KR20240144253A - Compositions, films, optical filters, solid-state imaging devices, image display devices, infrared sensors, camera modules and compounds - Google Patents

Abstract

A composition comprising an infrared absorber, a curable compound, and a solvent, wherein the infrared absorber comprises a compound represented by formula (1). A film, an optical filter, a solid-state imaging element, an image display device, an infrared sensor, a camera module, and a compound.

Description

Compositions, films, optical filters, solid-state imaging devices, image display devices, infrared sensors, camera modules and compounds

The present invention relates to a composition comprising a squarylium compound. In addition, the present invention relates to a film, an optical filter, a solid-state imaging device, an image display device, an infrared sensor, a camera module, and a compound using the composition.

Video cameras, digital still cameras, and mobile phones with camera functions use solid-state image pickup devices, such as CCDs (charge-coupled devices) and CMOSs (complementary metal oxide semiconductors), for color images. These solid-state image pickup devices use silicon photodiodes that are sensitive to infrared rays in their light-receiving sections. For this reason, an infrared cutoff filter is sometimes provided to correct visibility.

Infrared blocking filters are manufactured using a composition containing an infrared absorbent. Known infrared absorbents include squarylium compounds.

Patent Document 1 describes the manufacture of an infrared blocking filter or the like using a composition containing a specific squarylium compound or the like.

Patent Document 1: International Publication No. 2014/088063

However, squarylium compounds tend to have low light resistance. Therefore, there was room for further improvement in the light resistance of films obtained using compositions containing these compounds.

In addition, since squarylium compounds have a salt structure in the molecule, they tend to have low solubility in solvents. For this reason, for a composition containing a squarylium compound, the squarylium compound is likely to precipitate during storage of the composition, and when a film is formed using the composition after storage, foreign substances, etc. are likely to occur in the film. For this reason, there was room for further improvement in the storage stability of a composition containing a squarylium compound.

Accordingly, the purpose of the present invention is to provide a composition capable of forming a film having excellent preservation stability and also excellent light resistance. In addition, the present invention provides a film, an optical filter, a solid-state imaging element, an image display device, an infrared sensor, a camera module, and a compound.

The present invention provides the following.

<1> Containing an infrared absorber, a curable compound, and a solvent,

The above infrared absorbent is a composition comprising a compound represented by formula (1);

[Chemical Formula 1]

In formula (1), A and B each independently represent an aromatic hydrocarbon ring or an aromatic heterocycle,

R ^aa1 and R ^aa2 each independently represent a halogen atom, a sulfo group, a hydroxy group, a cyano group, a nitro group, a carboxyl group, a phosphoric acid group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an acyl group, an alkoxycarbonyl group, -NR ^a11 R ^a12 , -SR ^a13 , -SO ₂ R ^a14 , or -OSO ₂ R ^a15 ,

R ^a11 and R ^a12 each independently represent a hydrogen atom, an alkyl group, an aryl group, or a heterocyclic group,

R ^a13 ~R ^a15 each independently represent an alkyl group, an aryl group, or a heterocyclic group,

R ^b1 to R ^b4 each independently represent a hydrogen atom, a halogen atom, a sulfo group, a hydroxy group, a cyano group, a nitro group, a carboxyl group, a phosphoric acid group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an acyl group, an alkoxycarbonyl group, -NR ^b11 R ^b12 , -NHCOR ^b13 , -NHSO ₂ R ^b14 , -NHCSNHR ^b15 , -SR ^b16 , -SO ₂ R ^b17 , -OSO ₂ R ^b18 , -NHCSR ^b19 , -NHCONHR ^b20 or -NHCOOR ^b21 ,

R ^b11 and R ^b12 each independently represent a hydrogen atom, an alkyl group, an aryl group, or a heterocyclic group,

R ^b13 to R ^b21 each independently represent an alkyl group, an aryl group, or a heterocyclic group,

Y ¹ to Y ⁴ each independently represent a hydrogen atom, an alkyl group, an aryl group, a heterocyclic group, or a group represented by the formula (Y-1).

m1 represents an integer from 0 to mA, and mA represents the maximum integer that R ^aa1 can be replaced with A.

m2 represents an integer from 0 to mB, and mB represents the maximum integer that R ^aa2 can be replaced with B.

If m1 is 2 or more, two R ^aa1s among m1 R ^aa1s may combine to form a ring,

If m2 is 2 or more, two R ^aa2s among m2 R ^aa2s can combine to form a ring.

R ^aa1 and Y ¹ may be combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom,

R ^aa1 and Y ² may be combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom,

R ^aa2 and Y ³ may be combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom,

R ^aa2 and Y ⁴ may be combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom,

Y ¹ and Y ² may be combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom,

Y ³ and Y ⁴ may be combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom;

However, at least one of Y ¹ to Y ⁴ is a group represented by formula (Y-1), and further, at least one selected from R ^aa1 and Y ¹ , R ^aa1 and Y ² , R ^aa2 and Y ³ , and R ^aa2 and Y ⁴ is combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom;

[Chemical formula 2]

In formula (Y-1), the dashed line represents the bond loss,

Ry ¹ to Ry ⁴ each independently represent a hydrogen atom, an alkyl group, or an aryl group,

X ¹ represents a single bond, an alkylene group, an arylene group, -O-, -S-, -NRx-, -CO-, -CS-, -SO-, or -SO ₂ -, or a group combining two or more selected from an alkylene group, an arylene group, -O-, -S-, -NRx-, -CO-, -CS-, -SO-, and -SO ₂ -, and Rx represents a hydrogen atom, an alkyl group, or an aryl group,

Z ¹ represents an alicyclic hydrocarbon group, an aromatic hydrocarbon group, a heterocyclic group, or a group represented by any one of the formulae (Z-1) to (Z-6);

However, when Z ¹ is a group represented by formula (Z-1) or a group represented by formula (Z-4), the part connected to Z ¹ in X ¹ is an alkylene group or an arylene group;

[Chemical Formula 3]

In formulas (Z-1) to (Z-6), the dashed lines represent bond losses;

In formula (Z-1), Rz ¹¹ represents an alkyl group or an aryl group;

In formula (Z-2), Rz ¹² represents a hydrogen atom, -COR ¹⁰⁰ , or -COOR ¹⁰⁰ , R ¹⁰⁰ represents a hydrogen atom, an alkyl group, or an aryl group, Rz ^12a represents an alkyl group, and mz represents an integer from 0 to 4;

In formula (Z-3), Rz ¹³ to Rz ¹⁶ each independently represent an alkyl group, and Rz ¹⁷ represents a hydrogen atom, an alkyl group, or an oxygen radical;

In formula (Z-4), Rz ¹⁸ and Rz ¹⁹ each independently represent an alkyl group or an aryl group;

In formula (Z-6), W ¹ represents a single bond, an alkylene group, an arylene group, or -CO-, Rz ²⁰ represents a hydrogen atom, an alkyl group, an aryl group, or -COR ¹⁰¹ , and R ¹⁰¹ represents an alkyl group or an aryl group.

<2> The composition described in <1>, wherein the compound represented by the above formula (1) is a compound represented by the formula (2);

[Chemical Formula 4]

In formula (2), R ^a1 to R ^a4 each independently represent a hydrogen atom, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, a phosphoric acid group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an acyl group, an alkoxycarbonyl group, -NR ^a11 R ^a12 , -SR ^a13 , -SO ₂ R ^a14 , or -OSO ₂ R ^a15 ,

R ^a11 and R ^a12 each independently represent a hydrogen atom, an alkyl group, an aryl group, or a heterocyclic group,

R ^a13 ~R ^a15 each independently represent an alkyl group, an aryl group, or a heterocyclic group,

R ^b1 to R ^b4 each independently represent a hydrogen atom, a halogen atom, a sulfo group, a hydroxy group, a cyano group, a nitro group, a carboxyl group, a phosphoric acid group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an acyl group, an alkoxycarbonyl group, -NR ^b11 R ^b12 , -NHCOR ^b13 , -NHSO ₂ R ^b14 , -NHCSNHR ^b15 , -SR ^b16 , -SO ₂ R ^b17 , -OSO ₂ R ^b18 , -NHCSR ^b19 , -NHCONHR ^b20 or -NHCOOR ^b21 ,

R ^b11 and R ^b12 each independently represent a hydrogen atom, an alkyl group, an aryl group, or a heterocyclic group,

R ^b13 to R ^b21 each independently represent an alkyl group, an aryl group, or a heterocyclic group,

Y ¹ to Y ⁴ each independently represent a hydrogen atom, an alkyl group, an aryl group, a heterocyclic group or a group represented by the above formula (Y-1),

R ^a1 and Y ¹ may be combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom,

R ^a2 and Y ² may be combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom,

R ^a3 and Y ³ may be combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom,

R ^a4 and Y ⁴ may be combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom,

Y ¹ and Y ² may be combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom,

Y ³ and Y ⁴ may be combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom;

However, at least one of Y ¹ to Y ⁴ is a group represented by the above formula (Y-1), and further, at least one selected from R ^a1 and Y ¹ , R ^a2 and Y ² , R ^a3 and Y ³ , and R ^a4 and Y ⁴ is combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom.

<3> The composition described in <1>, wherein the compound represented by the above formula (1) is a compound represented by the formula (3);

[Chemical Formula 5]

In formula (3), R ¹³ to R ¹⁷ and R ²³ to R ²⁷ each independently represent a hydrogen atom, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, a phosphoric acid group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an acyl group, an alkoxycarbonyl group, -NR ^a11 R ^a12 , -SR ^a13 , -SO ₂ R ^a14 , or -OSO ₂ R ^a15 .

R ^a11 and R ^a12 each independently represent a hydrogen atom, an alkyl group, an aryl group, or a heterocyclic group,

R ^a13 ~R ^a15 each independently represent an alkyl group, an aryl group, or a heterocyclic group,

R ¹¹ , R ¹² , R ²¹ and R ²² each independently represent a hydrogen atom, a halogen atom, a sulfo group, a hydroxy group, a cyano group, a nitro group, a carboxyl group, a phosphoric acid group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an acyl group, an alkoxycarbonyl group, -NR ^b11 R ^b12 , -NHCOR ^b13 , -NHSO ₂ R ^b14 , -NHCSNHR ^b15 , -SR ^b16 , -SO ₂ R ^b17 , -OSO ₂ R ^b18 , -NHCSR ^b19 , -NHCONHR ^b20 or -NHCOOR ^b21 ,

R ^b11 and R ^b12 each independently represent a hydrogen atom, an alkyl group, an aryl group, or a heterocyclic group,

R ^b13 to R ^b21 each independently represent an alkyl group, an aryl group, or a heterocyclic group,

Y ¹¹ and Y ²¹ each independently represent a hydrogen atom, an alkyl group, an aryl group, a heterocyclic group or a group represented by the above formula (Y-1), and at least one of Y ¹¹ and Y ²¹ is a group represented by the above formula (Y-1).

<4> A composition as described in <3>, wherein at least one of R ¹¹ and R ¹² and at least one of R ²¹ and R ²² of the above formula (3) are each independently -NHCOR ^b13 , and R ^b13 is an alkyl group, an aryl group, or a heterocyclic group.

<5> The composition described in <3>, wherein at least one of R ¹¹ and R ¹² and at least one of R ²¹ and R ²² of the above formula (3) are each independently -NHSO ₂ R ^b14 , and R ^b14 is an alkyl group, an aryl group, or a heterocyclic group.

<6> A composition according to any one of <1> to <5>, wherein the curable compound comprises a resin.

<7> A composition according to any one of <1> to <6>, wherein the infrared absorbent further comprises an infrared absorbent other than the compound represented by the formula (1).

<8> A composition according to any one of <1> to <7>, further comprising at least one selected from ultraviolet absorbers and antioxidants.

<9> A film obtained by using the composition described in any one of <1> to <8>.

<10> An optical filter comprising a film as described in <9>.

<11> A solid-state imaging device comprising a film as described in <9>.

<12> An image display device comprising a membrane as described in <9>.

<13> An infrared sensor comprising a membrane as described in <9>.

<14> A camera module including the membrane described in <9>.

<15> A compound represented by formula (1);

[Chemical formula 6]

In formula (1), A and B each independently represent an aromatic hydrocarbon ring or an aromatic heterocycle,

R ^aa1 and R ^aa2 each independently represent a halogen atom, a sulfo group, a hydroxy group, a cyano group, a nitro group, a carboxyl group, a phosphoric acid group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an acyl group, an alkoxycarbonyl group, -NR ^a11 R ^a12 , -SR ^a13 , -SO ₂ R ^a14 , or -OSO ₂ R ^a15 ,

R ^a11 and R ^a12 each independently represent a hydrogen atom, an alkyl group, an aryl group, or a heterocyclic group,

R ^a13 ~R ^a15 each independently represent an alkyl group, an aryl group, or a heterocyclic group,

R ^b1 to R ^b4 each independently represent a hydrogen atom, a halogen atom, a sulfo group, a hydroxy group, a cyano group, a nitro group, a carboxyl group, a phosphoric acid group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an acyl group, an alkoxycarbonyl group, -NR ^b11 R ^b12 , -NHCOR ^b13 , -NHSO ₂ R ^b14 , -NHCSNHR ^b15 , -SR ^b16 , -SO ₂ R ^b17 , -OSO ₂ R ^b18 , -NHCSR ^b19 , -NHCONHR ^b20 or -NHCOOR ^b21 ,

R ^b11 and R ^b12 each independently represent a hydrogen atom, an alkyl group, an aryl group, or a heterocyclic group,

R ^b13 to R ^b21 each independently represent an alkyl group, an aryl group, or a heterocyclic group,

Y ¹ to Y ⁴ each independently represent a hydrogen atom, an alkyl group, an aryl group, a heterocyclic group, or a group represented by the formula (Y-1).

m1 represents an integer from 0 to mA, and mA represents the maximum integer that R ^aa1 can be replaced with A.

m2 represents an integer from 0 to mB, and mB represents the maximum integer that R ^aa2 can be replaced with B.

If m1 is 2 or more, two R ^aa1s among m1 R ^aa1s may combine to form a ring,

If m2 is 2 or more, two R ^aa2s among m2 R ^aa2s can combine to form a ring.

R ^aa1 and Y ¹ may be combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom,

R ^aa1 and Y ² may be combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom,

R ^aa2 and Y ³ may be combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom,

R ^aa2 and Y ⁴ may be combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom,

Y ¹ and Y ² may be combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom,

Y ³ and Y ⁴ may be combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom;

However, at least one of Y ¹ to Y ⁴ is a group represented by formula (Y-1), and further, at least one selected from R ^aa1 and Y ¹ , R ^aa1 and Y ² , R ^aa2 and Y ³ , and R ^aa2 and Y ⁴ is combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom;

[Chemical formula 7]

In formula (Y-1), the dashed line represents the bond loss,

Ry ¹ to Ry ⁴ each independently represent a hydrogen atom, an alkyl group, or an aryl group,

X ¹ represents a single bond, an alkylene group, an arylene group, -O-, -S-, -NRx-, -CO-, -CS-, -SO-, or -SO ₂ -, or a group combining two or more selected from an alkylene group, an arylene group, -O-, -S-, -NRx-, -CO-, -CS-, -SO-, and -SO ₂ -, and Rx represents a hydrogen atom, an alkyl group, or an aryl group,

Z ¹ represents an alicyclic hydrocarbon group, an aromatic hydrocarbon group, a heterocyclic group, or a group represented by any one of the formulae (Z-1) to (Z-6);

However, when Z ¹ is a group represented by formula (Z-1) or a group represented by formula (Z-4), the part connected to Z ¹ in X ¹ is an alkylene group or an arylene group;

[Chemical formula 8]

In formulas (Z-1) to (Z-6), the dashed lines represent bond losses;

In formula (Z-1), Rz ¹¹ represents an alkyl group or an aryl group;

In formula (Z-2), Rz ¹² represents a hydrogen atom, -COR ¹⁰⁰ , or -COOR ¹⁰⁰ , R ¹⁰⁰ represents a hydrogen atom, an alkyl group, or an aryl group, Rz ^12a represents an alkyl group, and mz represents an integer from 0 to 4;

In formula (Z-3), Rz ¹³ to Rz ¹⁶ each independently represent an alkyl group, and Rz ¹⁷ represents a hydrogen atom, an alkyl group, or an oxygen radical;

In formula (Z-4), Rz ¹⁸ and Rz ¹⁹ each independently represent an alkyl group or an aryl group;

In formula (Z-6), W ¹ represents a single bond, an alkylene group, an arylene group, or -CO-, Rz ²⁰ represents a hydrogen atom, an alkyl group, an aryl group, or -COR ¹⁰¹ , and R ¹⁰¹ represents an alkyl group or an aryl group.

According to the present invention, a composition can be provided that is capable of forming a film having excellent preservation stability and, further, excellent light resistance. In addition, the present invention can provide a film, an optical filter, a solid-state imaging element, an image display device, an infrared sensor, a camera module, and a compound.

Figure 1 is a schematic diagram showing one embodiment of an infrared sensor.

Below, the contents of the present invention are described in detail.

In this specification, “~” is used to mean that the numerical values described before and after it are included as lower and upper limits.

In the notation of groups (atomic groups) in this specification, a notation that does not describe substitution and unsubstitution includes groups (atomic groups) that have a substituent as well as groups (atomic groups) that do not have a substituent. For example, "alkyl group" includes not only an alkyl group that does not have a substituent (unsubstituted alkyl group) but also an alkyl group that has a substituent (substituted alkyl group).

In this specification, unless otherwise specified, the term "exposure" includes not only exposure using light but also drawing using particle beams such as electron beams and ion beams. In addition, examples of light used for exposure include active light or radiation such as the luminescence spectrum of a mercury lamp, ultraviolet rays represented by an excimer laser, extreme ultraviolet rays (EUV light), X-rays, and electron beams.

In this specification, “(meth)acrylate” represents either one or both of acrylate and methacrylate, “(meth)acryl” represents either one or both of acrylic and methacrylic, and “(meth)acryloyl” represents either one or both of acryloyl and methacryloyl.

In this specification, the weight average molecular weight and number average molecular weight are defined as polystyrene conversion values in gel permeation chromatography (GPC) measurement.

In this specification, Me in the chemical formula represents a methyl group, Et represents an ethyl group, Bu represents a butyl group, and Ph represents a phenyl group.

In this specification, infrared refers to light (electromagnetic waves) with a wavelength of 700 to 2500 nm.

In this specification, total solid content refers to the total mass of all components of the composition excluding the solvent.

The term "process" as used herein includes not only an independent process but also a process that is not clearly distinguishable from other processes, provided that the desired function of the process is achieved.

<Composition>

The composition of the present invention comprises an infrared absorber, a curable compound, and a solvent.

The above infrared absorbent is characterized by including a compound represented by formula (1).

The composition of the present invention can form a film having excellent preservation stability and suppressing the occurrence of foreign substances, etc. even after long-term storage. In addition, the present invention can form a film having excellent light resistance. The detailed reason for obtaining such an effect is unclear, but it is presumed to be due to the following.

The compound represented by formula (1) included in the composition of the present invention has a structure in which at least one of Y ¹ to Y ⁴ is a group represented by formula (Y-1), and further, at least one selected from R ^aa1 and Y ¹ , R ^aa1 and Y ² , R ^aa2 and Y ³ , and R ^aa2 and Y ⁴ is bonded to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom, thereby improving compatibility with a solvent or a curable compound included in the composition, and as a result, it is presumed that a composition having excellent storage stability can be achieved.

In addition, squarylium compounds tend to easily form H associations in the film during film formation. Since H associations are formed, light resistance tends to be reduced, but it is presumed that the compound represented by formula (1) can suppress the formation of H associations in the film by having the structure described above. Therefore, by using the composition of the present invention, a film with excellent light resistance can be formed.

The composition of the present invention can be used as a composition for an optical filter. Types of optical filters include infrared cutoff filters and infrared transmission filters.

The compound represented by formula (1) can suppress the formation of H association in a film, and thus, by using the composition of the present invention, a film having excellent visible light transmittance and excellent infrared shielding properties can be formed. For this reason, the composition of the present invention is particularly preferably used as a composition for an infrared cutoff filter.

Below, each component used in the composition of the present invention is described.

<<Infrared absorber>>

The composition of the present invention includes an infrared absorbent. The infrared absorbent included in the composition of the present invention includes a compound represented by formula (1). The compound represented by formula (1) is also a compound of the present invention. Hereinafter, the compound represented by formula (1) is also referred to as a specific compound.

(a specific compound (a compound represented by formula (1)))

[Chemical formula 9]

A and B in formula (1) each independently represent an aromatic hydrocarbon ring or an aromatic heterocycle.

The number of carbon atoms constituting the aromatic hydrocarbon ring is preferably 6 to 48, more preferably 6 to 22, and particularly preferably 6 to 12. The aromatic hydrocarbon ring is preferably a monocyclic ring or a condensed ring having 2 to 8 condensed atoms, more preferably a monocyclic ring or a condensed ring having 2 to 4 condensed atoms, more preferably a monocyclic ring or a condensed ring having 2 or 3 condensed atoms, more preferably a monocyclic ring or a condensed ring having 2 condensed atoms, and particularly preferably a monocyclic ring.

The aromatic heterocycle is preferably a 5-membered ring or a 6-membered ring. The aromatic heterocycle is preferably a monocyclic ring or a condensed ring having 2 to 8 members, more preferably a monocyclic ring or a condensed ring having 2 to 4 members, more preferably a monocyclic ring or a condensed ring having 2 or 3 members, more preferably a monocyclic ring or a condensed ring having 2 members, and particularly preferably a monocyclic ring. Examples of the heteroatom constituting the aromatic heterocyclic ring include a nitrogen atom, an oxygen atom, and a sulfur atom, and a nitrogen atom and a sulfur atom are preferable. The number of heteroatoms constituting the aromatic heterocyclic ring is preferably 1 to 3, more preferably 1 to 2.

In formula (1), it is preferable that at least one of A and B (preferably both of A and B) is a benzene ring, a thiophene ring, a furan ring, a pyrrole ring, a pyridine ring, an azulene ring, or a condensed ring including these rings. Examples of the condensed ring described above include a naphthalene ring, a benzothiophene ring, a benzofuran ring, an isobenzofuran ring, a benzimidazole ring, an indole ring, an isoindole ring, a quinoline ring, an isoquinoline ring, a thienopyrrole ring, a pyrrolothiazole ring, and the like. It is preferable that at least one of A and B (preferably both of A and B) is a benzene ring or a naphthalene ring, and it is more preferable that it is a benzene ring.

R ^aa1 and R ^aa2 in formula (1) each independently represent a halogen atom, a sulfo group, a hydroxy group, a cyano group, a nitro group, a carboxyl group, a phosphoric acid group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an acyl group, an alkoxycarbonyl group, -NR ^a11 R ^a12 , -SR ^a13 , -SO ₂ R ^a14 , or -OSO ₂ R ^a15 ,

R ^a11 and R ^a12 each independently represent a hydrogen atom, an alkyl group, an aryl group, or a heterocyclic group,

R ^a13 to R ^a15 each independently represent an alkyl group, an aryl group, or a heterocyclic group.

Halogen atoms represented by R ^aa1 and R ^aa2 include fluorine atoms, chlorine atoms, bromine atoms, and iodine atoms.

The number of carbon atoms in the alkyl group represented by R ^aa1 , R ^aa2 , R ^a11 to R ^a15 is preferably 1 to 20, more preferably 1 to 15, and even more preferably 1 to 8. The alkyl group may be linear, branched, or cyclic, and linear or branched is preferable. The alkyl group may have a substituent. As the substituent, a group represented by the substituent T described below can be mentioned, and it is preferable that it is at least one selected from the group consisting of an aryl group, a heterocyclic group, a halogen atom, a sulfo group, a hydroxy group, a cyano group, a nitro group, a carboxyl group, a phosphoric acid group, and an amino group.

The number of carbon atoms in the aryl group represented by R ^aa1 , R ^aa2 , R ^a11 to R ^a15 is preferably 6 to 48, more preferably 6 to 22, and even more preferably 6 to 12. The aryl group may have a substituent. As the substituent, a group represented by the substituent T described below can be mentioned, and it is preferable that it is at least one selected from the group consisting of an alkyl group, a heterocyclic group, a halogen atom, a sulfo group, a hydroxy group, a cyano group, a nitro group, a carboxyl group, a phosphoric acid group, and an amino group.

