KR20100131312A - 폴리플루오로계실세스퀴옥산 및 그의 제조방법 - Google Patents
폴리플루오로계실세스퀴옥산 및 그의 제조방법 Download PDFInfo
- Publication number
- KR20100131312A KR20100131312A KR1020090050134A KR20090050134A KR20100131312A KR 20100131312 A KR20100131312 A KR 20100131312A KR 1020090050134 A KR1020090050134 A KR 1020090050134A KR 20090050134 A KR20090050134 A KR 20090050134A KR 20100131312 A KR20100131312 A KR 20100131312A
- Authority
- KR
- South Korea
- Prior art keywords
- group
- polyfluoro
- silsesquioxane
- formula
- polyfluorosilsesquioxane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 238000002360 preparation method Methods 0.000 title description 5
- 239000000178 monomer Substances 0.000 claims abstract description 33
- 238000000034 method Methods 0.000 claims abstract description 23
- 239000003054 catalyst Substances 0.000 claims abstract description 16
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims abstract description 15
- 229910000077 silane Inorganic materials 0.000 claims abstract description 15
- 125000001153 fluoro group Chemical group F* 0.000 claims abstract description 14
- -1 fluorocarbon hydrocarbon Chemical class 0.000 claims abstract description 12
- 238000004519 manufacturing process Methods 0.000 claims abstract description 11
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 claims description 27
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 24
- 229920001577 copolymer Polymers 0.000 claims description 19
- 125000003709 fluoroalkyl group Chemical group 0.000 claims description 13
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims description 12
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 12
- 125000003700 epoxy group Chemical group 0.000 claims description 11
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 claims description 11
- 239000000126 substance Substances 0.000 claims description 11
- 125000005641 methacryl group Chemical group 0.000 claims description 10
- 238000006068 polycondensation reaction Methods 0.000 claims description 10
- 125000003118 aryl group Chemical group 0.000 claims description 7
- 238000012643 polycondensation polymerization Methods 0.000 claims description 6
- 229920001519 homopolymer Polymers 0.000 claims description 5
- 229910000027 potassium carbonate Inorganic materials 0.000 claims description 5
- 125000001207 fluorophenyl group Chemical group 0.000 claims description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 4
- 125000000538 pentafluorophenyl group Chemical group FC1=C(F)C(F)=C(*)C(F)=C1F 0.000 claims description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 3
- 125000003545 alkoxy group Chemical group 0.000 claims description 3
- 125000005843 halogen group Chemical group 0.000 claims description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 3
- 125000004432 carbon atom Chemical group C* 0.000 claims description 2
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 claims description 2
- 241000239366 Euphausiacea Species 0.000 claims 1
- 238000006116 polymerization reaction Methods 0.000 abstract description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 13
- 238000006243 chemical reaction Methods 0.000 abstract description 10
- 239000000463 material Substances 0.000 abstract description 10
- 238000000016 photochemical curing Methods 0.000 abstract description 8
- 238000009826 distribution Methods 0.000 abstract description 7
- 230000003287 optical effect Effects 0.000 abstract description 7
- 238000006460 hydrolysis reaction Methods 0.000 abstract description 6
- 239000011248 coating agent Substances 0.000 abstract description 4
- 238000000576 coating method Methods 0.000 abstract description 4
- 239000011229 interlayer Substances 0.000 abstract description 4
- 239000013307 optical fiber Substances 0.000 abstract description 3
- 239000011253 protective coating Substances 0.000 abstract description 3
- 239000004065 semiconductor Substances 0.000 abstract description 3
- 239000004215 Carbon black (E152) Substances 0.000 abstract description 2
- 229930195733 hydrocarbon Natural products 0.000 abstract description 2
- 230000007062 hydrolysis Effects 0.000 abstract description 2
- 230000002940 repellent Effects 0.000 abstract description 2
- 239000005871 repellent Substances 0.000 abstract description 2
- 238000009833 condensation Methods 0.000 abstract 1
- 230000005494 condensation Effects 0.000 abstract 1
- 229920000642 polymer Polymers 0.000 description 18
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 15
- 238000005481 NMR spectroscopy Methods 0.000 description 14
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 12
- QUJHWGZPSFBJAP-UHFFFAOYSA-N trichloro-(2,3,4,5,6-pentafluorophenyl)silane Chemical compound FC1=C(F)C(F)=C([Si](Cl)(Cl)Cl)C(F)=C1F QUJHWGZPSFBJAP-UHFFFAOYSA-N 0.000 description 12
- 238000004458 analytical method Methods 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- 239000007795 chemical reaction product Substances 0.000 description 8
- 239000000203 mixture Substances 0.000 description 8
- 239000012153 distilled water Substances 0.000 description 7
- 229920000734 polysilsesquioxane polymer Polymers 0.000 description 7
- 239000002244 precipitate Substances 0.000 description 7
