KR20230071350A - Plasma power apparatus using double phase control and its control method - Google Patents

Abstract

The present invention relates to a plasma power apparatus using double phase control to change output at high speed and a control method thereof. According to the present invention, the plasma power apparatus using double phase control comprises: a radio frequency (RF) power amplification unit generating first and second radio-frequency power signals of a pulse waveform and selectively or overlappingly performing leg phase control and module phase control in response to non-linearity of output power; an RF sensor detecting an electrical signal according to a change in impedance of an RF load to output an electrical detection signal; and a controller using a forward power command value applied from the outside and a forward power detection value and reverse power detection value output from the RF sensor to output a leg face control signal and/or module face control signal for controlling the RF power amplification unit.

Description

Plasma power device using double phase control and its control method

The present invention relates to a plasma power device using dual phase control capable of eliminating nonlinearity of leg control by overlapping leg phase control and module phase control, and a control method thereof.

Plasma etching is frequently used in semiconductor manufacturing processes. In plasma etching, ions are accelerated by an electric field to etch an exposed surface on a substrate. The electric field is generated according to the high frequency power signals generated by the high frequency generator of the high frequency power system. The high frequency power signals generated by the high frequency generator are precisely controlled to efficiently perform plasma etching.

A high frequency power system may include a load such as a high frequency generator, a matching network, and a plasma chamber. A high frequency power signal is used to drive a load to manufacture various components such as integrated circuits (ICs), solar panels, compact discs (CDs), and/or DVDs. Loads may include cables with broadband mismatched loads (eg, mismatched resistor terminations), narrowband mismatched loads (eg, two-element matched networks), and resonator loads. can

A high frequency power signal is received in the resonant network. The resonant network matches the input impedance of the resonant network to the characteristic impedance of the transmission line between the high frequency generator and the resonant network. Impedance matching helps minimize the amount of power from the resonant network applied to the resonant network in the forward direction towards the plasma chamber ("forward power") and minimizes the amount of power reflected from the resonant network to the high frequency generator ("reverse power"). help to do Impedance matching helps maximize the forward power output from the resonant network to the plasma chamber.

There are various methods for applying a high-frequency signal to a load. According to one example, a continuous wave signal is applied to the load. The continuous wave signal is generally a sinusoidal wave continuously output to a load by a high frequency power supply. In the continuous wave approach, the high frequency signal assumes a sinusoidal output, and the amplitude and/or frequency of the sinusoidal wave can be varied to change the output power applied to the load. Another approach is to apply a high-frequency signal to a load by superimposing voltages having different potentials.

However, since the continuous wave approach or the voltage superposition method generates a high-frequency signal by controlling the voltage level applied to the load, there is a disadvantage in that it cannot promptly respond to load variations continuously and variously occurring in the plasma processing chamber.

Accordingly, the applicant can respond quickly to load fluctuations by continuously and alternately performing voltage level control and phase difference control through Patent Application No. 10-2018-0135556 (Plasma Power Device Responsive to Load Fluctuation and Control Method thereof) Plasma power device and its control method have been proposed.

Korea Patent Registration No. 10-1287598 RF power generator and its operation method Korea Patent Registration No. 10-2143178 Plasma power device with rapid response to load change and its control method

The present invention provides a plasma power device using dual phase control capable of changing output at high speed and controlling output in a wide range by using leg phase control and module phase control simultaneously or selectively, and a control method thereof. has a purpose

In addition, the present invention performs module phase control in a section where the output power according to the leg phase control is nonlinear, and performs leg phase control in a section where the output power according to the module phase control is nonlinear, , in the section where the output power by leg-phase control and module-phase control changes linearly at the same time, leg-phase control and module-phase control are performed simultaneously to eliminate the non-linearity of leg-phase control and module-phase control. Another object is to provide a plasma power device and a control method thereof.

In addition, the present invention provides a plasma power device using double phase control and a control method thereof capable of protecting a switching element in a high frequency power amplification unit by reducing a forward power reference value as the reverse power detected at the cost of a standing wave ratio increases. It has another purpose.

The problems of the present invention are not limited to those mentioned above, and other problems not mentioned will be clearly understood by those skilled in the art from the description below.

