KR20170141834A - Pc-abs 수지 부품의 비전해성 금속도금방법 - Google Patents
Pc-abs 수지 부품의 비전해성 금속도금방법 Download PDFInfo
- Publication number
- KR20170141834A KR20170141834A KR1020160074322A KR20160074322A KR20170141834A KR 20170141834 A KR20170141834 A KR 20170141834A KR 1020160074322 A KR1020160074322 A KR 1020160074322A KR 20160074322 A KR20160074322 A KR 20160074322A KR 20170141834 A KR20170141834 A KR 20170141834A
- Authority
- KR
- South Korea
- Prior art keywords
- plating
- acid
- ternary alloy
- abs resin
- plating solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000007747 plating Methods 0.000 title claims abstract description 197
- 238000000034 method Methods 0.000 title claims abstract description 102
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 29
- 239000002184 metal Substances 0.000 title claims abstract description 29
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical class [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims abstract description 63
- 229910002058 ternary alloy Inorganic materials 0.000 claims abstract description 48
- 239000011651 chromium Substances 0.000 claims abstract description 46
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims abstract description 36
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 36
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 claims abstract description 35
- 229910020994 Sn-Zn Inorganic materials 0.000 claims abstract description 34
- 229910009069 Sn—Zn Inorganic materials 0.000 claims abstract description 34
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 30
- 238000009713 electroplating Methods 0.000 claims abstract description 18
- 239000000243 solution Substances 0.000 claims description 51
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 33
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims description 30
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims description 27
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 claims description 20
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 claims description 20
- 238000005238 degreasing Methods 0.000 claims description 19
- 239000003054 catalyst Substances 0.000 claims description 17
- 239000008139 complexing agent Substances 0.000 claims description 17
- 239000010949 copper Substances 0.000 claims description 17
- 229910052802 copper Inorganic materials 0.000 claims description 16
- 239000011734 sodium Substances 0.000 claims description 16
- 238000005530 etching Methods 0.000 claims description 15
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 14
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 14
- 235000019253 formic acid Nutrition 0.000 claims description 13
- 239000003381 stabilizer Substances 0.000 claims description 13
- 235000011121 sodium hydroxide Nutrition 0.000 claims description 11
- 239000011701 zinc Substances 0.000 claims description 11
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 10
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 claims description 9
- 229910000365 copper sulfate Inorganic materials 0.000 claims description 9
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 claims description 9
- 238000007781 pre-processing Methods 0.000 claims description 9
- 239000004094 surface-active agent Substances 0.000 claims description 9
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 claims description 8
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 claims description 8
- 239000003795 chemical substances by application Substances 0.000 claims description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 8
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 claims description 7
- 235000006408 oxalic acid Nutrition 0.000 claims description 7
- 229910052725 zinc Inorganic materials 0.000 claims description 7
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 claims description 6
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 claims description 6
- 239000002253 acid Substances 0.000 claims description 6
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 claims description 6
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 claims description 6
- GRWVQDDAKZFPFI-UHFFFAOYSA-H chromium(III) sulfate Chemical compound [Cr+3].[Cr+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O GRWVQDDAKZFPFI-UHFFFAOYSA-H 0.000 claims description 6
- 239000001630 malic acid Substances 0.000 claims description 6
- 235000011090 malic acid Nutrition 0.000 claims description 6
- NROKBHXJSPEDAR-UHFFFAOYSA-M potassium fluoride Chemical compound [F-].[K+] NROKBHXJSPEDAR-UHFFFAOYSA-M 0.000 claims description 6
- 150000003839 salts Chemical class 0.000 claims description 6
- 235000019333 sodium laurylsulphate Nutrition 0.000 claims description 6
- 238000005406 washing Methods 0.000 claims description 6
- 101150003085 Pdcl gene Proteins 0.000 claims description 5
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 5
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 claims description 5
- 150000002500 ions Chemical class 0.000 claims description 5
- 239000000080 wetting agent Substances 0.000 claims description 5