The heterocyclic group represented by R ^aa1 , R ^aa2 , R ^a11 to R ^a15 is preferably a 5-membered or 6-membered heterocyclic group. In addition, the heterocyclic group is preferably a monocyclic heterocyclic group or a condensed ring heterocyclic group having a condensation number of 2 to 8, more preferably a monocyclic heterocyclic group or a condensed ring heterocyclic group having a condensation number of 2 to 4, and still more preferably a monocyclic heterocyclic group or a condensed ring heterocyclic group having a condensation number of 2 or 3. The heteroatom constituting the ring of the heterocyclic group is preferably a nitrogen atom, an oxygen atom, or a sulfur atom. The number of heteroatoms constituting the ring of the heterocyclic group is preferably 1 to 3, and more preferably 1 to 2. The number of carbon atoms constituting the ring of the heterocyclic group is preferably 1 to 30, more preferably 1 to 18, and still more preferably 1 to 12. The heterocyclic group may have a substituent. As a substituent, a group represented by the substituent T described below can be mentioned, and it is preferable that it be at least one selected from the group consisting of an alkyl group, an aryl group, a heterocyclic group, a halogen atom, a sulfo group, a hydroxy group, a cyano group, a nitro group, a carboxyl group, a phosphoric acid group, and an amino group.

The number of carbon atoms in the alkoxy group represented by R ^aa1 and R ^aa2 is preferably 1 to 20, more preferably 1 to 15, and even more preferably 1 to 8. The alkoxy group is preferably linear or branched. The alkoxy group may have a substituent. As the substituent, a group represented by the substituent T described below can be mentioned, and it is preferable that it is at least one selected from the group consisting of an alkyl group, an aryl group, a heterocyclic group, a halogen atom, a sulfo group, a hydroxy group, a cyano group, a nitro group, a carboxyl group, a phosphoric acid group, and an amino group.

The carbon number of the acyl group represented by R ^aa1 and R ^aa2 is preferably 2 to 30, more preferably 2 to 15, and still more preferably 2 to 8. Examples of the acyl group include a formyl group, an alkylcarbonyl group, and an arylcarbonyl group. The carbon number of the alkylcarbonyl group is preferably 2 to 30, more preferably 2 to 15, and still more preferably 2 to 8. The carbon number of the arylcarbonyl group is preferably 7 to 30, more preferably 7 to 20, and still more preferably 7 to 12. The acyl group may have a substituent. Examples of the substituent include groups represented by the substituent T described below, and it is preferable that it is at least one selected from the group consisting of an alkyl group, an aryl group, a heterocyclic group, a halogen atom, a sulfo group, a hydroxy group, a cyano group, a nitro group, a carboxyl group, a phosphoric acid group, and an amino group.

The number of carbon atoms in the alkoxycarbonyl group represented by R ^aa1 and R ^aa2 is preferably 2 to 30, more preferably 2 to 15, and even more preferably 2 to 8. The alkoxycarbonyl group may have a substituent. As the substituent, a group represented by the substituent T described below can be mentioned, and it is preferable that it is at least one selected from the group consisting of an alkyl group, an aryl group, a heterocyclic group, a halogen atom, a sulfo group, a hydroxy group, a cyano group, a nitro group, a carboxyl group, a phosphoric acid group, and an amino group.

In equation (1), m1 represents an integer from 0 to mA, and mA represents the maximum integer that R ^aa1 can be replaced with A.

m2 represents an integer from 0 to mB, and mB represents the maximum integer that R ^aa2 can be replaced with B.

If m1 is 2 or more, two R ^aa1s among m1 R ^aa1s may combine to form a ring,

When m2 is 2 or more, two R ^aa2s among m2 R ^aa2s may combine to form a ring.

For example, when A is a benzene ring, mA becomes 2. It is preferable that m1 and m2 are each independently an integer from 0 to 2, and more preferably 1 or 2.

R ^b1 to R ^b4 in formula (1) each independently represent a hydrogen atom, a halogen atom, a sulfo group, a hydroxy group, a cyano group, a nitro group, a carboxyl group, a phosphoric acid group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an acyl group, an alkoxycarbonyl group, -NR ^b11 R ^b12 , -NHCOR ^b13 , -NHSO ₂ R ^b14 , -NHCSNHR ^b15 , -SR ^b16 , -SO ₂ R ^b17 , -OSO ₂ R ^b18 , -NHCSR ^b19 , -NHCONHR ^b20 or -NHCOOR ^b21 ,

R ^b11 and R ^b12 each independently represent a hydrogen atom, an alkyl group, an aryl group, or a heterocyclic group,

R ^b13 to R ^b21 each independently represent an alkyl group, an aryl group, or a heterocyclic group.

The halogen atom, alkoxy group, acyl group and alkoxycarbonyl group represented by R ^b1 to R ^b4 are the same as the halogen atom, alkoxy group, acyl group and alkoxycarbonyl group represented by R ^aa1 and R ^aa2 , and the preferred ranges are also the same.

The alkyl groups, aryl groups and heterocyclic groups represented by R ^b1 to R ^b4 and R ^b11 to R ^b21 are the same as the alkyl groups, aryl groups and heterocyclic groups represented by R ^aa1 and R ^aa2 , and the preferred ranges are also the same.

The alkyl group represented by R ^b11 to R ^b21 is also preferably a fluoroalkyl group because it can further improve visible light transmittance and infrared shielding properties.

In formula (1), at least one of R ^b1 and R ^b2 and at least one of R ^b3 and R ^b4 are each independently preferably -NHCOR ^b13 , -NHSO ₂ R ^b14 , -NHCSNHR ^b15 , -SO ₂ R ^b17 , -NHCSR ^b19 , -NHCONHR ^b20 or -NHCOOR ^b21 , and -NHCOR ^b13 or -NHSO ₂ R ^b14 is more preferable, and -NHCOR ^b13 is even more preferable because this can further improve visible light transmittance and infrared shielding property. R ^b13 , R ^b14 , R ^b15 , R ^b17 , R ^b19 , R ^b20 and R ^b21 are each independently preferably an alkyl group or an aryl group, more preferably an alkyl group, and more preferably a fluoroalkyl group because this can further improve visible light transmittance and infrared shielding properties.

In formula (1), it is preferable that one of R ^b1 and R ^b2 is -NHCOR ^b13 , -NHSO ₂ R ^b14 , -NHCSNHR ^b15 , -SO ₂ R ^b17 , -NHCSR ^b19 , -NHCONHR ^b20 or -NHCOOR ^b21 and the other is a hydrogen atom, and further, one of R ^b3 and R ^b4 is -NHCOR ^b13 , -NHSO ₂ R ^b14 , -NHCSNHR ^b15 , -SO ₂ R ^b17 , -NHCSR ^b19 , -NHCONHR ^b20 or -NHCOOR ^b21 and the other is a hydrogen atom, and one of R ^b1 and R ^b2 is -NHCOR ^b13 or -NHSO ₂ R ^b14 and the other is a hydrogen atom, and further, one of R ^b3 and R ^b4 is -NHCOR ^b13 or -NHSO ₂ R ^b14 and it is more preferable that the other is a hydrogen atom, one of R ^b1 and R ^b2 is -NHCOR ^b13 and the other is a hydrogen atom, and further, one of R ^b3 and R ^b4 is -NHCOR ^b13 and the other is a hydrogen atom.

Y ¹ to Y ⁴ in formula (1) each independently represent a hydrogen atom, an alkyl group, an aryl group, a heterocyclic group, or a group represented by formula (Y-1),

R ^aa1 and Y ¹ may be combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom,

R ^aa1 and Y ² may be combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom,

R ^aa2 and Y ³ may be combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom,

R ^aa2 and Y ⁴ may be combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom,

Y ¹ and Y ² may be combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom,

Y ³ and Y ⁴ may be combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom.

However, at least one of Y ¹ to Y ⁴ is a group represented by formula (Y-1), and further, at least one selected from R ^aa1 and Y ¹ , R ^aa1 and Y ² , R ^aa2 and Y ³ , and R ^aa2 and Y ⁴ is combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom.

The alkyl group, aryl group and heterocyclic group represented by Y ¹ to Y ⁴ in formula (1) are the same as the alkyl group, aryl group and heterocyclic group represented by R ^aa1 and R ^aa2 , and the preferred ranges are also the same.

In formula (1), it is preferable that at least one of Y ¹ and Y ² and at least one of Y ³ and Y ⁴ are independently represented by formula (Y-1).

The group represented by the formula (Y-1) in which Y ¹ to Y ⁴ of formula (1) are described is explained.

[Chemical Formula 10]

The dashed lines in equation (Y-1) represent bond losses.

Ry ¹ to Ry ⁴ in formula (Y-1) each independently represent a hydrogen atom, an alkyl group, or an aryl group.

The number of carbon atoms in the alkyl group represented by Ry ¹ to Ry ⁴ is preferably 1 to 20, more preferably 1 to 15, and even more preferably 1 to 8. The alkyl group may be linear, branched, or cyclic, and linear or branched is preferred. The alkyl group may have a substituent. As the substituent, a group represented by the substituent T described below can be mentioned.

The carbon number of the aryl group represented by Ry ¹ to Ry ⁴ is preferably 6 to 48, more preferably 6 to 22, and even more preferably 6 to 12. The aryl group may have a substituent. As the substituent, a group represented by the substituent T described below can be mentioned.

It is preferable that Ry ¹ to Ry ⁴ are hydrogen atoms.

In formula (Y-1), X ¹ represents a single bond, an alkylene group, an arylene group, -O-, -S-, -NRx-, -CO-, -CS-, -SO-, or -SO ₂ -, or a group combining two or more selected from an alkylene group, an arylene group, -O-, -S-, -NRx-, -CO-, -CS-, -SO-, and -SO ₂ -, and Rx represents a hydrogen atom, an alkyl group, or an aryl group. However, when Z ¹ is a group represented by formula (Z-1) or a group represented by formula (Z-4), the moiety in X ¹ connected to Z ¹ is an alkylene group or an arylene group.

The carbon number of the alkylene group represented by X ¹ is preferably 1 to 20, more preferably 1 to 15, and still more preferably 1 to 8.

The carbon number of the arylene group represented by X ¹ is preferably 6 to 48, more preferably 6 to 22, and still more preferably 6 to 12.

The number of carbon atoms in the alkyl group represented by Rx is preferably 1 to 20, more preferably 1 to 15, and even more preferably 1 to 8. The alkyl group may be linear, branched, or cyclic, and linear or branched is preferred.

The carbon number of the aryl group represented by Rx is preferably 6 to 48, more preferably 6 to 22, and still more preferably 6 to 12.

It is preferable that X ¹ of formula (Y-1) is a factor represented by formula (X-1).

^*1 -X ¹¹ -X ¹² -X ¹³ - ^*2 ···(X-1)

^*1 and ^*2 represent bonds, and ^*2 is a bond with Z ¹ .

X ¹¹ and X ¹³ each independently represent a single bond, -O-, -S-, -NRx-, -NRxCO-, -CONRx-, -CO-, -OCO-, -COO-, -CS-, -SO- or -SO ₂ -, and Rx represents a hydrogen atom, an alkyl group or an aryl group,

X ¹² represents a single bond, an alkylene group, or an arylene group.

However, when Z ¹ of formula (Y-1) is a group represented by formula (Z-1) or a group represented by formula (Z-4), X ¹² is an alkylene group or an arylene group, and X ¹³ is a single bond.

It is preferred that X ¹¹ and X ¹³ are, each independently, a single bond, -O-, -NRx-, -NRxCO-, -CONRx-, -CO-, -OCO- or

It is preferable that X ¹² is a single bond or an alkylene group.

When Z ¹ of formula (Y-1) is an alicyclic hydrocarbon group, an aromatic hydrocarbon group, or a heterocyclic group, from the viewpoint of preservation stability and light resistance, it is preferable that X ¹³ is -O-.

In the case where Z ¹ of formula (Y-1) is a group represented by formula (Z-6), and further, when W ¹ is -CO-, it is preferable that X ¹² is an alkylene group or an arylene group, and X ¹³ is a single bond.

Z ¹ in formula (Y-1) represents an alicyclic hydrocarbon group, an aromatic hydrocarbon group, a heterocyclic group, or a group represented by any one of formulas (Z-1) to (Z-6).

The alicyclic hydrocarbon group represented by Z ¹ may be a monocyclic alicyclic hydrocarbon group or a polycyclic alicyclic hydrocarbon group. In addition, the polycyclic alicyclic hydrocarbon group may have a bridged structure or a spirocyclic structure. The alicyclic hydrocarbon group may have a substituent. As the substituent, a group represented by the substituent T described below can be mentioned, and an alkyl group, an aryl group, an alkoxy group, an aryloxy group, an alkoxycarbonyl group, an aryloxycarbonyl group, or an acyloxy group is preferable.

The aromatic hydrocarbon group represented by Z ¹ may be a monocyclic aromatic hydrocarbon group or a condensed-ring aromatic hydrocarbon group. The aromatic hydrocarbon group preferably has 6 to 48 carbon atoms, more preferably 6 to 22 carbon atoms, and still more preferably 6 to 12 carbon atoms. The aromatic hydrocarbon group may have a substituent. As the substituent, a group represented by the substituent T described below can be exemplified, and an alkyl group, an aryl group, an alkoxy group, an aryloxy group, an alkoxycarbonyl group, an aryloxycarbonyl group, or an acyloxy group is preferable.

The heterocyclic group represented by Z ¹ is preferably a 5-membered or 6-membered heterocyclic group. The heterocyclic group is preferably a monocyclic heterocyclic group or a condensed ring heterocyclic group having a condensation number of 2 to 8, more preferably a monocyclic heterocyclic group or a condensed ring heterocyclic group having a condensation number of 2 to 4, and more preferably a monocyclic heterocyclic group or a condensed ring heterocyclic group having a condensation number of 2 or 3. The heteroatom constituting the ring of the heterocyclic group is preferably a nitrogen atom, an oxygen atom, or a sulfur atom. The number of heteroatoms constituting the ring of the heterocyclic group is preferably 1 to 3, more preferably 1 to 2. The number of carbon atoms constituting the ring of the heterocyclic group is preferably 1 to 30, more preferably 1 to 18, and more preferably 1 to 12. The heterocyclic group may have a substituent. As the substituent, a group represented by the substituent T described below can be exemplified.

[Chemical Formula 11]

In formulas (Z-1) to (Z-6), the dashed lines represent bond losses;

In formula (Z-1), Rz ¹¹ represents an alkyl group or an aryl group;

In formula (Z-2), Rz ¹² represents a hydrogen atom, -COR ¹⁰⁰ , or -COOR ¹⁰⁰ , R ¹⁰⁰ represents a hydrogen atom, an alkyl group, or an aryl group, Rz ^12a represents an alkyl group, and mz represents an integer from 0 to 4;

In formula (Z-3), Rz ¹³ to Rz ¹⁶ each independently represent an alkyl group, and Rz ¹⁷ represents a hydrogen atom, an alkyl group, or an oxygen radical;

In formula (Z-4), Rz ¹⁸ and Rz ¹⁹ each independently represent an alkyl group or an aryl group;

In formula (Z-6), W ¹ represents a single bond, an alkylene group, an arylene group, or -CO-, Rz ²⁰ represents a hydrogen atom, an alkyl group, an aryl group, or -COR ¹⁰¹ , and R ¹⁰¹ represents an alkyl group or an aryl group.

Rz ¹¹ of the formula (Z-1) represents an alkyl group or an aryl group, and is preferably an alkyl group. The alkyl group preferably has 1 to 20 carbon atoms, more preferably 1 to 15 carbon atoms, and still more preferably 1 to 8 carbon atoms. The alkyl group may be linear, branched, or cyclic. In addition, the alkyl group may be unsubstituted or may have a substituent. As the substituent, a group represented by the substituent T described later can be exemplified. The aryl group preferably has 6 to 30 carbon atoms, more preferably 6 to 20 carbon atoms, and still more preferably 6 to 12 carbon atoms. In addition, the aryl group may be unsubstituted or may have a substituent. As the substituent, a group represented by the substituent T described later can be exemplified.

In formula (Z-2), Rz ¹² represents a hydrogen atom, -COR ¹⁰⁰ , or -COOR ¹⁰⁰ , R ¹⁰⁰ represents a hydrogen atom, an alkyl group, or an aryl group, Rz ^12a represents an alkyl group, and mz represents an integer from 0 to 4. From the viewpoint of light resistance, it is preferable that Rz ¹² is a hydrogen atom.

For the alkyl and aryl groups represented by R ¹⁰⁰ , the range is the same as that described in Rz ¹¹ .

mz represents an integer from 0 to 4, preferably an integer from 0 to 2, and more preferably 1 or 2.

The number of carbon atoms in the alkyl group represented by Rz ^12a is preferably 1 to 10, more preferably 1 to 5. The alkyl group may be linear, branched, or cyclic, and linear or branched is preferred, and branched is more preferred.

In formula (Z-3), Rz ¹³ to Rz ¹⁶ each independently represent an alkyl group, and Rz ¹⁷ represents a hydrogen atom, an alkyl group, or an oxygen radical (-O). The alkyl group represented by Rz ¹³ to Rz ¹⁷ preferably has 1 to 10 carbon atoms, more preferably 1 to 5. The alkyl group may be linear, branched, or cyclic, and linear or branched is preferable.

In formula (Z-4), Rz ¹⁸ and Rz ¹⁹ each independently represent an alkyl group or an aryl group, and are preferably aryl groups. The alkyl group and aryl group represented by Rz ¹⁸ and Rz ¹⁹ are the same as the range described for Rz ¹¹ .

In formula (Z-6), W ¹ represents a single bond, an alkylene group, an arylene group or -CO-, Rz ²⁰ represents a hydrogen atom, an alkyl group, an aryl group or -COR ¹⁰¹ , and R ¹⁰¹ represents an alkyl group or an aryl group. The alkylene group represented by W ¹ has preferably 1 to 20 carbon atoms, more preferably 1 to 15 carbon atoms, and still more preferably 1 to 8 carbon atoms. The arylene group represented by W ¹ has preferably 6 to 48 carbon atoms, more preferably 6 to 22 carbon atoms, and still more preferably 6 to 12 carbon atoms. W ¹ is preferably -CO-. Rz ²⁰ is preferably a hydrogen atom, an alkyl group or -COR ¹⁰¹ carbon atoms, and still more preferably a hydrogen atom. The alkyl group and aryl group represented by R ¹⁰¹ are the same as the range described for Rz ¹¹ .

In terms of light resistance, Z ¹ of formula (Y-1) is preferably a group represented by any one of formulas (Z-1) to (Z-6), more preferably a group represented by any one of formulas (Z-1) to (Z-4), still more preferably a group represented by formula (Z-2) or formula (Z-4), and particularly preferably a group represented by formula (Z-2).

In a case where either one of Y ¹ and Y ² in formula (1) and either one of Y ³ and Y ⁴ are independently a group represented by a formula (Y-1), Z ¹ in the group represented by the formula (Y-1) represented by either one of Y ¹ and Y ² and Z ¹ in the group represented by the formula (Y-1) represented by either one of Y ³ and Y ⁴ may be the same or different. In the case of different groups, from the viewpoint of light resistance, it is preferable that one Z ¹ is a group represented by the formula (Z-1) or the formula (Z-4), and the other Z ¹ is a group represented by the formula (Z-2), the formula (Z-3), or the formula (Z-6).

In addition, in a specific compound (a compound represented by formula (1)), there are cases where a compound having a resonance relationship exists, but in the present invention, the specific compound (a compound represented by formula (1)) also includes the resonance structure.

It is preferable that the specific compound be a compound represented by formula (2).

[Chemical Formula 12]

In formula (2), R ^a1 to R ^a4 each independently represent a hydrogen atom, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, a phosphoric acid group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an acyl group, an alkoxycarbonyl group, -NR ^a11 R ^a12 , -SR ^a13 , -SO ₂ R ^a14 , or -OSO ₂ R ^a15 ,

R ^a11 and R ^a12 each independently represent a hydrogen atom, an alkyl group, an aryl group, or a heterocyclic group,

R ^a13 ~R ^a15 each independently represent an alkyl group, an aryl group, or a heterocyclic group,

R ^b1 to R ^b4 each independently represent a hydrogen atom, a halogen atom, a sulfo group, a hydroxy group, a cyano group, a nitro group, a carboxyl group, a phosphoric acid group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an acyl group, an alkoxycarbonyl group, -NR ^b11 R ^b12 , -NHCOR ^b13 , -NHSO ₂ R ^b14 , -NHCSNHR ^b15 , -SR ^b16 , -SO ₂ R ^b17 , -OSO ₂ R ^b18 , -NHCSR ^b19 , -NHCONHR ^b20 or -NHCOOR ^b21 ,

R ^b11 and R ^b12 each independently represent a hydrogen atom, an alkyl group, an aryl group, or a heterocyclic group,

R ^b13 to R ^b21 each independently represent an alkyl group, an aryl group, or a heterocyclic group,

Y ¹ to Y ⁴ each independently represent a hydrogen atom, an alkyl group, an aryl group, a heterocyclic group, or a group represented by the formula (Y-1).

R ^a1 and Y ¹ may be combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom,

R ^a2 and Y ² may be combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom,

R ^a3 and Y ³ may be combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom,

R ^a4 and Y ⁴ may be combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom,

Y ¹ and Y ² may be combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom,

Y ³ and Y ⁴ may be combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom;

However, at least one of Y ¹ to Y ⁴ is a group represented by formula (Y-1), and further, at least one selected from R ^a1 and Y ¹ , R ^a2 and Y ² , R ^a3 and Y ³ , and R ^a4 and Y ⁴ combines to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom.

R ^b1 to R ^b4 in equation (2) have the same meaning as R ^b1 to R ^b4 in equation (1).

Y ¹ to Y ⁴ in equation (2) have the same meaning as Y ¹ to Y ⁴ in equation (1).

The halogen atom, alkoxy group, acyl group, and alkoxycarbonyl group represented by R ^a1 to R ^a4 in formula (2) are the same as the halogen atom, alkoxy group, acyl group, and alkoxycarbonyl group represented by R ^aa1 and R ^aa2 in formula (2), and the preferred ranges are also the same.

The alkyl group, aryl group and heterocyclic group represented by R ^a1 to R ^a4 and R ^a11 to R ^a15 in formula (2) are the same as the alkyl group, aryl group and heterocyclic group represented by R ^aa1 and R ^aa2 in formula (1), and the preferred ranges are also the same.

In formula (2), at least one of R ^b1 and R ^b2 and at least one of R ^b3 and R ^b4 are each independently preferably -NHCOR ^b13 , -NHSO ₂ R ^b14 , -NHCSNHR ^b15 , -SO ₂ R ^b17 , -NHCSR ^b19 , -NHCONHR ^b20 or -NHCOOR ^b21 , and -NHCOR ^b13 or -NHSO ₂ R ^b14 is more preferable, and -NHCOR ^b13 is even more preferable because this can further improve visible light transmittance and infrared shielding property. R ^b13 , R ^b14 , R ^b15 , R ^b17 , R ^b19 , R ^b20 and R ^b21 are each independently preferably an alkyl group or an aryl group, more preferably an alkyl group, and more preferably a fluoroalkyl group because this can further improve visible light transmittance and infrared shielding properties.

In formula (2), it is preferable that one of R ^b1 and R ^b2 is -NHCOR ^b13 , -NHSO ₂ R ^b14 , -NHCSNHR ^b15 , -SO ₂ R ^b17 , -NHCSR ^b19 , -NHCONHR ^b20 or -NHCOOR ^b21 and the other is a hydrogen atom, and further, one of R ^b3 and R ^b4 is -NHCOR ^b13 , -NHSO ₂ R ^b14 , -NHCSNHR ^b15 , -SO ₂ R ^b17 , -NHCSR ^b19 , -NHCONHR ^b20 or -NHCOOR ^b21 and the other is a hydrogen atom, and one of R ^b1 and R ^b2 is -NHCOR ^b13 or -NHSO ₂ R ^b14 and the other is a hydrogen atom, and further, one of R ^b3 and R ^b4 is -NHCOR ^b13 or -NHSO ₂ R ^b14 and it is more preferable that the other is a hydrogen atom, one of R ^b1 and R ^b2 is -NHCOR ^b13 and the other is a hydrogen atom, and further, one of R ^b3 and R ^b4 is -NHCOR ^b13 and the other is a hydrogen atom.

In formula (2), at least one of Y ¹ to Y ⁴ is a group represented by formula (Y-1), and further, at least one selected from R ^a1 and Y ¹ , R ^a2 and Y ² , R ^a3 and Y ³ , and R ^a4 and Y ⁴ is bonded to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom.

In formula (2), it is preferable that at least one of Y ¹ and Y ² and at least one of Y ³ and Y ⁴ are independently expressed by formula (Y-1).

In formula (2), it is preferable that R ^a2 and Y ² combine to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom, and further, that R ^a4 and Y ⁴ combine to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom, and it is more preferable that R ^a2 and Y ² combine to form a 5-membered heterocycle containing at least one nitrogen atom, and further, that R ^a4 and Y ⁴ combine to form a 5-membered heterocycle containing at least one nitrogen atom.

In formula (2), it is preferable that at least one of Y ¹ and Y ³ is a group represented by formula (Y-1) (preferably, Y ¹ and Y ³ are each independently a group represented by formula (Y-1)), R ^a2 and Y ² combine to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom (preferably a 5-membered heterocycle), and R ^a4 and Y ⁴ combine to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom (preferably a 5-membered heterocycle).

