KR20230156686A - Epoxy resin mixture and method for producing the same, epoxy resin composition and cured product thereof - Google Patents
Epoxy resin mixture and method for producing the same, epoxy resin composition and cured product thereof Download PDFInfo
- Publication number
- KR20230156686A KR20230156686A KR1020237019238A KR20237019238A KR20230156686A KR 20230156686 A KR20230156686 A KR 20230156686A KR 1020237019238 A KR1020237019238 A KR 1020237019238A KR 20237019238 A KR20237019238 A KR 20237019238A KR 20230156686 A KR20230156686 A KR 20230156686A
- Authority
- KR
- South Korea
- Prior art keywords
- epoxy resin
- formula
- epoxy
- weight
- phenol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000003822 epoxy resin Substances 0.000 title claims abstract description 87
- 229920000647 polyepoxide Polymers 0.000 title claims abstract description 87
- 239000000203 mixture Substances 0.000 title claims abstract description 56
- 238000004519 manufacturing process Methods 0.000 title claims description 4
- 239000004593 Epoxy Substances 0.000 claims abstract description 30
- 150000001875 compounds Chemical class 0.000 claims abstract description 26
- 238000000034 method Methods 0.000 claims description 32
- -1 phenol compound Chemical class 0.000 claims description 21
- 239000005011 phenolic resin Substances 0.000 claims description 17
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 claims description 13
- 239000003795 chemical substances by application Substances 0.000 claims description 13
- 238000004817 gas chromatography Methods 0.000 claims description 11
- 238000004458 analytical method Methods 0.000 claims description 7
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Natural products OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 42
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 39
- 238000006243 chemical reaction Methods 0.000 description 36
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 33
- 229920005989 resin Polymers 0.000 description 32
- 239000011347 resin Substances 0.000 description 32
- 238000001723 curing Methods 0.000 description 23
- 239000000463 material Substances 0.000 description 21
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 15
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 15
- 238000010438 heat treatment Methods 0.000 description 15
- 150000002989 phenols Chemical class 0.000 description 15
- 239000000047 product Substances 0.000 description 15
- 239000000243 solution Substances 0.000 description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 14
- 239000000758 substrate Substances 0.000 description 13
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 12
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 12
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 12
- 238000005227 gel permeation chromatography Methods 0.000 description 12
- 239000004065 semiconductor Substances 0.000 description 12
- 238000005406 washing Methods 0.000 description 12
- 239000002904 solvent Substances 0.000 description 11
- 229920000049 Carbon (fiber) Polymers 0.000 description 10
- 239000004917 carbon fiber Substances 0.000 description 10
- INZDTEICWPZYJM-UHFFFAOYSA-N 1-(chloromethyl)-4-[4-(chloromethyl)phenyl]benzene Chemical group C1=CC(CCl)=CC=C1C1=CC=C(CCl)C=C1 INZDTEICWPZYJM-UHFFFAOYSA-N 0.000 description 9
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 9
- 229920002430 Fibre-reinforced plastic Polymers 0.000 description 9
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 9
- 238000000465 moulding Methods 0.000 description 9
- 239000000835 fiber Substances 0.000 description 8
- 239000002585 base Substances 0.000 description 7
- 239000011151 fibre-reinforced plastic Substances 0.000 description 7
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 6
- 239000004918 carbon fiber reinforced polymer Substances 0.000 description 6
- 230000007423 decrease Effects 0.000 description 6
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 6
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 6
- 238000012360 testing method Methods 0.000 description 6
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 5
- 229920003986 novolac Polymers 0.000 description 5
- 150000003839 salts Chemical class 0.000 description 5
- RGHHSNMVTDWUBI-UHFFFAOYSA-N 4-hydroxybenzaldehyde Chemical compound OC1=CC=C(C=O)C=C1 RGHHSNMVTDWUBI-UHFFFAOYSA-N 0.000 description 4
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 4
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 4
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- 238000006735 epoxidation reaction Methods 0.000 description 4
- 239000011810 insulating material Substances 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 230000007935 neutral effect Effects 0.000 description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- 230000035484 reaction time Effects 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 4
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 4
- ZZHIDJWUJRKHGX-UHFFFAOYSA-N 1,4-bis(chloromethyl)benzene Chemical compound ClCC1=CC=C(CCl)C=C1 ZZHIDJWUJRKHGX-UHFFFAOYSA-N 0.000 description 3
- MODAACUAXYPNJH-UHFFFAOYSA-N 1-(methoxymethyl)-4-[4-(methoxymethyl)phenyl]benzene Chemical group C1=CC(COC)=CC=C1C1=CC=C(COC)C=C1 MODAACUAXYPNJH-UHFFFAOYSA-N 0.000 description 3
- FUIQBJHUESBZNU-UHFFFAOYSA-N 2-[(dimethylazaniumyl)methyl]phenolate Chemical compound CN(C)CC1=CC=CC=C1O FUIQBJHUESBZNU-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- BWVAOONFBYYRHY-UHFFFAOYSA-N [4-(hydroxymethyl)phenyl]methanol Chemical compound OCC1=CC=C(CO)C=C1 BWVAOONFBYYRHY-UHFFFAOYSA-N 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 150000001299 aldehydes Chemical class 0.000 description 3
- 150000001408 amides Chemical class 0.000 description 3
- 238000005452 bending Methods 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 235000010290 biphenyl Nutrition 0.000 description 3
- 150000004074 biphenyls Chemical class 0.000 description 3
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 239000011888 foil Substances 0.000 description 3
- 150000002576 ketones Chemical class 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 239000003973 paint Substances 0.000 description 3
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 3
- 238000006068 polycondensation reaction Methods 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 2
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical class C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 2
- AHDSRXYHVZECER-UHFFFAOYSA-N 2,4,6-tris[(dimethylamino)methyl]phenol Chemical compound CN(C)CC1=CC(CN(C)C)=C(O)C(CN(C)C)=C1 AHDSRXYHVZECER-UHFFFAOYSA-N 0.000 description 2
- JECYUBVRTQDVAT-UHFFFAOYSA-N 2-acetylphenol Chemical compound CC(=O)C1=CC=CC=C1O JECYUBVRTQDVAT-UHFFFAOYSA-N 0.000 description 2
- MLPVBIWIRCKMJV-UHFFFAOYSA-N 2-ethylaniline Chemical compound CCC1=CC=CC=C1N MLPVBIWIRCKMJV-UHFFFAOYSA-N 0.000 description 2
- LJGHYPLBDBRCRZ-UHFFFAOYSA-N 3-(3-aminophenyl)sulfonylaniline Chemical compound NC1=CC=CC(S(=O)(=O)C=2C=C(N)C=CC=2)=C1 LJGHYPLBDBRCRZ-UHFFFAOYSA-N 0.000 description 2
- TXFPEBPIARQUIG-UHFFFAOYSA-N 4'-hydroxyacetophenone Chemical compound CC(=O)C1=CC=C(O)C=C1 TXFPEBPIARQUIG-UHFFFAOYSA-N 0.000 description 2
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 2
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- ATRRKUHOCOJYRX-UHFFFAOYSA-N Ammonium bicarbonate Chemical compound [NH4+].OC([O-])=O ATRRKUHOCOJYRX-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 description 2
- 150000008065 acid anhydrides Chemical class 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 239000001099 ammonium carbonate Substances 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- IMHDGJOMLMDPJN-UHFFFAOYSA-N biphenyl-2,2'-diol Chemical group OC1=CC=CC=C1C1=CC=CC=C1O IMHDGJOMLMDPJN-UHFFFAOYSA-N 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- 229910000019 calcium carbonate Inorganic materials 0.000 description 2
- 235000010216 calcium carbonate Nutrition 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 238000005538 encapsulation Methods 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- HYBBIBNJHNGZAN-UHFFFAOYSA-N furfural Chemical compound O=CC1=CC=CO1 HYBBIBNJHNGZAN-UHFFFAOYSA-N 0.000 description 2
- 238000001802 infusion Methods 0.000 description 2
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 2
- NXPPAOGUKPJVDI-UHFFFAOYSA-N naphthalene-1,2-diol Chemical compound C1=CC=CC2=C(O)C(O)=CC=C21 NXPPAOGUKPJVDI-UHFFFAOYSA-N 0.000 description 2
- 150000004780 naphthols Chemical class 0.000 description 2
- 229920001568 phenolic resin Polymers 0.000 description 2
- IGALFTFNPPBUDN-UHFFFAOYSA-N phenyl-[2,3,4,5-tetrakis(oxiran-2-ylmethyl)phenyl]methanediamine Chemical compound C=1C(CC2OC2)=C(CC2OC2)C(CC2OC2)=C(CC2OC2)C=1C(N)(N)C1=CC=CC=C1 IGALFTFNPPBUDN-UHFFFAOYSA-N 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 239000004848 polyfunctional curative Substances 0.000 description 2
- SCVFZCLFOSHCOH-UHFFFAOYSA-M potassium acetate Chemical compound [K+].CC([O-])=O SCVFZCLFOSHCOH-UHFFFAOYSA-M 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 2
- 239000011342 resin composition Substances 0.000 description 2
- 239000002966 varnish Substances 0.000 description 2
- 239000003643 water by type Substances 0.000 description 2
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 1
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 1
- MGAXYKDBRBNWKT-UHFFFAOYSA-N (5-oxooxolan-2-yl)methyl 4-methylbenzenesulfonate Chemical compound C1=CC(C)=CC=C1S(=O)(=O)OCC1OC(=O)CC1 MGAXYKDBRBNWKT-UHFFFAOYSA-N 0.000 description 1
- KJPRLNWUNMBNBZ-QPJJXVBHSA-N (E)-cinnamaldehyde Chemical class O=C\C=C\C1=CC=CC=C1 KJPRLNWUNMBNBZ-QPJJXVBHSA-N 0.000 description 1
- DAJPMKAQEUGECW-UHFFFAOYSA-N 1,4-bis(methoxymethyl)benzene Chemical compound COCC1=CC=C(COC)C=C1 DAJPMKAQEUGECW-UHFFFAOYSA-N 0.000 description 1
- IPJGAEWUPXWFPL-UHFFFAOYSA-N 1-[3-(2,5-dioxopyrrol-1-yl)phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1=CC=CC(N2C(C=CC2=O)=O)=C1 IPJGAEWUPXWFPL-UHFFFAOYSA-N 0.000 description 1
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 description 1
- RWNUSVWFHDHRCJ-UHFFFAOYSA-N 1-butoxypropan-2-ol Chemical compound CCCCOCC(C)O RWNUSVWFHDHRCJ-UHFFFAOYSA-N 0.000 description 1
- IYSVFZBXZVPIFA-UHFFFAOYSA-N 1-ethenyl-4-(4-ethenylphenyl)benzene Chemical group C1=CC(C=C)=CC=C1C1=CC=C(C=C)C=C1 IYSVFZBXZVPIFA-UHFFFAOYSA-N 0.000 description 1
- SDRZFSPCVYEJTP-UHFFFAOYSA-N 1-ethenylcyclohexene Chemical compound C=CC1=CCCCC1 SDRZFSPCVYEJTP-UHFFFAOYSA-N 0.000 description 1
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 description 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 1
- 150000003923 2,5-pyrrolediones Chemical class 0.000 description 1
- UZDBWHMHPZZCNE-UHFFFAOYSA-N 2-benzyl-n,n-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1CC1=CC=CC=C1 UZDBWHMHPZZCNE-UHFFFAOYSA-N 0.000 description 1
- PQAMFDRRWURCFQ-UHFFFAOYSA-N 2-ethyl-1h-imidazole Chemical compound CCC1=NC=CN1 PQAMFDRRWURCFQ-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- VEORPZCZECFIRK-UHFFFAOYSA-N 3,3',5,5'-tetrabromobisphenol A Chemical compound C=1C(Br)=C(O)C(Br)=CC=1C(C)(C)C1=CC(Br)=C(O)C(Br)=C1 VEORPZCZECFIRK-UHFFFAOYSA-N 0.000 description 1
- MOSSLXZUUKTULI-UHFFFAOYSA-N 3-[3-(2,5-dioxopyrrol-3-yl)-4-methylphenyl]pyrrole-2,5-dione Chemical compound CC1=CC=C(C=2C(NC(=O)C=2)=O)C=C1C1=CC(=O)NC1=O MOSSLXZUUKTULI-UHFFFAOYSA-N 0.000 description 1
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- 238000007613 slurry method Methods 0.000 description 1
- HELHAJAZNSDZJO-OLXYHTOASA-L sodium L-tartrate Chemical compound [Na+].[Na+].[O-]C(=O)[C@H](O)[C@@H](O)C([O-])=O HELHAJAZNSDZJO-OLXYHTOASA-L 0.000 description 1
- 239000001632 sodium acetate Substances 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 235000017550 sodium carbonate Nutrition 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 239000001509 sodium citrate Substances 0.000 description 1
- AJPJDKMHJJGVTQ-UHFFFAOYSA-M sodium dihydrogen phosphate Chemical compound [Na+].OP(O)([O-])=O AJPJDKMHJJGVTQ-UHFFFAOYSA-M 0.000 description 1
- QDRKDTQENPPHOJ-UHFFFAOYSA-N sodium ethoxide Chemical compound [Na+].CC[O-] QDRKDTQENPPHOJ-UHFFFAOYSA-N 0.000 description 1
- HLBBKKJFGFRGMU-UHFFFAOYSA-M sodium formate Chemical compound [Na+].[O-]C=O HLBBKKJFGFRGMU-UHFFFAOYSA-M 0.000 description 1
- 235000019254 sodium formate Nutrition 0.000 description 1
- ZNCPFRVNHGOPAG-UHFFFAOYSA-L sodium oxalate Chemical compound [Na+].[Na+].[O-]C(=O)C([O-])=O ZNCPFRVNHGOPAG-UHFFFAOYSA-L 0.000 description 1
- 229940039790 sodium oxalate Drugs 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- 229910000162 sodium phosphate Inorganic materials 0.000 description 1
- 229960003339 sodium phosphate Drugs 0.000 description 1
- 235000011008 sodium phosphates Nutrition 0.000 description 1
- 239000001433 sodium tartrate Substances 0.000 description 1
- 229960002167 sodium tartrate Drugs 0.000 description 1
- 235000011004 sodium tartrates Nutrition 0.000 description 1
- 235000019832 sodium triphosphate Nutrition 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 239000012265 solid product Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 239000012756 surface treatment agent Substances 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 150000003505 terpenes Chemical class 0.000 description 1
- 235000007586 terpenes Nutrition 0.000 description 1
- DDFYFBUWEBINLX-UHFFFAOYSA-M tetramethylammonium bromide Chemical compound [Br-].C[N+](C)(C)C DDFYFBUWEBINLX-UHFFFAOYSA-M 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- AYEKOFBPNLCAJY-UHFFFAOYSA-O thiamine pyrophosphate Chemical compound CC1=C(CCOP(O)(=O)OP(O)(O)=O)SC=[N+]1CC1=CN=C(C)N=C1N AYEKOFBPNLCAJY-UHFFFAOYSA-O 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000001721 transfer moulding Methods 0.000 description 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
- 235000015870 tripotassium citrate Nutrition 0.000 description 1
- HRXKRNGNAMMEHJ-UHFFFAOYSA-K trisodium citrate Chemical compound [Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O HRXKRNGNAMMEHJ-UHFFFAOYSA-K 0.000 description 1
- 229940038773 trisodium citrate Drugs 0.000 description 1
- 235000019263 trisodium citrate Nutrition 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 239000003799 water insoluble solvent Substances 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/02—Polycondensates containing more than one epoxy group per molecule
- C08G59/04—Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof
- C08G59/06—Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof of polyhydric phenols
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/22—Di-epoxy compounds
- C08G59/223—Di-epoxy compounds together with monoepoxy compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/32—Epoxy compounds containing three or more epoxy groups
- C08G59/36—Epoxy compounds containing three or more epoxy groups together with mono-epoxy compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Epoxy Resins (AREA)
- Epoxy Compounds (AREA)
Abstract
본 발명은 고내열성과 고탄성률을 나타내는 에폭시 수지 혼합물, 에폭시 수지 조성물, 및 그의 경화물을 제공한다.
