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KR20220087933A - Method For Producing Diamine Derivative - Google Patents

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KR20220087933A
KR20220087933A KR1020200178460A KR20200178460A KR20220087933A KR 20220087933 A KR20220087933 A KR 20220087933A KR 1020200178460 A KR1020200178460 A KR 1020200178460A KR 20200178460 A KR20200178460 A KR 20200178460A KR 20220087933 A KR20220087933 A KR 20220087933A
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황성관
박장하
김경덕
고수익
이서후
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엠에프씨 주식회사
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    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D513/00Heterocyclic compounds containing in the condensed system at least one hetero ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for in groups C07D463/00, C07D477/00 or C07D499/00 - C07D507/00
    • C07D513/02Heterocyclic compounds containing in the condensed system at least one hetero ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for in groups C07D463/00, C07D477/00 or C07D499/00 - C07D507/00 in which the condensed system contains two hetero rings
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    • A61K31/395Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins
    • A61K31/435Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins having six-membered rings with one nitrogen as the only ring hetero atom
    • A61K31/44Non condensed pyridines; Hydrogenated derivatives thereof
    • A61K31/4427Non condensed pyridines; Hydrogenated derivatives thereof containing further heterocyclic ring systems
    • A61K31/444Non condensed pyridines; Hydrogenated derivatives thereof containing further heterocyclic ring systems containing a six-membered ring with nitrogen as a ring heteroatom, e.g. amrinone

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Abstract

본 발명은, FXa (활성화 제 X 인자) 저해약인 에독사반 (화학식 1), 이의 약학적으로 허용가능한 염 또는 이들의 수화물의 제조방법 및 이를 위한 신규 중간체 화합물(화학식 7, 8)에 관한 것이다. 본 발명의 제조방법은 상업생산 적용에 까다로운 금속 촉매를 사용한 수소화 반응, 또는 반응시에 무수조건에서 수행해야 하는 반응, 또는 폭발성을 갖는 여러 종류의 시약들을 사용하지 않는 장점이 있다. 따라서 본 발명의 제조방법으로 고순도, 고수율로 에독사반을 안정적으로 제공할 수 있다.The present invention relates to a method for preparing FXa (activator factor X) inhibitor edoxaban (Formula 1), a pharmaceutically acceptable salt or hydrate thereof, and novel intermediate compounds (Formulas 7 and 8) therefor. . The manufacturing method of the present invention has the advantage of not using a hydrogenation reaction using a metal catalyst, which is difficult for commercial production applications, or a reaction that must be performed under anhydrous conditions during the reaction, or various kinds of reagents having explosive properties. Therefore, it is possible to stably provide edoxaban with high purity and high yield by the manufacturing method of the present invention.

Description

디아민 유도체의 제조방법{Method For Producing Diamine Derivative}Method for producing a diamine derivative {Method For Producing Diamine Derivative}

본 발명은, FXa (활성화 제 X 인자) 저해약인 에독사반 (화학식 1), 이의 약학적으로 허용가능한 염 또는 이들의 수화물의 제조방법 및 이를 위한 신규 중간체 화합물(화학식 7, 8)에 관한 것이다.The present invention relates to a method for preparing FXa (activator factor X) inhibitor edoxaban (Formula 1), a pharmaceutically acceptable salt or hydrate thereof, and novel intermediate compounds (Formulas 7 and 8) therefor. .

에독사반의 p-톨루엔술폰산의 염 또는 그 염의 수화물은 항 혈액 응고인자로 작용하는 FXa 억제제로서 혈전증, 색전질환의 예방 또는 치료제로서의 항응혈제로 유용하게 사용되고 있다. 항응혈제의 예로서는 아르가트로반(Argatroban), 다비가트란(Dabigatran), 리바록사반(Rivaroxaban), 아픽사반(Apixaban), 에독사반(Edoxaban)이 있다.Edoxaban p-toluenesulfonic acid salt or hydrate thereof is an FXa inhibitor that acts as an anti-blood coagulation factor, and is usefully used as an anticoagulant for the prevention or treatment of thrombosis and embolic diseases. Examples of anticoagulants include Argatroban, Dabigatran, Rivaroxaban, Apixaban, and Edoxaban.

에독사반은 하기의 화학식 1로 표시되며 화학명은 N'-(5-클로로피리딘-2-일)-N-{(1S,2R,4S)-4-[(디메틸아미노)카르보닐]-2-[5-메틸-4,5,6,7-테트라히드로티아졸로[5,4-c]피리딘-2-일)카르보닐]아미노사이클로헥실}에탄디아미드이며, 이의 p-톨루엔술폰산염 일수화물이 주성분이 되는 의약품이 릭시아나(LIXIANA®)라는 제품명으로 출시되어 있다.Edoxaban is represented by the following Chemical Formula 1 and the chemical name is N'-(5-chloropyridin-2-yl)-N-{(1S,2R,4S)-4-[(dimethylamino)carbonyl]-2 -[5-methyl-4,5,6,7-tetrahydrothiazolo[5,4-c]pyridin-2-yl)carbonyl]aminocyclohexyl}ethanediamide, its p-toluenesulfonate yl A drug whose main ingredient is hydrate is released under the product name LIXIANA ® .

[화학식 1][Formula 1]

Figure pat00001
Figure pat00001

FXa 저해약으로서 항응혈제로 사용되는 에독사반은 국제공개공보 WO 2003-000657호에 최초로 개시되었으며 그 제조방법을 아래의 <반응식 1>, <반응식 2>, <반응식 3>으로 표기할 수 있다.Edoxaban, used as an anticoagulant as an FXa inhibitor, was first disclosed in International Publication No. WO 2003-000657, and its preparation method can be expressed as <Scheme 1>, <Scheme 2>, and <Scheme 3> .

<반응식 1><Scheme 1>

Figure pat00002
Figure pat00002

<반응식 2><Scheme 2>

Figure pat00003
Figure pat00003

<반응식 3><Scheme 3>

Figure pat00004
Figure pat00004

상기 <반응식 1>, <반응식 2>, <반응식 3>에 의한 에독사반의 제조방법은 금속 촉매를 사용한 수소화 반응, 반응시에 무수조건에서 수행해야 하는 반응, 폭발성을 갖는 여러 종류의 시약들을 사용해야 하기 때문에 상업적으로 적용하기에 매우 어려운 조건이나 방법들을 포함하고 있다. 따라서 종래 제조방법에 의한 에독사반의 생산은 고순도의 에독사반을 제조하기 어렵고 또한 경제적인 측면에서도 대량생산에 적합하지 않다.The preparation method of edoxaban according to <Reaction Scheme 1>, <Reaction Scheme 2>, and <Reaction Scheme 3> uses a hydrogenation reaction using a metal catalyst, a reaction that must be performed under anhydrous conditions during the reaction, and various types of reagents having explosive properties. Therefore, it contains conditions or methods that are very difficult to apply commercially. Therefore, the production of edoxaban by the conventional manufacturing method is difficult to manufacture high-purity edoxaban and is not suitable for mass production in terms of economics as well.

