KR20200032844A - 고분자 전해질 및 이의 제조방법 - Google Patents
고분자 전해질 및 이의 제조방법 Download PDFInfo
- Publication number
- KR20200032844A KR20200032844A KR1020180111963A KR20180111963A KR20200032844A KR 20200032844 A KR20200032844 A KR 20200032844A KR 1020180111963 A KR1020180111963 A KR 1020180111963A KR 20180111963 A KR20180111963 A KR 20180111963A KR 20200032844 A KR20200032844 A KR 20200032844A
- Authority
- KR
- South Korea
- Prior art keywords
- polymer electrolyte
- based material
- ethenylbenzene
- bis
- acrylate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000005518 polymer electrolyte Substances 0.000 title claims abstract description 116
- 238000000034 method Methods 0.000 title claims description 18
- 239000002608 ionic liquid Substances 0.000 claims abstract description 18
- 239000000178 monomer Substances 0.000 claims abstract description 18
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims abstract description 17
- 150000001491 aromatic compounds Chemical class 0.000 claims abstract description 16
- 238000004519 manufacturing process Methods 0.000 claims abstract description 15
- 239000002904 solvent Substances 0.000 claims abstract description 13
- 239000002671 adjuvant Substances 0.000 claims abstract description 7
- 239000000463 material Substances 0.000 claims description 42
- 229910052744 lithium Inorganic materials 0.000 claims description 33
- 239000012528 membrane Substances 0.000 claims description 30
- 239000000203 mixture Substances 0.000 claims description 30
- -1 1,1 '-(1,10-decanediyl) bis (4-ethenylbenzene) [1,1'-(1,10-Decanediyl ) bis (4-ethenylbenzene)] Chemical compound 0.000 claims description 29
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims description 29
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims description 27
- 229910003002 lithium salt Inorganic materials 0.000 claims description 27
- 159000000002 lithium salts Chemical class 0.000 claims description 27
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 claims description 22
- 150000001408 amides Chemical class 0.000 claims description 17
- 229910052760 oxygen Inorganic materials 0.000 claims description 16
- 125000005250 alkyl acrylate group Chemical group 0.000 claims description 15
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 15
- 239000001301 oxygen Substances 0.000 claims description 15
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 claims description 12
- 239000003999 initiator Substances 0.000 claims description 9
- 239000011259 mixed solution Substances 0.000 claims description 9
- 239000000758 substrate Substances 0.000 claims description 8
- 239000012453 solvate Substances 0.000 claims description 7
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims description 6
- YFNKIDBQEZZDLK-UHFFFAOYSA-N triglyme Chemical compound COCCOCCOCCOC YFNKIDBQEZZDLK-UHFFFAOYSA-N 0.000 claims description 6
- 229910013872 LiPF Inorganic materials 0.000 claims description 5
- 101150058243 Lipf gene Proteins 0.000 claims description 5
- 229910052757 nitrogen Inorganic materials 0.000 claims description 5
- 238000000016 photochemical curing Methods 0.000 claims description 5
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 claims description 4
- PMDCZENCAXMSOU-UHFFFAOYSA-N N-ethylacetamide Chemical compound CCNC(C)=O PMDCZENCAXMSOU-UHFFFAOYSA-N 0.000 claims description 4
- OHLUUHNLEMFGTQ-UHFFFAOYSA-N N-methylacetamide Chemical compound CNC(C)=O OHLUUHNLEMFGTQ-UHFFFAOYSA-N 0.000 claims description 4
- ATHHXGZTWNVVOU-UHFFFAOYSA-N N-methylformamide Chemical compound CNC=O ATHHXGZTWNVVOU-UHFFFAOYSA-N 0.000 claims description 4
- 238000001723 curing Methods 0.000 claims description 4
- 239000012744 reinforcing agent Substances 0.000 claims description 4
- ZUHZGEOKBKGPSW-UHFFFAOYSA-N tetraglyme Chemical compound COCCOCCOCCOCCOC ZUHZGEOKBKGPSW-UHFFFAOYSA-N 0.000 claims description 4
- 229910013528 LiN(SO2 CF3)2 Inorganic materials 0.000 claims description 3
- 229920001187 thermosetting polymer Polymers 0.000 claims description 3
- LIBSRZRRETWQKD-UHFFFAOYSA-N 1-ethenyl-4-[6-(4-ethenylphenyl)hexyl]benzene Chemical compound C1=CC(C=C)=CC=C1CCCCCCC1=CC=C(C=C)C=C1 LIBSRZRRETWQKD-UHFFFAOYSA-N 0.000 claims description 2
- OIEDDNJAEIOXEP-UHFFFAOYSA-N 2-methylideneicosanoic acid octadecyl prop-2-enoate Chemical compound C(CCCCCCCCCCCCCCCCC)C(C(=O)O)=C.C(C=C)(=O)OCCCCCCCCCCCCCCCCCC OIEDDNJAEIOXEP-UHFFFAOYSA-N 0.000 claims description 2
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 claims description 2
- 229910015015 LiAsF 6 Inorganic materials 0.000 claims description 2
- 229910013063 LiBF 4 Inorganic materials 0.000 claims description 2