- 238000001228 spectrum Methods 0.000 description 7
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- 239000000243 solution Substances 0.000 description 5
- 239000000538 analytical sample Substances 0.000 description 4
- 238000005227 gel permeation chromatography Methods 0.000 description 4
- 238000001879 gelation Methods 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 239000012299 nitrogen atmosphere Substances 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 4
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- 238000003760 magnetic stirring Methods 0.000 description 3
- 125000002524 organometallic group Chemical group 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- DOGMJCPBZJUYGB-UHFFFAOYSA-N 3-trichlorosilylpropyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCC[Si](Cl)(Cl)Cl DOGMJCPBZJUYGB-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 2
- 238000001157 Fourier transform infrared spectrum Methods 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 2
- 229910002808 Si–O–Si Inorganic materials 0.000 description 2
- 239000007810 chemical reaction solvent Substances 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 238000003776 cleavage reaction Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000007334 copolymerization reaction Methods 0.000 description 2
- 238000000806 fluorine-19 nuclear magnetic resonance spectrum Methods 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 230000007017 scission Effects 0.000 description 2
- 238000003980 solgel method Methods 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000005979 thermal decomposition reaction Methods 0.000 description 2
- ORVMIVQULIKXCP-UHFFFAOYSA-N trichloro(phenyl)silane Chemical compound Cl[Si](Cl)(Cl)C1=CC=CC=C1 ORVMIVQULIKXCP-UHFFFAOYSA-N 0.000 description 2
- SHDWQYAAHOSWDZ-UHFFFAOYSA-N trichloro(trifluoromethyl)silane Chemical compound FC(F)(F)[Si](Cl)(Cl)Cl SHDWQYAAHOSWDZ-UHFFFAOYSA-N 0.000 description 2
- 125000006717 (C3-C10) cycloalkenyl group Chemical group 0.000 description 1
- 125000006376 (C3-C10) cycloalkyl group Chemical group 0.000 description 1
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- 125000006374 C2-C10 alkenyl group Chemical group 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- HEDRZPFGACZZDS-MICDWDOJSA-N Trichloro(2H)methane Chemical compound [2H]C(Cl)(Cl)Cl HEDRZPFGACZZDS-MICDWDOJSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000001460 carbon-13 nuclear magnetic resonance spectrum Methods 0.000 description 1
- 239000007809 chemical reaction catalyst Substances 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical group FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 239000003779 heat-resistant material Substances 0.000 description 1
- 125000001072 heteroaryl group Chemical group 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 238000002329 infrared spectrum Methods 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- ARYZCSRUUPFYMY-UHFFFAOYSA-N methoxysilane Chemical compound CO[SiH3] ARYZCSRUUPFYMY-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000001226 reprecipitation Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000002115 silicon-29 solid-state nuclear magnetic resonance spectrum Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000012916 structural analysis Methods 0.000 description 1
- 230000007847 structural defect Effects 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- FHYUCVWDMABHHH-UHFFFAOYSA-N toluene;1,2-xylene Chemical group CC1=CC=CC=C1.CC1=CC=CC=C1C FHYUCVWDMABHHH-UHFFFAOYSA-N 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 1
- 239000005052 trichlorosilane Substances 0.000 description 1
- QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 description 1
- 238000002371 ultraviolet--visible spectrum Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
- C08G77/24—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen halogen-containing groups
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/12—Organo silicon halides
- C07F7/14—Preparation thereof from optionally substituted halogenated silanes and hydrocarbons hydrosilylation reactions
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/06—Preparatory processes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/06—Preparatory processes
- C08G77/08—Preparatory processes characterised by the catalysts used
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G2261/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G2261/10—Definition of the polymer structure
- C08G2261/13—Morphological aspects
- C08G2261/133—Rod-like building block
- C08G2261/1336—Ladder-type, e.g. ladder-poly-p-phenylenes
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Silicon Polymers (AREA)
Abstract
Description
실시 예 | 트리데카플루오르1,1,2,2테트라하이드로옥틸-트리 메톡시 실란(mol) |
페닐트리메톡시 실란(mol) | 공중합체의 분자량 | 분자량 분포도 |
5 | 0.16 | 0.24 | 6,500 | 1.7 |
6 | 0.12 | 0.28 | 7,000 | 1.8 |
7 | 0.08 | 0.32 | 6,800 | 2.2 |
8 | 0.04 | 0.36 | 7,900 | 2.4 |
Claims (9)
- 제 1항에 있어서,상기 R1 및 R2는 각각 독립적으로 플루오로 원자가 1 내지 5개 치환된 플루오로페닐기, 플루오로 원자가 1 내지 49개 치환된 탄소수 1 내지 24의 플루오로알킬기, 알릴기, 비닐기, 에폭시기, 메타크릴기 및 아크릴기로 이루어진 그룹으로부터 선택되며, R1 및 R2 중 적어도 하나 이상은 플루오로페닐기인 것을 특징을 하는 폴리플루오로계실세스퀴옥산.