It is preferable that the specific compound be a compound represented by formula (3).

[Chemical Formula 13]

In formula (3), R ¹³ to R ¹⁷ and R ²³ to R ²⁷ each independently represent a hydrogen atom, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, a phosphoric acid group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an acyl group, an alkoxycarbonyl group, -NR ^a11 R ^a12 , -SR ^a13 , -SO ₂ R ^a14 , or -OSO ₂ R ^a15 .

R ^a11 and R ^a12 each independently represent a hydrogen atom, an alkyl group, an aryl group, or a heterocyclic group,

R ^a13 ~R ^a15 each independently represent an alkyl group, an aryl group, or a heterocyclic group,

R ¹¹ , R ¹² , R ²¹ and R ²² each independently represent a hydrogen atom, a halogen atom, a sulfo group, a hydroxy group, a cyano group, a nitro group, a carboxyl group, a phosphoric acid group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an acyl group, an alkoxycarbonyl group, -NR ^b11 R ^b12 , -NHCOR ^b13 , -NHSO ₂ R ^b14 , -NHCSNHR ^b15 , -SR ^b16 , -SO ₂ R ^b17 , -OSO ₂ R ^b18 , -NHCSR ^b19 , -NHCONHR ^b20 or -NHCOOR ^b21 ,

R ^b11 and R ^b12 each independently represent a hydrogen atom, an alkyl group, an aryl group, or a heterocyclic group,

R ^b13 to R ^b21 each independently represent an alkyl group, an aryl group, or a heterocyclic group,

Y ¹¹ and Y ²¹ each independently represent a hydrogen atom, an alkyl group, an aryl group, a heterocyclic group, or a group represented by formula (Y-1), and at least one of Y ¹¹ and Y ²¹ is a group represented by formula (Y-1).

The halogen atom, alkoxy group, acyl group, and alkoxycarbonyl group represented by R ¹³ to R ¹⁷ and R ²³ to R ²⁷ in formula (3) are the same as the halogen atom, alkoxy group, acyl group, and alkoxycarbonyl group represented by R ^aa1 and R ^aa2 in formula (1), and the preferred ranges are also the same.

The alkyl group, aryl group and heterocyclic group represented by R ¹³ to R ¹⁷ , R ²³ to R ²⁷ , R ^a11 to R ^a15 in formula (3) are the same as the alkyl group, aryl group and heterocyclic group represented by R ^aa1 and R ^aa2 in formula (1), and the preferred ranges are also the same.

The halogen atom, alkoxy group, acyl group and alkoxycarbonyl group represented by R ¹¹ , R ¹² , R ²¹ and R ²² in formula (3) are the same as the halogen atom, alkoxy group, acyl group and alkoxycarbonyl group represented by R ^b1 to R ^b4 in formula (1), and the preferred ranges are also the same.

The alkyl group, aryl group and heterocyclic group represented by R ¹¹ , R ¹² , R ²¹ , R ²² , R ^b13 to R ^b21 in formula (3) are the same as the alkyl group, aryl group and heterocyclic group represented by R ^b1 to R ^b4 in formula (1), and the preferred ranges are also the same.

In formula (3), it is preferable that at least one of R ¹¹ and R ¹² and at least one of R ²¹ and R ²² are each independently -NHCOR ^b13 , or that at least one of R ¹¹ and R ¹² and at least one of R ²¹ and R ²² are each independently -NHSO ₂ R ^b14 , and it is more preferable that at least one of R ¹¹ and R ¹² and at least one of R ²¹ and R ²² are each independently -NHCOR ^b13 .

Among these, it is preferable that one of R ¹¹ and R ¹² is -NHCOR ^b13 and the other is a hydrogen atom, and further, one of R ²¹ and R ²² is -NHCOR ^b13 and the other is a hydrogen atom, or that one of R ¹¹ and R ¹² is -NHSO ₂ R ^b14 and the other is a hydrogen atom, and further, one of R ²¹ and R ²² is -NHSO ₂ R ^b14 and the other is a hydrogen atom, and it is more preferable that one of R ¹¹ and R ¹² is -NHCOR ^b13 and the other is a hydrogen atom, and further, one of R ²¹ and R ²² is -NHCOR ^b13 and the other is a hydrogen atom.

The alkyl group, aryl group, heterocyclic group and group represented by formula (Y-1) represented by Y ¹¹ and Y ²¹ of formula (3) are the same as the alkyl group, aryl group, heterocyclic group and group represented by formula (Y-1) represented by Y ¹ to Y ⁴ of formula (1), and the preferred ranges are also the same.

It is preferable that Y ¹¹ and Y ²¹ in formula (3) are each independently expressed by formula (Y-1).

When Y ¹¹ and Y ²¹ of formula (3) are each independently a group represented by formula (Y-1), Z ¹ of the two formulas (Y-1) may be the same or different. When they are different groups, from the viewpoint of light resistance, it is preferable that one Z ¹ is a group represented by formula (Z-1) or formula (Z-4), and the other Z ¹ is a group represented by formula (Z-2), formula (Z-3), or formula (Z-6).

-About the substituent T-

As substituent T, the following groups can be mentioned. A halogen atom (e.g., a fluorine atom, a chlorine atom, a bromine atom, an iodine atom), an alkyl group (preferably an alkyl group having 1 to 30 carbon atoms), an alkenyl group (preferably an alkenyl group having 2 to 30 carbon atoms), an alkynyl group (preferably an alkynyl group having 2 to 30 carbon atoms), an aryl group (preferably an aryl group having 6 to 30 carbon atoms), a heterocyclic group (preferably a heterocyclic group having 1 to 30 carbon atoms), an amino group (preferably an amino group having 0 to 30 carbon atoms), an alkoxy group (preferably an alkoxy group having 1 to 30 carbon atoms), an aryloxy group (preferably an aryloxy group having 6 to 30 carbon atoms), a heterocyclic oxy group (preferably a heterocyclic oxy group having 1 to 30 carbon atoms), an acyl group (preferably an acyl group having 2 to 30 carbon atoms), An alkoxycarbonyl group (preferably an alkoxycarbonyl group having 2 to 30 carbon atoms), an aryloxycarbonyl group (preferably an aryloxycarbonyl group having 7 to 30 carbon atoms), a heterocyclic oxycarbonyl group (preferably a heterocyclic oxycarbonyl group having 2 to 30 carbon atoms), an acyloxy group (preferably an acyloxy group having 2 to 30 carbon atoms), an acylamino group (preferably an acylamino group having 2 to 30 carbon atoms), an aminocarbonylamino group (preferably an aminocarbonylamino group having 2 to 30 carbon atoms), an alkoxycarbonylamino group (preferably an alkoxycarbonylamino group having 2 to 30 carbon atoms), an aryloxycarbonylamino group (preferably an aryloxycarbonylamino group having 7 to 30 carbon atoms), a sulfamoyl group (preferably a sulfamoyl group having 0 to 30 carbon atoms), A sulfamoylamino group (preferably a sulfamoylamino group having 0 to 30 carbon atoms), a carbamoyl group (preferably a carbamoyl group having 1 to 30 carbon atoms), an alkylthio group (preferably an alkylthio group having 1 to 30 carbon atoms), an arylthio group (preferably an arylthio group having 6 to 30 carbon atoms), a heterocyclic thio group (preferably a heterocyclic thio group having 1 to 30 carbon atoms), an alkylsulfonyl group (preferably an alkylsulfonyl group having 1 to 30 carbon atoms), an alkylsulfonylamino group (preferably an alkylsulfonylamino group having 1 to 30 carbon atoms), an arylsulfonyl group (preferably an arylsulfonyl group having 6 to 30 carbon atoms), an arylsulfonylamino group (preferably an arylsulfonylamino group having 6 to 30 carbon atoms), a heterocyclic A sulfonyl group (preferably a heterocyclic sulfonyl group having 1 to 30 carbon atoms), a heterocyclic sulfonylamino group (preferably a heterocyclic sulfonylamino group having 1 to 30 carbon atoms), an alkylsulfinyl group (preferably an alkylsulfinyl group having 1 to 30 carbon atoms), an arylsulfinyl group (preferably an arylsulfinyl group having 6 to 30 carbon atoms), a heterocyclic sulfinyl group (preferably a heterocyclic sulfinyl group having 1 to 30 carbon atoms), a ureido group (preferably a ureido group having 1 to 30 carbon atoms), a hydroxy group, a nitro group, a carboxyl group, a sulfo group, a phosphoric acid group, a carboxylic acid amide group, a sulfonic acid amide group, an imide group, a phosphino group, a mercapto group, a cyano group, an alkylsulfino group, an arylsulfino group, an arylazo group, a heterocyclic azo group, a phosphinyl group, Phosphinyloxy group, phosphinylamino group, silyl group, hydrazino group, imino group. These groups may further have a substituent if they are additionally substitutable. As the substituent, the groups described in the above-mentioned substituent T can be mentioned.

-About specific examples-

Specific examples of specific compounds include compounds having the structures shown below. Resonance structures of these compounds can also be cited as specific examples of specific compounds.

[Chemical Formula 14]

[Chemical Formula 15]

[Chemical Formula 16]

[Chemical Formula 17]

[Chemical Formula 18]

[Chemical Formula 19]

[Chemical Formula 20]

[Chemical Formula 21]

[Chemical Formula 22]

[Chemical Formula 23]

[Chemical Formula 24]

[Chemical Formula 25]

[Chemical Formula 26]

[Chemical Formula 27]

[Chemical formula 28]

[Chemical Formula 29]

[Chemical formula 30]

The maximum absorption wavelength of a specific compound is preferably in the range of 650 to 1500 nm, more preferably in the range of 680 to 1200 nm, and even more preferably in the range of 700 to 1000 nm.

(other infrared absorbers)

The composition of the present invention may contain an infrared absorbent other than the specific compound described above (another infrared absorbent). By containing another infrared absorbent, a film capable of shielding infrared rays in a wider wavelength range can be formed. The other infrared absorbent may be a dye or a pigment (particle). Examples of the other infrared absorbent include pyrrolopyrrole compounds, cyanine compounds, squarylium compounds, polymethane compounds, phthalocyanine compounds, naphthalocyanine compounds, quaterylene compounds, merocyanine compounds, croconium compounds, oxonol compounds, iminium compounds, dithiol compounds, triarylmethane compounds, pyrromethene compounds, azomethane compounds, anthraquinone compounds, dibenzofuranone compounds, dithiolene metal complexes, metal oxides, metal borides, and the like. Examples of the pyrrolopyrrole compounds include compounds described in paragraphs No. 0016 to 0058 of Japanese Patent Application Laid-Open No. 2009-263614, compounds described in paragraphs No. 0037 to 0052 of Japanese Patent Application Laid-Open No. 2011-068731, and compounds described in paragraphs No. 0010 to 0033 of International Publication No. 2015/166873. As the squarylium compound, the compound described in paragraphs No. 0044 to 0049 of Japanese Patent Publication No. 2011-208101, the compound described in paragraphs No. 0060 to 0061 of Japanese Patent Publication No. 6065169, the compound described in paragraph No. 0040 of International Publication No. 2016/181987, the compound described in Japanese Patent Publication No. 2015-176046, the compound described in paragraph No. 0072 of International Publication No. 2016/190162, the compound described in paragraphs No. 0196 to 0228 of Japanese Patent Publication No. 2016-074649, the compound described in paragraph No. 0124 of Japanese Patent Publication No. 2017-067963, and the compound described in International Publication No. 2017/135359. Examples thereof include compounds described in Japanese Patent Publication No. 2017-114956, compounds described in Japanese Patent Publication No. 6197940, and compounds described in International Publication No. 2016/120166. Examples of the cyanine compounds include compounds described in paragraphs No. 0044 to 0045 of Japanese Patent Application Laid-Open No. 2009-108267, compounds described in paragraphs No. 0026 to 0030 of Japanese Patent Application Laid-Open No. 2002-194040, compounds described in Japanese Patent Application Laid-Open No. 2015-172004, compounds described in Japanese Patent Application Laid-Open No. 2015-172102, compounds described in Japanese Patent Application Laid-Open No. 2008-088426, compounds described in paragraph No. 0090 of International Publication No. 2016/190162, and compounds described in Japanese Patent Application Laid-Open No. 2017-031394. Examples of the polymethane compound include compounds described in Japanese Patent Application Laid-Open No. 2021-134350, compounds described in International Publication No. 2021/085372, etc. Examples of the croconium compound include compounds described in Japanese Patent Application Laid-Open No. 2017-082029. Examples of the iminium compound include compounds described in Japanese Patent Application Laid-Open No. 2008-528706, compounds described in Japanese Patent Application Laid-Open No. 2012-012399, compounds described in Japanese Patent Application Laid-Open No. 2007-092060, and compounds described in paragraphs 0048 to 0063 of International Publication No. 2018/043564. Examples of the phthalocyanine compound include compounds described in paragraph No. 0093 of Japanese Patent Application Laid-Open No. 2012-077153, oxytitanium phthalocyanine described in Japanese Patent Application Laid-Open No. 2006-343631, compounds described in paragraphs Nos. 0013 to 0029 of Japanese Patent Application Laid-Open No. 2013-195480, vanadium phthalocyanine compounds described in Japanese Patent Publication No. 6081771, and compounds described in International Publication No. 2020/071470. Examples of the naphthalocyanine compound include compounds described in paragraph No. 0093 of Japanese Patent Application Laid-Open No. 2012-077153. Examples of the dithiolene metal complex include compounds described in Japanese Patent Application Laid-Open No. 5733804. Examples of the metal oxide include indium tin oxide, antimony tin oxide, zinc oxide, Al-doped zinc oxide, fluorine-doped tin dioxide, niobium-doped titanium dioxide, and tungsten oxide. For details on tungsten oxide, see paragraph No. 0080 of Japanese Patent Application Laid-Open No. 2016-006476, the contents of which are incorporated herein by reference. Examples of the metal boride include lanthanum boride. Commercially available products of lanthanum boride include LaB ₆ -F (manufactured by Nippon Shinkinzoku Co., Ltd.). In addition, as the metal boride, compounds described in International Publication No. 2017/119394 can also be used. Commercially available products of indium tin oxide include F-ITO (manufactured by DOWA HIGH-TECH Co., Ltd.).

In addition, as infrared absorbers, squarylium compounds described in Japanese Patent Laid-Open No. 2017-197437, squarylium compounds described in Japanese Patent Laid-Open No. 2017-025311, squarylium compounds described in International Publication No. 2016/154782, squarylium compounds described in Japanese Patent Laid-Open No. 5884953, squarylium compounds described in Japanese Patent Laid-Open No. 6036689, squarylium compounds described in Japanese Patent Laid-Open No. 5810604, squarylium compounds described in paragraphs No. 0090 to 0107 of International Publication No. 2017/213047, pyrrole ring-containing compounds described in paragraphs No. 0019 to 0075 of Japanese Patent Laid-Open No. 2018-054760, and Japanese Patent Laid-Open No. A pyrrole ring-containing compound described in paragraphs No. 0078 to 0082 of Japanese Patent Application Laid-Open No. 2018-040955, a pyrrole ring-containing compound described in paragraphs No. 0043 to 0069 of Japanese Patent Application Laid-Open No. 2018-002773, a squarylium compound having an aromatic ring on amide α described in paragraphs No. 0024 to 0086 of Japanese Patent Application Laid-Open No. 2018-041047, an amide-linked squarylium compound described in Japanese Patent Application Laid-Open No. 2017-179131, a compound having a pyrrolebis-type squarylium skeleton or a croconium skeleton described in Japanese Patent Application Laid-Open No. 2017-141215, a dihydrocarbazole bis-type squarylium compound described in Japanese Patent Application Laid-Open No. 2017-082029, Japanese Patent Application Laid-Open No. It is also possible to use asymmetrical compounds described in paragraphs No. 0027 to 0114 of Japanese Patent Application Publication No. 2017-068120, pyrrole ring-containing compounds (carbazole type) described in Japanese Patent Application Publication No. 2017-067963, phthalocyanine compounds described in Japanese Patent Application Publication No. 6251530, etc.

As another infrared absorber, tungsten oxide represented by the following formula described in paragraph number 0025 of European Patent Publication No. 3628645 may also be used.

M ¹ _a M ² _b W _c O _d (P(O) _n R _m ) _e

M ¹ , M ² represent ammonium cations or metal cations, a is 0.01 to 0.5, b is 0 to 0.5, c is 1, d is 2.5 to 3, e is 0.01 to 0.75, n is 1, 2, or 3, m is 1, 2, or 3, and R represents a hydrocarbon group which may have a substituent.

The content of the infrared absorbent is preferably 0.1 mass% or more, more preferably 0.5 mass% or more, still more preferably 3 mass% or more, and particularly preferably 5 mass% or more, based on the total solid content of the composition. In addition, the upper limit of the content of the infrared absorbent is preferably 50 mass% or less, more preferably 40 mass% or less, and still more preferably 30 mass% or less.

The content of the specific compound described above is preferably 0.1 mass% or more, more preferably 0.5 mass% or more, still more preferably 3 mass% or more, and particularly preferably 5 mass% or more, based on the total solid content of the composition. In addition, the upper limit of the content of the specific compound described above is preferably 50 mass% or less, more preferably 40 mass% or less, and still more preferably 30 mass% or less. The composition of the present invention may contain only one specific compound, or may contain two or more specific compounds. When containing two or more specific compounds, it is preferable that their total amount falls within the above range.

When the composition of the present invention contains another infrared absorbent, the content of the other infrared absorbent is preferably 1 to 1000 parts by mass, more preferably 3 to 500 parts by mass, and even more preferably 5 to 300 parts by mass, per 100 parts by mass of the specific compound described above. The composition of the present invention may contain only one type of the other infrared absorbent, or may contain two or more types. When containing two or more types, it is preferable that their total amount is within the above range.

<<Curable compound>>

The composition of the present invention contains a curable compound. As the curable compound, a polymerizable compound, a resin, etc. can be mentioned. The resin may be a non-polymerizable resin (a resin not having a polymerizable group) or a polymerizable resin (a resin having a polymerizable group). As the polymerizable group, an ethylenically unsaturated bond-containing group, a cyclic ether group, a methylol group, an alkoxymethyl group, etc. can be mentioned. As the ethylenically unsaturated bond-containing group, a vinyl group, a vinylphenyl group, a (meth)allyl group, a (meth)acryloyl group, a (meth)acryloyloxy group, a (meth)acryloylamide group, etc., and a (meth)allyl group, a (meth)acryloyl group, and a (meth)acryloyloxy group are preferable, and a (meth)acryloyloxy group is more preferable. As the cyclic ether group, an epoxy group, an oxetanyl group, etc. can be mentioned, and an epoxy group is preferable.

As the curable compound, it is preferable to use one that contains at least a resin. In addition, when the composition of the present invention is used as a composition for photolithography, it is preferable to use a resin and a polymerizable compound (preferably a polymerizable monomer, which is a monomer-type polymerizable compound) as the curable compound, and it is more preferable to use a resin and a polymerizable monomer having an ethylenically unsaturated bond-containing group (a monomer-type polymerizable compound).

(polymeric compound)

As polymerizable compounds, compounds having an ethylenically unsaturated bond-containing group, compounds having a cyclic ether group, compounds having a methylol group, compounds having an alkoxymethyl group, etc. can be mentioned. Compounds having an ethylenically unsaturated bond-containing group can be preferably used as radically polymerizable compounds. In addition, compounds having a cyclic ether group can be preferably used as cationically polymerizable compounds.

As a polymerizable compound of the resin type, examples thereof include a resin including a repeating unit having a polymerizable group.

The molecular weight of the polymerizable compound of the monomer type (polymerizable monomer) is preferably less than 2000, more preferably 1500 or less. The lower limit of the molecular weight of the polymerizable monomer is preferably 100 or more, more preferably 200 or more. The weight average molecular weight (Mw) of the polymerizable compound of the resin type is preferably 2000 to 2 million to 2 million thousand thousand. The upper limit of the weight average molecular weight is preferably 1 million to 5 million thousand thousand, more preferably 5 million to 5 million thousand thousand. The lower limit of the weight average molecular weight is preferably 3 million to 5 million thousand thousand, more preferably 5 million to 5 million thousand thousand.

The compound having an ethylenically unsaturated bond-containing group as a polymerizable monomer is preferably a 3- to 15-functional (meth)acrylate compound, and more preferably a 3- to 6-functional (meth)acrylate compound. Specific examples thereof include compounds described in paragraphs No. 0095 to 0108 of Japanese Patent Application Publication No. 2009-288705, paragraphs No. 0227 of Japanese Patent Application Publication No. 2013-029760, paragraphs No. 0254 to 0257 of Japanese Patent Application Publication No. 2008-292970, paragraphs No. 0034 to 0038 of Japanese Patent Application Publication No. 2013-253224, paragraphs No. 0477 of Japanese Patent Application Publication No. 2012-208494, Japanese Patent Application Publication No. 2017-048367, Japanese Patent Application Publication No. 6057891, Japanese Patent Application Publication No. 6031807, and Japanese Patent Application Publication No. 2017-194662, the contents of which are incorporated herein by reference. It is cited.

As compounds having an ethylenically unsaturated bond-containing group, dipentaerythritol tri(meth)acrylate (commercially available product: KAYARAD D-330; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol tetra(meth)acrylate (commercially available product: KAYARAD D-320; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol penta(meth)acrylate (commercially available product: KAYARAD D-310; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol hexa(meth)acrylate (commercially available product: KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd., NK Ester A-DPH-12E; manufactured by Shin-Nakamura Chemical Industry Co., Ltd.), and compounds having a structure in which a (meth)acryloyl group of these compounds is bonded via an ethylene glycol and/or propylene glycol residue. Examples include compounds (e.g., SR454 and SR499, commercially available from Sartomer). In addition, as compounds having an ethylenically unsaturated bond-containing group, diglycerin EO (ethylene oxide) modified (meth)acrylate (as a commercial product, M-460; manufactured by Toagosei), pentaerythritol tetraacrylate (manufactured by Shin-Nakamura Chemical Industries, Ltd., NK Ester A-TMMT), 1,6-hexanediol diacrylate (manufactured by Nippon Kayaku Co., Ltd., KAYARAD HDDA), RP-1040 (manufactured by Nippon Kayaku Co., Ltd.), Aronix TO-2349 (manufactured by Toagosei Co., Ltd.), NK Oligo UA-7200 (manufactured by Shin-Nakamura Chemical Industries, Ltd.), 8UH-1006, 8UH-1012 (manufactured by Taisei Fine Chemical Co., Ltd.), light acrylate POB-A0 (Kyoeisha) You can also use Gagaku Co., Ltd.

In addition, as a compound having an ethylenically unsaturated bond-containing group, it is also preferable to use a trifunctional (meth)acrylate compound such as trimethylolpropane tri(meth)acrylate, trimethylolpropane propylene oxide-modified tri(meth)acrylate, trimethylolpropane ethylene oxide-modified tri(meth)acrylate, isocyanuric acid ethylene oxide-modified tri(meth)acrylate, and pentaerythritol tri(meth)acrylate. Commercially available products of trifunctional (meth)acrylate compounds include Aronix M-309, M-310, M-321, M-350, M-360, M-313, M-315, M-306, M-305, M-303, M-452, M-450 (manufactured by Toagosei Co., Ltd.), NK Ester A9300, A-GLY-9E, A-GLY-20E, A-TMM-3, A-TMM-3L, A-TMM-3LM-N, A-TMPT, TMPT (manufactured by Shin-Nakamura Kagaku Kogyo Co., Ltd.), KAYARAD GPO-303, TMPTA, THE-330, TPA-330, PET-30 (manufactured by Nippon Kayaku Co., Ltd.).

Compounds containing an ethylenically unsaturated bond may further contain an acid group such as a carboxyl group, a sulfo group, or a phosphoric acid group. Commercially available products of such compounds include Aronix M-305, M-510, M-520, and Aronix TO-2349 (manufactured by Toagosei Co., Ltd.).

As a compound having an ethylenically unsaturated bond-containing group, a compound having a caprolactone structure can also be used. For compounds having a caprolactone structure, reference can be made to the description in paragraphs 0042 to 0045 of Japanese Patent Application Laid-Open No. 2013-253224, the contents of which are incorporated herein by reference. Examples of compounds having a caprolactone structure include DPCA-20, DPCA-30, DPCA-60, and DPCA-120, which are commercially available as a series from Nippon Kayaku Co., Ltd.