이에 본 발명자들은 고순도의 품질 확보가 가능하고 대량생산에 적합한 에독사반의 간결한 제조공정을 개발하게 되었다.Accordingly, the present inventors have developed a simple manufacturing process of edoxaban that can ensure high purity quality and is suitable for mass production.

국제특허공개 제WO2003/000657호International Patent Publication No. WO2003/000657 국제특허공개 제WO2003/000680호International Patent Publication No. WO2003/000680

본 발명은 종래의 기술보다 획기적으로 진보된 에독사반의 제조방법을 제공하는 것으로 고순도, 고수율의 대량생산에 적합한 에독사반의 제조방법을 제공하는 것을 목적으로 한다. An object of the present invention is to provide a method for manufacturing edoxaban that is significantly advanced than the prior art, and an object of the present invention is to provide a method for manufacturing edoxaban suitable for high-purity, high-yield mass production.

본 발명의 목적을 달성하기 위하여, 본 발명은 하기 단계를 포함하는 화학식 1의 화합물, 이의 약학적으로 허용가능한 염 또는 이의 수화물의 신규 제조방법을 제공한다:In order to achieve the object of the present invention, the present invention provides a novel method for preparing a compound of Formula 1, a pharmaceutically acceptable salt thereof, or a hydrate thereof, comprising the steps of:

(S-1) 하기 화학식 6 화합물을 하기 화학식 10 화합물과 반응시켜 하기 화학식 7 화합물을 제조하는 단계;(S-1) reacting a compound of Formula 6 with a compound of Formula 10 to prepare a compound of Formula 7;

(S-2) 상기 화학식 7 화합물을 미츠노부(Mitsunobu) 반응시켜 하기 화학식 8 화합물을 제조하는 단계;(S-2) reacting the compound of Formula 7 with a Mitsunobu reaction to prepare a compound of Formula 8;

(S-3) 상기 화학식 8 화합물을 탈보호화 반응시켜 하기 화학식 9 화합물을 제조하는 단계; 및(S-3) deprotecting the compound of Formula 8 to prepare a compound of Formula 9; and

(S-4) 상기 화학식 9 화합물을 하기 화학식 11 화합물과 반응시켜 하기 화학식 1 화합물을 제조하는 단계.(S-4) preparing a compound of Formula 1 by reacting the compound of Formula 9 with a compound of Formula 11.

[화학식 1][Formula 1]

Figure pat00005
Figure pat00005

[화학식 6][Formula 6]

Figure pat00006
Figure pat00006

[화학식 7][Formula 7]

Figure pat00007
Figure pat00007

[화학식 8][Formula 8]

Figure pat00008
Figure pat00008

[화학식 9][Formula 9]

Figure pat00009
Figure pat00009

[화학식 10][Formula 10]

Figure pat00010
Figure pat00010

[화학식 11][Formula 11]

Figure pat00011
Figure pat00011

본 발명의 제조방법의 일례는 하기 반응식 4로 제공된다.An example of the preparation method of the present invention is provided by Scheme 4 below.

<반응식 4> <Scheme 4>

Figure pat00012
Figure pat00012

본 발명은 상업생산 적용에 까다로운 금속 촉매를 사용한 수소화 반응, 또는 반응시에 무수조건에서 수행해야 하는 반응, 또는 폭발성을 갖는 여러 종류의 시약들을 사용하지 않는 장점이 있다. 따라서 본 발명의 제조방법은 고순도, 고수율로 화학식 1 화합물, 이의 약학적으로 허용가능한 염 또는 이의 수화물을 안정적으로 제공할 수 있다.The present invention has the advantage of not using a hydrogenation reaction using a metal catalyst, which is difficult for commercial production applications, or a reaction that must be performed under anhydrous conditions during the reaction, or various kinds of reagents having explosive properties. Therefore, the preparation method of the present invention can stably provide the compound of Formula 1, a pharmaceutically acceptable salt thereof, or a hydrate thereof with high purity and high yield.

본 발명에 따른 화학식 1의 화합물(에독사반), 이의 약학적으로 허용가능한 염 또는 이의 수화물의 신규 제조방법은 하기 4 단계를 포함한다:A novel method for preparing a compound of Formula 1 (edoxaban), a pharmaceutically acceptable salt thereof, or a hydrate thereof according to the present invention includes the following four steps:

(S-1) 하기 화학식 6 화합물을 하기 화학식 10 화합물과 반응시켜 하기 화학식 7 화합물을 제조하는 단계;(S-1) reacting a compound of Formula 6 with a compound of Formula 10 to prepare a compound of Formula 7;

(S-2) 상기 화학식 7 화합물을 미츠노부(Mitsunobu) 반응시켜 하기 화학식 8 화합물을 제조하는 단계;(S-2) reacting the compound of Formula 7 with a Mitsunobu reaction to prepare a compound of Formula 8;

(S-3) 상기 화학식 8 화합물을 탈보호화 반응시켜 하기 화학식 9 화합물을 제조하는 단계; 및(S-3) deprotecting the compound of Formula 8 to prepare a compound of Formula 9; and

(S-4) 상기 화학식 9 화합물을 하기 화학식 11 화합물과 반응시켜 하기 화학식 1 화합물을 제조하는 단계.(S-4) preparing a compound of Formula 1 by reacting the compound of Formula 9 with a compound of Formula 11.

이하, 본 발명의 제조방법을 각 단계별로 상세히 설명하면 다음과 같다.Hereinafter, the manufacturing method of the present invention will be described in detail for each step as follows.

S-1 단계Step S-1

본 발명의 제조방법에서, S-1 단계는 화학식 6 화합물을 화학식 10 화합물과 반응시켜 하기 화학식 7 화합물을 제조하는 단계이다. 상기 S-1 단계는 구체적으로 다음 두 가지 방법으로 수행될 수 있다.In the preparation method of the present invention, step S-1 is a step of preparing a compound of Formula 7 below by reacting a compound of Formula 6 with a compound of Formula 10. Step S-1 may be specifically performed in the following two ways.

