KR810001351B1 - Process for preparing 2-lower alkyl-7-substituted-2 or 3-cefe-4-carboxylic acid compound - Google Patents
Process for preparing 2-lower alkyl-7-substituted-2 or 3-cefe-4-carboxylic acid compound Download PDFInfo
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- KR810001351B1 KR810001351B1 KR1019810003177A KR810003177A KR810001351B1 KR 810001351 B1 KR810001351 B1 KR 810001351B1 KR 1019810003177 A KR1019810003177 A KR 1019810003177A KR 810003177 A KR810003177 A KR 810003177A KR 810001351 B1 KR810001351 B1 KR 810001351B1
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- South Korea
- Prior art keywords
- compound
- salts
- substituted
- ester
- reaction
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- 238000004519 manufacturing process Methods 0.000 title claims description 3
- 150000001875 compounds Chemical class 0.000 claims description 54
- 150000003839 salts Chemical class 0.000 claims description 32
- 239000002253 acid Substances 0.000 claims description 18
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 18
- 125000000217 alkyl group Chemical group 0.000 claims description 8
- 125000003277 amino group Chemical group 0.000 claims description 7
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims description 5
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 2
- 229910052739 hydrogen Inorganic materials 0.000 claims description 2
- 239000001257 hydrogen Substances 0.000 claims description 2
- -1 alkali metal salts Chemical class 0.000 description 46
- 238000006243 chemical reaction Methods 0.000 description 32
- 238000000034 method Methods 0.000 description 20
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 13
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 12
- 239000002904 solvent Substances 0.000 description 12
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 9
- 150000007513 acids Chemical class 0.000 description 9
- 230000007062 hydrolysis Effects 0.000 description 9
- 238000006460 hydrolysis reaction Methods 0.000 description 9
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 9
- 239000007858 starting material Substances 0.000 description 9
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 8
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 8
- 125000002252 acyl group Chemical group 0.000 description 8
- 150000002148 esters Chemical group 0.000 description 8
- 125000006239 protecting group Chemical group 0.000 description 8
- 239000000203 mixture Substances 0.000 description 7
- 230000009467 reduction Effects 0.000 description 7
- 238000006722 reduction reaction Methods 0.000 description 7
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 6
- 239000002184 metal Chemical class 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 230000002411 adverse Effects 0.000 description 5
- 125000005907 alkyl ester group Chemical group 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 5
- 238000007796 conventional method Methods 0.000 description 5
- 238000001816 cooling Methods 0.000 description 5
- 125000001424 substituent group Chemical group 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 4
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 4
- 235000011054 acetic acid Nutrition 0.000 description 4
- 239000002585 base Substances 0.000 description 4
- 230000003115 biocidal effect Effects 0.000 description 4
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 4
- 150000007522 mineralic acids Chemical class 0.000 description 4
- 150000007524 organic acids Chemical class 0.000 description 4
- 229910052763 palladium Inorganic materials 0.000 description 4
- 229910052697 platinum Inorganic materials 0.000 description 4
- NYBWUHOMYZZKOR-UHFFFAOYSA-N tes-adt Chemical class C1=C2C(C#C[Si](CC)(CC)CC)=C(C=C3C(SC=C3)=C3)C3=C(C#C[Si](CC)(CC)CC)C2=CC2=C1SC=C2 NYBWUHOMYZZKOR-UHFFFAOYSA-N 0.000 description 4
- 229910052725 zinc Inorganic materials 0.000 description 4
- 239000011701 zinc Substances 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- 208000035473 Communicable disease Diseases 0.000 description 3
- 239000004480 active ingredient Substances 0.000 description 3
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 3
- 229940100198 alkylating agent Drugs 0.000 description 3
- 239000002168 alkylating agent Substances 0.000 description 3
- 244000052616 bacterial pathogen Species 0.000 description 3
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 125000001589 carboacyl group Chemical group 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 125000001841 imino group Chemical group [H]N=* 0.000 description 3
- 150000007529 inorganic bases Chemical class 0.000 description 3
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 150000007530 organic bases Chemical class 0.000 description 3
- 239000008194 pharmaceutical composition Substances 0.000 description 3
- 235000019260 propionic acid Nutrition 0.000 description 3
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 3
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- ORLCYMQZIPSODD-UHFFFAOYSA-N 1-chloro-2-[chloro(2,2,2-trichloroethoxy)phosphoryl]oxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(=O)OCC(Cl)(Cl)Cl ORLCYMQZIPSODD-UHFFFAOYSA-N 0.000 description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 2
- 229920001817 Agar Polymers 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 241001465754 Metazoa Species 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 125000000738 acetamido group Chemical group [H]C([H])([H])C(=O)N([H])[*] 0.000 description 2
- 239000008272 agar Substances 0.000 description 2
- 150000001335 aliphatic alkanes Chemical class 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 125000003342 alkenyl group Chemical group 0.000 description 2
- 125000004390 alkyl sulfonyl group Chemical group 0.000 description 2
- 150000003863 ammonium salts Chemical class 0.000 description 2
- 125000001584 benzyloxycarbonyl group Chemical group C(=O)(OCC1=CC=CC=C1)* 0.000 description 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 2
- 229910052794 bromium Inorganic materials 0.000 description 2
- 238000010531 catalytic reduction reaction Methods 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 235000019253 formic acid Nutrition 0.000 description 2
- 238000009472 formulation Methods 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 125000001475 halogen functional group Chemical group 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000004356 hydroxy functional group Chemical group O* 0.000 description 2
- 230000002401 inhibitory effect Effects 0.000 description 2
- 239000003863 metallic catalyst Substances 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 125000004170 methylsulfonyl group Chemical group [H]C([H])([H])S(*)(=O)=O 0.000 description 2
- 230000036961 partial effect Effects 0.000 description 2
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 2
- 239000000825 pharmaceutical preparation Substances 0.000 description 2
- UYWQUFXKFGHYNT-UHFFFAOYSA-N phenylmethyl ester of formic acid Natural products O=COCC1=CC=CC=C1 UYWQUFXKFGHYNT-UHFFFAOYSA-N 0.000 description 2
- XHXFXVLFKHQFAL-UHFFFAOYSA-N phosphoryl trichloride Chemical compound ClP(Cl)(Cl)=O XHXFXVLFKHQFAL-UHFFFAOYSA-N 0.000 description 2
- 125000000612 phthaloyl group Chemical group C(C=1C(C(=O)*)=CC=CC1)(=O)* 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- VWDWKYIASSYTQR-UHFFFAOYSA-N sodium nitrate Chemical compound [Na+].[O-][N+]([O-])=O VWDWKYIASSYTQR-UHFFFAOYSA-N 0.000 description 2
- 125000004044 trifluoroacetyl group Chemical group FC(C(=O)*)(F)F 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- AMOYMEBHYUTMKJ-UHFFFAOYSA-N 2-(2-phenylethoxy)ethylbenzene Chemical compound C=1C=CC=CC=1CCOCCC1=CC=CC=C1 AMOYMEBHYUTMKJ-UHFFFAOYSA-N 0.000 description 1
- LBLYYCQCTBFVLH-UHFFFAOYSA-M 2-methylbenzenesulfonate Chemical compound CC1=CC=CC=C1S([O-])(=O)=O LBLYYCQCTBFVLH-UHFFFAOYSA-M 0.000 description 1
- BSKHPKMHTQYZBB-UHFFFAOYSA-N 2-methylpyridine Chemical class CC1=CC=CC=N1 BSKHPKMHTQYZBB-UHFFFAOYSA-N 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000002774 3,4-dimethoxybenzyl group Chemical group [H]C1=C([H])C(=C([H])C(OC([H])([H])[H])=C1OC([H])([H])[H])C([H])([H])* 0.000 description 1
- BMYNFMYTOJXKLE-UHFFFAOYSA-N 3-azaniumyl-2-hydroxypropanoate Chemical compound NCC(O)C(O)=O BMYNFMYTOJXKLE-UHFFFAOYSA-N 0.000 description 1
- 125000004080 3-carboxypropanoyl group Chemical group O=C([*])C([H])([H])C([H])([H])C(O[H])=O 0.000 description 1
- 125000004217 4-methoxybenzyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1OC([H])([H])[H])C([H])([H])* 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- 229910000497 Amalgam Inorganic materials 0.000 description 1
- 241000894006 Bacteria Species 0.000 description 1
- JGLMVXWAHNTPRF-CMDGGOBGSA-N CCN1N=C(C)C=C1C(=O)NC1=NC2=CC(=CC(OC)=C2N1C\C=C\CN1C(NC(=O)C2=CC(C)=NN2CC)=NC2=CC(=CC(OCCCN3CCOCC3)=C12)C(N)=O)C(N)=O Chemical compound CCN1N=C(C)C=C1C(=O)NC1=NC2=CC(=CC(OC)=C2N1C\C=C\CN1C(NC(=O)C2=CC(C)=NN2CC)=NC2=CC(=CC(OCCCN3CCOCC3)=C12)C(N)=O)C(N)=O JGLMVXWAHNTPRF-CMDGGOBGSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- YXHKONLOYHBTNS-UHFFFAOYSA-N Diazomethane Chemical compound C=[N+]=[N-] YXHKONLOYHBTNS-UHFFFAOYSA-N 0.000 description 1