- 229910013684 LiClO 4 Inorganic materials 0.000 claims description 2
- 229910013398 LiN(SO2CF2CF3)2 Inorganic materials 0.000 claims description 2
- 229910013870 LiPF 6 Inorganic materials 0.000 claims description 2
- 229910012513 LiSbF 6 Inorganic materials 0.000 claims description 2
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 claims description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 claims description 2
- VENJJOGQEGHFPI-UHFFFAOYSA-N butyl prop-2-enoate;2-methylidenehexanoic acid Chemical group CCCCOC(=O)C=C.CCCCC(=C)C(O)=O VENJJOGQEGHFPI-UHFFFAOYSA-N 0.000 claims description 2
- FWLDHHJLVGRRHD-UHFFFAOYSA-N decyl prop-2-enoate Chemical compound CCCCCCCCCCOC(=O)C=C FWLDHHJLVGRRHD-UHFFFAOYSA-N 0.000 claims description 2
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 claims description 2
- LNMQRPPRQDGUDR-UHFFFAOYSA-N hexyl prop-2-enoate Chemical compound CCCCCCOC(=O)C=C LNMQRPPRQDGUDR-UHFFFAOYSA-N 0.000 claims description 2
- PBOSTUDLECTMNL-UHFFFAOYSA-N lauryl acrylate Chemical compound CCCCCCCCCCCCOC(=O)C=C PBOSTUDLECTMNL-UHFFFAOYSA-N 0.000 claims description 2
- AJFDBNQQDYLMJN-UHFFFAOYSA-N n,n-diethylacetamide Chemical compound CCN(CC)C(C)=O AJFDBNQQDYLMJN-UHFFFAOYSA-N 0.000 claims description 2
- KERBAAIBDHEFDD-UHFFFAOYSA-N n-ethylformamide Chemical compound CCNC=O KERBAAIBDHEFDD-UHFFFAOYSA-N 0.000 claims description 2
- QJQAMHYHNCADNR-UHFFFAOYSA-N n-methylpropanamide Chemical compound CCC(=O)NC QJQAMHYHNCADNR-UHFFFAOYSA-N 0.000 claims description 2
- 229940065472 octyl acrylate Drugs 0.000 claims description 2
- ANISOHQJBAQUQP-UHFFFAOYSA-N octyl prop-2-enoate Chemical compound CCCCCCCCOC(=O)C=C ANISOHQJBAQUQP-UHFFFAOYSA-N 0.000 claims description 2
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 claims description 2
- QLNJFJADRCOGBJ-UHFFFAOYSA-N propionamide Chemical compound CCC(N)=O QLNJFJADRCOGBJ-UHFFFAOYSA-N 0.000 claims description 2
- 229940080818 propionamide Drugs 0.000 claims description 2
- XZHNPVKXBNDGJD-UHFFFAOYSA-N tetradecyl prop-2-enoate Chemical compound CCCCCCCCCCCCCCOC(=O)C=C XZHNPVKXBNDGJD-UHFFFAOYSA-N 0.000 claims description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims 3
- 229910013884 LiPF3 Inorganic materials 0.000 claims 1
- AMLJWLYRONUCKO-UHFFFAOYSA-N n-(6-amino-5-iodopyridin-2-yl)acetamide Chemical compound CC(=O)NC1=CC=C(I)C(N)=N1 AMLJWLYRONUCKO-UHFFFAOYSA-N 0.000 claims 1
- 239000002994 raw material Substances 0.000 abstract description 2
- 125000000217 alkyl group Chemical group 0.000 abstract 1
- 230000000379 polymerizing effect Effects 0.000 abstract 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 21
- 239000010408 film Substances 0.000 description 20
- 229920000642 polymer Polymers 0.000 description 19
- 230000000052 comparative effect Effects 0.000 description 17
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 15
- 239000003792 electrolyte Substances 0.000 description 13
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 13
- 229920005989 resin Polymers 0.000 description 10
- 239000011347 resin Substances 0.000 description 10
- 239000000126 substance Substances 0.000 description 9
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 8
- 229910001416 lithium ion Inorganic materials 0.000 description 8
- QSZMZKBZAYQGRS-UHFFFAOYSA-N lithium;bis(trifluoromethylsulfonyl)azanide Chemical compound [Li+].FC(F)(F)S(=O)(=O)[N-]S(=O)(=O)C(F)(F)F QSZMZKBZAYQGRS-UHFFFAOYSA-N 0.000 description 8
- 229910052799 carbon Inorganic materials 0.000 description 7
- 239000010949 copper Substances 0.000 description 7
- 150000002500 ions Chemical class 0.000 description 7
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 7
- 229910003473 lithium bis(trifluoromethanesulfonyl)imide Inorganic materials 0.000 description 7
- 229910052759 nickel Inorganic materials 0.000 description 7
- 229910052782 aluminium Inorganic materials 0.000 description 6
- 210000004027 cell Anatomy 0.000 description 6
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 5
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 5
- 229910052802 copper Inorganic materials 0.000 description 5
- 229910052742 iron Inorganic materials 0.000 description 5
- 239000011133 lead Substances 0.000 description 5
- 239000011572 manganese Substances 0.000 description 5
- 238000006116 polymerization reaction Methods 0.000 description 5
- 239000007784 solid electrolyte Substances 0.000 description 5
- 229910052719 titanium Inorganic materials 0.000 description 5
- 239000010936 titanium Substances 0.000 description 5
