[go: up one dir, main page]

KR890702240A - 내구성 패턴 형성용 부재 - Google Patents

내구성 패턴 형성용 부재

Info

Publication number
KR890702240A
KR890702240A KR1019880701566A KR880701566A KR890702240A KR 890702240 A KR890702240 A KR 890702240A KR 1019880701566 A KR1019880701566 A KR 1019880701566A KR 880701566 A KR880701566 A KR 880701566A KR 890702240 A KR890702240 A KR 890702240A
Authority
KR
South Korea
Prior art keywords
forming
durability
compound
general formula
pattern according
Prior art date
Application number
KR1019880701566A
Other languages
English (en)
Other versions
KR930001852B1 (ko
Inventor
시게오 모리
아쯔노리 야구찌
Original Assignee
홍고오 므쯔미
이데미쯔세끼유 가가꾸 가부시기가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP19963687A external-priority patent/JPH077207B2/ja
Application filed by 홍고오 므쯔미, 이데미쯔세끼유 가가꾸 가부시기가이샤 filed Critical 홍고오 므쯔미
Publication of KR890702240A publication Critical patent/KR890702240A/ko
Application granted granted Critical
Publication of KR930001852B1 publication Critical patent/KR930001852B1/ko

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/48—Protective coatings
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S428/00—Stock material or miscellaneous articles
    • Y10S428/901—Printed circuit
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S428/00—Stock material or miscellaneous articles
    • Y10S428/913—Material designed to be responsive to temperature, light, moisture
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/21—Circular sheet or circular blank
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/23—Sheet including cover or casing
    • Y10T428/239—Complete cover or casing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24851—Intermediate layer is discontinuous or differential
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24851—Intermediate layer is discontinuous or differential
    • Y10T428/24868—Translucent outer layer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24851—Intermediate layer is discontinuous or differential
    • Y10T428/24868—Translucent outer layer
    • Y10T428/24876—Intermediate layer contains particulate material [e.g., pigment, etc.]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24917—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including metal layer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31855—Of addition polymer from unsaturated monomers
    • Y10T428/31909—Next to second addition polymer from unsaturated monomers
    • Y10T428/31928—Ester, halide or nitrile of addition polymer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Paints Or Removers (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)

Abstract

내용 없음

Description

내구성 패턴 형성용 부재
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (9)

  1. 소망형상의 패턴이 형성된 포토마스크기판 또는 리스필름 기재위에, 경화성 화합물의 경화보호막을 형성해서 이루어진 것을 특징으로 하는 내구성 패턴형성용 부재.
  2. 제 1 항에 있어서, 상기 포토마스크기판이, 청판유리 또는 백판유리인 내구성 패턴형성용 기판.
  3. 제 1 항에 있어서, 상기 리스필름기재가 폴리에스테르인 내구성 패턴 형성용 부재.
  4. 제 1 항에 있어서, 상기 경화성 화합물이 경화성 포스파젠화합물인 내구성 패턴 형성용 부재.
  5. 제 4 항에 있어서, 상기 경화성 포스파젠화합물이, 일반식(I)
    (식중의 X 및 Y는, 각각 중합경화성기 또는 비중합경화성기로서, 그것들은 동일해도 좋고, 서로 상이해도 좋지만, 적어도 한 쪽은 중합경화성기이고, P 및 q는 각각 0 이상의 수이고, 그들의 합계는 2이며, n은 3 이상의 정수이다)로 표시되는 화합물인 내구성 패턴형성용 부재.
  6. 제 5 항에 있어서, 상기 일반식(I)에 있어서의 X 및 Y가, 일반식(II)
    (식중의 R는 탄소수 1∼12의 알킬렌기, Z는 수소원자 또는 메틸기이다)로 표시되는 기인 내구성 패턴형성용 부재.
  7. 제 6 항에 있어서, 상기 일반식(I)에 있어서의 X 및 Y가 메타크릴레이트류 또는 아크릴 레이트 류속의 수산기로부터 수소원자를 제외한 잔기인 내구성 패턴 형성용 부재.
  8. 제 7 항에 있어서, 상기 메타크릴레이트류가 2-히드록시에틸메타크릴레이트인 내구성 패턴 형성용 부재.
  9. 제 7 항에 있어서, 상기 아크릴레이트류가 2-히드록시에틸아크릴레이트인 내구성 패턴 형성용 부재.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019880701566A 1987-08-10 1988-06-06 내구성 패턴 형성용부재 KR930001852B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP87-199636 1987-08-10
JP19963687A JPH077207B2 (ja) 1987-05-16 1987-08-10 耐久性パタ−ン形成用部材
JP62-199636 1987-08-10
PCT/JP1988/000546 WO1989001650A1 (en) 1987-08-10 1988-06-06 Durable patterning member

Publications (2)

Publication Number Publication Date
KR890702240A true KR890702240A (ko) 1989-12-23
KR930001852B1 KR930001852B1 (ko) 1993-03-15