- XBPCUCUWBYBCDP-UHFFFAOYSA-N Dicyclohexylamine Chemical class C1CCCCC1NC1CCCCC1 XBPCUCUWBYBCDP-UHFFFAOYSA-N 0.000 description 1
- WHUUTDBJXJRKMK-UHFFFAOYSA-N Glutamic acid Natural products OC(=O)C(N)CCC(O)=O WHUUTDBJXJRKMK-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 1
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical class CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 1
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 1
- 238000005917 acylation reaction Methods 0.000 description 1
- 125000004423 acyloxy group Chemical group 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 229910001963 alkali metal nitrate Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001350 alkyl halides Chemical class 0.000 description 1
- 150000008051 alkyl sulfates Chemical class 0.000 description 1
- 229940045714 alkyl sulfonate alkylating agent Drugs 0.000 description 1
- 150000008052 alkyl sulfonates Chemical class 0.000 description 1
- 125000001118 alkylidene group Chemical group 0.000 description 1
- 125000000304 alkynyl group Chemical group 0.000 description 1
- 239000003242 anti bacterial agent Substances 0.000 description 1
- 229940088710 antibiotic agent Drugs 0.000 description 1
- 125000003435 aroyl group Chemical group 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 150000007860 aryl ester derivatives Chemical class 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- JUHORIMYRDESRB-UHFFFAOYSA-N benzathine Chemical class C=1C=CC=CC=1CNCCNCC1=CC=CC=C1 JUHORIMYRDESRB-UHFFFAOYSA-N 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-M benzenesulfonate Chemical compound [O-]S(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-M 0.000 description 1
- 229940077388 benzenesulfonate Drugs 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 1
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 1
- FFBHFFJDDLITSX-UHFFFAOYSA-N benzyl N-[2-hydroxy-4-(3-oxomorpholin-4-yl)phenyl]carbamate Chemical compound OC1=C(NC(=O)OCC2=CC=CC=C2)C=CC(=C1)N1CCOCC1=O FFBHFFJDDLITSX-UHFFFAOYSA-N 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- RDHPKYGYEGBMSE-UHFFFAOYSA-N bromoethane Chemical compound CCBr RDHPKYGYEGBMSE-UHFFFAOYSA-N 0.000 description 1
- 239000000872 buffer Substances 0.000 description 1
- 125000004744 butyloxycarbonyl group Chemical group 0.000 description 1
- 125000004063 butyryl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 159000000007 calcium salts Chemical class 0.000 description 1
- 239000002775 capsule Substances 0.000 description 1
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 1
- WLXALCKAKGDNAT-UHFFFAOYSA-N diazoethane Chemical compound CC=[N+]=[N-] WLXALCKAKGDNAT-UHFFFAOYSA-N 0.000 description 1
- DENRZWYUOJLTMF-UHFFFAOYSA-N diethyl sulfate Chemical compound CCOS(=O)(=O)OCC DENRZWYUOJLTMF-UHFFFAOYSA-N 0.000 description 1
- 229940008406 diethyl sulfate Drugs 0.000 description 1
- 238000003113 dilution method Methods 0.000 description 1
- VAYGXNSJCAHWJZ-UHFFFAOYSA-N dimethyl sulfate Chemical compound COS(=O)(=O)OC VAYGXNSJCAHWJZ-UHFFFAOYSA-N 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 239000008298 dragée Substances 0.000 description 1
- 239000003937 drug carrier Substances 0.000 description 1
- 239000003995 emulsifying agent Substances 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 238000005886 esterification reaction Methods 0.000 description 1
- 125000003754 ethoxycarbonyl group Chemical group C(=O)(OCC)* 0.000 description 1
- 125000004494 ethyl ester group Chemical group 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 125000002485 formyl group Chemical group [H]C(*)=O 0.000 description 1
- 235000011389 fruit/vegetable juice Nutrition 0.000 description 1
- 235000013922 glutamic acid Nutrition 0.000 description 1
- 239000004220 glutamic acid Substances 0.000 description 1
- 125000004993 haloalkoxycarbonyl group Chemical group 0.000 description 1
- 230000002140 halogenating effect Effects 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 125000005935 hexyloxycarbonyl group Chemical group 0.000 description 1
- 150000002429 hydrazines Chemical class 0.000 description 1
- 238000000338 in vitro Methods 0.000 description 1
- 238000011534 incubation Methods 0.000 description 1
- 208000015181 infectious disease Diseases 0.000 description 1
- 229910003480 inorganic solid Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- HVTICUPFWKNHNG-UHFFFAOYSA-N iodoethane Chemical compound CCI HVTICUPFWKNHNG-UHFFFAOYSA-N 0.000 description 1
- INQOMBQAUSQDDS-UHFFFAOYSA-N iodomethane Chemical compound IC INQOMBQAUSQDDS-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000005928 isopropyloxycarbonyl group Chemical group [H]C([H])([H])C([H])(OC(*)=O)C([H])([H])[H] 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 159000000003 magnesium salts Chemical class 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 description 1
- VUQUOGPMUUJORT-UHFFFAOYSA-N methyl 4-methylbenzenesulfonate Chemical compound COS(=O)(=O)C1=CC=C(C)C=C1 VUQUOGPMUUJORT-UHFFFAOYSA-N 0.000 description 1
- 150000004702 methyl esters Chemical class 0.000 description 1
- 244000000010 microbial pathogen Species 0.000 description 1
- 244000005700 microbiome Species 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- SYSQUGFVNFXIIT-UHFFFAOYSA-N n-[4-(1,3-benzoxazol-2-yl)phenyl]-4-nitrobenzenesulfonamide Chemical class C1=CC([N+](=O)[O-])=CC=C1S(=O)(=O)NC1=CC=C(C=2OC3=CC=CC=C3N=2)C=C1 SYSQUGFVNFXIIT-UHFFFAOYSA-N 0.000 description 1
- 125000001038 naphthoyl group Chemical group C1(=CC=CC2=CC=CC=C12)C(=O)* 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 231100000252 nontoxic Toxicity 0.000 description 1
- 230000003000 nontoxic effect Effects 0.000 description 1
- 239000002674 ointment Substances 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229940045681 other alkylating agent in atc Drugs 0.000 description 1
- 125000003431 oxalo group Chemical group 0.000 description 1
- MUMZUERVLWJKNR-UHFFFAOYSA-N oxoplatinum Chemical compound [Pt]=O MUMZUERVLWJKNR-UHFFFAOYSA-N 0.000 description 1
- 125000005740 oxycarbonyl group Chemical group [*:1]OC([*:2])=O 0.000 description 1
- 229910003445 palladium oxide Inorganic materials 0.000 description 1
- 125000001148 pentyloxycarbonyl group Chemical group 0.000 description 1
- 239000000546 pharmaceutical excipient Substances 0.000 description 1
- 125000003356 phenylsulfanyl group Chemical group [*]SC1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 125000003170 phenylsulfonyl group Chemical group C1(=CC=CC=C1)S(=O)(=O)* 0.000 description 1
- 229910003446 platinum oxide Inorganic materials 0.000 description 1
- 159000000001 potassium salts Chemical class 0.000 description 1
- 125000001501 propionyl group Chemical group O=C([*])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004742 propyloxycarbonyl group Chemical group 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 150000003222 pyridines Chemical class 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 238000006894 reductive elimination reaction Methods 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000004317 sodium nitrate Substances 0.000 description 1
- 235000010344 sodium nitrate Nutrition 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 238000007920 subcutaneous administration Methods 0.000 description 1
- 125000005717 substituted cycloalkylene group Chemical group 0.000 description 1
- 239000000829 suppository Substances 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 239000003826 tablet Substances 0.000 description 1
- 229940095064 tartrate Drugs 0.000 description 1
- 238000003419 tautomerization reaction Methods 0.000 description 1
- RUPAXCPQAAOIPB-UHFFFAOYSA-N tert-butyl formate Chemical group CC(C)(C)OC=O RUPAXCPQAAOIPB-UHFFFAOYSA-N 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 230000001225 therapeutic effect Effects 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
- 125000005425 toluyl group Chemical group 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical class CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 1
- 125000002221 trityl group Chemical group [H]C1=C([H])C([H])=C([H])C([H])=C1C([*])(C1=C(C(=C(C(=C1[H])[H])[H])[H])[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 210000003708 urethra Anatomy 0.000 description 1
- 125000003774 valeryl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
- 238000010626 work up procedure Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D501/00—Heterocyclic compounds containing 5-thia-1-azabicyclo [4.2.0] octane ring systems, i.e. compounds containing a ring system of the formula:, e.g. cephalosporins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulfur-containing hetero ring
- C07D501/14—Compounds having a nitrogen atom directly attached in position 7
- C07D501/60—Compounds having a nitrogen atom directly attached in position 7 with a double bond between positions 3 and 4
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/55—Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Cephalosporin Compounds (AREA)
Abstract
내용 없음.No content.
