KR20190082132A - A fine pattern structure capable of dry adhesion function and a manufacturing method thereof - Google Patents

Abstract

The present invention relates to a fine pattern structure for dry adhesion, a method of applying the same, and a method of manufacturing the same, and more particularly, to a fine pattern structure including a structure capable of improving adhesion and a method of easily manufacturing the same. .

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to a fine pattern structure capable of performing a dry adhesion function,

The present invention relates to a fine pattern structure for dry adhesion, a method of applying the same, and a manufacturing method thereof, and more particularly, to a fine pattern structure including a structure capable of improving adhesion and a method of easily manufacturing the same .

Adhesives are generally classified into wet type adhesives and dry type adhesives. For example, an adhesive tape coated with an adhesive material on a film is widely used as a typical wet adhesive and has excellent adhesive strength. However, even if it is difficult to reuse once it is used, it is difficult to separate the substrate, a specific part of the body, Or the adhesive material remains on the surface of the object to be adhered.

In recent years, attempts have been actively made to solve these problems by developing various dry type adhesives focused on the form of structures observed in nature. For example, there have been developed various adhesive structures that are found in microstructures found in the sole of a gecko, a sucker of an octopus, etc., which not only have a strong adhesive force but also can easily control the adhesive force.

Specifically, Korean Patent Laid-Open Publication No. 10-2008-86340 discloses a chuck having a plurality of nano-cilia formed thereon for tightly fixing a workpiece such as a substrate. Korean Patent Laid-Open Publication No. 10-2008-84215 discloses a chuck A directional adhesive structure capable of controlling an adhesive force using a structure and a method of manufacturing the same. Korean Patent Laid-Open Publication No. 10-2009-32719 also discloses an apparatus for fixing a substrate using nano cilium.

On the other hand, in order to increase the adhesion of the fine ciliated structure to the object to be bonded, it is necessary to widen the contact area between the distal end of the fine cilia and the object to be bonded so that the van der Waals force becomes large. For this purpose, there is a method of flattening or protruding the distal end of the fine cilia.

Korean Patent Laid-Open No. 10-2009-32719

SUMMARY OF THE INVENTION The present invention has been made to solve the conventional problems in the prior art which have limitations in the manufacturing process for widening the end portions of the micropattern structure having the dry adhesion function and the manufacturing process is long due to application of the conventional thermosetting resin and vacuum application In order to solve the complicated problem, it is possible to easily manufacture a fine pattern structure capable of performing a dry adhesion function by applying a UV imprint process and a process capable of easily producing a product through a continuous process without applying a vacuum process And a fine pattern structure capable of performing a dry adhesion function according to the method.

A method for producing a fine pattern structure capable of performing a dry adhesion function of the present invention, comprising:

Providing the fine pattern structure to a substrate;

Applying a resin including an ultraviolet curable resin to one side of the blanket mold to form a resin layer;

Contacting the end of the micropatterned structure provided on the substrate with the resin layer applied to the blanket mold; And

Irradiating ultraviolet rays to the resin layer to partially cure the resin layer;

And releasing the fine pattern structure provided on the substrate from the resin layer,

And the resin adjacent to the end of the fine pattern structure is cured by using an oxygen barrier effect upon partially curing the resin layer.

In the method for manufacturing a fine pattern structure capable of performing a dry adhesion function according to the present invention, a dry adhesion pattern is formed on the end of the fine pattern structure provided on the substrate, which is formed from the ultraviolet curable resin, And the dry adhesion function of the structure is improved.

Further, in the method of manufacturing a fine pattern structure capable of performing a dry adhesion function according to the present invention, it may further comprise the step of post-curing the resin formed at the end of the fine pattern structure formed from the ultraviolet curable resin .

In addition, in the method for producing a fine pattern structure capable of performing a dry-adhering function according to the present invention, the ultraviolet-curable resin may be any one selected from the group consisting of acrylate, urethane acrylate, silicone acrylate, One may be included.