- RCEJCSULJQNRQQ-UHFFFAOYSA-N 2-methylbutanenitrile Chemical compound CCC(C)C#N RCEJCSULJQNRQQ-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 239000004698 Polyethylene Substances 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 239000004020 conductor Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000007773 negative electrode material Substances 0.000 description 4
- 229920000573 polyethylene Polymers 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 229910001220 stainless steel Inorganic materials 0.000 description 4
- 239000010935 stainless steel Substances 0.000 description 4
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 239000002033 PVDF binder Substances 0.000 description 3
- 239000004743 Polypropylene Substances 0.000 description 3
- 239000011230 binding agent Substances 0.000 description 3
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- 238000000157 electrochemical-induced impedance spectroscopy Methods 0.000 description 3
- 239000011888 foil Substances 0.000 description 3
- 229910003480 inorganic solid Inorganic materials 0.000 description 3
- 239000011244 liquid electrolyte Substances 0.000 description 3
- 229910052748 manganese Inorganic materials 0.000 description 3
- 229920001155 polypropylene Polymers 0.000 description 3
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 2
- YLZOPXRUQYQQID-UHFFFAOYSA-N 3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)-1-[4-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]piperazin-1-yl]propan-1-one Chemical compound N1N=NC=2CN(CCC=21)CCC(=O)N1CCN(CC1)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F YLZOPXRUQYQQID-UHFFFAOYSA-N 0.000 description 2
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- 229910014689 LiMnO Inorganic materials 0.000 description 2
- 229910013716 LiNi Inorganic materials 0.000 description 2
- 229910017267 Mo 6 S 8 Inorganic materials 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
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- 229910006404 SnO 2 Inorganic materials 0.000 description 2
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- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 238000003848 UV Light-Curing Methods 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- KLARSDUHONHPRF-UHFFFAOYSA-N [Li].[Mn] Chemical compound [Li].[Mn] KLARSDUHONHPRF-UHFFFAOYSA-N 0.000 description 2
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- IFBMOBFQBJZBMV-UHFFFAOYSA-N [phenyl-(2,4,6-trimethylbenzoyl)phosphanyl]-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(C=1C=CC=CC=1)C(=O)C1=C(C)C=C(C)C=C1C IFBMOBFQBJZBMV-UHFFFAOYSA-N 0.000 description 2
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- 150000001875 compounds Chemical class 0.000 description 2
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- ZQMIGQNCOMNODD-UHFFFAOYSA-N diacetyl peroxide Chemical compound CC(=O)OOC(C)=O ZQMIGQNCOMNODD-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
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- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 239000003273 ketjen black Substances 0.000 description 2
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- FUJCRWPEOMXPAD-UHFFFAOYSA-N lithium oxide Chemical compound [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 description 2
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- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- FVQMJJQUGGVLEP-UHFFFAOYSA-N (2-methylpropan-2-yl)oxy 2-ethylhexaneperoxoate Chemical compound CCCCC(CC)C(=O)OOOC(C)(C)C FVQMJJQUGGVLEP-UHFFFAOYSA-N 0.000 description 1
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- 229910007860 Li3.25Ge0.25P0.75S4 Inorganic materials 0.000 description 1
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- 229910015643 LiMn 2 O 4 Inorganic materials 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
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- H01M10/00—Secondary cells; Manufacture thereof
- H01M10/05—Accumulators with non-aqueous electrolyte
- H01M10/056—Accumulators with non-aqueous electrolyte characterised by the materials used as electrolytes, e.g. mixed inorganic/organic electrolytes
- H01M10/0564—Accumulators with non-aqueous electrolyte characterised by the materials used as electrolytes, e.g. mixed inorganic/organic electrolytes the electrolyte being constituted of organic materials only
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- H—ELECTRICITY
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- H—ELECTRICITY
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Abstract
Description
도 2는 실시예 3 및 비교예 3에서 제조된 고분자 전해질막을 포함하는 코인셀에 대한 전압안정성을 측정한 결과를 나타낸 그래프이다.