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 claims description 4
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 claims description 4
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 claims description 4
- 241000080590 Niso Species 0.000 claims description 4
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 4
- 229910052921 ammonium sulfate Inorganic materials 0.000 claims description 4
- 235000011130 ammonium sulphate Nutrition 0.000 claims description 4
- 239000012752 auxiliary agent Substances 0.000 claims description 4
- 239000004327 boric acid Substances 0.000 claims description 4
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 claims description 4
- 239000003638 chemical reducing agent Substances 0.000 claims description 4
- 150000002762 monocarboxylic acid derivatives Chemical class 0.000 claims description 4
- 229910017604 nitric acid Inorganic materials 0.000 claims description 4
- 239000007800 oxidant agent Substances 0.000 claims description 4
- 239000003002 pH adjusting agent Substances 0.000 claims description 4
- JHJLBTNAGRQEKS-UHFFFAOYSA-M sodium bromide Chemical compound [Na+].[Br-] JHJLBTNAGRQEKS-UHFFFAOYSA-M 0.000 claims description 4
- NWONKYPBYAMBJT-UHFFFAOYSA-L zinc sulfate Chemical compound [Zn+2].[O-]S([O-])(=O)=O NWONKYPBYAMBJT-UHFFFAOYSA-L 0.000 claims description 4
- 229910000368 zinc sulfate Inorganic materials 0.000 claims description 4
- 229960001763 zinc sulfate Drugs 0.000 claims description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 3
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 claims description 3
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical compound OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 claims description 3
- MQRWBMAEBQOWAF-UHFFFAOYSA-N acetic acid;nickel Chemical compound [Ni].CC(O)=O.CC(O)=O MQRWBMAEBQOWAF-UHFFFAOYSA-N 0.000 claims description 3
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 claims description 3
- 229910052787 antimony Inorganic materials 0.000 claims description 3
- 229910052797 bismuth Inorganic materials 0.000 claims description 3
- RJTANRZEWTUVMA-UHFFFAOYSA-N boron;n-methylmethanamine Chemical compound [B].CNC RJTANRZEWTUVMA-UHFFFAOYSA-N 0.000 claims description 3
- 239000010439 graphite Substances 0.000 claims description 3
- 229910002804 graphite Inorganic materials 0.000 claims description 3
- 229910052741 iridium Inorganic materials 0.000 claims description 3
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims description 3
- 229940078494 nickel acetate Drugs 0.000 claims description 3
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 claims description 3
- 239000001103 potassium chloride Substances 0.000 claims description 3
- 235000011164 potassium chloride Nutrition 0.000 claims description 3
- 239000011698 potassium fluoride Substances 0.000 claims description 3
- 239000002243 precursor Substances 0.000 claims description 3
- HELHAJAZNSDZJO-OLXYHTOASA-L sodium L-tartrate Chemical compound [Na+].[Na+].[O-]C(=O)[C@H](O)[C@@H](O)C([O-])=O HELHAJAZNSDZJO-OLXYHTOASA-L 0.000 claims description 3
- 239000012279 sodium borohydride Substances 0.000 claims description 3
- 229910000033 sodium borohydride Inorganic materials 0.000 claims description 3
- FQENQNTWSFEDLI-UHFFFAOYSA-J sodium diphosphate Chemical compound [Na+].[Na+].[Na+].[Na+].[O-]P([O-])(=O)OP([O-])([O-])=O FQENQNTWSFEDLI-UHFFFAOYSA-J 0.000 claims description 3
- 229940048086 sodium pyrophosphate Drugs 0.000 claims description 3
- 239000001433 sodium tartrate Substances 0.000 claims description 3
- 229960002167 sodium tartrate Drugs 0.000 claims description 3
- 235000011004 sodium tartrates Nutrition 0.000 claims description 3
- 235000019818 tetrasodium diphosphate Nutrition 0.000 claims description 3
- 239000001577 tetrasodium phosphonato phosphate Substances 0.000 claims description 3
- 229910052716 thallium Inorganic materials 0.000 claims description 3
- 239000001124 (E)-prop-1-ene-1,2,3-tricarboxylic acid Substances 0.000 claims description 2
- KVZLHPXEUGJPAH-UHFFFAOYSA-N 2-oxidanylpropanoic acid Chemical compound CC(O)C(O)=O.CC(O)C(O)=O KVZLHPXEUGJPAH-UHFFFAOYSA-N 0.000 claims description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-M Bicarbonate Chemical compound OC([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-M 0.000 claims description 2
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 claims description 2
- PQUCIEFHOVEZAU-UHFFFAOYSA-N Diammonium sulfite Chemical compound [NH4+].[NH4+].[O-]S([O-])=O PQUCIEFHOVEZAU-UHFFFAOYSA-N 0.000 claims description 2
- 239000004471 Glycine Substances 0.000 claims description 2
- 229910002651 NO3 Inorganic materials 0.000 claims description 2
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 claims description 2
- IOVCWXUNBOPUCH-UHFFFAOYSA-M Nitrite anion Chemical compound [O-]N=O IOVCWXUNBOPUCH-UHFFFAOYSA-M 0.000 claims description 2
- 229910019142 PO4 Inorganic materials 0.000 claims description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-L Phosphate ion(2-) Chemical compound OP([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-L 0.000 claims description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims description 2
