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KR900015267A - 반도체 소자의 패턴 형성방법 - Google Patents

반도체 소자의 패턴 형성방법 Download PDF

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Publication number
KR900015267A
KR900015267A KR1019890003219A KR890003219A KR900015267A KR 900015267 A KR900015267 A KR 900015267A KR 1019890003219 A KR1019890003219 A KR 1019890003219A KR 890003219 A KR890003219 A KR 890003219A KR 900015267 A KR900015267 A KR 900015267A
Authority
KR
South Korea
Prior art keywords
semiconductor device
pattern formation
formation method
photoresist
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
KR1019890003219A
Other languages
English (en)
Other versions
KR0129192B1 (ko
Inventor
허훈
박근원
김승운
Original Assignee
이만용
금성반도체 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 이만용, 금성반도체 주식회사 filed Critical 이만용
Priority to KR1019890003219A priority Critical patent/KR0129192B1/ko
Publication of KR900015267A publication Critical patent/KR900015267A/ko
Application granted granted Critical
Publication of KR0129192B1 publication Critical patent/KR0129192B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

내용 없음.

Description

반도체 소자의 패턴 형성방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제2도의 (가) 내지 (바)는 본 발명의 패턴 형성과정을 보인 설명도.

Claims (1)

  1. 포토레지스트(51)를 코팅하여 소프트 베이크 처리를 하고, 이어서 레티클(52)을 통해 노광시킴과 아울러 베이크 처리를 하며, 이후 그 포토레지스터(51) 상부에 투사시키는 노광에너지를 가장 수직적으로 포토레지스트 프로파일을 나타내는 임계치 에너지보다 약 30％ 이상 인가하여 부(-)경사진 패턴을 형성하는 반도체 소자의 패턴 형성방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019890003219A 1989-03-15 1989-03-15 반도체 소자의 패턴 형성방법 Expired - Fee Related KR0129192B1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019890003219A KR0129192B1 (ko) 1989-03-15 1989-03-15 반도체 소자의 패턴 형성방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019890003219A KR0129192B1 (ko) 1989-03-15 1989-03-15 반도체 소자의 패턴 형성방법

Publications (2)

Publication Number Publication Date
KR900015267A true KR900015267A (ko) 1990-10-26
KR0129192B1 KR0129192B1 (ko) 1998-04-07

Family

ID=19284553

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019890003219A Expired - Fee Related KR0129192B1 (ko) 1989-03-15 1989-03-15 반도체 소자의 패턴 형성방법

Country Status (1)

Country Link
KR (1) KR0129192B1 (ko)

Also Published As

Publication number Publication date
KR0129192B1 (ko) 1998-04-07

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