도 3은 실시예 1의 고분자 전해질 막에 대한 발화 전 및 발화 후의 사진을 나타낸 것이다.
(단위: 중량%) |
말단에 비닐기를 포함하는 방향족 화합물 | Styrene(S) 주2) | 알킬 아크릴레이트계 단량체 | SIL주4 ) | |
디비닐벤젠(V)주1 ) | 부틸아크릴레이트(B)주3 ) | G3 | LiTFSI | ||
실시예 1 | 0.4 | 0.6 | 21 | 30 | 48 |
실시예 2 | 2 | 1 | 19 | 30 | 48 |
실시예 3 | 2 | 2 | 18 | 30 | 48 |
주1) 디비닐벤젠 (divinylbenzene, Sigma-Aldrich) 주2) styrene (Sigma-Aldrich) 주3) 부틸 아크릴레이트 (butyl acrylate, Sigma-Aldrich) 주4) SIL: 하기 제조예 1에 따라, G3(Triglyme, TCI chemical)과 LiTFSI(3M, Sigma-Aldrich)를 이용하여 제조됨 |
(단위: 중량%) |
PEGDA주5 ) | styrene 주6) | PEGMEA주7 ) | SIL주8 ) | |
G3 | LiTFSI | ||||
비교예 1 | 2 | 0 | 20 | 30 | 48 |
비교예 2 | 2 | 1 | 19 | 30 | 48 |
비교예 3 | 5.5 | 1 | 15.5 | 30 | 48 |
주5) PEGDA poly(ethylene glycol) diacrylate (PEGDA, Sigma-Aldrich, Mn: 575) 주6) styrene (Sigma-Aldrich) 주7) PEGMEA (poly(ethylene glycol) methyl ether acrylate, Sigma-Aldrich, Mn: 480) 주8) SIL: 하기 제조예 1에 따라, G3(Triglyme, TCI chemical)과 LiTFSI(3M, Sigma-Aldrich)를 이용하여 제조됨. |
σ@25℃ (S/cm) | 고분자 전해질막의 두께 (㎛) | 고분자 전해질막의 두께 | |
실시예1 | 4.5 x 10-4 | 250 | Free-standing film |
실시예2 | 3.8 x 10-4 | 300 | Free-standing film |
실시예3 | 3.4 x 10-4 | 240 | Free-standing film |
비교예1 | 6.4 x 10-4 | 140 | Free-standing film |
비교예2 | 7.7 x 10-4 | 380 | Free-standing film |
비교예3 | 6.3 x 10-4 | 440 | Free-standing film |
11: 리튬염의 리튬
23: 전해질
Claims (14)
- 말단에 비닐기를 포함하는 방향족 화합물; 보강제; 알킬 아크릴레이트계 단량체; 및 리튬염과 글라임계 물질 또는 아미드계 물질을 함유하는 솔베이트 이온성 액체(Solvate Ionic Liquid, SIL);를 포함하는 고분자 전해질.
