KR20180085520A - 티타늄 및 티타늄합금 제품용 광택 화학연마제 조성물 - Google Patents
티타늄 및 티타늄합금 제품용 광택 화학연마제 조성물 Download PDFInfo
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- KR20180085520A KR20180085520A KR1020170009149A KR20170009149A KR20180085520A KR 20180085520 A KR20180085520 A KR 20180085520A KR 1020170009149 A KR1020170009149 A KR 1020170009149A KR 20170009149 A KR20170009149 A KR 20170009149A KR 20180085520 A KR20180085520 A KR 20180085520A
- Authority
- KR
- South Korea
- Prior art keywords
- weight
- titanium
- parts
- acid
- polishing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010936 titanium Substances 0.000 title claims abstract description 56
- 238000005498 polishing Methods 0.000 title claims abstract description 51
- 229910052719 titanium Inorganic materials 0.000 title claims abstract description 50
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 title claims abstract description 49
- 239000000126 substance Substances 0.000 title claims abstract description 43
- 239000000203 mixture Substances 0.000 title claims abstract description 36
- 229910001069 Ti alloy Inorganic materials 0.000 title claims abstract description 35
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims abstract description 24
- 239000003381 stabilizer Substances 0.000 claims abstract description 13
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims abstract description 12
- -1 amine compound Chemical class 0.000 claims abstract description 12
- 229910017604 nitric acid Inorganic materials 0.000 claims abstract description 12
- 150000002222 fluorine compounds Chemical class 0.000 claims abstract description 10
- QOSATHPSBFQAML-UHFFFAOYSA-N hydrogen peroxide;hydrate Chemical compound O.OO QOSATHPSBFQAML-UHFFFAOYSA-N 0.000 claims abstract description 9
- 150000007524 organic acids Chemical class 0.000 claims abstract description 9
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims description 9
- BZOVBIIWPDQIHF-UHFFFAOYSA-N 3-hydroxy-2-methylbenzenesulfonic acid Chemical compound CC1=C(O)C=CC=C1S(O)(=O)=O BZOVBIIWPDQIHF-UHFFFAOYSA-N 0.000 claims description 7
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 claims description 6
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 claims description 6
- 238000000034 method Methods 0.000 claims description 6
- BFXAWOHHDUIALU-UHFFFAOYSA-M sodium;hydron;difluoride Chemical compound F.[F-].[Na+] BFXAWOHHDUIALU-UHFFFAOYSA-M 0.000 claims description 6
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 claims description 5
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 claims description 5
- 239000001630 malic acid Substances 0.000 claims description 5
- 235000011090 malic acid Nutrition 0.000 claims description 5
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 claims description 4
- WHOZNOZYMBRCBL-OUKQBFOZSA-N (2E)-2-Tetradecenal Chemical compound CCCCCCCCCCC\C=C\C=O WHOZNOZYMBRCBL-OUKQBFOZSA-N 0.000 claims description 3
- LBLYYCQCTBFVLH-UHFFFAOYSA-N 2-Methylbenzenesulfonic acid Chemical compound CC1=CC=CC=C1S(O)(=O)=O LBLYYCQCTBFVLH-UHFFFAOYSA-N 0.000 claims description 3
- MIMUSZHMZBJBPO-UHFFFAOYSA-N 6-methoxy-8-nitroquinoline Chemical compound N1=CC=CC2=CC(OC)=CC([N+]([O-])=O)=C21 MIMUSZHMZBJBPO-UHFFFAOYSA-N 0.000 claims description 3
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 claims description 3
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 claims description 3
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 claims description 3
- 239000011976 maleic acid Substances 0.000 claims description 3
- 229940098779 methanesulfonic acid Drugs 0.000 claims description 3
- 229940044654 phenolsulfonic acid Drugs 0.000 claims description 3
- VBKNTGMWIPUCRF-UHFFFAOYSA-M potassium;fluoride;hydrofluoride Chemical compound F.[F-].[K+] VBKNTGMWIPUCRF-UHFFFAOYSA-M 0.000 claims description 3
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 claims description 3
- 239000000956 alloy Substances 0.000 abstract description 8
- 230000001965 increasing effect Effects 0.000 abstract description 5
- 230000009286 beneficial effect Effects 0.000 abstract description 2
- 239000007789 gas Substances 0.000 abstract 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 11
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- 238000010438 heat treatment Methods 0.000 description 8
- 238000007517 polishing process Methods 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000004090 dissolution Methods 0.000 description 4
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 230000003247 decreasing effect Effects 0.000 description 3
- 230000007613 environmental effect Effects 0.000 description 3
- 238000000227 grinding Methods 0.000 description 3
- QPJSUIGXIBEQAC-UHFFFAOYSA-N n-(2,4-dichloro-5-propan-2-yloxyphenyl)acetamide Chemical compound CC(C)OC1=CC(NC(C)=O)=C(Cl)C=C1Cl QPJSUIGXIBEQAC-UHFFFAOYSA-N 0.000 description 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- QDZRBIRIPNZRSG-UHFFFAOYSA-N titanium nitrate Chemical compound [O-][N+](=O)O[Ti](O[N+]([O-])=O)(O[N+]([O-])=O)O[N+]([O-])=O QDZRBIRIPNZRSG-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- LCKIEQZJEYYRIY-UHFFFAOYSA-N Titanium ion Chemical compound [Ti+4] LCKIEQZJEYYRIY-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 229940125782 compound 2 Drugs 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 239000002932 luster Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000010297 mechanical methods and process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000003002 pH adjusting agent Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000011164 primary particle Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000009958 sewing Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/04—Aqueous dispersions
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1454—Abrasive powders, suspensions and pastes for polishing
- C09K3/1463—Aqueous liquid suspensions
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Dispersion Chemistry (AREA)
- ing And Chemical Polishing (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
본 발명에 따르면, 티타늄 및 티타늄합금 자재를 이용하여 제작한 다양한 구조물을 갖는 각종 제품의 표면을 화학적으로 연마할 수 있으며, 이를 통해 제품의 광택도를 증가시킴과 동시에 제품 표면에 잔존하는 열처리 스케일 등의 각종 이물질을 제거할 수 있는 유용한 효과를 달성할 수 있다.