하기 식 (1)로 나타내는 에폭시 수지와 하기 식 (2)로 나타내는 에폭시 화합물을 함유하는 에폭시 수지 혼합물.
[화학식 1]
(식 (1) 중, n은 반복 수이며 1 ~ 20의 실수를 나타낸다.)
[화학식 2]
The present invention provides an epoxy resin mixture, an epoxy resin composition, and a cured product thereof that exhibit high heat resistance and high elastic modulus.
An epoxy resin mixture containing an epoxy resin represented by the following formula (1) and an epoxy compound represented by the following formula (2).
[Formula 1]
(In equation (1), n is the number of repetitions and represents a real number from 1 to 20.)
[Formula 2]
Description
본 발명은 전기 전자 부품용 절연 재료(고신뢰성 반도체 밀봉 재료 등), 적층판(프린트 배선판, 빌드업 기판 등) 및 FRP(섬유 강화 플라스틱)를 비롯한 각종 복합 재료, 접착제, 도료 등 그 중에서도 특히 적층판 등의 용도에 유용하고, 금속박 부착 적층판, 빌드업 기판용 절연 재료, 플렉시블 기판 재료 등에 유용한 경화성 수지 조성물을 제공하는 에폭시 수지 혼합물 및 에폭시 수지 조성물에 관한 것이다.The present invention relates to insulating materials for electrical and electronic components (high-reliability semiconductor encapsulation materials, etc.), laminated boards (printed wiring boards, build-up boards, etc.) and various composite materials including FRP (fiber reinforced plastic), adhesives, paints, etc., among others, laminated boards, etc. It relates to an epoxy resin mixture and an epoxy resin composition that are useful for uses and provide a curable resin composition useful for laminated boards with metal foil, insulating materials for build-up boards, flexible board materials, etc.
에폭시 수지는 작업성, 및 그 경화물의 우수한 전기 특성, 내열성, 접착성, 내흡수성 등에 의해 전기·전자 부품, 구조용 재료, 접착제, 도료 등의 분야에서 폭넓게 사용되고 있다.Epoxy resins are widely used in fields such as electrical and electronic components, structural materials, adhesives, and paints due to their workability and the excellent electrical properties, heat resistance, adhesiveness, and water absorption resistance of their cured products.
최근, 반도체 관련 재료의 분야에서 고기능화나 고성능화를 위해 종래의 반도체보다도 더 높은 전압이나 전류를 취급할 수 있는 파워 반도체가 개발되어 사용되고 있다. 파워 반도체는 주로 전압이나 주파수의 변경이나 직류와 교류의 스위칭 등의 전력 변환에 사용되어 그에 의해 모터를 정밀하게 돌리거나, 발전한 전기를 낭비 없이 송전망에 보내거나, 가전제품이나 전기 기구에 전원을 안정적으로 공급할 수 있다.Recently, in the field of semiconductor-related materials, power semiconductors that can handle higher voltages or currents than conventional semiconductors have been developed and used to improve functionality and performance. Power semiconductors are mainly used for power conversion, such as changing voltage or frequency or switching between direct current and alternating current, thereby precisely turning motors, sending generated electricity to the transmission grid without waste, and providing stable power to home appliances and electrical appliances. can be supplied.
파워 반도체는 매우 큰 전력을 취급하기 때문에 사용시에 열을 발하여 고온이 되기 때문에 이것이 고장의 원인이 된다. 파워 반도체의 장기간에서의 고온 동작을 보증하기 위해서 -55℃ ~ 150℃를 1000사이클 이상 반복하는 냉열 사이클 시험이라고 불리는 신뢰성 시험이 행해지고 있다. 그 때문에 파워 반도체용 수지 재료에는 150℃ 이상의 내열성이 요구되고 있다(특허문헌 1 ~ 4).Since power semiconductors handle very large amounts of power, they generate heat and become high in temperature when used, which can cause malfunctions. To ensure long-term high-temperature operation of power semiconductors, a reliability test called a cold-heat cycle test that repeats -55°C to 150°C over 1,000 cycles is performed. Therefore, heat resistance of 150°C or higher is required for resin materials for power semiconductors (Patent Documents 1 to 4).
반도체 관련 분야에서는 파워 반도체의 고기능화, 고성능화에 더하여 칩을 실장하는데 필요한 패키지 기판의 개발이 이루어지고 있어 박형화가 진행되고 있다. 패키지 기판의 박형화에 동반하여 강성이 필요해지고, 강성이 부족한 기판 재료에서는 휨에 견딜 수 없어 파손으로 이어진다. 그 때문에 기판 재료에 널리 사용되는 수지 재료에는 높은 탄성률이 요구되고 있다.In the semiconductor field, in addition to increasing the functionality and performance of power semiconductors, the development of package substrates necessary for mounting chips is underway, leading to thinning. As package substrates become thinner, rigidity becomes necessary, and substrate materials that lack rigidity cannot withstand bending, leading to breakage. For this reason, resin materials widely used in substrate materials are required to have a high elastic modulus.
패키지 기판 이외에도 수지 재료에 높은 탄성률이 요구되고 있는 것은 많이 존재하고, 그 하나로서 CFRP(탄소섬유 강화 플라스틱)를 들 수 있다. CFRP는 탄소 섬유 내에 수지 재료가 가득 채워짐으로써 하중을 가했을 때에 응력이 수지를 통해 섬유에 전파되기 때문에 탄소 섬유의 많은 부분이 유효하게 동시에 부하를 담당할 수 있다. 이 때에 사용되는 수지 재료의 탄성률이 높기 때문에 하중을 가했을 때에 발생하는 응력에 의한 탄소 섬유의 굴곡을 억제할 수 있어 CFRP의 강도 발현에 연결된다. 수지 재료의 탄성률이 낮은 경우, 응력에 의해 탄소 섬유가 용이하게 굴곡되어 버려 CFRP의 강도가 잘 발현될 수 없어 파손에 연결되어 버린다. 그 때문에 CFRP에 사용되는 수지 재료에는 탄성률이 조금이라도 높은 것이 바람직하다.In addition to package substrates, there are many resin materials that require a high modulus of elasticity, one of which is CFRP (carbon fiber reinforced plastic). CFRP is filled with resin material within the carbon fiber, so when a load is applied, stress is propagated to the fiber through the resin, so many parts of the carbon fiber can effectively bear the load at the same time. Since the resin material used at this time has a high elastic modulus, bending of the carbon fiber due to stress generated when a load is applied can be suppressed, which leads to the development of the strength of CFRP. If the elastic modulus of the resin material is low, the carbon fibers are easily bent due to stress, and the strength of CFRP cannot be expressed well, leading to breakage. Therefore, it is desirable for the resin material used in CFRP to have at least a slightly higher elastic modulus.
특허문헌 5에서는 네오펜틸글리콜, 1,4-부탄디올, 1,6-헥산디올 골격의 에폭시 수지와 비스페놀 A형 에폭시 수지를 조합한 수지 조성물이 개시되어 있고, 우수한 내열성이나 탄성률을 나타내고 있지만, 내열성이 150℃에 도달하지 않고, 탄성률도 충분한 값이라고는 할 수 없다.Patent Document 5 discloses a resin composition combining an epoxy resin with a neopentyl glycol, 1,4-butanediol, and 1,6-hexanediol skeleton and a bisphenol A type epoxy resin, and shows excellent heat resistance and elastic modulus, but the heat resistance is poor. It does not reach 150°C, and the elastic modulus cannot be said to be a sufficient value.
본 발명은 이러한 상황을 감안하여 이루어진 것으로서 고내열성과 고탄성률을 나타내는 에폭시 수지 혼합물, 에폭시 수지 조성물 및 그 경화물을 제공하는 것을 목적으로 한다.The present invention was made in consideration of this situation, and its purpose is to provide an epoxy resin mixture, an epoxy resin composition, and a cured product thereof that exhibit high heat resistance and high elastic modulus.
본 발명자들은 예의 연구한 결과, 특정 구조를 갖는 에폭시 수지에 대하여 특정 구조를 갖는 에폭시 화합물을 특정의 비율 함유함으로써 그 경화물이 고내열성과 고탄성률이 되는 것을 발견하고, 본 발명을 완성하기에 이르렀다.As a result of extensive research, the present inventors discovered that by containing a specific ratio of an epoxy compound with a specific structure to an epoxy resin with a specific structure, the cured product has high heat resistance and high elastic modulus, and came to complete the present invention. .
즉, 본 발명은 이하의 [1] 내지 [5]에 나타내는 것이다.That is, the present invention is shown in [1] to [5] below.
[1][One]
하기 식 (1)로 나타내는 에폭시 수지와 하기 식 (2)로 나타내는 에폭시 화합물을 함유하는 에폭시 수지 혼합물.An epoxy resin mixture containing an epoxy resin represented by the following formula (1) and an epoxy compound represented by the following formula (2).
(식 (1) 중, n은 반복 수이며 1 ~ 20의 실수를 나타낸다.)(In equation (1), n is the number of repetitions and represents a real number from 1 to 20.)
[2][2]
가스 크로마토그래피 분석에 있어서, 상기 식(1)의 n이 1인 에폭시 수지의 함유량을 100면적%로 했을 때, 상기 식(2)로 표시되는 에폭시 화합물의 함유량이 1.0 ~ 10.0 면적%인 전항 [1]에 기재된 에폭시 수지 혼합물.In gas chromatography analysis, when the content of the epoxy resin in which n in the formula (1) is 1 is 100 area%, the content of the epoxy compound represented by the formula (2) is 1.0 to 10.0 area%. The epoxy resin mixture described in [1].