- 제 2항에 있어서,상기 R1 및 R2는 각각 독립적으로 펜타플루오로페닐기, 트리플루오로메틸기, 트리데카플루오르-1,1,2,2테트라하이드로옥틸, 알릴기, 비닐기, 에폭시기, 메타크릴기 및 아크릴기로 이루어진 그룹으로부터 선택되며, R1 및 R2 중 적어도 하나 이상은 펜타플루오로페닐기 또는 트리데카플루오르-1,1,2,2테트라하이드로옥틸인 것을 특징으로 하는 폴리플루오로계실세스퀴옥산.
- 제 1항 내지 제 3항 중 어느 한 항에 있어서,상기 알릴기, 비닐기, 에폭시기, 메타크릴기 및 아크릴기는 수소 원자의 일 부 또는 전부가 플루오로 원자로 각각 치환된 것임을 특징으로 하는 폴리플루오로계실세스퀴옥산.
- 제 1항 내지 제 3항 중 어느 한 항에 있어서,수평균분자량(Mn)이 1,000 내지 100,000인 것을 특징으로 하는 폴리플루오로계실세스퀴옥산.
- 제 1항 내지 제 3항 중 어느 한 항에 있어서,규칙적 사다리 구조를 갖는 단일 중합체 또는 공중합체인 것임을 특징으로 하는 폴리플루오로계실세스퀴옥산.
- 하기 화학식 2로 표시되는 실란 단량체의 가수분해물을 5~85 ℃ 온도에서 축중합하는 것을 포함하는, 하기 화학식 1로 표시되는 폴리플루오로계실세스퀴옥산의 제조방법.<화학식 2><화학식 1>상기 화학식 1 또는 2에서,R은 R1 또는 R2 이고,R1 및 R2는 각각 독립적으로 플루오로방향족기, 플루오로알킬기, 알릴기, 비 닐기, 에폭시기, 메타크릴기 및 아크릴기로 이루어진 그룹으로부터 선택되며, R1 및 R2 중 적어도 하나 이상은 플루오로방향족기 또는 플루오로알킬기이고,X1, X2 및 X3은 각각 독립적으로 할로겐원자, 알콕시기 또는 하이드록시기이며,n은 5내지 10,000의 정수이다.
- 제 7항에 있어서,축중합 반응은 수산화리튬, 수산화나트륨 또는 탄산칼륨의 염기성 촉매하에서 수행되는 것을 특징으로 하는 제조방법.
- 제 7항에 있어서,수평균분자량(Mn)이 1,000 내지 100,000이고, 규칙적 사다리 구조를 갖는 폴리플루오로계실세스퀴옥산을 제조하는 것을 특징으로 하는 제조방법.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020090050134A KR20100131312A (ko) | 2009-06-05 | 2009-06-05 | 폴리플루오로계실세스퀴옥산 및 그의 제조방법 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020090050134A KR20100131312A (ko) | 2009-06-05 | 2009-06-05 | 폴리플루오로계실세스퀴옥산 및 그의 제조방법 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR20100131312A true KR20100131312A (ko) | 2010-12-15 |
Family
ID=43507392
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020090050134A Ceased KR20100131312A (ko) | 2009-06-05 | 2009-06-05 | 폴리플루오로계실세스퀴옥산 및 그의 제조방법 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR20100131312A (ko) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104610549A (zh) * | 2015-01-29 | 2015-05-13 | 苏州大学 | 一种改性含氟硅油及其制备方法 |
WO2017116171A1 (ko) * | 2015-12-31 | 2017-07-06 | 엘티씨 (주) | 유연기판용 폴리실세스퀴녹산 수지 조성물 |
WO2017142153A1 (ko) * | 2016-02-19 | 2017-08-24 | 엘티씨 (주) | 폴리실세스퀴옥산 수지 조성물 및 이를 포함하는 차광용 블랙 레지스트 조성물 |
WO2017160023A1 (ko) * | 2016-03-17 | 2017-09-21 | 주식회사 엘지화학 | 다면체 올리고머 실세스퀴옥산 및 그 제조 방법 |
US9983376B2 (en) | 2015-04-23 | 2018-05-29 | Corning Optical Communications LLC | High-data-rate electrical interconnect cables |
CN115746363A (zh) * | 2022-11-01 | 2023-03-07 | 神通科技集团股份有限公司 | 一种便于安装的耐老化汽车b柱外饰板及其制备方法 |
CN115943187A (zh) * | 2020-06-23 | 2023-04-07 | Nck株式会社 | 薄膜封装用组合物 |
WO2023100992A1 (ja) * | 2021-12-01 | 2023-06-08 | 東亞合成株式会社 | シルセスキオキサン誘導体、硬化性組成物、硬化物及び基材 |
-
2009
- 2009-06-05 KR KR1020090050134A patent/KR20100131312A/ko not_active Ceased
Cited By (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104610549A (zh) * | 2015-01-29 | 2015-05-13 | 苏州大学 | 一种改性含氟硅油及其制备方法 |
CN104610549B (zh) * | 2015-01-29 | 2017-03-29 | 苏州大学 | 一种改性含氟硅油及其制备方法 |
US9983376B2 (en) | 2015-04-23 | 2018-05-29 | Corning Optical Communications LLC | High-data-rate electrical interconnect cables |
WO2017116171A1 (ko) * | 2015-12-31 | 2017-07-06 | 엘티씨 (주) | 유연기판용 폴리실세스퀴녹산 수지 조성물 |
US10934455B2 (en) | 2015-12-31 | 2021-03-02 | Ltc Co., Ltd. | Polysilsesquioxane resin composition for flexible substrate |
JP2019504159A (ja) * | 2015-12-31 | 2019-02-14 | エルティーシー カンパニー リミテッド | フレキシブル基板用ポリシルセスキノキサン樹脂組成物{poly silsesquinoxane resin composition for flexible substrate} |
CN108473682A (zh) * | 2015-12-31 | 2018-08-31 | Ltc有限公司 | 柔性基板用聚倍半硅氧烷树脂组合物 |
CN108699245A (zh) * | 2016-02-19 | 2018-10-23 | Ltc有限公司 | 聚倍半硅氧烷树脂组合物及包含其的遮光用黑色抗蚀剂组合物 |
WO2017142153A1 (ko) * | 2016-02-19 | 2017-08-24 | 엘티씨 (주) | 폴리실세스퀴옥산 수지 조성물 및 이를 포함하는 차광용 블랙 레지스트 조성물 |
CN108473515A (zh) * | 2016-03-17 | 2018-08-31 | 株式会社Lg化学 | 多面体低聚倍半硅氧烷及其制备方法 |
WO2017160023A1 (ko) * | 2016-03-17 | 2017-09-21 | 주식회사 엘지화학 | 다면체 올리고머 실세스퀴옥산 및 그 제조 방법 |
US10683313B2 (en) | 2016-03-17 | 2020-06-16 | Lg Chem, Ltd. | Polyhedral oligomeric silsesquioxane and preparation method thereof |
CN108473515B (zh) * | 2016-03-17 | 2021-01-12 | 株式会社Lg化学 | 多面体低聚倍半硅氧烷及其制备方法 |
CN115943187A (zh) * | 2020-06-23 | 2023-04-07 | Nck株式会社 | 薄膜封装用组合物 |
WO2023100992A1 (ja) * | 2021-12-01 | 2023-06-08 | 東亞合成株式会社 | シルセスキオキサン誘導体、硬化性組成物、硬化物及び基材 |
CN115746363A (zh) * | 2022-11-01 | 2023-03-07 | 神通科技集团股份有限公司 | 一种便于安装的耐老化汽车b柱外饰板及其制备方法 |
CN115746363B (zh) * | 2022-11-01 | 2023-08-18 | 神通科技集团股份有限公司 | 一种便于安装的耐老化汽车b柱外饰板及其制备方法 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR20100131312A (ko) | 폴리플루오로계실세스퀴옥산 및 그의 제조방법 | |
KR101249798B1 (ko) | 선택적으로 구조가 제어된 폴리실세스퀴옥산의 제조방법 및 이로부터 제조된 폴리실세스퀴옥산 | |
US20030055195A1 (en) | Polyorganosilsesquioxane and process for preparing the same | |
JP5442557B2 (ja) | 光活性基を側鎖として有するはしご構造のポリシルセスキオキサン及びその製造方法 | |
JP2011190413A (ja) | シロキサンポリマー架橋硬化物 | |
He et al. | Liquid polycarbosilanes: synthesis and evaluation as precursors for SiC ceramic | |
Chen et al. | Thermally stable transparent sol–gel based active siloxane–oligomer materials with tunable high refractive index and dual reactive groups | |
KR20130125224A (ko) | 사다리형 사이올계 실세스퀴옥산 고분자 및 이의 제조방법 | |
Li et al. | Synthesis and characterization of a novel arylacetylene oligomer containing POSS units in main chains | |
WO2010062695A2 (en) | Properties tailoring in silsesquioxanes | |
Wang et al. | Dendrimeric organosiloxane with thermopolymerizable–OCF= CF2 groups as the arms: synthesis and transformation to the polymer with both ultra-low k and low water uptake | |
Imoto et al. | Polymers and cyclic compounds based on a side‐opening type cage silsesquioxane | |
Wu et al. | Partially Bio-Based and fluorinated polysiloxane with high transparency and low dielectric constant | |
Samthong et al. | Synthesis and characterization of organic/inorganic epoxy nanocomposites from poly (aminopropyl/phenyl) silsesquioxanes | |
Li et al. | Synthesis of hyperbranched polymethylvinylborosiloxanes and modification of addition‐curable silicone with improved thermal stability | |
Cao et al. | Synthesis and characterization of ladder-like copolymethyl-epoxysilsesquioxane | |
