KR910012802A - Photosensitive resin composition - Google Patents
Photosensitive resin compositionInfo
- Publication number
- KR910012802A KR910012802A KR1019890019445A KR890019445A KR910012802A KR 910012802 A KR910012802 A KR 910012802A KR 1019890019445 A KR1019890019445 A KR 1019890019445A KR 890019445 A KR890019445 A KR 890019445A KR 910012802 A KR910012802 A KR 910012802A
- Authority
- KR
- South Korea
- Prior art keywords
- resin composition
- photosensitive resin
- water
- soluble
- acetamide
- Prior art date
Links
- 239000011342 resin composition Substances 0.000 title claims 3
- DLFVBJFMPXGRIB-UHFFFAOYSA-N Acetamide Chemical compound CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 claims 2
- 239000004014 plasticizer Substances 0.000 claims 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 claims 1
- 239000004372 Polyvinyl alcohol Substances 0.000 claims 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims 1
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical group OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 claims 1
- 239000004202 carbamide Substances 0.000 claims 1
- 229920002451 polyvinyl alcohol Polymers 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
- 239000004094 surface-active agent Substances 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Materials For Photolithography (AREA)
Abstract
내용 없음.No content.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.
Claims (2)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019890019445A KR910010255B1 (en) | 1989-12-23 | 1989-12-23 | Photosensitive resin composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019890019445A KR910010255B1 (en) | 1989-12-23 | 1989-12-23 | Photosensitive resin composition |
Publications (2)
Publication Number | Publication Date |
---|---|
KR910012802A true KR910012802A (en) | 1991-08-08 |
KR910010255B1 KR910010255B1 (en) | 1991-12-24 |
Family
ID=19293594
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019890019445A KR910010255B1 (en) | 1989-12-23 | 1989-12-23 | Photosensitive resin composition |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR910010255B1 (en) |
-
1989
- 1989-12-23 KR KR1019890019445A patent/KR910010255B1/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR910010255B1 (en) | 1991-12-24 |
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Legal Events
Date | Code | Title | Description |
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A201 | Request for examination | ||
PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 19891223 |
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PA0201 | Request for examination |
Patent event code: PA02012R01D Patent event date: 19891223 Comment text: Request for Examination of Application |
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PG1501 | Laying open of application | ||
G160 | Decision to publish patent application | ||
PG1605 | Publication of application before grant of patent |
Comment text: Decision on Publication of Application Patent event code: PG16051S01I Patent event date: 19911122 |
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E701 | Decision to grant or registration of patent right | ||
PE0701 | Decision of registration |
Patent event code: PE07011S01D Comment text: Decision to Grant Registration Patent event date: 19920321 |
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GRNT | Written decision to grant | ||
PR0701 | Registration of establishment |
Comment text: Registration of Establishment Patent event date: 19920331 Patent event code: PR07011E01D |
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PR1002 | Payment of registration fee |
Payment date: 19920331 End annual number: 3 Start annual number: 1 |
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FPAY | Annual fee payment |
Payment date: 19991129 Year of fee payment: 9 |
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LAPS | Lapse due to unpaid annual fee | ||
PC1903 | Unpaid annual fee |