- 제1항에 있어서,
상기 말단에 비닐기를 포함하는 방향족 화합물은 디비닐벤젠(divinylbenzene), 1,1'-(1,10-데칸디일)비스(4-에테닐벤젠)[1,1'-(1,10-Decanediyl)bis(4-ethenylbenzene)]; 1,1'-(1,8-옥탄디일)비스(4-에테닐벤젠)[1,1'-(1,8-Octanediyl)bis(4-ethenylbenzene)]; 1,1'-(1,6-헥산디일)비스(4-에테닐벤젠)[1,1'-(1,6-Hexanediyl)bis[4-ethenylbenzene]; 1,1'-(1,4-부탄디일)비스(4-에테닐벤젠)[1,1'-(1,4-Butanediyl)bis(4-ethenylbenzene)]; 및 1,1'-(1,6-헥산디일비스(옥시메틸렌))비스(4-에테닐벤젠)[1,1'-(1,6-Hexanediylbis(oxymethylene))bis(4-ethenylbenzene)];으로 이루어진 군에서 선택되는 1종 이상인, 고분자 전해질. - 제1항에 있어서,
상기 보강제는 스티렌(styrene), 메틸 메타크릴레이트(methyl methacrylate, MMA) 및 메타크릴레이트(methacrylate, MA)로 이루어진 군에서 선택되는 1종 이상인, 고분자 전해질. - 제1항에 있어서,
상기 알킬 아크릴레이트계 단량체는 부틸 아크릴레이트(butyl acrylate); 에틸아크릴레이트(ethyl acrylate); 헥실아크릴레이트(hexyl acrylate); 옥틸아크릴레이트(octyl acrylate); 데실아크릴레이트(decyl acrylate); 도데실아크릴레이트(dodecyl acrylate); 테트라데실아크릴레이트(tetradecyl acrylate); 및 옥타데실아크릴레이트(octadecyl acrylate);로 이루어진 군에서 선택되는 1종 이상인, 고분자 전해질. - 제1항에 있어서,
상기 솔베이트 이온성 액체에서, 상기 리튬염과 글라임계 물질의 몰비는 1 : 0.1 내지 3이고, 상기 리튬염과 아미드계 물질의 몰비는 1 : 1 내지 6인, 고분자 전해질. - 제1항에 있어서,
상기 글라임계 물질은 모노글라임, 디글라임, 트리글라임 및 테트라글라임으로 구성된 군에서 선택된 1종 이상인, 고분자 전해질. - 제1항에 있어서,
상기 아미드계 물질은 N-메틸아세트아미드(N-methylacetamide, NMAC), 아세
트아미드, N-메틸프로피온아미드, N-에틸아세트아미드, 프로피온아미드, 포름아미
드, N-메틸포름아미드, N-에틸포름아미드, N,N-디메틸포름아미드, N,N-디에틸포름
아미드, N,N-디메틸아세트아미드 및 N,N-디에틸아세트아미드로 이루어진 군에서 선
택되는 1종 이상인, 고분자 전해질. - 제1항에 있어서,
상기 리튬염은 LiSCN, LiN(CN)2, LiClO4, LiBF4, LiAsF6, LiPF6, LiCF3SO3, LiN(SO2F)2, Li(CF3SO2)3C, LiN(SO2CF3)2, LiN(SO2CF2CF3)2, LiSbF6 및 LiPF3(CF2CF3)3, LiPF3(C2F5)3, LiPF3(CF3)3 및 LiB(C2O4)2 로 구성된 군에서 선택되는 1종 이상인, 고분자 전해질. - 제1항에 있어서,
상기 말단에 비닐기를 포함하는 방향족 화합물 0.1 내지 12 중량%; 보강제 0.1 내지 10 중량%; 알킬 아크릴레이트계 단량체 10 내지 30 중량%; 및 리튬염과 글라임계 물질 또는 아미드계 물질을 함유하는 솔베이트 이온성 액체(Solvate Ionic Liquid, SIL) 65 내지 85 중량%;를 포함하는, 고분자 전해질. - 제1항에 있어서,
상기 고분자 전해질은 네트워크(network) 형태의 고분자 전해질막인, 고분자 전해질. - (S1) 말단에 비닐기를 포함하는 방향족 화합물; 보강제; 알킬 아크릴레이트계 단량체; 및 리튬염과 글라임계 물질 또는 아미드계 물질을 함유하는 솔베이트 이온성 액체(Solvate Ionic Liquid, SIL);의 혼합 용액에 개시제를 첨가하여 혼합물을 형성하는 단계;
(S2) 상기 (S1) 단계에서 형성된 혼합물로부터 산소를 제거하는 단계; 및
(S3) 상기 (S2) 단계에서 산소가 제거된 혼합물을 기재 상에 도포하여 경화시키는 단계;를 포함하는, 고분자 전해질의 제조방법. - 제11항에 있어서,
상기 개시제는 상기 혼합 용액 전체 중량을 기준으로 0.1 내지 2 중량%로 첨가하는 것인, 고분자 전해질의 제조방법. - 제11항에 있어서,
상기 (S3) 단계에서 상기 경화는 열경화 또는 광경화인, 고분자 전해질의 제조방법. - 제1항 내지 제10항 중 어느 한 항의 고분자 전해질을 포함하는 리튬 이차전지.
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