Description
본 발명은 신규 2-저급알킬-7-치환된-2 또는 3-세펨-4-카르복실릭산 화합물과 약학적으로 받아 들여질 수 있는 이들의 염류에 관한 것이다.The present invention relates to novel 2-lower alkyl-7-substituted-2 or 3-cefe-4-carboxylic acid compounds and their pharmaceutically acceptable salts.
더욱 특별히, 신규 2-저급알킬-7-치환된-2 또는 3-세펨-4-카르복실릭산 화합물과 항생작용을 갖는 약학적으로 받아들여질 수 있는 이들의 염류와 이들의 제조 방법, 약학적 조성물과 인간과 동물의 감염질병 처리에 치료적으로 사용하는 방법에 관한 것이다.More specifically, pharmaceutically acceptable salts thereof having antibiotics with the novel 2-lower alkyl-7-substituted-2 or 3-cefe-4-carboxylic acid compounds and methods for their preparation, pharmaceutical compositions And therapeutically used for the treatment of infectious diseases in humans and animals.
따라서 본 발명의 목적은 병원성 미생물에 대해 활성이 있는 2-저급알킬-7-치환된-2 또는 3-세펨-4-카르복실릭산 화합물과 약학적으로 받아들여질 수 있는 이들의 염류를 제공한다.It is therefore an object of the present invention to provide 2-lower alkyl-7-substituted-2 or 3-cefe-4-carboxylic acid compounds which are active against pathogenic microorganisms and their pharmaceutically acceptable salts.
본 발명의 다른 목적은 2-저급알킬-7-치환된-2 또는 3-세펨-4-카르복실릭산 화합물과 약학적으로 받아들여질 수 있는 이들 염류의 제조 방법을 제공한다.Another object of the present invention is to provide a process for preparing these salts with a 2-lower alkyl-7-substituted-2 or 3-cefe-4-carboxylic acid compound.
본 발명의 더욱 다른 목적은 활성 성분으로서, 언급한 2-저급알킬-7-치환된-2 또는 3-세펨-4-카르복실릭산 화합물과 약학적으로 받아들여질 수 있는 이들의 염류로 약학적 조성물을 제공한다.A further object of the present invention is a pharmaceutical composition comprising, as active ingredients, the mentioned 2-lower alkyl-7-substituted-2 or 3-cefe-4-carboxylic acid compounds and their pharmaceutically acceptable salts thereof. To provide.
본 발명의 더욱 다른 목적은 활성성분으로서, 언급한 2-저급알킬-7-치환된-2 또는 3-세펨-4-카르복실릭산 화합물과 약학적으로 받아들여질 수 있는 이들의 염류로 구성되는 약학적조성물을 제공한다.A further object of the present invention is a pharmaceutical composition comprising, as an active ingredient, the aforementioned 2-lower alkyl-7-substituted-2 or 3-cefe-4-carboxylic acid compounds and their pharmaceutically acceptable salts. Provide a red composition.
본 발명의 더욱 다른 목적은 인간과 동물에서 병원성 박테리아에 의해 기인한 감염성 질병의 처리를 위한 방법을 제공한다.A further object of the present invention is to provide a method for the treatment of an infectious disease caused by pathogenic bacteria in humans and animals.
목적 2-저급알킬-7-치환된-2 또는 3-세펨-4-카르복실릭산 화합물은 신규이고 다음 일반구조식(I)에 의해 나타낼 수 있다.The desired 2-lower alkyl-7-substituted-2 or 3-cefe-4-carboxylic acid compound is novel and can be represented by the following general formula (I).
상기 구조식에서,In the above structural formula,
R1은 저급 알킬,R 1 is lower alkyl,
R2는 카르복시 또는 보호된 카르복시그룹,R 2 is a carboxy or protected carboxy group,
R3는 아미노 또는 보호된 아미노그룹이고,R 3 is an amino or protected amino group,
R4는 수소 또는 저급알킬.R 4 is hydrogen or lower alkyl.
본 발명에 따라, 2-저급알킬-7-치환된-2 또는 3-세펨-4-카르복실릭산 화합물(I)은 다음 도표에 의해 설명되는 다양한 공정에 의해 제조할 수 있다.According to the present invention, 2-lower alkyl-7-substituted-2 or 3-cefe-4-carboxylic acid compound (I) can be prepared by various processes described by the following table.
상기 구조식에서,In the above structural formula,
R1, R2, R3와 R4는 각기 상기 정의한 것이고,R 1 , R 2 , R 3 and R 4 are each as defined above,
R2a는 보호된 카르복시그룹,R 2a is a protected carboxy group,
R3a는 보호된 아미노그룹,R 3a is a protected amino group,
R4a는 저급알킬,R 4a is lower alkyl,
R5는 구조식 : -COOR5에 의해 대표되는 에스테르화 된 카르복시그룹의 에스테르부분,R 5 is the ester moiety of the esterified carboxy group represented by the formula: -COOR 5 ,
Y는 산의 간류물이다.Y is an interstitial acid.
본 발명에서 출발화합물(V)은 신규 화합물이고 다음 도표에 의해 설명되는 종래공정에 의해 제조할 수 있다.Starting compounds (V) in the present invention are novel compounds and can be prepared by conventional processes as illustrated by the following table.
상기식에서 R1, R2, R4a와 Y는 상기 정의한 것이다.Wherein R 1 , R 2 , R 4a and Y are as defined above.