[3][3]
전항 [1] 또는 [2]에 기재된 에폭시 수지 혼합물과 경화제를 함유하는 에폭시 수지 조성물.An epoxy resin composition containing the epoxy resin mixture according to the preceding item [1] or [2] and a curing agent.
[4][4]
전항 [3]에 기재된 에폭시 수지 조성물을 경화하여 얻어지는 경화물.A cured product obtained by curing the epoxy resin composition described in the preceding paragraph [3].
[5][5]
하기 식 (3)으로 나타내는 페놀 수지, 및 하기 식 (4)로 나타내는 페놀 화합물에 에피클로로히드린을 반응시켜 얻어지는 전항 [1] 또는 [2]에 기재된 에폭시 수지 혼합물의 제조 방법.A method for producing an epoxy resin mixture according to the preceding item [1] or [2], which is obtained by reacting epichlorohydrin with a phenol resin represented by the following formula (3) and a phenol compound represented by the following formula (4).
(식 (3) 중, n은 반복 수이며 1 ~ 20의 실수를 나타낸다.)(In equation (3), n is the number of repetitions and represents a real number from 1 to 20.)
본 발명에 의하면 그 경화물이 고내열성과 고탄성률을 갖는 에폭시 수지, 에폭시 수지 조성물, 그것을 사용한 경화물을 제공할 수 있다. 따라서, 파워 반도체, 회로 기판, FRP 등에 유용하다.According to the present invention, it is possible to provide an epoxy resin, an epoxy resin composition, and a cured product using the same whose cured product has high heat resistance and high elastic modulus. Therefore, it is useful for power semiconductors, circuit boards, FRP, etc.
도 1은 실시예 2의 GPC 차트를 나타낸다.
도 2는 실시예 3의 GPC 차트를 나타낸다.
도 3은 합성예 1의 GPC 차트를 나타낸다.
도 4는 실시예 2, 3 및 합성예 1의 GC 차트를 나타낸다.Figure 1 shows the GPC chart of Example 2.
Figure 2 shows the GPC chart of Example 3.
Figure 3 shows the GPC chart of Synthesis Example 1.
Figure 4 shows the GC charts of Examples 2 and 3 and Synthesis Example 1.
본 발명의 에폭시 수지 혼합물은 하기 식 (1)로 표시되는 에폭시 수지와 하기 식 (2)로 표시되는 에폭시 화합물을 함유한다.The epoxy resin mixture of the present invention contains an epoxy resin represented by the following formula (1) and an epoxy compound represented by the following formula (2).
(식 (1) 중, n은 반복 수이며 1 ~ 20의 실수를 나타낸다.)(In equation (1), n is the number of repetitions and represents a real number from 1 to 20.)
상기 식 (1) 중, n의 값은 겔 투과 크로마토그래피(GPC, 검출기: RI)의 측정에 의해 구할 수 있다. n은 통상 1 ~ 20의 실수이지만, 1 ~ 10인 것이 바람직하고, 1 ~ 5인 것이 보다 바람직하다. n이 20보다 커지면 분자량이 증대하여 고점도가 되기 때문에 가공성이 떨어진다.In the above formula (1), the value of n can be determined by measurement using gel permeation chromatography (GPC, detector: RI). n is usually a real number from 1 to 20, but it is preferably 1 to 10, and more preferably 1 to 5. When n becomes greater than 20, the molecular weight increases and the viscosity becomes high, which reduces processability.
또한, n의 평균값은 겔 투과 크로마토그래피(GPC, 검출기: RI)의 측정에 의해 구해진 수평균 분자량, 혹은 분리한 피크 각각의 면적비로부터 산출할 수 있다. n의 평균값은 1 ~ 10인 것이 바람직하고, 1.1 ~ 10인 것이 보다 바람직하고, 1.1 ~ 5인 것이 특히 바람직하다.Additionally, the average value of n can be calculated from the number average molecular weight determined by gel permeation chromatography (GPC, detector: RI) or the area ratio of each separated peak. The average value of n is preferably 1 to 10, more preferably 1.1 to 10, and particularly preferably 1.1 to 5.
상기 식 (1)로 표시되는 에폭시 수지와 상기 식 (2)로 표시되는 에폭시 화합물을 함유하는 에폭시 수지 혼합물의 에폭시 당량의 바람직한 범위는 250g/eq. 이상 400g/eq. 미만이고, 더욱 바람직하게는 280g/eq. 이상 350g/eq. 미만이며, 특히 바람직하게는 290g/eq. 이상 320g/eq. 미만이다. 에폭시 수지 혼합물의 에폭시 당량이 250g/eq. 미만인 경우 가교 밀도가 증가하여 내열성은 향상되지만, 딱딱하고 부서지기 쉬워져 기계 강도의 저하를 초래하기 때문에 바람직하지 않다. 또한 에폭시 수지 혼합물의 에폭시 당량이 600g/eq. 이상인 경우 가교 밀도가 감소하여 경화물의 취성이 개선되지만, 내열성의 저하를 초래하기 때문에 바람직하지 않다. 에폭시 당량이 적정한 경우 기계 강도의 저하를 일으키지 않고 경화물의 내열성을 향상시킬 수 있다.The preferred range of the epoxy equivalent weight of the epoxy resin mixture containing the epoxy resin represented by the formula (1) and the epoxy compound represented by the formula (2) is 250 g/eq. More than 400g/eq. less than, more preferably 280 g/eq. More than 350g/eq. less than, particularly preferably 290 g/eq. More than 320g/eq. It is less than. The epoxy equivalent weight of the epoxy resin mixture is 250 g/eq. If it is less than that, the crosslinking density increases and heat resistance improves, but it becomes hard and brittle, resulting in a decrease in mechanical strength, which is not preferable. Additionally, the epoxy equivalent weight of the epoxy resin mixture is 600 g/eq. If it is above this, the crosslinking density decreases and the brittleness of the cured product improves, but it is not preferable because it causes a decrease in heat resistance. If the epoxy equivalent is appropriate, the heat resistance of the cured product can be improved without causing a decrease in mechanical strength.
본 발명에 있어서, 에폭시 당량은 JIS K-7236에 기재된 방법으로 측정하고 있다.In the present invention, the epoxy equivalent is measured by the method described in JIS K-7236.
본 발명의 에폭시 수지 혼합물의 연화점의 바람직한 범위는 60 ~ 80℃이고, 더욱 바람직하게는 65 ~ 70℃이다. 연화점이 상기 범위이면 수지끼리 실온에서 블로킹하지 않기 때문에 핸들링성이 우수하다.The preferred range of softening point of the epoxy resin mixture of the present invention is 60 to 80°C, more preferably 65 to 70°C. If the softening point is within the above range, handling properties are excellent because the resins do not block each other at room temperature.
상기 식(2)로 표시되는 에폭시 화합물의 함유량은 GC(가스 크로마토그래피) 분석에 의해 측정할 수 있고, 검출된 피크의 면적%로부터 확인할 수 있다. 본 발명의 GC 분석은 후술하는 실시예 기재의 방법으로 행하고 있다.The content of the epoxy compound represented by the above formula (2) can be measured by GC (gas chromatography) analysis and can be confirmed from the area% of the detected peak. The GC analysis of the present invention is performed by the method described in the Examples described later.
GC 분석에 있어서, 상기 식(1)의 n이 1인 에폭시 수지의 함유량을 100면적%로 했을 때, 상기 식(2)로 표시되는 에폭시 화합물의 함유량은 1.0 ~ 10.0 면적% 함유하고 있는 것이 바람직하고, 1.0 ~ 8.0 면적%가 보다 바람직하고, 1.0 ~ 6.0 면적%가 더욱 바람직하고, 2.0 ~ 6.0 면적%가 특히 바람직하고, 2.0 ~ 4.0 면적%가 가장 바람직하다. 에폭시 수지 혼합물의 경화물의 3차원 네트워크 중에서는 자유 부피가 발생한다. 상기 식 (2)로 표시되는 에폭시 화합물은 관능기가 하나밖에 없기 때문에 그 함유량이 1.0면적% 이상이면 자유부피를 적게 할 수 있기 때문에 3차원 네트워크가 움직이기 어렵게 되어 내열성이나 탄성률이 향상된다. 상기 식 (2)로 표시되는 에폭시 화합물의 함유량이 10.0 면적%보다 많으면 자유부피는 적어지지만, 자유부피 내에 들어갈 수 없었던 상기 식 (2)로 표시되는 에폭시 화합물이 과잉으로 존재하기 때문에 저분자 성분이 많아져 내열성이나 탄성률이 낮아져 버린다. 그 때문에 상기 식 (2)로 표시되는 에폭시 화합물의 함유량이 상기 범위 내에 있는 것이 바람직하다.In GC analysis, when the content of the epoxy resin in which n in the formula (1) is 1 is 100 area%, the content of the epoxy compound represented by the formula (2) is preferably 1.0 to 10.0 area%. 1.0 to 8.0 area% is more preferable, 1.0 to 6.0 area% is more preferable, 2.0 to 6.0 area% is particularly preferable, and 2.0 to 4.0 area% is most preferable. Free volume occurs in the three-dimensional network of the cured product of the epoxy resin mixture. Since the epoxy compound represented by the above formula (2) has only one functional group, if its content is 1.0 area% or more, the free volume can be reduced, making it difficult for the three-dimensional network to move, improving heat resistance and elastic modulus. If the content of the epoxy compound represented by the formula (2) is greater than 10.0 area%, the free volume decreases, but since the epoxy compound represented by the formula (2) that cannot enter the free volume exists in excess, there are many low molecular weight components. This results in lower heat resistance and elastic modulus. Therefore, it is preferable that the content of the epoxy compound represented by the above formula (2) is within the above range.
본 발명의 에폭시 수지 혼합물은 내열성, 탄성률이 우수하다. 내열성은 150℃ 이상이 바람직하고, 더욱 바람직하게는 155℃ 이상이고, 특히 바람직하게는 160℃ 이상이다. 내열성이 낮으면 파워 디바이스 등의 종래보다 고온으로 장시간 동작하는 장소에 사용했을 경우, 분자 운동이 심해져 버려 파손으로 이어질 가능성이 있다. 또한, 패키지 기판과 같은 박형의 기판에서는 강성, 즉 경화물의 탄성률이 요구되고, 강성이 낮으면 기판이 휘어지기 쉬워져 파손될 우려가 있다. 그 때문에 박형의 기판에는 고탄성률이 요구되고 있다. 에폭시 수지 재료의 탄성률은 30℃에서의 굽힘 시험에서 2.8GPa 이상이 바람직하고, 2.9GPa 이상이 더욱 바람직하다.The epoxy resin mixture of the present invention has excellent heat resistance and elastic modulus. The heat resistance is preferably 150°C or higher, more preferably 155°C or higher, and particularly preferably 160°C or higher. If the heat resistance is low, if it is used in a place where it operates at a higher temperature for a longer period of time than before, such as in a power device, the molecular movement may increase, which may lead to damage. In addition, thin substrates such as package substrates require rigidity, that is, an elastic modulus of the cured product, and if the rigidity is low, the substrate is likely to bend and may be damaged. For this reason, thin substrates are required to have a high elastic modulus. The elastic modulus of the epoxy resin material is preferably 2.8 GPa or more, and more preferably 2.9 GPa or more in a bending test at 30°C.
상기 식 (1)로 표시되는 에폭시 수지와 상기 식 (2)로 표시되는 에폭시 화합물은 하기 식 (3)으로 표시되는 페놀 수지 및 하기 식 (4)로 표시되는 페놀 화합물과 에피클로로히드린과의 반응에 의해 얻을 수 있다.The epoxy resin represented by the formula (1) and the epoxy compound represented by the formula (2) are the phenol resin represented by the formula (3) below, the phenol compound represented by the formula (4) below, and epichlorohydrin. It can be obtained by reaction.
(식 (3) 중, n은 반복 수이며 1 ~ 20의 실수를 나타낸다.)(In equation (3), n is the number of repetitions and represents a real number from 1 to 20.)
식 (3) 중의 n의 값 및 바람직한 범위는 상기 식 (1)과 동일하다.The value and preferred range of n in equation (3) are the same as in equation (1) above.
상기 식 (3)으로 표시되는 페놀 수지의 합성법으로서는 페놀과 4,4'-비스클로로메틸비페닐과의 반응을 들 수 있고, 이 경우의 4,4'-비스클로로메틸비페닐의 사용량은 페놀 10몰에 대하여 통상 1 ~ 9 몰, 바람직하게는 2 ~ 8 몰의 범위이다.A method for synthesizing the phenol resin represented by the above formula (3) includes the reaction between phenol and 4,4'-bischloromethylbiphenyl, and the amount of 4,4'-bischloromethylbiphenyl used in this case is phenol It is usually in the range of 1 to 9 moles, preferably 2 to 8 moles, per 10 moles.