As the compound having an ethylenically unsaturated bond-containing group, a compound having an ethylenically unsaturated bond-containing group and an alkyleneoxy group can also be used. Such a compound is preferably a compound having an ethylenically unsaturated bond-containing group and an ethyleneoxy group and/or a propyleneoxy group, more preferably a compound having an ethylenically unsaturated bond-containing group and an ethyleneoxy group, and still more preferably a trifunctional to hexafunctional (meth)acrylate compound having 4 to 20 ethyleneoxy groups. Commercially available products include, for example, SR-494, a tetrafunctional (meth)acrylate having four ethyleneoxy groups manufactured by Sartomer, and KAYARAD TPA-330, a trifunctional (meth)acrylate having three isobutyleneoxy groups manufactured by Nippon Kayaku Co., Ltd.

As a compound having an ethylenically unsaturated bond-containing group, a polymerizable compound having a fluorene skeleton can also be used. Commercially available products include Ogsol EA-0200, EA-0300 (Osaka Gas Chemical Co., Ltd., (meth)acrylate monomer having a fluorene skeleton).

As a compound having an ethylenically unsaturated bond-containing group, it is also preferable to use a compound that substantially does not contain environmentally regulated substances such as toluene. Commercially available products of such compounds include KAYARAD DPHA LT and KAYARAD DPEA-12 LT (manufactured by Nippon Kayaku Co., Ltd.).

As compounds having a cyclic ether group, examples thereof include compounds having an epoxy group and compounds having an oxetanyl group, and compounds having an epoxy group are preferred. As compounds having an epoxy group, examples thereof include compounds having 1 to 100 epoxy groups per molecule. The upper limit of the number of epoxy groups may be, for example, 10 or less or 5 or less. The lower limit of the number of epoxy groups is preferably 2 or more.

The compound having a cyclic ether group may be a low-molecular-weight compound (for example, a molecular weight of less than 1000) or a high-molecular-weight compound (for example, a molecular weight of 1000 or more; in the case of a polymer, a weight-average molecular weight of 1000 or more). The weight-average molecular weight of the cyclic ether group is preferably 200 to 100,000, more preferably 500 to 50,000. The upper limit of the weight-average molecular weight is preferably 10,000 or less, more preferably 5,000 or less, and still more preferably 3,000 or less.

As compounds having a phantom ether group, compounds described in paragraphs No. 0034 to 0036 of Japanese Patent Application Laid-Open No. 2013-011869, compounds described in paragraphs No. 0147 to 0156 of Japanese Patent Application Laid-Open No. 2014-043556, compounds described in paragraphs No. 0085 to 0092 of Japanese Patent Application Laid-Open No. 2014-089408, and compounds described in Japanese Patent Application Laid-Open No. 2017-179172 can also be used.

As commercial products of compounds having a phantom ether group, Denacol EX-212L, EX-212, EX-214L, EX-214, EX-216L, EX-216, EX-321L, EX-321, EX-850L, EX-850 (all manufactured by Nagase Chemtex Co., Ltd.), ADEKA RESIN EP-4000S, EP-4003S, EP-4010S, EP-4011S (all manufactured by ADEKA Co., Ltd.), NC-2000, NC-3000, NC-7300, XD-1000, EPPN-501, EPPN-502 (all manufactured by ADEKA Co., Ltd.), Celoxide 2021P, Celoxide 2081, Celoxide 2083, Celoxide 2085, EHPE3150, EPOLEAD PB 3600, PB 4700 (above, manufactured by Daicel Co., Ltd.), Cyclomer P ACA 200M, ACA 230AA, ACA Z250, ACA Z251, ACA Z300, ACA Z320 (above, manufactured by Daicel Co., Ltd.), jER1031S, jER157S65, jER152, jER154, jER157S70 (above, manufactured by Mitsubishi Chemical Co., Ltd.), Alon Oxetane OXT-121, OXT-221, OX-SQ, PNOX (above, manufactured by Toagosei Co., Ltd.), Adeka Glycyrol ED-505 (manufactured by ADEKA Co., Ltd., epoxy group-containing monomer), Maproof G-0150M, G-0105SA, G-0130SP, G-0250SP, Examples thereof include G-1005S, G-1005SA, G-1010S, G-2050M, G-01100, G-01758 (epoxy group-containing polymers manufactured by Nichiyu Co., Ltd.), OXT-101, OXT-121, OXT-212, OXT-221 (oxetanyl group-containing monomers manufactured by Toagosei Co., Ltd.), OXE-10, OXE-30 (oxetanyl group-containing monomers manufactured by Osaka Yuki Kagaku Kogyo Co., Ltd.).

Examples of compounds having a methylol group (hereinafter also referred to as methylol compounds) include compounds in which the methylol group is bonded to a nitrogen atom or a carbon atom forming an aromatic ring. In addition, examples of compounds having an alkoxymethyl group (hereinafter also referred to as alkoxymethyl compounds) include compounds in which the alkoxymethyl group is bonded to a nitrogen atom or a carbon atom forming an aromatic ring. Examples of compounds in which an alkoxymethyl group or a methylol group is bonded to a nitrogen atom include alkoxymethylated melamine, methylolated melamine, alkoxymethylated benzoguanamine, methylolated benzoguanamine, alkoxymethylated glycoluril, methylolated glycoluril, alkoxymethylated urea, and methylolated urea. Additionally, compounds described in paragraphs 0134 to 0147 of Japanese Patent Application Laid-Open No. 2004-295116 and paragraphs 0095 to 0126 of Japanese Patent Application Laid-Open No. 2014-089408 can also be used.

(profit)

The composition of the present invention can use a resin as a curable compound. It is preferable to use a curable compound that contains at least a resin. The resin is mixed for the purpose of dispersing pigments and the like in the composition, or for the purpose of a binder. In addition, a resin that is mainly used for dispersing pigments and the like in the composition is also called a dispersant. However, such uses of the resin are only examples, and the resin can be used for purposes other than such uses. In addition, a resin having a polymerizable group also corresponds to a polymerizable compound.

The weight average molecular weight of the resin is preferably 3,000 to 2,000,000. The upper limit is preferably 1,000,000 or less, and more preferably 500,000 or less. The lower limit is preferably 4,000 or more, and more preferably 5,000 or more.

Examples of the resin include (meth)acrylic resin, epoxy resin, enethiol resin, polycarbonate resin, polyether resin, polyarylate resin, polysulfone resin, polyethersulfone resin, polyphenylene resin, polyarylene ether phosphine oxide resin, polyimide resin, polyamide resin, polyamideimide resin, polyolefin resin, cyclic olefin resin, polyester resin, styrene resin, vinyl acetate resin, polyvinyl alcohol resin, polyvinyl acetal resin, polyurethane resin, and polyurea resin. One type of these resins may be used alone, or two or more types may be mixed and used. As the cyclic olefin resin, norbornene resin is preferable from the viewpoint of improving heat resistance. Commercially available products of norbornene resin include, for example, the ARTON series (for example, ARTON F4520) manufactured by JSR Corporation. In addition, as a resin, a resin described in the examples of International Publication No. 2016/088645, a resin described in Japanese Patent Application Laid-Open No. 2017-057265, a resin described in Japanese Patent Application Laid-Open No. 2017-032685, a resin described in Japanese Patent Application Laid-Open No. 2017-075248, a resin described in Japanese Patent Application Laid-Open No. 2017-066240, a resin described in Japanese Patent Application Laid-Open No. 2017-167513, a resin described in Japanese Patent Application Laid-Open No. 2017-173787, a resin described in paragraphs No. 0041 to 0060 of Japanese Patent Application Laid-Open No. 2017-206689, a resin described in paragraphs No. 0022 to 0071 of Japanese Patent Application Laid-Open No. 2018-010856, a resin described in ... A block polyisocyanate resin described in Patent Publication No. 2016-222891, a resin described in Japanese Patent Publication No. 2020-122052, a resin described in Japanese Patent Publication No. 2020-111656, a resin described in Japanese Patent Publication No. 2020-139021, or a resin including a structural unit having a ring structure in the main chain and a structural unit having a biphenyl group in the side chain described in Japanese Patent Publication No. 2017-138503 can also be used. In addition, a resin having a fluorene skeleton can also be preferably used as the resin. For the resin having a fluorene skeleton, reference can be made to the description in U.S. Patent Application Publication No. 2017/0102610, the contents of which are incorporated herein by reference. In addition, as the resin, a resin described in paragraphs 0199 to 0233 of Japanese Patent Application Laid-Open No. 2020-186373, an alkali-soluble resin described in Japanese Patent Application Laid-Open No. 2020-186325, a resin represented by Formula 1 described in Korean Patent Application Laid-Open No. 10-2020-0078339, and a resin described in Japanese Patent Application Laid-Open No. 2021-134350 can also be used.

As the resin, it is preferable to use a resin having an acid group. As the acid group, for example, a carboxyl group, a phosphoric acid group, a sulfo group, a phenolic hydroxyl group, etc., can be mentioned. These acid groups may be one type or two or more types. The resin having an acid group can also be used as a dispersant. The acid value of the resin having an acid group is preferably 30 to 500 mgKOH/g. The lower limit is preferably 50 mgKOH/g or more, and more preferably 70 mgKOH/g or more. The upper limit is preferably 400 mgKOH/g or less, more preferably 200 mgKOH/g or less, still more preferably 150 mgKOH/g or less, and most preferably 120 mgKOH/g or less.

As the resin, it is also preferable to include a resin including a repeating unit derived from a compound represented by the formula (ED1) and/or a compound represented by the formula (ED2) (hereinafter, these compounds are sometimes referred to as "ether dimers").

[Chemical Formula 31]

In the formula (ED1), R ¹ and R ² each independently represent a hydrogen atom or a hydrocarbon group having 1 to 25 carbon atoms which may have a substituent.

[Chemical formula 32]

In the formula (ED2), R represents a hydrogen atom or an organic group having 1 to 30 carbon atoms. For specific examples of the formula (ED2), reference can be made to the description in Japanese Patent Application Laid-Open No. 2010-168539.

For specific examples of ether dimers, see paragraph No. 0317 of Japanese Patent Application Laid-Open No. 2013-029760, the contents of which are incorporated herein by reference.

As the resin, it is also preferable to use a resin having a polymerizable group. The polymerizable group is preferably an ethylenically unsaturated bond-containing group and a cyclic ether group, and is more preferably an ethylenically unsaturated bond-containing group.

As a resin, it is also preferable to use a resin containing a repeating unit derived from a compound represented by formula (X).

[Chemical formula 33]

In the formula, R ¹ represents a hydrogen atom or a methyl group, R ²¹ and R ²² each independently represent an alkylene group, and n represents an integer of 0 to 15. The number of carbon atoms in the alkylene group represented by R ²¹ and R ²² is preferably 1 to 10, more preferably 1 to 5, still more preferably 1 to 3, and particularly preferably 2 or 3. n represents an integer of 0 to 15, preferably an integer of 0 to 5, more preferably an integer of 0 to 4, and still more preferably an integer of 0 to 3.

Examples of compounds represented by formula (X) include ethylene oxide or propylene oxide-modified (meth)acrylates of paracumylphenol. Commercially available products include Aronix M-110 (manufactured by Toagosei Co., Ltd.).

The resin preferably contains a resin as a dispersant. Examples of the dispersant include an acidic dispersant (acidic resin) and a basic dispersant (basic resin). Here, the acidic dispersant (acidic resin) refers to a resin in which the amount of acid groups is greater than the amount of basic groups. As the acidic dispersant (acidic resin), a resin in which the amount of acid groups is 70 mol% or more when the total amount of acid groups and basic groups is 100 mol% is preferable. The acid group of the acidic dispersant (acidic resin) is preferably a carboxyl group. The acid value of the acidic dispersant (acidic resin) is preferably 10 to 105 mgKOH/g. In addition, the basic dispersant (basic resin) refers to a resin in which the amount of basic groups is greater than the amount of acid groups. As the basic dispersant (basic resin), a resin in which the amount of basic groups exceeds 50 mol% when the total amount of acid groups and basic groups is 100 mol% is preferable. The basic group of the basic dispersant is preferably an amino group.

The resin used as a dispersant is also preferably a graft resin. For details on the graft resin, reference can be made to the description in paragraphs 0025 to 0094 of Japanese Patent Application Laid-Open No. 2012-255128, the contents of which are incorporated herein by reference.

The resin used as the dispersant is also preferably a polyimine-based dispersant containing a nitrogen atom in at least one of the main chain and the side chain. As the polyimine-based dispersant, a resin having a main chain having a partial structure having a functional group having pKa14 or less and a side chain having 40 to 10,000 atoms, and further having a basic nitrogen atom in at least one of the main chain and the side chain, is preferable. The basic nitrogen atom is not particularly limited as long as it is a nitrogen atom exhibiting basicity. For the polyimine-based dispersant, reference can be made to the description in paragraphs 0102 to 0166 of Japanese Patent Application Laid-Open No. 2012-255128, the contents of which are incorporated herein by reference.

It is also preferable that the resin used as the dispersant be a resin having a structure in which multiple polymer chains are bonded to the core portion. As such a resin, for example, a dendrimer (including a star-shaped polymer) can be mentioned. In addition, specific examples of the dendrimer include polymer compounds C-1 to C-31 described in paragraphs 0196 to 0209 of Japanese Patent Application Laid-Open No. 2013-043962.

It is also preferable that the resin used as a dispersant be a resin containing a repeating unit having an ethylenically unsaturated bond-containing group in its side chain. The content of the repeating unit having an ethylenically unsaturated bond-containing group in its side chain is preferably 10 mol% or more of the total repeating units of the resin, more preferably 10 to 80 mol%, and even more preferably 20 to 70 mol%.

In addition, as a dispersant, a resin described in Japanese Patent Application Laid-Open No. 2018-087939, a block copolymer (EB-1) to (EB-9) described in paragraphs 0219 to 0221 of Japanese Patent Application Laid-Open No. 6432077, a polyethyleneimine having a polyester side chain described in International Publication No. 2016/104803, a block copolymer described in International Publication No. 2019/125940, a block polymer having an acrylamide structural unit described in Japanese Patent Application Laid-Open No. 2020-066687, a block polymer having an acrylamide structural unit described in Japanese Patent Application Laid-Open No. 2020-066688, or the like can be used.

Dispersants are also available as commercial products, and specific examples thereof include the DISPERBYK series manufactured by Big Chemie, the SOLSPERSE series manufactured by Nippon Lubrizol, the Efka series manufactured by BASF, and the AJISUPER series manufactured by Ajinomoto Fine Techno Co., Ltd. In addition, products described in paragraph number 0129 of Japanese Patent Application Laid-Open No. 2012-137564 and products described in paragraph number 0235 of Japanese Patent Application Laid-Open No. 2017-194662 can also be used as dispersants.

The content of the curable compound is preferably 1 to 95 mass% of the total solid content of the composition. The lower limit is preferably 2 mass% or more, more preferably 5 mass% or more, further preferably 7 mass% or more, and particularly preferably 10 mass% or more. The upper limit is preferably 94 mass% or less, more preferably 90 mass% or less, further preferably 85 mass% or less, and particularly preferably 80 mass% or less.

When the composition of the present invention contains a polymerizable compound as a curable compound, the content of the polymerizable compound is preferably 1 to 85 mass% based on the total solid content of the composition. The lower limit is preferably 2 mass% or more, more preferably 3 mass% or more, and even more preferably 5 mass% or more. The upper limit is preferably 80 mass% or less, and more preferably 70 mass% or less.

When the composition of the present invention contains a polymerizable monomer as a curable compound, the content of the polymerizable monomer is preferably 1 to 50 mass% based on the total solid content of the composition. The lower limit is preferably 2 mass% or more, more preferably 3 mass% or more, and even more preferably 5 mass% or more. The upper limit is preferably 30 mass% or less, and more preferably 20 mass% or less.

When the composition of the present invention contains a compound having an ethylenically unsaturated bond-containing group as a curable compound, the content of the compound having an ethylenically unsaturated bond-containing group is preferably 1 to 70 mass% based on the total solid content of the composition. The lower limit is preferably 2 mass% or more, more preferably 3 mass% or more, and still more preferably 5 mass% or more. The upper limit is preferably 65 mass% or less, and more preferably 60 mass% or less.

When the composition of the present invention contains a compound having a cyclic ether group as a curable compound, the content of the compound having a cyclic ether group is preferably 1 to 95 mass% based on the total solid content of the composition. The lower limit is preferably 2 mass% or more, more preferably 3 mass% or more, and even more preferably 5 mass% or more. The upper limit is preferably 80 mass% or less, more preferably 70 mass% or less, and even more preferably 60 mass% or less.

When the composition of the present invention contains a resin as a curable compound, the content of the resin is preferably 1 to 85 mass% based on the total solid content of the composition. The lower limit is preferably 2 mass% or more, more preferably 5 mass% or more, still more preferably 7 mass% or more, and particularly preferably 10 mass% or more. The upper limit is preferably 80 mass% or less, more preferably 75 mass% or less, still more preferably 70 mass% or less, and particularly preferably 40 mass% or less.

When the composition of the present invention contains a resin as a dispersant, the content of the resin as a dispersant is preferably 0.1 to 40 mass% of the total solid content of the composition. The upper limit is preferably 25 mass% or less, and more preferably 20 mass% or less. The lower limit is preferably 0.5 mass% or more, and more preferably 1 mass% or more. In addition, the content of the resin as a dispersant is preferably 1 to 100 mass parts with respect to 100 mass parts of the pigment. The upper limit is preferably 80 mass parts or less, and more preferably 75 mass parts or less. The lower limit is preferably 2.5 mass parts or more, and more preferably 5 mass parts or more.

The composition of the present invention may contain only one type of curable compound, or may contain two or more types. When two or more types of curable compounds are contained, it is preferable that their total amount is within the above range.

<<Solvent>>

The composition of the present invention contains a solvent. Examples of the solvent include water and an organic solvent, and an organic solvent is preferable. Examples of the organic solvent include an ester solvent, a ketone solvent, an alcohol solvent, an amide solvent, an ether solvent, a hydrocarbon solvent, and the like. For details of these, reference can be made to paragraph No. 0223 of International Publication No. 2015/166779, the contents of which are incorporated herein by reference. In addition, an ester solvent substituted with a cyclic alkyl group and a ketone solvent substituted with a cyclic alkyl group can also be preferably used. Specific examples of the organic solvent include polyethylene glycol monomethyl ether, dichloromethane, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, 2-heptanone, 2-pentanone, 3-pentanone, 4-heptanone, cyclohexanone, 2-methylcyclohexanone, 3-methylcyclohexanone, 4-methylcyclohexanone, cycloheptanone, cyclooctanone, cyclohexyl acetate, cyclopentanone, ethyl carbitol acetate, butyl carbitol acetate, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, Examples thereof include 3-methoxy-N,N-dimethylpropanamide, 3-butoxy-N,N-dimethylpropanamide, propylene glycol diacetate, 3-methoxybutanol, methyl ethyl ketone, gamma butyrolactone, sulfolane, anisole, 1,4-diacetoxybutane, diethylene glycol monoethyl ether acetate, butane-1,3-diyl diacetate, dipropylene glycol methyl ether acetate, diacetone alcohol (aliases diacetone alcohol, 4-hydroxy-4-methyl-2-pentanone), 2-methoxypropyl acetate, 2-methoxy-1-propanol, isopropyl alcohol, etc. However, aromatic hydrocarbons (such as benzene, toluene, xylene, and ethylbenzene) as organic solvents may be better reduced for environmental reasons (for example, the total amount of organic solvents may be reduced to 50 mass ppm (parts per million) or less, 10 mass ppm or less, or 1 mass ppm or less).

In the present invention, it is preferable to use an organic solvent having a low metal content, and the metal content of the organic solvent is preferably, for example, 10 mass ppb (parts per billion) or less. If necessary, an organic solvent having a mass ppt (parts per trillion) level may be used, and such an organic solvent is provided by, for example, Toyo Kosei (Kagaku Kogyo Nippo, November 13, 2015).

As a method for removing impurities such as metals from organic solvents, distillation (molecular distillation, thin film distillation, etc.) or filtration using a filter can be mentioned, for example. The filter pore diameter of the filter used for filtration is preferably 10 μm or less, more preferably 5 μm or less, and even more preferably 3 μm or less. The material of the filter is preferably polytetrafluoroethylene, polyethylene, or nylon.

Organic solvents may contain isomers (compounds with the same number of atoms but different structures). Also, the isomers may contain only one type or may contain multiple types.

It is preferable that the content of peroxide in the organic solvent is 0.8 mmol/L or less, and it is more preferable that it contains substantially no peroxide.

The content of the solvent in the composition is preferably 10 to 97 mass%. The lower limit is preferably 30 mass% or more, more preferably 40 mass% or more, still more preferably 50 mass% or more, still more preferably 60 mass% or more, and particularly preferably 70 mass% or more. The upper limit is preferably 96 mass% or less, and more preferably 95 mass% or less. The composition may contain only one type of solvent, or may contain two or more types. When containing two or more types, it is preferable that their total amount is within the above range.

<<Pigment derivatives>>

The composition of the present invention may further contain a pigment derivative. The pigment derivative is used as a dispersing aid. As the pigment derivative, a compound having a structure in which an acid group or a basic group is bonded to a pigment skeleton can be exemplified.

As pigment skeletons constituting the pigment derivative, squarylium pigment skeleton, pyrrolopyrrole pigment skeleton, diketopyrrolopyrrole pigment skeleton, quinacridone pigment skeleton, anthraquinone pigment skeleton, dianthraquinone pigment skeleton, benzisoindole pigment skeleton, thiazine indigo pigment skeleton, azo pigment skeleton, quinophthalone pigment skeleton, phthalocyanine pigment skeleton, naphthalocyanine pigment skeleton, dioxazine pigment skeleton, perylene pigment skeleton, perinone pigment skeleton, benzimidazolone pigment skeleton, benzothiazole pigment skeleton, benzimidazole pigment skeleton and benzoxazole pigment skeleton can be mentioned, and squarylium pigment skeleton, pyrrolopyrrole pigment skeleton, diketopyrrolopyrrole pigment skeleton, phthalocyanine pigment skeleton, quinacridone pigment skeleton and benzimidazolone pigment skeleton are preferable, and squarylium pigment skeleton and pyrrolopyrrole pigment skeleton are preferable. It is more desirable.

Examples of the acid group include a carboxyl group, a sulfo group, a phosphoric acid group, a boronic acid group, a carboxylic acid amide group, a sulfonamide group, an imidic acid group, and salts thereof. Examples of the atoms or atomic groups constituting the salt include an alkali metal ion (Li ⁺ , Na ⁺ , K ^{+ ,} etc.), an alkaline earth metal ion (Ca ²⁺ , Mg ^{2+ ,} etc.), an ammonium ion, an imidazolium ion, a pyridinium ion, a phosphonium ion, etc. As the carboxylic acid amide group, a group represented by -NHCOR ^A1 is preferable. As the sulfonamide group, a group represented by -NHSO ₂ R ^A2 is preferable. As the imidic acid group, a group represented by -SO ₂ NHSO ₂ R ^A3 , -CONHSO ₂ R ^A4 , -CONHCOR ^A5 or -SO ₂ NHCOR ^A6 is preferable, and -SO ₂ NHSO ₂ R ^A3 is more preferable. R ^A1 to R ^A6 each independently represent an alkyl group or an aryl group. The alkyl group and aryl group represented by R ^A1 to R ^A6 may have a substituent. As the substituent, a halogen atom is preferable, and a fluorine atom is more preferable.

As basic groups, examples thereof include amino groups, pyridinyl groups and their salts, ammonium group salts, and phthalimidomethyl groups. As atoms or atomic groups constituting salts, examples thereof include hydroxide ions, halogen ions, carboxylic acid ions, sulfonic acid ions, and phenoxide ions.

Specific examples of pigment derivatives include the compounds described in the examples below. Also, Japanese Patent Publication No. 56-118462, Japanese Patent Publication No. 63-264674, Japanese Patent Publication No. 01-217077, Japanese Patent Publication No. 03-009961, Japanese Patent Publication No. 03-026767, Japanese Patent Publication No. 03-153780, Japanese Patent Publication No. 03-045662, Japanese Patent Publication No. 04-285669, Japanese Patent Publication No. 06-145546, Japanese Patent Publication No. 06-212088, Japanese Patent Publication No. 06-240158, Japanese Patent Publication No. 10-030063, Japanese Patent Publication No. 10-195326, and International Publication Also included are compounds described in paragraphs No. 0086 to 0098 of International Publication No. 2011/024896 and paragraphs No. 0063 to 0094 of International Publication No. 2012/102399, the contents of which are incorporated herein by reference.

The content of the pigment derivative is preferably 1 to 50 parts by mass per 100 parts by mass of the pigment. The lower limit is preferably 3 parts by mass or more, and more preferably 5 parts by mass or more. The upper limit is preferably 40 parts by mass or less, and more preferably 30 parts by mass or less. The pigment derivative may be used alone or in combination of two or more. When two or more types are used, the total amount is preferably within the above range.