목적화합물(I)에 관해서, 호변이성체를 포함할 것으로 이해될 것이며, 즉, 구조식(R3는 상기 정의한 것)의 그룹의 경우에서 언급한 목적과 출발 화합물의 분자에서 포함될 게이며, 구조식의 언급한 그룹은 호변구조식 :With respect to the target compound (I), it will be understood to include tautomers, i.e., structural formulas (R 3 is as defined above) in the case of the group mentioned above and in the molecule of the starting compound, and the mentioned group of the structural formula:
(R3'는 이미노 또는 보호된 이미노그룹)에 의해 차례대로 나타낼 수 있다. (R 3 ′ may be indicated in turn by imino or protected imino group).
즉 언급한 그룹의 둘은 각기 평형상태이고 어떠한 호변이성체는 다음 평형에 의해 나타낼 수 있다.That is, two of the groups mentioned are each in equilibrium and some tautomers can be represented by the following equilibrium.
상기 식에서 R3와 R3'는 각기 상기 정의한 것이다.Wherein R 3 and R 3 ′ are the definitions above.
상기 기술된 바와 같은 아아노화합물과 상응하는 이미노-화합물사이 호변이성의 이들 형태는 문헌에 잘알려져 있고 이 분야에 숙련된 사람은 호변이성체의 둘이 쉽게 전환될 수 있고 화합물 자체의 같은 범주에 포함되는 것을 알 것이다.These forms of tautomerism between aano compounds and the corresponding imino-compounds as described above are well known in the literature and those skilled in the art can easily convert both of the tautomers and fall within the same category of the compound itself. You will know.
따라서, 목적화합물(I)의 호변 형태는 본 발명의 형태에 명백히 포함된다.Therefore, the tautomeric form of the target compound (I) is expressly included in the form of the present invention.
본 명세서와 청구범위에서, 이러한 이성체의 그룹을 포함하는 목적과 출발화합물은 구조식 :에 의해 나타난다.In the present specification and claims, the objectives and starting compounds comprising such groups of isomers are represented by Indicated by
더욱이, 목적화합물(I)과 출발화합물(V)에 관해서, 언급한 목적과 출발화합물은 신 이성체, 안티이성체와 이들의 혼합물을 포함하는 것으로 이해된다. 즉, 언급한 목적과 출발화합물은 신이성체 또는 안티이성체 또는 이들의 혼합물로서 임의로 얻을 수 있다.Furthermore, with regard to the target compound (I) and the starting compound (V), it is understood that the stated purpose and starting compound include the new isomers, anti-isomers and mixtures thereof. In other words, the stated purpose and starting compound can be optionally obtained as neoisomers or antiisomers or mixtures thereof.
따라서, 본 명세서에서, 신 이성체는 다음 구조식 :에 의해 나타나는 부분적 구조를 갖는 하나의 기하학적 이성체를 의미하고 안티이성체는 다음 구조식 :에 의해 나타나는 부분적 구조를 갖는 다른 기하학적 이성체를 의미한다.Thus, in this specification, neoisomers have the following structural formula: Means one geometric isomer having a partial structure represented by the anti-isomer is the following structural formula: By other geometric isomers having a partial structure represented by.
상기식에서 R4는 상기 언급한 바와 같다.In which R 4 is as mentioned above.
목적화합물(I)의 적합한 약학적으로 받아들여질 수 있는 염류는 종래 비독성 염류이고 알카리금속염(즉, 소디움염, 포타슘염 등)과 알카리토류금속염(즉, 칼슘염, 마그네슘염 등) 같은 금속염, 암모늄염, 무기염기염(즉, 트리메틸아민염, 트리에틸아민염, 피리딘염, 피콜린염, 디사이클로 헥실아민염, N, N'-디벤질에틸렌디아민 염 등), 유기산염(즉, 아세테이트, 말레이트, 타르트레이트, 메탄설폰에이트, 벤젠설폰에이트, 톨루엔설폰에이트 등) 무기산염(즉, 하이드로클로라이드, 하이드로보로마이드, 설페이트, 포스페이트 등) 또는 아미노산과 염(즉, 아르지닌, 아스파르틱산, 글루타믹산 등)과 같은 것을 포함한다.Suitable pharmaceutically acceptable salts of the desired compound (I) are conventionally non-toxic salts, metal salts such as alkali metal salts (ie sodium salts, potassium salts) and alkaline earth metal salts (ie calcium salts, magnesium salts, etc.), Ammonium salts, inorganic base salts (i.e., trimethylamine salts, triethylamine salts, pyridine salts, picoline salts, dicyclohexylamine salts, N, N'-dibenzylethylenediamine salts, etc.), organic acid salts (i.e. acetate, Maleate, tartrate, methanesulfonate, benzenesulfonate, toluenesulfonate, and the like. , Glutamic acid, and the like).
상기와 본 명세서의 연속기술에서, 본 발명의 적합한 실시예와 다양한 정의의 설명은 다음에 상세히 설명된 본 발명의 상범주에 포함된다.In the foregoing and in the continuation of the specification, the description of suitable embodiments and various definitions of the invention is included in the scope of the invention described in detail below.
용어 "저급"은 달리 언급하지 않는한 탄소원자 1 내지 6을 의미한다.The term "lower" means carbon atoms 1 to 6 unless otherwise stated.
적합한 저급알킬은 메틸, 에틸, 프로필, 이소프로필, 부틸, 펜틸, 헥실과 같은 것 이포함 될 수 있다.Suitable lower alkyls may include such as methyl, ethyl, propyl, isopropyl, butyl, pentyl, hexyl.
적합히 보호된 카르복시는 에스테르화된 카르복시와 같은 것이 포함될 수 있고 언급한 에스테르화된 카르복시에서 에스테르 부분의 적합한예는 적합한 치환체를 예를 들면, 저급 알카노일옥시(저급) 알킬에스테르(즉, 아세톡시메틸에스테르, 프로피오닐옥시 메틸에스테르, 부티릴옥시메틸에스테르, 발레릴옥시메틸에스테르, 피바로일옥시메틸 에스테르, 2-아세톡시 에틸에스테르, 2-프로피오닐옥시에틸에스테르 등), 저급 알칸설포닐(저급) 알킬에스테르(즉, 2-메질에틸 에스테르 등) 또는 모노(또는 디 또는 트리) 할로(저급)알킬에스테르(즉, 2-이오드에틸 에스테르, 2,2,2-트리클로로에틸에스테르 등), 저급알켄일에스테르(즉, 비닐에스테르, 알릴에스테르 등), 저급알킨일에스테르(즉, 에틴일에스테르, 프로필일에스테르 등)과 같은 것중 적어도 하나를 갖을 수 있는 저급알킬에스테르(즉, 메틸에스테르, 에틸에스테르, 프로필에스테르, 이소프로필 에스테르, 부틸에스테르, 이소부틸에스테르, 펜틸에스테르, 헥실에스테르, 1-사이클로프로필에틸에스테르 등) : 적합한 치환체(즉, 벤질에스테르, 4-메톡시벤질 에스테르, 4-니트로 벤질에스테르, 펜에틸에스테르, 트리틸에스테르, 디페닐메틸에스테르, 비스(메톡시페닐) 메틸에스테르, 3,4-디메톡시 벤질에스테르, 4-하이드록시-3,5-디터서리 부틸벤질에스테르 등)을 적어도 하나 갖을 수 있는 아르(저급) 알킬에스테르 :Suitably protected carboxys may include such as esterified carboxys and suitable examples of ester moieties in the esterified carboxys mentioned include suitable substituents such as lower alkanoyloxy (lower) alkylesters (i.e. acetoxy Methyl ester, propionyloxy methyl ester, butyryloxymethyl ester, valeryloxymethyl ester, pivaloyloxymethyl ester, 2-acetoxy ethyl ester, 2-propionyloxyethyl ester, etc.), lower alkanesulfonyl ( Lower) alkyl esters (i.e. 2-methylethyl ester, etc.) or mono (or di or tri) halo (lower) alkyl esters (i.e. 2-iodethyl ester, 2,2,2-trichloroethyl ester, etc.), At least one of lower alkenyl esters (ie, vinyl esters, allyl esters, etc.) and lower alkynyl esters (ie, ethynyl esters, propylyl esters, etc.) Lower alkyl esters that may have (ie methyl esters, ethyl esters, propyl esters, isopropyl esters, butyl esters, isobutyl esters, pentyl esters, hexyl esters, 1-cyclopropylethyl esters, etc.): suitable substituents (ie benzyl Ester, 4-methoxybenzyl ester, 4-nitro benzyl ester, phenethyl ester, trityl ester, diphenylmethyl ester, bis (methoxyphenyl) methyl ester, 3,4-dimethoxy benzyl ester, 4-hydroxy Ar (lower) alkyl esters which may have at least one of -3,5-ditherbutyl butylbenzyl ester, etc.