Family

ID=16411142

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019880701566A KR930001852B1 (ko) 1987-08-10 1988-06-06 내구성 패턴 형성용부재

Country Status (4)

Country Link
US (1) US5051295A (ko)
EP (1) EP0328648A4 (ko)
KR (1) KR930001852B1 (ko)
WO (1) WO1989001650A1 (ko)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH034420A (ja) * 1989-05-31 1991-01-10 Idemitsu Petrochem Co Ltd タッチパネル
EP0571625B1 (en) * 1990-06-20 2001-06-06 Dai Nippon Printing Co., Ltd. Color filter and method of manufacturing the same
EP0464749B1 (en) * 1990-07-02 1995-10-04 Canon Kabushiki Kaisha Image holding member
JP4601769B2 (ja) * 2000-05-25 2010-12-22 株式会社きもと フォトマスク用保護膜転写シート及び保護膜転写方法
DE10255664B4 (de) * 2002-11-28 2006-05-04 Kodak Polychrome Graphics Gmbh Für lithographische Druckplatten geeignete Photopolymerzusammensetzung
US20040265704A1 (en) * 2003-06-26 2004-12-30 Taiwan Semiconductor Manufacturing Co., Ltd. Multiple-exposure defect elimination
US9752022B2 (en) 2008-07-10 2017-09-05 Avery Dennison Corporation Composition, film and related methods
RU2571140C2 (ru) 2010-03-04 2015-12-20 Авери Деннисон Корпорейшн Не содержащая пвх пленка и не содержащая пвх многослойная пленка
JP6084353B2 (ja) * 2010-12-28 2017-02-22 太陽インキ製造株式会社 光硬化性樹脂組成物の製造方法、ドライフィルムの製造方法、硬化物の製造方法およびプリント配線板の製造方法
CN105899587A (zh) 2013-12-30 2016-08-24 艾利丹尼森公司 聚氨酯保护性膜

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1180805A (en) * 1966-06-30 1970-02-11 Ibm A Process for Forming Protective Coatings on Glass Photographic Masters.
JPS49105469A (ko) * 1973-02-07 1974-10-05
JPS5634857B2 (ko) * 1973-04-20 1981-08-13
US3892973A (en) * 1974-02-15 1975-07-01 Bell Telephone Labor Inc Mask structure for X-ray lithography
JPS5829619B2 (ja) * 1975-03-26 1983-06-23 日本電気株式会社 シヤシンシヨツコクヨウホトマスク
JPS5330331A (en) * 1976-09-02 1978-03-22 Konishiroku Photo Ind Co Ltd Treatment of silver halide photographic photosensitive material
US4108805A (en) * 1977-09-06 1978-08-22 Armstrong Cork Company Structurally regulated polyphosphazene copolymers
US4242491A (en) * 1978-09-08 1980-12-30 The Firestone Tire & Rubber Company Polyphosphazene polymers containing substituents of acrylate functionality
JPS584338B2 (ja) * 1978-11-20 1983-01-26 富士通株式会社 レジスト剥離防止方法
JPS55158113A (en) * 1979-05-25 1980-12-09 Univ California Method of polymerizing inorganiccelementtcontaining monomer by plasma* and product resulting from said polymerization
US4264531A (en) * 1979-11-14 1981-04-28 Ethyl Corporation Liquid, linear phosphazene prepolymers and process for preparing same
JPS57179850A (en) * 1981-04-30 1982-11-05 Fujitsu Ltd Keeping method for photo mask
JPS592449A (ja) * 1982-06-28 1984-01-09 Fujitsu Ltd 等化処理方式
JPS5950444A (ja) * 1982-09-16 1984-03-23 Tokyo Ohka Kogyo Co Ltd 微細加工用ホトマスク
US4543319A (en) * 1982-12-30 1985-09-24 International Business Machines Corporation Polystyrene-tetrathiafulvalene polymers as deep-ultraviolet mask material
FR2539746B1 (fr) * 1983-01-21 1986-01-10 Charbonnages Ste Chimique Compositions de polymeres acryliques ignifuges et leur procede de preparation
DE3421773A1 (de) * 1983-07-27 1985-02-07 Siemens AG, 1000 Berlin und 8000 München Verfahren zum herstellen von masshaltigen strukturen mit hohem aspektverhaeltnis im 1 (pfeil abwaerts)/(pfeil abwaerts)um-bereich und darunter fuer die mikroelektronik und anwendung dieses verfahrens zur herstellung einer roentgenabsorbermaske
JPH0657716B2 (ja) * 1984-08-15 1994-08-03 学校法人日本大学 歯科重合硬化性ホスフアゼン化合物
US4623676A (en) * 1985-01-18 1986-11-18 Minnesota Mining And Manufacturing Company Protective coating for phototools
US4696878A (en) * 1985-08-02 1987-09-29 Micronix Corporation Additive process for manufacturing a mask for use in X-ray photolithography and the resulting mask
DE3528814A1 (de) * 1985-08-10 1987-02-12 Nikita Dr Sotnik Hartmaske fuer leiterplattenbelichtung, verfahren zur herstellung derselben und vorrichtung zur durchfuehrung des verfahrens
US5282061A (en) * 1991-12-23 1994-01-25 Xerox Corporation Programmable apparatus for determining document background level