상기 반응에 사용할 수 있는 염기성 물질의 구체예로서는 수산화리튬, 수산화나트륨, 수산화칼륨 등의 알칼리 금속 수산화물, 수산화마그네슘, 수산화칼슘, 수산화바륨 등의 알칼리토류 금속수산화물, 산화마그네슘, 산화칼슘 등의 알칼리토류 금속산화물, 아세트산나트륨, 아세트산칼륨, 옥살산나트륨, 옥살산칼륨, 포름산나트륨, 포름산칼륨, 아세트산칼슘, 아세트산마그네슘, 아세트산암모늄, 탄산나트륨, 탄산칼륨, 탄산칼슘, 탄산마그네슘, 탄산암모늄, 탄산수소나트륨, 탄산수소칼륨, 탄산수소암모늄, 시트르산삼나트륨, 시트르산삼칼륨, 타르타르산나트륨, 타르타르산칼륨, 인산나트륨, 트리폴리인산나트륨, 인산일수소나트륨, 인산이수소나트륨, 나트륨메톡시드, 나트륨에톡시드, 칼륨-tert-부톡시드, 칼륨에톡시드 등의 알칼리금속 메톡시드, 나트륨페녹사이드, 칼륨페녹사이드 등을 들 수 있지만, 이들에 한정되는 것은 아니다. 또한, 이들은 단독으로 사용해도 되고, 2종 이상 병용해도 된다. 이들 염기성 물질의 사용량은 4,4'-비스클로로메틸비페닐 1몰에 대하여 통상 0.02 ~ 2.0몰, 바람직하게는 0.05 ~ 2.0몰의 범위이다.Specific examples of basic substances that can be used in the above reaction include alkali metal hydroxides such as lithium hydroxide, sodium hydroxide, and potassium hydroxide, alkaline earth metal hydroxides such as magnesium hydroxide, calcium hydroxide, and barium hydroxide, and alkaline earth metal oxides such as magnesium oxide and calcium oxide. , sodium acetate, potassium acetate, sodium oxalate, potassium oxalate, sodium formate, potassium formate, calcium acetate, magnesium acetate, ammonium acetate, sodium carbonate, potassium carbonate, calcium carbonate, magnesium carbonate, ammonium carbonate, sodium bicarbonate, potassium bicarbonate, Ammonium bicarbonate, trisodium citrate, tripotassium citrate, sodium tartrate, potassium tartrate, sodium phosphate, sodium tripolyphosphate, sodium monohydrogen phosphate, sodium dihydrogen phosphate, sodium methoxide, sodium ethoxide, potassium-tert-butoxide. , alkali metal methoxides such as potassium ethoxide, sodium phenoxide, potassium phenoxide, etc., but are not limited to these. In addition, these may be used individually, or two or more types may be used together. The amount of these basic substances used is usually 0.02 to 2.0 mol, preferably 0.05 to 2.0 mol, per 1 mol of 4,4'-bischloromethylbiphenyl.
상기 반응에 사용할 수 있는 용제의 구체예로서는 메탄올, 에탄올, 프로판올 등의 알코올류, 메틸에틸케톤, 메틸이소부틸케톤 등의 케톤류, 디에틸렌글리콜, 아세트산 등을 들 수 있지만, 이들에 한정되는 것은 아니다. 또한, 이들은 단독으로 사용해도 되고, 2종 이상 병용해도 된다. 이들의 사용량은 페놀 100 중량부에 대하여 통상 5 ~ 200 중량부, 바람직하게는 10 ~ 100 중량부의 범위이다.Specific examples of solvents that can be used in the above reaction include alcohols such as methanol, ethanol, and propanol, ketones such as methyl ethyl ketone and methyl isobutyl ketone, diethylene glycol, and acetic acid, but are not limited to these. In addition, these may be used individually, or two or more types may be used together. The amount of these used is usually in the range of 5 to 200 parts by weight, preferably 10 to 100 parts by weight, based on 100 parts by weight of phenol.
상기 반응에서는 상기 용제와 함께 톨루엔을 사용함으로써 상기 식 (4)로 표시되는 페놀 화합물을 얻을 수 있다. 톨루엔의 사용량은 페놀 100 중량부에 대하여 통상 5 ~ 200 중량부, 바람직하게는 10 ~ 100 중량부의 범위이다. 톨루엔을 200중량부보다 많이 사용한 경우, 상기 식 (4)로 표시되는 페놀 화합물이 많이 생성되어 버려, 결과적으로 상기 식 (2)로 표시되는 에폭시 화합물이 많이 생성되게 되기 때문에 내열성이 크게 저하된다. 한편, 톨루엔을 5중량부보다 적게 사용한 경우, 상기 식 (4)로 표시되는 페놀 화합물의 생성량이 적어져 결과적으로 상기 식 (2)로 표시되는 에폭시 화합물의 생성량이 적어 지기 때문에 저탄성률이 된다. 따라서, 상기 범위 내에서 톨루엔을 사용하는 것이 바람직하다.In the above reaction, the phenol compound represented by the above formula (4) can be obtained by using toluene together with the above solvent. The amount of toluene used is usually in the range of 5 to 200 parts by weight, preferably 10 to 100 parts by weight, based on 100 parts by weight of phenol. When more than 200 parts by weight of toluene is used, a large amount of the phenolic compound represented by the above formula (4) is produced, and as a result, a large amount of the epoxy compound represented by the above formula (2) is produced, resulting in a significant decrease in heat resistance. On the other hand, when less than 5 parts by weight of toluene is used, the amount of the phenol compound represented by the formula (4) is reduced, and as a result, the amount of the epoxy compound represented by the formula (2) is reduced, resulting in a low elastic modulus. Therefore, it is preferable to use toluene within the above range.
상기 반응은 통상 페놀과 상기 염기성 물질을 투입하고, 이것에 서서히 4,4'-비스클로로메틸비페닐을 첨가하는 것이 바람직하다. 그 때의 온도는 통상 50 ~ 150℃, 바람직하게는 60 ~ 120℃의 범위에서, 통상 0.5 ~ 10시간, 바람직하게는 1 ~ 4시간이다. 50℃ 미만의 온도에서 반응시킨 경우, 톨루엔이 반응하기 어려운, 즉 상기 식 (2)로 표시되는 에폭시 화합물의 생성이 곤란해진다. 150 ℃를 초과하면 톨루엔이 휘발되어 반응에 기여하지 않게 된다. 4,4'-비스클로로메틸비페닐 첨가 종료 후, 통상 50 ~ 150℃, 바람직하게는 60 ~ 120℃의 범위에서, 통상 0.5 ~ 10시간, 바람직하게는 1 ~ 5시간 더 반응시킨다. 또한,이 때 반응 용액의 pH가 산성이 아니면 반응의 진행이 방해되어 고분자화되지 않는 경우가있다. 이 경우, p-톨루엔술폰산, 염산, 황산 등의 산성 물질을 반응계에 첨가한다. 반응 종료 후, 가열 감압 하에서 과잉의 페놀을 증류 제거한다. 그 후, 통상 비수용성의 용제에 용해하여 수세를 반복하여 염을 제거하고, 용제를 증류 제거함으로써 상기 식 (3)으로 나타내는 페놀 수지 및 상기 식 (4)로 나타내는 페놀 화합물을 얻을 수 있다.In the above reaction, it is generally preferable to add phenol and the basic substance and gradually add 4,4'-bischloromethylbiphenyl to it. The temperature at that time is usually 50 to 150°C, preferably 60 to 120°C, and is usually 0.5 to 10 hours, preferably 1 to 4 hours. When the reaction is carried out at a temperature of less than 50°C, it is difficult for toluene to react, that is, the production of the epoxy compound represented by the above formula (2) becomes difficult. If the temperature exceeds 150°C, toluene volatilizes and does not contribute to the reaction. After the addition of 4,4'-bischloromethylbiphenyl is completed, the reaction is usually carried out at 50 to 150°C, preferably 60 to 120°C, for another 0.5 to 10 hours, preferably 1 to 5 hours. Additionally, if the pH of the reaction solution is not acidic, the progress of the reaction may be hindered and polymerization may not occur. In this case, acidic substances such as p-toluenesulfonic acid, hydrochloric acid, and sulfuric acid are added to the reaction system. After completion of the reaction, excess phenol is distilled off under heating and reduced pressure. After that, it is usually dissolved in a water-insoluble solvent, repeatedly washed with water to remove the salt, and the solvent is distilled off to obtain the phenol resin represented by the formula (3) and the phenolic compound represented by the formula (4).
이어서, 본 발명의 에폭시 수지 혼합물을 얻는 반응에 대하여 설명한다. 상기 식 (1)로 표시되는 에폭시 수지 및 상기 식 (2)로 표시되는 에폭시 화합물은 각각 상기 식 (3)으로 표시되는 페놀 수지와 상기 식 (4)로 표시되는 페놀 화합물을 에피클로로히드린과 반응시켜 얻어진다.Next, the reaction for obtaining the epoxy resin mixture of the present invention will be described. The epoxy resin represented by the formula (1) and the epoxy compound represented by the formula (2) are respectively a phenol resin represented by the formula (3) and a phenolic compound represented by the formula (4) with epichlorohydrin and It is obtained by reaction.
에피클로로히드린은 시장에서 쉽게 입수할 수 있다. 에피클로로히드린의 사용량은 원료 페놀 수지의 수산기 1몰에 대하여 통상 3.0 ~ 10몰, 바람직하게는 3.5 ~ 8.0몰, 보다 바람직하게는 4.0 ~ 7.0몰이다.Epichlorohydrin is easily available in the market. The amount of epichlorohydrin used is usually 3.0 to 10 mol, preferably 3.5 to 8.0 mol, more preferably 4.0 to 7.0 mol, based on 1 mol of hydroxyl group of the raw material phenol resin.
상기 반응에서, 에폭시화 공정을 촉진하는 촉매로서 알칼리 금속 수산화물을 사용할 수 있다. 사용할 수 있는 알칼리 금속 수산화물로서는 수산화나트륨, 수산화칼륨 등을 들 수 있고, 고형물을 이용해도 되고, 그 수용액을 사용해도 되지만, 본 발명에서는 특히 용해성, 핸들링의 면으로부터 플레이크 형상으로 성형된 고형물의 사용이 바람직하다. 알칼리 금속 수산화물의 사용량은 원료 페놀 수지의 수산기 1몰에 대하여 통상 0.90 ~ 1.50몰이다.In the above reaction, an alkali metal hydroxide can be used as a catalyst to promote the epoxidation process. Alkali metal hydroxides that can be used include sodium hydroxide, potassium hydroxide, etc., and solid materials or aqueous solutions thereof may be used. However, in the present invention, the use of solid products shaped into flakes is preferred, especially from the viewpoint of solubility and handling. desirable. The amount of alkali metal hydroxide used is usually 0.90 to 1.50 mole per mole of hydroxyl group of the raw material phenol resin.
또한, 반응을 촉진하기 위해서 테트라메틸암모늄클로라이드, 테트라메틸암모늄브로마이드, 트리메틸벤질암모늄클로라이드 등의 4급 암모늄염을 촉매로서 첨가해도 된다. 4급 암모늄염의 사용량으로서는 원료 페놀 혼합물의 수산기 1몰에 대하여 통상 0.0009 ~ 0.15몰이 바람직하다.Additionally, in order to promote the reaction, quaternary ammonium salts such as tetramethylammonium chloride, tetramethylammonium bromide, and trimethylbenzylammonium chloride may be added as a catalyst. The amount of quaternary ammonium salt used is usually 0.0009 to 0.15 mole per mole of hydroxyl group in the raw material phenol mixture.
반응 온도는 통상 30 ~ 90℃이고, 바람직하게는 35 ~ 80℃이다. 특히 본 발명에 있어서는 보다 고순도인 에폭시화를 위해서 50℃ 이상이 바람직하다. 반응 시간은 통상 0.5 ~ 10시간이며, 바람직하게는 1 ~ 8시간, 특히 바람직하게는 1 ~ 4시간이다. 반응 시간이 짧으면 반응이 진행되지 않고, 반응 시간이 길어지면 부생성물이 생기기 때문에 바람직하지 않다.The reaction temperature is usually 30 to 90°C, preferably 35 to 80°C. In particular, in the present invention, 50°C or higher is preferable for higher purity epoxidation. The reaction time is usually 0.5 to 10 hours, preferably 1 to 8 hours, and particularly preferably 1 to 4 hours. If the reaction time is short, the reaction does not proceed, and if the reaction time is long, by-products are generated, which is not preferable.