적합한 치환체(즉, 페닐에스테르, 4-클로로페닐에스테르, 톨일에스테르, 터서리부틸페닐 에스테르, 크실일에스테르, 메지틸에스테르, 쿠멘일에스테르 등)를 적어도 하나 갖을 수 있는 아릴에스테르와 같은 중 하나일 수 있다.May be one such as an aryl ester which may have at least one suitable substituent (ie, phenylester, 4-chlorophenylester, tolylester, tertarybutylphenyl ester, xylyl ester, mezzyl ester, cumenyl ester, etc.) have.
적합히 보호된 아미노는 하기 언급한 바와 같은 아실, 적합한 치환체(즉, 벤질, 4-메톡시벤질, 펜에틸, 트리틸, 3,4-디메톡시벤질 등)를 적어도 하나 갖을 수 있는 아르(저급) 알킬과 같은 종래 보호그룹에 의해 치환된 아미노그룹이 포함될 수 있다.Suitably protected amino are ar (lower) which may have at least one of acyl, suitable substituents (ie benzyl, 4-methoxybenzyl, phenethyl, trityl, 3,4-dimethoxybenzyl, etc.) as mentioned below Amino groups substituted by conventional protecting groups such as alkyl may be included.
적합한 아실은 카르바모일, 지방족 아실그룹과 방향족 또는 헤테로 사이클릭링을 포함하는 아실그룹이 포함될 수 있다.Suitable acyls may include carbamoyl, aliphatic acyl groups and acyl groups including aromatic or heterocyclic rings.
언급한 아실의 적합한 예는 저급알카노일(즉, 포밀, 아세틸, 프로피오닐, 부티릴, 이소부티릴, 발레릴, 이소발레릴, 옥살일, 석신일, 피바로일 등), 저급알콕시 카르보닐(즉, 메톡시 카르보닐, 에톡시카르보닐, 프로폭시카르보닐, 1-사이클로프로필에톡시 카르보닐, 이소프로폭시카르보닐, 부톡시카르보닐, 터셔리부톡시카르보닐, 펜틸옥시카르보닐, 헥실옥시카르보닐 등): 저급알칸설포닐(즉, 메질, 메탄설포닐, 프로판설포닐, 이소프로판설포닐, 부탄설포닐 등) : 아르네설포닐(즉, 벤젠설포닐, 토질 등) : 아로일(즉, 벤조일, 토루오일, 나프토일, 프타로일, 인탄카르보닐 등), 아르(저급) 알카노일(즉, 페닐아세틸, 페닐프로피오닐 등) : 아르(저급) 알콕시카르보닐(즉, 벤질옥시카르보닐 등)과 같은 것이다.Suitable examples of acyls mentioned are lower alkanoyls (ie formyl, acetyl, propionyl, butyryl, isobutyryl, valeryl, isovaleryl, oxalyl, succinyl, fivaroyl, etc.), lower alkoxycarbonyl (Ie methoxy carbonyl, ethoxycarbonyl, propoxycarbonyl, 1-cyclopropylethoxy carbonyl, isopropoxycarbonyl, butoxycarbonyl, tertiarybutoxycarbonyl, pentyloxycarbonyl, Hexyloxycarbonyl, etc.): lower alkanesulfonyl (ie, mesyl, methanesulfonyl, propanesulfonyl, isopropanesulfonyl, butanesulfonyl, etc.): arnesulfonyl (ie, benzenesulfonyl, soil, etc.): Aroyl (ie benzoyl, toluoyl, naphthoyl, phthaloyl, intancarbonyl, etc.), ar (lower) alkanoyl (ie phenylacetyl, phenylpropionyl, etc.): ar (lower) alkoxycarbonyl (ie , Benzyloxycarbonyl and the like).
상기 언급한 바와 같은 아실부분은 할로겐(즉, 염소, 브롬, 요드 또는 불소), 시아노, 저급알킬(즉, 메틸, 에틸, 프로필, 이소프로필, 부틸 등), 저급 알켄일(즉, 비닐, 알릴 등)과 같은 적합한 치환체를 적어도 하나 갖을 수 있다.Acyl moieties as mentioned above include halogens (ie chlorine, bromine, iodine or fluorine), cyano, lower alkyl (ie methyl, ethyl, propyl, isopropyl, butyl, etc.), lower alkenyl (ie vinyl, Or at least one suitable substituent, such as allyl).
이것의 적합한 예는 모노(또는 디 또는 트리) 할로(저급) 알카노일(즉, 트리플루오로 아세틸 등)일 수 있다.Suitable examples of this may be mono (or di or tri) halo (lower) alkanoyl (ie trifluoro acetyl, etc.).
에스테르화 된 카르복시의 적합한 에스테르 부분은 보호된 카르복시를 위해 예시화된 에스테르가 포함될 수 있다.Suitable ester moieties of esterified carboxy may include esters exemplified for the protected carboxy.
산의 적합한 잔류물은 할로겐(즉, 염소, 브롬, 요도 또는 불소)와 같은 것이 포함될 수 있다.Suitable residues of acids may include such as halogens (ie chlorine, bromine, urethra or fluorine).
본 발명의 목적화합물을 제조하기 위한 다양한 공정은 다음에 상세히 설명되어 있다.Various processes for preparing the target compounds of the present invention are described in detail below.
공정 1Process 1
목적화합물(I) 또는 이들의 염은 화합물(V) 또는 이들의 염을 화합물(VI)과 반응시켜 제조할 수 있다.The target compound (I) or salts thereof can be prepared by reacting compound (V) or salts thereof with compound (VI).
화합물(V)의 적합한 염은 화합물(I)을 위해 예시화된 것중 하나로 언급할 수 있다.Suitable salts of compound (V) may be mentioned as one exemplified for compound (I).
본 반응은 물, 알콜(즉, 메탄올 등), 벤젠, 디메틸포름 아마이드, 테트라하이드로 푸란 같은 용매 또는 반응에 역영향을 미치지 않는 어떠한 마른 용매에서 통상적으로 수행한다.The reaction is usually carried out in solvents such as water, alcohols (ie methanol, etc.), benzene, dimethylformamide, tetrahydrofuran or any dry solvent which does not adversely affect the reaction.
반응온도는 중요하지 않고 반응은 주위온도 내지 가열하에 통상적으로 수행한다.The reaction temperature is not critical and the reaction is usually carried out at ambient temperature to heating.
공정 2Process 2
목적화합물(Ia) 또는 이들의 염은 화합물(Ib) 또는 이들의 염을 아미노 보호그룹의 제거반응으로 제조할 수 있다.The desired compound (Ia) or salts thereof may be prepared by removing compound (Ib) or salts thereof by removing an amino protecting group.
화합물(Ib)의 적합한 염은 금속염, 암모늄염과 화합물(I)을 위해 예시된 유기아민염으로 언급할 수 있다.Suitable salts of compound (Ib) may be mentioned with metal salts, ammonium salts and organic amine salts exemplified for compound (I).
제거반응은 가수분해, 환원과 같은 종래방법과 일치해서 수행한다. 가수분해는 산 또는 염기 또는 하이드라진을 사용하는 방법이 또한 포함될 수 있다.The removal reaction is carried out in accordance with conventional methods such as hydrolysis and reduction. Hydrolysis may also include methods using acids or bases or hydrazines.
이들 방법은 제거된 보호그룹의 종류에 따라 선택될 수 있다.These methods may be chosen depending on the type of protection group removed.
