KR910016818A - 경화성 수지, 그의 제조 방법 및 전자부품용 보호막 - Google Patents
경화성 수지, 그의 제조 방법 및 전자부품용 보호막 Download PDFInfo
- Publication number
- KR910016818A KR910016818A KR1019910004557A KR910004557A KR910016818A KR 910016818 A KR910016818 A KR 910016818A KR 1019910004557 A KR1019910004557 A KR 1019910004557A KR 910004557 A KR910004557 A KR 910004557A KR 910016818 A KR910016818 A KR 910016818A
- Authority
- KR
- South Korea
- Prior art keywords
- curable resin
- organic group
- integer
- structural formula
- protective film
- Prior art date
Links
- 239000011347 resin Substances 0.000 title claims 4
- 229920005989 resin Polymers 0.000 title claims 4
- 238000004519 manufacturing process Methods 0.000 title claims 2
- 230000001681 protective effect Effects 0.000 title claims 2
- 125000000962 organic group Chemical group 0.000 claims 6
- 125000003118 aryl group Chemical group 0.000 claims 2
- 125000004432 carbon atom Chemical group C* 0.000 claims 2
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 2
- 239000004642 Polyimide Substances 0.000 claims 1
- -1 aminosilicon compound Chemical class 0.000 claims 1
- 229920001721 polyimide Polymers 0.000 claims 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/42—Block-or graft-polymers containing polysiloxane sequences
- C08G77/452—Block-or graft-polymers containing polysiloxane sequences containing nitrogen-containing sequences
- C08G77/455—Block-or graft-polymers containing polysiloxane sequences containing nitrogen-containing sequences containing polyamide, polyesteramide or polyimide sequences
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1057—Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain
- C08G73/106—Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain containing silicon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/18—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
- H01B3/30—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
- H01B3/303—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups H01B3/38 or H01B3/302
- H01B3/306—Polyimides or polyesterimides
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Indole Compounds (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Paints Or Removers (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
Claims (3)
- 하기 구조식(Ⅰ)의 경화성 수지.상기 식 중, R1및 R2는 서로 동일하거나 또는 상이한 것으로서, 탄소수 1 내지 10의 치환되지 않거나 또는 치환된 1가 탄화수소기이고, R3은 2가 유기기이며, X는 방향족 고리를 함유하는 4가 유기기이고, Y는 2가 유기기이며, m은 1 내지 3의 정수이고, n은 1 이상의 정수이다.
- 하기 구조식(Ⅱ)의 폴리이미드와 하기 구조식(Ⅲ)의 아미노실리콘 화합물을 반응시킴을 특징으로 하는 하기 구조식(Ⅰ)의 경화성 수지를 제조하는 방법.(R'O)mR2 (3-m)SiR3NH2(Ⅲ)상기 식 중 R1및 R2는 서로 동일하거나 또는 상이한 것으로서, 탄소수 1 내지 10의 치환되지 않거나 또는 치환된 1가 탄화수소기이고, R3은 2가 유기기이며, X는 방향족 고리를 함유하는 4가 유기기이고, Y는 2가 유기기이며, m은 1 내지 3의 정수이고, n은 1 이상의 정수이다.
- 제1항 기재의 경화성 수지를 경화시킨 전자부품 보호막.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2073971A JP2606402B2 (ja) | 1990-03-23 | 1990-03-23 | 硬化性樹脂及びその製造方法 |
JP2-73971 | 1990-03-23 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR910016818A true KR910016818A (ko) | 1991-11-05 |
Family
ID=13533482
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019910004557A KR910016818A (ko) | 1990-03-23 | 1991-03-22 | 경화성 수지, 그의 제조 방법 및 전자부품용 보호막 |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP0448359A1 (ko) |
JP (1) | JP2606402B2 (ko) |
KR (1) | KR910016818A (ko) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2712993B2 (ja) * | 1992-01-17 | 1998-02-16 | 信越化学工業株式会社 | 硬化性樹脂、その溶液及びその製造法並びに電子部品用保護膜 |
JP2674415B2 (ja) * | 1992-01-27 | 1997-11-12 | 信越化学工業株式会社 | 感光性樹脂組成物及び電子部品用保護膜 |
DE4240274B4 (de) * | 1992-12-01 | 2004-02-12 | Minnesota Mining And Manufacturing Co., Saint Paul | Polysiloxane mit fluoraliphaten- und carboxylhaltigen terminalen Gruppen, ihre Herstellung und ihre Verwendung bei der Behandlung von Fasersubstraten |