In addition, in the method of manufacturing a fine pattern structure capable of performing a dry adhesion function according to the present invention, the blanket mold may be made of a transparent flexible material.

In the method of manufacturing a fine pattern structure capable of performing a dry adhesion function according to the present invention, the flexible material may be at least one selected from the group consisting of polyethylene terephthalate (PET), polyimide (PI), silicone resin, polyurethane (PU) Polyethylene terephthalate, polyethylene naphthalate (PEN), and triacetylcellulose (TAC).

Further, in the method of manufacturing a fine pattern structure capable of performing a dry adhesion function according to the present invention, in the step of partially curing the resin layer by irradiating ultraviolet rays to the resin layer, the ultraviolet rays are irradiated onto the resin of the blanket mold And may be irradiated from the other side of the coated one side to the resin applied to the blanket mold.

In addition, in the method of manufacturing a fine pattern structure capable of performing a dry adhesion function according to the present invention, the blanket mold may transmit at least 30% of the ultraviolet ray having a wavelength of 100 to 450 nm.

In addition, in the method of manufacturing a fine pattern structure capable of performing a dry adhesion function according to the present invention, the irradiation direction of the ultraviolet ray may be an angle of 0 to 25 degrees with an imaginary line perpendicular to the one surface of the blanket mold .

Further, in the method of manufacturing a fine pattern structure capable of performing a dry adhesion function according to the present invention, the step of applying a resin containing an ultraviolet curable resin on the blanket mold may be carried out by using an inkjet, a silk screen, , Or a bar coater manner.

In addition, in the method of manufacturing a fine pattern structure capable of performing a dry adhesion function according to the present invention, the resin layer may have a thickness of 10 μm or less.

Conventional known dry bonding structures have a structure in which the shape of the end portions is difficult to duplicate easily. In order to realize such a structure, time and cost are considerable and it is difficult to apply mass production. According to the present invention, there is proposed a method of continuously producing a dry-type adhesive product in which adhesion performance is remarkably increased by further forming an end portion on a regularly formed column pattern. In addition, since complicated semiconductor processes such as photolithography and reactive dry etching processes such as RIE must be performed on a silicon substrate in processing a master to form a complicated end shape, it is possible to solve the problem of size restriction and high cost of the product . In addition, since it is possible to produce a dry bonding surface without restriction of the size of the substrate by this method, it is possible to manufacture a large-area dry bonding product by applying the processing method according to the present invention, which contributes greatly to the related art.

FIG. 1 is a flowchart showing steps of a method of manufacturing a fine pattern structure capable of performing a dry adhesion function according to an embodiment of the present invention.
FIGS. 2A to 2F are cross-sectional views and perspective views illustrating a process of forming a dry adhesion pattern at an end of a fine pattern structure in a method of manufacturing a fine pattern structure capable of performing a dry adhesion function according to FIG.
3 is a longitudinal sectional view showing a state in which the resin applied to the blanket mold and the fine pattern structure provided on the substrate are in contact with each other.
4 is a longitudinal sectional view showing a ray tracing simulation result when ultraviolet rays are irradiated from the substrate side to the blanket mold side.
5 is a vertical cross-sectional view for explaining a light path when ultraviolet light is irradiated from the substrate side to the blanket mold side.
6A to 6F are longitudinal sectional views showing ray tracing simulation results when ultraviolet rays are irradiated toward the substrate side in the blanket mold side direction.
7 is a microphotograph showing the structure before and after the UV curing process according to an embodiment of the present invention.

Inking method and apparatus for forming the end portion of a micropattern structure according to the present invention are characterized by (1) using a transparent and flexible mold, (2) applying an ultraviolet curable resin thinly, (3) bringing the already formed columnar product into contact with the upper surface coated with the ultraviolet curable resin, (4) irradiating with ultraviolet rays, and curing the contact portion and the adjacent region by using oxygen obstacle do.

The present invention has the following points.