이들 방법 중, 산을 사용하는 가수분해는 가장 통상적인 것이고 치환되거나 또는 치환되지 않은 알콕시카르보닐, 사이클로 알콕시카르보닐, 치환되거나 또는 치환되지 않은 아르알콕시 카르보닐, 아르알킬(즉, 트리실), 치환된 페닐티오, 치환된 아르알킬리덴, 치환된 알킬리덴, 치환된 사이클로 알킬렌과 같은 보호성그룹 제거를 위해 바람직한 방법이다.Of these methods, hydrolysis using acids is the most common and substituted or unsubstituted alkoxycarbonyl, cycloalkoxycarbonyl, substituted or unsubstituted aralkoxy carbonyl, aralkyl (ie trisyl), It is a preferred method for removing protective groups such as substituted phenylthio, substituted aralkylidene, substituted alkylidene, substituted cycloalkylene.
적합한 산은 포로믹산, 트리플루오로아세틱산, 벤젠설포닉산, P-톨루엔설포닉산, 하이드로클로릭산과 같은 유기 또는 무기산을 포함하고 가장 적합한 산은 감압하 증류 같은 종래 방법에 의해 반응혼합물로부터 쉽게 제거할 수 있는 산 예를 들면, 포르믹산, 트리플루오로아세틱산 등이다.Suitable acids include organic or inorganic acids such as poromic acid, trifluoroacetic acid, benzenesulphonic acid, P-toluenesulphonic acid, hydrochloric acid and the most suitable acids can be easily removed from the reaction mixture by conventional methods such as distillation under reduced pressure. Acids for example are formic acid, trifluoroacetic acid and the like.
산류는 제거된 보호그룹의 종류에 따라 선택할 수 있다.Acids may be selected depending on the type of protection group removed.
제거반응이 산으로 전도될때, 용매존재 또는 없이 수행할 수 있다. 적합한 용매는 물, 종래 유기용매 또는 이들의 혼합물을 포함한다. 하이드라진을 사용하는 가수분해는 프타로일 형태 아미노-보호그룹을 제거키기 위해 통상적으로 사용된다. 환원성제거는 보호그룹, 예를 들면, 할로알콕시 카르보닐(즉, 트리클로로에톡시카르보닐 등), 치환되거나 또는 치환되지 않은 아르알콕시카르보닐(즉, 벤질옥시카르보닐 등), 2-피리딜메톡시카르보닐 등의 제거를 위해 일반적으로 사용된다.When the removal reaction is conducted to the acid, it can be carried out with or without solvent. Suitable solvents include water, conventional organic solvents or mixtures thereof. Hydrolysis using hydrazine is commonly used to remove phthaloyl form amino-protecting groups. Reductive elimination may be carried out by protecting groups such as haloalkoxy carbonyl (ie trichloroethoxycarbonyl, etc.), substituted or unsubstituted aralkoxycarbonyl (ie benzyloxycarbonyl, etc.), 2-pyridylmeth It is generally used for the removal of oxycarbonyl and the like.
적합한 환원은, 예를 들면, 알카리금속 보로키이드라이드(지, 소디움 보로하이드라이드 등)로 환원, 금속염화합물(즉, 크로모우스 클로라이드, 크로모우스 아세테이트 등)과 유기 또는 무기산(즉, 아세틱산, 프로피오닉산, 하이드로 클로릭산)으로 금속(즉, 주석, 아연, 철 등) 또는 언급한 금속과 함께 혼합으로 환언 또는 촉매성 환원을 포함한다. 적합한 촉매는 종래것 중 하나 예를 들면, 라네이부켈, 플라티늄 옥사이드, 목탄상 팔라듐과 같은 것을 포함한다.Suitable reductions are, for example, reduction with alkali metal borohydrides (eg, sodium borohydrides, etc.), metal salt compounds (ie chromose chloride, chromose acetate, etc.) and organic or inorganic acids (ie acetic acid). , Propionic acid, hydrochloric acid), in other words by mixing with other metals (ie, tin, zinc, iron, etc.) or the metals mentioned, or catalytic reduction. Suitable catalysts include one of the prior art, such as raneybukel, platinum oxide, palladium on charcoal.
보호그룹중, 아실그룹은 가수분해에 의해 일반적으로 제거할 수 있다. 특별히, 트리플루오로아세틸그룹은 중간조건에서 물로 처리하여 쉽게 제거할 수 있고 할로겐 치환된-알콕시 카르보닐과 8-퀴놀일옥시카르보닐 그룹은 구리, 아연과 같은 중금속으로 처리하여 통상적으로 제거된다. 보호그룹중, 아실그룹은 이미노 할로겐화제(즉, 포스포러스 옥시클로라이드 등)와 아미노 에스테르화제 즉, 저급알카놀(즉, 메탄올, 에탄올 등)로 처리하여, 만약 필요키다면, 가수분해에 의해 제거할 수 있다.Among the protecting groups, acyl groups can generally be removed by hydrolysis. In particular, trifluoroacetyl groups can be easily removed by treatment with water at intermediate conditions and halogen-substituted-alkoxy carbonyl and 8-quinolyloxycarbonyl groups are usually removed by treatment with heavy metals such as copper and zinc. Among the protecting groups, acyl groups are treated with an imino halogenating agent (i.e., phosphorus oxychloride, etc.) and an amino esterifying agent, i.e., lower alkanols (i.e., methanol, ethanol, etc.), if necessary, by hydrolysis. Can be removed.
반응온도는 중요하지 않고 아미노그룹을 위한 보호그룹의 종류와 상기 언급한 바와 같은 제거방법에 따라 적합하게 선택할 수 있고 반응은 냉각 또는 약간 상승된 온도와 같은 온화한 조건하에 바람직하게 수행한다.The reaction temperature is not critical and can be appropriately selected depending on the kind of protecting group for the amino group and the removal method as mentioned above, and the reaction is preferably performed under mild conditions such as cooling or slightly elevated temperature.
본 발명은 보호된 카르복시가 반응 또는 본 공정의 후처리단계 동안 유리카르복시 그룹으로 전환되는 경우를 포함한다.The present invention includes the case where the protected carboxy is converted to the free carboxy group during the reaction or the workup step of the present process.
공정 3Process 3
목적화합물(If) 또는 이들의 염은 화합물(Ig) 또는 이들의 염을 알킬화제와 반응시켜 제조할 수 있다.The desired compound (If) or salts thereof may be prepared by reacting compound (Ig) or salts thereof with an alkylating agent.
화합물(Ig)의 적합한 염은 화합물(III)에 예시된 것중 하나로 언급할 수 있다.Suitable salts of compound (Ig) may be mentioned as one of those exemplified for compound (III).
본 반응에서 사용된 적합한 알킬화제는 디(저급) 알킬설페이트(즉, 디메틸설페이트, 디에틸설페이트 등) 디아조(저급) 알칸(즉, 디아조메탄, 디아조에탄 등), 저급 알킬할라이드(즉, 메틸이오다이드, 에틸이오다이드, 에틸브로마이드 등), 저급 알킬설폰에이트(즉, 메틸 P-톨루엔설폰에이트 등)와 같은 것이 포함될 수 있다.Suitable alkylating agents used in this reaction include di (lower) alkylsulfates (i.e. dimethylsulfate, diethylsulfate, etc.) diazo (lower) alkanes (i.e. diazomethane, diazoethane, etc.), lower alkyl halides (i.e. Methyl iodide, ethyl iodide, ethyl bromide, etc.), lower alkylsulfonates (ie, methyl P-toluenesulfonate, etc.) may be included.
디아조-(저급)알칸을 사용하는 반응은 디에틸에테르, 디옥산 같은 용매 또는 냉각 또는 주위온도하 반응에 역영향을 미치지 않는 다른 용매에서 통상적으로 수행한다.Reactions with diazo- (lower) alkanes are commonly carried out in solvents such as diethyl ether, dioxane or other solvents that do not adversely affect the reaction under cooling or ambient temperature.