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 claims description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 2
- 229940091181 aconitic acid Drugs 0.000 claims description 2
- 230000003213 activating effect Effects 0.000 claims description 2
- 150000001447 alkali salts Chemical class 0.000 claims description 2
- 239000012670 alkaline solution Substances 0.000 claims description 2
- DIZPMCHEQGEION-UHFFFAOYSA-H aluminium sulfate (anhydrous) Chemical compound [Al+3].[Al+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O DIZPMCHEQGEION-UHFFFAOYSA-H 0.000 claims description 2
- SWLVFNYSXGMGBS-UHFFFAOYSA-N ammonium bromide Chemical compound [NH4+].[Br-] SWLVFNYSXGMGBS-UHFFFAOYSA-N 0.000 claims description 2
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 claims description 2
- GTZCVFVGUGFEME-IWQZZHSRSA-N cis-aconitic acid Chemical compound OC(=O)C\C(C(O)=O)=C\C(O)=O GTZCVFVGUGFEME-IWQZZHSRSA-N 0.000 claims description 2
- 238000004140 cleaning Methods 0.000 claims description 2
- 239000003086 colorant Substances 0.000 claims description 2
- XPPKVPWEQAFLFU-UHFFFAOYSA-J diphosphate(4-) Chemical compound [O-]P([O-])(=O)OP([O-])([O-])=O XPPKVPWEQAFLFU-UHFFFAOYSA-J 0.000 claims description 2
- 235000011180 diphosphates Nutrition 0.000 claims description 2
- BNIILDVGGAEEIG-UHFFFAOYSA-L disodium hydrogen phosphate Chemical compound [Na+].[Na+].OP([O-])([O-])=O BNIILDVGGAEEIG-UHFFFAOYSA-L 0.000 claims description 2
- 229910000397 disodium phosphate Inorganic materials 0.000 claims description 2
- 235000019800 disodium phosphate Nutrition 0.000 claims description 2
- 239000003906 humectant Substances 0.000 claims description 2
- 229910052739 hydrogen Inorganic materials 0.000 claims description 2
- 239000001257 hydrogen Substances 0.000 claims description 2
- 229910017053 inorganic salt Inorganic materials 0.000 claims description 2
- 229910052742 iron Inorganic materials 0.000 claims description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 2
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 claims description 2
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 claims description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 claims description 2
- 239000010452 phosphate Substances 0.000 claims description 2
- 239000000088 plastic resin Substances 0.000 claims description 2
- 238000005498 polishing Methods 0.000 claims description 2
- 239000011591 potassium Substances 0.000 claims description 2
- 229910052700 potassium Inorganic materials 0.000 claims description 2
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 claims description 2
- KYKNRZGSIGMXFH-ZVGUSBNCSA-M potassium bitartrate Chemical compound [K+].OC(=O)[C@H](O)[C@@H](O)C([O-])=O KYKNRZGSIGMXFH-ZVGUSBNCSA-M 0.000 claims description 2
- 239000001472 potassium tartrate Substances 0.000 claims description 2
- 229940111695 potassium tartrate Drugs 0.000 claims description 2
- 235000011005 potassium tartrates Nutrition 0.000 claims description 2
- 229940048084 pyrophosphate Drugs 0.000 claims description 2
- 239000011775 sodium fluoride Substances 0.000 claims description 2
- 239000001384 succinic acid Substances 0.000 claims description 2
- GTZCVFVGUGFEME-UHFFFAOYSA-N trans-aconitic acid Natural products OC(=O)CC(C(O)=O)=CC(O)=O GTZCVFVGUGFEME-UHFFFAOYSA-N 0.000 claims description 2
- 125000004954 trialkylamino group Chemical group 0.000 claims description 2
- RVCSYOQWLPPAOA-DHWZJIOFSA-M trospium chloride Chemical compound [Cl-].[N+]12([C@@H]3CC[C@H]2CC(C3)OC(=O)C(O)(C=2C=CC=CC=2)C=2C=CC=CC=2)CCCC1 RVCSYOQWLPPAOA-DHWZJIOFSA-M 0.000 claims description 2
- 125000000896 monocarboxylic acid group Chemical group 0.000 claims 9
- 239000002033 PVDF binder Substances 0.000 claims 4
- 229920002981 polyvinylidene fluoride Polymers 0.000 claims 4
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 claims 2
- 229910044991 metal oxide Inorganic materials 0.000 claims 2
- 150000004706 metal oxides Chemical class 0.000 claims 2
- KQTIIICEAUMSDG-UHFFFAOYSA-N tricarballylic acid Chemical compound OC(=O)CC(C(O)=O)CC(O)=O KQTIIICEAUMSDG-UHFFFAOYSA-N 0.000 claims 2
- 150000003628 tricarboxylic acids Chemical class 0.000 claims 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims 1
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 claims 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims 1
- RNYGFMAGXOZVNR-UHFFFAOYSA-N acetic acid;chromium Chemical compound [Cr].CC(O)=O.CC(O)=O.CC(O)=O RNYGFMAGXOZVNR-UHFFFAOYSA-N 0.000 claims 1
- 235000019270 ammonium chloride Nutrition 0.000 claims 1
- 150000004985 diamines Chemical class 0.000 claims 1
- GYQBBRRVRKFJRG-UHFFFAOYSA-L disodium pyrophosphate Chemical compound [Na+].[Na+].OP([O-])(=O)OP(O)([O-])=O GYQBBRRVRKFJRG-UHFFFAOYSA-L 0.000 claims 1
- 229940071106 ethylenediaminetetraacetate Drugs 0.000 claims 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 1
- 150000007522 mineralic acids Chemical class 0.000 claims 1
- 239000011593 sulfur Substances 0.000 claims 1
- 229910052717 sulfur Inorganic materials 0.000 claims 1
