프레임을 그 외측으로부터 드러나게 하는 한 쌍의 대향된 도려진 부분을 갖어, 박피 프레임을 제거될 수 있도록 파지되게 하는 것을 특징으로 하는 장치.
  3. 제1항에 있어서, 상기 장치와 박피를 지지, 제위치에 정화가게 설치되게 하는 윈도우 외측으로 배치된 적어도 한 쌍의 대향된 정렬 구멍을 더 형성하는 것을 특징으로 하는 장치.
  4. 제1항에 있어서, 상기 바이어스 부분은 일반적으로 박피 프레임 평행한 방향으로 그에 접촉하게 연장하나 장치에 박피가 지지되도록 안쪽으로 약간 편향되는 한 쌍의 탄성 아암으로 이루어지는 것을 특징으로 하는 장치.
  5. 제4항에 있어서, 상기 탄성 아암들은 판형 부재의 일체형 부분으로 이루어지는 것을 특징으로 하는 장치.
  6. 멤브레인과 주변 프레임을 포함하는 광학 박피; 및 박피 프레임 과의 사이에 마찰 끼워맞춤이 존재하도록 내측 크기가 박피 프레임의 외측 크기보다 약간만 큰, 박피를 제거가능하게 수용하는 중심 배치된 윈도우를 형성하고, 박피 프레임으로 부터 내향 연장하는 멤브레인을 초과하지 않도록, 박피 프레임의 두께를 넘지않게 내향 연장하는 박피가 얹힐 수 있는 견부를 포함하며, 박피가 제위치에 완충 지지되도록 박피 프레임의 외측 부분에 면해 접하는 탄성 부분을 더 포함하는 실질적으로 단단한 판형 부재 형태의 정렬 지지구로 이루어지는 지지구-장치식 광학 박피.
  7. 제6항에 있어서, 상기 바이어스 부분은 일반적으로 박피 프레임에 평행한 방향으로 그에 접하게 연장하나 박피가 지지구에 지지되도록 안쪽으로 약간 편향되며, 판형 부재의 일체형 부분으로 이루어지는 한쌍의 탄성 아암으로 이루어지는 것을 특징으로 하는 장치.
  8. 지지구의 바이어스 부분을 편향시킨 후 박피의 후방측이 계속 노출되게 박피의 전방측을 지지구의 제위치로 밀어 넣음으로써 박피를 박피 지지구에 제거가능하게 설치하는 단계; 박피 지지구를 잡아 박피를 검사하는 단계; 박피의 후방측을 포토마스크에 접착 고착함으로써 박피를 포토마스크에 설치하는 단계; 및 지지구를 박피에서 벗겨냄으로써 제거하는 단계를 이루어지는 광학 박피 사용 방법.
  9. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019920015323A 1991-08-26 1992-08-25 광학 펠리클 호울더, 그 호울더와 광학 펠리클 조립체 및 그 사용 방법 Expired - Fee Related KR960014053B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07/749,940 1991-08-26
US07/749,940 US5168993A (en) 1991-08-26 1991-08-26 Optical pellicle holder

Publications (2)

Publication Number Publication Date
KR930005113A true KR930005113A (ko) 1993-03-23
KR960014053B1 KR960014053B1 (ko) 1996-10-11

Family

ID=25015860

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019920015323A Expired - Fee Related KR960014053B1 (ko) 1991-08-26 1992-08-25 광학 펠리클 호울더, 그 호울더와 광학 펠리클 조립체 및 그 사용 방법

Country Status (8)

Country Link
US (1) US5168993A (ko)
EP (1) EP0529826B1 (ko)
JP (1) JP2665433B2 (ko)
KR (1) KR960014053B1 (ko)
AT (1) ATE133918T1 (ko)
CA (1) CA2070257C (ko)
DE (1) DE69208183T2 (ko)
TW (1) TW215512B (ko)

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US11137693B2 (en) 2018-11-30 2021-10-05 Iucf-Hyu (Industry-University Cooperation Foundation Hanyang University) Pellicle holder, pellicle inspection apparatus, and pellicle inspection method

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US11137693B2 (en) 2018-11-30 2021-10-05 Iucf-Hyu (Industry-University Cooperation Foundation Hanyang University) Pellicle holder, pellicle inspection apparatus, and pellicle inspection method

Also Published As

Publication number Publication date
KR960014053B1 (ko) 1996-10-11
EP0529826A1 (en) 1993-03-03
DE69208183T2 (de) 1996-12-12
DE69208183D1 (de) 1996-03-21
CA2070257C (en) 1996-01-30
US5168993A (en) 1992-12-08
TW215512B (ko) 1993-11-01
JPH05197135A (ja) 1993-08-06
JP2665433B2 (ja) 1997-10-22
CA2070257A1 (en) 1993-02-27
ATE133918T1 (de) 1996-02-15
EP0529826B1 (en) 1996-02-07

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