<<Photopolymerization initiator>>

When the composition of the present invention contains a polymerizable compound, it is preferable that the composition of the present invention further contains a photopolymerization initiator. There is no particular limitation on the photopolymerization initiator, and it may be appropriately selected from known photopolymerization initiators. For example, a compound that is photosensitive to light from the ultraviolet range to the visible range is preferable. The photopolymerization initiator is preferably a photoradical polymerization initiator.

Examples of the photopolymerization initiator include halogenated hydrocarbon derivatives (e.g., compounds having a triazine skeleton, compounds having an oxadiazole skeleton, etc.), acylphosphine compounds, hexaarylbiimidazole compounds, oxime compounds, organic peroxides, thio compounds, ketone compounds, aromatic onium salts, α-hydroxyketone compounds, α-aminoketone compounds, and the like. From the viewpoint of exposure sensitivity, the photopolymerization initiator is preferably a trihalomethyltriazine compound, a benzyl dimethyl ketal compound, an α-hydroxyketone compound, an α-aminoketone compound, an acylphosphine compound, a phosphine oxide compound, a metallocene compound, an oxime compound, a hexaarylbiimidazole compound, an onium compound, a benzothiazole compound, a benzophenone compound, an acetophenone compound, a cyclopentadiene-benzene-iron complex, a halomethyloxadiazole compound, and a 3-aryl-substituted coumarin compound, more preferably a compound selected from an oxime compound, an α-hydroxyketone compound, an α-aminoketone compound, and an acylphosphine compound, and still more preferably an oxime compound. In addition, as photopolymerization initiators, compounds described in paragraphs 0065 to 0111 of Japanese Patent Application Laid-Open No. 2014-130173, compounds described in Japanese Patent Application Laid-Open No. 6301489, MATERIAL STAGE 37-60p, vol. 19, No. 3, a peroxide-based photopolymerization initiator described in 2019, a photopolymerization initiator described in International Publication No. 2018/221177, a photopolymerization initiator described in International Publication No. 2018/110179, a photopolymerization initiator described in Japanese Patent Laid-Open No. 2019-043864, a photopolymerization initiator described in Japanese Patent Laid-Open No. 2019-044030, a peroxide-based initiator described in Japanese Patent Laid-Open No. 2019-167313, an aminoacetophenone-based initiator having an oxazolidine group described in Japanese Patent Laid-Open No. 2020-055992, an oxime-based photopolymerization initiator described in Japanese Patent Laid-Open No. 2013-190459, a photopolymerization initiator described in Japanese Patent Laid-Open No. 2020-172619 Examples thereof include polymers, compounds represented by the formula 1 described in International Publication No. 2020/152120, the contents of which are incorporated herein by reference.

Specific examples of hexaarylbiimidazole compounds include 2,2',4-tris(2-chlorophenyl)-5-(3,4-dimethoxyphenyl)-4,5-diphenyl-1,1'-biimidazole, etc.

Commercially available products of α-hydroxyketone compounds include Omnirad 184, Omnirad 1173, Omnirad 2959, Omnirad 127 (all manufactured by IGM Resins B.V.), Irgacure 184, Irgacure 1173, Irgacure 2959, Irgacure 127 (all manufactured by BASF). Commercially available products of α-aminoketone compounds include Omnirad 907, Omnirad 369, Omnirad 369E, Omnirad 379EG (all manufactured by IGM Resins B.V.), Irgacure 907, Irgacure 369, Irgacure 369E, Irgacure 379EG (all manufactured by BASF). Commercially available products of acylphosphine compounds include Omnirad 819, Omnirad TPO (all manufactured by IGM Resins B.V.), Irgacure 819, Irgacure TPO (all manufactured by BASF), etc.

As the oxime compound, a compound described in Japanese Patent Laid-Open No. 2001-233842, a compound described in Japanese Patent Laid-Open No. 2000-080068, a compound described in Japanese Patent Laid-Open No. 2006-342166, a compound described in J. C. S. Perkin II (1979, pp. 1653-1660), a compound described in J. C. S. Perkin II (1979, pp. 156-162), a compound described in Journal of Photopolymer Science and Technology (1995, pp. 202-232), a compound described in Japanese Patent Laid-Open No. 2000-066385, a compound described in Japanese Patent Laid-Open No. 2004-534797, a compound described in Japanese Patent Laid-Open No. 2006-342166, a compound described in Japanese Patent Laid-Open No. Examples thereof include compounds described in Patent Publication No. 2017-019766, compounds described in Japanese Patent Publication No. 6065596, compounds described in International Publication No. 2015/152153, compounds described in International Publication No. 2017/051680, compounds described in Japanese Patent Publication No. 2017-198865, compounds described in paragraphs No. 0025 to 0038 of International Publication No. 2017/164127, compounds described in paragraphs No. 0029 to 0044 of International Publication No. 2013/167515, International Publication No. 2017/169819, and Japanese Patent Publication No. 2019-168654. Specific examples of oxime compounds include 3-benzoyloxyiminobutan-2-one, 3-acetoxyiminobutan-2-one, 3-propionyloxyiminobutan-2-one, 2-acetoxyiminopentan-3-one, 2-acetoxyimino-1-phenylpropan-1-one, 2-benzoyloxyimino-1-phenylpropan-1-one, 3-(4-toluenesulfonyloxy)iminobutan-2-one, 2-ethoxycarbonyloxyimino-1-phenylpropan-1-one, 1-[4-(phenylthio)phenyl]-3-cyclohexyl-propane-1,2-dione-2-(O-acetyloxime). Examples of commercially available products include Irgacure OXE01, Irgacure OXE02, Irgacure OXE03, Irgacure OXE04 (all manufactured by BASF), TR-PBG-304, TR-PBG-327 (manufactured by Tronly), and Adeka Optomer N-1919 (manufactured by ADEKA Co., Ltd., photopolymerization initiator 2 described in Japanese Patent Application Laid-Open No. 2012-014052). In addition, as the oxime compound, it is also preferable to use a compound without coloring properties or a compound that is highly transparent and thus unlikely to discolor. Examples of commercially available products include ADEKA Acles NCI-730, NCI-831, NCI-930 (all manufactured by ADEKA Co., Ltd.).

As a photopolymerization initiator, an oxime compound having a fluorene ring can also be used. Specific examples of oxime compounds having a fluorene ring include compounds described in Japanese Patent Application Laid-Open No. 2014-137466, compounds described in Japanese Patent Application Laid-Open No. 6636081, and compounds described in Korean Patent Application Laid-Open No. 10-2016-0109444.

As a photopolymerization initiator, an oxime compound having a skeleton in which at least one benzene ring of a carbazole ring becomes a naphthalene ring may be used. Specific examples of such oxime compounds include compounds described in International Publication No. 2013/083505.

As a photopolymerization initiator, an oxime compound having a fluorine atom can also be used. Specific examples of the oxime compound having a fluorine atom include compounds described in Japanese Patent Application Laid-Open No. 2010-262028, compounds 24, 36 to 40 described in Japanese Patent Application Laid-Open No. 2014-500852, and compound (C-3) described in Japanese Patent Application Laid-Open No. 2013-164471.

As a photopolymerization initiator, an oxime compound having a nitro group can be used. It is also preferable that the oxime compound having a nitro group be a dimer. Specific examples of the oxime compound having a nitro group include compounds described in paragraphs No. 0031 to 0047 of Japanese Patent Application Laid-Open No. 2013-114249, paragraphs No. 0008 to 0012 and 0070 to 0079 of Japanese Patent Application Laid-Open No. 2014-137466, compounds described in paragraphs No. 0007 to 0025 of Japanese Patent Application Laid-Open No. 4223071, and ADEKA ACKLS NCI-831 (manufactured by ADEKA Co., Ltd.).

As a photopolymerization initiator, an oxime compound having a benzofuran skeleton can also be used. Specific examples thereof include OE-01 to OE-75 described in International Publication No. 2015/036910.

As a photopolymerization initiator, an oxime compound having a carbazole skeleton and a substituent having a hydroxyl group bonded thereto may be used. Examples of such photopolymerization initiators include compounds described in International Publication No. 2019/088055.

Specific examples of oxime compounds preferably used in the present invention are shown below, but the present invention is not limited to these.

[Chemical Formula 34]

[Chemical Formula 35]

[Chemical formula 36]

[Chemical Formula 37]

The oxime compound is preferably a compound having a maximum absorption wavelength in the range of 350 to 500 nm, and more preferably a compound having a maximum absorption wavelength in the range of 360 to 480 nm. In addition, the molar absorption coefficient of the oxime compound at a wavelength of 365 nm or a wavelength of 405 nm is preferably high from the viewpoint of sensitivity, more preferably 1,000 to 300,000, still more preferably 2,000 to 300,000, and particularly preferably 5,000 to 200,000. The molar absorption coefficient of the compound can be measured using a known method. For example, it is preferable to measure at a concentration of 0.01 g/L using an ethyl acetate solvent with a spectrophotometer (Cary-5 spectrophotometer manufactured by Varian).

As the photopolymerization initiator, a bifunctional or trifunctional or higher photoradical polymerization initiator may be used. By using such a photoradical polymerization initiator, since two or more radicals are generated from one molecule of the photoradical polymerization initiator, good sensitivity is obtained. In addition, in the case of using a compound having an asymmetric structure, the crystallinity is lowered, solubility in solvents, etc. is improved, and precipitation becomes difficult over time, so that the stability over time of the composition can be improved. Specific examples of the bifunctional or trifunctional or higher photoradical polymerization initiator include dimers of oxime compounds described in Japanese Patent Publication No. 2010-527339, Japanese Patent Publication No. 2011-524436, International Publication No. 2015/004565, paragraphs No. 0407 to 0412 of Japanese Patent Publication No. 2016-532675, and paragraphs No. 0039 to 0055 of International Publication No. 2017/033680, compounds (E) and (G) described in Japanese Patent Publication No. 2013-522445, Cmpd 1 to 7 described in International Publication No. 2016/034963, and Japanese Patent Publication No. 2013-522445. Examples thereof include the oxime ester initiator described in paragraph No. 0007 of Japanese Patent Application Publication No. 2017-523465, the photoinitiator described in paragraphs No. 0020 to 0033 of Japanese Patent Application Publication No. 2017-167399, the photopolymerization initiator (A) described in paragraphs No. 0017 to 0026 of Japanese Patent Application Publication No. 2017-151342, and the oxime ester initiator described in Japanese Patent Publication No. 6469669.

The content of the photopolymerization initiator is preferably 0.1 to 40 mass%, more preferably 0.5 to 35 mass%, and even more preferably 1 to 30 mass%, based on the total solid content of the composition. The composition may contain only one type of photopolymerization initiator, or may contain two or more types. When two or more types are contained, it is preferable that their total amount is within the above range.

<<Hardener>>

When the composition of the present invention includes a compound having a cyclic ether group, it is preferable to further include a curing agent. Examples of the curing agent include amine compounds, acid anhydride compounds, amide compounds, phenol compounds, polyhydric carboxylic acids, and thiol compounds. Specific examples of the curing agent include succinic acid, trimellitic acid, pyromellitic acid, N,N-dimethyl-4-aminopyridine, and pentaerythritol tetrakis(3-mercaptopropionate). As the curing agent, compounds described in paragraphs No. 0072 to 0078 of Japanese Patent Application Laid-Open No. 2016-075720 and compounds described in Japanese Patent Application Laid-Open No. 2017-036379 can also be used. The content of the hardener is preferably 0.01 to 20 parts by mass, more preferably 0.01 to 10 parts by mass, and even more preferably 0.1 to 6.0 parts by mass, per 100 parts by mass of the compound having a cyclic ether group.

<<Colored pigment>>

The composition of the present invention may contain a chromatic colorant. In the present invention, the chromatic colorant means a colorant other than a white colorant and a black colorant. The chromatic colorant is preferably a colorant having absorption in a wavelength range of 400 nm or more and less than 650 nm.

As chromatic colorants, red colorants, green colorants, blue colorants, yellow colorants, purple colorants, and orange colorants can be mentioned. The chromatic colorants can be pigments or dyes. Pigments and dyes can be used in combination. Also, the pigments can be either inorganic pigments or organic pigments. Also, as pigments, a material in which part of an inorganic pigment or an organic-inorganic pigment is substituted with an organic chromophore can be used. By substituting an inorganic pigment or an organic-inorganic pigment with an organic chromophore, color design can be made easy.

The average primary particle diameter of the pigment is preferably 1 to 200 nm. The lower limit is preferably 5 nm or more, and more preferably 10 nm or more. The upper limit is preferably 180 nm or less, more preferably 150 nm or less, and even more preferably 100 nm or less. When the average primary particle diameter of the pigment is within the above range, the dispersion stability of the pigment in the composition is good. In addition, in the present invention, the primary particle diameter of the pigment can be obtained from an image photograph obtained by observing the primary particles of the pigment with a transmission electron microscope. Specifically, the projected area of the primary particles of the pigment is obtained, and the corresponding circle-equivalent diameter is calculated as the primary particle diameter of the pigment. In addition, the average primary particle diameter in the present invention is taken as the arithmetic mean of the primary particle diameters of 400 primary particles of the pigment. In addition, the primary particles of the pigment refer to independent particles without aggregation.

It is preferable that the chromatic colorant contains a pigment. The content of the pigment in the chromatic colorant is preferably 50 mass% or more, more preferably 70 mass% or more, still more preferably 80 mass% or more, and particularly preferably 90 mass% or more. Examples of the pigment include those shown below.

Color Index (C.I.) Pigment Yellow 1, 2, 3, 4, 5, 6, 10, 11, 12, 13, 14, 15, 16, 17, 18, 20, 24, 31, 32, 34, 35, 35:1, 36, 36:1, 37, 37:1, 40, 42, 43, 53, 55, 60, 61, 62, 63, 65, 73, 74, 77, 81, 83, 86, 93, 94, 95, 97, 98, 100, 101, 104, 106, 108, 109, 110, 113, 114, 115, 116, 117, 118, 119, 120, 123, 125, 126, 127, 128, 129, 137, 138, 139, 147, 148, 150, 151, 152, 153, 154, 155, 6, 161, 162, 164, 166, 167, 168, 169, 170, 171, 172, 173, 174, 175, 176, 177, 179, 180, 181, 182, 185, 187, 188, 193, 199, 213, 214, 215, 228, 231, 232 (metaine), 233 (quinoline), 234 (aminoketone), 235 (aminoketone), 236 (aminoketone), etc. (above, yellow pigments)

C. I. Pigment Orange 2, 5, 13, 16, 17:1, 31, 34, 36, 38, 43, 46, 48, 49, 51, 52, 55, 59, 60, 61, 62, 64, 71, 73, etc. (orange pigments)

C. I. Pigment Red 1, 2, 3, 4, 5, 6, 7, 9, 10, 14, 17, 22, 23, 31, 38, 41, 48:1, 48:2, 48:3, 48:4 , 49, 49:1, 49:2, 52:1, 52:2, 53:1, 57:1, 60:1, 63:1, 66, 67, 81:1, 81:2, 81:3 , 83, 88, 90, 105, 112, 119, 122, 123, 144, 146, 149, 150, 155, 166, 168, 169, 170, 171, 172, 175, 176, 177, 178, 179, 184, 185, 187, 188, 190, 200, 202, 206, 207, 208, 209, 210, 216, 220, 224, 226, 242, 246, 254, 255, 264, 269, 270, 272, 279, 291, 294 (Xanthenes, Organo Ultramarine, Bluish Red), 295 (Monoazo), 296 (Diazos), 297 (Aminoketone), etc. (above, red pigment),

C. I. Pigment Green 7, 10, 36, 37, 58, 59, 62, 63, 64 (phthalocyanine), 65 (phthalocyanine), 66 (phthalocyanine), etc. (green pigments)

C. I. Pigment Violet 1, 19, 23, 27, 32, 37, 42, 60 (triarylmethane series), 61 (xanthene series), etc. (violet pigments)

C. I. Pigment Blue 1, 2, 15, 15:1, 15:2, 15:3, 15:4, 15:6, 16, 22, 29, 60, 64, 66, 79, 80, 87 (monoazo system), 88 (metaine system), etc. (above, blue pigments).

In addition, as a green pigment, a halogenated zinc phthalocyanine pigment having an average of 10 to 14 halogen atoms, an average of 8 to 12 bromine atoms, and an average of 2 to 5 chlorine atoms per molecule can also be used. Specific examples thereof include compounds described in International Publication No. 2015/118720. In addition, as a green pigment, a compound described in Chinese Patent Application No. 106909027, a phthalocyanine compound having a phosphoric acid ester as a ligand described in International Publication No. 2012/102395, a phthalocyanine compound described in Japanese Patent Laid-Open No. 2019-008014, a phthalocyanine compound described in Japanese Patent Laid-Open No. 2018-180023, a compound described in Japanese Patent Laid-Open No. 2019-038958, a core-shell pigment described in Japanese Patent Laid-Open No. 2020-076995, etc. can also be used.

In addition, as a blue pigment, an aluminum phthalocyanine compound having a phosphorus atom can be used. Specific examples thereof include compounds described in paragraphs No. 0022 to 0030 of Japanese Patent Application Laid-Open No. 2012-247591 and paragraph No. 0047 of Japanese Patent Application Laid-Open No. 2011-157478.

In addition, as a yellow pigment, a compound described in Japanese Patent Application Publication No. 2017-201003, a compound described in Japanese Patent Application Publication No. 2017-197719, a compound described in paragraphs No. 0011 to 0062, 0137 to 0276 of Japanese Patent Application Publication No. 2017-171912, a compound described in paragraphs No. 0010 to 0062, 0138 to 0295 of Japanese Patent Application Publication No. 2017-171913, a compound described in paragraphs No. 0011 to 0062, 0139 to 0190 of Japanese Patent Application Publication No. 2017-171914, a compound described in paragraphs No. 0010 to 0065, 0142 to 0222 of Japanese Patent Application Publication No. 2017-171915, a compound described in paragraphs No. 0010 to 0065, 0142 to 0222 of Japanese Patent Application Publication No. 2017-171916, a compound described in paragraphs No. 0011 to 0062, 0139 to 0190 of Japanese Patent Application Publication No. 2017-171917, a compound described in paragraphs No. 0010 to 0065, 0142 to 0222 of Japanese Patent Application Publication No. 2017-171915, a compound described in paragraphs No. 0011 to 0062, 0139 to 0190 of Japanese Patent Application Publication No. 2017-171916, a compound described in paragraphs No. 0010 to 0065, 0142 to 0222 of Japanese Patent Application Publication No. A quinophthalone compound described in paragraphs No. 0011 to 0034 of Patent Publication No. 2013-054339, a quinophthalone compound described in paragraphs No. 0013 to 0058 of Japanese Patent Publication No. 2014-026228, an isoindoline compound described in Japanese Patent Publication No. 2018-062644, a quinophthalone compound described in Japanese Patent Publication No. 2018-203798, a quinophthalone compound described in Japanese Patent Publication No. 2018-062578, a quinophthalone compound described in Japanese Patent Publication No. 6432076, a quinophthalone compound described in Japanese Patent Publication No. 2018-155881, and a quinophthalone compound described in Japanese Patent Publication No. 2018-111757. Quinophthalone compound, a quinophthalone compound described in Japanese Patent Publication No. 2018-040835, a quinophthalone compound described in Japanese Patent Publication No. 2017-197640, a quinophthalone compound described in Japanese Patent Publication No. 2016-145282, a quinophthalone compound described in Japanese Patent Publication No. 2014-085565, a quinophthalone compound described in Japanese Patent Publication No. 2014-021139, a quinophthalone compound described in Japanese Patent Publication No. 2013-209614, a quinophthalone compound described in Japanese Patent Publication No. 2013-209435, a quinophthalone compound described in Japanese Patent Publication No. 2013-181015, a quinophthalone compound described in Japanese Patent Publication No. A quinophthalone compound described in Japanese Patent Application Publication No. 2013-061622, a quinophthalone compound described in Japanese Patent Application Publication No. 2013-032486, a quinophthalone compound described in Japanese Patent Application Publication No. 2012-226110, a quinophthalone compound described in Japanese Patent Application Publication No. 2008-074987, a quinophthalone compound described in Japanese Patent Application Publication No. 2008-081565, a quinophthalone compound described in Japanese Patent Application Publication No. 2008-074986, a quinophthalone compound described in Japanese Patent Application Publication No. 2008-074985, a quinophthalone compound described in Japanese Patent Application Publication No. 2008-050420, a quinophthalone compound described in Japanese Patent Application Publication No. 2008-031281 The quinophthalone compound described in Japanese Patent Publication No. 48-032765, the quinophthalone compound described in Japanese Patent Laid-Open No. 2019-008014, the quinophthalone compound described in Japanese Patent Publication No. 6607427, the compound described in Korean Patent Laid-Open No. 10-2014-0034963, the compound described in Japanese Patent Laid-Open No. 2017-095706, the compound described in Taiwanese Patent Application Publication No. 201920495, the compound described in Japanese Patent Publication No. 6607427, the compound described in Japanese Patent Laid-Open No. 2020-033525, the compound described in Japanese Patent Laid-Open No. 2020-033524, the compound described in Japanese Patent Laid-Open No. 2020-033523 Compounds, compounds described in Japanese Patent Application Laid-Open No. 2020-033522, compounds described in Japanese Patent Application Laid-Open No. 2020-033521, compounds described in International Publication No. 2020/045200, compounds described in International Publication No. 2020/045199, and compounds described in International Publication No. 2020/045197 can also be used. In addition, those compounds that are multimerized are also preferably used from the viewpoint of improving color value.

As a red pigment, a diketopyrrolopyrrole compound having a structure described in Japanese Patent Laid-Open No. 2017-201384 in which at least one bromine atom is substituted, a diketopyrrolopyrrole compound described in paragraphs No. 0016 to 0022 of Japanese Patent Publication No. 6248838, a diketopyrrolopyrrole compound described in International Publication No. 2012/102399, a diketopyrrolopyrrole compound described in International Publication No. 2012/117965, a naphthol azo compound described in Japanese Patent Laid-Open No. 2012-229344, a red pigment described in Japanese Patent Laid-Open No. 6516119, a red pigment described in Japanese Patent Laid-Open No. 6525101, a brominated compound described in paragraph No. 0229 of Japanese Patent Laid-Open No. 2020-090632 It is also possible to use a diketopyrrolopyrrole compound, an anthraquinone compound described in Korean Patent Publication No. 10-2019-0140741, an anthraquinone compound described in Korean Patent Publication No. 10-2019-0140744, a perylene compound described in Japanese Patent Publication No. 2020-079396, etc. In addition, as a red pigment, it is also possible to use a compound having a structure in which an aromatic ring group to which an oxygen atom, a sulfur atom, or a nitrogen atom is bonded to the aromatic ring is introduced, and the aromatic ring group is bonded to the diketopyrrolopyrrole skeleton.

For the preferable diffraction angles that various pigments have, reference can be made to the descriptions of Japanese Patent Publication No. 6561862, Japanese Patent Publication No. 6413872, Japanese Patent Publication No. 6281345, and Japanese Unexamined Patent Publication No. 2020-026503, the contents of which are incorporated herein by reference. In addition, as a pyrrolo-pyrrole pigment, it is also preferable to use one in which the crystallite size in the direction of the plane corresponding to the maximum peak in the X-ray diffraction pattern among eight planes of (±1±1±1) among the crystal lattice planes is 140 Å or less. In addition, it is also preferable to set the physical properties of the pyrrolo-pyrrole pigment as described in paragraphs 0028 to 0073 of Japanese Unexamined Patent Publication No. 2020-097744.

Dyes can also be used as chromatic colorants. There are no particular limitations on the dyes, and known dyes can be used. Examples thereof include pyrazole azo dyes, anilino azo dyes, triarylmethane dyes, anthraquinone dyes, anthrapyridone dyes, benzylidene dyes, oxonol dyes, pyrazolotriazole azo dyes, pyridone azo dyes, cyanine dyes, phenothiazine dyes, pyrrolopyrazole azometaine dyes, xanthene dyes, phthalocyanine dyes, benzopyran dyes, indigo dyes, and pyrromethene dyes.

A pigment multimer may also be used as a chromatic colorant. The pigment multimer is preferably a dye that is dissolved in a solvent and used. In addition, the pigment multimer may form particles. When the pigment multimer is a particle, it is usually used in a state dispersed in a solvent. The particle-like pigment multimer can be obtained, for example, by emulsion polymerization, and specific examples thereof include compounds and production methods described in Japanese Patent Application Laid-Open No. 2015-214682. The pigment multimer has two or more pigment structures in one molecule, and preferably has three or more pigment structures. The upper limit is not particularly limited, but may be 100 or less. The plurality of pigment structures in one molecule may be the same pigment structure or different pigment structures. The weight average molecular weight (Mw) of the pigment multimer is preferably 2,000 to 50,000. The lower limit is more preferably 3000 or more, and more preferably 6000 or more. The upper limit is more preferably 30000 or less, and more preferably 20000 or less. The dye multimer can also utilize compounds described in Japanese Patent Application Laid-Open No. 2011-213925, Japanese Patent Application Laid-Open No. 2013-041097, Japanese Patent Application Laid-Open No. 2015-028144, Japanese Patent Application Laid-Open No. 2015-030742, International Publication No. 2016/031442, etc.

