KR910005158B1 - 진공연속 처리장치 - Google Patents
진공연속 처리장치 Download PDFInfo
- Publication number
- KR910005158B1 KR910005158B1 KR1019880005390A KR880005390A KR910005158B1 KR 910005158 B1 KR910005158 B1 KR 910005158B1 KR 1019880005390 A KR1019880005390 A KR 1019880005390A KR 880005390 A KR880005390 A KR 880005390A KR 910005158 B1 KR910005158 B1 KR 910005158B1
- Authority
- KR
- South Korea
- Prior art keywords
- vacuum
- slit
- processed
- seal
- workpiece
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C67/00—Shaping techniques not covered by groups B29C39/00 - B29C65/00, B29C70/00 or B29C73/00
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
- B01J3/03—Pressure vessels, or vacuum vessels, having closure members or seals specially adapted therefor
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
- B01J3/002—Component parts of these vessels not mentioned in B01J3/004, B01J3/006, B01J3/02 - B01J3/08; Measures taken in conjunction with the process to be carried out, e.g. safety measures
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/14—Surface shaping of articles, e.g. embossing; Apparatus therefor by plasma treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C71/00—After-treatment of articles without altering their shape; Apparatus therefor
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Physical Vapour Deposition (AREA)
- Sealing Devices (AREA)
Abstract
Description
Claims (6)
- 진공처리실(1)의 전후방측에 각각 적어도 1개의 예비진공실(2,3)을 배치한 진공연속 처리장치에 있어서, 상기 예비진공실(2,3)은 피처리물을 통과시킴과 동시에 진공처리실(1)을 처리실 밖으로부터 시일하는 슬릿상의 시일장치(S)를 가지고, 해당시일장치(S)의 전후 또는 한쪽에 피처리물을 안내하는 안내부재(25,26)을 설치하고, 해당 안내부(25,26)를 장력검출기(37)가 검출하는 피처리물의 장력에 따라 피처리물의 반송방향과 수직인 방향으로 이동 가능하게 설치하고, 상기 시일장치(S)는 슬릿을 형성하는 부재(14,15)를 피처리물의 반송방향과 수직방향으로 이동 가능하게 설치한 것을 특징으로 하는 진공연속 처리장치.
- 제1항에 있어서, 상기 시일장치(S)는 평판형상의 한 쪽의 부재(14)와, 그 한쪽의 다른쪽의 부재(13)와, 그 다른쪽의 부재(13)의 요(凹)부에 수납되어 상기 한쪽의 부재(14)와 대향하는 면에서 피처리물이 통과하는 슬릿을 형성하는 평판부재(15)와, 평판부재(15)를 피처리물의 반송방향과 수직인 방향으로 이동시키는 수단으로 구성한 것을 특징으로 하는 진공연속 처리장치.
- 진공처리실(1)의 전후방측에 각각 적어도 1개의 예비진공실(2,3)을 배치한 진공연속 처리장치에 있어서, 상기 예비진공실(2,3)은 피처리물을 반송함과 동시에 진공처리실을 처리실 밖으로부터 시일하는 슬릿상의 시일장치(S)를 가지고, 그 시일장치(S)의 전후 또는 한쪽에 피처리물을 안내부재(25,26)를 설치하고, 상기 슬릿장치의 슬릿부 내에서 에어분출구(101a,101b)를 설치한 것을 특징으로 하는 진공연속 처리장치.
- 제3항에 있어서, 상기 분출구(101a,101b)가 슬릿상 시일면과 수직으로 향하고 있는 것을 특징으로하는 진공연속 처리장치.
- 진공처리실(1)의 전후방측에 각각 적어도 1개의 예비진공실(2,3)을 배치한 진공연속 처리장치에 있어서, 상기 예비진공실(2,3)은 피처리물을 반송함과 동시에 진공처리실을 처리실 밖으로부터 시일하는 슬릿상의 시일장치(S)를 가지고 해당 시일장치(S)의 전후 또는 한쪽에 피처리물을 안내하는 안내부재(25,26)를 설치하고, 또 상기 피처리물의 두께를 측정하는 검출기(68)와 그 검출기(68)로 부터의 신호에 의하여 슬릿상 시일장치의 간극을 제어하는 제어장치(69)를 설치한 것을 특징으로 하는 진공연속 처리장치.
- 제5항에 있어서, 상기 슬릿상 시일장치 간극의 제어장치(69)로서 슬릿상 간극을 조정하는 스탭핑모터(66)를 구비한 것을 특징으로 하는 진공연속 처리장치.