Description
Claims (5)
- 물 100중량부에 대하여 과산화수소수 40~60중량부, 과산화수소수 안정제 2~6중량부, 불소화합물 10~30중량부, 아민화합물 2~6중량부, 질산 5~10중량부 및 유기산 2~6중량부가 혼합된 조성으로 이루어지는 것을 특징으로 하는 티타늄 및 티타늄합금 제품용 광택 화학연마제 조성물.
- 제 1항에 있어서,
상기 과산화수소수 안정제는 페놀술폰산(Phenolsulfonic acid), 톨루엔술폰산(Toluenesulfonic acid), 크레졸술폰산(Cresolsulfonic acid) 중에서 선택된 어느 1종 또는 2종 이상이 혼합 사용되는 것을 특징으로 하는 티타늄 및 티타늄합금 제품용 광택 화학연마제 조성물.
- 제 1항에 있어서,
상기 불소화합물은 소듐비플루오르화물(Sodiumbifluoride), 포타슘비플루오르화물(Potassiumbifluoride), 암모늄비플루오르화물(Ammoniumbifluoride) 중에서 선택된 어느 1종 또는 2종 이상이 혼합 사용되는 것을 특징으로 하는 티타늄 및 티타늄합금 제품용 광택 화학연마제 조성물.
- 제 1항에 있어서,
상기 아민화합물은 모노에탄올아민(Monoethanolamine), 트리에탄올아민(Triethanolamine), 에틸렌디아민(Ethylenediamine) 중에서 선택된 어느 1종 또는 2종 이상이 혼합 사용되는 것을 특징으로 하는 티타늄 및 티타늄합금 제품용 광택 화학연마제 조성물.
- 제 1항에 있어서,
상기 유기산은 시트르산(Citric acid), 말산(Malic acid), 메탄술폰산(Methanesulfonic acid), 말레산(Maleic acid) 중에서 선택된 어느 1종 또는 2종 이상이 혼합 사용되는 것을 특징으로 하는 티타늄 및 티타늄합금 제품용 광택 화학연마제 조성물.
Priority Applications (1)
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KR1020170009149A KR101929021B1 (ko) | 2017-01-19 | 2017-01-19 | 티타늄 및 티타늄합금 제품용 광택 화학연마제 조성물 |
Applications Claiming Priority (1)
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KR1020170009149A KR101929021B1 (ko) | 2017-01-19 | 2017-01-19 | 티타늄 및 티타늄합금 제품용 광택 화학연마제 조성물 |
Publications (2)
Publication Number | Publication Date |
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KR20180085520A true KR20180085520A (ko) | 2018-07-27 |
KR101929021B1 KR101929021B1 (ko) | 2018-12-13 |
Family
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Family Applications (1)
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KR1020170009149A Active KR101929021B1 (ko) | 2017-01-19 | 2017-01-19 | 티타늄 및 티타늄합금 제품용 광택 화학연마제 조성물 |
Country Status (1)
Country | Link |
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KR (1) | KR101929021B1 (ko) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20200142749A (ko) * | 2019-06-13 | 2020-12-23 | 주식회사 포스코 | 철-니켈 합금 포일 연마 조성물 및 이를 이용한 철-니켈 합금 포일 연마 방법 |
EP4484510A1 (en) * | 2023-06-27 | 2025-01-01 | Acondicionamiento Tarrasense | A method and a composition of polishing a titanium or titanium alloy workpiece |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101273973B1 (ko) | 2013-03-04 | 2013-06-12 | 황의용 | 광택향상 효과가 우수한 알루미늄용 화학 연마제 조성물 |
KR20150081267A (ko) | 2012-10-31 | 2015-07-13 | 가부시키가이샤 후지미인코퍼레이티드 | 연마용 조성물 |
Family Cites Families (1)
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---|---|---|---|---|
JP6531612B2 (ja) | 2014-11-27 | 2019-06-19 | 三菱瓦斯化学株式会社 | 液体組成物およびこれを用いたエッチング方法 |
-
2017
- 2017-01-19 KR KR1020170009149A patent/KR101929021B1/ko active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20150081267A (ko) | 2012-10-31 | 2015-07-13 | 가부시키가이샤 후지미인코퍼레이티드 | 연마용 조성물 |
KR101273973B1 (ko) | 2013-03-04 | 2013-06-12 | 황의용 | 광택향상 효과가 우수한 알루미늄용 화학 연마제 조성물 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20200142749A (ko) * | 2019-06-13 | 2020-12-23 | 주식회사 포스코 | 철-니켈 합금 포일 연마 조성물 및 이를 이용한 철-니켈 합금 포일 연마 방법 |
EP4484510A1 (en) * | 2023-06-27 | 2025-01-01 | Acondicionamiento Tarrasense | A method and a composition of polishing a titanium or titanium alloy workpiece |
Also Published As
Publication number | Publication date |
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KR101929021B1 (ko) | 2018-12-13 |
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