KR20140119376A - 히터 블럭을 갖는 증착 소스 장치 - Google Patents
히터 블럭을 갖는 증착 소스 장치 Download PDFInfo
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- KR20140119376A KR20140119376A KR1020130034777A KR20130034777A KR20140119376A KR 20140119376 A KR20140119376 A KR 20140119376A KR 1020130034777 A KR1020130034777 A KR 1020130034777A KR 20130034777 A KR20130034777 A KR 20130034777A KR 20140119376 A KR20140119376 A KR 20140119376A
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- Prior art keywords
- heater
- nozzle
- unit
- block
- ceramic
- Prior art date
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/10—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor
- H05B3/12—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material
- H05B3/14—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material the material being non-metallic
- H05B3/141—Conductive ceramics, e.g. metal oxides, metal carbides, barium titanate, ferrites, zirconia, vitrous compounds
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/20—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater
- H05B3/22—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible
- H05B3/26—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible heating conductor mounted on insulating base
- H05B3/265—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible heating conductor mounted on insulating base the insulating base being an inorganic material, e.g. ceramic
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
도 2 - 본 발명에 따른 히터 블럭을 갖는 증착 소스 장치의 주요부에 대한 상세 모식도.
100, 200 : 히터부 300, 400 : 고정부
500 : 냉각쉴드
Claims (11)
- 증착 물질이 내부에 수용되는 본체와, 상기 본체 상측으로 본체의 길이 방향에 대해 수직한 방향으로 길게 형성된 노즐결합부와, 상기 노즐결합부 상측으로 돌출되게 배열 형성된 분사노즐과, 상기 본체, 노즐결합부 및 분사노즐을 가열시키는 히터부를 포함하여 이루어진 선형 증착 시스템용 증착 소스 장치에 있어서,
상기 노즐결합부를 가열시키는 히터부는, 상기 노즐결합부의 양측면에 각각 블럭 형상의 세라믹 히터로 형성되고,
상기 분사노즐을 가열시키는 히터부는, 상기 배열 형성된 분사노즐의 양측면에 형성된 블럭 형상의 세라믹 히터로 형성되는 것을 특징으로 하는 히터 블럭을 갖는 증착 소스 장치. - 제 1항에 있어서, 상기 노즐결합부의 히터부는,
상기 노즐결합부의 길이 방향으로 길게 형성되는 것을 특징으로 하는 히터 블럭을 갖는 증착 소스 장치. - 제 2항에 있어서, 상기 노즐결합부의 히터부는,
사각 지그재그 형태로 형성된 것을 특징으로 하는 히터 블럭을 갖는 증착 소스 장치. - 제 3항에 있어서, 상기 노즐결합부의 히터부에는,
상기 노즐결합부 양단부측 및 중간 위치에 형성되고, 상기 히터부를 고정시키는 고정부가 형성된 것을 특징으로 하는 히터 블럭을 갖는 증착 소스 장치. - 제 4항에 있어서, 상기 고정부가 위치하는 노즐결합부의 히터부에는,
세라믹 절연체가 코팅되는 것을 특징으로 하는 히터 블럭을 갖는 증착 소스 장치. - 제 4항에 있어서, 상기 노즐결합부의 히터부 바깥측으로 냉각쉴드가 형성되어, 상기 고정부에 의해 고정되는 것을 특징으로 하는 히터 블럭을 갖는 증착 소스 장치.
- 제 1항에 있어서, 상기 분사노즐의 히터부는,
다수개의 분사노즐 전체에 걸쳐 길이 방향으로 길게 형성되는 것을 특징으로 하는 히터 블럭을 갖는 증착 소스 장치. - 제 7항에 있어서, 상기 분사노즐의 히터부는,
사각 평판형으로 형성된 것을 특징으로 하는 히터 블럭을 갖는 증착 소스 장치. - 제 7항에 있어서, 상기 분사노즐의 히터부에는,
일정 간격으로 상기 히터부를 고정시키는 고정부가 형성된 것을 특징으로 하는 히터 블럭을 갖는 증착 소스 장치. - 제 9항에 있어서, 상기 고정부가 위치하는 분사노즐의 히터부에는,
세라믹 절연체가 코팅되는 것을 특징으로 하는 히터 블럭을 갖는 증착 소스 장치. - 제 1항 내지 제 10항 중의 어느 한 항에 있어서, 상기 세라믹 히터는,
질화물 세라믹 또는 탄화물 세라믹과 금속 입자를 함께 소결하여 형성된 것을 특징으로 하는 히터 블럭을 갖는 증착 소스 장치.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020130034777A KR20140119376A (ko) | 2013-03-29 | 2013-03-29 | 히터 블럭을 갖는 증착 소스 장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020130034777A KR20140119376A (ko) | 2013-03-29 | 2013-03-29 | 히터 블럭을 갖는 증착 소스 장치 |
Publications (1)
Publication Number | Publication Date |
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KR20140119376A true KR20140119376A (ko) | 2014-10-10 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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KR1020130034777A Ceased KR20140119376A (ko) | 2013-03-29 | 2013-03-29 | 히터 블럭을 갖는 증착 소스 장치 |
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KR (1) | KR20140119376A (ko) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20180116593A (ko) * | 2017-04-17 | 2018-10-25 | 주식회사 선익시스템 | 증착 장비의 증발원 노즐의 히팅 장치 |
WO2021107224A1 (ko) * | 2019-11-29 | 2021-06-03 | 엘지전자 주식회사 | 증착 장치 |
-
2013
- 2013-03-29 KR KR1020130034777A patent/KR20140119376A/ko not_active Ceased
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20180116593A (ko) * | 2017-04-17 | 2018-10-25 | 주식회사 선익시스템 | 증착 장비의 증발원 노즐의 히팅 장치 |
WO2021107224A1 (ko) * | 2019-11-29 | 2021-06-03 | 엘지전자 주식회사 | 증착 장치 |
KR20220039773A (ko) * | 2019-11-29 | 2022-03-29 | 엘지전자 주식회사 | 증착 장치 |
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