Plasma power device using double phase control according to the present invention generates first and second high frequency power signals of pulse waveforms, and includes leg phase control and module phase control in response to nonlinearity of output power. a high-frequency power amplifying unit selectively or overlappingly controlling; An RF sensor that detects an electrical signal according to a change in impedance of an RF load and outputs an electrical detection signal; And a controller outputting a leg phase control signal and/or a module phase control signal for controlling the high frequency power amplification unit using a forward power command value applied from the outside and a forward power detection value and a reverse power detection value output from the RF sensor. include

Preferably, the controller includes: a standing wave ratio limiter outputting a forward power reference value using the forward power command value, the forward power detection value, and the reverse power detection value; a leg face controller outputting a leg face control signal using the forward power reference value and the forward power detection value; and a module phase controller outputting a module phase control signal using the forward power reference value and the forward power detection value.

Preferably, the leg face controller may include: a first limiter limiting upper and lower limits of the forward power reference value; a second limiter limiting upper and lower limits of the forward power detection value; a first subtractor outputting a difference between an output of the first limiter and an output of the second limiter; a first proportional integrator that proportionally integrates and outputs the output of the first subtractor; a first feed forwarder that feed forwards the forward power reference value; a first adder for adding an output of the first proportional integrator and an output of the first feed forwarder; and a third limiter outputting a leg phase control signal by limiting the upper and lower limits of the output of the first adder.

Preferably, the module phase controller includes: a fourth limiter limiting upper and lower limits of the forward power reference value; a fifth limiter limiting upper and lower limits of the forward power detection value; a second subtractor outputting a difference between an output of the fourth limiter and an output of the fifth limiter; a second proportional integrator that proportionally integrates and outputs the output of the second subtractor; a second feed forwarder that feed forwards the forward power reference value; a second adder for adding an output of the second proportional integrator and an output of the second feed forwarder; and a sixth limiter configured to output a leg phase control signal by limiting an upper limit value and a lower limit value of an output of the second adder.

Preferably, the controller may perform the module phase control in a period in which output power according to the leg phase control is nonlinear.

Preferably, the controller overlaps the leg phase control and the module phase control in a section in which output power linearly increases according to the leg phase control and output power linearly increases according to the module phase control. can be done by

Preferably, the controller may perform the leg phase control in a period in which output power according to the module phase control is nonlinear.

Preferably, the standing wave ratio limiter calculates a standing wave ratio using the forward power detection value and the reverse power detection value, and reduces the standing wave ratio to the forward power reference value.

Preferably, a plasma power device using double phase control according to an embodiment of the present invention includes: a rectifier for outputting a rectified voltage by rectifying a three-phase voltage; a smoothing unit for smoothing the rectified voltage into a smoothing voltage and providing the smoothed voltage to the high frequency power amplifying unit; a coupling transformer for inducing the first and second high frequency power signals to a secondary side; a resonance filter filtering the first and second high frequency power signals induced in the secondary side of the coupling transformer into first and second resonance signals having a predetermined resonance frequency; and a combiner configured to combine the first and second resonant signals and output a combined high frequency power signal.

In addition, a control method of a plasma power device using double phase control according to the present invention includes generating first and second high frequency power signals of pulse waveforms; applying a combination of the first and second high frequency power signals to an RF load; and an output step of outputting a leg phase control signal and/or a module phase control signal using a forward power command value applied from the outside and a forward power detection value and a reverse power detection value output from the RF sensor.

Preferably, according to the control method of a plasma power device using double phase control according to the present invention, when the output power according to the leg phase control is nonlinear, the module phase control may be performed.

Preferably, according to the control method of a plasma power device using double phase control according to the present invention, the output power increases linearly according to the leg phase control and the output power increases linearly according to the module phase control. In the section, the leg face control and the module face control may be overlapped.

Preferably, the leg phase control may be performed in a period in which the output power according to the module phase control is nonlinear.