- 229920005989 resin Polymers 0.000 abstract description 13
- 239000011347 resin Substances 0.000 abstract description 13
- -1 cyanide compound Chemical class 0.000 abstract description 10
- 238000006467 substitution reaction Methods 0.000 abstract 1
- 239000000203 mixture Substances 0.000 description 8
- 238000005299 abrasion Methods 0.000 description 6
- 238000005260 corrosion Methods 0.000 description 6
- 230000007797 corrosion Effects 0.000 description 6
- 230000000704 physical effect Effects 0.000 description 5
- FAPWRFPIFSIZLT-UHFFFAOYSA-M sodium chloride Inorganic materials [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 5
- PHFQLYPOURZARY-UHFFFAOYSA-N chromium trinitrate Chemical compound [Cr+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O PHFQLYPOURZARY-UHFFFAOYSA-N 0.000 description 4
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 238000011161 development Methods 0.000 description 3
- 230000018109 developmental process Effects 0.000 description 3
- 238000004070 electrodeposition Methods 0.000 description 3
- 239000011780 sodium chloride Substances 0.000 description 3
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 description 3
- KWSLGOVYXMQPPX-UHFFFAOYSA-N 5-[3-(trifluoromethyl)phenyl]-2h-tetrazole Chemical compound FC(F)(F)C1=CC=CC(C2=NNN=N2)=C1 KWSLGOVYXMQPPX-UHFFFAOYSA-N 0.000 description 2
- 229910020888 Sn-Cu Inorganic materials 0.000 description 2
- 229910019204 Sn—Cu Inorganic materials 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 229910007610 Zn—Sn Inorganic materials 0.000 description 2
- DPRMFUAMSRXGDE-UHFFFAOYSA-N ac1o530g Chemical compound NCCN.NCCN DPRMFUAMSRXGDE-UHFFFAOYSA-N 0.000 description 2
- KXZJHVJKXJLBKO-UHFFFAOYSA-N chembl1408157 Chemical compound N=1C2=CC=CC=C2C(C(=O)O)=CC=1C1=CC=C(O)C=C1 KXZJHVJKXJLBKO-UHFFFAOYSA-N 0.000 description 2
- QSWDMMVNRMROPK-UHFFFAOYSA-K chromium(3+) trichloride Chemical compound [Cl-].[Cl-].[Cl-].[Cr+3] QSWDMMVNRMROPK-UHFFFAOYSA-K 0.000 description 2
- WYYQVWLEPYFFLP-UHFFFAOYSA-K chromium(3+);triacetate Chemical compound [Cr+3].CC([O-])=O.CC([O-])=O.CC([O-])=O WYYQVWLEPYFFLP-UHFFFAOYSA-K 0.000 description 2
- 239000000084 colloidal system Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- BUACSMWVFUNQET-UHFFFAOYSA-H dialuminum;trisulfate;hydrate Chemical compound O.[Al+3].[Al+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O BUACSMWVFUNQET-UHFFFAOYSA-H 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 2
- 239000001508 potassium citrate Substances 0.000 description 2
- 229960002635 potassium citrate Drugs 0.000 description 2
- QEEAPRPFLLJWCF-UHFFFAOYSA-K potassium citrate (anhydrous) Chemical compound [K+].[K+].[K+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O QEEAPRPFLLJWCF-UHFFFAOYSA-K 0.000 description 2
- 235000011082 potassium citrates Nutrition 0.000 description 2
- OTYBMLCTZGSZBG-UHFFFAOYSA-L potassium sulfate Chemical compound [K+].[K+].[O-]S([O-])(=O)=O OTYBMLCTZGSZBG-UHFFFAOYSA-L 0.000 description 2
- 229910052939 potassium sulfate Inorganic materials 0.000 description 2
- 235000011151 potassium sulphates Nutrition 0.000 description 2
- 229910001379 sodium hypophosphite Inorganic materials 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- RYCLIXPGLDDLTM-UHFFFAOYSA-J tetrapotassium;phosphonato phosphate Chemical compound [K+].[K+].[K+].[K+].[O-]P([O-])(=O)OP([O-])([O-])=O RYCLIXPGLDDLTM-UHFFFAOYSA-J 0.000 description 2
- 150000003627 tricarboxylic acid derivatives Chemical class 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 229910018104 Ni-P Inorganic materials 0.000 description 1
- 229910018536 Ni—P Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910007565 Zn—Cu Inorganic materials 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 125000005619 boric acid group Chemical group 0.000 description 1
- 239000000872 buffer Substances 0.000 description 1
- MTAZNLWOLGHBHU-UHFFFAOYSA-N butadiene-styrene rubber Chemical compound C=CC=C.C=CC1=CC=CC=C1 MTAZNLWOLGHBHU-UHFFFAOYSA-N 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 150000001844 chromium Chemical class 0.000 description 1
- 150000001845 chromium compounds Chemical class 0.000 description 1
- TVZPLCNGKSPOJA-UHFFFAOYSA-N copper zinc Chemical compound [Cu].[Zn] TVZPLCNGKSPOJA-UHFFFAOYSA-N 0.000 description 1
- DOBRDRYODQBAMW-UHFFFAOYSA-N copper(i) cyanide Chemical compound [Cu+].N#[C-] DOBRDRYODQBAMW-UHFFFAOYSA-N 0.000 description 1
- YDIQKOIXOOOXQQ-UHFFFAOYSA-H dialuminum;trisulfite Chemical compound [Al+3].[Al+3].[O-]S([O-])=O.[O-]S([O-])=O.[O-]S([O-])=O YDIQKOIXOOOXQQ-UHFFFAOYSA-H 0.000 description 1
- 150000001991 dicarboxylic acids Chemical class 0.000 description 1
- TVQLLNFANZSCGY-UHFFFAOYSA-N disodium;dioxido(oxo)tin Chemical compound [Na+].[Na+].[O-][Sn]([O-])=O TVQLLNFANZSCGY-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- NIFHFRBCEUSGEE-UHFFFAOYSA-N oxalic acid Chemical compound OC(=O)C(O)=O.OC(=O)C(O)=O NIFHFRBCEUSGEE-UHFFFAOYSA-N 0.000 description 1
- 239000006174 pH buffer Substances 0.000 description 1
- 239000006179 pH buffering agent Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 239000007774 positive electrode material Substances 0.000 description 1