(1) A process for easily shaping the shape of the end of a fine pattern structure in order to realize a dry adhesion function, wherein a general pattern product which is not formed with a usual end portion, a conventional application method and a resin to be applied are ultraviolet curable resin Or an ultraviolet curing type resin containing a solvent such as acetone, alcohol, MEK, toluene, PGMEA or the like is applied, and the thickness to be applied is not more than 10 μm after drying, and the coating surface is easily released after the curing step A process for contacting a common pattern product with a blanket mold which can be repeatedly used, a process for irradiating ultraviolet rays to cure the product to a certain region of a general pattern product, a process for releasing and repeating continuous production of a dry adhesive product .

(2) In the item (1), the end portion of the general pattern product not having the end portion is not larger than the thickness of the column, and the width of the end portion after the end portion is widened.

 (3) The coating method according to (1), wherein the coating method is an ordinary coating method such as an inkjet, a silk screen, a slot die, a microgravure, or a bar coater.

 (4) The resin according to (1), wherein the resin to be coated is an ultraviolet curable resin including acrylate, urethane acrylate, and silicone acrylate.

(5) The coating method of (1), wherein the applied thickness is 10 탆 or less.

(6) The mold according to (1), wherein the mold is characterized by a flexible polymer mold which can be repeatedly used and has excellent mold releasing properties.

(7) The method according to (1), wherein the end forming by ultraviolet irradiation is characterized by controlling only the region in contact with the pattern and the adjacent region by using the oxygen barrier property of the radical polymerization, do.

Hereinafter, preferred embodiments of the present invention will be described with reference to Figs. 1 to 7. Fig.

FIG. 1 is a flowchart showing steps of a method of manufacturing a fine pattern structure capable of performing a dry adhesion function according to an embodiment of the present invention. FIGS. 2A to 2F are cross-sectional views and perspective views illustrating a process of forming a dry adhesion pattern at an end of a fine pattern structure in a method of manufacturing a fine pattern structure capable of performing a dry adhesion function according to FIG. 3 is a longitudinal sectional view showing a state in which the resin applied to the blanket mold and the fine pattern structure provided on the substrate are in contact with each other. 4 is a longitudinal sectional view showing a ray tracing simulation result when ultraviolet rays are irradiated from the substrate side to the blanket mold side. 5 is a vertical cross-sectional view for explaining a light path when ultraviolet light is irradiated from the substrate side to the blanket mold side. 6A to 6F are longitudinal sectional views showing ray tracing simulation results when ultraviolet rays are irradiated toward the substrate side in the blanket mold side direction. 7 is a microphotograph showing the structure before and after the UV curing process according to an embodiment of the present invention.

As shown in FIG. 1, in the present invention, an ordinary fine pattern structure is prepared and a process of applying a resin onto a blanket mold and a process of contacting the prepared pattern structure with the applied resin are performed. Then, After the partial curing by the process, the release process is carried out. After that, post-curing can be carried out if necessary. In particular, ultraviolet resin is preferably used as the resin.

Hereinafter, the present invention will be described with reference to specific examples.

Referring to FIGS. 1 and 2A to 2F, a pattern structure (hereinafter referred to as a "fine pattern structure") 10 having a fine pattern structure is provided (step S10). At this time, the fine pattern structure 10 is provided in contact with the substrate 20. The micropattern structure 10 in contact with the substrate 20 is brought into contact with the micropattern structure 10 to the resin 30 in step S30 to be described later. The fine pattern structure 10 provided in step S10 may be a structure having little adhesive force. The material of the fine pattern structure 10 may be, for example, a silicone resin, a silicone acrylate, an acrylate, a urethane acrylate, or the like. In addition, the fine pattern structure 10 may correspond to the kind of the metal mesh, or may be one used for the application of the composite sheet. The fine pattern structure on the fine pattern structure 10 may, in one embodiment, be a pattern of microstructures, for example a pattern of microstructures in which a hexagonal arrangement is continuous and the width of the end of the pattern may be about 13 microns.