According to the plasma power device using dual phase control and its control method of the present invention, the output can be changed at high speed and the output can be controlled in a wide range by using leg phase control and module phase control simultaneously or selectively. In the section where the output of the leg face is nonlinear, the module face is controlled, in the section where the output of the module face is nonlinear, the leg face is controlled, and in the section where the output of the leg face and the module face change simultaneously, both faces are controlled simultaneously. Non-linearity between leg phase control and module phase control can be excluded, and the switching element in the high frequency power amplifier can be protected by reducing the forward power reference value as the reverse power detected at the expense of the standing wave ratio increases.

1 is an overall block diagram of a plasma power device according to an embodiment of the present invention;
2 is an example of a module face gain in a parallel high frequency power amplifier according to the prior art;
3 is an example of a leg phase gain in a high frequency power amplifier according to the prior art;
4 is a control block diagram of a plasma power device according to an embodiment of the present invention;
5 is a system characteristic diagram of a plasma power device according to an embodiment of the present invention;
6A is a switching waveform diagram according to an embodiment of the present invention;
6B is a switching waveform diagram according to another embodiment of the present invention, and
6C is a switching waveform diagram according to another embodiment of the present invention.

Additional objects, features and advantages of the present invention may be more clearly understood from the following detailed description and accompanying drawings.

Prior to the detailed description of the present invention, the present invention may make various changes and may have various embodiments, and the examples described below and shown in the drawings are not intended to limit the present invention to specific embodiments. No, it should be understood to include all changes, equivalents or substitutes included in the spirit and scope of the present invention.

It is understood that when an element is referred to as being "connected" or "connected" to another element, it may be directly connected or connected to the other element, but other elements may exist in the middle. It should be. On the other hand, when an element is referred to as “directly connected” or “directly connected” to another element, it should be understood that no other element exists in the middle.

Terms used in this specification are only used to describe specific embodiments, and are not intended to limit the present invention. Singular expressions include plural expressions unless the context clearly dictates otherwise. In this specification, terms such as "include" or "have" are intended to indicate that there is a feature, number, step, operation, component, part, or combination thereof described in the specification, but one or more other features It should be understood that the presence or addition of numbers, steps, operations, components, parts, or combinations thereof is not precluded.

In addition, terms such as "...unit", "...unit", and "...module" described in the specification mean a unit that processes at least one function or operation, which is hardware, software, or hardware and It can be implemented as a combination of software.

In addition, in the description with reference to the accompanying drawings, the same reference numerals are given to the same components regardless of reference numerals, and overlapping descriptions thereof will be omitted. In describing the present invention, if it is determined that a detailed description of related known technologies may unnecessarily obscure the subject matter of the present invention, the detailed description will be omitted.

1 is an overall block diagram of a plasma power device according to an embodiment of the present invention.

A plasma power device according to an embodiment of the present invention includes an EMI filter 110, a rectifying unit 115, a smoothing unit 117, a high-frequency power amplifier 120 and 125, a transformer for coupling 130 and 135, It includes resonance filters 140 and 145, combiner 150, RF sensor 155, RF load 160, and controller 165.

The EMI filter 110 serves to shield noise of electromagnetic waves included in the input three-phase commercial power supply.

The rectifying unit 115 rectifies the 3-phase voltage from the EMI filter 110 into a rectified voltage and outputs the rectified voltage.

The smoothing unit 117 smooths the smoothing voltage output from the rectifying unit 115 .

The high frequency power amplifiers 120 and 125 amplify the smoothing voltage of a predetermined level output from the smoothing unit 117 to generate a pulse wave high frequency power signal. The high-frequency power amplification units 120 and 125 operate two or more power amplification modules in parallel to generate voltages and frequencies according to various load conditions. The first high frequency power amplification module 120 and the second high frequency power amplification module 125 are controlled by the first amplification control signal Pcon1 and the second amplification control signal Pcon2 output from the controller 170, respectively. 1 high frequency power signal v1 and a second high frequency power signal v2 are output. Here, the first amplification control signal Pcon1 means the first to fourth switching control signals S1, S2, S3, and S4 applied to the first to fourth switching elements, and the second amplification control signal Pcon2 denotes the fifth to eighth switching control signals S5, S6, S7, and S8 applied to the fifth to eighth switching elements.