- 229960003975 potassium Drugs 0.000 description 1
- 235000003270 potassium fluoride Nutrition 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- SPPDMENUXZUYIL-UHFFFAOYSA-N propane-1,2,3-tricarboxylic acid Chemical compound OC(=O)CC(C(O)=O)CC(O)=O.OC(=O)CC(C(O)=O)CC(O)=O SPPDMENUXZUYIL-UHFFFAOYSA-N 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- MNWBNISUBARLIT-UHFFFAOYSA-N sodium cyanide Chemical compound [Na+].N#[C-] MNWBNISUBARLIT-UHFFFAOYSA-N 0.000 description 1
- 235000013024 sodium fluoride Nutrition 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- 229910000162 sodium phosphate Inorganic materials 0.000 description 1
- 235000011008 sodium phosphates Nutrition 0.000 description 1
- 229940079864 sodium stannate Drugs 0.000 description 1
- PVGBHEUCHKGFQP-UHFFFAOYSA-N sodium;n-[5-amino-2-(4-aminophenyl)sulfonylphenyl]sulfonylacetamide Chemical compound [Na+].CC(=O)NS(=O)(=O)C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 PVGBHEUCHKGFQP-UHFFFAOYSA-N 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 231100000167 toxic agent Toxicity 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/54—Electroplating of non-metallic surfaces
- C25D5/56—Electroplating of non-metallic surfaces of plastics
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1635—Composition of the substrate
- C23C18/1639—Substrates other than metallic, e.g. inorganic or organic or non-conductive
- C23C18/1641—Organic substrates, e.g. resin, plastic
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1646—Characteristics of the product obtained
- C23C18/165—Multilayered product
- C23C18/1653—Two or more layers with at least one layer obtained by electroless plating and one layer obtained by electroplating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/2006—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
- C23C18/2046—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by chemical pretreatment
- C23C18/2073—Multistep pretreatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/28—Sensitising or activating
- C23C18/285—Sensitising or activating with tin based compound or composition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/32—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/32—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
- C23C18/34—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/32—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
- C23C18/34—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents
- C23C18/36—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents using hypophosphites
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/38—Electroplating: Baths therefor from solutions of copper
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
- C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Electrochemistry (AREA)
- Inorganic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
Description
도금액 조성 | 실시예 1 | 실시예 2 | 실시예 3 | 비교예 1 |
황산크롬(g/ℓ) | 150 | 180 | 200 | 150 |
개미산(g/ℓ) | 50 | - | ||
옥살산(g/ℓ) | - | 50 | 30 | - |
붕산(g/ℓ) | 80 | 80 | 80 | 100 |
아황산알루미늄(g/ℓ) | - | 50 | 80 | - |
황산암모늄(g/ℓ) | 30 | 20 | 10 | |
브롬화암모늄(g/ℓ) | - | 30 | 10 | 20 |
불화칼륨(g/ℓ) | 30 | 20 | - | |
계면활성제(mg/ℓ) | 0.1 | 0.1 | 0.1 | - |
도금 조건 | ||||
pH | 3.0 | 2.5 | 2.0 | 3.3 |
전류밀도(A/dm2) | 10 | 12 | 15 | 10 |
도금액 온도(℃) | 40 | 40 | 40 | 40 |
도금시간(분) | 5 | 5 | 5 | 5 |
피막 특성 | ||||
도금층 두께(㎛) | 2.0 | 2.1 | 2.4 | 2.3 |
경도(Hv) | 890 | 1,000 | 900 | 800 |
내식성(염수분무시험) | ◎※ | ◎ | ◎ | ◎ |
마모특성(마모량 mg) | 1.3 | 1.2 | 1.5 | 20 |
S10-1; 탈지공정
S10-2; 에칭공정
S10-3; 촉매부여공정
S10-4; 무전해니켈도금공정
S10-5; 수세공정
S20; 동 전기도금 단계
S30; Cu-Sn-Zn 삼원합금 도금 단계
S40; 3가 크롬 도금단계
Claims (25)
- PC-ABS 수지 부품의 비전해성 금속도금방법에 있어서,
PC-ABS 수지 부품의 전처리 단계(S10):
상기 전처리 단계(S10)에 의해 전처리된 부품 상에 동을 도금하기 위한 동 전기도금 단계(S20):
상기 동 전기도금 단계(S20)를 거친 대상물의 동 전기도금층 위에 Cu-Sn-Zn 삼원합금으로 도금 처리하는, Cu-Sn-Zn 삼원합금 도금 단계(S30):
상기 Cu-Sn-Zn 삼원합금 도금 단계(S30)를 거친 대상물의 삼원합금 도금층 위에 최종적으로 3가크롬 도금단계(S40)를 거치는 것을 포함하는, PC-ABS 수지 부품의 비전해성 금속도금방법.
- 제 1 항에 있어서,
상기 전처리 단계(S10)는, 도금 대상물인 PC-ABS 수지 부품을 탈지하기 위한 탈지공정(S10-1);
상기 탈지공정을 거친 대상물을 에칭하는 에칭공정(S10-2);
상기 에칭공정(S10-2)을 거친 대상물을 침적하여 활성화 시키기 위한 촉매부여공정(S10-3);
상기 촉매부여공정(S10-3)을 거친 대상물을 무전해 니켈 도금하게 되는 무전해니켈도금공정(S10-4);
상기 무전해니켈도금공정(S10-4)을 거친 대상물을 수세 처리하게 되는 수세공정(S10-5)을 포함하는 것을 특징으로 하는, PC-ABS 수지 부품의 비전해성 금속도금방법.
- 제 2 항에 있어서,
상기 탈지공정(S10-1)은, 피도금대상물인 PC-ABS 수지 부품을 NaOH, KOH, 등의 약 20% 강알칼리 용액에 약 1∼5분간 침적하여 탈지하는 것을 포함하는, PC-ABS 수지 부품의 비전해성 금속도금방법.
- 제 2 항에 있어서,
상기 에칭공정(S10-2)은, 무기산인 인산(H3PO4), 황산(H2SO4), 질산(HNO3), 크롬산(Cro3)군으로부터 선택된 1종 또는 2종 이상으로 혼합되는 산 중 어느 하나와, 과망간산염을 혼합하여서 되는 에칭액에 10분간 상온에서 침적 처리하는 것을 포함하는, PC-ABS 수지 부품의 비전해성 금속도금방법.
- 제 4 항에 있어서,
상기 인산(H3PO4), 황산(H2SO4), 질산(HNO3), 크롬산(Cro3)군은 10g/ℓ 의 농도를 유지하는 것을 포함하는, PC-ABS 수지 부품의 비전해성 금속도금방법.
- 제 4 항에 있어서,
상기 과망간산염은 100g/ℓ의 농도를 유지하는 것을 포함하는, PC-ABS 수지 부품의 비전해성 금속도금방법.
- 제 2 항에 있어서,
상기 촉매부여공정(S10-3)은, PdCl2 와 SnCl2 로 이루어지는 혼합 콜로이드 촉매용액에 20∼50℃의 온도에서 1∼10분간 침지시켜 처리하는 것을 포함하는, PC-ABS 수지 부품의 비전해성 금속도금방법.
- 제 7 항에 있어서,
상기 PdCl2 의 농도는 0.2g/ℓ를 유지하고, 상기 SnCl2 의 농도는 10g/ℓ를 유지ㅎ며 혼합 콜로이드 촉매용액을 이루는 것을 포함하는, PC-ABS 수지 부품의 비전해성 금속도금방법.