In another embodiment, the pattern of the microstructure is not greater than the thickness of the column, and the pattern of the microstructure after performing steps S20 to S50 described later is caused by the dry adhesion pattern 50 (see step S30) , The width of the end portion of the pattern of the microstructure can be widened.

The fine pattern structure 10 before the application of the method of manufacturing a fine pattern structure capable of performing the dry adhesion function of the present invention may have a structure in which the width of the fine pattern structure 10 decreases from the substrate 20. When the method of manufacturing the fine pattern structure capable of performing the dry adhesion function of the present invention is applied to the fine pattern structure 10, the hardened resin adheres to the end of the fine pattern structure 10, Can be larger.

  The substrate 10 may be a substrate that can transmit ultraviolet light and can support the fine pattern structure 10 and may be a silicon substrate, a metal substrate, a polymer substrate, a glass substrate, a PET film, a TPU film, have.

Next, as shown in Figs. 2A and 2B, the resin 30 is applied on the blanket mold 40 (step S20). The resin 30 includes an ultraviolet curable resin. In one embodiment, the resin 30 to be applied may be an ultraviolet curable resin alone, and as another embodiment, it may be an ultraviolet curable resin containing a solvent such as acetone, alcohol, MEK, Toluene, PGMEA or the like. Preferably, a resin 30 containing a solvent such as acetone, alcohol, MEK, toluene, or PGMEA is applied to the blanket mold 40, and the solvent is volatilized through thermal drying (IR or Dry) have. When a solvent is contained, only ultraviolet curing without heat drying may cause problems such as cracks, shrinkage, swelling, and gas in the product, so it may be preferable to perform ultraviolet curing after thermal drying.

The ultraviolet curable resin may be, for example, acrylate, urethane acrylate, or silicone acrylate. The blanket mold 40, in one embodiment, suffices if it has a flat planar shape so that the resin 30 can evenly be applied on the blanket mold 40. For example, the blanket mold 40 may be a transparent, soft, flexible mold having a flat, planar shape. Further, for example, the blanket mold 40 can be used repeatedly, has excellent wettability at the time of coating, and is good in releasing property. On the other hand, the applied thickness of the resin 30 may be 10 μm or less after thermal drying, preferably about 15% or less, more preferably about 10% of the column width of the fine pattern structure 10.

The blanket mold 40 may be a transparent flexible material and may be made of a material such as polyethylene terephthalate (PET), polyimide (PI), silicone resin, polyurethane (PU), polyethylene naphthalate (PEN), triacetylcellulose TAC). ≪ / RTI >

Next, as shown in FIGS. 2c and 2d, the resin 30 applied on the blanket mold 40 is contacted with the fine pattern structure 10 which is in contact with the substrate 20 (step S30). As shown in FIG. 2, the fine pattern structure 10 is brought into contact with the surface of the resin 30 applied on the blanket mold 40. At this time, as an embodiment, the end of the fine pattern structure on the fine pattern structure 10 may be immersed in the uncured resin 30.

The coating thickness of the resin 30 may be 1 占 퐉 or more. In the method of manufacturing a fine pattern structure capable of performing the dry adhesion function of the present invention, a Roll To Roll coating method may be used in the process. In the roll-to-roll coating, when the thickness of the layer laminated on the workpiece is less than 1 μm, the defect rate increases, so that the coating thickness of the resin 30 may preferably be 1 μm or more.

Next, the resin 30 is irradiated with ultraviolet rays to partially cure the resin 30 (step S40). More specifically, in the present invention, the resin 30 is selectively partially cured using the oxygen barrier effect. That is, the resin in contact with or adjacent to the end of the fine pattern structure of the fine pattern structure 10 is cured, but the remaining resin 30 is hardly cured due to the oxygen barrier effect.

On the other hand, when the resin 30 applied on the blanket mold 40 has an exemplary viscosity of 250 cPs and is applied in a thickness of 2 m, the micropattern structure 10 is brought into contact with the resin 30 and UV-A The resin 30 can be partially cured by irradiating ultraviolet rays having a wavelength of 100 mJ.