첫번째 방법은, 화학식 10의 화합물을 제1 유기용매 존재 하에서 염소화제로 활성화시킨 후, 화학식 6의 화합물과 제2 유기용매 및 염기 존재 하에서 반응을 시켜 화학식 7의 화합물을 제조하는 방법이다. 여기서, 상기 제1 유기용매는 디클로로메탄이 사용될 수 있고, 제2 유기용매는 톨루엔, 아세토니트릴, 테트라히드로퓨란, 디메틸포름아미드 또는 이들의 조합이 사용될 수 있다. 상기 염소화제는 티오닐클로라이드(SOCl2)일 수 있으나, 이에 제한되지 않는다. 상기 염기는 트리에틸아민, 디이소프로필에틸아민, 피리딘 일 수 있으나, 이에 제한되지 않는다.The first method is to prepare the compound of Formula 7 by activating the compound of Formula 10 with a chlorinating agent in the presence of a first organic solvent and then reacting the compound of Formula 6 with the compound of Formula 6 in the presence of a second organic solvent and base. Here, the first organic solvent may be dichloromethane, and the second organic solvent may be toluene, acetonitrile, tetrahydrofuran, dimethylformamide, or a combination thereof. The chlorinating agent may be thionyl chloride (SOCl 2 ), but is not limited thereto. The base may be triethylamine, diisopropylethylamine, or pyridine, but is not limited thereto.

두 번째 방법은, 화학식 6 화합물과 화학식 10 화합물을 커플링 반응 (Coupling Reaction) 시켜서 화학식 7의 화합물을 제조하는 방법이다. 여기서, 커플링 시약(Coupling Reagents)으로 HOBt(hydroxybenzotriazole), EDCI(1-Ethyl-3-(3-dimethylaminopropyl)carbodiimide) 또는 이들의 조합을 사용할 수 있으나 이에 제한되지 않는다.The second method is a method of preparing a compound of Formula 7 by performing a coupling reaction between a compound of Formula 6 and a compound of Formula 10. Here, hydroxybenzotriazole (HOBt), 1-Ethyl-3-(3-dimethylaminopropyl)carbodiimide (EDCI), or a combination thereof may be used as the coupling reagents, but is not limited thereto.

화학식 10 화합물은 상업적으로 구입 가능하며, 당업계에 공지된 방법으로 제조될 수 있다.The compound of formula (10) is commercially available and can be prepared by methods known in the art.

본 발명은 단계 S-1의 일례로 실시예 1을 제공하지만 반드시 이에 제한되는 것은 아니다.The present invention provides Example 1 as an example of step S-1, but is not necessarily limited thereto.

[화학식 6][Formula 6]

Figure pat00013
Figure pat00013

[화학식 7][Formula 7]

Figure pat00014
Figure pat00014

[화학식 10][Formula 10]

Figure pat00015
Figure pat00015

S-2 단계Step S-2

본 발명의 제조방법에서, S-2 단계는 상기 S-1 단계에서 제조된 화학식 7 화합물을 미츠노부(Mitsunobu) 반응시켜 화학식 8 화합물을 제조하는 단계이다. 구체적으로, 상기 미츠노부 반응은 화학식 7 화합물을 프탈이미드(Phthalimide)와 미츠노부 반응시키는 것일 수 있다. 미츠노부 반응의 구체적 조건을 설명하는 문헌은 유기화학 분야의 통상의 기술자에게 공지되어 있으며, 본 발명에 그 내용이 참조로 포함된다.In the preparation method of the present invention, step S-2 is a step of preparing the compound of formula 8 by performing a Mitsunobu reaction of the compound of formula 7 prepared in step S-1. Specifically, the Mitsunobu reaction may be a Mitsunobu reaction of the compound of Formula 7 with phthalimide. Documents describing specific conditions for the Mitsunobu reaction are known to those skilled in the art of organic chemistry, and the content of which is incorporated herein by reference.

[화학식 8][Formula 8]

Figure pat00016
Figure pat00016

본 발명은 단계 S-2의 일례로 실시예 2를 제공하지만 반드시 이에 제한되는 것은 아니다.The present invention provides Example 2 as an example of step S-2, but is not necessarily limited thereto.

S-3 단계Step S-3

본 발명의 제조방법에서, S-3 단계는 상기 S-2 단계에서 제조된 화학식 8 화합물을 탈보호화(Deprotection) 반응을 하여 화학식 9 화합물을 제조하는 단계이다. 상기 S-3 단계는 유기용매, 수용액 또는 이들의 혼합용매의 존재 하에서 반응을 수행할 수 있다. 상기 탈보호화 반응에 사용되는 탈보호기 시약으로는 히드라진 또는 이의 수화물(Hydrazine hydrate)을 사용할 수 있으나 이에 제한되지 않는다. 상기 탈보호화 반응에 의해, 아민기(amine group)를 생성시킨 화학식 9 화합물이 제조된다.In the preparation method of the present invention, step S-3 is a step of preparing the compound of formula 9 by deprotection reaction of the compound of formula 8 prepared in step S-2. In step S-3, the reaction may be performed in the presence of an organic solvent, an aqueous solution, or a mixed solvent thereof. As the deprotecting group reagent used in the deprotection reaction, hydrazine or a hydrate thereof may be used, but is not limited thereto. By the deprotection reaction, the compound of Formula 9 in which an amine group is generated is prepared.

[화학식 9][Formula 9]

Figure pat00017
Figure pat00017

본 발명은 단계 S-3의 일례로 실시예 3의 단계 1을 제공하지만 반드시 이에 제한되는 것은 아니다.The present invention provides step 1 of Example 3 as an example of step S-3, but is not necessarily limited thereto.

S-4 단계Step S-4

본 발명의 제조방법에서, S-4 단계는 상기 S-3 단계에서 제조된 화학식 9 화합물을 화학식 11 화합물과 반응시켜 화학식 1 화합물(에독사반)을 제조하는 단계이다. In the preparation method of the present invention, step S-4 is a step of preparing the compound of formula 1 (edoxaban) by reacting the compound of formula 9 prepared in step S-3 with the compound of formula 11.

[화학식 11][Formula 11]

Figure pat00018
Figure pat00018

화학식 11 화합물은 상업적으로 구입 가능하며, 당업계에 공지된 방법으로 제조될 수 있다. The compound of formula 11 is commercially available and can be prepared by methods known in the art.

본 발명은 단계 S-4의 일례로 실시예 3의 단계 2를 제공하지만 반드시 이에 제한되는 것은 아니다.The present invention provides step 2 of Example 3 as an example of step S-4, but is not necessarily limited thereto.

또한, 상기 화학식 1 화합물에 추가적인 반응을 통해 화학식 1 화합물의 약학적으로 허용가능한 염 또는 이의 수화물(예컨대, 에독사반의 토실산염 수화물)을 제조할 수 있다(실시예 4 참조).In addition, a pharmaceutically acceptable salt of the compound of Formula 1 or a hydrate thereof (eg, tosylate hydrate of edoxaban) may be prepared through an additional reaction with the compound of Formula 1 (see Example 4).