- 제 2 항에 있어서,
상기 무전해니켈도금공정(S10-4)에서 선택되는 니켈 원은 황산니켈(NiSO46H2O), 염화니켈(NiCl2), 니켈아세테이트Ni(CH3CO2)H2O 중 어느 하나를 이루고,
환원제로 차아인산나트륨(NaH2PO2H2O) 또는 디메틸아민보레인(CH3)2NHBH3), 소디운보로하이드라이드(NaBH4) 중 어느 하나로 이루어지며,
착화제로 카복실산계인 아세트산, 글리콜산, 숙신산, 사과산, 구연산 중 어느 하나로 이루어지고,
안정화제로는 Bi, Sb, Tl, Zn, Te의 무기염이나 치오우리아{SC(NH2)2},머켑탄(CH4S) 중 어느 하나를 선택하여 무전해니켈도금이 이루어지는 것을 포함하는, PC-ABS 수지 부품의 비전해성 금속도금방법.
- 제 1 항에 있어서,
상기 동 전기도금 단계(S20)는 황산동 도금용액으로 CuSO4 200∼220g/ℓ, H2SO4 50∼60g/ℓ, Cl이온 40∼80mg/ℓ, 도금액 온도 20∼30℃, 전류밀도 1∼5A/dm2에서 약 5∼10분간 도금한 후 세척하는 황산동 도금공정인 것을 포함하는, PC-ABS 수지 부품의 비전해성 금속도금방법.
- 제 1 항에 있어서,
상기 Cu-Sn-Zn 삼원합금 도금 단계(S30)에서, 도금액 중의 동(Cu) 농도는 10∼40g/ℓ(CuSO45H2O), 아연(Zn) 농도는 0.5∼3.0g/ℓ(ZnSO47H2O), 주석(Sn) 농도는 10∼60g/ℓNa2(Sn(OH)6, 피로인산수소나트륨(Na2H2P2O7) 농도는 100∼300g/ℓ, 구연산(C6H8O7) 농도는 15∼20g/ℓ, 아세트산(CH3COOH) 농도는 15∼25g/ℓ, 에틸렌디아민 4 농도는 0∼60ml/ℓ, NaOH 또는 KOH의 농도는 15∼25g/ℓ로 이루어지는 도금액을 이용하는 것을 포함하는, PC-ABS 수지 부품의 비전해성 금속도금방법.
- 제 11 항에 있어서,
상기 도금액의 온도30∼60℃, 전류밀도 0.1∼2.0A/dm2 , 의 조건에서 1∼10분간 도금하는 것을 특징으로 하는, PC-ABS 수지 부품의 비전해성 금속도금방법.
- 제 1 항에 있어서,
상기 Cu-Sn-Zn 삼원합금 도금 단계(S30)에 적용되는 삼원합금 전구체로 Cu 및 Zn을 적용하되, 상기 Zn은 +2 상태의 피로인산염, 탄산염, 수소탄산염, 아황산염, 황산염, 인산염, 아질산염, 질산염, 황산동(CuSO45H2O) 및 황산아연(ZnSO47H2O) 중 어느 하나를 사용하여서 되는 도금액을 이용하여 Cu-Sn-Zn 삼원합금 도금하는 것을 포함하는, PC-ABS 수지 부품의 비전해성 금속도금방법.
- 제 13 항에 있어서,
상기 Zn은, +4가 상태의 주석산나트륨(Na2SnO33H2O), 주석산칼륨(K2SnO33H2O)을 사용하고 도금액의 pH는 약산성 및 강알칼리성으로 pH 7∼12 범위내에 있도록 하는 도금액을 이용하여 Cu-Sn-Zn 삼원합금 도금하는 것을 포함하는, PC-ABS 수지 부품의 비전해성 금속도금방법.
- 제 1 항에 있어서,
상기 Cu-Sn-Zn 삼원합금 도금 단계(S30)에 적용되는 도금액에 안정제, 착화제, 광택제, 습윤제, 감극제 중 적어도 하나 이상 선택 조합 첨가하여서 되는 도금액을 이용하여 Cu-Sn-Zn 삼원합금 도금하는 것을 포함하는, PC-ABS 수지 부품의 비전해성 금속도금방법.
- 제 15 항에 있어서,
상기 안정제, 착화제, 광택제, 습윤제, 감극제는 인산수소나트륨(Na2H2P2O7), 인산수소칼륨(K2H2P2O7), 피로인산나트륨(Na4P2O7nH2O), 칼륨염과, 모노카복실산(monocarboxylic acid), 디카복실산(dicarboxylic acid), 트리카복실산(tricarboxylic acid), 베타인(betaines, 트리알킬아미노산, C5H11NO2), 및 에틸렌디아민ethylenediamine, C2H4(NH2)2 으로 이루어지는 도금액을 이용하여 Cu-Sn-Zn 삼원합금 도금하는 것을 포함하는, PC-ABS 수지 부품의 비전해성 금속도금방법.
- 제 16 항에 있어서,
상기 모노카복실산으로 아세트산(acetic acid, CH3COOH), 글리콜릭산(glycolic acid, HOCH2COOH), 글리신(glycine, NH2CH2COOH), 아닐린(aniline, C6H5NH2). 젖산lactic acid, CH3CH(OH)COOH, 개미산(HCOOH) 중 어느 하나로 이루어지는 도금액을 이용하여 Cu-Sn-Zn 삼원합금 도금하는 것을 포함하는, PC-ABS 수지 부품의 비전해성 금속도금방법.