Ultraviolet light may be irradiated from above the substrate 20 or from below the blanket mold 40. That is, a light source of ultraviolet rays may exist on the upper side or the lower side of the resin 30, and preferably ultraviolet rays may be irradiated on the lower side of the blanket mold 40 while looking at the resin 30. Specifically, the ultraviolet light may be irradiated so as to be transmitted from the lower surface of the blanket mold 40 to the upper surface of the blanket mold 30. [

3 is a longitudinal sectional view showing a state in which the resin applied to the blanket mold and the fine pattern structure provided on the substrate are in contact with each other. 3, the ray tracing simulation results obtained when the substrate 20, the fine pattern structure 10, the resin 30 and the blanket mold 40 are irradiated with ultraviolet rays are shown in FIG. 4 With reference to Figs.

4 is a longitudinal sectional view showing a ray tracing simulation result when ultraviolet rays are irradiated from the substrate side to the blanket mold side. It can be seen from the distribution of the light rays shown in Fig. 4 that light is not irradiated to both sides of the end portion of the fine pattern structure 10. Hereinafter, the simulation result of FIG. 4 will be described with reference to FIG.

The ultraviolet light is preferably irradiated in a direction perpendicular to the blanket mold 40 or the substrate 20 but the actual light is emitted from the point light source so that the blanket mold 40 or the substrate 20 is slightly angled . ≪ / RTI > The light P1 irradiated outside the area formed by the area where the fine pattern structure 10 contacts the substrate 20 is set such that the refractive index of the material of the substrate 20 is the refractive index of the atmosphere or the process gas (gas filling the space irradiated with ultraviolet rays) The light P1 can be irradiated to a position away from the end of the fine pattern structure 10 by being bent at a greater angle than the incident angle. Even if the light P1 is irradiated at an angle in the direction of approaching the fine pattern structure 10 as opposed to the slope of the light P1 as shown in Fig. 5, if the light P1 hits the fine pattern structure 10 before the light P1 reaches the resin 30 The light P1 may not be reflected or can not reach the end of the micropattern structure 10 due to its inherent inside the micropattern structure 10. [ Since the refractive index of the fine pattern structure 10 is larger than the refractive index of the atmosphere or the process gas, the light P2 irradiated inside the region formed by the area where the fine pattern structure 10 contacts the substrate 20 forms a fine pattern It may be attached to the inside of the structure 10 and can not come out. The case where the light P3 irradiated at the boundary of the region formed by the area where the fine pattern structure 10 contacts the substrate 20 is ideally incident on the surface of the substrate 20 in a vertical direction, Ultraviolet rays may be irradiated to the endmost portion. However, even in this case, since the area where the fine pattern structure 10 is in contact with the substrate 20 and the end area of the fine pattern structure 10 are different from each other, they must be separated by a certain distance D, It is also difficult to irradiate the substrate 20 perpendicularly. Thus, it may be desirable to irradiate ultraviolet light to be transmitted from the lower surface of the blanket mold 40 to the upper surface of the blanket mold 30. That is, ultraviolet rays may be irradiated from the other side of one side of the blanket mold to the resin applied to the blanket mold.

The blanket mold 40 may transmit at least 30% of the ultraviolet light when ultraviolet rays having a wavelength of 100 to 450 nm are transmitted from the lower surface to the upper surface of the blanket mold 40. Preferably, the wavelength of ultraviolet light may be at least one selected from 365 nm, 385 nm, 395 nm, 405 nm, and 415 nm. When the blanket mold 40 having a transmittance of 30% or less is used, the surrounding material such as the substrate 20 and the fine pattern structure 10 may be deformed due to heat generated in the blanket mold 40.

The irradiation direction of ultraviolet rays may be an angle of 0 to 25 degrees with an imaginary line perpendicular to the upper surface or the lower surface of the blanket mold 40.