MY124687A (en) * | 1998-05-20 | 2006-06-30 | Hitachi Chemical Co Ltd | Insulating adhesive for electronic parts, and lead frame and semiconductor device using the same |
US8491997B2 (en) * | 2006-06-22 | 2013-07-23 | Sabic Innovative Plastics Ip B.V. | Conductive wire comprising a polysiloxane/polyimide copolymer blend |
US8071693B2 (en) | 2006-06-22 | 2011-12-06 | Sabic Innovative Plastics Ip B.V. | Polysiloxane/polyimide copolymers and blends thereof |
US20080236864A1 (en) | 2007-03-28 | 2008-10-02 | General Electric Company | Cross linked polysiloxane/polyimide copolymers, methods of making, blends thereof, and articles derived therefrom |
US8013251B2 (en) | 2008-03-17 | 2011-09-06 | Sabic Innovative Plastics Ip B.V. | Electrical wire comprising an aromatic polyketone and polysiloxane/polyimide block copolymer composition |
TWI635139B (zh) * | 2017-03-02 | 2018-09-11 | 律勝科技股份有限公司 | 感光性透明樹脂 |
JP7088640B2 (ja) * | 2017-08-01 | 2022-06-21 | 旭化成株式会社 | 半導体装置、及びその製造方法 |
JP7088639B2 (ja) * | 2017-08-01 | 2022-06-21 | 旭化成株式会社 | 半導体装置、及びその製造方法 |
JP7088636B2 (ja) * | 2017-07-11 | 2022-06-21 | 旭化成株式会社 | 半導体装置、及びその製造方法 |
JP7088638B2 (ja) * | 2017-08-01 | 2022-06-21 | 旭化成株式会社 | 半導体装置、及びその製造方法 |
JP2019029556A (ja) * | 2017-08-01 | 2019-02-21 | 旭化成株式会社 | 半導体装置、及びその製造方法 |
WO2025013912A1 (ja) * | 2023-07-10 | 2025-01-16 | Agc株式会社 | 化合物、組成物、表面処理剤、物品、及び物品の製造方法 |
WO2025013913A1 (ja) * | 2023-07-10 | 2025-01-16 | Agc株式会社 | 化合物、組成物、表面処理剤、物品の製造方法及び物品 |
CN118772407B (zh) * | 2024-09-09 | 2025-01-07 | 济南大学 | 一种聚酰亚胺复合材料用大分子硅烷偶联剂及其制备方法和应用 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3948835A (en) * | 1973-06-07 | 1976-04-06 | Ciba-Geigy Corporation | Silicon-modified prepolymers |
US4758476A (en) * | 1984-12-12 | 1988-07-19 | Hitachi Chemical Company, Ltd. | Polyimide precursor resin composition and semiconductor device using the same |
JPS61207438A (ja) * | 1985-03-11 | 1986-09-13 | Chisso Corp | 可溶性ポリイミドシロキサン前駆体及びその製造方法 |
JPH0617474B2 (ja) * | 1985-05-31 | 1994-03-09 | チッソ株式会社 | 高接着性シリコン含有ポリアミド酸の製造法 |
US4609700A (en) * | 1985-06-19 | 1986-09-02 | Chisso Corporation | Soluble imide oligomer and a method for producing the same |
JPS61293227A (ja) * | 1985-06-21 | 1986-12-24 | Chisso Corp | s−トリアジン環を有する可溶性ポリイミドシロキサン前駆体の製造法 |
JPH0768347B2 (ja) * | 1985-09-25 | 1995-07-26 | 株式会社日立製作所 | 有機ケイ素末端ポリイミド前駆体とポリイミドの製造方法 |
JPH0623251B2 (ja) * | 1986-02-03 | 1994-03-30 | チッソ株式会社 | 架橋ポリイミドシロキサンの製造方法 |
JPH0791378B2 (ja) * | 1986-02-04 | 1995-10-04 | チッソ株式会社 | 架橋シリコン含有ポリイミドの製造法 |
US4795680A (en) * | 1986-05-09 | 1989-01-03 | General Electric Company | Polyimide-siloxanes, method of making and use |
JPS6315223A (ja) * | 1986-07-08 | 1988-01-22 | Chisso Corp | 液晶配向膜用塗布液及び加熱により形成された液晶配向膜 |
JPH0819234B2 (ja) * | 1987-06-29 | 1996-02-28 | チッソ株式会社 | 低熱膨脹性かつ高接着性のシリコン含有ポリイミド前駆体の製造法 |
JPS6416831A (en) * | 1987-07-09 | 1989-01-20 | Chisso Corp | Solution of heat-resistant photosensitive material |
JP2607104B2 (ja) * | 1987-11-11 | 1997-05-07 | チッソ株式会社 | シリコン含有ポリイミド硬化物及びその製造法 |
JPH01156371A (ja) * | 1987-12-14 | 1989-06-19 | Chisso Corp | カラーフイルター保護膜用ワニス |
JPH0749524B2 (ja) * | 1988-07-01 | 1995-05-31 | 旭硝子株式会社 | ポリアミツク酸組成物およびその製造方法 |
-
1990
- 1990-03-23 JP JP2073971A patent/JP2606402B2/ja not_active Expired - Fee Related
-
1991
- 1991-03-19 EP EP91302379A patent/EP0448359A1/en not_active Withdrawn
- 1991-03-22 KR KR1019910004557A patent/KR910016818A/ko not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
JPH03275722A (ja) | 1991-12-06 |
JP2606402B2 (ja) | 1997-05-07 |
EP0448359A1 (en) | 1991-09-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 19910322 |
|
PG1501 | Laying open of application | ||
PC1203 | Withdrawal of no request for examination | ||
WITN | Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid |