KR20150033614A - Illumination apparatus, processing apparatus, and method for manufacturing device - Google Patents

Abstract

A light integrator having a rectangular first surface, an inner surface, and a second rectangular surface, wherein light incident on the first surface is emitted from the second surface through multiple reflections on the inner surface; A light guide portion for guiding light from a light source to the optical integrator, the light guide portion supplying a plurality of light beams lined up at a predetermined interval along a long longitudinal direction of the first surface to the optical integrator; Wherein the second surface is formed with a conjugate plane which is conjugate with the second surface with respect to the short-length direction of the two surfaces, and the second surface has a smaller refractive power with respect to the long- Respectively.

Description

TECHNICAL FIELD [0001] The present invention relates to a lighting apparatus, a processing apparatus,

The present invention relates to a lighting device, a processing device, and a device manufacturing method.

The present application claims priority based on U.S. Provisional Application No. 61 / 662,571, filed on June 21, 2012, the contents of which are incorporated herein by reference.

2. Description of the Related Art In recent years, devices such as organic EL display panels and liquid crystal display panels have been widely used as display devices for televisions and the like. Such various devices are manufactured by forming various film patterns such as transparent thin film electrodes on a substrate such as a glass plate by using, for example, an exposure process and an etching technique. As a form of manufacturing a device, there has been proposed a roll-to-roll type manufacturing method in which a film-like substrate is transported and various treatments such as exposure treatment are performed on the substrate on a transport path (see, for example, 1).

Patent Document 1: International Publication No. 2008/129819

A processing apparatus such as an exposure apparatus is expected to widen the processing range from the viewpoint of enabling the device to be produced efficiently. It is expected that the illuminating device used in such a processing apparatus widen the irradiation range of the light in the direction perpendicular to the moving direction of the object to be processed.

It is an object of the present invention to provide a lighting device, a processing device, and a device manufacturing method that enable a wider processing range.

A lighting apparatus according to one aspect of the present invention is a lighting apparatus having a first surface of a rectangular shape, an inner surface, and a second surface of a rectangular shape, wherein light incident on the first surface, A light integrator for emitting light from two planes and a light guide portion (light guide portion) for guiding light from the light source to the light integrator, the light guide portion being a light guide portion A light guiding portion that supplies a plurality of light beams (light beams) to the optical integrator; and a second light guiding portion that forms a conjugate surface that is conjugate with the second surface with respect to the short-length direction of the second surface, (Imaging optical system) having a smaller refractive power with respect to a longer longitudinal direction of the second surface than a refractive power with respect to the shorter-length direction of the second surface.

A lighting apparatus according to one aspect of the present invention has a rectangular first surface, an inner surface, and a rectangular second surface, wherein light incident on the first surface is reflected from the second surface And a light guide unit for guiding light from the light source to the optical integrator, wherein the light guide unit comprises a plurality of light beams lined up at predetermined intervals along a long longitudinal direction of the first surface, A light guiding portion which supplies the light guiding portion to the optical integrator; and a light guiding portion which forms a conjugate surface which is a conjugate area with the second surface with respect to the short surface direction of the second surface, The imaging optical system having a small refractive power in the long-side direction of the second surface and a predetermined magnification other than the magnification in the short-side direction of the second surface.

A processing apparatus according to one aspect of the present invention is a processing apparatus for transferring a pattern formed on a mask pattern to a substrate having a sensitive layer (sense layer), the apparatus comprising: the illumination device for illuminating the mask pattern; And a moving device for relatively moving the pattern and the substrate in a direction perpendicular to the longitudinal direction of the second surface.

A device manufacturing method according to one aspect of the present invention is characterized in that the processing apparatus continuously transfers the pattern to the substrate while relatively moving the mask pattern and the substrate, Lt; RTI ID = 0.0 > a < / RTI >

A lighting apparatus according to one aspect of the present invention is a lighting apparatus having a rectangular input end, an inner surface, and a rectangular output end, wherein light from a light source incident from the incident end is reflected by multiple reflections on the inner surface, A light integrator having a rectangular parallelepiped shape and guided to an output end of the optical integrator; and a plurality of light collectors (light collectors) arranged at predetermined intervals along the long longitudinal direction of the incident end And a light source side optical system for forming a light source side optical system and a light integrator, wherein the light source side optical system forms a conjugate plane which is a conjugate part with the emitting end with respect to a short length direction of the light integrator, And has a small refractive power with respect to the long longitudinal direction of the imaging optical system.

According to the aspect of the present invention, it is possible to provide a lighting device, a processing device, and a device manufacturing method that can expand the processing range.

1 is a diagram showing an example of a device manufacturing system.
2 is a side view showing the exposure apparatus according to the first embodiment.
3 is a front view showing an exposure apparatus according to the first embodiment.
4 is a perspective view showing a lighting apparatus according to the first embodiment.
5 is a side view and a front view showing a lighting apparatus according to the first embodiment.
6 is a plan view showing the light source unit according to the first embodiment.
7 is a plan view showing the diaphragm member according to the first embodiment.
8 is a view for explaining an illumination method.
9 is a view for explaining an illumination method.
10 is a graph for explaining the illuminance distribution.
11 is a side view showing the exposure apparatus according to the second embodiment.
12 is a side view and a front view showing a lighting apparatus according to the second embodiment.
13 is a plan view showing the diaphragm member according to the second embodiment.
14 is a side view showing an exposure apparatus according to the third embodiment.
15 is a top view showing a lighting apparatus according to the third embodiment.
16 is a view for explaining an illumination method.
17 is a graph showing an example of the illuminance distribution.
18 is a side view showing an exposure apparatus according to the fourth embodiment.
19 is a view for explaining an illumination method.
20 is a graph showing an example of the illuminance distribution.
21 is a flowchart showing an example of a device manufacturing method.

[First Embodiment]

1 is a diagram showing a configuration example of a device manufacturing system SYS (flexible display manufacturing line). Here, the flexible substrate P (sheet, film, etc.) drawn out from the supply roll FR1 passes through the n processing units U1, U2, U3, U4, U5, ..., And wound up on the roll FR2.

1, the XYZ orthogonal coordinate system is set so that the front side (or rear side) of the substrate P is perpendicular to the XZ plane and is set to be perpendicular to the conveying direction (long side direction) of the substrate P Direction) is set in the Y-axis direction. The Z-axis direction is set, for example, to the vertical direction, and the X-axis direction and the Y-axis direction are set to the horizontal direction. For convenience of explanation, the drawing viewed from the X-axis direction (downstream in the transport direction), the front view, the Y-axis direction (the direction of the rotation center axis), the side view and the Z axis direction There may be a top view.

The substrate P wound on the supply roll FR1 is taken out by the niped drive roller and is positioned in the Y direction by the edge position controller and sent to the processing device U1.

The processing apparatus U1 is a coating apparatus and is provided with a photosensitive functional liquid (photoresist, photosensitive coupling material, UV curable resin liquid, etc.) on the surface of the substrate P by a printing method, (Long direction) of the substrate W in a continuous or selective manner. The processing apparatus U2 is a heating apparatus, for example, and is configured to heat the substrate P conveyed from the processing apparatus U1 to a predetermined temperature (for example, about several tens of degrees Celsius to about 120 degrees Celsius) The photosensitive functional layer is stably fixed.

The processing unit U3 includes an exposure unit and is configured to emit ultraviolet light corresponding to a circuit pattern for display or a wiring pattern to the photosensitive functional layer of the substrate P transported from the processing unit U2, As shown in FIG. In the processing apparatus U3, the edge position controller EPC controls the center of the substrate P in the Y direction (width direction) to a constant position, and the niped drive roller DR1 controls the exposure region Area). The drive rollers DR2 and DR3 take out the substrate P while giving the substrate P a predetermined slack DL.

In the processing apparatus U3, the rotary drum DM holds a sheet-like mask pattern M (mask substrate), and the rotary drum DP is supported by the rotary drum DM at a position facing the rotary drum DM (P). In the processing apparatus U3, the illumination apparatus IU irradiates the substrate P with light through a part of the mask pattern M held by the rotary drum DM, And transfers the formed pattern to the substrate P supported by the rotary drum DP. In the processing apparatus U3, the alignment microscope AM detects an alignment mark or the like formed on the substrate P in advance in order to relatively align (align) the pattern to be exposed (transferred) and the substrate P.

The processing apparatus U3 in FIG. 1 includes a so-called proximity type exposure apparatus, in which the rotary drum DM around which the mask pattern M is wound is used as a mask body, The substrate P is brought close to a predetermined gap (for example, within a few tens of 탆), and the pattern on the mask body is transferred onto the substrate P. The transfer method of the pattern by the processing apparatus U3 is not limited to the proximity system and may be a contact system in which the substrate P is wound around the outer periphery of the cylindrical mask body, Or a method of projecting an image onto the substrate P may be used. In the mask body, the rotary drum DM and the mask pattern M may be releasable or not releasable. For example, the mask body may be formed by forming a mask pattern M on the surface of a rotary drum DM made of a transparent cylindrical quartz tube.

The processing apparatus U4 is a wet processing apparatus for performing a wet process on the photosensitive functional layer of the substrate P transported from the processing apparatus U3, And at least one of various kinds of wet processing is performed. The processing apparatus U5 is, for example, a heating and drying apparatus and warms the substrate P transported from the processing apparatus U4 to adjust the moisture content of the substrate P wetted in the wet process to a predetermined value .

The substrate P processed by the processing apparatuses U1 to U5 or the like passes through the last processing unit Un of a series of processes and then passes through the nip driving rollers and the edge position controller to the recovery roll FR2, .

The upper level control device CONT is for controlling the operation of each of the processing devices U1 to Un constituting the manufacturing line in a collective manner. It monitors the processing status and processing status in each of the processing devices U1 to Un, Monitoring of the conveyance state of the substrate P between the processing apparatuses, and feedback correction and feedforward correction based on the results of pre- and post-inspection / measurement.

The substrate P used in the present embodiment is, for example, a resin film, a foil (foil) made of a metal such as stainless steel or an alloy, or the like. The material of the resin film is, for example, polyethylene resin, polypropylene resin, polyester resin, ethylene vinyl copolymer resin, polyvinyl chloride resin, cellulose resin, polyamide resin, polyimide resin, polycarbonate resin, polystyrene resin, And one or more of vinyl acetate resin.

The substrate P may have a thermal expansion coefficient that is not significantly large so that the amount of deformation due to heat received in various processing steps can be substantially ignored. The thermal expansion coefficient may be set to be smaller than a threshold value according to the process temperature or the like, for example, by mixing an inorganic filler with a resin film. The inorganic filler may be, for example, titanium oxide, zinc oxide, alumina, silicon oxide, or the like. Alternatively, the substrate P may be a very thin glass single layer having a thickness of about 100 占 퐉 manufactured by a float method or the like, and a laminate obtained by bonding the above-mentioned resin film, foil, Okay. The substrate P may be one obtained by modifying the surface of the substrate P by a predetermined pretreatment and activating the substrate P or by forming a fine partition structure (concavo-convex structure) for precision patterning on the surface.

The device manufacturing system SYS of Fig. 1 repeatedly executes various processes for manufacturing a device (display panel or the like) with respect to the substrate P or continuously. The substrate P subjected to various processes is divided (diced) for each device into a plurality of devices. The dimension of the substrate P is, for example, about 10 cm to 2 m in the width direction (Y axis direction as a short axis) and a dimension in the long direction (X axis direction as a long axis) to be. At least one of the plurality of processing apparatuses included in the above-described device manufacturing system SYS may be omitted.

