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KR910018562A - Method of treating copper waste liquid by producing basic copper chloride - Google Patents

Method of treating copper waste liquid by producing basic copper chloride Download PDF

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Publication number
KR910018562A
KR910018562A KR1019900005693A KR900005693A KR910018562A KR 910018562 A KR910018562 A KR 910018562A KR 1019900005693 A KR1019900005693 A KR 1019900005693A KR 900005693 A KR900005693 A KR 900005693A KR 910018562 A KR910018562 A KR 910018562A
Authority
KR
South Korea
Prior art keywords
copper
waste liquid
treating
chloride
producing basic
Prior art date
Application number
KR1019900005693A
Other languages
Korean (ko)
Other versions
KR930004476B1 (en
Inventor
이일연
Original Assignee
이일연
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 이일연 filed Critical 이일연
Priority to KR1019900005693A priority Critical patent/KR930004476B1/en
Publication of KR910018562A publication Critical patent/KR910018562A/en
Application granted granted Critical
Publication of KR930004476B1 publication Critical patent/KR930004476B1/en

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G3/00—Compounds of copper
    • C01G3/04—Halides
    • C01G3/05—Chlorides
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B3/00—Extraction of metal compounds from ores or concentrates by wet processes
    • C22B3/20—Treatment or purification of solutions, e.g. obtained by leaching
    • C22B3/44—Treatment or purification of solutions, e.g. obtained by leaching by chemical processes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C23F1/32—Alkaline compositions
    • C23F1/34—Alkaline compositions for etching copper or alloys thereof
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/46—Regeneration of etching compositions

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Removal Of Specific Substances (AREA)
  • ing And Chemical Polishing (AREA)

Abstract

내용 없음.No content.

Description

염기성 염화동 제조에 의한 동폐액의 처리방법Method of treating copper waste liquid by producing basic copper chloride

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제1도는 실시예 1에서 회수한 염기성 염화동의 전자 현미경에 의해 촬영한 사진1 is a photograph taken by an electron microscope of the basic copper chloride recovered in Example 1

Claims (4)

암모니아 동작이온을 함유하는 알칼리 엣칭폐액과 염산함유 염화동폐액을 중화 반응시킨 후 염기성 염화동 및 염화암모늄을 분리, 회수함을 특징으로 하는 동폐액의 처리법.A process for treating copper waste, characterized in that the alkaline etching waste liquid containing ammonia operating ions and copper chloride containing hydrochloric acid are neutralized to separate and recover basic copper chloride and ammonium chloride. 제1항에 있어서, 반응혼합물의 pH를 3 내지 6으로 조정함이 특징인 방법.The method of claim 1 wherein the pH of the reaction mixture is adjusted to 3-6. 제1항 또는 제3항에 있어서, 반응온도를 50℃ 이상이 특징인 방법.The method according to claim 1 or 3, wherein the reaction temperature is 50 ° C or higher. 제1항에 있어서, 분리된 염화암모늄액중의 잔존하는 소량의 동이온을 제거하기 위하여 여액의 pH를 암모니아수로 pH 6∼7로 조정한 후 황화물로 처리하여 황화동을 침전, 분리함이 특징인 방법.The method of claim 1, wherein the pH of the filtrate is adjusted to pH 6-7 with ammonia water in order to remove the small amount of copper ions remaining in the separated ammonium chloride solution, followed by treatment with sulfide to precipitate and separate copper sulfide. Way. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019900005693A 1990-04-23 1990-04-23 Recovery of basic copper chloride from copper waste KR930004476B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019900005693A KR930004476B1 (en) 1990-04-23 1990-04-23 Recovery of basic copper chloride from copper waste

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019900005693A KR930004476B1 (en) 1990-04-23 1990-04-23 Recovery of basic copper chloride from copper waste

Publications (2)

Publication Number Publication Date
KR910018562A true KR910018562A (en) 1991-11-30
KR930004476B1 KR930004476B1 (en) 1993-05-27

Family

ID=19298269

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019900005693A KR930004476B1 (en) 1990-04-23 1990-04-23 Recovery of basic copper chloride from copper waste

Country Status (1)

Country Link
KR (1) KR930004476B1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108185150B (en) * 2017-12-18 2021-08-03 广州科城环保科技有限公司 Basic copper chloride particulate matter and preparation method thereof

Also Published As

Publication number Publication date
KR930004476B1 (en) 1993-05-27

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