본 발명은 또한, 본 발명의 신규 제조방법의 중간체로 사용된 신규 화학식 7 화합물 및 화학식 8 화합물을 제공한다.The present invention also provides novel compounds of Formula 7 and Formula 8 used as intermediates in the novel production method of the present invention.

본 발명에 따른 제조방법은 기존에 알려진 선행기술 들에서 사용되는 고가의 금속 촉매를 사용하거나 폭발성이 높은 시약들을 사용하지 않으며 또한 고압 반응 등의 특수한 반응설비를 필요로 하지 않는다. 따라서, 본 발명은 간결하고 안전한 에독사반의 제조방법으로 고순도, 고수율의 에독사반을 제조할 수 있다.The manufacturing method according to the present invention does not use expensive metal catalysts or highly explosive reagents used in known prior art, and does not require special reaction equipment such as high-pressure reaction. Therefore, the present invention can manufacture edoxaban of high purity and high yield by a simple and safe manufacturing method of edoxaban.

이하, 본 발명에 따른 제조방법에 대해 실시예를 들어 상세히 설명한다. 그러나 본 발명이 이에 한정되는 것은 아니다.Hereinafter, the manufacturing method according to the present invention will be described in detail with reference to Examples. However, the present invention is not limited thereto.

<실시예 1> N-((1R,2R,5S)-5-(디메틸카바모일)-2-히드록시시클로헥실)-5-메틸-4,5,6,7-테트라히드로티아졸로[5,4-c]피리딘-2-카복사미드(화학식 7)의 제조<Example 1> N-((1R,2R,5S)-5-(dimethylcarbamoyl)-2-hydroxycyclohexyl)-5-methyl-4,5,6,7-tetrahydrothiazolo[5 Preparation of ,4-c]pyridine-2-carboxamide (Formula 7)

단계 1: (1S,4S,5S)-4-브로모-6-옥사바이시클로[3.2.1]옥탄-7온의 제조Step 1: Preparation of (1S,4S,5S)-4-bromo-6-oxabicyclo[3.2.1]octan-7one

Figure pat00019
Figure pat00019

(1S)-시클로헥스-3-엔-1-카복시산 (S)-알파-페닐에틸아민 염(2) 10.0g(40.4 mmol)과 디클로로메탄 50 ml를 투입하고 교반한 후 산화칼슘 2.4g(42.4 mmol)을 투입했다. 반응액을 0~10 ℃로 냉각 후 N-브로모숙신이미드(NBS) 7.5g(42.4 mmol)을 천천히 투입했다. 실온에서 20시간 반응 후 10% 티오황산 나트륨 수용액 50 ml를 투입하고 30분간 교반한 뒤 유기층을 분리했다. 분리된 유기층을 정제수 50 ml를 이용하여 2회 세척했다. 분리된 유기층을 무수황산나트륨을 이용해 탈수하고 농축한 뒤 농축된 반응물에 이소프로필알콜을 투입하고 실온에서 2시간 교반했다. 생성된 고체를 여과하고 30 ~ 40 ℃오븐에서 3 ~ 4시간 감압건조하여 표제 화합물 7.3 g(35.6 mmol, 수율 88.0%)을 수득했다.(1S)-Cyclohex-3-ene-1-carboxylic acid (S)-alpha-phenylethylamine salt (2) 10.0 g (40.4 mmol) and 50 ml of dichloromethane were added and stirred, followed by stirring 2.4 g of calcium oxide ( 42.4 mmol) was added. After the reaction solution was cooled to 0-10 °C, 7.5 g (42.4 mmol) of N-bromosuccinimide (NBS) was slowly added thereto. After 20 hours of reaction at room temperature, 50 ml of a 10% aqueous sodium thiosulfate solution was added, stirred for 30 minutes, and the organic layer was separated. The separated organic layer was washed twice with 50 ml of purified water. The separated organic layer was dehydrated using anhydrous sodium sulfate and concentrated. Then, isopropyl alcohol was added to the concentrated reaction product, followed by stirring at room temperature for 2 hours. The resulting solid was filtered and dried under reduced pressure in an oven at 30-40 °C for 3-4 hours to obtain 7.3 g (35.6 mmol, yield 88.0%) of the title compound.

1H-NMR (500 MHz, CDCl3) : δ 1.59-1.84 (2H, m), 1.88-2.02 (2H, m), 2.27-2.34 (2H, m), 4.33 (1H, q), 5.02 (1H, q) 1 H-NMR (500 MHz, CDCl 3 ): δ 1.59-1.84 (2H, m), 1.88-2.02 (2H, m), 2.27-2.34 (2H, m), 4.33 (1H, q), 5.02 (1H) , q)

단계 2: (1S,3R,4R)-3-아미노-4-히드록시-N,N-디메틸시클로헥산-1-카복사미드의 제조Step 2: Preparation of (1S,3R,4R)-3-amino-4-hydroxy-N,N-dimethylcyclohexane-1-carboxamide

Figure pat00020
Figure pat00020

반응기에 실시예 1의 단계 1에서 생성된 화합물 20 g(0.098 mol)과 아세토니트릴 120 mL를 투입하고 50% 디메틸아민 수용액 35.2 g(0.39 mol)을 투입한 뒤 10 ℃ 이하에서 10 시간 반응했다. 반응액을 감압농축하여 용매를 제거한 뒤 반응액에 디클로로메탄 100 mL를 투입하고 40% NaOH sol 24.5g(0.245 mol)을 투입하고 실온에서 4시간 반응했다. 다시 반응액을 농축하고 암모니아수 125 mL(2.06 mol)을 투입하고 40 ℃에서 10 시간 교반한 뒤 반응액에 디클로로메탄 100 mL를 투입하고 10 분간 교반하고 유기층을 분리했다. 분리된 유기층을 정제수 100 mL로 2회 세척하고 무수황산나트륨 4 g을 이용하여 탈수한 후 감압농축했다. 농축된 반응액에 노르말헥산 30 mL를 투입하여 결정화하고, 결정을 여과 후 감압건조하여 표제 화합물 14.9 g(0.080 mol, 수율 82.0%)을 수득했다.20 g (0.098 mol) of the compound produced in Step 1 of Example 1 and 120 mL of acetonitrile were added to the reactor, and 35.2 g (0.39 mol) of a 50% aqueous dimethylamine solution was added, followed by reaction at 10 ° C. or less for 10 hours. After the reaction solution was concentrated under reduced pressure to remove the solvent, 100 mL of dichloromethane was added to the reaction solution, 24.5 g (0.245 mol) of 40% NaOH sol was added, and the reaction was conducted at room temperature for 4 hours. The reaction solution was concentrated again, aqueous ammonia 125 mL (2.06 mol) was added, and the mixture was stirred at 40° C. for 10 hours. Then, 100 mL of dichloromethane was added to the reaction solution, stirred for 10 minutes, and the organic layer was separated. The separated organic layer was washed twice with 100 mL of purified water, dehydrated using 4 g of anhydrous sodium sulfate, and then concentrated under reduced pressure. 30 mL of n-hexane was added to the concentrated reaction solution for crystallization, and the crystals were filtered and dried under reduced pressure to obtain 14.9 g (0.080 mol, yield 82.0%) of the title compound.