다른 알킬화제를 사용하는 반응은 물, 아세톤, 에탄올, 디에틸에테르, 디메틸포름아마이드 같은 용매 또는 냉각 내지 가열하 반응에 역영향을 미치지 않는 어떠한 다른 용매에서 통상적으로 수행하고 반응은 무기염기 또는 이미 언급한 바와 같은 유기염기 존재하에 바람직하게 수행한다.The reaction with other alkylating agents is usually carried out in solvents such as water, acetone, ethanol, diethyl ether, dimethylformamide or any other solvent which does not adversely affect the reaction under cooling or heating and the reaction is carried out with inorganic bases or already mentioned. It is preferably carried out in the presence of an organic base as shown.
공정 4Process 4
목적화합물(In) 또는 이들의 염은 화합물(Ii) 또는 이들의 염을 카르복시 보호그룹의 제거반응으로 맞춰 제조할 수 있다.The target compound (In) or salts thereof can be prepared by combining compound (Ii) or salts thereof by removing a carboxy protecting group.
화합물(Ii)의 적합한 염은 화합물(I)에 예시된 산부가염으로 언급할 수 있다.Suitable salts of compound (Ii) may be referred to as acid addition salts exemplified for compound (I).
본 제거반응에서, 모든 종래 방법이 카르복시 보호그룹의 제거반응에서 사용된다. 예를 들면, 가수분해, 환원이 사용할 수 있는 것이다. 카르복시그룹이 에스테르일 때, 가수분해에 의해 제거할 수 있다. 가수분해는 염기 또는 산의 존재하에 바람직하게 수행한다.In this removal reaction, all conventional methods are used in the removal reaction of carboxy protecting groups. For example, hydrolysis and reduction can be used. When the carboxy group is an ester, it can be removed by hydrolysis. Hydrolysis is preferably carried out in the presence of a base or an acid.
적합한 염기는 공정 2에서 언급한 바와 같은 무기염기와 유기염기가 포함될 수 있다.Suitable bases may include inorganic bases and organic bases as mentioned in Process 2.
적합한 산은 유기산(즉, 포르믹산, 아세틱산, 프로피오닉산 등)과 무기산(즉, 하이드로클로릭산, 하이드로브로믹산, 설퍼릭산 등)이 포함될 수 있다.Suitable acids may include organic acids (ie, formic acid, acetic acid, propionic acid, etc.) and inorganic acids (ie, hydrochloric acid, hydrobromic acid, sulfuric acid, etc.).
환언은 2-이오도에틸에스테르, 2,2,2-트리클로로에틸 에스테르 같은 보호그룹의 제거에 사용할 수 있다. 본 발명에 사용할 수 있는 환원은 금속(즉, 아연, 아연아말감 등) 또는 크롬염화합물(즉, 크로모우스 클로라이드, 크로모우스 아세테이트 등)과 유기 또는 무기산(즉, 아세틱산, 프로피오닉산, 하이드로클로릭산 등)의 조합을 사용하는 환원과 금속성 촉매존재하의 환원이 포함될 수 있다. 촉매성 환원을 위한 금속성 촉매류는, 예를 들면, 플라리늄 촉매(즉, 플라티늄와이어, 스폰지플라티늄, 플라티늄 블랙, 플라티늄클로이드 등), 팔라듐촉매(즉, 팔라듐스폰지, 팔라듐블랙, 팔라듐옥사이드, 바리옥설렌레이트상 팔라듐, 바리움카르본에이트상 팔라듐, 목탄상팔라듐, 실리카겔상팔라듐, 팔라듐클로이드 등), 니켈촉매(즉, 환원된 닉켈, 닉켈옥사이드, 라네이닉켈, 우루시바라닉켈 등)와 같은 것을 포함한다.In other words, it can be used for the removal of protecting groups such as 2-iodoethyl ester and 2,2,2-trichloroethyl ester. Reductions that may be used in the present invention include metals (i.e. zinc, zinc amalgam, etc.) or chromium salt compounds (i.e., chromus chloride, chromus acetate, etc.) and organic or inorganic acids (i.e. acetic acid, propionic acid, Reduction using a combination of hydrochloric acid, etc.) and reduction in the presence of a metallic catalyst. Metallic catalysts for catalytic reduction include, for example, platinum catalysts (ie, platinum wires, sponge platinum, platinum black, platinum claroids, etc.), palladium catalysts (ie, palladium sponges, palladium black, palladium oxides, and varieties). Such as palladium on oxalate, palladium on barium carbonate, palladium on charcoal, palladium on silica gel, palladium claroid, etc. Include.
반응온도는 중요하지 않고 카르복시보호그룹의 종류와 제거방법에 따라 선택될 수 있다.The reaction temperature is not critical and can be selected depending on the type of carboxy protecting group and the removal method.
공정 5Process 5
목적화합물(Ij) 또는 이들의 염은 화합물(In) 또는 이들의 염을 에스테르화 반응으로 맞춰 제조할 수 있다. 화합물(Ih)의 적합한 염은 화합물(I)을 위해 예시된 것중 하나로 언급할 수 있다.The target compound (Ij) or salts thereof can be prepared by matching the compound (In) or salts thereof by an esterification reaction. Suitable salts of compound (Ih) may be mentioned as one illustrated for compound (I).
본 반응에서 사용된 에스테르화제는 다음 구조식의 화합물일 수 있다.The esterifying agent used in the present reaction may be a compound of the following structural formula.
X-R5(XI)XR 5 (XI)
상기 구조식에서 R5는 상기 정의한 것이고, X는 하이드록시 또는 이들의 반응성 유도체.Wherein R 5 is as defined above and X is hydroxy or a reactive derivative thereof.
하이드록시의 반응성유도체의 적합한 예는 이미 언급한 바와 같은 산의 잔류물이 포함될 수 있다.Suitable examples of reactive derivatives of hydroxy may include residues of acids as already mentioned.
본 반응은 디메틸포름아마이드, 피리딘, 헥사메틸 포스포릭트리아마이드, 디옥산 같은 용매 또는 반응에 역영향을 미치지 않는 다른 용매에서 통상적으로 수행한다.The reaction is usually carried out in solvents such as dimethylformamide, pyridine, hexamethyl phosphortriamide, dioxane or other solvents that do not adversely affect the reaction.
화합물(Ih)가 유리산의 형태로 사용되는 경우에서, 반응은 공정 2에서 언급한 바와 같은 무기염기 또는 유기염기 같은 염기 존재하에 바람직하게 수행된다. 반응온도는 중요하지 않고 반응은 냉각, 주위온도 또는 따뜻한 곳에서 바람직하게 수행된다.In the case where compound (Ih) is used in the form of a free acid, the reaction is preferably carried out in the presence of a base such as an inorganic base or an organic base as mentioned in Step 2. The reaction temperature is not critical and the reaction is preferably carried out at cooling, ambient or warm.
이미 언급한 반응 또는 본 발명 공정의 후처리단계에서,이미 언급한 호변이성체는 임의로 다른 호변이성체로 변화되고 이러한 경우는 본 발명의 형태내에 포함된다.In the reactions already mentioned or in the post-treatment steps of the process of the invention, the tautomers already mentioned are optionally changed to other tautomers and such cases are included within the form of the invention.
이미 언급한 반응 또는 본 발명 공정의 후처리 단계에서, 언급된 신 또는 안티이성체는 부분적 또는 전체적으로 다른 이성체로 변형되고 이러한 경우는 본 발명 형태 이내에 포함된다.In the reactions already mentioned or in the post-treatment steps of the process of the invention, the mentioned syn or anti-isomers are modified, in part or in whole, into other isomers and such cases are included within the invention form.
목적화합물(I)이 4 위치에서 유리산 형태로 얻어지는 경우 또는 목적화합물(I)이 유리아미노 그룹인 경우에, 종래 방법에 의해 이미 언급한 바와 같은 약학적으로 받아들여질 수 있는 염으로 변형될 수 있다.When the desired compound (I) is obtained in free acid form at the 4 position or when the desired compound (I) is a free amino group, it can be modified by the conventional method into a pharmaceutically acceptable salt as already mentioned. have.