이들 에폭시화 반응의 반응물을 수세 후, 또는 수세 없이 가열 감압 하에서 에피클로로히드린이나 용매 등을 제거한다. 또한 가수분해성 할로겐이 적은 에폭시 수지로 하기 위해서 회수한 에폭시 수지를 탄소수 4 ~ 7의 케톤 화합물(예를 들면, 메틸이소부틸케톤, 메틸에틸케톤, 시클로펜타논, 시클로헥사논 등을 들 수 있다.)을 용제로서 용해하고, 수산화나트륨, 수산화칼륨 등의 알칼리 금속 수산화물의 수용액을 첨가하여 반응을 행하여, 폐환을 확실한 것으로 할 수도 있다. 이 경우 알칼리 금속 수산화물의 사용량은 에폭시화에 사용한 원료 페놀 수지의 수산기 1몰에 대하여 통상 0.01 ~ 0.3몰, 반응 온도는 통상 50 ~ 120℃, 반응 시간은 통상 0.5 ~ 2시간이다.After washing the reactants of these epoxidation reactions with water, epichlorohydrin, solvent, etc. are removed under heating and reduced pressure without washing with water. Additionally, in order to make an epoxy resin with less hydrolyzable halogen, the recovered epoxy resin is mixed with a ketone compound having 4 to 7 carbon atoms (for example, methyl isobutyl ketone, methyl ethyl ketone, cyclopentanone, cyclohexanone, etc.). ) as a solvent and adding an aqueous solution of an alkali metal hydroxide such as sodium hydroxide or potassium hydroxide to carry out the reaction to ensure ring closure. In this case, the amount of alkali metal hydroxide used is usually 0.01 to 0.3 mol per mole of hydroxyl group of the raw material phenol resin used for epoxidation, the reaction temperature is usually 50 to 120°C, and the reaction time is usually 0.5 to 2 hours.
반응 종료 후, 생성된 염을 여과, 수세 등에 의해 제거하고, 추가로 가열 감압하에 용매를 증류 제거하여 본 발명의 에폭시 수지 혼합물을 얻을 수 있다.After completion of the reaction, the produced salt is removed by filtration, washing with water, etc., and the solvent is further distilled off under heating and reduced pressure to obtain the epoxy resin mixture of the present invention.
본 발명의 에폭시 수지 조성물은 경화제를 함유한다. 사용할 수 있는 경화제로서는 예를 들면 페놀계 경화제, 산무수물계 경화제, 아미드계 경화제, 및 아민계 경화제 등을 들 수 있다.The epoxy resin composition of the present invention contains a curing agent. Examples of curing agents that can be used include phenol-based curing agents, acid anhydride-based curing agents, amide-based curing agents, and amine-based curing agents.
본 발명의 에폭시 수지 조성물에 있어서는 특히 수지 경화물의 내열성이나 열 안정성을 밸런스 좋게 양립할 수 있기 때문에 페놀계 경화제가 바람직하다. 페놀계 경화제로서는 페놀 노볼락 수지, 크레졸 노볼락 수지, 페놀 아랄킬 수지; In the epoxy resin composition of the present invention, a phenol-based curing agent is particularly preferred because it can achieve a good balance of heat resistance and thermal stability of the cured resin. Examples of phenol-based curing agents include phenol novolak resin, cresol novolak resin, and phenol aralkyl resin;
다가 페놀류(비스페놀A, 비스페놀F, 비스페놀S, 플루오렌비스페놀, 테르펜디페놀, 4,4'-디히드록시비페닐, 2,2'-디히드록시비페닐, 3,3',5,5'-테트라메틸-(1,1'-비페닐)-4,4'-디올, 하이드로퀴논, 레졸신, 나프탈렌디올, 트리스-(4-히드록시페닐)메탄 및 1,1,2,2-테트라키스(4-히드록시페닐)에탄 등); 페놀류(예를 들면, 페놀, 알킬 치환 페놀, 나프톨, 알킬 치환 나프톨, 디히드록시벤젠 및 디히드록시나프탈렌 등)과, 알데히드류(포름알데히드, 아세트알데히드, 벤즈알데히드, p-히드록시벤즈알데히드, o-히드록시벤즈알데히드 및 푸르푸랄 등), 케톤류(p-히드록시아세토페논 및 o-히드록시아세토펜논 등) 혹은 디엔류(디시클로디엔디엔 및 트리시클로펜타디엔 등)과의 축합에 의해 얻어지는 페놀 수지; 상기 페놀류와 치환 비페닐류(4,4'-비스(클로르메틸)-1,1'-비페닐 및 4,4'-비스(메톡시메틸)-1,1'-비페닐 등), 혹은 치환 페닐류(1,4-비스(클로로메틸)벤젠, 1,4-비스(메톡시메틸)벤젠 및 1,4-비스(히드록시메틸)벤젠 등과의 중축합에 의해 얻어지는 페놀수지; 상기 페놀류 및/또는 상기 페놀수지의 변성물; 테트라브로모비스페놀A 및 브롬화 수지 등의 할로겐화 페놀류를 들 수 있다.Polyhydric phenols (bisphenol A, bisphenol F, bisphenol S, fluorene bisphenol, terpenediphenol, 4,4'-dihydroxybiphenyl, 2,2'-dihydroxybiphenyl, 3,3', 5,5 '-Tetramethyl-(1,1'-biphenyl)-4,4'-diol, hydroquinone, resorcin, naphthalenediol, tris-(4-hydroxyphenyl)methane and 1,1,2,2- tetrakis(4-hydroxyphenyl)ethane, etc.); Phenols (e.g., phenol, alkyl-substituted phenol, naphthol, alkyl-substituted naphthol, dihydroxybenzene, dihydroxynaphthalene, etc.) and aldehydes (formaldehyde, acetaldehyde, benzaldehyde, p-hydroxybenzaldehyde, o- phenol resins obtained by condensation with hydroxybenzaldehyde, furfural, etc.), ketones (p-hydroxyacetophenone, o-hydroxyacetophenone, etc.), or dienes (dicyclodiendiene, tricyclopentadiene, etc.); The above phenols and substituted biphenyls (4,4'-bis(chloromethyl)-1,1'-biphenyl and 4,4'-bis(methoxymethyl)-1,1'-biphenyl, etc.), or Phenolic resins obtained by polycondensation with substituted phenyls (1,4-bis(chloromethyl)benzene, 1,4-bis(methoxymethyl)benzene, and 1,4-bis(hydroxymethyl)benzene; the above phenols and/or modified products of the above phenol resins; halogenated phenols such as tetrabromobisphenol A and brominated resins.
산 무수물계 경화제로서는 무수프탈산, 무수트리멜리트산, 무수피로멜리트산, 무수말레산, 테트라히드로 무수프탈산, 메틸테트라히드로 무수프탈산, 무수메틸나직산, 헥사히드로 무수프탈산 및 메틸헥사히드로 무수프탈산 등을 들 수 있다.Acid anhydride-based hardeners include phthalic anhydride, trimellitic anhydride, pyromellitic anhydride, maleic anhydride, tetrahydrophthalic anhydride, methyltetrahydrophthalic anhydride, methylnagic anhydride, hexahydrophthalic anhydride, and methylhexahydrophthalic anhydride. I can hear it.
아미드계 경화제로서는 디시안디아미드, 혹은 리놀렌산의 2량체와 에틸렌디아민으로부터 합성되는 폴리아미드 수지 등을 들 수 있다.Examples of the amide-based curing agent include dicyandiamide or a polyamide resin synthesized from a dimer of linolenic acid and ethylenediamine.
아민계 경화제로서는 3,3'-디아미노디페닐술폰(3,3'-DDS), 4,4'-디아미노디페닐술폰(4,4'-DDS), 디아미노디페닐메탄(DDM), 3,3'-디이소프로필-4,4'-디아미노디페닐메탄, 3,3'-디-t-부틸-4,4'-디아미노디페닐메탄, 3,3'-디에틸-5,5'-디메틸-4,4'-디아미노디페닐메탄, 3,3'-디이소프로필-5,5'-디메틸-4,4'-디아미노디페닐메탄, 3,3'-디-t-부틸-5,5'-디메틸-4,4'-디아미노디페닐메탄, 3,3',5,5'-테트라에틸-4,4'-디아미노디페닐메탄, 3,3'-디이소프로필-5,5'-디에틸-4,4'-디아미노디페닐메탄, 3,3'-디-t-부틸-5,5'-디에틸-4,4'-디아미노디페닐메탄, 3,3',5,5'-테트라이소프로필-4,4'-디아미노디페닐메탄, 3,3'-디-t-부틸-5,5'-디이소프로필-4,4'-디아미노디페닐메탄, 3,3',5,5'-테트라-t-부틸-4,4'-디아미노디페닐메탄, 디아미노디페닐에테르(DADPE), 비스아닐린, 벤질디메틸아닐린, 2-(디메틸아미노메틸)페놀(DMP-10), 2,4,6-트리스(디메틸아미노메틸)페놀(DMP-30), 2,4,6-트리스(디메틸아미노메틸)페놀의 2-에틸헥산산에스테르 등을 사용할 수 있다. 또한, 아닐린 노볼락, 오르토에틸아닐린 노볼락, 아닐린과 크실릴렌 클로라이드의 반응에 의해 얻어지는 아닐린 수지, 아닐린과 치환 비페닐류(4,4'-비스(클로르메틸)-1,1'-비페닐 및 4,4'-비스(메톡시메틸)-1,1'-비페닐 등), 혹은 치환 페닐류(1,4-비스(클로로메틸)벤젠, 1,4-비스(메톡시메틸)벤젠 및 1,4-비스(히드록시메틸)벤젠 등) 등과의 중축합에 의해 얻어지는 아닐린 수지 등을 들 수 있다.Amine-based hardeners include 3,3'-diaminodiphenylsulfone (3,3'-DDS), 4,4'-diaminodiphenylsulfone (4,4'-DDS), and diaminodiphenylmethane (DDM). , 3,3'-diisopropyl-4,4'-diaminodiphenylmethane, 3,3'-di-t-butyl-4,4'-diaminodiphenylmethane, 3,3'-diethyl -5,5'-dimethyl-4,4'-diaminodiphenylmethane, 3,3'-diisopropyl-5,5'-dimethyl-4,4'-diaminodiphenylmethane, 3,3' -di-t-butyl-5,5'-dimethyl-4,4'-diaminodiphenylmethane, 3,3',5,5'-tetraethyl-4,4'-diaminodiphenylmethane, 3 ,3'-Diisopropyl-5,5'-diethyl-4,4'-diaminodiphenylmethane, 3,3'-di-t-butyl-5,5'-diethyl-4,4' -Diaminodiphenylmethane, 3,3',5,5'-tetraisopropyl-4,4'-diaminodiphenylmethane, 3,3'-di-t-butyl-5,5'-diiso Propyl-4,4'-diaminodiphenylmethane, 3,3',5,5'-tetra-t-butyl-4,4'-diaminodiphenylmethane, diaminodiphenyl ether (DADPE), bis Aniline, benzyldimethylaniline, 2-(dimethylaminomethyl)phenol (DMP-10), 2,4,6-tris(dimethylaminomethyl)phenol (DMP-30), 2,4,6-tris(dimethylaminomethyl) ) 2-ethylhexanoic acid ester of phenol, etc. can be used. In addition, aniline novolac, orthoethylaniline novolac, aniline resin obtained by reaction of aniline and xylylene chloride, aniline and substituted biphenyls (4,4'-bis(chloromethyl)-1,1'-bi phenyl and 4,4'-bis(methoxymethyl)-1,1'-biphenyl, etc.), or substituted phenyls (1,4-bis(chloromethyl)benzene, 1,4-bis(methoxymethyl) and aniline resins obtained by polycondensation with benzene, 1,4-bis(hydroxymethyl)benzene, etc.
본 발명의 에폭시 수지 조성물에 있어서 경화제의 사용량은 에폭시 수지의 에폭시기 1 당량에 대하여 0.7 ~ 1.2 당량이 바람직하다. 에폭시기 1 당량에 대하여 0.7 당량에 미치지 않는 경우, 혹은 1.2 당량을 초과하는 경우, 모두 경화가 불완전해져 양호한 경화물성이 얻어지지 않을 우려가 있다.In the epoxy resin composition of the present invention, the amount of curing agent used is preferably 0.7 to 1.2 equivalents per equivalent of epoxy group of the epoxy resin. If the amount is less than 0.7 equivalents based on 1 equivalent of the epoxy group, or if it exceeds 1.2 equivalents, there is a risk that curing will be incomplete and good cured properties may not be obtained.
또한, 본 발명의 에폭시 수지 조성물에 있어서는 필요에 따라 경화 촉진제를 배합해도 된다. 경화 촉진제를 사용함으로써 겔화 시간을 조정할 수도 있다. 사용할 수 있는 경화 촉진제의 예로는 2-메틸이미다졸, 2-에틸이미다졸, 2-에틸-4-메틸이미다졸 등의 이미다졸류, 2-(디메틸아미노메틸)페놀, 1,8-디아자-비시클로(5,4,0) 운데센-7 등의 제3급 아민류, 트리페닐포스핀 등의 포스핀류, 옥틸산주석 등의 금속 화합물을 들 수 있다. 경화 촉진제는 에폭시 수지 100 중량부에 대하여 0.01 ~ 5.0 중량부가 필요에 따라 사용된다.Additionally, in the epoxy resin composition of the present invention, a curing accelerator may be added as needed. The gelation time can also be adjusted by using a curing accelerator. Examples of curing accelerators that can be used include imidazoles such as 2-methylimidazole, 2-ethylimidazole, and 2-ethyl-4-methylimidazole, 2-(dimethylaminomethyl)phenol, and 1,8 -tertiary amines such as diaza-bicyclo(5,4,0)undecene-7, phosphines such as triphenylphosphine, and metal compounds such as tin octylate. The curing accelerator is used in an amount of 0.01 to 5.0 parts by weight based on 100 parts by weight of the epoxy resin.
