KR20170087027A - 광학 장치, 투영 광학계, 노광 장치 및 물품 제조 방법 - Google Patents
광학 장치, 투영 광학계, 노광 장치 및 물품 제조 방법 Download PDFInfo
- Publication number
- KR20170087027A KR20170087027A KR1020170004103A KR20170004103A KR20170087027A KR 20170087027 A KR20170087027 A KR 20170087027A KR 1020170004103 A KR1020170004103 A KR 1020170004103A KR 20170004103 A KR20170004103 A KR 20170004103A KR 20170087027 A KR20170087027 A KR 20170087027A
- Authority
- KR
- South Korea
- Prior art keywords
- mirror
- actuator
- actuators
- back surface
- area
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 41
- 238000004519 manufacturing process Methods 0.000 title description 8
- 239000000758 substrate Substances 0.000 claims description 16
- 238000000034 method Methods 0.000 claims description 12
- 230000008569 process Effects 0.000 claims description 3
- 238000009826 distribution Methods 0.000 abstract description 7
- 230000002093 peripheral effect Effects 0.000 description 15
- 238000005286 illumination Methods 0.000 description 4
- 230000004075 alteration Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000005452 bending Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 230000020169 heat generation Effects 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000008859 change Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
Images
Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
- G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
- G02B7/185—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors with means for adjusting the shape of the mirror surface
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0825—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a flexible sheet or membrane, e.g. for varying the focus
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/20—Light-tight connections for movable optical elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
- G03F7/70266—Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Optical Elements Other Than Lenses (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPJP-P-2016-008283 | 2016-01-19 | ||
| JP2016008283A JP2017129685A (ja) | 2016-01-19 | 2016-01-19 | 光学装置、投影光学系、露光装置およびデバイス製造方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20170087027A true KR20170087027A (ko) | 2017-07-27 |
Family
ID=59340869
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020170004103A Ceased KR20170087027A (ko) | 2016-01-19 | 2017-01-11 | 광학 장치, 투영 광학계, 노광 장치 및 물품 제조 방법 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP2017129685A (zh) |
| KR (1) | KR20170087027A (zh) |
| CN (1) | CN106980177A (zh) |
| TW (1) | TWI631430B (zh) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6598827B2 (ja) * | 2017-08-01 | 2019-10-30 | キヤノン株式会社 | 光学装置、これを用いた露光装置、および物品の製造方法 |
| CN108983414B (zh) * | 2018-08-30 | 2024-01-30 | 京东方科技集团股份有限公司 | 光学反射镜、光学反射镜系统及曝光机 |
| CN109932804B (zh) * | 2019-03-04 | 2021-06-01 | 杭州电子科技大学 | 一种小口径轻型反射镜的柔性记忆合金支撑装置 |
| DE102021205368A1 (de) * | 2021-05-27 | 2022-12-01 | Carl Zeiss Smt Gmbh | Komponente für eine Projektionsbelichtungsanlage für die Halbleiterlithografie und Verfahren zur Auslegung der Komponente |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE743727A (zh) * | 1968-12-26 | 1970-05-28 | ||
| JP3409214B2 (ja) * | 1993-06-04 | 2003-05-26 | コニカ株式会社 | ポリゴンミラースキャナ装置 |
| JP4817702B2 (ja) | 2005-04-14 | 2011-11-16 | キヤノン株式会社 | 光学装置及びそれを備えた露光装置 |
| JP2008040299A (ja) * | 2006-08-09 | 2008-02-21 | Funai Electric Co Ltd | 形状可変ミラー及び形状可変ミラーの製造方法 |
| JP2012078861A (ja) * | 2011-12-21 | 2012-04-19 | Kyocera Mita Corp | 光走査装置 |
| JP5524254B2 (ja) * | 2012-02-14 | 2014-06-18 | 富士フイルム株式会社 | ミラー駆動装置及びその制御方法 |
| JP6168957B2 (ja) * | 2013-09-30 | 2017-07-26 | キヤノン株式会社 | 光学装置、投影光学系、露光装置および物品の製造方法 |
| JP6336274B2 (ja) * | 2013-12-25 | 2018-06-06 | キヤノン株式会社 | 光学装置、投影光学系、露光装置、および物品の製造方法 |
-
2016
- 2016-01-19 JP JP2016008283A patent/JP2017129685A/ja active Pending
- 2016-12-15 TW TW105141624A patent/TWI631430B/zh active
-
2017
- 2017-01-11 KR KR1020170004103A patent/KR20170087027A/ko not_active Ceased
- 2017-01-16 CN CN201710029635.8A patent/CN106980177A/zh active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| JP2017129685A (ja) | 2017-07-27 |
| TW201740208A (zh) | 2017-11-16 |
| TWI631430B (zh) | 2018-08-01 |
| CN106980177A (zh) | 2017-07-25 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 20170111 |
|
| PG1501 | Laying open of application | ||
| A201 | Request for examination | ||
| PA0201 | Request for examination |
Patent event code: PA02012R01D Patent event date: 20180711 Comment text: Request for Examination of Application Patent event code: PA02011R01I Patent event date: 20170111 Comment text: Patent Application |
|
| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20190422 Patent event code: PE09021S01D |
|
| E601 | Decision to refuse application | ||
| PE0601 | Decision on rejection of patent |
Patent event date: 20190702 Comment text: Decision to Refuse Application Patent event code: PE06012S01D Patent event date: 20190422 Comment text: Notification of reason for refusal Patent event code: PE06011S01I |