1H-NMR (500 MHz, CDCl3) : δ 1.60-1.78 (2H, m), 1.83-1.92 (2H, m), 2.18-2.24 (1H, m), 2.34-2.41 (1H, m), 2.81-2.90 (1H, m), 2.96 (3H, s), 3.74-3.79 (1H, m), 4.03-4.08 (1H, m) 1 H-NMR (500 MHz, CDCl 3 ): δ 1.60-1.78 (2H, m), 1.83-1.92 (2H, m), 2.18-2.24 (1H, m), 2.34-2.41 (1H, m), 2.81 -2.90 (1H, m), 2.96 (3H, s), 3.74-3.79 (1H, m), 4.03-4.08 (1H, m)

단계 3-1: N-((1R,2R,5S)-5-(디메틸카바모일)-2-히드록시시클로헥실)-5-메틸-4,5,6,7-테트라히드로티아졸로[5,4-c]피리딘-2-카복사미드(화학식 7 화합물)의 제조Step 3-1: N-((1R,2R,5S)-5-(dimethylcarbamoyl)-2-hydroxycyclohexyl)-5-methyl-4,5,6,7-tetrahydrothiazolo[5 Preparation of ,4-c]pyridine-2-carboxamide (compound of formula 7)

Figure pat00021
Figure pat00021

반응기에 5-메틸-4,5,6,7-테트라히드로티아졸로[5,4-c]피리딘-2-카복시산 5 g(0.025 mol)을 투입하고 디클로로메탄 50 mL를 투입하여 용해한 뒤 10℃이하로 냉각했다. 반응액에 티오닐클로라이드 3.1 g(0.026 mol)을 투입하고 10℃이하에서 4시간 교반하고 반응액을 감압농축했다. 농축된 반응액에 아세토니트릴 50 mL와 실시예 1의 단계 2에서 생성된 화합물 4.7 g(0.025 mol)을 투입하고, 트리에틸아민 5.3 g(0.052 mol)을 천천히 투입한 후 실온에서 6시간 교반하고 감압농축하여 용매를 제거한 후 정제수 100 mL를 투입하고 10℃이하에서 1시간 교반 후 여과, 감압건조하여 표제 화합물 8.4 g(0.023 mol, 수율 91.2%)을 수득했다.5 g (0.025 mol) of 5-methyl-4,5,6,7-tetrahydrothiazolo[5,4-c]pyridine-2-carboxylic acid was added to the reactor, and 50 mL of dichloromethane was added to dissolve, and then 10 It was cooled to below °C. To the reaction solution, 3.1 g (0.026 mol) of thionyl chloride was added, stirred at 10° C. or lower for 4 hours, and the reaction solution was concentrated under reduced pressure. To the concentrated reaction solution, 50 mL of acetonitrile and 4.7 g (0.025 mol) of the compound produced in step 2 of Example 1 were added, and 5.3 g (0.052 mol) of triethylamine was slowly added thereto, followed by stirring at room temperature for 6 hours. After concentration under reduced pressure to remove the solvent, 100 mL of purified water was added, stirred at 10° C. or lower for 1 hour, filtered and dried under reduced pressure to obtain 8.4 g (0.023 mol, yield 91.2%) of the title compound.

단계 3-2: N-((1R,2R,5S)-5-(디메틸카바모일)-2-히드록시시클로헥실)-5-메틸-4,5,6,7-테트라히드로티아졸로[5,4-c]피리딘-2-카복사미드(화학식 7 화합물)의 제조Step 3-2: N-((1R,2R,5S)-5-(dimethylcarbamoyl)-2-hydroxycyclohexyl)-5-methyl-4,5,6,7-tetrahydrothiazolo[5 Preparation of ,4-c]pyridine-2-carboxamide (compound of formula 7)

Figure pat00022
Figure pat00022

반응기에 실시예 1의 단계 2에서 생성된 화합물 4.7g (0.025 mol)과 아세토니트릴 35 mL를 투입하고 10℃이하로 냉각 교반하였다. 반응액에 트리에틸아민 10.1 g(0.100 mol), 5-메틸-4,5,6,7-테트라히드로티아졸로[5,4-c]피리딘-2-카복시산 5.4 g(0.027 mol), 하이드록시벤조트리아졸 4.1 g(0.030 mol), N-(3-디메틸아미노프로필)-N-에틸카보다이이미드 염산염 5.8 g(0.030 mol)을 순서대로 투입하고 20℃에서 20시간 교반한다. 반응액을 10℃로 냉각하고 정제수 65 mL를 투입하고 1시간 교반 후 여과하고 정제수 10 mL로 세척한 뒤 감압건조하여 표제 화합물 8.1g (0.022 mol, 수율 89.3%)을 수득하였다.4.7 g (0.025 mol) of the compound produced in step 2 of Example 1 and 35 mL of acetonitrile were added to the reactor, and the mixture was cooled and stirred at 10° C. or less. In the reaction solution, 10.1 g (0.100 mol) of triethylamine, 5.4 g (0.027 mol) of 5-methyl-4,5,6,7-tetrahydrothiazolo[5,4-c]pyridine-2-carboxylic acid, and hydro 4.1 g (0.030 mol) of oxybenzotriazole and 5.8 g (0.030 mol) of N-(3-dimethylaminopropyl)-N-ethylcarbodiimide hydrochloride were sequentially added, followed by stirring at 20° C. for 20 hours. The reaction solution was cooled to 10° C., 65 mL of purified water was added, stirred for 1 hour, filtered, washed with 10 mL of purified water, and dried under reduced pressure to obtain 8.1 g (0.022 mol, yield 89.3%) of the title compound.