본 발명의 에폭시 수지 조성물에 있어서는 다른 에폭시 수지를 배합해도 되고, 구체예로서는 페놀류(페놀, 알킬 치환 페놀, 방향족 치환 페놀, 나프톨, 알킬 치환 나프톨, 디히드록시벤젠, 알킬 치환 디히드록시벤젠, 디히드록시나프탈렌 등)과 각종 알데히드(포름알데히드, 아세트알데히드, 알킬알데히드, 벤즈알데히드, 알킬 치환 벤즈알데히드, 히드록시벤즈알데히드, 나프트알데히드, 글루타르알데히드, 프탈알데히드, 크로톤알데히드, 신남알데히드 등)과의 중축합물, 페놀류와 각종 디엔 화합물(디시클로펜타디엔, 테르펜류, 비닐시클로헥센, 노르보르나디엔, 비닐노르보르넨, 테트라히드로인덴, 디비닐벤젠, 디비닐비페닐, 디이소프로페닐비페닐, 부타디엔, 이소프렌 등)과의 중합물, 페놀류와 케톤류(아세톤, 메틸에틸케톤, 메틸이소부틸케톤, 아세토페논, 벤조페논 등)와의 중축합물, 페놀류와 치환 비페닐류(4,4'-비스(클로르메틸)-1,1'-비페닐 및 4,4'-비스(메톡시메틸)-1,1'-비페닐 등), 혹은 치환 페닐류(1,4-비스(클로로메틸)벤젠, 1,4-비스(메톡시메틸)벤젠 및 1,4-비스(히드록시메틸) 벤젠 등) 등과의 중축합에 의해 얻어지는 페놀 수지, 비스페놀류와 각종 알데히드의 중축합물, 알코올류 등을 글리시딜화한 글리시딜에테르계 에폭시 수지, 4-비닐-1-시클로헥센디에폭사이드나 3, 4-에폭시시클로헥실메틸-3,4'-에폭시시클로헥산카르복실레이트 등을 대표로 하는 지환식 에폭시 수지, 테트라글리시딜디아미노디페닐메탄(TGDDM)이나 트리글리시딜-p-아미노페놀 등을 대표로 하는 글리시딜아민계 에폭시 수지, 글리시딜에스테르계 에폭시 수지 등을 들 수 있지만, 통상 사용되는 에폭시 수지이면 이들에 한정되는 것은 아니다.In the epoxy resin composition of the present invention, other epoxy resins may be blended, and specific examples include phenols (phenol, alkyl-substituted phenol, aromatic-substituted phenol, naphthol, alkyl-substituted naphthol, dihydroxybenzene, alkyl-substituted dihydroxybenzene, dihyde Polycondensates of aldehydes (formaldehyde, acetaldehyde, alkylaldehyde, benzaldehyde, alkyl-substituted benzaldehyde, hydroxybenzaldehyde, naphthaldehyde, glutaraldehyde, phthalaldehyde, crotonaldehyde, cinnamaldehyde, etc.), Phenols and various diene compounds (dicyclopentadiene, terpenes, vinylcyclohexene, norbornadiene, vinylnorbornene, tetrahydroindene, divinylbenzene, divinylbiphenyl, diisopropenylbiphenyl, butadiene , isoprene, etc.), polycondensates of phenols and ketones (acetone, methyl ethyl ketone, methyl isobutyl ketone, acetophenone, benzophenone, etc.), phenols and substituted biphenyls (4,4'-bis(chlormethyl )-1,1'-biphenyl and 4,4'-bis(methoxymethyl)-1,1'-biphenyl, etc.), or substituted phenyls (1,4-bis(chloromethyl)benzene, 1, Phenolic resins obtained by polycondensation with 4-bis(methoxymethyl)benzene and 1,4-bis(hydroxymethyl)benzene, etc., polycondensates of bisphenols and various aldehydes, glycidylated alcohols, etc. Glycidyl ether-based epoxy resins, alicyclic epoxy resins such as 4-vinyl-1-cyclohexene diepoxide and 3,4-epoxycyclohexylmethyl-3,4'-epoxycyclohexanecarboxylate, Examples include glycidylamine-based epoxy resins, such as tetraglycidyldiaminodiphenylmethane (TGDDM) and triglycidyl-p-aminophenol, and glycidyl ester-based epoxy resins, but commonly used If it is an epoxy resin, it is not limited to these.
본 발명의 에폭시 수지 조성물에는 필요에 따라 공지의 첨가제를 배합할 수 있다. 사용할 수 있는 첨가제의 구체예로서는 폴리부타디엔 및 이 변성물, 아크릴로니트릴 공중합체의 변성물, 폴리페닐렌에테르, 폴리스티렌, 폴리에틸렌, 폴리이미드, 불소 수지, 말레이미드계 화합물, 시아네이트에스테르계 화합물, 실리콘 겔, 실리콘 오일, 및 실리카, 알루미나, 탄산칼슘, 석영 분말, 알루미늄 분말, 흑연, 활석, 점토, 산화철, 산화티탄, 질화알루미늄, 석면, 운모, 유리 분말 등의 무기 충전재, 실란 커플링제와 같은 충전재의 표면 처리제, 이형제, 카본 블랙, 프탈로시아닌 블루, 프탈로시아닌 그린 등의 착색제를 들 수 있다.Known additives can be added to the epoxy resin composition of the present invention as needed. Specific examples of additives that can be used include polybutadiene and its modified products, modified products of acrylonitrile copolymer, polyphenylene ether, polystyrene, polyethylene, polyimide, fluororesin, maleimide-based compounds, cyanate ester-based compounds, and silicone. Gel, silicone oil, inorganic fillers such as silica, alumina, calcium carbonate, quartz powder, aluminum powder, graphite, talc, clay, iron oxide, titanium oxide, aluminum nitride, asbestos, mica, glass powder, fillers such as silane coupling agent. surface treatment agents, mold release agents, and colorants such as carbon black, phthalocyanine blue, and phthalocyanine green.
본 발명의 에폭시 수지 조성물에는 필요에 따라 공지의 말레이미드계 화합물을 배합할 수 있다. 사용할 수 있는 말레이미드 화합물의 구체예로서는 4,4'-디페닐메탄비스말레이미드, 폴리페닐메탄말레이미드, m-페닐렌비스말레이미드, 2,2'-비스[4-(4-말레이미드페녹시)페닐]프로판, 3,3'-디메틸-5,5'-디에틸-4,4'-디페닐메탄비스말레이미드, 4-메틸-1,3-페닐렌비스말레이미드, 4,4'-디페닐에테르비스말레이미드, 4,4'-디페닐술폰비스말레이미드, 1,3-비스(3-말레이미드페녹시)벤젠, 1,3-비스(4-말레이미드페녹시)벤젠 등을 들 수 있지만, 이들에 한정되는 것은 아니다. 이들은 단독으로 사용해도 되고, 2종 이상 병용해도 된다. 말레이미드계 화합물을 배합할 때는 필요에 따라 경화 촉진제를 배합하지만, 상기 경화 촉진제나, 유기 과산화물, 아조 화합물 등의 라디칼 중합 개시제 등 사용할 수 있다.Known maleimide-based compounds can be blended into the epoxy resin composition of the present invention as needed. Specific examples of maleimide compounds that can be used include 4,4'-diphenylmethanebismaleimide, polyphenylmethanemaleimide, m-phenylenebismaleimide, 2,2'-bis[4-(4-maleimidephenoc) C) phenyl] propane, 3,3'-dimethyl-5,5'-diethyl-4,4'-diphenylmethane bismaleimide, 4-methyl-1,3-phenylenebismaleimide, 4,4 '-Diphenyletherbismaleimide, 4,4'-diphenylsulfonebismaleimide, 1,3-bis(3-maleimidephenoxy)benzene, 1,3-bis(4-maleimidephenoxy)benzene These may be mentioned, but are not limited to these. These may be used individually, or two or more types may be used together. When blending a maleimide-based compound, a curing accelerator is blended as needed; however, the curing accelerator described above or a radical polymerization initiator such as an organic peroxide or an azo compound can be used.
본 발명의 에폭시 수지 조성물은 유기 용제를 첨가하여 바니시 형상의 조성물(이하, 간단히 바니시라고 한다.)로 할 수 있다. 사용되는 용제로서는 예를 들면 γ-부티로락톤류, N-메틸피롤리돈, N,N-디메틸포름아미드, N,N-디메틸아세트아미드, N,N-디메틸이미다졸리디논 등의 아미드계 용제, 테트라메틸렌술폰 등의 술폰류, 디에틸렌글리콜디메틸에테르, 디에틸렌글리콜디에틸에테르, 프로필렌글리콜, 프로필렌글리콜모노메틸에테르, 프로필렌글리콜모노메틸에테르모노아세테이트, 프로필렌글리콜모노부틸에테르 등의 에테르계 용제, 메틸에틸케톤, 메틸이소부틸케톤, 시클로펜타논, 시클로헥사논 등의 케톤계 용제, 톨루엔, 크실렌 등의 방향족계 용제를 들 수 있다. 용제는 얻어진 바니시 중의 용제를 제외한 고형분 농도가 통상 10 ~ 80중량%, 바람직하게는 20 ~ 70중량%가 되는 범위에서 사용한다.The epoxy resin composition of the present invention can be made into a varnish-like composition (hereinafter simply referred to as varnish) by adding an organic solvent. Solvents used include, for example, amides such as γ-butyrolactone, N-methylpyrrolidone, N,N-dimethylformamide, N,N-dimethylacetamide, and N,N-dimethylimidazolidinone. Solvents, sulfones such as tetramethylene sulfone, ether solvents such as diethylene glycol dimethyl ether, diethylene glycol diethyl ether, propylene glycol, propylene glycol monomethyl ether, propylene glycol monomethyl ether monoacetate, and propylene glycol monobutyl ether. , ketone solvents such as methyl ethyl ketone, methyl isobutyl ketone, cyclopentanone, and cyclohexanone, and aromatic solvents such as toluene and xylene. The solvent is used in a range where the solid content concentration excluding the solvent in the obtained varnish is usually 10 to 80% by weight, preferably 20 to 70% by weight.
이어서, 본 발명의 경화물, 수지 시트, 프리프레그, FRP를 설명한다.Next, the cured product, resin sheet, prepreg, and FRP of the present invention will be explained.
본 발명의 에폭시 수지 조성물을 지지 기재의 한면 또는 양면에 도포하여 수지 시트로서 사용해도 된다. 도포 방법으로서는 예를 들어, 주형법, 펌프나 압출기 등에 의해 수지를 노즐이나 다이스로부터 압출하여 블레이드로 두께를 조정하는 방법, 롤에 의해 캘린더 가공하여 두께를 조정하는 방법, 스프레이 등을 사용하여 분무하는 방법 등을 들 수 있다. 또한, 층을 형성하는 공정에 있어서는 에폭시 수지 조성물의 열분해를 회피 가능한 온도 범위에서 가열하면서 행해도 된다. 또한, 필요에 따라 압연 처리, 연삭 처리 등을 실시해도 된다. 지지 기재로서는 예를 들면 종이, 천, 부직포 등으로 이루어지는 다공질 기재, 폴리에틸렌, 폴리프로필렌, 폴리에틸렌테레프탈레이트, 폴리에스테르 필름 등의 플라스틱 필름 혹은 시트, 네트, 발포체, 금속박, 및 이들의 라미네이트체 등의 적절한 박엽체 등을 들 수 있지만, 이들에 한정되는 것은 아니다. 지지 기재에 두께는 특별히 제한되지 않고, 용도에 따라 적절히 결정된다.The epoxy resin composition of the present invention may be applied to one or both sides of a support substrate and used as a resin sheet. Application methods include, for example, a molding method, a method of extruding resin from a nozzle or die using a pump or extruder and adjusting the thickness with a blade, a method of adjusting the thickness by calendering with a roll, or spraying using a spray, etc. Methods, etc. may be mentioned. Additionally, in the step of forming the layer, the epoxy resin composition may be performed while being heated in a temperature range that can avoid thermal decomposition. Additionally, rolling treatment, grinding treatment, etc. may be performed as needed. Examples of the supporting substrate include porous substrates made of paper, cloth, non-woven fabric, etc., plastic films such as polyethylene, polypropylene, polyethylene terephthalate, and polyester films, or sheets, nets, foams, metal foils, and laminates thereof. Thin leaf bodies and the like can be mentioned, but are not limited to these. The thickness of the support base material is not particularly limited and is appropriately determined depending on the intended use.