The coupling transformers 130 and 135 induce the high-frequency power signal of the pulse waveform output from the high-frequency power amplifiers 120 and 125 to the secondary side, and electrically insulate the primary side and the secondary side so that the user can be connected to the RF load. An electric shock accident can be prevented when contacting the included plasma chamber.

The resonance filters 140 and 145 include an inductor and a capacitor coupled in series and parallel, and a sinusoidal resonance signal having a predetermined resonance frequency from a high frequency power signal induced in the secondary side of the coupling transformer 130 and 135. outputs Here, the first resonance filter 140 outputs the first resonance signal vR1, and the second resonance filter 145 outputs the second resonance signal vR2.

The combiner 150 may be configured as a 3dB coupler. The first resonant signal vR1 is input to the first terminal T1 and the second resonant signal vR2 is input to the second terminal T2, respectively, and the load side terminal T3 and the terminating terminal T4 are coupled to the output side. And, the terminating impedance (Z) may be coupled to the terminating terminal (T4). The combiner 150 combines the first resonance signal vR1 and the second resonance signal vR2 and outputs a combined high frequency power signal. When the phase of the first resonance signal vR1 is ahead of the phase of the second resonance signal vR2 by 90 degrees, most of the combined high frequency power signal can be output to the load-side terminal T3. When the phase of the first resonance signal vR1 lags behind the phase of the second resonance signal vR2 by 90 degrees, most of the combined high frequency power signal can be output to the terminating terminal T4. Also, when the phase of the first resonance signal vR1 and the phase of the second resonance signal vR2 are the same, the combined high frequency power signal may be output to the load-side terminal T3 and the terminating terminal T4 in half. Meanwhile, the terminating impedance Z may be a resistor having a predetermined resistance value, and heat generated in the terminating resistor by the high frequency power signal applied through the terminating terminal T4 is dissipated using a fan (not shown). can

The RF sensor 155 is disposed between the combiner 150 and the RF load 160 and detects an electrical signal and outputs an electrical detection signal. Here, the electrical detection signal is a detection current value (Is), a detection voltage value (Vs), forward power (PF: Forward Power) supplied from the combiner 150 to the RF load 160, and the RF load 160 It may be at least one or more of reverse power (PR) reflected from the combiner 150.

The controller 165 uses the forward power command value PF_CMD applied from the outside and the electrical detection signal output from the RF sensor 155 to generate the voltage control signal Vcon, the first amplification control signal Pcon1, and the second amplification signal. A control signal Pcon2 is generated.

2 is an exemplary diagram of a module phase gain in a parallel high frequency power amplifier according to the prior art, showing a relationship between a phase difference and output power between modules A and B.

If the module phase is -90 degrees, the phase of module A is 90 degrees behind the phase of module B, if the phase is 0 degrees, the phase of module A and module B are in phase, and if the phase is 90 degrees, the phase of module A is that of module B. This means that it is 90 degrees ahead of the phase.

3 is an exemplary diagram of a leg phase gain in a high frequency power amplifier according to the prior art, showing a relationship between a phase difference between switching signals S1 and S4 and switching signals S2 and S3 and output power in the module. In the module, the output power increases nonlinearly until the phase difference between the switching signals S1 and S4 and the switching signals S2 and S3 is approximately 65 degrees, making it difficult to control the output power. In order to solve this problem, conventionally, the output power in the nonlinear section is fixed to a predetermined level and controlled.

Therefore, in the present invention, using the control block diagram of the plasma power device according to an embodiment of the present invention shown in FIG. 4, leg phase control and module phase control are selectively or overlapped. do.

Specifically, in order to overcome non-linearity of output power according to leg phase control, module phase control is performed in a section where output power according to leg phase control is constantly controlled, and leg phase control and module phase control are performed. In the section where the output power by phase control changes linearly at the same time, leg phase control and module phase control are overlapped at the same time, and the output power according to module phase control is Leg pace control is performed in the section that is constantly controlled.

Accordingly, non-linearity between the leg phase control and the module phase control can be eliminated, the output can be changed at high speed, and the output can be controlled in a wide range.