- 제 16 항에 있어서,
상기 디카복실산으로는 숙신산(succinic acid, CH2)2(COOH)2, 사과산(malic acid, C8H6O5), 타타르산tataric acid, (CHOH)2(COOH)2, 옥살산oxalic acid, (COOH)2 중 어느 하나로 이루어지는 도금액을 이용하여 Cu-Sn-Zn 삼원합금 도금하는 것을 포함하는, PC-ABS 수지 부품의 비전해성 금속도금방법.
- 제 16 항에 있어서,
상기 트리카복실산으로는 구연산(citric acid, C6H8O7), 아코니니틱산(aconitic acid(C6H6O8), 트리메스틱산(trimestic acid, C9H5O6), 프로판 1,2,3 트리카복실산propane-1,2,3-tricarboxylic acid, C3H5(COOH)3 중 어느 하나 또는 이들의 알칼리염으로 이루어지는 도금액을 이용하여 Cu-Sn-Zn 삼원합금 도금하는 것을 포함하는, PC-ABS 수지 부품의 비전해성 금속도금방법.
- 제 16 항에 있어서,
상기 안정제로 피로인산수소나트륨 100∼300g/ℓ, 착화제 구연산 15∼20g/ℓ, 아세트산 15∼25g/ℓ, 에틸렌디아민 40∼60ml/ℓ, pH 조절제로 NaOH 15∼25g/ℓ, 가 첨가되는 도금액을 이용하여 Cu-Sn-Zn 삼원합금 도금하는 것을 포함하는, PC-ABS 수지 부품의 비전해성 금속도금방법.
- 제 1 항에 있어서,
상기 3가크롬 도금단계(S40)에서 3가크롬 원으로는 황산크롬Cr2(SO4)3, 염화크롬(CrCl3), 질산크롬HNO3)3, 초산크롬Cr2(OAc)42H2O 에서 선택되는 어느 하나 이상의 군을 사용하여서 되는 도금액을 이용하여 도금 처리하는 것을 포함하는, PC-ABS 수지 부품의 비전해성 금속도금방법.
- 제 21 항에 있어서,
상기 가크롬 도금단계(S40)에 적용되는 도금액에 기타 첨가제로 착화제, 전도성 보조제, 산화제, 감극제, 습윤제, pH조절제 및 안정제, 무기물 색상발현제가 더 첨가되는 도금액을 이용하여, 도금 처리하는 것을 포함하는, PC-ABS 수지 부품의 비전해성 금속도금방법.
- 제 22 항에 있어서,
상기 착화제로는 옥살산(C2H2O4), 개미산(HCOOH) 중 어느 하나를, 상기 전도성 보조제로는 염화암모늄(NH4Cl), 염화칼륨(KCl), 염화칼슘(CaCl2) 중 어느 하나를, 상기 산화제로는 황산칼륨(K2SO4), 황산알루미늄Al2(SO4)3, 아황산암모늄(NH4)2S2O8 중 어느 하나를, 상기 감극제는 NH4Br, NaBr, NaF, KF 중 어느 하나를, 상기 습윤제는 소디움라우릴설페이트sodium lauryl sulfate, CH3(CH2)11SO4Na 를, 상기 pH 조절제 및 안정제로 KOH, NaOH, NH4OH, H2BO3, 중 어느 하나를, 상기 무기물 색상발현제로 Fe, Co 이온 중 어느 하나를 사용하여 첨가되는 도금액을 이용하여, 도금 처리하는 것을 포함하는, PC-ABS 수지 부품의 비전해성 금속도금방법.
- 제 1 항에 있어서,
상기 3가크롬 도금단계(S40)에 적용되는 도금액에서의 황산크롬Cr2(SO4)36H2O은 100∼300g/ℓ, 착화제인 옥살산(C2H2O42H2O)는 50∼70g/ℓ, 개미산(HCOOH) 30∼50g/ℓ의 농도를 유지하며, 3가크롬 1몰에 대하여 착화제는 0.1∼2.0몰로, 황 조정, 황산암모늄NH4)2SO4 40∼100g/ℓ, 아황산암모늄((NH4)2S2O8) 5∼15g/ℓ, 붕산(HBO3) 30∼80g/ℓ, 브롬화암모늄(NH4Br), 또는 불화칼륨(KF) 5∼40g/ℓ, 소디움라우릴설페이트CH3(CH2)11SO4Na 0.05∼0.1g/ℓ, 무기물 색상 발현제 2∼15g/ℓ을 첨가한 도금액을 사용하여 도금하는 것을 포함하는, PC-ABS 수지 부품의 비전해성 금속도금방법.
