KR890700927A - Method for producing yttrium oxide composition for deposition and antireflection film - Google Patents

Method for producing yttrium oxide composition for deposition and antireflection film

Info

Publication number: KR890700927A
Authority: KR; South Korea
Prior art keywords: deposition; antireflection film; yttrium oxide; oxide composition; producing yttrium
Prior art date: 1987-02-04

Application number

KR1019880701199A

Other languages

Korean (ko)

Other versions

KR910008716B1 (en

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1987-02-04

Filing date

1988-09-29

Publication date

1989-04-28

1988-02-04 Application filed filed Critical

1989-04-28 Publication of KR890700927A publication Critical patent/KR890700927A/en

1991-10-19 Application granted granted Critical

1991-10-19 Publication of KR910008716B1 publication Critical patent/KR910008716B1/en

Classifications

- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/62218—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products obtaining ceramic films, e.g. by using temporary supports
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/30—Coatings
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/30—Coatings
- H10F77/306—Coatings for devices having potential barriers
- H10F77/311—Coatings for devices having potential barriers for photovoltaic cells
- H10F77/315—Coatings for devices having potential barriers for photovoltaic cells the coatings being antireflective or having enhancing optical properties
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/84—Coatings, e.g. passivation layers or antireflective coatings
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy

Landscapes

Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Organic Chemistry (AREA)
Ceramic Engineering (AREA)
Materials Engineering (AREA)
Manufacturing & Machinery (AREA)
Mechanical Engineering (AREA)
Inorganic Chemistry (AREA)
Metallurgy (AREA)
Chemical Kinetics & Catalysis (AREA)
Structural Engineering (AREA)
Physical Vapour Deposition (AREA)
Surface Treatment Of Optical Elements (AREA)
Photovoltaic Devices (AREA)
Inorganic Compounds Of Heavy Metals (AREA)
Surface Treatment Of Glass (AREA)

KR1019880701199A 1987-02-04 1988-02-04 Yttrium oxide composition for vapor deposition and manufacturing method of antireflection film KR910008716B1 (en)

Applications Claiming Priority (3)

Application Number	Priority Date	Filing Date	Title
JP62023946A JPS63192856A (en)	1987-02-04	1987-02-04	Yttrium oxide composition for deposition and method for producing antireflection film
JP62-23946		1987-02-04
PCT/JP1988/000103 WO1988005963A1 (en)	1987-02-04	1988-02-04	Yttrium oxide composition for use in evaporation and process for preparing anti-reflection film thereof

Publications (2)

Publication Number	Publication Date
KR890700927A true KR890700927A (en)	1989-04-28
KR910008716B1 KR910008716B1 (en)	1991-10-19

Family

ID=12124709

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
KR1019880701199A KR910008716B1 (en)	1987-02-04	1988-02-04	Yttrium oxide composition for vapor deposition and manufacturing method of antireflection film

Country Status (6)

Country	Link
JP (1)	JPS63192856A (en)
KR (1)	KR910008716B1 (en)
CN (1)	CN1017164B (en)
DE (2)	DE3890060C2 (en)
SE (1)	SE8803506D0 (en)
WO (1)	WO1988005963A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP2850371B2 (en) *	1989-06-19	1999-01-27	松下電器産業株式会社	Image output device
CN102140621A (en) *	2011-03-10	2011-08-03	苏州大学	Preparation method of dense composite titanium dioxide film

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4246043A (en) *	1979-12-03	1981-01-20	Solarex Corporation	Yttrium oxide antireflective coating for solar cells
DE3613501A1 (en) *	1986-04-22	1987-10-29	Stefan Dipl Ing Donnerhack	Process for anti-catalytic coating of thermocouples

1987
- 1987-02-04 JP JP62023946A patent/JPS63192856A/en active Pending
- 1987-11-12 CN CN87107819A patent/CN1017164B/en not_active Expired
1988
- 1988-02-04 DE DE19883890060 patent/DE3890060C2/en not_active Expired - Lifetime
- 1988-02-04 KR KR1019880701199A patent/KR910008716B1/en not_active IP Right Cessation
- 1988-02-04 DE DE19883890060 patent/DE3890060T/de active Pending
- 1988-02-04 WO PCT/JP1988/000103 patent/WO1988005963A1/en active Application Filing
- 1988-10-03 SE SE8803506A patent/SE8803506D0/en not_active Application Discontinuation