Also Published As

Publication number Publication date
KR930001852B1 (ko) 1993-03-15
EP0328648A1 (en) 1989-08-23
US5051295A (en) 1991-09-24
EP0328648A4 (en) 1991-05-15
WO1989001650A1 (en) 1989-02-23

Similar Documents

Publication Publication Date Title
KR960706515A (ko) 활성 에너지선 경화성 조성물 및 렌즈 시이트(Active energy ray-curable composition and lens sheet)
ATE169311T1 (de) Polysiloxanhaltige bindemittel, deren herstellung, diese enthaltende überzugsmittel und deren verwendung
KR940021629A (ko) 비스아실포스핀 옥사이드 광개시제를 함유하는 경화 조성물 및 에틸렌성 불포화 중합성 화합물의 경화방법
ES8100806A1 (es) Procedimiento de sintesis de nuevos poli(carbonatos-ureta- nos) de insaturaciones acrilicas para la obtencion de com- posiciones foto-retienlables.
KR900018298A (ko) 중합성 염료
CA2223905A1 (en) Plastic articles for medical use
KR890702240A (ko) 내구성 패턴 형성용 부재
MX166968B (es) Composiciones de revestimiento de componentes multiples que comprende un polimero que contiene anhidrido, un componente de glicidilo y un componente anhidrido monomerico u oligomerico
KR940007615A (ko) 백지 복사기용 수계 투명 영상 기록 시이트
ATE91879T1 (de) Kosmetische verwendung von polysiloxanen mit beta-ketoester-funktion.
KR927003662A (ko) 광학용 판상물
EP0407932A3 (en) Uv light-absorbing skin-protecting composition
KR890007118A (ko) 가시광 광중합성 조성물
DE59400045D1 (de) Estergruppen aufweisende Organopolysiloxane.
ES2053997T3 (es) Composicion de revestimiento de multiples componentes que comprende un polimero que contiene anhidrido, un componente glicidilico y un catalizador de fosfonio.
KR960010757A (ko) 내오염성이 우수한 광경화형 수지조성물 및 이의 제품
DE69416775D1 (de) Verfahren zur Herstellung von Alkylimidazolidon (Meth)acrylat
KR940018216A (ko) 투명한 복합판 시스템
SE9300145D0 (sv) Monofunktionell akrylatmonomer
KR860003302A (ko) 광중합 조성물
KR960017796A (ko) 메트아크릴산 트리플루오로에틸을 주성분으로 하는 광(光) 교차결합 가능 조성물과 그 제조방법
ATE136318T1 (de) Transparente formmasse
ES2086182T3 (es) Masas de moldeo a base de polimetilmetacrilato con una mejorada resiliencia con entalla.
KR890013520A (ko) 네가형 감광성 수지 조성물
KR930020185A (ko) 콘택트렌즈

Legal Events

Date Code Title Description
A201 Request for examination
PA0109 Patent application

Patent event code: PA01091R01D

Comment text: Patent Application

Patent event date: 19881129

PA0201 Request for examination

Patent event code: PA02012R01D

Patent event date: 19881129

Comment text: Request for Examination of Application

PG1501 Laying open of application
E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

Comment text: Notification of reason for refusal

Patent event date: 19920428

Patent event code: PE09021S01D

G160 Decision to publish patent application
PG1605 Publication of application before grant of patent

Comment text: Decision on Publication of Application

Patent event code: PG16051S01I

Patent event date: 19930215

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

Patent event code: PE07011S01D

Comment text: Decision to Grant Registration

Patent event date: 19930527

GRNT Written decision to grant
PR0701 Registration of establishment

Comment text: Registration of Establishment

Patent event date: 19930614

Patent event code: PR07011E01D

PR1002 Payment of registration fee

Payment date: 19930614

End annual number: 3

Start annual number: 1

PR1001 Payment of annual fee

Payment date: 19960314

Start annual number: 4

End annual number: 4

PR1001 Payment of annual fee

Payment date: 19970311

Start annual number: 5

End annual number: 5

PR1001 Payment of annual fee

Payment date: 19980310

Start annual number: 6

End annual number: 6

FPAY Annual fee payment

Payment date: 19990309

Year of fee payment: 7

PR1001 Payment of annual fee

Payment date: 19990309

Start annual number: 7

End annual number: 7

LAPS Lapse due to unpaid annual fee
PC1903 Unpaid annual fee