In addition, as the chromatic colorant, a thiazole compound described in Japanese Patent Application Laid-Open No. 2012-158649, an azo compound described in Japanese Patent Application Laid-Open No. 2011-184493, an azo compound described in Japanese Patent Application Laid-Open No. 2011-145540, a triarylmethane dye polymer described in Korean Patent Application Laid-Open No. 10-2020-0028160, a xanthene compound described in Japanese Patent Application Laid-Open No. 2020-117638, a phthalocyanine compound described in International Publication No. 2020/174991, an isoindoline compound described in Japanese Patent Application Laid-Open No. 2020-160279, or a salt thereof can be used.

When the composition of the present invention contains a chromatic colorant, the content of the chromatic colorant is preferably 1 to 50 mass% of the total solid content of the composition of the present invention. When the composition of the present invention contains two or more kinds of chromatic colorants, the total amount thereof is preferably within the above range.

When the composition of the present invention is used as an infrared cutoff filter, it is preferable that the composition of the present invention substantially does not contain a chromatic colorant. In addition, when the composition of the present invention substantially does not contain a chromatic colorant, it means that the content of the chromatic colorant in the total solid content of the composition of the present invention is 0.5 mass% or less, preferably 0.1 mass% or less, and more preferably does not contain a chromatic colorant.

<<Coloring material that transmits infrared rays and blocks visible light>>

The composition of the present invention may contain a coloring material that transmits infrared rays and blocks visible light (hereinafter, also referred to as a coloring material that blocks visible light). A composition containing a coloring material that blocks visible light is preferably used as a composition for forming an infrared transmitting filter.

It is preferable that the colorant that blocks visible light is a colorant that absorbs light in the wavelength range from purple to red. In addition, it is preferable that the colorant that blocks visible light is a colorant that blocks light in the wavelength range of 450 to 650 nm. In addition, it is preferable that the colorant that blocks visible light is a colorant that transmits light in the wavelength range of 900 to 1500 nm. It is preferable that the colorant that blocks visible light satisfies at least one of the following requirements (A) and (B).

(A): Contains two or more types of chromatic colorants, and a black color is formed by a combination of two or more types of chromatic colorants.

(B): Contains an organic black colorant.

Examples of the chromatic colorant include those described above. Examples of the organic black colorant include bisbenzofuranone compounds, azomethain compounds, perylene compounds, azo compounds, etc., and bisbenzofuranone compounds and perylene compounds are preferable. Examples of the bisbenzofuranone compounds include compounds described in Japanese Patent Publication No. 2010-534726, Japanese Patent Publication No. 2012-515233, Japanese Patent Publication No. 2012-515234, etc., and are available as "Irgaphor Black" from BASF. Examples of the perylene compounds include compounds described in paragraphs 0016 to 0020 of Japanese Patent Publication No. 2017-226821, C. I. Pigment Black 31, 32, etc. Examples of azomethane compounds include compounds described in Japanese Patent Application Laid-Open No. 01-170601, Japanese Patent Application Laid-Open No. 02-034664, etc., and are available as "Chromophine Black A1103" manufactured by Dainichi Seika Co., Ltd.

In the case where a black color is formed by combining two or more types of chromatic colorants, examples of the combination of chromatic colorants include the following embodiments (1) to (8).

(1) A form containing a yellow colorant, a blue colorant, a purple colorant and a red colorant.

(2) A form containing a yellow colorant, a blue colorant and a red colorant.

(3) A form containing a yellow colorant, a purple colorant and a red colorant.

(4) A form containing a yellow colorant and a purple colorant.

(5) A form containing a green colorant, a blue colorant, a purple colorant and a red colorant.

(6) A form containing purple colorant and orange colorant.

(7) A form containing a green colorant, a purple colorant and a red colorant.

(8) A form containing a green colorant and a red colorant.

When the composition of the present invention contains a colorant that blocks visible light, the content of the colorant that blocks visible light is preferably 1 to 50 mass% of the total solid content of the composition. The lower limit is preferably 5 mass% or more, more preferably 10 mass% or more, still more preferably 20 mass% or more, and particularly preferably 30 mass% or more.

When the composition of the present invention is used as an infrared cut filter, it is preferable that the composition of the present invention substantially does not contain a colorant that blocks visible light. Furthermore, when the composition of the present invention substantially does not contain a colorant that blocks visible light, it means that the content of the colorant that blocks visible light in the total solid content of the composition of the present invention is 0.5 mass% or less, preferably 0.1 mass% or less, and more preferably does not contain a colorant that blocks visible light.

<<Surfactant>>

The composition of the present invention preferably contains a surfactant. As the surfactant, various surfactants such as a fluorinated surfactant, a nonionic surfactant, a cationic surfactant, an anionic surfactant, and a silicone surfactant can be used. The surfactant is preferably a silicone surfactant or a fluorinated surfactant. As for the surfactant, surfactants described in paragraphs No. 0238 to 0245 of International Publication No. 2015/166779 can be mentioned, the contents of which are incorporated herein by reference.

Examples of fluorinated surfactants include surfactants described in paragraphs No. 0060 to 0064 of Japanese Patent Application Laid-Open No. 2014-041318 (paragraphs No. 0060 to 0064 of corresponding International Publication No. 2014/017669), surfactants described in paragraphs No. 0117 to 0132 of Japanese Patent Application Laid-Open No. 2011-132503, and surfactants described in Japanese Patent Application Laid-Open No. 2020-008634, the contents of which are incorporated herein by reference. As commercially available products of fluorine-based surfactants, for example, Megapaq F-171, F-172, F-173, F-176, F-177, F-141, F-142, F-143, F-144, F-437, F-475, F-477, F-479, F-482, F-554, F-555-A, F-556, F-557, F-558, F-559, F-560, F-561, F-563, F-565, F-568, F-575, F-780, EXP, MFS-330, R-01, R-40, R-40-LM, R-41, R-41-LM, RS-43, TF-1956, RS-90, R-94, RS-72-K, DS-21 (all from DIC Co., Ltd.), Fluorad FC430, FC431, FC171 (all from Sumitomo 3M Co., Ltd.), Surflon S-382, SC-101, SC-103, SC-104, SC-105, SC-1068, SC-381, SC-383, S-393, KH-40 (all from AGC Co., Ltd.), PolyFox PF636, PF656, PF6320, PF6520, PF7002 (all from OMNOVA), Phtergent 208G, 215M, 245F, 601AD, 601ADH2, 602A, 610FM, 710FL, 710FM, 710FS, Examples include FTX-218 (manufactured by NEOS Co., Ltd.).

In addition, as a fluorine-containing surfactant, an acrylic compound having a molecular structure having a functional group containing a fluorine atom, and in which the portion of the functional group containing the fluorine atom is cleaved when heat is applied and the fluorine atom volatilizes can also be suitably used. As such a fluorine-containing surfactant, an example of the Megapak DS series manufactured by DIC Co., Ltd. (Kagaku Kogyo Nippo (February 22, 2016), Nikkei Sangyo Shinbun (February 23, 2016)) is Megapak DS-21.

In addition, as a fluorine-containing surfactant, it is also preferable to use a polymer of a fluorine atom-containing vinyl ether compound having a fluorinated alkyl group or a fluorinated alkylene ether group and a hydrophilic vinyl ether compound. Examples of such fluorine-containing surfactants include fluorine-containing surfactants described in Japanese Patent Application Laid-Open No. 2016-216602, the contents of which are incorporated herein by reference.

As the fluorinated surfactant, a block polymer can also be used. As the fluorinated surfactant, a fluorinated polymer compound comprising a repeating unit derived from a (meth)acrylate compound having a fluorine atom and a repeating unit derived from a (meth)acrylate compound having two or more (preferably five or more) alkyleneoxy groups (preferably ethyleneoxy groups and propyleneoxy groups) can also be preferably used. In addition, the fluorine-containing surfactants described in paragraphs No. 0016 to 0037 of Japanese Patent Application Laid-Open No. 2010-032698 and the following compounds are also exemplified as the fluorinated surfactant used in the present invention.

[Chemical formula 38]

The weight average molecular weight of the above compound is preferably 3000 to 50000, for example, 14000. In the above compound, % indicating the proportion of repeating units is mol%.

In addition, as a fluorinated surfactant, a fluorinated polymer having an ethylenically unsaturated bond-containing group in the side chain can be used. Specific examples thereof include compounds described in paragraphs No. 0050 to 0090 and paragraphs No. 0289 to 0295 of Japanese Patent Application Laid-Open No. 2010-164965, and Megapak RS-101, RS-102, RS-718K, RS-72-K manufactured by DIC Corporation. In addition, as a fluorinated surfactant, compounds described in paragraphs No. 0015 to 0158 of Japanese Patent Application Laid-Open No. 2015-117327 can be used.

In addition, it is also desirable from an environmental regulation perspective to use the surfactant described in International Publication No. 2020/084854 as a substitute for a surfactant having a perfluoroalkyl group having 6 or more carbon atoms.

In addition, it is also desirable to use a fluorinated imide salt compound represented by formula (fi-1) as a surfactant.

[Chemical Formula 39]

In the formula (fi-1), m represents 1 or 2, n represents an integer from 1 to 4, a represents 1 or 2, and X ^a+ represents a metal ion of valent a, a primary ammonium ion, a secondary ammonium ion, a tertiary ammonium ion, a quaternary ammonium ion, or NH ₄ ⁺ .

As nonionic surfactants, glycerol, trimethylolpropane, trimethylolethane and their ethoxylates and propoxylates (e.g., glycerol propoxylate, glycerol ethoxylate, etc.), polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, polyoxyethylene oleyl ether, polyoxyethylene octyl phenyl ether, polyoxyethylene nonyl phenyl ether, polyethylene glycol dilaurate, polyethylene glycol distearate, sorbitan fatty acid esters, Pluronic L10, L31, L61, L62, 10R5, 17R2, 25R2 (manufactured by BASF), Tetronic 304, 701, 704, 901, 904, 150R1 (manufactured by BASF), Solsperse 20000 (manufactured by Nippon Lubrizol Co., Ltd.), NCW-101, Examples include NCW-1001, NCW-1002 (manufactured by Wako Junyaku Kogyo Co., Ltd.), Pioneer D-6112, D-6112-W, D-6315 (manufactured by Takemoto Yushi Co., Ltd.), Olphin E1010, Surfinol 104, 400, 440 (manufactured by Nissin Kagaku Kogyo Co., Ltd.).

Examples of cationic surfactants include tetraalkylammonium salts, alkylamine salts, benzalkonium salts, alkylpyridium salts, and imidazolium salts. Specific examples include dihydroxyethylstearylamine, 2-heptadecenyl-hydroxyethylimidazoline, lauryldimethylbenzylammonium chloride, cetylpyridinium chloride, and stearamidemethylpyridium chloride.

Examples of the anionic surfactants include dodecylbenzenesulfonic acid, sodium dodecylbenzenesulfonate, sodium lauryl sulfate, sodium alkyldiphenyl ether disulfonate, sodium alkylnaphthalenesulfonate, sodium dialkyl sulfosuccinate, sodium stearate, potassium oleate, sodium dioctyl sulfosuccinate, sodium polyoxyethylene alkyl ether sulfate, sodium polyoxyethylene alkyl ether sulfate, sodium polyoxyethylene alkylphenyl ether sulfate, sodium dialkyl sulfosuccinate, sodium stearate, sodium oleate, t-octylphenoxyethoxypolyethoxyethyl sulfate sodium salt, and the like.

As silicone surfactants, for example, SH8400, SH8400 FLUID, FZ-2122, 67 Additive, 74 Additive, M Additive, SF 8419 OIL (all manufactured by Dow Toray Co., Ltd.), TSF-4440, TSF-4300, TSF-4445, TSF-4460, TSF-4452 (all manufactured by Momentive Performance Materials Co., Ltd.), KP-341, KF-6000, KF-6001, KF-6002, KF-6003 (all manufactured by Shin-Etsu Chemical Co., Ltd.), BYK-307, BYK-322, BYK-323, BYK-330, BYK-3760, BYK-UV3510 (all manufactured by Big Chemie Co., Ltd.) You can hear the back.

Additionally, a compound having the following structure can be used as a silicone-based surfactant.

[Chemical formula 40]

The content of the surfactant is preferably 0.001 to 1 mass% of the total solid content of the composition, more preferably 0.001 to 0.5 mass%, and even more preferably 0.001 to 0.2 mass%. The composition may contain only one type of surfactant, or may contain two or more types. When containing two or more types, it is preferable that their total amount is within the above range.

<<Polymerization inhibitor>>

The composition of the present invention may contain a polymerization inhibitor. Examples of the polymerization inhibitor include hydroquinone, p-methoxyphenol, di-tert-butyl-p-cresol, pyrogallol, tert-butylcatechol, benzoquinone, 4,4'-thiobis(3-methyl-6-tert-butylphenol), 2,2'-methylenebis(4-methyl-6-t-butylphenol), N-nitrosophenylhydroxyamine salt (ammonium salt, cerium salt, etc.), and p-methoxyphenol is preferable. The content of the polymerization inhibitor is preferably 0.0001 to 5 mass% based on the total solid content of the composition. The composition may contain only one type of polymerization inhibitor or may contain two or more types. When two or more types are contained, it is preferable that their total amount is within the above range.

<<Silane coupling agent>>

The composition of the present invention may contain a silane coupling agent. In the present specification, the silane coupling agent means a silane compound having a hydrolyzable group and a functional group other than the hydrolyzable group. In addition, the hydrolyzable group means a substituent that is directly connected to a silicon atom and can form a siloxane bond by at least one of a hydrolysis reaction and a condensation reaction. Examples of the hydrolyzable group include a halogen atom, an alkoxy group, an acyloxy group, and the like, and an alkoxy group is preferable. That is, the silane coupling agent is preferably a compound having an alkoxysilyl group. In addition, examples of the functional group other than the hydrolyzable group include a vinyl group, a (meth)acryloyl group, a mercapto group, an epoxy group, an oxetanyl group, an amino group, a ureido group, a sulfide group, an isocyanate group, a phenyl group, and the like, and a (meth)acryloyl group and an epoxy group are preferable. Examples of the silane coupling agent include compounds described in paragraphs 0018 to 0036 of Japanese Patent Application Laid-Open No. 2009-288703 and compounds described in paragraphs 0056 to 0066 of Japanese Patent Application Laid-Open No. 2009-242604, the contents of which are incorporated herein by reference. The content of the silane coupling agent is preferably 0.01 to 15.0 mass%, more preferably 0.05 to 10.0 mass%, based on the total solid content of the composition. The composition may contain only one silane coupling agent or may contain two or more silane coupling agents. When containing two or more silane coupling agents, it is preferable that their total amount falls within the above range.

<<UV absorber>>

The composition of the present invention may contain an ultraviolet absorber. Examples of the ultraviolet absorber include conjugated diene compounds, aminodiene compounds, salicylate compounds, benzophenone compounds, benzotriazole compounds, acrylonitrile compounds, hydroxyphenyltriazine compounds, indole compounds, triazine compounds, dibenzoyl compounds, and the like. Specific examples of such compounds include compounds described in paragraphs No. 0038 to 0052 of Japanese Patent Application Laid-Open No. 2009-217221, paragraphs No. 0052 to 0072 of Japanese Patent Application Laid-Open No. 2012-208374, paragraphs No. 0317 to 0334 of Japanese Patent Application Laid-Open No. 2013-068814, paragraphs No. 0061 to 0080 of Japanese Patent Application Laid-Open No. 2016-162946, paragraphs No. 0052 and 0074 of International Publication No. 2021/131355, and paragraphs No. 0022 to 0024 of International Publication No. 2021/132247, the contents of which are incorporated herein by reference. Examples of commercially available ultraviolet absorbers include the Tinuvin series and Uvinul series manufactured by BASF. In addition, examples of benzotriazole compounds include the MYUA series manufactured by Miyoshi Yushi (Kagaku Kogyo Nippo, February 1, 2016). As the ultraviolet absorber, compounds described in the examples described below, paragraphs Nos. 0049 to 0059 of Japanese Patent Publication No. 6268967, and paragraphs Nos. 0059 to 0076 of International Publication No. 2016/181987 can also be used. The content of the ultraviolet absorber is preferably 0.01 to 30 mass%, more preferably 0.05 to 25 mass%, based on the total solid content of the composition. The composition may contain only one type of ultraviolet absorber, or may contain two or more types. When two or more types are contained, it is preferable that their total amount falls within the above range.

<<Antioxidant>>

The composition of the present invention may contain an antioxidant. Examples of the antioxidant include phenol antioxidants, amine antioxidants, phosphorus antioxidants, and sulfur antioxidants. Examples of the phenol antioxidant include hindered phenol compounds. The phenol antioxidant is preferably a compound having a substituent at a position (ortho-position) adjacent to a phenolic hydroxyl group. The substituent described above is preferably a substituted or unsubstituted alkyl group having 1 to 22 carbon atoms. The antioxidant is also preferably a compound having a phenol group and a phosphorous ester group in the same molecule. Examples of the phosphorus antioxidants include tris[2-[[2,4,8,10-tetrakis(1,1-dimethylethyl)dibenzo[d,f][1,3,2]dioxaphosphepin-6-yl]oxy]ethyl]amine, tris[2-[(4,6,9,11-tetra-tert-butyldibenzo[d,f][1,3,2]dioxaphosphepin-2-yl)oxy]ethyl]amine, ethylbis(2,4-di-tert-butyl-6-methylphenyl)phosphite, and tris(2,4-di-tert-butylphenyl)phosphate. Examples of commercially available antioxidants include Adeka Stab AO-20, Adeka Stab AO-30, Adeka Stab AO-40, Adeka Stab AO-50, Adeka Stab AO-50F, Adeka Stab AO-60, Adeka Stab AO-60G, Adeka Stab AO-80, Adeka Stab AO-330, Adeka Stab AO-412S, Adeka Stab 2112, Adeka Stab PEP-36, Adeka Stab HP-10 (all manufactured by ADEKA Co., Ltd.), JP-650 (manufactured by Johoku Kagaku Kogyo Co., Ltd.), etc. As the antioxidant, a compound described in paragraphs 0023 to 0048 of Japanese Patent Publication No. 6268967, a compound described in International Publication No. 2017/006600, a compound described in International Publication No. 2017/164024, or a compound described in Korean Patent Publication No. 10-2019-0059371 can be used. The content of the antioxidant is preferably 0.01 to 20 mass%, more preferably 0.3 to 15 mass%, based on the total solid content of the composition. The composition may contain only one type of antioxidant, or may contain two or more types. When two or more types are contained, it is preferable that their total amount falls within the above range.

<<Other ingredients>>

The composition of the present invention may contain, as necessary, a sensitizer, a curing accelerator, a filler, a thermosetting accelerator, a plasticizer, and other agents (e.g., conductive particles, an antifoaming agent, a flame retardant, a leveling agent, a peeling accelerator, a fragrance, a surface tension regulator, a chain transfer agent, etc.). By appropriately containing these components, the properties such as film properties can be adjusted. For these components, reference can be made to the descriptions in, for example, Japanese Patent Application Laid-Open No. 2012-003225, paragraph No. 0183 and thereafter (corresponding U.S. Patent Application Laid-Open No. 2013/0034812, paragraph No. 0237), Japanese Patent Application Laid-Open No. 2008-250074, paragraphs No. 0101 to 0104, 0107 to 0109, etc., the contents of which are incorporated herein by reference. In addition, the composition of the present invention may contain a potential antioxidant, if necessary. As a potential antioxidant, a compound in which a portion functioning as an antioxidant is protected by a protective group may be mentioned, and the compound may be heated at 100 to 250°C, or heated at 80 to 200°C in the presence of an acid/base catalyst, thereby removing the protective group and functioning as an antioxidant. As a potential antioxidant, the compounds described in International Publication No. 2014/021023, International Publication No. 2017/030005, and Japanese Patent Application Laid-Open No. 2017-008219 may be mentioned. Commercially available products of the potential antioxidant include Adeka Acles GPA-5001 (manufactured by ADEKA Co., Ltd.).

<Container>

There is no particular limitation as a container for containing the composition of the present invention, and a known container can be used. In addition, as a container, for the purpose of suppressing the mixing of impurities into the raw material or the composition, it is also preferable to use a multilayer bottle in which the inner wall of the container is composed of six types of six layers of resin, or a bottle having a seven-layer structure of six types of resin. Examples of such a container include a container described in Japanese Patent Application Laid-Open No. 2015-123351. In addition, it is also preferable to use the inner wall of the container made of glass or stainless steel, etc., for the purpose of preventing metal elution from the inner wall of the container, increasing the stability of the composition over time, suppressing deterioration of the components, etc.

<Method for preparing the composition>

The composition of the present invention can be prepared by mixing the above-described components. When preparing the composition, the composition may be prepared by simultaneously dissolving or dispersing all the components in a solvent, and, if necessary, two or more solutions or dispersions in which each component is appropriately mixed may be prepared in advance, and these may be mixed at the time of use (application) to prepare the composition.

When preparing the composition, a process for dispersing the pigment may be included. In the process for dispersing the pigment, mechanical forces used for dispersing the pigment may include compression, pressing, impact, shearing, cavitation, etc. Specific examples of these processes include a bead mill, a sand mill, a roll mill, a ball mill, a paint shaker, a microfluidizer, a high-speed impeller, a sand grinder, a flow jet mixer, high-pressure wet atomization, and ultrasonic dispersion. In addition, when pulverizing the pigment in a sand mill (bead mill), it is preferable to process under conditions that increase the pulverization efficiency, such as by using beads with a small diameter or increasing the filling rate of the beads. In addition, it is preferable to remove coarse particles by filtration, centrifugation, etc. after the pulverization. In addition, the process and disperser for dispersing the pigment can suitably use the process and disperser described in "Complete Collection of Dispersion Technology, published by Johokiko Co., Ltd., July 15, 2005" or "Practical Comprehensive Data Collection of Dispersion Technology and Industrial Application Centered on Suspension (Solid/Liquid Dispersion System), published by Keihei Kaihatsu Center Publishing Department, October 10, 1978", paragraph No. 0022 of Japanese Patent Laid-Open No. 2015-157893. In addition, in the process for dispersing the pigment, a pigment refinement treatment may be performed in a salt milling process. For materials, devices, processing conditions, etc. used in the salt milling process, reference can be made to the descriptions in, for example, Japanese Patent Laid-Open No. 2015-194521 and Japanese Patent Laid-Open No. 2012-046629. As materials for beads used for dispersion, zirconia, agate, quartz, titania, tungsten carbide, silicon nitride, alumina, stainless steel, and glass can be mentioned. In addition, an inorganic compound having a Mohs hardness of 2 or higher can be used for the beads. The composition may contain 1 to 10,000 ppm of the beads.

In preparing the composition, it is preferable to filter the composition with a filter for the purpose of removing foreign substances or reducing defects. As the filter, any filter that has been conventionally used for filtration purposes can be used without particular limitation. For example, filters using materials such as fluororesins such as polytetrafluoroethylene (PTFE), polyamide resins such as nylon (e.g., nylon-6, nylon-6,6), polyolefin resins such as polyethylene and polypropylene (PP) (including high-density, ultra-high molecular weight polyolefin resins) can be mentioned. Of these materials, polypropylene (including high-density polypropylene) and nylon are preferable.

The pore diameter of the filter is preferably 0.01 to 7.0 μm, more preferably 0.01 to 3.0 μm, and even more preferably 0.05 to 0.5 μm. When the pore diameter of the filter is in the above range, fine foreign substances can be removed more reliably. For the pore diameter value of the filter, you can refer to the nominal value of the filter manufacturer. As the filter, various filters provided by Nippon Pol Co., Ltd. (DFA4201NXEY, DFA4201NAEY, DFA4201J006P, etc.), Advantech Toyo Co., Ltd., Nippon Integris Co., Ltd. (formerly Nippon Microlis Co., Ltd.), and Kitsu Micro Filter Co., Ltd. can be used.

In addition, it is also desirable to use a fibrous filter as a filter. Examples of the fibrous filter include polypropylene fiber, nylon fiber, and glass fiber. Commercially available products include the SBP type series (SBP008, etc.), TPR type series (TPR002, TPR005, etc.), and SHPX type series (SHPX003, etc.) manufactured by Loki Techno.

When using a filter, different filters (for example, a first filter and a second filter, etc.) may be combined. At that time, filtration using each filter may be performed only once or twice or more. In addition, filters having different pore diameters may be combined within the above-described range. In addition, filtration using the first filter may be performed only on the dispersion, and filtration may be performed using the second filter after mixing other components.