Also Published As

Publication number	Publication date
WO1988005963A1 (en)	1988-08-11
CN87107819A (en)	1988-08-17
DE3890060C2 (en)	1990-08-16
SE8803506L (en)	1988-10-03
CN1017164B (en)	1992-06-24
KR910008716B1 (en)	1991-10-19
JPS63192856A (en)	1988-08-10
DE3890060T (en)	1989-03-23
SE8803506D0 (en)	1988-10-03

Publication	Publication Date	Title
AU607219B2 (en)	1991-02-28	Method of forming superconductive thin films and solutions for forming the same
GB2169442B (en)	1988-01-06	Forming thin semiconductor films
EP0302506A3 (en)	1990-05-16	Method for fabricating superconducting materials and superconductive thin films
SG26394G (en)	1995-09-01	A superconducting thin film and a method for preparing the same
EP0301952A3 (en)	1990-02-07	Compound oxide superconducting material and method for preparing the same
HK2196A (en)	1996-01-12	Method for preparing thin film of compound oxide superconductor
GB2165956B (en)	1988-11-30	Thin film optical element and method for producing the same
AU8030991A (en)	1992-01-16	Method of preparing oxide superconducting wire
GB2198146B (en)	1990-06-13	Soft magnetic thin films
EP0300561A3 (en)	1990-12-27	Method for producing superconducting oxides and thin films of such oxides
EP0328757A3 (en)	1989-11-23	Method for manufacturing thin films from high tc oxide superconductors
AU7107387A (en)	1987-10-08	High speed thermomagnetic tape duplication
DE3568457D1 (en)	1989-04-06	Method of depositing silicon films with reduced structural defects
EP0287383A3 (en)	1989-04-05	Superconducting ceramic film and a method of manufacturing the same
DE69112520D1 (en)	1995-10-05	Superconducting thin film oxide compound and process for its production.
EP0410868A3 (en)	1991-05-29	Superconducting thin film of compound oxide and process for preparing the same
EP0482777A3 (en)	1992-08-05	Method for fabricating oxide superconducting coatings
EP0506570A3 (en)	1993-01-27	Method of forming compound oxide superconducting thin film
EP0408753A4 (en)	1991-08-28	Process for forming superconducting thin film
EP0319585A4 (en)	1989-09-19	Process for forming thin film of oxide superconductor.
KR890700927A (en)	1989-04-28	Method for producing yttrium oxide composition for deposition and antireflection film
EP0587095A3 (en)	1996-11-06	Method of making an oxide superconducting thin film
EP0599699A3 (en)	1996-04-03	Method for preparing superconducting thin film formed of high temperature superconductor oxide.
EP0449317A3 (en)	1991-11-27	Method of preparing oxide superconducting thin film
GB8430170D0 (en)	1985-01-09	Deposition of oxide films

Legal Events

Date	Code	Title	Description
1988-09-29	A201	Request for examination
1988-09-29	PA0109	Patent application	Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 19880929
1988-09-29	PA0201	Request for examination
1989-04-28	PG1501	Laying open of application
1991-09-19	G160	Decision to publish patent application
1991-10-19	PG1605	Publication of application before grant of patent	Comment text: Decision on Publication of Application Patent event code: PG16051S01I Patent event date: 19910919
1992-01-18	E701	Decision to grant or registration of patent right
1992-01-18	PE0701	Decision of registration	Patent event code: PE07011S01D Comment text: Decision to Grant Registration Patent event date: 19920118
1992-01-29	GRNT	Written decision to grant
1992-01-29	PR0701	Registration of establishment	Comment text: Registration of Establishment Patent event date: 19920129 Patent event code: PR07011E01D
1992-01-29	PR1002	Payment of registration fee	Payment date: 19920129 End annual number: 3 Start annual number: 1
1994-10-18	FPAY	Annual fee payment	Payment date: 19941018 Year of fee payment: 4
1994-10-18	PR1001	Payment of annual fee	Payment date: 19941018 Start annual number: 4 End annual number: 4
1995-10-20	LAPS	Lapse due to unpaid annual fee
1995-10-20	PC1903	Unpaid annual fee