1H-NMR (500 MHz, CDCl3) : δ 1.47-1.73 (4H, m), 2.01-2.15 (2H, t), 2.26 (3H, s), 2.38 (1H, m), 2.76-2.83 (4H, m),2.98 (6H, s), 3.37 (2H, s), 3.54 (1H, m), 4.16 (1H, m), 5.37 (1H, s), 8.32 (1H, s) 1 H-NMR (500 MHz, CDCl 3 ): δ 1.47-1.73 (4H, m), 2.01-2.15 (2H, t), 2.26 (3H, s), 2.38 (1H, m), 2.76-2.83 (4H) , m),2.98 (6H, s), 3.37 (2H, s), 3.54 (1H, m), 4.16 (1H, m), 5.37 (1H, s), 8.32 (1H, s)

<실시예 2> N-((1R,2S,5S)-5-(디메틸카바모일)-2-(1,3-디옥소이소인돌린-2-일)시클로헥실)-5-메틸-4,5,6,7-테트라히드로티아졸로[5,4-c]피리딘-2-카복사미드(화학식 8)의 제조<Example 2> N-((1R,2S,5S)-5-(dimethylcarbamoyl)-2-(1,3-dioxoisoindolin-2-yl)cyclohexyl)-5-methyl-4, Preparation of 5,6,7-tetrahydrothiazolo[5,4-c]pyridine-2-carboxamide (Formula 8)

Figure pat00023
Figure pat00023

반응기에 테트라히드로푸란 40 mL와 실시예 1에서 생성된 최종 화합물 10 g(0.027 mol)을 투입한 후 프탈이미드 4.7 g(0.032 mol), 트리페닐포스핀 8.4 g(0.032 mol)을 투입했다. 반응액을 10℃이하로 냉각하고 DEAD 7.1 g(0.041 mol)을 투입하였다. 실온에서 2시간 교반하고 45℃로 승온하여 12시간 교반했다. 반응액을 감압농축하고 디클로로메탄 50 mL와 정제수 50 mL를 반응기에 투입하고 유기층을 분리하여 감압농축했다. 농축된 반응액에 에탄올 60 mL를 투입하고 60℃로 승온하여 용해하고 10℃로 냉각 교반한 뒤 여과하고 감압건조하여 표제 화합물 10.9 g(0.022mol, 수율 80.0%)을 수득하였다.After adding 40 mL of tetrahydrofuran and 10 g (0.027 mol) of the final compound prepared in Example 1 to the reactor, 4.7 g (0.032 mol) of phthalimide and 8.4 g (0.032 mol) of triphenylphosphine were added. The reaction solution was cooled to 10° C. or less, and DEAD 7.1 g (0.041 mol) was added thereto. After stirring at room temperature for 2 hours, the temperature was raised to 45°C, and the mixture was stirred for 12 hours. The reaction solution was concentrated under reduced pressure, 50 mL of dichloromethane and 50 mL of purified water were added to the reactor, and the organic layer was separated and concentrated under reduced pressure. Into the concentrated reaction solution, 60 mL of ethanol was added, dissolved by heating to 60 °C, cooled to 10 °C, stirred, filtered, and dried under reduced pressure to obtain 10.9 g (0.022 mol, yield 80.0%) of the title compound.

1H-NMR (500 MHz, CDCl3) : δ 1.73-1.80 (4H, m), 2.02 (2H, t), 2.26 (3H, s), 2.38 (1H, m), 2.76-2.83 (4H, m), 2.98 (6H, s), 3.37 (2H, s), 4.16~4.18 (2H, m), 7.84-7.92 (4H, m), 8.32 (1H, s) 1 H-NMR (500 MHz, CDCl 3 ): δ 1.73-1.80 (4H, m), 2.02 (2H, t), 2.26 (3H, s), 2.38 (1H, m), 2.76-2.83 (4H, m) ), 2.98 (6H, s), 3.37 (2H, s), 4.16~4.18 (2H, m), 7.84-7.92 (4H, m), 8.32 (1H, s)

<실시예 3> N1-(5-클로로피리딘-2-일)-N2-((1S,2R,4S)-4-(디메틸카바모일)-2-(5-메틸-4,5,6,7-테트라히드로티아졸로[5,4-c]피리딘-2-카복사미도)시클로헥실)옥살라미드(화학식 1)의 제조<Example 3> N1-(5-chloropyridin-2-yl)-N2-((1S,2R,4S)-4-(dimethylcarbamoyl)-2-(5-methyl-4,5,6, Preparation of 7-tetrahydrothiazolo[5,4-c]pyridine-2-carboxamido)cyclohexyl)oxalamide (Formula 1)

단계 1: N-((1R,2S,5S)-2-아미노-5-(디메틸카바모일)시클로헥실)-5-메틸-4,5,6,7-테트라히드로티아졸로[5,4-c]피리딘-2-카복사미드의 제조Step 1: N-((1R,2S,5S)-2-amino-5-(dimethylcarbamoyl)cyclohexyl)-5-methyl-4,5,6,7-tetrahydrothiazolo[5,4- c] Preparation of pyridine-2-carboxamide

Figure pat00024
Figure pat00024

반응기에 실시예 2에서 생성된 최종 화합물 11 g(0.022 mol)과 메틸알코올 1100 mL, 히드라진 7.0 g(0.220 mol)을 투입하고 30℃로 승온하여 1시간 교반한 후 65℃로 승온하여 5시간 교반했다. 반응액을 20℃로 냉각한 뒤 반응액을 여과하고 여액을 감압농축한 뒤 테트라이드로푸란 180 mL를 투입한 뒤 60℃로 승온하여 용해하고 다시 10℃로 냉각한 후 여과했다. 여과된 습체를 감압건조하여 표제 화합물 7.3 g(0.020 mol, 수율 91.1%)을 수득하였다.11 g (0.022 mol) of the final compound prepared in Example 2, 1100 mL of methyl alcohol, and 7.0 g (0.220 mol) of hydrazine were added to the reactor, the temperature was raised to 30 ° C., and stirred for 1 hour. Then, the temperature was raised to 65 ° C. and stirred for 5 hours. did. After cooling the reaction solution to 20°C, the reaction solution was filtered, the filtrate was concentrated under reduced pressure, 180 mL of tetrahydrofuran was added, the temperature was raised to 60°C to dissolve, and then cooled to 10°C again and filtered. The filtered wet body was dried under reduced pressure to obtain 7.3 g (0.020 mol, yield 91.1%) of the title compound.