Yuan et al. | Synthesis of polysiloxanes containing trifluoroethylene aryl ether groups: The effect of promoters | |
KR20230023791A (ko) | 폴리실록산을 제조하기 위한 전구체, 폴리실록산, 폴리실록산 수지, 폴리실록산을 제조하기 위한 방법, 폴리실록산 수지를 제조하기 위한 방법 및 광전자 소자 | |
WO2017047652A1 (ja) | 対称性を有するオリゴシロキサンの重縮合による周期ポリシロキサンの製造方法 | |
Kim et al. | Synthesis and properties of poly (silylenephenylenevinylene) s | |
KR100371070B1 (ko) | 폴리지방족방향족실세스퀴옥산 및 그의 제조 방법 | |
Wei et al. | POSS‐based poly (aryl ether sulfone) s random terpolymer linked POSS to the main chain: effect of chemical structure and POSS content on properties | |
KR100481911B1 (ko) | 폴리오르가노실세스퀴옥산 및 그의 제조방법 | |
Tang et al. | Synthesis of multifunctional polysilanes via Si–Cl containing intermediate | |
JPH08245880A (ja) | 耐熱性フィルム及びその製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 20090605 |
|
PA0201 | Request for examination | ||
PG1501 | Laying open of application | ||
E902 | Notification of reason for refusal | ||
PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20110311 Patent event code: PE09021S01D |
|
AMND | Amendment | ||
E601 | Decision to refuse application | ||
PE0601 | Decision on rejection of patent |
Patent event date: 20111121 Comment text: Decision to Refuse Application Patent event code: PE06012S01D Patent event date: 20110311 Comment text: Notification of reason for refusal Patent event code: PE06011S01I |
|
J201 | Request for trial against refusal decision | ||
PJ0201 | Trial against decision of rejection |
Patent event date: 20111220 Comment text: Request for Trial against Decision on Refusal Patent event code: PJ02012R01D Patent event date: 20111121 Comment text: Decision to Refuse Application Patent event code: PJ02011S01I Appeal kind category: Appeal against decision to decline refusal Decision date: 20130130 Appeal identifier: 2011101009959 Request date: 20111220 |
|
AMND | Amendment | ||
PB0901 | Examination by re-examination before a trial |
Comment text: Amendment to Specification, etc. Patent event date: 20120119 Patent event code: PB09011R02I Comment text: Request for Trial against Decision on Refusal Patent event date: 20111220 Patent event code: PB09011R01I Comment text: Amendment to Specification, etc. Patent event date: 20110511 Patent event code: PB09011R02I |
|
B601 | Maintenance of original decision after re-examination before a trial | ||
PB0601 | Maintenance of original decision after re-examination before a trial |
Comment text: Report of Result of Re-examination before a Trial Patent event code: PB06011S01D Patent event date: 20120220 |
|
J301 | Trial decision |
Free format text: TRIAL DECISION FOR APPEAL AGAINST DECISION TO DECLINE REFUSAL REQUESTED 20111220 Effective date: 20130130 |
|
PJ1301 | Trial decision |
Patent event code: PJ13011S01D Patent event date: 20130130 Comment text: Trial Decision on Objection to Decision on Refusal Appeal kind category: Appeal against decision to decline refusal Request date: 20111220 Decision date: 20130130 Appeal identifier: 2011101009959 |