Next, the processing apparatus U3 (exposure apparatus EX) will be described in more detail. Fig. 2 is a side view showing the exposure apparatus EX according to the present embodiment, and Fig. 3 is a front view showing the exposure apparatus EX. The exposure apparatus EX in FIG. 2 includes an illumination device IU for illuminating a part of the mask pattern M, a moving device 10 for moving the substrate P and the mask pattern M, EX) for controlling each part of the vehicle.

The exposure apparatus EX in Fig. 2 is a so-called scanning exposure apparatus and is a projection exposure apparatus that exposes the substrate P by exposure light (exposure light) L2 generated in a mask pattern M illuminated by the illumination light L1. Thereby transferring the pattern formed on the mask pattern M to the substrate P. [0053]

As shown in Figs. 2 and 3, the illumination apparatus IU forms an illumination region IR having a long length in the Y-axis direction and illuminates the illumination light L1 in such a manner that the illuminance distribution of the illumination region IR becomes uniform Injection. The moving device 10 is moved in the direction substantially perpendicular to the long longitudinal direction (long axis direction, long axis, Y axis direction) of the illumination area IR so that a part of the mask pattern M passes through the illumination area IR in order (Short axis direction, short axis direction, short axis, X axis direction). In this manner, the exposure apparatus EX generates the exposure light L2 according to the pattern of this region in the region of the mask pattern M arranged in the illumination region IR.

The moving device 10 is configured to move the substrate P to the illumination area IR so that the substrate P passes through the area (exposure area PR) where the exposure light L2 enters from the mask pattern M, (X-axis direction). Thus, the exposure apparatus EX scans the substrate P with exposure light L2 in a direction (X-axis direction) perpendicular to the longitudinal direction (Y-axis direction) of the illumination region IR.

Next, the mobile device 10 will be described in more detail. 2 includes a rotary drum DM for holding a mask pattern M, a driving unit 12 for driving the rotary drum DM, a rotary drum DP for supporting the substrate P, And a driving unit 13 for driving the rotary drum DP.

The rotary drum DM is a mask holding member for holding the mask pattern M. [ The rotary drum DM has a cylindrical outer circumferential surface (hereinafter referred to as a cylindrical surface DMa), and the mask pattern M is curved in a cylindrical surface shape along the cylindrical surface DMa ). The cylindrical surface is a surface curved at a predetermined radius around a predetermined center line, and is, for example, at least a part of a cylindrical or cylindrical outer peripheral surface.

The mask pattern M is, for example, a transmissive mask pattern formed in a sheet shape and includes a pattern formed of a light shielding member such as chromium. The rotary drum DM holds the mask pattern M in a releasable state (interchangeable) by winding the mask pattern M on the cylindrical surface DMa, It's okay to do it. For example, the mask pattern M may be formed on the cylindrical surface DMa of the rotary drum DM by a quartz tube, a glass pipe, or the like, and integrated with the rotary drum DM.

The rotary drum DM is provided so as to be rotatable around the rotation center axis AX1 and rotates by the torque supplied from the driving unit 12. [ The rotational position of the rotary drum DM is detected by the detecting unit 14 such as an encoder and controlled based on the result of detection by the detecting unit 14. [ The detection unit 14 may be a part of the mobile device 10 or may be a device different from the mobile device 10.

The rotary drum DP is a substrate holding member for holding the substrate P. [ The rotary drum DP has a cylindrical outer peripheral surface DPa and supports the substrate P on the outer peripheral surface DPa. The rotary drum DP is rotatable about the rotation center axis AX2 and rotates by the torque supplied from the driving unit 13. [ The rotational center axis AX2 of the rotary drum DP is set substantially parallel to the rotational center axis AX1 of the rotary drum DM, for example. The substrate P is conveyed so as to be wound on the rotary drum DP by rotating the rotary drum DP.

The rotational position of the rotary drum DP is detected by the detecting unit 15 such as an encoder and controlled based on the result of detection by the detecting unit 15. [ The detection unit 15 may be a part of the mobile device 10 or may be a device different from the mobile device 10.

The control device 11 controls the drive section 12 based on the detection result obtained from the detection section 14 to thereby control the rotational position of the rotary drum DM. Thus, the control device 11 can control the rotational position of the mask pattern M held by the rotary drum DM. The control unit 11 controls the driving unit 13 based on the detection result obtained from the detecting unit 15 to thereby control the rotational position of the rotary drum DP. Thus, the control device 11 can control the position of the substrate P moving in accordance with the rotation of the rotary drum DP.

The control device 11 controls the relative positions of the mask pattern M and the substrate P by controlling the driving part 12 and the driving part 13 and controls the relative position between the illumination area IR The substrate P is scanned with the exposure light L2 generated at a portion overlapping the exposure light L2. The scanning direction in which the substrate P is scanned by the exposure light L2 in the exposure apparatus EX is a direction (X-axis direction) substantially perpendicular to the rotation center axis AX1 (Y-axis direction).

The driving unit 12 may be capable of moving the rotary drum DM in at least one direction of the X-axis direction, the Y-axis direction, and the Z-axis direction. In this case, the detecting section 14 may detect the position of the rotary drum DM in the direction in which the driving section 12 moves the rotary drum DM, and the control device 11 may detect the position of the rotary drum DM It is also possible to control the position of the rotary drum DM in an arbitrary direction by controlling the driving unit 12 based on the detection result.

The position adjustment of the rotary drum DM may be performed by one or both of the rotation direction about the X axis and the rotation direction about the Z axis. The position adjustment of the rotary drum DM may be applied to the rotary drum DP. The exposure apparatus EX can control the relative positions of the rotary drum DM and the rotary drum DP by controlling the position of one or both of the rotary drum DM and the rotary drum DP. Thereby, the exposure apparatus EX can adjust the relative position between the illumination region IR and the substrate P in a direction other than the scanning direction.

Next, the lighting apparatus IU will be described in more detail. Fig. 4 is a perspective view showing the lighting apparatus IU according to the present embodiment, Fig. 5 (A) is a side view showing the lighting apparatus IU, and Fig. 5 (B) is a front view showing the lighting apparatus IU. 6 is a plan view showing an example of a light source portion (light guide portion (light guide portion), light source side optical system) 20, and Fig. 7 is a plan view showing a diaphragm member.

The illumination device IU of Fig. 4 forms an illumination area IR having a predetermined length (Y-axis direction) as a long length. The illumination device IU is arranged in the exposure apparatus EX (see Fig. 2) so that the long-length direction of the illumination area IR is substantially perpendicular to the scanning direction (X-axis direction).

The lighting apparatus IU includes a light source unit 20, a magnifying optical system 21, a light integrator 22, and an imaging optical system 23. The illumination light L1 emitted from the light source unit 20 passes through the magnifying optical system 21 and enters the optical integrator 22 and exits from the optical integrator 22 and then passes through the imaging optical system 23, And enters the illumination area IR.

As the illumination light L1 for exposure, light having a wavelength of 300 nm or more and 400 nm or less, or light having a wavelength of 400 nm or more and 500 nm or less, for example, light in a ultraviolet region is used. Therefore, the glass material of the optical element constituting each of the light source section 20, the magnifying optical system 21, the optical integrator 22, and the imaging optical system 23 may be quartz.

6 includes a solid-state light source 24 (light source) and a plurality of optical fibers 25 connected to the solid-state light source 24. The solid- Here, a plurality of solid light sources 24 are provided in the light source unit 20, and the optical fibers 25 are provided in a one-to-one correspondence with the solid light sources 24. The solid state light source 24 is, for example, a laser diode (LD) or a light emitting diode (LED). The light source unit 20 guides the light from the solid light source 24 to the light integrator 22.

The optical fiber 25 (see Figs. 4 and 5) guides the illumination light L1 from the solid-state light source 24 of Fig. 6 to the optical integrator 22 via the magnifying optical system 21. [ Each of the plurality of optical fibers 25 has an end portion 26 from which the illumination light L1 is emitted and the end portion 26 of the optical fiber 25 is located at an incident end of the optical integrator 22. [ (A predetermined distance, a distance between centers) along the long longitudinal direction (long axis direction, long axis) A light source image Im1 is formed at each end 26 of the plurality of optical fibers 25 and the light source unit 20 forms a plurality of light source images Im1 on the long side of the illumination area IR Are formed so as to lie at a predetermined pitch in the direction corresponding to the longitudinal direction, and are supplied to the optical integrator 22. [

The end 26 of the optical fiber 25 has a substantially circular shape and the spread angle of the illumination light L1 at the time of emergence from the light source 20 is converged at the incident end of the optical fiber 25, (Numerical aperture) of the optical fiber 25, the diameter 1 of the optical fiber 25, and the like. The magnifying optical system 21 adjusts the spread angle of the illumination light L1 at the time of incidence on the optical integrator 22. [ The magnifying optical system 21 is disposed in the optical path between the light source unit 20 and the optical integrator 22 and enlarges the light source image Im1 formed by the light source unit 20 to increase the spreading angle of the illumination light L1 Adjust.

The magnifying optical system 21 of FIG. 5 (B) includes a plurality of modules 27 arranged in the longitudinal direction of the illumination region IR. Each of the plurality of modules 27 is provided in a one-to-one correspondence with the optical fiber 25 of the light source section 20 and is provided on the light output side end 26 of the optical fiber 25 Thereby forming an image. That is, the magnifying optical system 21 forms a secondary light source image Im2 in which the light source image Im1 is magnified. In the drawings referred to in the description, the number of the light source unit 20 and the number of the modules 27 may be suitably reduced in order to make the drawings easy to see.

Each of the plurality of modules 27 includes a lens 28 and a lens 29 forming a secondary light source image Im2 and a lens 30. The lens 30 condenses the illumination light L1 that has passed through the lens 29 so as to enter the incidence end 35 of the optical integrator 22. [ Each of the lens 28, the lens 29, and the lens 30 is composed of, for example, a spherical lens, but it may include an aspheric lens or a free-form surface lens.

The lens 28 and the lens 29 are, for example, telecentric optical systems, and the front focal position of the lens 28 is located at the light exit side end 26 of the optical fiber 25 , And the front focal position of the lens 29 is set to the rear focal position of the lens 28. [ An image (secondary light source image Im2) of the end portion 26 of the optical fiber 25 is formed at the rear focal position of the lens 29. [ The lens 30 is disposed in the optical path between the lens 29 and the incident end 35 of the optical integrator 22. For example, (35).

In this setting, the image (light source image) of the end portion 26 of the optical fiber 25 is imaged (converged) at the position of the incident end 35 of the optical integrator 22 The position of the incident end 35 of the optical integrator 22 and the position of the light source image may be shifted in the direction of the optical axis of the lenses 28 to 30. For example, the rear focal position of the lens 30 may be offset from the position of the incident end 35 of the light integrator 22 in the normal direction of the incident end 35.

The module 27 shown in Fig. 5 includes a diaphragm member 31 that defines a spread angle of the illumination light L1 at the time of incidence on the optical integrator 22. As shown in Fig. The diaphragm member 31 is a so-called aperture stop, for example, disposed at or near the pupil plane (secondary light source image Im2) of the magnifying optical system 21. Here, the diaphragm member 31 is disposed at a position optically conjugate with the end of the optical fiber 25 on the light emission side (on the side of the solid-state light source 24).

The diaphragm member 31 in Fig. 7 has an opening 31a through which the illumination light L1 passes. The openings 31a are arranged in plural in the longitudinal direction (Y-axis direction) of the illumination region IR corresponding to the arrangement of the plurality of modules 27 in Fig. The opening 31a is substantially circular and defines the spreading angle in the XZ plane and the spreading angle in the YZ plane of the illumination light L1 passing through the diaphragm member 31 almost the same. In addition, the diaphragm member 31 can be appropriately omitted.

5B, the plurality of modules 27 of the magnifying optical system 21 includes the lens array 32 in which the lenses 28 are arranged in the Y-axis direction, and the lens array 32 in which the lenses 29 are arranged in the Y- And a lens array 34 in which the lens 30 is arranged in the Y-axis direction. As described above, the number of components can be reduced by configuring at least one kind of lens of the magnifying optical system 21 with a lens array. However, at least one kind of lens of the magnifying optical system 21 may not be in the form of a lens array, The components may be independent from each other in the plurality of modules 27.

The optical integrator 22 (see Fig. 4) is an optical member in the form of a rectangular parallelepiped, such as a rod lens. The optical integrator 22 includes a rectangular incidence end (rectangular incidence surface, first surface) 35, an inner surface 36 including a long side of the incidence end 35, and a short side of the incidence end 35 And an outgoing end (a rectangular outgoing surface, second surface) 38 of a rectangular shape. The incident end 35 includes an incident region where the illumination light L1 from the light source section 20 enters and the exit end 38 is located at a position where the illumination light L1 passing through the inside of the light integrator 22 is emitted And an output area for outputting the image. The optical integrator 22 guides the illumination light L1 incident on the incidence end 35 to the emission end 38 by multiple reflection on the inner surface 36. [

The illuminating light L1 spreading in the short longitudinal direction (short axis direction, short axis) of the incident end 35 in the optical integrator 22 is reflected by the inner surface And includes a plurality of light fluxes having different reflection frequencies in the light flux control section 36. [ The illuminating light L1 passing through the optical integrator 22 has a plurality of light fluxes having different numbers of reflections overlapping each other at the emitting end 38 so that the illuminance distribution in the short length direction of the emitting end 38 becomes uniform. Here, the illumination light L1 includes a light beam reflected by the inner surface 36, regardless of the illumination light L1 emitted from any of the plurality of modules 27. [

The illumination light L1 spreading in the longitudinal direction of the incident end 35 in the optical integrator 22 is reflected in the Y direction of the module 27 of the outgoing source as shown in FIG. A part of the light flux is reflected by the inner surface 37 located at the end portion in the longer longitudinal direction and the other light flux does not enter the inner surface 37. [ For example, the illumination light L1 from the module 27 disposed at the end in the long longitudinal direction of the incident end 35 includes the light flux that is incident on and reflected by the inner surface 37, The illumination light L1 from the module 27 disposed at the central portion in the long longitudinal direction of the light guide plate 31 substantially does not include the light beam incident on the inner surface 37. [ Most of the illumination light L1 from the module 27 disposed at the center in the long longitudinal direction of the incident end 35 passes through the interior of the light integrator 22 without being reflected by the inner surface 37 And exits from the emitting end 38. [

The optical integrator 22 changes the spreading angle of the illumination light L1 in each of the X-axis direction (within the XZ plane) corresponding to the short-length direction and the Y-axis direction (within the YZ plane) corresponding to the long- Do not. That is, the spread angle of the illumination light L1 in the X-axis direction in the optical integrator 22 is substantially the same at the time of incidence on the incidence end 35 and on the emergence from the emergence end 38. [ The spread angle of the illumination light L1 in the Y-axis direction in the optical integrator 22 is substantially the same at the incidence end 35 at the time of incidence and at the time of emergence from the incidence end 38. [ The illumination light L1 emitted from the optical integrator 22 is incident on the imaging optical system 23.

The imaging optical system 23 has a large refractive power in the short-length direction of the emitting end 38, as compared with the refractive power of the emitting end 38 in the long-length direction. The imaging optical system 23 is composed of, for example, a pair of cylindrical lenses (cylindrical lenses). The generatrix of the cylindrical lens of the imaging optical system 23 is set, for example, substantially parallel to the longitudinal direction of the emitting end 38.

The imaging optical system 23 has an imaging action with respect to a light beam on any surface which is parallel to the short longitudinal direction of the emitting end 38 of the optical integrator 22 and perpendicular to the long longitudinal direction. The imaging optical system 23 forms a conjugate plane 23a (illumination region IR) conjugate with the emitting end 38 with respect to the short-length direction of the emitting end 38 of the optical integrator 22. [ For example, when the illumination device IU is viewed from the Y-axis direction, the light flux emitted from one point (a line parallel to the Y-axis direction) of the emission end 38 passes through almost one point on the conjugate plane 23a Axis and a line parallel to the Y-axis direction).

The illumination device IU having the above configuration is arranged such that the conjugate plane 23a (illumination region IR) is positioned at substantially the same position as the mask pattern M (cylindrical face DMa of the rotary drum DM) do. The illuminance distribution in the short length direction at the emitting end 38 of the optical integrator 22 is made uniform by the multiple reflections on the inner surface 36 and the imaging optical system 23 is illuminated at the emitting end 38 And the illumination region IR are optically conjugated to each other, the illuminance distribution in the short-length direction in the illumination region IR becomes uniform. The illuminance distribution in the long-side direction in the illumination region IR is uniformized by overlapping the illuminance distributions derived from each of the plurality of light source portions 20 in the longitudinal direction and overlapping each other. Therefore, the illumination device IU can illuminate the illumination area IR with uniform brightness.

Next, the lighting method by the lighting apparatus IU will be described in more detail. Here, the values of the various members, the focal length, and the like are described, but these values can be appropriately changed as an example.

The solid-state light source 24 of the light source unit 20 in FIG. 6 is, for example, a laser diode, and emits laser light having a wavelength of about 403 nm as the illumination light L1 and has an output of about 0.25 W or so. For example, 83 solid state light sources 24 are provided in the light source section 20, and the total output of the 83 solid state light sources 24 is about 20.075 W. The optical fiber 25 is provided in the same number (83 pieces) as, for example, the solid light source 24, and has a diameter (? 1) of about 0.3 mm. In this example, the spread angle (angle characteristic) of the illumination light L1 emitted from the optical fiber 25 of the light source section 20 is about 0.2 in terms of NA (numerical aperture).

In the following description, a value obtained by converting the spread angle of light (for example, illumination light L1) into NA is suitably referred to as an NA-converted value of light (for example, illumination light L1). The NA converted value of light (light flux) spreading in the X axis direction in the XZ plane is converted into the NA converted value in the X axis direction, the NA converted value of light (flux) spreading in the Y axis direction in the YZ plane is converted into the NA converted in the Y axis direction Value.

The spread angle of the illumination light L1 at the time of exit from the illumination device IU, that is, the spread angle of the illumination light L1 at the time of incidence on the illumination area IR, is set according to the use or the like of the illumination device IU. For example, in the exposure apparatus EX, the spread angle of the illumination light L1 at the time of exiting from the illumination device IU is selected in accordance with the resolution (line width of the projection pattern) of the exposure apparatus EX and the like. Here, it is assumed that the resolution of the exposure apparatus EX is about several micrometers, and the NA converted value of the illumination light L1 when it is emitted from the illumination device IU is set to 0.04.

Each module 27 of the magnifying optical system 21 in FIG. 5 expands the light source image Im1 formed by the light source unit 20 N times (for example, 5 times). Thus, the NA-converted value of the illumination light L1 at the time of exit from the magnifying optical system 21 is 1 / N of the NA-converted value (0.2, for example) of the illumination light L1 at the time of incidence to the magnifying optical system 21 (Here, 0.2 / 5 = 0.04). Such a module 27 can be obtained by setting the focal length f1 of the lens 28 to about 3 mm, the focal length f2 of the lens 29 to about 15 mm, the focal length f3 of the lens 30 About 18.75 mm.

Figs. 8 and 9 are views for explaining an illumination method. Fig. 8A is a side view of the light beam from the light source image (secondary light source image Im2) viewed from the Y axis direction, and FIG. 8B is a side view of the light source image (secondary light source image Im2 9 is a view showing the light source image Im1 (secondary light source image Im2) from the illumination area IR.

The optical integrator 22 shown in Fig. 8 has a dimension of about 2.5 mm in the short-length direction (X-axis direction), about 250 mm in the long-length direction (Y-axis direction) And the dimension in the direction perpendicular to the direction (Z-axis direction) is about 125 mm. The spreading angle (angle characteristic) of the illumination light L1 at the time of incidence on the optical integrator 22 is almost the same as the spreading angle of the illumination light L1 at the time of emergence from the magnifying optical system 21, 0.04.

8 (A), the number of reflection times of the illumination light L1 on the inner surface 36 of the light integrator 22 is 0 light flux, 1 light flux, and 2 And these light beams are superimposed on each other at the emission end 38. [

The NA converted value (the NA converted value in the X axis direction) of the illumination light L1 in the short-length direction of the emitting end 38 is set so as to be equal to or smaller than a predetermined value at the time of incidence to the incidence end 35 and at the time of emergence from the emergence end 38 And is about 0.04, for example. The NA converted value (converted value in the Y axis direction) of the illumination light L1 with respect to the long length direction of the emitting end 38 is set so that the incident angle of the illumination light L1 at the incident end 35, And is about 0.04, for example. 8, the spreading angle of the illumination light L1 at the time of emergence from the light integrator 22 is isotropic in the long direction and the short direction of the long side, and the illumination light L1 (at the time of incidence to the imaging optical system 23) ) Is isotropic in the long and short directions.

The magnification of the imaging optical system 23 with respect to the X-axis direction (short-length direction) when the spreading angle of the illumination light L1 at the time of incidence to the imaging optical system 23 is isotropic around the Z- Times. This imaging optical system 23 can be realized, for example, by making the focal lengths in the XZ plane of the pair of cylindrical lenses almost equal (for example, about 15 mm).

Since the magnification of the imaging optical system 23 is equal to the magnification of the illumination light L1 at the time of emission from the imaging optical system 23 in the short-length direction (the NA converted value in the X-axis direction) (NA converted value in the X-axis direction) of the illumination light L1 in the short-side direction.

The spreading angle (converted value in the Y-axis direction in the Y-axis direction) of the illumination light L1 at the time of emergence from the imaging optical system 23 is such that the imaging optical system 23 has almost no refractive index with respect to the YZ plane (NA converted value in the Y-axis direction) of the illumination light L1 at the time of incidence on the imaging optical system 23 in the long-length direction.

As described above, by making the spread angle of the illumination light L1 at the time of emergence from the imaging optical system 23 isotropic, the spread angle of the illumination light L1 at the time of incidence in the illumination region IR can be made isotropic. Therefore, in the exposure apparatus EX, it becomes easy to match the line width of the exposure pattern in the short longitudinal direction (X-axis direction) and the long longitudinal direction (Y-axis direction).

Next, the illuminance distribution of the illumination area IR will be described. The incident region where the illumination light L1 from one of the plurality of light source images Im1 formed by the light source unit 20 enters is appropriately referred to as a partial illumination region. 8B, the partial illumination region IRa is defined as an incident region in which the illumination light L1 from one of the plurality of secondary light source images Im2 in the magnifying optical system 21 enters. I do not mind. Here, the partial illumination region IRa has a conjugate plane 23a (illumination region (illumination region)) in which the illumination light L1 emitted from the irradiation-side end portion 26 of one optical fiber 25 shown in Fig. IR)).

The diaphragm member 31 (see Figs. 5 and 7) of the magnifying optical system 21 is disposed at a position optically conjugate with the end 26 on the exit side of the optical fiber 25, The light intensity distribution of the illumination light L1 may be considered as a Gaussian distribution at a spreading angle corresponding to 0.04 in terms of the NA. Therefore, the light flux from one point of the diaphragm member 31 (aperture 31a) forms an illuminance distribution such as a Gaussian distribution at the focal plane of the lens 30, for example, ) Diameter (? 2) is widened to a range of about 1.5 mm. In the case where the focal plane of the lens 30 is substantially at the same position as the incident end 35 of the light integrator 22, the dimension of the incident end 35 in the short longitudinal direction (about 2.5 mm in this case) By making the spot diameter (φ2 = 1.5 mm) or more, "vignetting" at the incident end 35 can be suppressed.

The illumination light L1 emitted from the light source unit 20 and passing through one module 27 is reflected by the multiple reflection on the inner surface 36 of the light integrator 22 as shown in Fig. , The illuminance distribution in the short-length direction becomes uniform at the emission end 38. Here, the illumination light L1 spreading in the short-length direction of the emitting end 38 is reflected by the light flux whose number of times of reflection on the inner surface 36 is zero, the inner surface 36 on the + X side or the inner surface 36 on the -X side A light flux whose number of times of reflection is one, the light flux whose number of times of reflection at the inner surface 36 of the + X side or the inner surface 36 of the -X side is twice, and these five light fluxes overlap each other at the output end 38 .

The light beam reflected by the inner surface 36 corresponds to the light beam from the virtual image Im3 of the light source image Im1 and the light beam incident on each point of the output stage 38 is reflected by the light source Im1 The light flux from the real image and the light flux from the four virtual images Im3 formed by the inner surface 36 correspond to the light flux superimposed on each other. 9, five light source images Im1 (actual or virtual) are arranged in the X-axis direction when the light source 20 side is viewed from one point of the illumination region IR.

In the example of Fig. 9, the Y-axis light source image Im1 is the real image, and the other light source image Im1 is the virtual image Im3. The virtual image Im3 is schematically shown in Fig. 8 (A), but the virtual image Im3 may be the same image as the secondary image source image Im2 or the secondary image source image Im2, (The same side as the end 26 on the emission side of the optical fiber 25).

8 (B), the illumination light L 1 emitted from the light source unit 20 and passing through the one module 27 spreads in the longitudinal direction of the incident end 35, Passes through the inside of the partial area 22 and enters the partial illumination area IRa. The partial illumination area IRa is, for example, a substantially rectangular area having a long length in the Y-axis direction, and is formed in a one-to-one correspondence with the actual image of the light source image Im1 formed by the light source part 20. [ That is, the partial illumination area IRa is formed in a one-to-one correspondence with the secondary light source image Im2 formed by each module 27 of the magnifying optical system 21. [

10 is a graph for explaining the illuminance distribution. 10A is a graph showing the illuminance distribution B1 of the illumination area IR (partial illumination area IRa) for each module 27. The horizontal axis indicates the position in the short longitudinal direction, Represents the relative value of the illuminance. 10B is a graph showing the illuminance distribution B2 of the illumination area IR by the plurality of partial illumination areas IRa, wherein the horizontal axis indicates the position in the long longitudinal direction, and the vertical axis indicates the position Represents the relative value of a value obtained by averaging roughness in the short-length direction.

As shown in Fig. 10 (A), the illuminance distribution B1 of each partial illumination region IRa is the same distribution as the Gaussian distribution. In the illumination area IR, the partial illumination area IRa is arranged in the Y-axis direction so as to overlap with the neighboring partial illumination area IRa. As shown in Fig. 10 (B), the illuminance distribution B2 of the illumination area IR is a distribution in which the illuminance distribution B1 of the partial illumination area IRa is shifted in the Y-axis direction and overlapped. Therefore, the illuminance distribution B2 of the illumination region IR becomes a so-called top hat type distribution by disposing the partial illumination regions IRa at a predetermined pitch, Resulting in uniform illumination.

The pitch in the Y axis direction of the partial illumination region IRa is a pitch in the Y axis direction of the light source image Im1 (the exit side end 26 of the optical fiber 25) formed by the light source unit 20 26). The pitch in the Y axis direction of the partial illumination region IRa is a distance (distance between centers) from the center position of the partial illumination region IRa to the center position of the neighboring partial illumination region IRa, Can also be defined in the same manner.

The pitches of the plurality of light source images Im1 formed by the light source unit 20 in the Y axis direction are set such that the illuminance distribution in the Y axis direction in the conjugate plane 23a (illumination region IR) is uniform. The pitch in the Y axis direction of each of the end 26 on the emission side of the optical fiber 25, the lens 28, the lens 29 and the lens 30 is, for example, 3 mm.

The optical fiber 25 and the module 27 of the magnifying optical system 21 are arranged on the Y axis by the number corresponding to the dimension in the Y axis direction of the illumination area IR in order to form the illumination area IR of the desired dimension. Direction at a predetermined pitch.

In this illumination apparatus IU, since the cylindrical lens of the imaging optical system 23 has almost no refracting power with respect to the YZ plane, the illumination light L1 is emitted from the end of the optical integrator 22 in the Y- For example, about 14 mm. The region illuminated by the illumination light L1 spreading outside the optical integrator 22 may be uneven in the illuminance distribution with the other regions and may not be used as the illumination region IR.

In the example of FIG. 8 (B), the light beam incident on one point of the illumination area IR is a light beam which is obtained by superimposing the light beams from the five modules 27 arranged in the Y-axis direction. Therefore, as shown in Fig. 9, when the light source section 20 side is viewed from one point of the illumination region IR, five light source images Im1 are arranged in the Y-axis direction. A light beam corresponding to a light flux from an array of 25 light source images Im1, which is five rows in the X-axis direction and five columns in the Y-axis direction, is incident on each point of the region except for the end portion in the Y- .

In the present embodiment, the illuminance distribution in the short-length direction of the illumination region IR is made uniform by the multiple reflection at the inner surface 36 of the light integrator 22, and the illumination in the long- The distribution is made uniform by overlapping the light fluxes from the plurality of light source images Im1. Such an illumination apparatus IU appropriately adjusts the number of the partial illumination areas IRa arranged in a predetermined direction so that the illumination area IR is set to a desired length in a predetermined direction, Can be illuminated.

In the present embodiment, the exposure apparatus EX can extend the processing range of the exposure processing since the illumination region IR in the direction orthogonal to the scanning direction can be set to a desired length. As a result, the exposure apparatus EX can efficiently process a large substrate for manufacturing a large-sized device, a large substrate for obtaining a multi-surface, and the like.

[Second Embodiment]

Next, the second embodiment will be described. In the present embodiment, the same components as those in the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

11 is a side view showing the exposure apparatus EX according to the present embodiment. The exposure apparatus EX in Fig. 11 has a substrate stage ST instead of the rotary drum DP shown in Fig. The substrate stage ST is a substrate supporting member for supporting the substrate P and supports the substrate P in a planar shape in the exposure region PR. The substrate stage ST, for example, supports the back surface of the substrate P in a noncontact manner by a layer of an air bearing.

In the exposure apparatus EX, a diaphragm member 40 is provided in the optical path between the rotary drum DM (mask pattern M) and the substrate stage ST (substrate P). The diaphragm member 40 is a so-called visual field diaphragm that defines a passage range of light (exposure light) emitted from the illumination device IU and passed through the mask pattern M, . The exposure apparatus EX can precisely define the range of the exposure area PR by the diaphragm member 40, but it is not necessary to provide the diaphragm member 40.

Fig. 12A is a side view showing the illuminator IU, Fig. 12B is a front view of the illuminator IU, and Fig. 13 is a plan view showing the diaphragm 31. Fig.

In the illumination device IU of Fig. 12, the magnification that the magnifying optical system 21 widens the illumination light L1 in the short longitudinal direction (X-axis direction) is obtained when the magnifying optical system 21 scans the illumination light L1 in the long- Axis direction). In this magnifying optical system 21, for example, the lens 28 is constituted by a spherical lens, the lens 29 is constituted by a cylindrical lens and a spherical lens, but the lens 29 is constituted by a toric lens It is okay to be.

The magnification of the magnifying optical system 21 differs between the X axis direction and the Y axis direction so that when the end portion 26 of the optical fiber 25 is substantially circular, 13 of the secondary light source image Im2) is an elliptical shape having a minor axis parallel to the X-axis direction and a major axis parallel to the Y-axis direction. The magnification of the end portion 26 of the optical fiber 25 is? 1, the magnification of the magnifying optical system 21 is the magnification of the illumination light L1 in the X-axis direction, the magnification optical system 21 is the magnification of the illumination light L1 in the Y- When the widening magnification is M1y, the minor axis of the secondary light source image Im2 is M1x x? 1, and the major axis of the secondary light source image Im2 is M1y x? 1. For example, when the diameter 1 of the end portion 26 of the optical fiber 25 is 0.3 mm, M1x is 3 times, and M1y is 5 times, the minor axis of the secondary light source image Im2 is 0.9 mm, And the long axis of the light source image Im2 is 1.5 mm.

A diaphragm member 31 as shown in Fig. 13 is provided at or near the surface (the coplanar surface 41) on which the secondary light source image Im2 is formed by the magnifying optical system 21. The diaphragm member 31 has, as a so-called aperture diaphragm, an elliptical opening 31a substantially resembling, for example, the secondary light source image Im2. For example, the direction of the minor axis of the opening 31a is set to be substantially equal to that of the secondary light source image Im2, and the direction of the major axis is set to be substantially equal to the secondary light source image Im2. Here, the opening 31a is formed to have almost the same dimensions as the secondary light source image Im2. The aperture 31a of the diaphragm member 31 may be smaller than the secondary light source image Im2 or may be omitted.

The illumination light L1 from the secondary light source image Im2 passes through the lens 30 of the magnifying optical system 21 and enters the incident end 35 of the light integrator 22. [ The spread angle (angular characteristic) of the illumination light L1 at the incidence end 35 upon incidence depends on the shape of the secondary light source image Im2 or the shape of the diaphragm member 31. [ Since the dimension (minor axis) of the secondary light source image Im2 in the X axis direction is smaller than the dimension (minor axis) in the Y axis direction, the spread angle of the illumination light L1 in the optical integrator 22 is smaller The spreading angle becomes smaller than the spreading angle in the Y-axis direction. That is, the magnifying optical system 21 (also referred to as a condensing optical system) has an angular characteristic with respect to the longitudinal direction (Y direction) of the incident end 35 of light toward the incident end 35 of the optical integrator 22 Is set so that the angular characteristic with respect to the short longitudinal direction (X direction) is different. For example, in the optical integrator 22, the NA conversion value of the illumination light L1 in the X-axis direction is about 0.024, and the NA conversion value of the illumination light L1 in the Y-axis direction is 0.04.

In the optical integrator 22, the illumination light L1 (see Fig. 12 (A)) extending in the short length direction of the incident end 35 is reflected by the inner surface 36 and guided to the output end 38, The illuminance at the emitting end 38 is made uniform by the multiple reflections on the inner surface 36. The spreading angle of the illumination light L1 in the short-length direction at the time of emergence from the emitting end 38 is substantially equal to that at the time of incidence on the incident end 35, and is, for example, 0.024 in terms of NA.

The position of the entrance end 35 of the optical integrator 22 and the position of the image of the end 26 of the optical fiber 25 may not coincide with each other, It may be deviated from a predetermined range in a direction parallel to the optical axis of the lens 30 of the optical system 21.

The illumination light L1 (refer to FIG. 12 (B)) extending in the longitudinal direction of the incident end 35 passes through the interior of the light integrator 22 without being incident on the inner surface 37 And exits from the emitting end 38. [ The spread angle of the illumination light L1 in the short-length direction at the time of emergence from the emitting end 38 is almost the same as that at the incidence on the incident end 35, and is, for example, 0.04 in terms of NA.

The imaging optical system 23 of Fig. 12 reduces the image of the emitting end 38 of the light integrator 22 in the short longitudinal direction (X-axis direction) to form the conjugate plane 23a (illumination region IR) . The magnification M2x of the imaging optical system 23 in the X axis direction is set such that the magnification of the magnifying optical system 21 by the magnifying optical system 21 in the X axis direction is M1x and the magnification optical system 21 expands the illumination light L1 in the Y axis direction When the magnification is M1y, it is M1x / M1y times. For example, in the case where M1x is 3 times and M1y is 5 times, the magnification of the imaging optical system 23 in the X-axis direction is set to 0.6 times. Therefore, the NA-converted value in the short-length direction of the light beam incident on each point of the illumination area IR becomes 1 / (M1x / M1y) times as large as that at the time of outputting from the optical integrator 22. [ For example, the NA converted value in the short-length direction of the light flux incident on each point of the illumination region IR becomes 0.024 / 0.6, and the NA in the long-length direction of the light flux incident on each point of the illumination region IR Which is almost the same value (0.04) as the converted value.

In the present embodiment, the imaging optical system 23 reduces the image of the emitting end 38 of the light integrator 22 in the short longitudinal direction, so that the width of the optical integrator 22 (in the X- The width of the conjugate plane 23a becomes narrower than the width of the conjugate plane 23a. For example, in the exposure apparatus EX using the mask pattern M curved in a cylindrical shape, if the width of the conjugate plane 23a is made small, the shape of the mask pattern M and the shape of the conjugate plane 23a The amount of defocus in the mask pattern M can be reduced. In addition, the width of the optical integrator 22 can be made larger than the width of the illumination area IR, and it becomes easy to secure the strength of the optical integrator 22. [ Therefore, for example, it becomes easy to extend the optical integrator 22 in the Y-axis direction, and it becomes easy to extend the illumination region IR in the Y-axis direction.

As described in the first embodiment, the illuminating device IU of the present embodiment is configured such that the illuminance distribution of the illumination area IR is uniformized in each of the long and short length directions, It is possible to illuminate uniform brightness while keeping the desired length in a predetermined direction.

[Third embodiment]

Next, the third embodiment will be described. In the present embodiment, the same components as those in the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

Fig. 14 is a side view showing the exposure apparatus EX according to the present embodiment, and Fig. 15 is a top view showing the lighting apparatus IU. 14 includes a first optical system 45, a second optical system 46, and an imaging optical system 23. The illumination system IU shown in Fig. The first optical system 45 and the second optical system 46 respectively emit the illumination light L1 and the illumination light L1 from the first optical system 45 and the second optical system 46 is reflected by the imaging optical system 23, And enters into the illumination area IR via the illumination unit IR.

The first optical system 45 includes a light source portion 20a (first light guide portion), a magnifying optical system 21a, and a light integrator 22a (first optical integrator). The light source unit 20a and the magnifying optical system 21a may have the same structure as that of the first embodiment, for example. The illumination light L1 emitted from the light source portion 20a enters the incidence end 35a of the optical integrator 22a via the magnifying optical system 21a. The glass material of the optical element constituting each of the light source portion 20a, the magnifying optical system 21a, and the optical integrator 22a may be quartz, for example.

The optical integrator 22a of Fig. 14 is a frustum shaped (horn-shaped top cut) member having a substantially trapezoidal side surface viewed from the Y-axis direction. The optical integrator 22 has a first surface 47a substantially parallel to the YZ plane and a second surface 47b inclined to a non-perpendicular (for example, about 45 degrees) with respect to the first surface 47a A third surface 47c substantially parallel to the first surface 47a and a fourth surface 47d substantially perpendicular to the first surface 47a.

The optical integrator 22a is arranged so that the illumination light L1 from the light source section 20a is incident on a part of the first surface 47a and at least part of the incident area of the illumination light L1 from the light source section 20a Includes an incident end 35a. The incident end 35a includes at least a part of a portion overlapping with the second surface 47b when viewed from the normal direction of the first surface 47a. In the optical integrator 22a of Fig. 14, the long length direction of the incident end 35a is substantially parallel to the Y-axis direction, and the short length direction of the incident end 35a is substantially parallel to the Z-axis direction.

The illumination light L1 incident on the incident end 35a is reflected by the second surface 47b and bent in the advancing direction and is reflected by the inner surface corresponding to the first surface 47a and the third surface 47c, And guided to the fourth surface 47d. The fourth surface 47d includes an emission end 38a and the illumination light L1 that has passed through the interior of the light integrator 22a exits from the emission end 38a. In the optical integrator 22a of Fig. 14, the long length direction of the emitting end 38a is substantially parallel to the Y-axis direction, and the short length direction of the emitting end 38a is substantially parallel to the X-axis direction.

The second optical system 46 has the same structure as the first optical system 45 and is arranged symmetrically with respect to the YZ plane with respect to the first optical system 45 when viewed from the Y-axis direction. The second optical system 46 includes the light source portion 20b (second light guide portion), the magnifying optical system 21b and the optical integrator 22b (second optical integrator), but the first optical system 45 The common description will be simplified or omitted.

The optical integrator 22a and the optical integrator 22b are arranged adjacently in the short length direction (X axis direction) of the emitting end 38a (emitting end 38b), and the third surface 47c Respectively. The optical integrator 22a and the optical integrator 22b are bonded with an adhesive having a refractive index of, for example, 1.46 or less and the illumination light L1 is almost totally reflected from the inner surface corresponding to each third surface 47c .

The end portion 26a on the exit side of the optical fiber 25a in the light source portion 20a of the first optical system 45 is located in the vicinity of the entrance end 35a in the long longitudinal direction And arranged at a constant pitch Py. The exit end 26b of the optical fiber 25b in the light source portion 20b of the second optical system 46 is arranged at a substantially constant pitch Py in the long longitudinal direction (Y axis direction) of the incident end 35b .

The end portion 26a of the optical fiber 25a of the first optical system 45 is located at a position closer to the optical axis of the second optical system 46 when viewed from the normal direction (X axis direction) of the incident end 35a (incident end 35b) And the end portions 26b of the optical fiber 25b do not overlap with each other in the Y-axis direction. The end portion 26a of the optical fiber 25a of the first optical system 45 and the end portion 26b of the optical fiber 25b of the second optical system 46 are alternately arranged from the Y axis direction, The position of one of the end portions 26a and the adjacent end portion 26b in the Y axis direction is shifted by about half of the pitch Py of the end portion 26a (pitch Py of the end portion 26b). That is, the displacement? Y of the position in the Y-axis direction between one of the end portions 26a and the adjacent end portion 26b is substantially equal to half (Py / 2) of the pitch Py.

A light source image Im1a is formed in each of the ends 26a of the plurality of optical fibers 25a in the light source portion 20a and a light source image Im1a is formed in each of the ends 26b of the plurality of optical fibers 25b in the light source portion 20b , The light source image Im1b is formed. Therefore, the plurality of light source images Im1a by the light source portion 20a are incident on the plurality of light source images Im1b by the light source portion 20b and the plurality of light source images Im1b by the long lengthwise direction of the incident end 35a (incident end 35b) Y-axis direction) are not overlapped with each other.

The illumination light L1 from the light source unit 20a shown in Fig.14 is reflected by the inner surface of the light integrator 22a so that the light intensity distribution in the short- . The illuminating light L1 from the light source portion 20b is illuminated by multiple reflections on the inner surface of the optical integrator 22b so that the illuminance distribution in the short length direction of the emitting end 38b is equalized at the emitting end 38b do. The imaging optical system 23 is arranged so that the exit end 38a of the light integrator 22a and the exit end 38b of the light integrator 22b are aligned with respect to the short end direction of the exit end 38a (exit end 38b) And a conjugate plane 23a, which is a conjugate plane. Therefore, the illuminance distribution of the illumination light L1 in the conjugate plane 23a (illumination region IR) becomes uniform in the direction corresponding to the short-length direction of the emission end 38a (emission end 38b).

8, the light flux from each light source image Im1a formed by the light source portion 20a spreads in the Y axis direction and propagates inside the light integrator 22a, (IRa). The partial illumination area IRa is arranged in the Y-axis direction so that a part of the neighboring partial illumination area IRa overlaps with the Y-axis direction. As described above, a plurality of light fluxes originating from the plurality of light source images Im1a are shifted in the Y-axis direction in the illumination region IR, overlapping, and the illuminance distribution in the Y-axis direction of the illumination region IR becomes uniform. The illuminating light L1 from the second optical system 46 propagates in the same manner, and the illuminance distribution in the Y-axis direction of the illumination region IR becomes uniform.

Next, the spreading angle of the light beam incident on each point of the illumination area IR will be described. As described with reference to Fig. 9 (Fig. 8), the light beam incident on each point of the illumination area IR corresponds to a light beam superimposed on a real image or a virtual image on a light source arranged in the X- do. Therefore, the spread angle of the light beam incident on each point of the illumination area IR is determined by the distribution of the real image and the virtual image of the light source image Im1 when the light source 20 side is viewed from each point.

16 is a view for explaining an illumination method according to the present embodiment. 16A shows the positions of the points Q1 and Q2 of the illumination area IR and the position of the point Q2 in the Y axis direction of the light source image Im1 when viewed from the normal direction of the illumination area IR Fig. The point Q1 and the point Q2 are points arranged in the short length direction (X axis direction) of the emission end 38a of the light integrator 22a. Here, the position (coordinate) Is substantially equal to the center of the light source image Im1a.

The spreading angle of the illumination light L1 at the time of outputting from the optical fiber 25a of the light source portion 20a is set to 0.2 when the diameter 1 of the optical fiber 25a is about 0.3 mm, Respectively. For example, when the magnification M1x of the magnifying optical system 21 in the X-axis direction is five times and the magnification M1x of the magnifying optical system 21 in the X-axis direction is five, the magnifying optical system 21 The secondary light source image Im2 to be formed becomes a circular shape with a spot diameter 2 of about 1.5 mm. The illumination light L1 from the secondary light source image Im2 has an NA converted value of about 0.04 in the X axis direction (in the XZ plane) at the time of incidence to the optical integrator 22a, a NA of about 0.04 in the Y axis direction The converted value becomes about 0.04.

16B is a diagram showing a real image and a virtual image distribution of the light source image Im1a when the light source unit 20a is viewed from a point Q1 on the illumination area IR. And the distribution of the virtual image of the light source image Im1b when the light source unit 20b is viewed from the point Q2 on the optical axis IR.

The actual image of the light source image Im1 viewed from the illumination area IR and the distribution of the virtual image in the X axis direction are the distribution of the illumination light L1 on the inner surface 36 of the light integrator 22 The number of reflections and the like. The number of times of reflection of the illumination light L1 on the inner surface 36 is determined by the spread angle of the illumination light L1 in the X-axis direction at the time of incidence on the light integrator 22, the interval between the two inner surfaces 36 in the X- The dimension of the optical integrator 22 in the Z-axis direction, and the like.

Here, the diameter of the optical fiber 25 is φ1, the magnification of the XZ plane from the end 26 of the optical fiber 25 to the surface (coarse surface) on which the secondary light source image Im2 is formed in the magnifying optical system 21, The focal length f3 with respect to the XZ plane of the lens 30 of the magnifying optical system 21 and the magnification with respect to the XZ plane of the imaging optical system 23 are? 2, , The point Q1, and the point Q2) of the light beam in the X-axis direction is expressed by the following formula (1).

NAx = (? 1 占? 1 占 0.5 / f? 3 占 1 /? 2 占 ... (One)

The diameter 1 of the optical fiber 25 is 0.3 mm and the magnification 1 of the magnifying optical system 21 in the X axis direction is 5 times the magnification of the lens of the magnifying optical system 21 30 is 18.75 mm, and the magnification 2 in the X-axis direction of the imaging optical system 23 is 1, NAx becomes 0.04.

The actual image of the light source image Im1 and the distribution of the virtual image in the Y axis direction when viewed from the illumination area IR are the same as the light source image Im1 formed by the light source part 20 26, the spreading angle of the illumination light L1 at the time of incidence on the optical integrator 22, the dimension of the optical integrator 22 in the Z-axis direction, and the like. Py is the pitch in the Y axis direction of the light source image Im1 formed by the light source unit 20 and NAy0 is the NA converted value in the Y axis direction of the illumination light L1 at the time of outputting from the optical fiber 25, The magnification of the YZ plane from the end 26 of the zoom optical system 21 to the plane on which the secondary light source image Im2 is formed on the enlargement optical system 21 The focal distance with respect to the plane is f4 and the optical path length from the incident end 35 of the optical integrator 22 to the illumination area IR is Lz, the light from the first optical system 45 (light source part 20a) The NA converted value NAy1 in the Y-axis direction of the light beam incident on the point Q1 on the optical axis IR is expressed by the following equation (2).

NAy1 = (Pyx2 + NAy0 /? 3xf4) / Lz ... (2)

The pitch Py of the end portion 26 of the optical fiber 25 is 3 mm and the NA converted value NAy0 of the illumination light L1 at the time of emission from the end portion 26 of the optical fiber is 0.2, The magnification 3 in the Y axis direction of the optical system 21 is 5 times and the focal length f4 of the lens 30 of the magnifying optical system 21 is 18.75 mm. From the incident end 35 of the optical integrator 22 Assuming that the optical path length Lz to the illumination area IR is 187.5 mm, NAy1 becomes 0.036, which is different from NAx (0.04).

As described above, in the light beam incident on each point on the illumination area IR, the spread angle is different in the X-axis direction and the Y-axis direction because the factors defining the spread angle are different in the X-axis direction and the Y- . The anisotropy of the spread angle is suitably permitted depending on the use of the lighting apparatus IU and the like. In the present embodiment, the light source image Im1a and the light source image Im2a in the light source unit 20a and the light source unit 20b, The spreading angle of the light beam incident on each point on the illumination region IR is made isotropic in the X axis direction and the Y axis direction by displacing the Y axis direction position with respect to the light source image Im1b.

More specifically, as shown in Figs. 16B and 16C, the actual phase and the virtual phase of the light source when the light source unit 20b is viewed from the point Q2 are different from each other when the light source unit 20a is viewed from the point Q1 And the positions of the virtual image and the Y-axis direction are shifted from each other. Here, since the position of the light source image Im1a by the light source unit 20a and the light source image Im1b by the light source unit 20b are displaced about half of the pitch Py in the Y axis direction, The actual phase and the virtual phase position of the light source image Im1 are shifted in the Y axis direction by about half of the pitch Py of the light source image Im1 in the Y axis direction. Therefore, the NA-converted value NAy2 in the Y-axis direction of the light beam incident on the point Q2 on the illumination area IR from the second optical system 46 (light source part 20b) is expressed by the following equation (3) .

NAy2 = (Py x 2 + Py x 0.5) / Lz ... (3)

Assuming that the pitch Py is 3 mm and the optical path length Lz from the incident end 35 of the optical integrator 22 to the illumination area IR is 187.5 mm, NAy2 is 0.04 in the equation (3). Here, the point on the substrate P is illuminated with the light flux from the first optical system 45 at the position of the point Q1, and the NAy1 of this light flux is 0.036. This point on the substrate P is illuminated by the light flux from the second optical system 46 at the position of the point Q2 as the substrate P moves in the X axis direction and the NAy1 of this light flux is 0.04. Therefore, the maximum value of the spreading angle of the light beam incident on the point on the substrate P in the Y-axis direction becomes 0.04 as the NA conversion value, and becomes almost the same as the NA conversion value (NAx = 0.04) in the X-axis direction .

The position (coordinate) in the Y-axis direction is substantially the same as the center of the light source image Im1b by the light source portion 20b, and a point where the position in the X-axis direction is shifted from this point Q2 is Q1 In the case of " In this case, the point on the substrate P is the point where the NA-converted value in the Y-axis direction when illuminated with the light flux from the first optical system 45 at the point Q1 is 0.04 and the converted value from the second optical system 46 is The converted value of the NA in the Y-axis direction when illuminated at the speed of light is 0.036. Therefore, the maximum value of the spreading angle of the light beam incident on the point on the substrate P in the Y-axis direction becomes 0.04 at the NA conversion value, and becomes almost the same as the NA conversion value (NAx = 0.04) in the X-axis direction .

In this manner, the shift amount between the position of the plurality of light source images Im1a by the light source portion 20a in the long-length direction and the position of the plurality of light source images Im1b by the light source portion 20b in the long- Is set so that the spreading angle of the light beam incident on each point on the conjugate surface 23a is isotropic in the long and short longitudinal directions via the imaging optical system 23. [

Fig. 17 is a graph showing an example of the illuminance distribution obtained by simulation based on the configuration of the lighting apparatus IU of the present embodiment. Fig. Fig. 17A shows the illuminance distribution in the short-length direction, and the ordinate is the illuminance (number of rays per unit area) and the abscissa is the position in the short-length direction (X-axis direction). FIG. 17B shows the roughness distribution in the long-length direction, and the integrated value of roughness in the short-length direction at each position in the long-length direction on the vertical axis and the position in the longitudinal direction (Y-axis direction) in which the horizontal axis is long. As shown in Fig. 17, uniform illuminance can be obtained in each of the short-length direction and the long-length direction.

In the exposure apparatus EX, the exposure amount at each position in the Y-axis direction on the substrate P is an amount corresponding to the integrated value of the roughness in the X-axis direction (scanning direction). Therefore, the illuminance distribution in the X-axis direction may be lower than the illuminance distribution in the Y-axis direction. In order to equalize the illuminance distribution in the Y-axis direction, the deviation of the outputs of the plurality of solid-state light sources 24 may be reduced. For example, the variation of the output of the plurality of solid-state light sources 24 may be within ± 3% in order to allow the deviation of the illuminance distribution to fall within ± 3%.

In order to make the outputs of the plurality of solid-state light sources 24 uniform, it is also possible to adjust the power supplied to each solid-state light source 24. For example, the solid-state light source 24, which has a smaller output than the average output of the plurality of solid-state light sources 24, (Driving circuit) may be formed.

In order to make the outputs of the plurality of solid-state light sources 24 uniform, a filter that adjusts the light quantity of the light from each solid-state light source 24 may be used. For example, among the plurality of solid state light sources 24, for the solid state light source 24 having an output for a predetermined power greater than the average output, an optical filter (not shown) for absorbing a part of the light emitted from the solid state light source 24 May be provided. This filter can also be used to suppress variations in optical characteristics in the plurality of modules 27. [ Such a filter may have a fixed transmittance and may be variable.

Here, the parallelism of the principal ray in the illumination region IR will be described. With respect to the X-axis direction, even if the tilt of the principal ray with respect to the illumination region IR changes, the influence of the change of the tilt of the principal ray is small because the image is averaged by scanning exposure. It is presumed that the deviation of the slope of the principal ray due to the difference of the image height in the Y axis direction is within ± 4 milliradians in the above numerical example. In order to make the line width error to be within ± 4% (± 0.4 μm) when the NA converted value of the light flux incident on each point of the illumination region IR is 0.03 and the line width of the exposure pattern is 10 μm, The focus amount may be set within a range of about +/- 13 mu m. Under this condition, it is estimated that the displacement amount of the transfer pattern on the substrate P in the Y-axis direction due to the deviation of the tilt of the principal ray is about 0.05 mu m. With this amount of displacement, the error is about 0.5% with respect to the line width of 10 占 퐉, and the influence on the accuracy of exposure is small.

It should be noted that the illuminating device IR using the illumination device IU described in the present embodiment is not limited to the case where the illumination area IR is 5 mm in the X-axis direction (scanning direction) And the loss of the amount of light from when the illumination light L1 is emitted from the solid-state light source 24 to the time when the illumination light L1 is incident on the magnifying optical system 21 is 20% 21, it is assumed that the illuminance in the illumination area IR is 2112 mW / cm ² when the loss of the light amount until the light is emitted from the imaging optical system 23 is 20%.

In the present embodiment, since the position in the Y-axis direction on the light source formed by the light source portion 20a and the light source portion 20b does not overlap, the illumination device IU is arranged so that the spread of the light beam incident on each point of the illumination region IR The angle can be made isotropic. The pitch of the light source when viewed from the short length direction of the emitting end 38 of the optical integrator 22 can be narrowed and the uniformity of the distribution of the exposure amount in the Y axis direction . It is also possible to widen the pitch of the light sources formed by the light source portions while maintaining the pitch of the light sources when viewed from the short length direction of the emission end 38 of the light integrator 22, for example. This makes it possible to avoid, for example, the miniaturization of the structure of the light source portion.

The illumination device IU in Fig. 14 is arranged so that the optical paths in the first optical system 45 and the second optical system 46 are arranged in a direction intersecting (orthogonal to) the normal direction (Z-axis direction) The apparatus size can be made compact, and it becomes easy to enter, for example, the inside of the rotary drum DM. 14 can bend the optical path by using the second surface 47b of the optical integrator 22 so that the number of parts can be reduced. However, the illuminator IU shown in Fig. flap) mirror or the like to bend the optical path.

[Fourth Embodiment]

Next, the fourth embodiment will be described. In the present embodiment, the same components as those in the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

18 is a side view showing the exposure apparatus EX according to the present embodiment. In the exposure apparatus EX in Fig. 18, the illumination apparatus IU irradiates the illumination light L1 from the two systems of the first optical system 45 and the second optical system 46 as described in the third embodiment And irradiates the illumination region IR via the imaging optical system 23. [

The first optical system 45 includes a light source portion 20a, an expansion optical system 21a for expanding the illumination light L1 from the light source portion 20a, and a light integrator 49a (optical integrator 22). The magnification of the magnifying optical system 21a is set such that the magnification of the incident end 35a of the optical integrator 49a in the long longitudinal direction (Y-axis direction) is perpendicular to the long longitudinal direction Is larger than the magnification with respect to the short-length direction (X-axis direction). The illumination light L1 from the magnifying optical system 21a is incident on the incident end 35a of the optical integrator 49a and passes through the interior of the optical integrator 49a and is reflected from the emitting end 38a to the emitting end 38a are uniformed in the short-length direction.

The optical integrator 22a shown in Fig. 14 is configured to bend the optical path of the illumination light L1 from the magnifying optical system 21a once, but the optical integrator 249a of Fig. 18 differs from the magnifying optical system 21a The optical path of the illumination light L1 of the illumination optical system L1 is bent twice. The optical integrator 22a of Fig. 18 is a structure in which two optical integrators 22a of Fig. 14 are used to orthogonally cross the optical integrator 22a. As described above, the optical integrator 22 may be any one of the number of times of bending the optical path of the illumination light L1 once, twice, and three times or more. Similarly to the optical integrator 22 of Fig. 2, It is not necessary to bend the optical path of the illumination light L1.