<End>

Next, the film of the present invention will be described. The film of the present invention is obtained from the composition of the present invention described above. The film of the present invention can be preferably used as an optical filter. The use of the optical filter is not particularly limited, and examples thereof include an infrared cut filter, an infrared transmission filter, and the like. Examples of the infrared cut filter include an infrared cut filter on the light-receiving side of a solid-state image sensor (for example, an infrared cut filter for a wafer-level lens), an infrared cut filter on the back side (the side opposite to the light-receiving side) of a solid-state image sensor, an infrared cut filter for an environmental light sensor (for example, an illuminance sensor that detects the illuminance or color tone of the environment in which an information terminal device is placed and adjusts the color tone of a display, or a color correction sensor that adjusts the color tone). In particular, the film of the present invention can be preferably used as an infrared cut filter on the light-receiving side of a solid-state image sensor. Examples of the infrared transmission filter include a filter that blocks visible light and selectively transmits infrared rays having a specific wavelength or higher.

The film of the present invention may have a pattern, or may be a film without a pattern (flat film). In addition, the film of the present invention may be used by being laminated on a support, or the film of the present invention may be used by being peeled off from the support. As the support, a semiconductor substrate such as a silicon substrate, or a transparent substrate can be exemplified.

On the semiconductor substrate used as the support, a charge-coupled device (CCD), a complementary metal oxide semiconductor (CMOS), a transparent conductive film, etc. may be formed. In addition, a black matrix that isolates each pixel may be formed on the semiconductor substrate. In addition, an undercoating layer may be provided on the semiconductor substrate, if necessary, to improve adhesion with an upper layer, prevent diffusion of a substance, or flatten the substrate surface.

The transparent substrate used as the support is not particularly limited as long as it is composed of a material that can transmit at least visible light. For example, a substrate composed of a material such as glass or resin can be exemplified. Examples of the resin include polyester resins such as polyethylene terephthalate and polybutylene terephthalate, polyolefin resins such as polyethylene, polypropylene, and ethylene vinyl acetate copolymer, acrylic resins such as norbornene resin, polyacrylate, and polymethyl methacrylate, urethane resin, vinyl chloride resin, fluororesin, polycarbonate resin, polyvinyl butyral resin, and polyvinyl alcohol resin. Examples of the glass include soda lime glass, borosilicate glass, non-alkali glass, quartz glass, and glass containing copper. Examples of the glass containing copper include phosphate glass containing copper, fluoride glass containing copper, and the like. The glass containing copper can also be a commercially available product. Examples of commercially available glass containing copper include NF-50 (manufactured by AGC Techno Glass Co., Ltd.).

The thickness of the film of the present invention can be appropriately adjusted depending on the purpose. The thickness of the film can be 200 μm or less, 150 μm or less, 120 μm or less, 20 μm or less, 10 μm or less, or 5 μm or less. The lower limit of the thickness of the film is preferably 0.1 μm or more, and more preferably 0.2 μm or more.

When the film of the present invention is used as an infrared cutoff filter, it is preferable that the film of the present invention has a maximum absorption wavelength in a range of a wavelength of 650 to 1500 nm (preferably a wavelength of 660 to 1200 nm, more preferably a wavelength of 660 to 1000 nm). In addition, it is preferable that the average transmittance of light having a wavelength of 420 to 550 nm is 50% or more, more preferably 70% or more, more preferably 80% or more, and particularly preferably 85% or more. In addition, it is preferable that the transmittance in the entire range of a wavelength of 420 to 550 nm is 50% or more, more preferably 70% or more, and more preferably 80% or more. In addition, the film of the present invention preferably has a transmittance of 15% or less, more preferably 10% or less, and even more preferably 5% or less, at at least one point in a wavelength range of 650 to 1500 nm (preferably 660 to 1200 nm, more preferably 660 to 1000 nm). In addition, the film of the present invention preferably has an average absorbance in a wavelength range of 420 to 550 nm of less than 0.030, and even more preferably less than 0.025, when the absorbance at the maximum absorption wavelength is 1.

When the film of the present invention is used as an infrared transmission filter, it is preferable that the film of the present invention have, for example, any one of the following spectral characteristics (i1) to (i3).

(i1): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in a wavelength range of 400 to 850 nm and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in a wavelength range of 1000 to 1500 nm. A film having such spectral characteristics can block light in a wavelength range of 400 to 850 nm and transmit light exceeding a wavelength of 950 nm.

(i2): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in a wavelength range of 400 to 950 nm and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in a wavelength range of 1100 to 1500 nm. A film having such spectral characteristics can block light having a wavelength of 400 to 950 nm and transmit light having a wavelength exceeding 1050 nm.

(i3): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in a wavelength range of 400 to 1050 nm and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in a wavelength range of 1200 to 1500 nm. A film having such spectral characteristics can block light in a wavelength range of 400 to 1050 nm and transmit light exceeding a wavelength of 1150 nm.

The film of the present invention can also be used in combination with a color filter containing a chromatic colorant. The color filter can be produced using a coloring composition containing a chromatic colorant. When the film of the present invention is used as an infrared cut filter, and furthermore, when the film of the present invention and the color filter are used in combination, it is preferable that the color filter is arranged on the optical path of the film of the present invention. For example, it is preferable to laminate the film of the present invention and the color filter and use it as a laminate. In the laminate, the film of the present invention and the color filter may both be adjacent in the thickness direction, or they may not be adjacent. When the film of the present invention and the color filter are not adjacent in the thickness direction, the film of the present invention may be formed on a support different from the support on which the color filter is formed, and another member (for example, a microlens, a planarizing layer, etc.) constituting a solid-state imaging element may be interposed between the film of the present invention and the color filter.

The film of the present invention can be used in various devices such as solid-state imaging devices such as CCD (charge-coupled device) and CMOS (complementary metal oxide semiconductor), infrared sensors, and image display devices.

<Method of making a curtain>

The film of the present invention can be manufactured through a process of applying the composition of the present invention.

As the support, the above-described ones can be mentioned. As the method of applying the composition, a known method can be used. For example, a dropping method; a slit coat method; a spray method; a roll coat method; a spin coating method; a flexible coating method; a slit and spin method; a prewetting method (for example, a method described in Japanese Patent Laid-Open No. 2009-145395); various printing methods such as inkjet (for example, on-demand method, piezo method, thermal method), nozzle jet, etc., discharge printing, flexographic printing, screen printing, gravure printing, reverse offset printing, metal mask printing; a transfer method using a mold, etc.; a nano imprint method, etc. can be mentioned. There is no particular limitation on the application method in inkjet, and examples thereof include the method described in "Diffuse and Usable Inkjet - Infinite Possibilities Seen through Patents -, published in February 2005 by Sumibe Techno Research" (particularly pages 115 to 133), or the methods described in Japanese Patent Laid-Open No. 2003-262716, Japanese Patent Laid-Open No. 2003-185831, Japanese Patent Laid-Open No. 2003-261827, Japanese Patent Laid-Open No. 2012-126830, Japanese Patent Laid-Open No. 2006-169325, etc.

The composition layer formed by applying the composition may be dried (prebaked). When prebaking is performed, the prebaking temperature is preferably 150°C or lower, more preferably 120°C or lower, and even more preferably 110°C or lower. The lower limit may be, for example, 50°C or higher, and may also be 80°C or higher. The prebaking time is preferably 10 to 3000 seconds, more preferably 40 to 2500 seconds, and even more preferably 80 to 220 seconds. Drying can be performed using a hot plate, an oven, or the like.

In the method for manufacturing a film, a process for forming a pattern may be further included. As the pattern forming method, a pattern forming method using a photolithography method or a pattern forming method using a dry etching method may be mentioned, and a pattern forming method using a photolithography method is preferable. In addition, when the film of the present invention is used as a flat film, the process for forming a pattern does not need to be performed. Hereinafter, the process for forming a pattern will be described in detail.

(When forming a pattern using photolithography)

The method for forming a pattern using photolithography preferably includes a process (exposure process) for exposing a composition layer formed by applying the composition of the present invention into a pattern, and a process (development process) for forming a pattern by developing and removing the composition layer of an unexposed portion. If necessary, a process (post-bake process) for baking the developed pattern may be provided. Hereinafter, each process will be described.

In the exposure process, the composition layer is exposed in a pattern shape. For example, the composition layer can be exposed in a pattern shape by exposing it through a mask having a predetermined mask pattern using a stepper exposure machine or a scanner exposure machine. As a result, the exposed portion can be hardened.

Examples of radiation (light) that can be used during exposure include g-lines and i-lines. In addition, light with a wavelength of 300 nm or less (preferably light with a wavelength of 180 to 300 nm) can be used. Examples of light with a wavelength of 300 nm or less include KrF lines (wavelength 248 nm) and ArF lines (wavelength 193 nm), with KrF lines (wavelength 248 nm) being preferred. In addition, a long-wave light source of 300 nm or more can also be used.

In addition, during exposure, exposure may be performed by irradiating light continuously or by irradiating light in pulses (pulse exposure). In addition, pulse exposure is an exposure method in which exposure is performed by repeating light irradiation and rest in a short-term cycle (for example, millisecond level or less).

The exposure dose is preferably, for example, 0.03 to 2.5 J/cm ² , and more preferably 0.05 to 1.0 J/cm ² . The oxygen concentration during exposure can be appropriately selected, and in addition to performing exposure in the atmosphere, exposure may be performed in a low-oxygen atmosphere having an oxygen concentration of 19 vol% or less (for example, 15 vol%, 5 vol%, or substantially oxygen-free), or exposure may be performed in a high-oxygen atmosphere having an oxygen concentration exceeding 21 vol% (for example, 22 vol%, 30 vol%, or 50 vol%). In addition, the exposure illuminance can be appropriately set, and can be selected from a range of typically 1000 W/m ² to 100000 W/m ² (for example, 5000 W/m ² , 15000 W/m ² , or 35000 W/m ² ). The oxygen concentration and the exposure illuminance can be appropriately combined, and for example, the oxygen concentration can be 10 volume% and the illuminance can be 10000 W/m ² , the oxygen concentration can be 35 volume% and the illuminance can be 20000 W/m ² , etc.

Next, the unexposed portion of the composition layer in the composition layer after exposure is developed and removed to form a pattern. The unexposed portion of the composition layer can be developed and removed using a developer. As a result, the unexposed portion of the composition layer in the exposure process is dissolved in the developer, and only the photocured portion remains on the support. The temperature of the developer is preferably 20 to 30°C, for example. The developing time is preferably 20 to 180 seconds. In addition, in order to improve the residue removability, the process of shaking off the developer every 60 seconds and supplying a new developer may be repeated several more times.

The developer may include an organic solvent, an alkaline developer, etc., and an alkaline developer is preferably used. As the alkaline developer, an alkaline aqueous solution (alkaline developer) in which an alkaline agent is diluted with pure water is preferable. Examples of the alkaline agent include organic alkaline compounds such as ammonia, ethylamine, diethylamine, dimethylethanolamine, diglycolamine, diethanolamine, hydroxyamine, ethylenediamine, tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetrapropylammonium hydroxide, tetrabutylammonium hydroxide, ethyltrimethylammonium hydroxide, benzyltrimethylammonium hydroxide, dimethylbis(2-hydroxyethyl)ammonium hydroxide, choline, pyrrole, piperidine, 1,8-diazabicyclo[5.4.0]-7-undecene, and inorganic alkaline compounds such as sodium hydroxide, potassium hydroxide, sodium carbonate, sodium bicarbonate, sodium silicate, and sodium metasilicate. From the environmental and safety perspectives, compounds with a large molecular weight are preferable as alkaline agents. The concentration of the alkaline agent in the alkaline aqueous solution is preferably 0.001 to 10 mass%, more preferably 0.01 to 1 mass%. In addition, the developer may further contain a surfactant. As the surfactant, a nonionic surfactant is preferable. The developer may be prepared as a concentrate from the viewpoint of convenience of transportation or storage, and then diluted to the required concentration at the time of use. The dilution ratio is not particularly limited, but may be set in the range of 1.5 to 100 times, for example. In addition, it is also preferable to rinse with pure water after development. In addition, it is preferable to perform rinsing by supplying the rinse liquid to the composition layer after development while rotating the support on which the composition layer after development is formed. In addition, it is also preferable to perform the rinsing by moving the nozzle that discharges the rinse liquid from the center of the support to the peripheral edge of the support. At this time, when moving the nozzle from the center of the support to the peripheral edge, the movement speed of the nozzle may be gradually reduced while moving. By performing rinsing in this manner, the unevenness of the surface of the rinse can be suppressed. Also, the same effect can be obtained by gradually reducing the rotation speed of the support while moving the nozzle from the center of the support to the peripheral edge.

After development, it is preferable to perform additional exposure treatment or heat treatment (post-bake) after drying. Additional exposure treatment or post-bake is a curing treatment after development to complete curing. The heating temperature in the post-bake is preferably 100 to 240°C, and more preferably 200 to 240°C. The post-bake can be performed continuously or in batches using a heating means such as a hot plate, a convection oven (hot air circulation dryer), or a high-frequency heater so that the film after development meets the above conditions. When performing additional exposure treatment, it is preferable that the light used for exposure is light having a wavelength of 400 nm or less. In addition, the additional exposure treatment may be performed by the method described in Korean Patent Publication No. 10-2017-0122130.

(When forming a pattern using dry etching)

Pattern formation using a dry etching method can be performed by a method such as applying the composition on a support, curing the formed composition layer to form a cured layer, then forming a patterned photoresist layer on the cured layer, and then dry etching the cured layer using an etching gas using the patterned photoresist layer as a mask. In forming the photoresist layer, it is preferable to perform a prebake treatment. For pattern formation using a dry etching method, reference can be made to the descriptions in paragraphs No. 0010 to 0067 of Japanese Patent Application Laid-Open No. 2013-064993, the contents of which are incorporated herein by reference.

<Optical Filter>

The optical filter of the present invention has the film of the present invention described above. Examples of the optical filter include an infrared blocking filter and an infrared transmitting filter.

The optical filter of the present invention may further have, in addition to the film of the present invention described above, a layer containing copper, a dielectric multilayer film, an ultraviolet-absorbing layer, etc. As the ultraviolet-absorbing layer, examples thereof include absorption layers described in paragraphs Nos. 0040 to 0070 and 0119 to 0145 of International Publication No. 2015/099060. As the dielectric multilayer film, examples thereof include dielectric multilayer films described in paragraphs Nos. 0255 to 0259 of Japanese Patent Application Laid-Open No. 2014-041318. As the layer containing copper, a glass substrate composed of glass containing copper (copper-containing glass substrate) or a layer containing a copper complex (copper complex-containing layer) can be used. Examples of the copper-containing glass substrate include copper-containing phosphate glass, copper-containing phosphate glass, and the like. Commercially available products of copper-containing glass include NF-50 (manufactured by AGC Techno Glass Co., Ltd.), BG-60, BG-61 (all manufactured by Schott), and CD5000 (manufactured by HOYA Co., Ltd.).

<Solid-state imaging device>

The solid-state imaging device of the present invention includes the film of the present invention described above. The configuration of the solid-state imaging device is not particularly limited as long as it has the film of the present invention and functions as a solid-state imaging device. For example, the following configurations can be given.

This is a configuration in which, on a support, a plurality of photodiodes constituting a light-receiving area of a solid-state image sensor and a transfer electrode made of polysilicon or the like are provided, a light-shielding film made of tungsten or the like which opens only the light-receiving portion of the photodiode on the photodiode and the transfer electrode, a device protection film made of silicon nitride or the like which is formed on the light-shielding film so as to cover the entire surface of the light-shielding film and the light-receiving portion of the photodiode, and the film of the present invention is provided on the device protection film. In addition, there may be a configuration in which a light-concentrating means (for example, a micro lens, etc.; the same shall apply hereinafter) is provided on the device protection film and below the film of the present invention (on the side closer to the support), or a configuration in which a light-concentrating means is provided on the film of the present invention. In addition, the color filter may have a structure in which a film forming each pixel is embedded in a space partitioned, for example, in a lattice shape, by partitions. In this case, the partitions preferably have a lower refractive index than each pixel. Examples of imaging devices having such a structure include devices described in Japanese Patent Application Publication No. 2012-227478 and Japanese Patent Application Publication No. 2014-179577.

<Video display device>

The image display device of the present invention includes the film of the present invention. As the image display device, a liquid crystal display device and an organic electroluminescence (organic EL) display device can be mentioned. The definition and details of the image display device are described in, for example, "Electronic Display Device (written by Akio Sasaki, published by Kogyo Chosakai Co., Ltd., 1990)", "Display Device (written by Sumiaki Ibuki, published by Sangyo Dosho Co., Ltd., Heisei 1st year)", etc. In addition, the liquid crystal display device is described in, for example, "Next-generation liquid crystal display technology (edited by Tatsuo Uchida, published by Kogyo Chosakai Co., Ltd., 1994)". There is no particular limitation on the liquid crystal display device to which the present invention can be applied, and for example, it can be applied to various types of liquid crystal display devices described in the above-mentioned "Next-generation liquid crystal display technology". The image display device may have a white organic EL element. The white organic EL element is preferably a tandem structure. The tandem structure of the organic EL element is described in Japanese Patent Application Laid-Open No. 2003-045676, supervised by Akiyoshi Mikami, "The Front Line of Organic EL Technology Development - High Luminance, High Precision, Long Life, and Know-How Collection -", Gijutsu Joho Kyokai, pp. 326-328, 2008, etc. It is preferable that the spectrum of white light emitted by the organic EL element has strong maximum emission peaks in the blue region (430 to 485 nm), green region (530 to 580 nm), and yellow region (580 to 620 nm). In addition to these emission peaks, it is more preferable to have a maximum emission peak in the red region (650 to 700 nm).

<Infrared sensor>

The infrared sensor of the present invention includes the film of the present invention described above. The configuration of the infrared sensor is not particularly limited as long as it functions as an infrared sensor. Hereinafter, one embodiment of the infrared sensor of the present invention will be described using drawings.

In Fig. 1, reference numeral 110 denotes a solid-state imaging element. An infrared cut filter (111) and an infrared transmission filter (114) are arranged on an imaging area of the solid-state imaging element (110). In addition, a color filter (112) is arranged on the infrared cut filter (111). A micro lens (115) is arranged on the incident light (hν) side of the color filter (112) and the infrared transmission filter (114). A flattening layer (116) is formed to cover the micro lens (115).

The infrared cut filter (111) can be formed using the composition of the present invention. The color filter (112) is a color filter in which pixels that transmit and absorb light of a specific wavelength in the visible range are formed, and is not particularly limited thereto, and a conventionally known color filter for pixel formation can be used. For example, a color filter in which red (R), green (G), and blue (B) pixels are formed, etc. can be used. For example, reference can be made to the description in paragraphs No. 0214 to 0263 of Japanese Patent Application Laid-Open No. 2014-043556, the contents of which are incorporated herein by reference. The infrared transmission filter (114) has its characteristics selected according to the emission wavelength of the infrared LED used. The infrared transmission filter (114) can be formed using the composition of the present invention.

In the infrared sensor shown in Fig. 1, an infrared cut filter (another infrared cut filter) different from the infrared cut filter (111) may be additionally arranged on the flattening layer (116). Examples of the other infrared cut filter include those having a layer containing copper and/or a dielectric multilayer film. Details of these are as described above. In addition, a dual band pass filter may be used as the other infrared cut filter.

<Camera module>

The camera module of the present invention includes a solid-state imaging element and the film of the present invention described above. It is preferable that the camera module further have a lens and a circuit for processing an image obtained from the solid-state imaging element. The solid-state imaging element used in the camera module may be the solid-state imaging element according to the present disclosure or a known solid-state imaging element. In addition, known elements can be used as the lens used in the camera module and the circuit for processing an image obtained from the solid-state imaging element. As examples of the camera module, reference can be made to the camera modules described in Japanese Patent Laid-Open No. 2016-006476 and Japanese Patent Laid-Open No. 2014-197190, the contents of which are incorporated herein by reference.

Example

The present invention will be described more specifically with reference to the following examples. The materials, amounts, ratios, processing contents, processing procedures, etc. shown in the following examples may be appropriately changed without departing from the spirit of the present invention.

<Synthetic example>

(Synthesis Example 1) Synthesis of compound A-e-1

Compound A-e-1 was synthesized according to the following synthetic scheme.

[Chemical Formula 41]

Intermediate 1 was synthesized by the method described in U.S. Patent Application Publication No. 2014/0061505. Intermediate 2 was synthesized by the method described in International Publication No. 2011/107501. Intermediate 3 was synthesized by the method described in International Publication No. 2014/088063. Intermediate 4 was synthesized by the method described in Bioconjugate Chemistry(2017), 28(5), 1552-1559. Intermediate 5 was synthesized by the method described in Organic and Biomolecular Chemistry, 2011, vol. 9, #23, p8122-8129.

Intermediate 5 (4.4 g, 7.0 mmol) and squaric acid (0.36 g, 3.1 mmol) were heated and refluxed for 12 hours in n-butanol/toluene (26 mL/60 mL) while undergoing azeotropic dehydration. After cooling the reaction solution, the solvent was distilled off under reduced pressure, and the residue was purified by silica gel column chromatography (developing solvent: chloroform). After chloroform was distilled off under reduced pressure, the solid was dispersed ultrasonically in methanol, and the solid was suction filtered to obtain the target compound (compound A-e-1) (green crystals, 1.3 g, yield 31%).

Identification data of compound A-e-1: MALDI TOF-MASS (Time-of-Flight Mass Spectrometry) Calc.for [M+H]+: 1332.5 found: 1332.5

<Manufacture of the composition>

The components listed in the table below were mixed in the mass parts listed in the table below, stirred, and filtered through a nylon filter (manufactured by Nippon Pall Co., Ltd.) having a pore diameter of 0.45 μm to prepare a composition.

[Table 1]

[Table 2]

[Table 3]

[Table 4]

[Table 5]

[Table 6]

[Table 7]

[Table 8]

[Table 9]

[Table 10]

[Table 11]

[Table 12]

[Table 13]

Details of the materials listed in the above table are as follows.