본 발명의 에폭시 수지 조성물 및/또는 수지 시트를 가열 용융하여 저점도화하여 섬유 기재에 함침시킴으로써 본 발명의 프리프레그를 얻을 수 있다.The prepreg of the present invention can be obtained by heating and melting the epoxy resin composition and/or the resin sheet of the present invention to lower the viscosity and impregnating the fiber base material.
또한, 바니시 형상의 에폭시 수지 조성물을 섬유 기재에 함침시켜 가열 건조시킴으로써 본 발명의 프리프레그를 얻을 수도 있다. 상기 프리프레그를 원하는 형태로 재단, 적층 후, 적층물에 프레스 성형법이나 오토클레이브 성형법, 시트 와인딩 성형법 등으로 압력을 가하면서 에폭시 수지 조성물을 가열 경화시킴으로써 본 발명의 FRP를 얻을 수 있다. 또한, 프리프레그의 적층시에 구리박이나 유기 필름을 적층할 수도 있다.Additionally, the prepreg of the present invention can be obtained by impregnating a fiber base with a varnish-like epoxy resin composition and heating and drying it. After cutting and laminating the prepreg into the desired shape, the FRP of the present invention can be obtained by heat-curing the epoxy resin composition while applying pressure to the laminate using a press molding method, autoclave molding method, sheet winding molding method, etc. Additionally, copper foil or organic film can also be laminated when lamination of the prepreg.
나아가, 본 발명의 FRP의 성형 방법은 상기의 방법 외에 공지의 방법으로 성형하여 얻을 수도 있다. 예를 들면, 탄소 섬유 기재(통상, 탄소 섬유 직물을 사용)를 재단, 적층, 부형하여 프리폼(수지를 함침하기 전의 예비 성형체)을 제작, 프리폼을 성형형 내에 배치하여 형을 닫고 수지를 주입하여 프리폼으로 함침, 경화시킨 후, 형을 열어 성형품을 꺼내는 레진트랜스퍼 성형기술(RTM법)을 이용할 수도 있다.Furthermore, the FRP molding method of the present invention can be obtained by molding by a known method other than the above method. For example, a carbon fiber base material (usually carbon fiber fabric is used) is cut, laminated, and shaped to produce a preform (a preform before impregnating resin), the preform is placed in a mold, the mold is closed, and resin is injected. You can also use resin transfer molding technology (RTM method), which involves impregnating and curing the preform, then opening the mold and taking out the molded product.
또, RTM법의 일종인, 예를 들면, VaRTM법, SCRIMP(Seeman's Composite Resin Infusion Molding Process)법, 일본 특표 2005-527410에 기재된 수지 공급 탱크를 대기압 보다도 낮은 압력까지 배기하고, 순환압축을 이용하고 또한 순 성형 압력을 제어함으로써 수지 주입 공정, 특히 VaRTM법을 보다 적절하게 제어하는 CAPRI(Controlled Atmosphereic Pressure Resin Infusion)법 등도 사용할 수 있다.In addition, a type of RTM method, such as VaRTM method, SCRIMP (Seeman's Composite Resin Infusion Molding Process) method, and the resin supply tank described in Japanese Patent Application No. 2005-527410 is evacuated to a pressure lower than atmospheric pressure and circular compression is used. In addition, the CAPRI (Controlled Atmosphereic Pressure Resin Infusion) method can be used to more appropriately control the resin injection process, especially the VaRTM method, by controlling the net molding pressure.
나아가, 섬유 기재를 수지 시트(필름)에 끼우는 필름 스태킹법이나, 함침 향상을 위해 강화 섬유 기재에 파우더 형상의 수지를 부착시키는 방법, 섬유 기재에 수지를 혼합하는 과정에서 유동층 혹은 유체 슬러리법을 이용하는 성형 방법(Powder Impregnated Yarn), 섬유 기재에 수지 섬유를 혼섬시키는 방법도 사용할 수 있다.Furthermore, a film stacking method of inserting a fiber base into a resin sheet (film), a method of attaching powder-like resin to a reinforced fiber base to improve impregnation, and a fluidized bed or fluid slurry method in the process of mixing the resin into the fiber base. A molding method (Powder Impregnated Yarn) or a method of mixing resin fibers into a fiber substrate can also be used.
탄소 섬유로서는 아크릴계, 피치계, 레이온계 등의 탄소 섬유를 들 수 있고, 그 중에서도 인장 강도가 높은 아크릴계의 탄소 섬유가 바람직하게 사용된다. 탄소 섬유의 형태로서는 유연사, 해연사 및 무연사 등을 사용할 수 있지만, 섬유 강화 복합 재료의 성형성과 강도 특성의 밸런스가 좋기 때문에 해연사 또는 무연사가 바람직하게 사용된다.Examples of carbon fibers include acrylic-based, pitch-based, and rayon-based carbon fibers, and among them, acrylic-based carbon fibers with high tensile strength are preferably used. As the form of carbon fiber, flexible yarns, untwisted yarns, and untwisted yarns can be used, but since the formability and strength characteristics of the fiber-reinforced composite material are well balanced, natural twisted yarns or untwisted yarns are preferably used.
실 시 예Example
이하에 실시예를 들어 본 발명을 더욱 구체적으로 설명한다. 이하에 나타내는 재료, 처리 내용, 처리 순서 등은 본 발명의 취지를 일탈하지 않는 한 적절하게 변경할 수 있다. 따라서, 본 발명의 범위는 이하에 나타내는 구체예에 의해 한정적으로 해석되는 것은 아니다.The present invention will be described in more detail below with reference to examples. The materials, processing content, processing sequence, etc. shown below can be changed appropriately as long as they do not deviate from the spirit of the present invention. Accordingly, the scope of the present invention is not to be construed as limited by the specific examples shown below.
각종 분석 방법에 대하여 이하의 조건으로 행하였다.Various analysis methods were performed under the following conditions.
ㆍ에폭시 당량ㆍEpoxy equivalent
JIS K-7236에 기재된 방법으로 측정하고, 단위는 g/eq.이다.Measured by the method described in JIS K-7236, and the unit is g/eq.
ㆍ연화점ㆍYeonhwa branch
JIS K-7234에 준거한 방법으로 측정하고, 단위는 ℃이다.Measured by a method based on JIS K-7234, the unit is ℃.
ㆍ용융 점도ㆍMel viscosity
ICI 용융 점도(150℃) 콘플레이트법으로 측정하고, 단위는 Pa·s이다.ICI melt viscosity (150°C) is measured by the corn plate method, and the unit is Pa·s.
ㆍGPC(겔 투과 크로마토그래피) 분석ㆍGPC (Gel Permeation Chromatography) analysis
메이커: WatersMaker: Waters
장치: alliance waters e2695Device: waters alliance e2695
컬럼: 가드컬럼 SHODEX GPC KF-601 (2 개), KF-602 KF-602.5, KF-603Column: Guard column SHODEX GPC KF-601 (2 pcs.), KF-602 KF-602.5, KF-603
유속: 1.23ml/min.Flow rate: 1.23ml/min.
컬럼 온도: 25℃Column temperature: 25℃
사용 용제: THF(테트라히드로푸란)Solvent used: THF (tetrahydrofuran)
검출기: RI(시차 굴절 검출기)Detector: RI (parallel refraction detector)
ㆍGC(가스 크로마토그래피) 분석ㆍGC (gas chromatography) analysis
제조사: 애질런트·테크놀로지 주식회사Manufacturer: Agilent Technology Co., Ltd.
장치: HP6890Device: HP6890
컬럼: DB-5HT 30m - 0.25mm - 0.10μmColumn: DB-5HT 30m - 0.25mm - 0.10μm
캐리어 가스: He 1.2mL/min.Carrier gas: He 1.2mL/min.
오븐: 150℃-10℃/min. -350℃(40min.)Oven: 150℃-10℃/min. -350℃(40min.)
주입구: split(30:1), 330℃Inlet: split(30:1), 330℃
검출기: FIDDetector: FID
검출기 온도: 350℃Detector temperature: 350℃
[실시예 1][Example 1]
교반기, 환류 냉각관, 교반 장치를 구비한 플라스크에 페놀 195 중량부, 플레이크 형상의 수산화나트륨 50 중량부, 메탄올 20 중량부, 톨루엔 40 중량부를 투입하고, 교반, 용해 후, 가열하여 온도를 100℃로 유지하면서 4,4'-비스클로로메틸비페닐 151중량부를 4시간에 걸쳐 연속적으로 첨가하였다. 첨가 종료 후, p-톨루엔술폰산을 11 중량부 첨가하고, 같은 온도에서 추가로 3 시간 반응을 행하였다. 반응 종료 후, 수세에 의해 부생하는 염화나트륨을 제거하고, 오일층으로부터 가열 감압 하에서 과잉의 페놀을 증류 제거하고, 잔류물에 400 중량부의 메틸이소부틸케톤을 첨가하여 용해하였다. 이 수지 용액을 세정액이 중성이 될 때까지 수세를 반복한 후, 유층으로부터 가열 감압 하에서 메틸이소부틸케톤을 증류 제거함으로써 페놀 수지(P1) 180중량부를 얻었다.195 parts by weight of phenol, 50 parts by weight of flake-shaped sodium hydroxide, 20 parts by weight of methanol, and 40 parts by weight of toluene were added to a flask equipped with a stirrer, reflux condenser, and stirring device, stirred, dissolved, and heated to bring the temperature to 100°C. While maintaining , 151 parts by weight of 4,4'-bischloromethylbiphenyl was added continuously over 4 hours. After the addition was completed, 11 parts by weight of p-toluenesulfonic acid was added, and reaction was performed for an additional 3 hours at the same temperature. After completion of the reaction, by-producing sodium chloride was removed by washing with water, excess phenol was distilled off from the oil layer under heating and reduced pressure, and 400 parts by weight of methyl isobutyl ketone was added to the residue to dissolve it. After repeatedly washing this resin solution with water until the washing liquid became neutral, methyl isobutyl ketone was distilled off from the oil layer under heating and reduced pressure to obtain 180 parts by weight of phenol resin (P1).
[실시예 2][Example 2]
실시예 1에서 얻어진 페놀 수지(P1) 107 중량부에 대하여 에피클로로히드린 230 중량부, 디메틸술폭사이드 60 중량부를 반응 용기에 투입하고, 가열, 교반, 용해 후, 온도를 45℃로 유지하면서 플레이크 형상의 수산화나트륨 21 중량부를 2시간에 걸쳐 연속적으로 첨가하였다. 수산화나트륨 첨가 완료 후, 45℃에서 2시간, 70℃에서 1시간 더 반응을 행하였다. 이어서 수세를 반복하고, 부성염과 디메틸술폭시드를 제거한 후, 유층으로부터 가열 감압 하에서 과잉의 에피클로로히드린을 증류 제거하고, 잔류물에 300중량부의 메틸이소부틸케톤을 첨가하여 용해하였다. 이 메틸이소부틸케톤 용액을 70℃로 가열하고, 30% 수산화나트륨 수용액 10중량부를 첨가하고, 1시간 반응시킨 후, 반응액의 수세를 세정액이 중성이 될 때까지 반복하였다. 이어서, 유층으로부터 가열 감압 하에서 메틸이소부틸케톤을 증류 제거함으로써 에폭시 수지 혼합물(EP1) 130중량부를 얻었다. 에폭시 수지 혼합물(EP1)의 GPC 차트를 도 1에 나타낸다. 에폭시 수지 혼합물(EP1)의 에폭시 당량은 312g/eq., 연화점이 66.9℃, ICI 용융 점도 0.25Pa·s(150℃)였다. GC 분석에 있어서, 상기 식(1)의 n이 1인 에폭시 수지(도 4A의 24.8분, 26.5분, 28.4분의 피크)의 함유량을 100면적%로 했을 때, 상기 식(2)로 표시되는 에폭시 화합물(도 4A의 21.1분, 22.1분의 피크)의 함유량은 6.0면적%였다.With respect to 107 parts by weight of the phenol resin (P1) obtained in Example 1, 230 parts by weight of epichlorohydrin and 60 parts by weight of dimethyl sulfoxide were added to a reaction vessel, and after heating, stirring, and dissolution, flakes were formed while maintaining the temperature at 45°C. 21 parts by weight of sodium hydroxide was added continuously over 2 hours. After the addition of sodium hydroxide was completed, the reaction was performed at 45°C for 2 hours and at 70°C for an additional hour. Subsequently, washing with water was repeated to remove the passive salt and dimethyl sulfoxide, and then excess epichlorohydrin was distilled off from the oil layer under heating and reduced pressure, and 300 parts by weight of methyl isobutyl ketone was added to the residue to dissolve it. This methyl isobutyl ketone solution was heated to 70°C, 10 parts by weight of 30% aqueous sodium hydroxide solution was added, and the mixture was allowed to react for 1 hour. After that, the reaction solution was repeatedly washed with water until the washing solution became neutral. Next, 130 parts by weight of the epoxy resin mixture (EP1) was obtained by distilling methyl isobutyl ketone from the oil layer under heating and reduced pressure. The GPC chart of the epoxy resin mixture (EP1) is shown in Figure 1. The epoxy equivalent weight of the epoxy resin mixture (EP1) was 312 g/eq., the softening point was 66.9°C, and the ICI melt viscosity was 0.25 Pa·s (150°C). In the GC analysis, when the content of the epoxy resin (peaks at 24.8 minutes, 26.5 minutes, and 28.4 minutes in Figure 4A) in which n in the formula (1) is 1 is 100 area%, The content of the epoxy compound (peaks at 21.1 and 22.1 minutes in Fig. 4A) was 6.0 area%.