The second optical system 46 has the same structure as the first optical system 45 and includes a light source portion 20b, a magnifying optical system 21b and a light integrator 49b (optical integrator 22). The illumination light L1 from the light source unit 20b is expanded by the magnifying optical system 21b and then incident on the incidence end 35b of the light integrator 49b and the emergence end 38b from the emission end 38b, The illuminance distribution in the short-side direction is made uniform.

The imaging optical system 23 converts the image of the surface including the emitting end 38a of the optical integrator 49a and the emitting end 38b of the optical integrator 49b to the emitting end 38a (X-axis direction) perpendicular to the long longitudinal direction (Y-axis direction) of the light-shielding layer (the end surface 38b) The magnification of the magnifying optical system 21a with respect to the X-axis direction and the magnification with respect to the Y-axis direction and the magnification with respect to the X-axis direction of the imaging optical system 23 are the same as those described in the second embodiment, And the spread angle of the emitted illumination light L1 is set to be isotropic.

19 is a view for explaining an illumination method. 19A shows the positions of the points Q1 and Q2 of the illumination region IR and the position of the point Q2 in the Y axis direction of the light source image Im1 when viewed from the normal direction of the illumination region IR Fig. The points Q1 and Q2 are points arranged in the short longitudinal direction (X-axis direction) of the emission end 38 of the light integrator 22. Here, the position (coordinate) in the Y- Is substantially equal to the center of the light source image Im1a. The deviation amount y between the position of the light source image Im1a by the light source portion 20a in the Y axis direction and the position of the light source image Im1b by the light source portion 20b in the Y axis direction is the light source image (Py / 2) of the pitch Py of the light source image Im1b (light source image Im1a).

19B is a diagram showing the actual image and virtual image distribution of the light source image Im1a when the light source unit 20a is viewed from the point Q1 on the illumination area IR, And the distribution of the virtual image of the light source image Im1b when the light source unit 20b is viewed from the point Q2 on the optical axis IR. 19B is different from the example shown in Fig. 9 in the optical path length from the incident end 35a to the output end 38a in the optical integrator 49a, 7 rows in the X-axis direction, and 7 rows in the Y-axis direction. 19C, the distribution of the light source image Im1b by the light source portion 20b is obtained by dividing the distribution of the light source image Im1a by the light source portion 20a into half of the pitch Py in the Y- .

The NA converted value NAx in the X axis direction of the light flux incident on each point (e.g., point Q1, point Q2) of the illumination area IR is expressed by the equation (1) described in the third embodiment. The diameter 1 of the optical fiber 25 is 0.3 mm and the magnification 1 in the X axis direction of the magnifying optical system 21 is 3 times larger than the magnification 1 of the magnifying optical system 21 30 is 18.75 mm, and the magnification 2 of the imaging optical system 23 in the X-axis direction is 0.6 times, NAx becomes 0.04.

In the first optical system 45, the pitch in the Y-axis direction of the light source image Im1 formed by the light source portion 20a is Py, the NA in the Y-axis direction of the illumination light L1 at the time of outputting from the optical fiber 25a, The magnification of the YZ plane from the end 26a of the optical fiber 25a to the plane on which the secondary light source image Im2 is formed from the magnifying optical system 21a to the surface of the secondary light source Im2 is β3, The focal length of the lens 30 of the optical integrator 49 in the YZ plane is f4 and the optical path length from the incident end 35a of the optical integrator 49a to the illumination area IR is Lz, The NA converted value NAy1 in the Y axis direction of the light flux incident on the point Q1 on the illumination area IR from the light source part 20a is expressed by the following equation (4).

NAy1 = (Pyx3 + NAy0 /? 3xf4) / Lz ... (4)

The pitch Py of the end portion 26 of the optical fiber 25 is 3 mm and the NA converted value NAy0 of the illumination light L1 at the time of emission from the end portion 26 of the optical fiber is 0.2, The magnification 3 in the Y axis direction of the optical system 21 is 5 times and the focal length f4 of the lens 30 of the magnifying optical system 21 is 18.75 mm. From the incident end 35 of the optical integrator 22 Assuming that the optical path length Lz to the illumination area IR is 262.5 mm, NAy1 becomes about 0.037.

The NA converted value NAy2 in the Y axis direction of the light flux incident on the point Q2 on the illumination region IR from the second optical system 46 (light source portion 20b) is the light source image Im1b viewed from the illumination region IR, Is expressed by the following equation (5) because the distribution of the light source image Im1a is shifted in the Y axis direction from the distribution of the light source image Im1a.

NAy2 = (Py x 3 + P x 0.5) / Lz = 0.04 ... (5)

In Equation (3), the number of the light source images arranged in the Y-axis direction from the illumination area IR is five, so that the coefficient multiplied by the pitch Py is 5/2 (that is, 2.5). In Equation (5), since the number of the light source images arranged in the Y-axis direction is 7, the coefficient multiplied by the pitch Py is 7/2 (that is, 3.5).

Assuming that the pitch Py is 3 mm and the optical path length Lz from the incident end 35a of the optical integrator 49a to the illumination area IR is 262.5 mm, NAy2 is 0.04 in equation (5). Here, the point on the substrate P is illuminated with the light flux from the first optical system 45 at the position of the point Q1, and NAy1 of this light flux is about 0.037. This point on the substrate P is illuminated by the light flux from the second optical system 46 at the position of the point Q2 as the substrate P moves in the X axis direction and the NAy1 of this light flux is 0.04. Therefore, the maximum value of the spreading angle of the light beam incident on the point on the substrate P in the Y-axis direction becomes 0.04 as the NA conversion value, and becomes almost the same as the NA conversion value (NAx = 0.04) in the X-axis direction .

As described above, the displacement amount between the positions of the plurality of light source images Im1a by the light source portion 20a in the long-length direction and the positions of the plurality of light source images Im1b by the light source portion 20b in the long- And the spread angle of the light beam incident on each point on the conjugate plane 23a through the imaging optical system 23 is set to be isotropic in the long direction and the short direction.

Fig. 20 is a graph showing an example of the illuminance distribution obtained by simulation based on the configuration of the lighting apparatus IU of the present embodiment. 20 (A) shows the illuminance distribution in the short-length direction, and the ordinate is the illuminance (number of rays per unit area) and the abscissa is the position in the short length direction (X-axis direction). FIG. 20 (B) shows the illuminance distribution in the long-length direction, and shows the integrated value of the illuminance in the short-length direction at each position in the longitudinal direction with the long axis in the longitudinal direction and the position in the longitudinal direction (Y-axis direction) with the long axis. As shown in Fig. 20, a uniform illuminance can be obtained in each of the short-length direction and the long-length direction.

Here, the parallelism of the principal ray in the illumination area IR will be described. With respect to the X-axis direction, even if the tilt of the principal ray with respect to the illumination region IR changes, the influence of the change of the tilt of the principal ray is small because the image is averaged by scanning exposure. It is presumed that the deviation of the slope of the principal ray due to the difference of the image height in the Y axis direction is within ± 3 milliradians in the above numerical example. When the spread angle of the light beam incident on each point of the illumination area IR is 0.03 in terms of NA and the line width of the exposure pattern is 10 m, the line width error is set to ± 4% (± 4 m) In order to enter, the defocus amount may be set within a range of about ± 13 μm. Under these conditions, it is estimated that the positional shift amount in the Y-axis direction of the transfer pattern on the substrate P due to the deviation of the tilt of the principal ray is about 0.04 m. With this amount of displacement, the error is about 0.4% with respect to the line width of 10 占 퐉, and the influence on the accuracy of exposure is small.

It should be noted that the illuminating device IR using the illumination device IU described in the present embodiment is not limited to the case where the illumination area IR is 5 mm in the X-axis direction (scanning direction) And the illumination light L1 is incident on the magnifying optical system 21 so that the illumination light L1 is incident on the magnifying optical system 21 by 20% When the loss of the light amount from the optical system 23 to the time of outputting is 20%, the illuminance in the illumination region IR is estimated to be 3520 mW / cm ² .

In the present embodiment, since the position in the Y-axis direction on the light source formed by the light source portion 20a and the light source portion 20b does not overlap, the illumination device IU is arranged so that the spread of the light beam incident on each point of the illumination region IR The angle can be made isotropic.

Incidentally, the longer the illumination area IR is made longer in the Y-axis direction, the more the optical integrator becomes slender and elongated in the Y-axis direction, possibly resulting in insufficient strength. In this embodiment, since the optical integrator 49a and the optical integrator 49b are bonded to each other, it is easy to ensure the strength, and the optical system 23 is arranged on the top of the output end 38a (output end 38b) Image) is shortened in the short-length direction, it is easy to make the illumination area IR slender in the Y-axis direction.

The technical scope of the present invention is not limited to the above embodiment. For example, one or more of the elements described in the above embodiments may be omitted. The elements described in the above embodiments can be appropriately combined.

Although the cylindrical mask pattern M is used in each of the embodiments described above, it is also possible to use a so-called endless belt-shaped mask pattern M, M) may be used, and the shape of the mask holding member can be appropriately changed in accordance with the shape of the mask pattern M.

In any of the above-described embodiments, the substrate support member for supporting the substrate P may be a rotary drum DP as described in the first embodiment, and may be a rotary drum DP as described in the second embodiment, ST).

In each of the above-described embodiments, the light source unit 20 may be provided with a collimator for collimating the illumination light L1 from the solid-state light source 24. [ The collimator is disposed, for example, between the solid-state light source 24 and the optical fiber 25, and its front focal position is set in the solid-state light source 24. [

The light source unit 20 focuses the illumination light L1 from the solid light source 24 on the light incident side end of the optical fiber 25 between the solid light source 24 and the optical fiber 25 ) May be provided. This input lens is disposed, for example, between the collimator and the optical fiber 25. The front focal position of the input lens is set, for example, to the rear focal position of the collimator, and the rear focal position of the input lens is set, for example, at the end of the optical fiber 25 on the light incidence side. Such an input lens can be used to adjust the spreading angle NA of the illumination light L1 in accordance with the ratio between the focal distance and the focal distance of the collimator.

Incidentally, in a laser diode, when observed in a far field, the spread angle of light (orientation characteristic) may have anisotropy. In this case, one or both of the collimator and the input lens can be used for correcting the spread angle of the illumination light L1 at the time of incidence on the optical fiber 25 isotropically by making the focal length anisotropic.

The illuminating device IU may not be provided with the magnifying optical system 21. In this case, the light source unit 20 may be composed of a plurality of LEDs arranged at the incident end 35 of the light integrator 22, for example. The light source unit 20 may include a lamp light source in place of the solid light source 24 and may divide the light from one lamp light source into a plurality of optical fibers 25 to guide the light integrator 22 It is okay to configure it.

The optical integrator 22 may not be a prismatic (flat plate) rod made of dense quartz. For example, an optical member (a kaleidoscope) in which four mirrors are combined in a frame shape, ). In this optical member, a dielectric may be disposed on at least a part of the optical path surrounded by the mirror, and the dielectric may not be disposed in this optical path. That is, a part of the inside of the optical integrator 22 may be a gap.

The exposure apparatus EX may be a multi-lens type or a projection type exposure apparatus of a microlens array type. In this case, at least one of the plurality of illumination optical systems can be applied to the illumination apparatus IU have. Although the illumination apparatus IU is applied to the exposure apparatus EX in the above-described embodiment, the illumination apparatus IU can also be applied to, for example, an annealing apparatus.

