KR20190023533A - 진공 척 - Google Patents
진공 척 Download PDFInfo
- Publication number
- KR20190023533A KR20190023533A KR1020170109436A KR20170109436A KR20190023533A KR 20190023533 A KR20190023533 A KR 20190023533A KR 1020170109436 A KR1020170109436 A KR 1020170109436A KR 20170109436 A KR20170109436 A KR 20170109436A KR 20190023533 A KR20190023533 A KR 20190023533A
- Authority
- KR
- South Korea
- Prior art keywords
- vacuum
- compressed air
- substrate
- flow
- port
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
도 2는 도 1의 진공 제공부를 설명하기 위한 단면도이다.
도 3은 도 2에 A 부분을 확대한 확대 단면도이다.
115 : 진공홀들 130 : 진공 제공부
131 : 본체 131a : 유입 포트
131b : 배출 포트 131c : 진공 포터
140 : 공기 이젝터 150 : 유량 제어 밸브
Claims (5)
- 기판을 진공 흡착하기 위한 복수의 진공홀들이 구비된 척;
상기 진공홀들과 연결되며 상기 진공홀들을 통하여 상기 기판에 진공력을 제공하기 위한 진공 제공부; 및
상기 진공 제공부의 동작을 제어하기 위한 제어부를 포함하며,
상기 진공 제공부는,
압축 공기의 제공을 위한 유입 포트, 상기 압축 공기의 배출을 위한 배출 포트 및 상기 진공 제공을 위한 진공 포트를 포함하는 본체;
상기 본체 내에 배치되며 상기 압축 공기의 유로를 제공하며 상기 압축 공기의 흐름에 의해 진공압이 생성되도록 상기 압축 공기의 유로와 연결되는 진공 유로를 구비하는 공기 이젝터; 및
상기 유입 포트와 상기 공기 이젝터 사이에 배치되며 상기 압축 공기의 유량을 단계적으로 조절할 수 있는 유량 제어 밸브를 포함하는 것을 특징으로 하는 진공척. - 제1항에 있어서, 상기 유량 제어 밸브는 솔레노이드 밸브를 포함하는 것을 특징으로 하는 진공 척.
- 제2항에 있어서, 상기 솔레노이드 밸브는 다단식 구동형 플런저를 포함하는 것을 특징으로 하는 진공 척.
- 제1항에 있어서, 상기 유량 제어 밸브는 상기 압축 공기가 상기 유입 포트로부터 상기 공기 이젝터 사이에 형성된 공급 유로 상에 배치된 것을 특징으로 하는 진공 척.
- 제1항에 있어서, 상기 유량 제어 밸브는 압전 액츄에이터 밸브를 포함하는 것을 특징으로 하는 진공 척.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020170109436A KR20190023533A (ko) | 2017-08-29 | 2017-08-29 | 진공 척 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020170109436A KR20190023533A (ko) | 2017-08-29 | 2017-08-29 | 진공 척 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR20190023533A true KR20190023533A (ko) | 2019-03-08 |
Family
ID=65800775
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020170109436A Ceased KR20190023533A (ko) | 2017-08-29 | 2017-08-29 | 진공 척 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR20190023533A (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20220035585A (ko) * | 2020-09-14 | 2022-03-22 | 주식회사 와이제이 더블유 | 승화 전사 장치 |
-
2017
- 2017-08-29 KR KR1020170109436A patent/KR20190023533A/ko not_active Ceased
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20220035585A (ko) * | 2020-09-14 | 2022-03-22 | 주식회사 와이제이 더블유 | 승화 전사 장치 |
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