[실시예 3][Example 3]
실시예 1에 있어서, 톨루엔을 20 중량부로 한 것 이외에는 실시예 1과 동일하게 합성한 페놀 수지(P3) 107 중량부에 대하여 에피클로로히드린 230 중량부, 디메틸술폭시드 60 중량부를 반응 용기에 투입하고, 가열, 교반, 용해 후, 온도를 45℃로 유지하면서 플레이크 형상의 수산화나트륨 21 중량부를 2시간에 걸쳐 연속적으로 첨가하였다. 수산화나트륨 첨가 완료 후, 45℃에서 2시간, 70℃에서 1시간 더 반응을 행하였다. 이어서 수세를 반복하고, 부성염과 디메틸술폭시드를 제거한 후, 유층으로부터 가열 감압 하에서 과잉의 에피클로로히드린을 증류 제거하고, 잔류물에 300중량부의 메틸이소부틸케톤을 첨가하여 용해하였다. 이 메틸이소부틸케톤 용액을 70℃로 가열하고, 30% 수산화나트륨 수용액 10중량부를 첨가하고, 1시간 반응시킨 후, 반응액의 수세를 세정액이 중성이 될 때까지 반복하였다. 이어서, 유층으로부터 가열 감압 하에서 메틸이소부틸케톤을 증류 제거함으로써 에폭시 수지 혼합물(EP2) 133 중량부를 얻었다. 에폭시 수지 혼합물(EP2)의 GPC 차트를 도 2에 나타낸다. 에폭시 수지 혼합물(EP2)의 에폭시 당량은 296g/eq., 연화점이 69.8℃, ICI 용융 점도 0.33Pa·s(150℃)였다. GC 분석에서 상기 식(1)의 n이 1인 에폭시 수지(도 4B의 24.9분, 26.5분, 28.3분의 피크)의 함유량을 100면적%로 했을 때 상기 식(2)로 표시되는 에폭시 화합물(도 4A의 21.1분, 22.1분의 피크)의 함유량은 3.5면적%였다.In Example 1, 230 parts by weight of epichlorohydrin and 60 parts by weight of dimethyl sulfoxide were added to the reaction vessel for 107 parts by weight of phenol resin (P3) synthesized in the same manner as in Example 1 except that toluene was used in an amount of 20 parts by weight. After heating, stirring, and dissolving, 21 parts by weight of flake-shaped sodium hydroxide was added continuously over 2 hours while maintaining the temperature at 45°C. After the addition of sodium hydroxide was completed, the reaction was performed at 45°C for 2 hours and at 70°C for an additional hour. Subsequently, washing with water was repeated to remove the passive salt and dimethyl sulfoxide, and then excess epichlorohydrin was distilled off from the oil layer under heating and reduced pressure, and 300 parts by weight of methyl isobutyl ketone was added to the residue to dissolve it. This methyl isobutyl ketone solution was heated to 70°C, 10 parts by weight of 30% aqueous sodium hydroxide solution was added, and the mixture was allowed to react for 1 hour. After that, the reaction solution was repeatedly washed with water until the washing solution became neutral. Next, methyl isobutyl ketone was distilled off from the oil layer under heating and reduced pressure to obtain 133 parts by weight of an epoxy resin mixture (EP2). The GPC chart of the epoxy resin mixture (EP2) is shown in Figure 2. The epoxy equivalent weight of the epoxy resin mixture (EP2) was 296 g/eq., the softening point was 69.8°C, and the ICI melt viscosity was 0.33 Pa·s (150°C). In GC analysis, when the content of the epoxy resin (peaks at 24.9 minutes, 26.5 minutes, and 28.3 minutes in Figure 4B) with n of the formula (1) is 1 is 100 area%, the epoxy compound represented by the formula (2) ( The content of peaks at 21.1 and 22.1 minutes in Figure 4A was 3.5 area%.
[합성예 1][Synthesis Example 1]
실시예 1에 있어서, 톨루엔을 0 중량부로 한 것 이외에는 동일하게 하여 합성한 페놀 수지(P2) 107 중량부에 대하여 에피클로로히드린 230 중량부, 디메틸술폭시드 60 중량부를 반응 용기에 투입하여 가열, 교반, 용해 후, 온도를 45℃로 유지하면서 플레이크 형상의 수산화나트륨 21 중량부를 2시간에 걸쳐 연속적으로 첨가하였다. 수산화나트륨 첨가 완료 후, 45℃에서 2시간, 70℃에서 1시간 더 반응을 행하였다. 이어서 수세를 반복하고, 부성염과 디메틸술폭시드를 제거한 후, 유층으로부터 가열 감압 하에서 과잉의 에피클로로히드린을 증류 제거하고, 잔류물에 300중량부의 메틸이소부틸케톤을 첨가하여 용해하였다. 이 메틸이소부틸케톤 용액을 70℃로 가열하고, 30% 수산화나트륨 수용액 10 중량부를 첨가하고, 1시간 반응시킨 후, 반응액의 수세를 세정액이 중성이 될 때까지 반복하였다. 이어서, 유층으로부터 가열 감압 하에서 메틸이소부틸케톤을 증류 제거함으로써 에폭시 수지(EP3) 135중량부를 얻었다. 에폭시 수지(EP3)의 GPC 차트를 도 3에 나타낸다. 에폭시 수지(EP3)의 에폭시 당량은 288g/eq., 연화점이 68℃, ICI 용융 점도 0.30Pa·s(150℃)였다. GC 분석에서 상기 화학식 2로 표시되는 에폭시 화합물은 검출 한계 이하였다(도 4C의 21.1분, 22.1분 주변의 피크).In Example 1, 230 parts by weight of epichlorohydrin and 60 parts by weight of dimethyl sulfoxide were added to a reaction vessel for 107 parts by weight of phenol resin (P2) synthesized in the same manner except that 0 parts by weight of toluene was added and heated. After stirring and dissolving, 21 parts by weight of flake-shaped sodium hydroxide was continuously added over 2 hours while maintaining the temperature at 45°C. After the addition of sodium hydroxide was completed, the reaction was performed at 45°C for 2 hours and at 70°C for an additional hour. Subsequently, washing with water was repeated to remove the passive salt and dimethyl sulfoxide, and then excess epichlorohydrin was distilled off from the oil layer under heating and reduced pressure, and 300 parts by weight of methyl isobutyl ketone was added to the residue to dissolve it. This methyl isobutyl ketone solution was heated to 70°C, 10 parts by weight of 30% aqueous sodium hydroxide solution was added, and the reaction was allowed to proceed for 1 hour. After this, the reaction solution was repeatedly washed with water until the washing solution became neutral. Next, 135 parts by weight of epoxy resin (EP3) was obtained by distilling methyl isobutyl ketone from the oil layer under heating and reduced pressure. The GPC chart of epoxy resin (EP3) is shown in Figure 3. The epoxy equivalent of the epoxy resin (EP3) was 288 g/eq., the softening point was 68°C, and the ICI melt viscosity was 0.30 Pa·s (150°C). In GC analysis, the epoxy compound represented by Formula 2 was below the detection limit (peaks around 21.1 and 22.1 minutes in Figure 4C).
[실시예 4, 5, 비교예 1][Examples 4, 5, Comparative Example 1]
에폭시 수지 혼합물(EP1, EP2), 에폭시 수지(EP3)를 각각 주제로 하고, 경화제로서 페놀 노볼락(약칭; PN, 수산기 당량 103g/eq.), 경화 촉진제로서 트리페닐포스핀(약칭; TPP)을 사용하여 표 1의 배합 조성에 나타내는 중량비로 배합, 2본 롤로 혼련, 태블릿화 후, 트랜스퍼 성형으로 수지 성형체를 조제하고, 160℃ 2시간, 나아가 180℃ 6시간의 경화 조건으로 경화시켰다.The main ingredients are epoxy resin mixture (EP1, EP2) and epoxy resin (EP3), respectively, phenol novolac (abbreviated as PN, hydroxyl equivalent 103 g/eq.) as the curing agent, and triphenylphosphine (abbreviated as TPP) as the curing accelerator. was mixed in the weight ratio shown in the composition in Table 1, kneaded with two rolls, tabletted, and then transfer molded to prepare a resin molded body, and cured under curing conditions of 160°C for 2 hours and further at 180°C for 6 hours.
물성값의 측정은 이하의 조건으로 측정했다.Physical property values were measured under the following conditions.
ㆍDMA 분석ㆍDMA analysis
메이커: TA 인스트루먼트Maker: TA Instruments
장치: DMAQ800Device: DMAQ800
측정 모드: 인장Measurement Mode: Tensile
승온 속도: 2℃/min.Temperature increase rate: 2℃/min.
측정 온도 범위: 25℃ ~ 350℃Measurement temperature range: 25℃ ~ 350℃
측정 주파수: 10HzMeasurement frequency: 10Hz
tanδ의 값이 최대가 된 온도를 Tg로 하였다.The temperature at which the value of tanδ reached its maximum was set as Tg.
ㆍ3점 굽힘 시험ㆍ3-point bending test
메이커: 주식회사 에이·앤드·데이Manufacturer: A&D Co., Ltd.
장치: RTG-1310Device: RTG-1310
시험 속도: 3mm/minTest speed: 3mm/min
지점간 거리: 64mmPoint-to-point distance: 64mm
ㆍ흡수율ㆍAbsorption rate
직경 5cm×두께 4mm의 원반 형상의 시험편을 100℃에서 24시간 가열 후, 중량을 측정하고, 그 시험편을 100℃의 물 중에서 24시간 끓인 후 다시 중량을 측정했다. 이들의 중량으로부터 중량 증가율(%)을 산출하였다.A disk-shaped test piece with a diameter of 5 cm The weight increase rate (%) was calculated from these weights.
표 1의 결과로부터, 실시예 4, 5, 비교예 1 모두 내열성은 150℃를 초과하는 것이 확인되었다. 또한 실시예 4, 5는 고탄성률이며, 저흡수율성도 우수한 것이 확인되었다.From the results in Table 1, it was confirmed that the heat resistance of Examples 4, 5, and Comparative Example 1 exceeded 150°C. Additionally, it was confirmed that Examples 4 and 5 had a high elastic modulus and were also excellent in low water absorption properties.
본 발명은 전기 전자 부품용 절연 재료(고신뢰성 반도체 밀봉 재료 등) 및 적층판(프린트 배선판, 빌드업 기판 등)이나 FRP를 비롯한 각종 복합 재료, 접착제, 도료 등 그 중에서도 특히 적층판 등의 용도에 유용하고, 금속박 부착 적층판, 빌드업 기판용 절연 재료, 플렉시블 기판 재료 등에 유용하다.The present invention is particularly useful for applications such as insulating materials for electrical and electronic components (high-reliability semiconductor encapsulation materials, etc.) and laminated boards (printed wiring boards, build-up boards, etc.), various composite materials including FRP, adhesives, paints, etc. , It is useful for laminates with metal foil, insulating materials for build-up boards, flexible board materials, etc.
Claims (5)
[화학식 1]
(식 (1) 중, n은 반복 수이며 1 ~ 20의 실수를 나타낸다.)
[화학식 2]
An epoxy resin mixture containing an epoxy resin represented by the following formula (1) and an epoxy compound represented by the following formula (2).
[Formula 1]
(In equation (1), n is the number of repetitions and represents a real number from 1 to 20.)
[Formula 2]
[화학식 3]
(식 (3) 중, n은 반복 수이며, 1 ~ 20의 실수를 나타낸다.)
[화학식 4]
A method for producing an epoxy resin mixture according to claim 1 or 2, which is obtained by reacting epichlorohydrin with a phenol resin represented by the following formula (3) and a phenol compound represented by the following formula (4).
[Formula 3]
(In equation (3), n is the number of repetitions and represents a real number from 1 to 20.)
[Formula 4]
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JP2021019123A (en) | 2019-07-22 | 2021-02-15 | Tdk株式会社 | Ceramic electronic component |
JP2021027150A (en) | 2019-08-05 | 2021-02-22 | 三菱電機株式会社 | Semiconductor device |
JP2021031323A (en) | 2019-08-21 | 2021-03-01 | 三菱マテリアル株式会社 | Copper/ceramic joint, insulated circuit board, copper/ceramic joint producing method, insulated circuit board producing method |
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