출발화합물의 제조방법은 다음에 상세히 설명되어 있다.The preparation of starting compounds is described in detail below.
화합물(X)는 화합물(II) 또는 아미노 그룹에서 이것의 반응성 유도체 또는 이들의 염을 화합물(IX) 또는 카르복시그룹에서 이것의 반응성유도체와 반응시켜 제조할 수 있다.Compound (X) may be prepared by reacting a reactive derivative thereof or a salt thereof at the compound (II) or an amino group with a reactive derivative thereof at the compound (IX) or carboxy group.
본 아실화반응은 종래 방법으로 수행한다.This acylation reaction is carried out by conventional methods.
출발화합물(Va)는 화합물(X)를 니트로소화제와 반응시켜 제조할 수 있다.Starting compounds (Va) can be prepared by reacting compound (X) with a nitrogenating agent.
적합한 니트로소화제는 니트로우스산, 알카리금속 니트레이트(즉, 소디움니트레이트 등), 저급알킬니트라이트(즉, 아밀니트라이트 등)가 포함될 수 있다.Suitable nitrosizing agents may include nitro acid, alkali metal nitrates (ie, sodium nitrate, etc.), lower alkylnitrites (ie, amylrite, etc.).
본 반응은 물, 아세틱산, 벤젠, 메탄올, 에탄올 같은 용매 또는 반응에 역영향을 미치지 않는 다른 용매에서 통상적으로 수행된다.The reaction is usually carried out in solvents such as water, acetic acid, benzene, methanol, ethanol or other solvents that do not adversely affect the reaction.
반응온도는 중요하지 않고 반응은 냉각 또는 주위온도에서 통상적으로 수행된다.The reaction temperature is not critical and the reaction is usually carried out at cooling or ambient temperature.
출발화합물(Vb)는 화합물(Va)를 알킬화제와 반응시켜 제조할 수 있다.Starting compound (Vb) can be prepared by reacting compound (Va) with an alkylating agent.
불반응은 공정 3의 반응에서 설명된 것과 유사한 방법으로 수행한다.The reaction is carried out in a similar manner as described for the reaction in process 3.
본 발명의 목적화합물(I)과 약학적으로 받아들여질 수 있는 이들의 염은 높은 항생작용을 나타내고 그림-양성과 그람음성 박테리아를 포함하는 미생물의 성장을 억제한다. 특별히, 목적화합물(I)의 신이성체와 약학적으로 받아들여질 수 있는 이들의 염의 신이성체는 목적화합물(I)과 약학적으로 받아들여질수 있는 이들의 상응하는 안티 이성체 보다 일반적으로 높은 항생작용을 나타낸다. 치료목적을 위해서 본 발명에 따른 화합물은 활성성분으로서 경구, 피하 또는 외부투여를 위해 적합한 유기 또는 무기고체 또는 액체 부형제와 같은 약학적으로 받아들여질 수 있는 담체와 혼합물로 언급한 화합물을 포함하는 약학적제제 형태로 사용할 수 있다. 약학적제제는 캡슐, 정제, 드라지, 연고 또는 좌제, 용액, 현탁액, 유제와 같은 것일 수 있다. 만약 원한다면, 상기 제제에서 보조물질, 안정제, 습윤 또는 유화제, 완충제와 다른 통상적으로 사용된 첨가제가 포함될 수 있다.The compound (I) of the present invention and its pharmaceutically acceptable salts exhibit high antibiotic activity and inhibit the growth of microorganisms, including pic-positive and gram-negative bacteria. In particular, the neoisomers of the target compound (I) and their pharmaceutically acceptable salts generally exhibit higher antibiotic activity than the target compound (I) and their corresponding anti-isomers which are pharmaceutically acceptable. Indicates. For therapeutic purposes, the compounds according to the invention are pharmaceutical preparations comprising the compounds mentioned in admixture as pharmaceutically acceptable carriers and mixtures, such as organic or inorganic solids or liquid excipients which are suitable for oral, subcutaneous or external administration as active ingredients. It can be used in the form of a formulation. The pharmaceutical preparation may be such as a capsule, tablet, dragee, ointment or suppository, solution, suspension, emulsion. If desired, auxiliary, stabilizer, wetting or emulsifying agents, buffers and other commonly used additives may be included in the formulation.
화합물의 투여량은 나이와 환자의 조건에 따라 변환하는 한편, 본 발명에 따른 화합물의 10mg, 50mg, 100mg, 250mg, 500mg과 1000mg의 평균 1회 투여량은 병원성 박테리아에 기인한 감염성질병 치료를 위해 효과적인 것으로 증명되었다.The dosage of the compound is converted according to age and the condition of the patient, while the average single dose of 10 mg, 50 mg, 100 mg, 250 mg, 500 mg and 1000 mg of the compound according to the invention is used for the treatment of infectious diseases caused by pathogenic bacteria. It proved to be effective.
목적화합물의 유용성을 설명하기 위해서, 병원성 박테리아의 시험균주에 대한 본 발명의 대표적 화합물의 항생작용은 최소저해 농도이하에서 보여준다.To demonstrate the usefulness of the target compound, the antibiotic activity of the representative compounds of the present invention on test strains of pathogenic bacteria is shown below the minimum inhibitory concentration.
시험방법Test Methods
시험관내에서 항생작용은 하기 기술된 바와 같은 두배 한천배지판 희석방법에 의해 결정된다.In vitro antibiotic activity is determined by a double agar plate dilution method as described below.
트리프티카세-콩육즙에서 각 시험균주의 철야배양의 한고리(ml당 108생세포)를 대표적 시험화합물의 등급된 농도를 포함하는 HI-한천배지상에서 배양하고 최소 저해농도[MIC]를 37℃에서 20시간 배양 후 μg/ml로 표현한다.In tripeptase-soybean juice, one ring (10 8 live cells per ml) of the overnight culture of each test strain was cultured on HI-agar medium containing graded concentrations of representative test compounds and the minimum inhibitory concentration [MIC] was 37 ° C. After 20 hours incubation in μg / ml.
시험화합물Test compound
(1) 2-메틸-7-[2-메톡시 이미노-2-(2-아미노티아졸-4-일) 아세트아미도]-3-세팜-4-카르복실릭산(신이성체)[시험화합물(1)](1) 2-Methyl-7- [2-methoxy imino-2- (2-aminothiazol-4-yl) acetamido] -3-cepam-4-carboxylic acid (neoisomer) [test Compound (1)]
(2) 피발오일옥시메틸 2-메틸-7-[2-메톡시이미노-2-(2-아미노티아졸-4-일)아세트아미도]-3-세팜-4-카르복실레이트(신이성체)[시험화합물(2)](2) pivaloyloxymethyl 2-methyl-7- [2-methoxyimino-2- (2-aminothiazol-4-yl) acetamido] -3-cepam-4-carboxylate (neoisomer) [Test Compound (2)]
Claims (1)
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KR1019810003177A KR810001351B1 (en) | 1977-06-28 | 1981-08-28 | Process for preparing 2-lower alkyl-7-substituted-2 or 3-cefe-4-carboxylic acid compound |
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KR7701493A KR810001350B1 (en) | 1977-06-28 | 1977-06-28 | Process for preparing 2-lower alkyl-7-substituted-2 or 3-cefe-4-carboxylic acid compound |
KR1019810003177A KR810001351B1 (en) | 1977-06-28 | 1981-08-28 | Process for preparing 2-lower alkyl-7-substituted-2 or 3-cefe-4-carboxylic acid compound |
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KR7701493A Division KR810001350B1 (en) | 1977-06-28 | 1977-06-28 | Process for preparing 2-lower alkyl-7-substituted-2 or 3-cefe-4-carboxylic acid compound |
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1981
- 1981-08-28 KR KR1019810003177A patent/KR810001351B1/en not_active Expired
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