Applications Claiming Priority (9)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP87-139751 | 1987-06-05 | ||
JP62-139754 | 1987-06-05 | ||
JP87-139754 | 1987-06-05 | ||
JP87-139755 | 1987-06-05 | ||
JP62-139751 | 1987-06-05 | ||
JP62-139755 | 1987-06-05 | ||
JP13975587A JPS63305141A (ja) | 1987-06-05 | 1987-06-05 | 真空連続処理装置 |
JP62139751A JPS63304034A (ja) | 1987-06-05 | 1987-06-05 | 真空連続処理装置 |
JP62139754A JPS63305140A (ja) | 1987-06-05 | 1987-06-05 | 真空連続処理装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR890000226A KR890000226A (ko) | 1989-03-13 |
KR910005158B1 true KR910005158B1 (ko) | 1991-07-23 |
Family
ID=27317938
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019880005390A Expired KR910005158B1 (ko) | 1987-06-05 | 1988-05-10 | 진공연속 처리장치 |
Country Status (4)
Country | Link |
---|---|
US (1) | US5016561A (ko) |
EP (1) | EP0293929B1 (ko) |
KR (1) | KR910005158B1 (ko) |
DE (1) | DE3865532D1 (ko) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05507383A (ja) * | 1990-05-10 | 1993-10-21 | イーストマン・コダック・カンパニー | 連続的材料のプラズマ処理装置 |
US5198033A (en) * | 1991-10-31 | 1993-03-30 | Medtronic, Inc. | Continuous plasma surface treatment apparatus for running length polymeric tubing |
JP3315238B2 (ja) * | 1994-02-10 | 2002-08-19 | 富士写真フイルム株式会社 | 感光材料用支持体の真空処理用シール方法及び装置 |
US5826773A (en) * | 1997-01-31 | 1998-10-27 | Straemke; Siegfried | Rope material transfer structure |
US5997963A (en) * | 1998-05-05 | 1999-12-07 | Ultratech Stepper, Inc. | Microchamber |
ES2222567T5 (es) † | 1998-11-26 | 2009-04-16 | Arcelormittal France | Recinto de estanqueidad para camara de vacio. |
JP4245271B2 (ja) * | 2000-02-03 | 2009-03-25 | 富士通コンポーネント株式会社 | タッチパネル用導電膜付きフィルムの製造方法、製造装置、および製造されたフィルム |
DE102006025751B4 (de) * | 2006-05-31 | 2010-12-23 | Von Ardenne Anlagentechnik Gmbh | Verfahren zur Abdichtung einer Vakuumkammer und Schleuseneinrichtung für eine Vakuumkammer |
WO2009094622A2 (en) * | 2008-01-24 | 2009-07-30 | Microcontinuum, Inc. | Vacuum coating techniques |
KR20090101738A (ko) * | 2008-03-24 | 2009-09-29 | 삼성전기주식회사 | 진공증착장치 및 그 제어방법 |
JP5641877B2 (ja) * | 2010-10-29 | 2014-12-17 | 株式会社神戸製鋼所 | プラズマcvd装置 |
EP4200461A4 (en) * | 2020-08-21 | 2024-09-18 | Applied Materials, Inc. | PROCESSING SYSTEM FOR PROCESSING A FLEXIBLE SUBSTRATE AND METHOD FOR MEASURING A PROPERTY OF A FLEXIBLE SUBSTRATE |
KR102612764B1 (ko) * | 2022-05-24 | 2023-12-12 | 주식회사 티에스이 | 반도체 패키지의 테스트 장치 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1250759A (ko) * | 1968-01-23 | 1971-10-20 | ||
US3829038A (en) * | 1968-07-24 | 1974-08-13 | W Studer | Tape recording transport control system |
US3606201A (en) * | 1969-07-15 | 1971-09-20 | Sperry Rand Corp | Constant speed,constant tension tape transport |
US3787690A (en) * | 1971-12-17 | 1974-01-22 | Bell & Howell Co | Tension transducer |
JPS5718737A (en) * | 1980-06-21 | 1982-01-30 | Shin Etsu Chem Co Ltd | Apparatus for continuous plasma treatment |
US4492181A (en) * | 1982-03-19 | 1985-01-08 | Sovonics Solar Systems | Apparatus for continuously producing tandem amorphous photovoltaic cells |
US4480585A (en) * | 1983-06-23 | 1984-11-06 | Energy Conversion Devices, Inc. | External isolation module |
US4841908A (en) * | 1986-06-23 | 1989-06-27 | Minnesota Mining And Manufacturing Company | Multi-chamber deposition system |
-
1988
- 1988-05-10 KR KR1019880005390A patent/KR910005158B1/ko not_active Expired
- 1988-06-03 DE DE8888108938T patent/DE3865532D1/de not_active Expired - Lifetime
- 1988-06-03 US US07/201,758 patent/US5016561A/en not_active Expired - Fee Related
- 1988-06-03 EP EP88108938A patent/EP0293929B1/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0293929B1 (en) | 1991-10-16 |
EP0293929A1 (en) | 1988-12-07 |
US5016561A (en) | 1991-05-21 |
KR890000226A (ko) | 1989-03-13 |
DE3865532D1 (de) | 1991-11-21 |
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