The controller 165 of the plasma power device according to an embodiment of the present invention includes a forward power command value PF_CMD applied from the outside, a forward power detection value PF and a reverse power detection value output from the RF sensor 155 A VSWR limiter 405 that calculates and outputs a forward power reference value (PF_ref) using (PR), and a leg face control unit that outputs a leg face control signal using the forward power reference value (PF_ref) and the forward power detection value (PF). Module face controllers 450, 455, 460 that output module face control signals using (410, 415, 420, 425, 430, 435, 440), the forward power reference value (PF_ref), and the forward power detection value (PF) , 465, 470, 475, 480). Here, the forward power command value PF_CMD is a value set by the user and corresponds to an output power value supplied to the load side.

The VSWR limiter 405 according to an embodiment of the present invention uses a forward power command value PF_CMD applied from the outside and a forward power detection value PF and a reverse power detection value PR output from the RF sensor 155. The forward power reference value (PF_ref) is calculated and output using Specifically, the VSWR limiter 405 calculates the Voltage Standing Wave Ratio (VSWR) using the forward power detection value (PF) and the reverse power detection value (PR), and then the standing wave ratio (VSWR) is 1.5: If it is greater than 1, it serves to limit the forward power reference value (PF_ref). The VSWR limiter 450 is applied for the purpose of protecting the high frequency power amplifiers 120 and 125. The standing wave ratio increases as the reflected wave influence from the load, that is, the reverse power detection value increases. In this case, since the high frequency power amplifiers 120 and 125 may be damaged when large power is applied in both the forward and reverse directions, the forward power reference value PF_ref is limited to be lower than the forward power command value PF_CMD, resulting in high frequency power Power applied to the amplifiers 120 and 125 can be limited.

That is, the VSWR limiter 405 outputs 100% of the forward power reference value PF_CMD as the forward power reference value PF_ref if the standing wave ratio (VSWR) is less than 1.5:1. limit For example, when the standing wave ratio (VSWR) is greater than or equal to 1.5:1 and less than 2.0:1, 90% of the forward power command value PF_CMD is output as the forward power reference value PF_ref. And, if the standing wave ratio (VSWR) is 2.0:1 or more and less than 3.0:1, 60% of the forward power command value PF_CMD is output as the forward power reference value PF_ref. Finally, if the standing wave ratio (VSWR) is 3.0:1 or more, 20% of the forward power command value (PF_CMD) is output as the forward power reference value (PF_ref). Accordingly, as the detected reverse power increases, the forward power reference value is reduced, thereby protecting the switching element in the high frequency power amplifying unit.

VSWR PF_ref ~1.5 PF_CMD*100% 1.5 to 2.0 PF_CMD*90% 2.0 to 3.0 PF_CMD*60% 3.0 ~ PF_CMD*20%

Meanwhile, the standing wave ratio (VSWR) limiter 405 calculates the standing wave ratio (VSWR) according to Equation 1 below.

)는

임.Here, the reflection coefficient (

)Is

lim.

For example, when the standing wave ratio (VSWR) is 3.0:1 due to load variation in the state where the forward power command value (PF_CMD) of 3kW is commanded, the forward power reference value is changed to 1.8kW and output, and the standing wave ratio (VSWR) is 1.5:1 If it is below, the forward power reference value is normalized again to 3 kW.

The leg face controller according to an embodiment of the present invention includes a first limiter 410 that limits the upper and lower limits of the forward power reference value PF_ref, the upper limit value of the forward power detection value PF output from the RF sensor 155, and The second limiter 415 for limiting the lower limit value, the first subtractor 420 for outputting the difference between the output of the first limiter 410 and the output of the second limiter 415, and the output of the first subtractor 420 proportional to The first proportional integrator 425 for integrating and outputting, the first feed forwarder 430 for feedforwarding the forward power reference value PF_ref, and the output of the first proportional integrator 425 and the output of the first feedforward are added. and a third limiter 440 for outputting a leg phase control signal by limiting the upper limit value and the lower limit value of the output of the first adder 435.

Meanwhile, the first feed forwarder 430 may be implemented as a linear function as follows.