6A to 6F are longitudinal sectional views showing ray tracing simulation results when ultraviolet rays are irradiated toward the substrate 10 side in the blanket mold 40 side direction. Specifically, 6a shows a ray tracing simulation result when the angle between the irradiation direction of the ultraviolet ray and the imaginary line is 0, and 6b shows the result of simulation when the angle between the irradiation direction of the ultraviolet ray and the imaginary line is 1 6c shows a result of ray tracing simulation when the angle between the irradiation direction of the ultraviolet ray and the imaginary line is 3 °, 6d is the ray tracing simulation result of the ray tracing simulation,

Ray tracing simulation result when the angle between the imaginary line and the imaginary line is 5 ° and 6e shows the ray tracing simulation result when the angle between the irradiation direction of the ultraviolet ray and the imaginary line is 15 ° , And 6f show ray tracing simulation results when the angle between the irradiation direction of the ultraviolet ray and the virtual line is 25 °. The fine pattern structure 10 may be twisted or the blanket mold 40 and the resin 30 may be separated from each other by a factor of 2 or more. Problems may arise during separation.

Generally, the ultraviolet curing type resin has a better curing effect when oxygen is absent. That is, the phenomenon in which the ultraviolet curable resin is not cured by oxygen in the air is called an oxygen occlusion phenomenon. However, ultraviolet curable resins having no oxygen occlusion phenomenon have a disadvantage of high manufacturing cost due to their high cost. Also, when general ultraviolet curable resins are used, oxygen reacts with radicals of the photoinitiator in a free-radical polymerization reaction and interferes with the polymerization reaction of the resin. Therefore, the surface of the resin can not be sufficiently cured, so that the surface of the partially cured pattern becomes tacky and adversely affects the optical characteristics and surface characteristics of the polymer pattern. However, in the present invention, the partial hardening phenomenon by oxygen is positively used, so that no extra labor is required to remove oxygen, and the manufacturing cost can be reduced. On the other hand, the fine pattern structure 10 So that only the resin 30 'in contact with the end portion of the structure can be selectively cured.

Next, as shown in Figures 2e and 2f, the micropattern structure 10 in contact with the substrate 20 is released from the resin 30 applied on the blanket mold 40 (step S50). As described above, the present invention partially cures the resin 30 using the oxygen barrier effect, so that the fine pattern structure 10 (FIG. 10) contacting the substrate 20 from the resin 30 applied on the blanket mold 40 The cured resin 50 in the portion in contact with the vicinity of the end portion of the fine pattern structure of the fine pattern structure 10 is removed from the resin coated on the blanket mold 40 such as the fine pattern structure 10 30). Accordingly, even if the fine pattern structure 10 is a structure having little adhesive force, since the resin is hardened at the end of the fine pattern structure of the fine pattern structure 10 after the above-described steps S10 to S50, An additional shape of the dry adhesion pattern 50 as the hardened resin 50 is formed at the end of the fine pattern structure of the structure 10 and consequently the adhesion of the fine pattern structure 10 is improved do.

Thereafter, a step (step S60) of postcuring the cured resin 50 having an adhesive force near the end of the fine pattern structure of the fine pattern structure 10 may be additionally or alternatively performed if necessary.

Example

In applying the ultraviolet curable resin 30, a silk printing method, a slit coating method, a roll coating method, or the like can be used. In an embodiment of the present invention, a bar coater is used.

First, a microstructure 10 having a hexagonal array is copied by duplicating the microstructure. The width of the end of the pattern was about 13 .mu.m. In the step of applying the ultraviolet curable resin 30 on the blanket mold 40, an ultraviolet curable resin 30 having a viscosity of 250 cPs was prepared and coated with a No. 8 bar coater to form a film having a thickness of about 2 um. At this time, as the blanket mold 40, a transparent and flexible soft mold (for example, Rigi-Flex manufactured by Minutatec Co., Ltd.) was used.

The ultraviolet curable resin 30 applied to the blanket mold 40 was brought into contact with the fine pattern structure 10 prepared and then irradiated with ultraviolet rays. 100 mJ was irradiated using a low-pressure ultraviolet curing machine having a wavelength of UV-A region. After irradiating, the adhesion was measured and the shape was observed.