(infrared absorber)

A-a-1~A-a-3, A-b-1~A-b-15, A-c-1~A-c-4, A-d-1~A-d-3, A-e-1~A-e-16, A-f-1~A-f-4, A-g- 1~A-g-4, A-h-1, A-h-2, A-i-1~A-i-6, A-k-1~A-k-6: Compounds A-a-1~A-a-3, A-b- shown as specific examples of the above-mentioned specific compounds. 1~A-b-15, A-c-1~A-c-4, A-d-1~A-d-3, A-e-1~A-e-16, A-f-1~A-f-4, A-g-1~A-g-4, A-h-1, A-h-2, A-i-1~A-i-6, A-k-1~A-k-6

X-1: Compound having the following structure (comparative compound)

[Chemical formula 42]

B-a-1~B-a-3: Compounds with the following structure (phthalocyanine compounds)

B-b-1~B-b-8: Compounds with the following structure (pentamethane compounds)

B-c-1~B-c-3: Compounds with the following structure (squarylium compounds)

B-d-1~B-d-3: Compounds with the following structure (heptametaine compounds)

B-d-4: Compound of the following structure (cyanine compound)

B-e-1: Compound of the following structure (imineum compound)

[Chemical Formula 43]

[Chemical Formula 44]

[Chemical Formula 45]

(profit)

C-1: Resin having the following structure (weight average molecular weight 137,000, number average molecular weight 32,000, glass transition temperature 165°C) synthesized by the method described in Resin Synthesis Example 1 of Japanese Patent Publication No. 2021-134350

C-2: Resin having the following structure (weight average molecular weight 188,000, number average molecular weight 75,000, glass transition temperature 285°C) synthesized by the method described in Resin Synthesis Example 2 of Japanese Patent Publication No. 2021-134350

C-3: Resin having the following structure synthesized by the method described in Resin Synthesis Example 3 of Japanese Patent Publication No. 2021-134350 (the numbers appended to the main chain indicate the molar ratio of repeating units. Glass transition temperature 310°C. Logarithmic viscosity 0.87)

C-4: Acrylic Reviewer (Nippon Shokubai Co., Ltd., Acrylic Resin)

C-5: Resin having the following structure (the numbers appended to the main chain represent the mass ratio of repeating units. Weight average molecular weight 26,100, number average molecular weight 8,600, epoxy equivalent 355 g/eq, acid value 163 mgKOH/g, glass transition temperature 133°C)

C-6: Resin having the following structure (the numbers appended to the main chain represent the mass ratio of repeating units. Weight average molecular weight 22900, number average molecular weight 8800, epoxy equivalent 316 g/eq, acid value 130 mgKOH/g, glass transition temperature 124°C)

C-7: Resin having the following structure (the numbers appended to the main chain represent the mass ratio of repeating units. Weight average molecular weight 18300, number average molecular weight 9100, epoxy equivalent 284 g/eq, acid value 98 mgKOH/g, glass transition temperature 134°C)

C-8: Resin having the following structure (the numbers appended to the main chain represent the mass ratio of repeating units. Weight average molecular weight 20,000, number average molecular weight 8,300, epoxy equivalent 284 g/eq, acid value 130 mgKOH/g, glass transition temperature 136°C)

C-9: Resin having the following structure (the numbers appended to the main chain represent the mass ratio of repeating units. Weight average molecular weight 21100, number average molecular weight 8500, epoxy equivalent 355 g/eq, acid value 157 mgKOH/g, glass transition temperature 157°C)

C-10: Resin having the following structure (the numbers appended to the main chain indicate the mass ratio of repeating units. Weight average molecular weight 9500, number average molecular weight 5800)

C-11: Resin having the following structure (the numbers appended to the main chain indicate the mass ratio of repeating units. Weight average molecular weight 23700, number average molecular weight 10300, epoxy equivalent 284 g/eq, glass transition temperature 83°C)

C-12: EPICLON N-695 (DIC Co., Ltd., novolac type epoxy resin)

C-13: Resin having the following structure (the numbers appended to the main chain indicate the molar ratio of repeating units. Weight average molecular weight 30,000, number average molecular weight 15,100, acid value 113 mgKOH/g)

C-14: Resin having the following structure (the numbers appended to the main chain indicate the weight ratio of repeating units. Weight average molecular weight 9700, number average molecular weight 5700, acid value 130 mgKOH/g)

C-15: Resin having the following structure (the numbers appended to the main chain indicate the weight ratio of repeating units. Weight average molecular weight 15,100, number average molecular weight 7,000, acid value 136 mgKOH/g)

C-16: Resin having the following structure (the numbers appended to the main chain indicate the weight ratio of repeating units. Weight average molecular weight 17000, number average molecular weight 7700, acid value 32 mgKOH/g)

C-17: Resin having the following structure (the numbers appended to the main chain indicate the weight ratio of repeating units. Weight average molecular weight 16,000, number average molecular weight 5,800, acid value 101 mgKOH/g)

C-18: Resin having the following structure (the numbers appended to the main chain indicate the molar ratio of repeating units. Weight average molecular weight 10000, number average molecular weight 3900, acid value 69 mgKOH/g)

[Chemical Formula 46]

[Chemical Formula 47]

(UV absorber)

D-1: Compound having the following structure (maximum absorption wavelength 394 nm in dichloromethane)

D-2: Uvinul3050 (manufactured by BASF, compound with the following structure)

D-3: Tinuvin477 (manufactured by BASF, hydroxyphenyltriazine UV absorber)

D-4: Tinuvin326 (manufactured by BASF, compound with the following structure)

D-5: Compound (2)-22 (compound with the following structure) described in International Publication No. 2021/131355

D-6: Compound (1)-46 (compound having the following structure) described in International Publication No. 2021/131355

D-7: Compound A-1 (compound having the following structure) described in International Publication No. 2021/132247

D-8: NeoHeliopan 357 (manufactured by Symrise, a compound with the following structure)

D-9: Compound having the following structure

[Chemical Formula 48]

(antioxidant)

E-1: Adeka Staub AO-60 (manufactured by ADEKA Co., Ltd., compound having the following structure)

E-2: Adeka Staub AO-80 (manufactured by ADEKA Co., Ltd., compound with the following structure)

E-3: Compound having the following structure

E-4: Adeka Staub 2112 (manufactured by ADEKA Co., Ltd., compound of the following structure)

E-5: Adeka Staub PEP-36 (manufactured by ADEKA Co., Ltd., compound with the following structure)

E-6: Adeka Staub HP-10 (made by ADEKA Co., Ltd., compound with the following structure)

E-7: Adeka Staub AO-412S (manufactured by ADEKA Co., Ltd., compound with the following structure)

[Chemical Formula 49]

(solvent)

F-1: Dichloromethane

F-2: N,N-Dimethylacetamide

F-3: Cyclohexane

F-4: Xylene

F-5: Cyclopentanone

F-6: Cyclohexanone

F-7: Propylene Glycol Monomethyl Ether Acetate (PGMEA)

F-8: Propylene Glycol Monomethyl Ether (PGME)

(Surfactant)

G-1: FTX-218D (Neos Corporation, fluorinated surfactant)

G-2: Megapak F-554 (DIC Co., Ltd., fluorine-based surfactant)

G-3: KF-6001 (Shin-Etsu Chemical Co., Ltd., silicone surfactant)

G-4: A compound having the following structure (weight average molecular weight 14000, the numerical value of % indicating the proportion of repeating units is mol%)

[Chemical formula 50]

(hardener)

H-1: Trimellitic acid

H-2: 2-Ethyl-4-methylimidazole

H-3: Methyltetrahydrophthalic anhydride

(polymeric compound)

I-1: KAYARAD DPHA (Nippon Kayaku Co., Ltd., mixture of dipentaerythritol hexaacrylate and dipentaerythritol pentaacrylate)

I-2: KAYARAD RP-1040 (made by Nippon Kayaku Co., Ltd., ethylene oxide modified pentaerythritol tetraacrylate)

I-3: Aronix M-510 (manufactured by Toagosei Co., Ltd., polybasic acid modified acrylic oligomer)

(photopolymerization initiator)

J-1: Irgacure OXE01 (BASF, oxime ester compound)

J-2: Compound No. 1 (compound having the following structure) described in International Publication No. 2017/169819

J-3: Compound No. 10 (compound having the following structure) described in International Publication No. 2017/169819

J-4: Compound No. 5 described in Japanese Patent Publication No. 2019-168654 (compound having the following structure)

J-5: Compound No. 73 described in Japanese Patent Publication No. 2019-168654 (compound having the following structure)

[Chemical Formula 51]

(Polymerization inhibitor)

K-1: p-methoxyphenol

(adhesive)

L-1, L-2: Compounds having the following structures

[Chemical formula 52]

<Making of the curtain>

(Manufacturing Example 1) Method for manufacturing a membrane using the composition of Examples 1 to 102 and Comparative Example 1

Each composition was cast on a glass substrate, dried at 20°C for 8 hours, and then peeled off from the glass substrate. The peeled film was further dried at 100°C for 8 hours under reduced pressure to obtain a film having a thickness of 0.1 mm, length of 60 mm, and width of 60 mm.

(Manufacturing Example 2) Method for manufacturing a membrane using the composition of Examples 201 to 313 and Comparative Example 2

Each composition was applied onto a glass substrate by spin coating, then heated using a hot plate at 100°C for 2 minutes, and then cured by heating at 200°C for 8 minutes to obtain a film with a thickness of 10 μm.

(Manufacturing Example 3) Method for manufacturing a membrane using the composition of Examples 401 to 517 and Comparative Example 3

Each composition was applied onto a glass substrate by spin coating, and then heated at 100°C for 2 minutes using a hot plate to obtain a composition layer. The obtained composition layer was exposed over the entire surface at an exposure dose of 500 mJ/ ^cm2 using an i-line stepper exposure device FPA-3000i5+ (manufactured by Canon Co., Ltd.). Subsequently, the exposed composition layer was cured by heating at 200°C for 5 minutes using a hot plate to obtain a film having a thickness of 1.0 μm.

<Performance Evaluation>

(Evaluation of infrared shielding)

The average transmittance of the obtained film in the wavelength range of 700 to 720 nm was measured using a spectrophotometer U-4100 (Hitachi High-Tech Co., Ltd.), and the infrared shielding property was evaluated according to the following criteria.

A: Average transmittance ≤2% in the wavelength range of 700 nm to 720 nm

B: 2%<Average transmittance in the wavelength range of 700 nm to 720 nm≤4%

C: 4%<average transmittance in the wavelength range of 700 nm to 720 nm≤7%

D: 7%<average transmittance in the wavelength range of 700 nm to 720 nm≤10%

E: 10%<Average transmittance in the wavelength range of 700 nm to 720 nm

(Evaluation of visible light transmittance)

The average transmittance of the obtained film in the wavelength range of 420 to 550 nm was measured using a spectrophotometer U-4100 (Hitachi High-Tech Co., Ltd.), and the visible light transmittance was evaluated according to the following criteria.

A: Average transmittance ≥ 95% in the wavelength range of 420 nm to 550 nm

B: 92%≤Average transmittance in the range of wavelength 420 nm to 550 nm<95%

C: 89%≤Average transmittance in the range of wavelength 420 nm to 550 nm<92%

D: 86%≤Average transmittance in the range of wavelength 420 nm to 550 nm<89%

E: Average transmittance <86% in the wavelength range of 420 nm to 550 nm

(Evaluation of light resistance)

For the obtained film, a light fastness test was conducted by irradiating 50,000 lux light from a Xe lamp through an ultraviolet ray blocking filter for 20 hours, and the ΔEab value of the color difference before and after the light irradiation was measured using a chromaticity meter MCPD-1000 (manufactured by Otsuka Denshi Co., Ltd.). A smaller ΔEab value indicates better light fastness. In addition, the ΔEab value is a value obtained from the following color difference formula by the CIE1976 (L*, a*, b*) space colorimetric system (Color Science Handbook (Showa 60), New Edition, edited by the Japan Society of Color Science, p. 266).

ΔEab={(ΔL*) ² +(Δa*) ² +(Δb*) ² } ^1/2

A: ΔEab value<2.5

B: 2.5≤ΔEab value<5

C: 5≤ΔEab value<10

D: 10≤ΔEab value<15

E: 15≤ΔEab value

<Evaluation of preservation stability>

Each composition was stored in an incubator at 45°C for 3 days, and then a membrane was manufactured according to the above-mentioned membrane manufacturing method. The obtained membrane was observed using a scanning electron microscope (magnification = 10,000 times), and the number of foreign substances present in a range of 10 μm × 15 μm was measured, and the preservation stability was evaluated according to the following criteria.

A: There is no foreign matter within the range of 10μm×15μm.

B: Foreign matter present in the range of 10μm×15μm exceeds 0 and is 50 or less

C: Foreign matter existing within a range of 10μm×15μm exceeds 50 and does not exceed 100

D: Foreign matter existing within a range of 10μm×15μm exceeds 100 and does not exceed 200

E: The number of foreign substances existing within a range of 10μm×15μm exceeds 200.

[Table 14]

[Table 15]

[Table 16]

[Table 17]

[Table 18]

[Table 19]

[Table 20]

[Table 21]

[Table 22]

As shown in the table above, the examples were superior to the comparative examples in terms of visible light transmittance, infrared shielding, light resistance, and preservation stability.

110: Solid State Image Sensor
111: Infrared Blocking Filter
112: Color Filter
114: Infrared Transmitting Filter
115: Micro lens
116: Flattening layer

Claims (15)

Containing an infrared absorber, a curable compound, and a solvent,
The above infrared absorbent is a composition comprising a compound represented by formula (1);
[Chemical Formula 1]

In formula (1), A and B each independently represent an aromatic hydrocarbon ring or an aromatic heterocycle,
R ^aa1 and R ^aa2 each independently represent a halogen atom, a sulfo group, a hydroxy group, a cyano group, a nitro group, a carboxyl group, a phosphoric acid group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an acyl group, an alkoxycarbonyl group, -NR ^a11 R ^a12 , -SR ^a13 , -SO ₂ R ^a14 , or -OSO ₂ R ^a15 ,
R ^a11 and R ^a12 each independently represent a hydrogen atom, an alkyl group, an aryl group, or a heterocyclic group,
R ^a13 ~R ^a15 each independently represent an alkyl group, an aryl group, or a heterocyclic group,
R ^b1 to R ^b4 each independently represent a hydrogen atom, a halogen atom, a sulfo group, a hydroxy group, a cyano group, a nitro group, a carboxyl group, a phosphoric acid group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an acyl group, an alkoxycarbonyl group, -NR ^b11 R ^b12 , -NHCOR ^b13 , -NHSO ₂ R ^b14 , -NHCSNHR ^b15 , -SR ^b16 , -SO ₂ R ^b17 , -OSO ₂ R ^b18 , -NHCSR ^b19 , -NHCONHR ^b20 or -NHCOOR ^b21 ,
R ^b11 and R ^b12 each independently represent a hydrogen atom, an alkyl group, an aryl group, or a heterocyclic group,
R ^b13 to R ^b21 each independently represent an alkyl group, an aryl group, or a heterocyclic group,
Y ¹ to Y ⁴ each independently represent a hydrogen atom, an alkyl group, an aryl group, a heterocyclic group, or a group represented by the formula (Y-1).
m1 represents an integer from 0 to mA, and mA represents the maximum integer that R ^aa1 can be replaced with A.
m2 represents an integer from 0 to mB, and mB represents the maximum integer that R ^aa2 can be replaced with B.
If m1 is 2 or more, two R ^aa1s among m1 R ^aa1s may combine to form a ring,
If m2 is 2 or more, two R ^aa2s among m2 R ^aa2s can combine to form a ring.
R ^aa1 and Y ¹ may be combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom,
R ^aa1 and Y ² may be combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom,
R ^aa2 and Y ³ may be combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom,
R ^aa2 and Y ⁴ may be combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom,
Y ¹ and Y ² may be combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom,
Y ³ and Y ⁴ may be combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom;
However, at least one of Y ¹ to Y ⁴ is a group represented by formula (Y-1), and further, at least one selected from R ^aa1 and Y ¹ , R ^aa1 and Y ² , R ^aa2 and Y ³ , and R ^aa2 and Y ⁴ is combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom;
[Chemical formula 2]

In formula (Y-1), the dashed line represents the bond loss,
Ry ¹ to Ry ⁴ each independently represent a hydrogen atom, an alkyl group, or an aryl group,
X ¹ represents a single bond, an alkylene group, an arylene group, -O-, -S-, -NRx-, -CO-, -CS-, -SO-, or -SO ₂ -, or a group combining two or more selected from an alkylene group, an arylene group, -O-, -S-, -NRx-, -CO-, -CS-, -SO-, and -SO ₂ -, and Rx represents a hydrogen atom, an alkyl group, or an aryl group,
Z ¹ represents an alicyclic hydrocarbon group, an aromatic hydrocarbon group, a heterocyclic group, or a group represented by any one of the formulae (Z-1) to (Z-6);
However, when Z ¹ is a group represented by formula (Z-1) or a group represented by formula (Z-4), the part connected to Z ¹ in X ¹ is an alkylene group or an arylene group;
[Chemical Formula 3]

In formulas (Z-1) to (Z-6), the dashed lines represent bond losses;
In formula (Z-1), Rz ¹¹ represents an alkyl group or an aryl group;
In formula (Z-2), Rz ¹² represents a hydrogen atom, -COR ¹⁰⁰ , or -COOR ¹⁰⁰ , R ¹⁰⁰ represents a hydrogen atom, an alkyl group, or an aryl group, Rz ^12a represents an alkyl group, and mz represents an integer from 0 to 4;
In formula (Z-3), Rz ¹³ to Rz ¹⁶ each independently represent an alkyl group, and Rz ¹⁷ represents a hydrogen atom, an alkyl group, or an oxygen radical;
In formula (Z-4), Rz ¹⁸ and Rz ¹⁹ each independently represent an alkyl group or an aryl group;
In formula (Z-6), W ¹ represents a single bond, an alkylene group, an arylene group, or -CO-, Rz ²⁰ represents a hydrogen atom, an alkyl group, an aryl group, or -COR ¹⁰¹ , and R ¹⁰¹ represents an alkyl group or an aryl group. In claim 1,
A composition wherein the compound represented by the above formula (1) is a compound represented by the formula (2);
[Chemical Formula 4]

In formula (2), R ^a1 to R ^a4 each independently represent a hydrogen atom, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, a phosphoric acid group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an acyl group, an alkoxycarbonyl group, -NR ^a11 R ^a12 , -SR ^a13 , -SO ₂ R ^a14 , or -OSO ₂ R ^a15 ,
R ^a11 and R ^a12 each independently represent a hydrogen atom, an alkyl group, an aryl group, or a heterocyclic group,
R ^a13 ~R ^a15 each independently represent an alkyl group, an aryl group, or a heterocyclic group,
R ^b1 to R ^b4 each independently represent a hydrogen atom, a halogen atom, a sulfo group, a hydroxy group, a cyano group, a nitro group, a carboxyl group, a phosphoric acid group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an acyl group, an alkoxycarbonyl group, -NR ^b11 R ^b12 , -NHCOR ^b13 , -NHSO ₂ R ^b14 , -NHCSNHR ^b15 , -SR ^b16 , -SO ₂ R ^b17 , -OSO ₂ R ^b18 , -NHCSR ^b19 , -NHCONHR ^b20 or -NHCOOR ^b21 ,
R ^b11 and R ^b12 each independently represent a hydrogen atom, an alkyl group, an aryl group, or a heterocyclic group,
R ^b13 to R ^b21 each independently represent an alkyl group, an aryl group, or a heterocyclic group,
Y ¹ to Y ⁴ each independently represent a hydrogen atom, an alkyl group, an aryl group, a heterocyclic group or a group represented by the above formula (Y-1),
R ^a1 and Y ¹ may be combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom,
R ^a2 and Y ² may be combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom,
R ^a3 and Y ³ may be combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom,
R ^a4 and Y ⁴ may be combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom,
Y ¹ and Y ² may be combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom,
Y ³ and Y ⁴ may be combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom;
However, at least one of Y ¹ to Y ⁴ is a group represented by the above formula (Y-1), and further, at least one selected from R ^a1 and Y ¹ , R ^a2 and Y ² , R ^a3 and Y ³ , and R ^a4 and Y ⁴ is combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom. In claim 1,
A composition wherein the compound represented by the above formula (1) is a compound represented by the formula (3);
[Chemical Formula 5]

In formula (3), R ¹³ to R ¹⁷ and R ²³ to R ²⁷ each independently represent a hydrogen atom, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, a phosphoric acid group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an acyl group, an alkoxycarbonyl group, -NR ^a11 R ^a12 , -SR ^a13 , -SO ₂ R ^a14 , or -OSO ₂ R ^a15 .
R ^a11 and R ^a12 each independently represent a hydrogen atom, an alkyl group, an aryl group, or a heterocyclic group,
R ^a13 ~R ^a15 each independently represent an alkyl group, an aryl group, or a heterocyclic group,
R ¹¹ , R ¹² , R ²¹ and R ²² each independently represent a hydrogen atom, a halogen atom, a sulfo group, a hydroxy group, a cyano group, a nitro group, a carboxyl group, a phosphoric acid group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an acyl group, an alkoxycarbonyl group, -NR ^b11 R ^b12 , -NHCOR ^b13 , -NHSO ₂ R ^b14 , -NHCSNHR ^b15 , -SR ^b16 , -SO ₂ R ^b17 , -OSO ₂ R ^b18 , -NHCSR ^b19 , -NHCONHR ^b20 or -NHCOOR ^b21 ,
R ^b11 and R ^b12 each independently represent a hydrogen atom, an alkyl group, an aryl group, or a heterocyclic group,
R ^b13 to R ^b21 each independently represent an alkyl group, an aryl group, or a heterocyclic group,
Y ¹¹ and Y ²¹ each independently represent a hydrogen atom, an alkyl group, an aryl group, a heterocyclic group or a group represented by the above formula (Y-1), and at least one of Y ¹¹ and Y ²¹ is a group represented by the above formula (Y-1). In claim 3,
A composition wherein at least one of R ¹¹ and R ¹² and at least one of R ²¹ and R ²² of the above formula (3) are each independently -NHCOR ^b13 , and R ^b13 is an alkyl group, an aryl group, or a heterocyclic group. In claim 3,
A composition wherein at least one of R ¹¹ and R ¹² and at least one of R ²¹ and R ²² of the above formula (3) are each independently -NHSO ₂ R ^b14 , and R ^b14 is an alkyl group, an aryl group, or a heterocyclic group. In any one of claims 1 to 5,
A composition wherein the curable compound comprises a resin. In any one of claims 1 to 5,
A composition further comprising an infrared absorbent other than the compound represented by the above formula (1). In any one of claims 1 to 5,
A composition further comprising at least one selected from ultraviolet absorbers and antioxidants. A film obtained by using the composition according to any one of claims 1 to 5. An optical filter comprising a film as described in claim 9. A solid-state imaging device comprising the film described in claim 9. An image display device comprising a film as described in claim 9. An infrared sensor comprising a membrane as described in claim 9. A camera module comprising a membrane as described in claim 9. A compound represented by formula (1);
[Chemical formula 6]

In formula (1), A and B each independently represent an aromatic hydrocarbon ring or an aromatic heterocycle,
R ^aa1 and R ^aa2 each independently represent a halogen atom, a sulfo group, a hydroxy group, a cyano group, a nitro group, a carboxyl group, a phosphoric acid group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an acyl group, an alkoxycarbonyl group, -NR ^a11 R ^a12 , -SR ^a13 , -SO ₂ R ^a14 , or -OSO ₂ R ^a15 ,
R ^a11 and R ^a12 each independently represent a hydrogen atom, an alkyl group, an aryl group, or a heterocyclic group,
R ^a13 ~R ^a15 each independently represent an alkyl group, an aryl group, or a heterocyclic group,
R ^b1 to R ^b4 each independently represent a hydrogen atom, a halogen atom, a sulfo group, a hydroxy group, a cyano group, a nitro group, a carboxyl group, a phosphoric acid group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an acyl group, an alkoxycarbonyl group, -NR ^b11 R ^b12 , -NHCOR ^b13 , -NHSO ₂ R ^b14 , -NHCSNHR ^b15 , -SR ^b16 , -SO ₂ R ^b17 , -OSO ₂ R ^b18 , -NHCSR ^b19 , -NHCONHR ^b20 or -NHCOOR ^b21 ,
R ^b11 and R ^b12 each independently represent a hydrogen atom, an alkyl group, an aryl group, or a heterocyclic group,
R ^b13 to R ^b21 each independently represent an alkyl group, an aryl group, or a heterocyclic group,
Y ¹ to Y ⁴ each independently represent a hydrogen atom, an alkyl group, an aryl group, a heterocyclic group, or a group represented by the formula (Y-1).
m1 represents an integer from 0 to mA, and mA represents the maximum integer that R ^aa1 can be replaced with A.
m2 represents an integer from 0 to mB, and mB represents the maximum integer that R ^aa2 can be replaced with B.
If m1 is 2 or more, two R ^aa1s among m1 R ^aa1s may combine to form a ring,
If m2 is 2 or more, two R ^aa2s among m2 R ^aa2s can combine to form a ring.
R ^aa1 and Y ¹ may be combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom,
R ^aa1 and Y ² may be combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom,
R ^aa2 and Y ³ may be combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom,
R ^aa2 and Y ⁴ may be combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom,
Y ¹ and Y ² may be combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom,
Y ³ and Y ⁴ may be combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom;
However, at least one of Y ¹ to Y ⁴ is a group represented by formula (Y-1), and further, at least one selected from R ^aa1 and Y ¹ , R ^aa1 and Y ² , R ^aa2 and Y ³ , and R ^aa2 and Y ⁴ is combined to form a 5-membered or 6-membered heterocycle containing at least one nitrogen atom;
[Chemical formula 7]

In formula (Y-1), the dashed line represents the bond loss,
Ry ¹ to Ry ⁴ each independently represent a hydrogen atom, an alkyl group, or an aryl group,
X ¹ represents a single bond, an alkylene group, an arylene group, -O-, -S-, -NRx-, -CO-, -CS-, -SO-, or -SO ₂ -, or a group combining two or more selected from an alkylene group, an arylene group, -O-, -S-, -NRx-, -CO-, -CS-, -SO-, and -SO ₂ -, and Rx represents a hydrogen atom, an alkyl group, or an aryl group,
Z ¹ represents an alicyclic hydrocarbon group, an aromatic hydrocarbon group, a heterocyclic group, or a group represented by any one of the formulae (Z-1) to (Z-6);
However, when Z ¹ is a group represented by formula (Z-1) or a group represented by formula (Z-4), the part connected to Z ¹ in X ¹ is an alkylene group or an arylene group;
[Chemical formula 8]

In formulas (Z-1) to (Z-6), the dashed lines represent bond losses;
In formula (Z-1), Rz ¹¹ represents an alkyl group or an aryl group;
In formula (Z-2), Rz ¹² represents a hydrogen atom, -COR ¹⁰⁰ , or -COOR ¹⁰⁰ , R ¹⁰⁰ represents a hydrogen atom, an alkyl group, or an aryl group, Rz ^12a represents an alkyl group, and mz represents an integer from 0 to 4;
In formula (Z-3), Rz ¹³ to Rz ¹⁶ each independently represent an alkyl group, and Rz ¹⁷ represents a hydrogen atom, an alkyl group, or an oxygen radical;
In formula (Z-4), Rz ¹⁸ and Rz ¹⁹ each independently represent an alkyl group or an aryl group;
In formula (Z-6), W ¹ represents a single bond, an alkylene group, an arylene group, or -CO-, Rz ²⁰ represents a hydrogen atom, an alkyl group, an aryl group, or -COR ¹⁰¹ , and R ¹⁰¹ represents an alkyl group or an aryl group.