FFDout = A*(forward power reference value) + B,

A, B: constant

The module face controller according to an embodiment of the present invention includes a fourth limiter 450 that limits the upper and lower limits of the forward power reference value PF_ref, the upper limit value of the forward power detection value PF output from the RF sensor 155, and The fifth limiter 455 for limiting the lower limit value, the second subtractor 460 for outputting the difference between the output of the fourth limiter 450 and the output of the fifth limiter 455, and the output of the second subtractor 460 are proportional to each other. The second proportional integrator 465 for integrating and outputting, the second feed forwarder 470 for feedforwarding the forward power reference value PF_ref, and the output of the second proportional integrator 465 and the output of the second feedforward are added. and a third limiter 440 for outputting a module phase control signal by limiting the upper and lower limits of the output of the second adder 475.

Here, if the module phase control signal is -90 degrees, the phase of module A is 90 degrees behind the phase of module B, if it is 0 degrees, the phase of module A and module B are in phase, and if it is 90 degrees, the phase of module A This means that it is 90 degrees ahead of the phase of module B.

And, if the leg phase control signal is 0 degree, the phase difference between switching signals S1 and S4 and switching signals S2 and S3 in module A is 0 degree, and the phase difference between switching signals S5 and S8 and switching signals S6 and S7 in module B is 0 degree means In addition, if the leg phase control signal is 90 degrees, the phase difference between switching signals S1 and S4 and switching signals S2 and S3 in module A is 90 degrees, and the phase difference between switching signals S5 and S8 and switching signals S6 and S7 in module B is 90 degrees means

A plasma power device according to an embodiment of the present invention uses a leg face control signal output from a leg face controller and a module phase control signal output from a module face controller according to an embodiment of the present invention shown in FIG. It can be controlled to have system characteristics of the plasma power device.

i) Non-linear section during leg phase control

In a section where the output power according to the leg phase control increases nonlinearly, it is difficult to control the output power, so it is kept constant. Accordingly, output power can be linearly controlled by performing module phase control in this section. For example, the output power may be applied in the range of 0 to 10% (see FIG. 5).

ii) overlapping control intervals

Output power can be linearly controlled by overlapping leg-phase control and module-phase control in the section where output power increases linearly according to leg-phase control and output power linearly increases according to module-phase control. there is. For example, the output power can be applied in the range of 10 to 20% (see FIG. 5).

iii) Non-linear section in module phase control

In module phase control, when the phase difference between module A and module B reaches 90 degrees, the output power becomes non-linear, so the output power can be linearly controlled by performing leg phase control in this section. For example, the output power can be applied in the range of 20 to 100% (see FIG. 5).

On the other hand, according to the present invention, although the leg phase control and the module phase control are divided into the above three and performed, the phase difference in the leg phase control and the phase difference in the module phase control are independent of each other.

6A is a switching waveform diagram according to an embodiment of the present invention, when the leg phase control signal is 40 degrees and the module phase control signal is -90 degrees, and FIG. 6B is a switching waveform diagram according to another embodiment of the present invention, which is a leg phase control signal. 6C is a switching waveform diagram according to another embodiment of the present invention when the leg phase control signal is 100 degrees and the module phase control signal is 30 degrees. am.

The embodiments described in this specification and the accompanying drawings merely illustrate some of the technical ideas included in the present invention by way of example. Therefore, since the embodiments disclosed in this specification are not intended to limit the technical idea of the present invention but to explain it, it is obvious that the scope of the technical idea of the present invention is not limited by these embodiments. All modified examples and specific examples that can be easily inferred by those skilled in the art within the scope of the technical idea included in the specification and drawings of the present invention should be construed as being included in the scope of the present invention.

110: EMI filter 115: rectifier
117: smoothing unit 120, 125: high frequency power amplifying unit
130, 135: coupling transformer 140, 145: resonance filter
150: combiner 155: RF sensor
160: RF load 165: controller
410: first limiter 415: second limiter
420: first subtractor 425: first proportional integrator
430: first feed forward machine 435: first adder
440: third limiter 450: first limiter
455: second limiter 460: first subtractor
465: first proportional integrator 470: first feed forward
475: first adder 480: third limiter