1H-NMR (500 MHz, CDCl3) : δ 1.48-1.79 (4H, m), 2.02 (2H, m), 2.26 (3H, s), 2.38 (1H, m), 2.76-2.83 (4H, m), 2.98 (6H, s), 3.19 (1H, m), 3.37 (2H, s), 3.49 (1H, m), 8.32 (1H, s) 1 H-NMR (500 MHz, CDCl 3 ): δ 1.48-1.79 (4H, m), 2.02 (2H, m), 2.26 (3H, s), 2.38 (1H, m), 2.76-2.83 (4H, m) ), 2.98 (6H, s), 3.19 (1H, m), 3.37 (2H, s), 3.49 (1H, m), 8.32 (1H, s)

단계 2: N1-(5-클로로피리딘-2-일)-N2-((1S,2R,4S)-4-(디메틸카바모일)-2-(5-메틸-4,5,6,7-테트라히드로티아졸로[5,4-c]피리딘-2-카복사미도)시클로헥실)옥살라미드의 제조Step 2: N1-(5-Chloropyridin-2-yl)-N2-((1S,2R,4S)-4-(dimethylcarbamoyl)-2-(5-methyl-4,5,6,7- Preparation of tetrahydrothiazolo[5,4-c]pyridine-2-carboxamido)cyclohexyl)oxalamide

Figure pat00025
Figure pat00025

반응기에 트리에틸아민 8.3 g(0.083 mol)과 실시예 3의 단계 1에서 생성된 화합물 12 g(0.033 mol)과 아세토니트릴 50 mL를 투입했다. 반응액을 60℃로 승온하고 Ethyl 2-[(5-클로로피리딘-2-일)아미노]-2-oxoacetate monohydrochloride 9.5 g(0.036 mol)를 천천히 투입하고 60℃를 유지하면서 4시간 교반하고 20℃로 냉각하고 10시간 교반했다. 반응액에 정제수 200 mL를 투입하고 5℃에서 1시간 교반한 뒤 여과하고 감압건조하여 표제 화합물 15.9 g(0.029 mol, 수율 89.2%)을 수득하였다.8.3 g (0.083 mol) of triethylamine, 12 g (0.033 mol) of the compound prepared in step 1 of Example 3, and 50 mL of acetonitrile were added to the reactor. The reaction solution was heated to 60°C, ethyl 2-[(5-chloropyridin-2-yl)amino]-2-oxoacetate monohydrochloride 9.5 g (0.036 mol) was slowly added, stirred while maintaining 60°C, and stirred for 4 hours at 20°C was cooled and stirred for 10 hours. 200 mL of purified water was added to the reaction solution, stirred at 5° C. for 1 hour, filtered, and dried under reduced pressure to obtain 15.9 g (0.029 mol, yield 89.2%) of the title compound.

1H-NMR (500 MHz, CDCl3) : δ 1.60-1.98 (3H, m), 2.00-2.16 (3H, m), 2.52 (3H,s), 2.78-2.90 (3H, m), 2.92-2.98 (2H, m), 2.95 (3H, s), 3.06 (3H, s), 3.69 (1H, d), 3.75 (1H, d), 4.07-4.15 (1H, m), 4.66-4.72 (1H, m) 7.40 (1H, m), 7.68 (1H, m), 8.03 (1H, d), 8.16 (1H, m), 8.30 (1H, m), 9.72 (1H, s) 1 H-NMR (500 MHz, CDCl 3 ): δ 1.60-1.98 (3H, m), 2.00-2.16 (3H, m), 2.52 (3H,s), 2.78-2.90 (3H, m), 2.92-2.98 (2H, m), 2.95 (3H, s), 3.06 (3H, s), 3.69 (1H, d), 3.75 (1H, d), 4.07-4.15 (1H, m), 4.66-4.72 (1H, m) ) 7.40 (1H, m), 7.68 (1H, m), 8.03 (1H, d), 8.16 (1H, m), 8.30 (1H, m), 9.72 (1H, s)

<실시예 4> N1-(5-클로로피리딘-2-일)-N2-((1S,2R,4S)-4-(디메틸카바모일)-2-(5-메틸-4,5,6,7-테트라히드로티아졸로[5,4-c]피리딘-2-카복사미도)시클로헥실)옥살라미드 토실레이트 모노하이드레이트의 제조<Example 4> N1-(5-chloropyridin-2-yl)-N2-((1S,2R,4S)-4-(dimethylcarbamoyl)-2-(5-methyl-4,5,6, Preparation of 7-tetrahydrothiazolo[5,4-c]pyridine-2-carboxamido)cyclohexyl)oxalamide tosylate monohydrate

Figure pat00026
Figure pat00026

반응기에 실시예 3 화합물 12 g(0.022 mol)을 반응기에 투입하고 에틸알코올 72 mL과 정제수 24 mL를 투입하고 p-톨루엔술폰산 일수화물 4.4 g(0.023 mol)을 투입한 뒤 반응액을 70℃로 승온하고 2시간 교반했다. 반응액을 20℃로 냉각 후 1시간 교반한 뒤 여과하고 습체를 감압건조하여 표제 화합물 15.5 g(0.021 mol, 수율 97.2%)을 수득하였다.12 g (0.022 mol) of the compound of Example 3 was put into the reactor, 72 mL of ethyl alcohol and 24 mL of purified water were added, 4.4 g (0.023 mol) of p-toluenesulfonic acid monohydrate was added, and the reaction solution was heated to 70° C. It heated up and stirred for 2 hours. The reaction solution was cooled to 20 °C, stirred for 1 hour, filtered, and dried under reduced pressure to obtain 15.5 g (0.021 mol, yield 97.2%) of the title compound.

1H-NMR (500 MHz, DMSO) : δ 1.48-1.74 (4H, m), 2.38 (2H, m), 2.26 (3H, s), 2.38 (1H, m), 2.43 (3H, s), 2.76-2.83 (4H, m), 2.98 (6H, s), 3.37 (2H, s), 4.15-4.23 (2H, m), 7.47 (2H, m), 7.70-7.75 (3H, m), 8.02 (1H, m), 8.28-8.31 (2H, m), 8.05 (1H, s),8.80 (1H, s), 11.23 (1H, s) 1 H-NMR (500 MHz, DMSO): δ 1.48-1.74 (4H, m), 2.38 (2H, m), 2.26 (3H, s), 2.38 (1H, m), 2.43 (3H, s), 2.76 -2.83 (4H, m), 2.98 (6H, s), 3.37 (2H, s), 4.15-4.23 (2H, m), 7.47 (2H, m), 7.70-7.75 (3H, m), 8.02 (1H) , m), 8.28-8.31 (2H, m), 8.05 (1H, s), 8.80 (1H, s), 11.23 (1H, s)

Claims (14)

(S-1) 하기 화학식 6 화합물을 하기 화학식 10 화합물과 반응시켜 하기 화학식 7 화합물을 제조하는 단계;
(S-2) 상기 화학식 7 화합물을 미츠노부(Mitsunobu) 반응시켜 하기 화학식 8 화합물을 제조하는 단계;
(S-3) 상기 화학식 8 화합물을 탈보호화 반응시켜 하기 화학식 9 화합물을 제조하는 단계; 및
(S-4) 상기 화학식 9 화합물을 하기 화학식 11 화합물과 반응시켜 하기 화학식 1 화합물을 제조하는 단계
를 포함하는, 하기 화학식 1 화합물, 이의 약학적으로 허용가능한 염 또는 이의 수화물의 제조방법:
[화학식 1]
Figure pat00027