- 제 24 항에 있어서,
상기 도금액의 온도 30∼60℃, pH 1.5∼5.0, 전류밀도 5∼20A/dm2, 양극은 불용성 흑연 또는 이리듐판을 채택하고, 도금시간은 1∼10분 범위내로 도금하는 것을 특징으로 하는 PC-ABS 수지 부품의 비전해성 금속도금방법.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020160074322A KR101861626B1 (ko) | 2016-06-15 | 2016-06-15 | Pc-abs 수지 부품의 비전해성 금속도금방법 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020160074322A KR101861626B1 (ko) | 2016-06-15 | 2016-06-15 | Pc-abs 수지 부품의 비전해성 금속도금방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20170141834A true KR20170141834A (ko) | 2017-12-27 |
KR101861626B1 KR101861626B1 (ko) | 2018-05-29 |
Family
ID=60938523
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020160074322A Expired - Fee Related KR101861626B1 (ko) | 2016-06-15 | 2016-06-15 | Pc-abs 수지 부품의 비전해성 금속도금방법 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR101861626B1 (ko) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109652787A (zh) * | 2018-12-20 | 2019-04-19 | 镇江阿尔法特种镀膜科技有限公司 | 一种聚醚醚酮复合材料表面化学镀前预处理工艺 |
CN110965052A (zh) * | 2019-12-25 | 2020-04-07 | 廊坊师范学院 | 金属表面中温化学镀镍磷合金的制备工艺 |
CN111501030A (zh) * | 2020-05-26 | 2020-08-07 | 电子科技大学 | 化学镀前表面修饰体系及双重修饰聚合物基材表面的方法 |
CN112239876A (zh) * | 2019-07-18 | 2021-01-19 | 波音公司 | 源自三价铬电解质的功能性铬合金镀覆 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007314876A (ja) * | 2006-04-28 | 2007-12-06 | Nippon Kanizen Kk | 無電解ニッケルめっき液 |
JP2009228083A (ja) * | 2008-03-25 | 2009-10-08 | Ebara-Udylite Co Ltd | プラスチック表面への金属めっき方法 |
JP6485122B2 (ja) * | 2014-10-08 | 2019-03-20 | 豊田合成株式会社 | 装飾部品 |
-
2016
- 2016-06-15 KR KR1020160074322A patent/KR101861626B1/ko not_active Expired - Fee Related
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109652787A (zh) * | 2018-12-20 | 2019-04-19 | 镇江阿尔法特种镀膜科技有限公司 | 一种聚醚醚酮复合材料表面化学镀前预处理工艺 |
CN109652787B (zh) * | 2018-12-20 | 2020-12-15 | 镇江阿尔法特种镀膜科技有限公司 | 一种聚醚醚酮复合材料表面化学镀前预处理工艺 |
CN112239876A (zh) * | 2019-07-18 | 2021-01-19 | 波音公司 | 源自三价铬电解质的功能性铬合金镀覆 |
EP3767012A1 (en) * | 2019-07-18 | 2021-01-20 | The Boeing Company | Functional chromium alloy plating from trivalent chromium electrolytes |
JP2021036073A (ja) * | 2019-07-18 | 2021-03-04 | ザ・ボーイング・カンパニーThe Boeing Company | 三価クロム電解質に基づく機能性クロム合金めっき |
AU2020205312B2 (en) * | 2019-07-18 | 2025-05-01 | The Boeing Company | Functional chromium alloy plating from trivalent chromium electrolytes |
CN110965052A (zh) * | 2019-12-25 | 2020-04-07 | 廊坊师范学院 | 金属表面中温化学镀镍磷合金的制备工艺 |
CN111501030A (zh) * | 2020-05-26 | 2020-08-07 | 电子科技大学 | 化学镀前表面修饰体系及双重修饰聚合物基材表面的方法 |
CN111501030B (zh) * | 2020-05-26 | 2021-03-02 | 电子科技大学 | 化学镀前表面修饰体系及双重修饰聚合物基材表面的方法 |
Also Published As
Publication number | Publication date |
---|---|
KR101861626B1 (ko) | 2018-05-29 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US5614003A (en) | Method for producing electroless polyalloys | |
EP3030688B1 (en) | Electroless nickel plating solution and method | |
JP5322083B2 (ja) | 3価クロムめっき浴及びその製造方法 | |
KR101861626B1 (ko) | Pc-abs 수지 부품의 비전해성 금속도금방법 | |
US2745799A (en) | Processes for coating aluminum and alloys thereof | |
US3925170A (en) | Method and composition for producing bright palladium electrodepositions | |
CN101096769A (zh) | 一种电镀方法 | |
US3096182A (en) | Chemical plating solution and process for plating therewith | |
WO2012114737A1 (ja) | 3価クロムめっき成形品の製造方法および3価クロムめっき成形品 | |
US20150135988A1 (en) | Trivalent chromium-conversion processing solution containing aluminum-modified colloidal silica | |
KR101692262B1 (ko) | 흑색 Cr-Co 합금 도금 피막용 흑화 처리액 | |
US3684666A (en) | Copper electroplating in a citric acid bath | |
JP2010209456A (ja) | クロムめっき皮膜の防錆用浸漬処理液及び防錆処理方法 | |
KR101365661B1 (ko) | 무전해 니켈-인 도금액 및 이를 이용한 도금방법 | |
JP2004176082A (ja) | 高耐食性部材及びその製造方法 | |
US20220106688A1 (en) | ELECTROLESS Ni-Fe ALLOY PLATING SOLUTION | |
Nakano et al. | Electrodeposition behavior of Zn–Co alloys from an alkaline zincate solution containing triethanolamine | |
US3681211A (en) | Electroplating a black nickel-zinc alloy deposit | |
US5494710A (en) | Electroless nickel baths for enhancing hardness | |
KR101848227B1 (ko) | 인 함량이 높은 무전해 니켈 | |
KR100402730B1 (ko) | 마그네슘합금에 동-니켈 도금층을 전해 도금으로 형성하는방법 | |
WO2012052832A2 (en) | Electroless nickel plating bath and electroless nickel plating method using same | |
US4470886A (en) | Gold alloy electroplating bath and process | |
CN113463146A (zh) | 一种用于金属工具表面的电镀液及电镀工艺 | |
KR102293808B1 (ko) | 무전해 백금 도금액 조성물 및 이를 이용한 도금방법 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 20160615 |
|
PA0201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20170203 Patent event code: PE09021S01D |
|
E701 | Decision to grant or registration of patent right | ||
PE0701 | Decision of registration |
Patent event code: PE07011S01D Comment text: Decision to Grant Registration Patent event date: 20170821 |
|
PG1501 | Laying open of application | ||
GRNT | Written decision to grant | ||
PR0701 | Registration of establishment |
Comment text: Registration of Establishment Patent event date: 20180521 Patent event code: PR07011E01D |
|
PR1002 | Payment of registration fee |
Payment date: 20180523 End annual number: 3 Start annual number: 1 |
|
PG1601 | Publication of registration | ||
PC1903 | Unpaid annual fee |
Termination category: Default of registration fee Termination date: 20220301 |