Claims (13)

a high-frequency power amplification unit generating first and second high-frequency power signals of pulse waveforms and selectively or overlappingly performing leg phase control and module phase control in response to nonlinearity of output power;
An RF sensor that detects an electrical signal according to a change in impedance of an RF load and outputs an electrical detection signal; and
A controller outputting a leg phase control signal and/or a module phase control signal for controlling the high frequency power amplification unit using a forward power command value applied from the outside and a forward power detection value and a reverse power detection value output from the RF sensor
Plasma power device using double phase control comprising a.
The method according to claim 1, wherein the controller,
a standing wave ratio limiter outputting a forward power reference value using the forward power command value, the forward power detection value, and the reverse power detection value;
a leg face controller outputting a leg face control signal using the forward power reference value and the forward power detection value; and
Module face controller outputting a module phase control signal using the forward power reference value and the forward power detection value
Plasma power device using double phase control comprising a.
The method according to claim 2, wherein the leg face control unit,
a first limiter limiting upper and lower limits of the forward power reference value;
a second limiter limiting upper and lower limits of the forward power detection value;
a first subtractor outputting a difference between an output of the first limiter and an output of the second limiter;
a first proportional integrator that proportionally integrates and outputs the output of the first subtractor;
a first feed forwarder that feed forwards the forward power reference value;
a first adder for adding an output of the first proportional integrator and an output of the first feed forwarder; and
A third limiter for outputting a leg phase control signal by limiting the upper and lower limits of the output of the first adder
Plasma power device using double phase control comprising a.
The method according to claim 2, wherein the module face control unit,
a fourth limiter limiting upper and lower limits of the forward power reference value;
a fifth limiter limiting upper and lower limits of the forward power detection value;
a second subtractor outputting a difference between an output of the fourth limiter and an output of the fifth limiter;
a second proportional integrator that proportionally integrates and outputs the output of the second subtractor;
a second feed forwarder that feed forwards the forward power reference value;
a second adder for adding an output of the second proportional integrator and an output of the second feed forwarder; and
A sixth limiter for outputting a leg phase control signal by limiting the upper and lower limits of the output of the second adder
Plasma power device using double phase control comprising a.
The method according to claim 2, wherein the controller,
Characterized in that the module phase control is performed in a section in which the output power according to the leg phase control is nonlinear
Plasma power device using dual phase control.
The method according to claim 2, wherein the controller,
Characterized in that the leg phase control and the module phase control are overlapped in a section in which the output power linearly increases according to the leg phase control and the output power linearly increases according to the module phase control.
Plasma power device using dual phase control.
The method according to claim 2, wherein the controller,
Characterized in that the leg phase control is performed in a section in which the output power according to the module phase control is nonlinear
Plasma power device using dual phase control.
The method according to claim 2, wherein the standing wave ratio limiter,
Characterized in that the standing wave ratio is calculated using the forward power detection value and the reverse power detection value, and the standing wave ratio is reduced by the forward power reference value
Plasma power device using dual phase control.
The method of claim 1,
a rectifying unit outputting a rectified voltage by rectifying the three-phase voltage;
a smoothing unit for smoothing the rectified voltage into a smoothing voltage and providing the smoothed voltage to the high frequency power amplifying unit;
a coupling transformer for inducing the first and second high frequency power signals to a secondary side;
a resonance filter filtering the first and second high frequency power signals induced in the secondary side of the coupling transformer into first and second resonance signals having a predetermined resonance frequency; and
a combiner combining the first and second resonant signals to output a combined high-frequency power signal;
Plasma power device using double phase control further comprising a.
generating first and second high frequency power signals of pulse waveforms;
applying a combination of the first and second high frequency power signals to an RF load; and
An output step of outputting a leg phase control signal and/or a module phase control signal using a forward power command value applied from the outside and a forward power detection value and a reverse power detection value output from the RF sensor
Control method of a plasma power device using double phase control comprising a.
The method of claim 10,
Characterized in that performing the module phase control when the output power according to the leg phase control is nonlinear
Control method of plasma power device using double phase control.
The method of claim 10,
Characterized in that the leg phase control and the module phase control are overlapped in a section in which the output power linearly increases according to the leg phase control and the output power linearly increases according to the module phase control.
Control method of plasma power device using double phase control.
The method of claim 10,
Characterized in that the leg phase control is performed in a section in which the output power according to the module phase control is nonlinear
Control method of plasma power device using double phase control.

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