For example, the annealing apparatus using ultraviolet rays is used to continuously send a large glass substrate for manufacturing a liquid crystal display device or a long flexible substrate for manufacturing a solar panel, while slit-shaped in a width direction orthogonal to the conveying direction , And curing of the ultraviolet curable resin layer and crystallization (orientation) of the semiconductor layer. The illuminating device according to each of the embodiments described above can be applied to, for example, such an annealing device, and can improve uniformity of illumination of slit-shaped illumination light irradiated onto a substrate, NA, which is isotropic or non-isotropic.

Further, the dimension (width) in the short-length direction of the slit-shaped irradiation region formed on the substrate may be widened. In this case, the imaging optical system 23 shown in Figs. 2 to 5, Fig. 11, Fig. 14 and Fig. 18 is set so that the imaging magnification of the light emitting end of the light integrator 22 in the short- do. In this case, in order to make the angular characteristic (NA) of the light irradiated on the substrate isotropic, a plurality of secondary light source images (as shown in Fig. 13) formed in the hibernation 41 (position of the diaphragm member 31) Im2 may have an elliptical shape having a minor axis parallel to the Y axis direction and a major axis parallel to the X axis direction.

One or both of the incident end 35 and the outgoing end 38 of the optical integrator 22 are not rectangular. For example, one or both of the incident end 35 and the emitting end 38 of the optical integrator 22 have a pair of first sides parallel to each other, and a line connecting the ends of one pair of first sides May not be perpendicular to the first side. This line may be a straight line, it may contain a broken line, and it may contain a curve. In other words, one or both of the incident end 35 and the outgoing end 38 may be a shape (rectangular shape) in which at least one square of a rectangular shape is rounded, and at least one of trapezoidal or trapezoidal angles It is okay to have one rounded shape (trapezoidal shape). In the case where one or both of the incident end 35 and the outgoing end 38 are in a shape other than a rectangle, the first pair may be set substantially parallel to the long direction of the illumination region IR. In this case, the long length direction of the incident end 35 and the long length direction of the emission end 38 are set in a direction parallel to the first side.

At least a part of the illumination light L1 from the plurality of modules 27 may be incident on the inner surface 37 of the light integrator 22 and may not be incident on the inner surface 37. [ For example, the plurality of modules 27 may be arranged in a manner such that the illumination light L1 from the magnifying optical system 21 (a plurality of modules 27) does not enter the inner surface 37, May be arranged so as to avoid an end portion in the longitudinal direction of the first end portion (35). The illumination light L1 reflected by the inner surface 37 may be used for illumination and may not be used for illumination.

11 and 14, in the configuration in which the image of the emitting end 38 of the light integrator 22 is contracted in the short longitudinal direction (X-axis direction), the magnifying optical system 21 is disposed on the light source image The magnification for magnifying the image Im1 may be anisotropic or isotropic. For example, as shown in Fig. 2, the magnifying optical system 21 enlarges the light source image Im1 isotropically, and the diaphragm member 31 having the elliptical opening 31a as shown in Fig. 13 is irradiated with the illumination light L1 ) May be anisotropic. Thus, the spread angle of the illumination light L1 when entering the illumination area IR may be adjusted isotropically or anisotropically.

[Device Manufacturing Method]

Next, a device manufacturing method will be described. 21 is a flowchart showing a device manufacturing method according to the present embodiment.

In the device manufacturing method shown in Fig. 21, first, functions and performance of devices such as a liquid crystal display panel and an organic EL display panel are designed (step 201). Next, based on the design of the device, a mask pattern M is produced (step 202). In addition, a substrate such as a transparent film or a sheet as a base of the device or a very thin metal foil is prepared by purchase, manufacture, or the like (step 203).

Next, the prepared substrate is put into a production line of a roll type or a patch type, and a TFT back plane layer such as an electrode or wiring, an insulating film, or a semiconductor film constituting a device, or an organic EL Thereby forming a light emitting layer (step 204). Step 204 typically includes a step of forming a resist pattern on a film on the substrate and a step of etching the film using the resist pattern as a mask. The resist pattern is formed by uniformly forming a resist film on the surface of the substrate, a step of exposing the resist film of the substrate with the exposure light patterned via the mask pattern (M) according to each of the above embodiments, A process of developing a resist film in which a latent image of a mask pattern is formed is performed.

(A photosensitive silane coupling material or the like) is formed on the surface of a substrate by a coating method. According to each of the above-described embodiments, a mask pattern M, a step of forming a hydrophilized portion and a water repellent portion in the functional photosensitive layer according to the pattern shape, a step of forming a functionalized A step of coating a plating base liquid or the like on a portion having high hydrophilicity of the photosensitive layer, and a step of precipitating and forming a metallic pattern by electroless plating.

Next, depending on the device to be manufactured, for example, the substrate may be diced or cut, or another substrate manufactured by another process, for example, a sheet-like color filter having a sealing function or a thin glass substrate may be bonded And the device is assembled (step 205). Next, post-processing such as inspection is performed on the device (step 206). As described above, a device can be manufactured.

EX - Exposure device IU - Lighting device
L1 - Illumination L2 - Exposure light
M - mask pattern P - substrate
U3 - Processing device 10 - Mobile device
11 - Control device 20 - Light source part
21 - Magnifying optical system 22 - Optical integrator
23 - imaging optical system 23a - conjugate plane
24 - solid state light source 25 - optical fiber
32 to 34 - Lens array 35 - Incoming end
36, 37 - Inside 38 - Outlet

Claims (19)

A light integrator having a first surface, an inner surface, and a second surface of a rectangle, the light incident on the first surface being emitted from the second surface through multiple reflections on the inner surface, Wow,
A light guide unit (light guide unit) for guiding light from a light source to the light integrator, wherein a plurality of light beams (light beams) lined up at a predetermined interval along a long longitudinal direction of the first surface are supplied to the light integrator The light guide portion,
Wherein the second surface is formed with a conjugate plane which is conjugate with the second surface with respect to the short-length direction of the second surface, and a long length of the second surface And an imaging optical system having a small refractive power with respect to a direction. The method according to claim 1,
A plurality of regions corresponding to the plurality of light fluxes in the conjugate plane are arranged in the longitudinal direction of the second surface,
Wherein the predetermined interval is set such that a distribution of illuminance (illuminance) in a long-length direction of the second surface in the conjugate plane is uniformized by partially overlapping the plurality of regions. The method according to claim 1 or 2,
Wherein the light guiding portion includes a plurality of optical fibers for guiding light from the solid light source as the light source to the optical integrator,
Wherein a plurality of outgoing ends of said plurality of optical fibers are lined up in a longitudinal direction of said first surface. The method according to any one of claims 1 to 3,
And a magnifying optical system disposed between the light guiding unit and the optical integrator. The method of claim 4,
Wherein the magnifying optical system includes a lens array having a plurality of lens elements arranged in a longitudinal direction of the first surface. The method according to claim 4 or 5,
Wherein an enlargement magnification of the magnifying optical system is set such that light emitted from the imaging optical system spreads isotropically (isotropically). The method of claim 6,
The magnification of the magnifying optical system in the short-side direction of the first surface is set to be smaller than the magnification in the longitudinal direction of the first surface,
Wherein the imaging optical system forms an image of the second surface on the conjugate plane, the second image being reduced in a short-length direction of the second surface. The method according to any one of claims 1 to 7,
Wherein the optical integrator has a first optical integrator and a second optical integrator,
Wherein the light guiding portion has a first light guiding portion and a second light guiding portion for respectively supplying the plurality of light beams to the first light integrator and the second light integrator,
The plurality of light beams from the first light guiding portion do not overlap with each other in the longitudinal direction of the first surface,
The plurality of light beams from the second light guiding portion do not overlap with each other in the longitudinal direction of the first surface,
Wherein the conjugate plane formed by the imaging optical system is a conjugate plane with respect to the short-length direction of the second surface, the conjugate plane being contiguous with the plane including the exit surface of the first optical integrator and the exit surface of the second optical integrator, . The method of claim 8,
The amount of deviation between the position of the plurality of light fluxes from the first light guiding portion and the position of the plurality of light fluxes from the second light guiding portion in the longitudinal direction of the first surface And a spreading angle of light incident on each point on the conjugate plane is set to be isotropic in a long-length direction of the second surface and a short-length direction of the second surface. The method according to claim 8 or 9,
Wherein the first optical integrator and the second optical integrator are arranged adjacent to each other in the short-length direction of the second surface, and are bonded to each other. The method of claim 10,
Wherein the imaging optical system is configured to reduce an image of a surface including an exit surface of the first optical integrator and an exit surface of the second optical integrator in a short longitudinal direction of the second surface, Lt; / RTI > The method of claim 11,
A first magnifying optical system disposed between the first light guiding unit and the first optical integrator,
And a second magnifying optical system disposed between the second light guiding unit and the second optical integrator,
Wherein the magnification of the first magnifying optical system and the magnification of the second magnifying optical system are set such that light emitted from the imaging optical system spreads isotropically. A light integrator having a rectangular first surface, an inner surface, and a second rectangular surface, wherein light incident on the first surface is emitted from the second surface by multiple reflections on the inner surface;
A light guide unit for guiding light from a light source to the optical integrator, the light guide unit comprising: a plurality of light beams lined up at predetermined intervals along a long longitudinal direction of the first surface and having a predetermined angular characteristic, The light guide portion,
Wherein the second surface is formed with a conjugate surface which is a conjugate surface with the second surface with respect to the short-length direction of the second surface, and the second surface has a smaller refractive power than the refractive power with respect to the short- And the imaging optical system has a predetermined magnification other than a magnification in a short-length direction of the second surface. 14. The method of claim 13,
An optical system for making the angular characteristics of the plurality of light beams directed from the plurality of light guiding portions toward the optical integrator with respect to the long longitudinal direction of the first surface to be different from the angular characteristics with respect to the short longitudinal direction of the first surface, Further comprising: 15. The method of claim 14,
Wherein the optical system is set such that a ratio of an angular characteristic of the first surface with respect to a long-length direction and an angular characteristic with respect to a short-length direction of the first surface corresponds to the predetermined magnification of the imaging optical system. A processing apparatus for transferring a pattern formed on a mask pattern to a substrate having a responsive layer (sense layer)
The illumination device according to any one of claims 1 to 15, which illuminates the mask pattern,
And a moving device for relatively moving the mask pattern and the substrate in a direction perpendicular to a longitudinal direction of the second surface. 18. The method of claim 16,
Wherein the moving device comprises a mask holding member which holds the mask pattern and is rotatable about a center line parallel to a longitudinal direction of the second surface. The processing apparatus according to claim 16 or 17, wherein the pattern is successively transferred to the substrate while the mask pattern and the substrate are moved relative to each other,
And performing subsequent processing using a change in the responsive layer of the substrate onto which the pattern is transferred. A rectangular parallelepiped shape having a rectangular input end, an inner surface, and a rectangular output end, for guiding light from a light source incident from the input end to the output end by multiple reflection on the inner surface, A light integrator,
A light source side optical system for forming light incident on an incident end of the optical integrator into a plurality of light converging beams arranged at predetermined intervals along a long longitudinal direction of the incident end,
Wherein said optical integrator is formed with a conjugate plane which is in the conjugate with said emitting end with respect to a short length direction of said optical integrator and wherein a refractive power of said emitting end in a long direction is smaller than a refractive power of said emitting end in a short- .

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