7 is a photograph before and after the UV curing process. <HONEYCOMB PATTERN> shows the photo before the UV curing process, and <HONEYCOMB PATTERN + INKING> shows the photo after the UV curing process. Table 1 shows the adhesion measured before and after the UV curing process.

End pattern width (um) Adhesion (gf / inch) Honeycomb pattern 20.72 0 Honeycomb + Inking 25.69 45

Referring to FIG. 7 and Table 1, although the adhesive force was hardly adhered to the fine pattern structure, the end portion was formed, and as a result, a measured value of 45 gf / in was obtained. The width of the end portion was increased from 20.72um to 25.69um.

While the present invention has been described in connection with what is presently considered to be the most practical and preferred embodiments, it is to be understood that the invention is not limited to the disclosed embodiments, but, on the contrary, is intended to cover various modifications and equivalent arrangements included within the spirit and scope of the invention. Especially, in the embodiment of the present invention, a hexagonal structure and a UV curable resin having a viscosity of 250 cPs are applied. However, the shape of the fine pattern structure and the type of UV curable resin can be applied by various methods at the level of the skilled person Do. It is therefore to be understood that the above-described embodiments are intended to be illustrative, but not limiting, and that the scope of the invention should be construed as including all such modifications as may fall within the scope of the appended claims, do.

10: fine pattern structure 20: substrate
30: Resin 40: Blanket mold
50: dry adhesion pattern

Claims (11)

A method for producing a fine pattern structure capable of performing a dry adhesion function, comprising:
Providing the fine pattern structure to a substrate;
Applying a resin including an ultraviolet curable resin to one side of the blanket mold to form a resin layer;
Contacting the end of the micropatterned structure provided on the substrate with the resin layer applied to the blanket mold; And
Irradiating ultraviolet rays to the resin layer to partially cure the resin layer;
And releasing the fine pattern structure provided on the substrate from the resin layer,
Wherein the resin adjacent to the end portion of the fine pattern structure is cured by using an oxygen barrier effect upon partially curing the resin layer. The method according to claim 1,
Wherein a dry adhesion function is improved by forming a dry adhesion pattern at an end of the micropattern structure provided on the substrate which is formed from the ultraviolet curing resin to improve the dry adhesion function of the micropattern structure, &Lt; / RTI &gt; The method according to claim 1,
Further comprising the step of postcuring a resin formed at an end of the fine pattern structure released from the ultraviolet curable resin. The method according to claim 1,
Wherein the ultraviolet curable resin comprises any one selected from the group consisting of acrylate, urethane acrylate, silicone acrylate, and combinations thereof. The method according to claim 1,
Wherein the blanket mold is made of a transparent flexible material. 6. The method of claim 5,
Wherein the flexible material is at least one selected from the group consisting of polyethylene terephthalate (PET), polyimide (PI), silicone resin, polyurethane (PU), polyethylene naphthalate (PEN), and triacetylcellulose (TAC) Of the fine pattern structure. The method according to claim 1,
Wherein the ultraviolet rays are irradiated from the other side of the one side of the blanket mold to the resin coated on the blanket mold by irradiating the resin layer with ultraviolet rays to partially cure the resin layer, Wherein the method comprises the steps of: 8. The method of claim 7,
Wherein the blanket mold is capable of performing a dry-bonding function such that the ultraviolet light having a wavelength of 100 to 450 nm is transmitted by 30% or more. 8. The method of claim 7,
Wherein the irradiation direction of the ultraviolet ray has an angle of 0 DEG to 25 DEG with an imaginary line perpendicular to the one surface of the blanket mold. The method according to claim 1,
Wherein the step of applying a resin containing an ultraviolet curable resin on the blanket mold is an ink jet, a silk screen, a slot die, a micro gravure, or a bar coater method. The method according to claim 1,
Wherein the resin layer has a thickness of 10 占 퐉 or less.

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