[화학식 6]
Figure pat00028

[화학식 7]
Figure pat00029

[화학식 8]
Figure pat00030

[화학식 9]
Figure pat00031

[화학식 10]
Figure pat00032

[화학식 11]
Figure pat00033
(S-1) reacting a compound of Formula 6 with a compound of Formula 10 to prepare a compound of Formula 7;
(S-2) reacting the compound of Formula 7 with a Mitsunobu reaction to prepare a compound of Formula 8;
(S-3) deprotecting the compound of Formula 8 to prepare a compound of Formula 9; and
(S-4) preparing a compound of Formula 1 by reacting the compound of Formula 9 with a compound of Formula 11
A method for preparing a compound of Formula 1, a pharmaceutically acceptable salt thereof, or a hydrate thereof, comprising:
[Formula 1]
Figure pat00027

[Formula 6]
Figure pat00028

[Formula 7]
Figure pat00029

[Formula 8]
Figure pat00030

[Formula 9]
Figure pat00031

[Formula 10]
Figure pat00032

[Formula 11]
Figure pat00033
제 1 항에 있어서, (S-1) 단계는
(i) 화학식 10 화합물을 제1 유기용매 하에서 염소화제로 활성화시키는 단계; 및
(ii) 상기 활성화된 화학식 10 화합물을 화학식 6 화합물과 제2 유기용매 및 염기 하에서 반응시켜 화학식 7 화합물을 제조하는 단계
를 포함하는 것인 제조방법.
The method of claim 1, wherein step (S-1)
(i) activating the compound of Formula 10 with a chlorinating agent in a first organic solvent; and
(ii) reacting the activated compound of formula (10) with a compound of formula (6) in a second organic solvent and a base to prepare a compound of formula (7)
A manufacturing method comprising a.
제 2 항에 있어서, 제1 유기용매는 디클로로메탄인 제조방법.The method according to claim 2, wherein the first organic solvent is dichloromethane. 제 2 항에 있어서, 제2 유기용매는 톨루엔, 아세토니트릴, 테트라히드로퓨란, 디메틸포름아미드 또는 이들의 조합인 제조방법.The method according to claim 2, wherein the second organic solvent is toluene, acetonitrile, tetrahydrofuran, dimethylformamide, or a combination thereof. 제 2 항에 있어서, 염소화제는 티오닐클로라이드(SOCl2)인 제조방법.The method according to claim 2, wherein the chlorinating agent is thionyl chloride (SOCl 2 ). 제 2 항에 있어서, 염기는 트리에틸아민, 디이소프로필에틸아민, 피리딘, 또는 이들의 조합인 제조방법.The method according to claim 2, wherein the base is triethylamine, diisopropylethylamine, pyridine, or a combination thereof. 제 1 항에 있어서, (S-1) 단계는
화학식 6 화합물과 화학식 10 화합물을 하이드록시벤조트리아졸(HOBt), EDCI(1-Ethyl-3-(3-dimethylaminopropyl)carbodiimide) 또는 이들의 조합과 함께 커플링 반응시켜 화학식 7 화합물을 제조하는 단계
를 포함하는 것인 제조방법.
The method of claim 1, wherein step (S-1)
Preparing the compound of formula 7 by coupling the compound of formula 6 and the compound of formula 10 with hydroxybenzotriazole (HOBt), EDCI (1-Ethyl-3-(3-dimethylaminopropyl)carbodiimide), or a combination thereof
A manufacturing method comprising a.
제 1 항에 있어서, (S-2) 단계의 미츠노부 반응은 프탈이미드와 함께 수행되는 것인 제조방법.The method according to claim 1, wherein the Mitsunobu reaction in step (S-2) is performed together with phthalimide. 제 1 항에 있어서, (S-3) 단계의 탈보호화 반응은 유기용매, 수용액 또는 이들의 혼합 용매의 존재 하에서 반응시키는 것인 제조방법. The method according to claim 1, wherein the deprotection reaction in step (S-3) is performed in the presence of an organic solvent, an aqueous solution, or a mixed solvent thereof. 제 1 항에 있어서, (S-3) 단계의 탈보호화 반응은 히드라진, 이의 수화물 또는 이들의 조합과 함께 수행되는 것인 제조방법.The method according to claim 1, wherein the deprotection reaction of step (S-3) is performed with hydrazine, a hydrate thereof, or a combination thereof. 하기 화학식 7 화합물:
[화학식 7]
Figure pat00034
A compound of formula 7
[Formula 7]
Figure pat00034
제 11 항에 있어서, 하기 화학식 6 화합물을 하기 화학식 10 화합물과 반응시켜 제조되는 것인 화학식 7 화합물.
[화학식 6]
Figure pat00035

[화학식 10]
Figure pat00036
12. The compound of claim 11, which is prepared by reacting a compound of formula (6) with a compound of formula (10).
[Formula 6]
Figure pat00035

[Formula 10]
Figure pat00036
하기 화학식 8 화합물:
[화학식 8]
Figure pat00037
A compound of formula 8:
[Formula 8]
Figure pat00037
제 13 항에 있어서, 제 11 항에 따른 화합물을 미츠노부 반응시켜 제조되는 것인 화학식 8 화합물.14. The compound of Formula 8 according to claim 13, which is prepared by subjecting the compound according to claim 11 to a Mitsunobu reaction.
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115724792A (en) * 2022-11-24 2023-03-03 上海柏狮生物科技有限公司 A kind of edoxaban key intermediate and its synthetic method
WO2024185438A1 (en) * 2023-03-09 2024-09-12 株式会社カネカ Azide compound, amine compound, and method for producing edoxaban

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WO2003000680A1 (en) 2001-06-20 2003-01-03 Daiichi Pharmaceutical Co., Ltd. Diamine derivatives
WO2003000657A1 (en) 2001-06-20 2003-01-03 Daiichi Pharmaceutical Co., Ltd. Diamine derivatives

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003000680A1 (en) 2001-06-20 2003-01-03 Daiichi Pharmaceutical Co., Ltd. Diamine derivatives
WO2003000657A1 (en) 2001-06-20 2003-01-03 Daiichi Pharmaceutical Co., Ltd. Diamine derivatives

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115724792A (en) * 2022-11-24 2023-03-03 上海柏狮生物科技有限公司 A kind of edoxaban key intermediate and its synthetic method
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