KR20100046830A - Spin head - Google Patents

Abstract

The present invention is a rotating plate formed on the outer surface of the spiral screw thread; And a plurality of chuck pins having a groove formed on a lower surface thereof to engage the thread and protruding to an upper portion of the rotating plate to support a side of the substrate.

According to the present invention, when the rotating plate rotates, the chuck pins simultaneously move to contact the side of the substrate. Thus, the substrate is stable in position, and it is possible to prevent concentration of force on some chuck pins.

Description

Spin head

The present invention relates to an apparatus for processing a substrate, and more particularly, to a spin head rotatable while supporting a substrate in a semiconductor process or the like.

The semiconductor process includes a process of etching or cleaning thin films, foreign substances, particles, and the like on a wafer. This process is accomplished by placing the wafer on the spin head with the pattern side facing up or down, rotating the spin head at high speed, and feeding the processing liquid onto the wafer. On the spin head are installed chuck pins that support the sides of the wafer to prevent the wafer from deviating laterally of the spin head. The chuck pins are moved between a standby position that provides space for the substrate to be placed when the substrate is loaded or unloaded on the spin head and a support position that contacts the side of the substrate when the process is performed while the substrate placed on the spin head is rotated. . Thus, the space provided between the chuck pins in the standby position is wider than the space provided between the chuck pins in the standby position.

When moved from the standby position to the support position, the chuck pins are moved by respective drive mechanisms. Thus, if there are machining tolerances or the like in the manufacture of the chuck pins, some chuck pins are not in contact with the side of the substrate even though all the chuck pins have been moved to the support position. Not only is the support of the substrate unstable during rotation, but also the force is concentrated on some of the chuck pins in contact with the substrate, which is likely to break the chuck pin.

In addition, when the spin head is rotated at a high speed, the chuck pins in the support position are moved in the direction toward the standby position by centrifugal force, causing an eccentric phenomenon, which causes unstable support of the substrate.

Also, the spin head generally has an upper plate and a lower plate fixedly coupled by screws, and the chuck pins are installed on the lower plate so as to protrude upward through the upper plate. Since chemical liquids are used as the treatment liquid in the process, the top plate is generally made of polyvinyl chloride material which is resistant to corrosion. However, when high temperature chemicals are used, polyvinyl chloride is easily thermally deformed. When the top plate is inflated by heat deformation, the bottom plate screwed with the top plate is also expanded, thereby changing the set position of the chuck pins coupled to the bottom plate.

It is an object of the present invention to provide a spin head having a structure capable of stably supporting a substrate.

In addition, the present invention is to provide a spin head having a structure in which all the chuck pins can maintain contact with the substrate at the same time.

The present invention also provides a spin head having a structure in which the chuck pins are not eccentrically and stably contacted with the side of the substrate even at high speed.

The problem to be solved by the present invention is not limited thereto, and other problems not mentioned will be clearly understood by those skilled in the art from the following description.

Spin head according to an embodiment of the present invention is a rotating plate formed on the outer surface of the spiral thread of the spiral; And a plurality of chuck pins formed at a lower surface thereof to engage the thread and protruding to an upper portion of the rotating plate so as to support a side of the substrate.

Here, the groove of the chuck pin may be formed in an arc shape so as to correspond to the screw thread.

In addition, a plurality of grooves of the chuck pins may be formed so that a plurality of grooves of the chuck pins are engaged with the threads.

In addition, when the rotating plate is rotated, the plurality of chuck pins may further include a top plate formed with a slit in a position corresponding to each of the chuck pins to linearly move in the radial direction.

In addition, the center of the rotary plate further includes an opening formed with a tooth toward the center of the rotary plate, to rotate the rotary plate, the pinion is provided to engage the teeth, and the motor for rotating the pinion have.

In addition, a tooth is formed at an end of the lower surface of the rotating plate, and may further include a pinion provided in the lower portion of the rotating plate so as to be engaged with the tooth for rotating the rotating plate, and a motor for rotating the pinion.

Furthermore, it may further include a support pin fixed to the top plate and provided to protrude upward from the top plate to support the bottom surface of the substrate.

In addition, the spin head according to an embodiment of the present invention is a rotating plate for rotating motion; And a plurality of chucks simultaneously supporting a side of the substrate and simultaneously linearly moving between a support position for supporting the side of the substrate by a rotational movement of the rotating plate and a standby position further radially farther from the center of the substrate than the support position. It includes a pin.

Here, when the rotating plate rotates, the plurality of chuck pins may further include a top plate formed with a slit at a position corresponding to each chuck pin so that the linear movement in the radial direction.

In addition, it may further include a support pin fixed to the top plate and provided to protrude upward from the top plate to support the bottom surface of the substrate.

According to the invention, when supporting the side of the substrate with chuck pins, all the chuck pins are in contact with the side of the substrate at the same time. Thus, the substrate is stable in position and it is possible to prevent the concentration of force on some chuck pins.

Further, according to the present invention, even when the substrate is rotated at high speed, the chuck pins can be held in a supporting position in contact with the side of the substrate without being eccentric by centrifugal force.

Hereinafter, exemplary embodiments of the present invention will be described in more detail with reference to FIGS. 1 to 9. The embodiments of the present invention can be modified in various forms, and the scope of the present invention should not be construed as being limited to the following embodiments. This embodiment is provided to more completely explain the present invention to those skilled in the art. Therefore, the shape of the elements in the drawings are exaggerated to emphasize a more clear description.

In the following embodiment, an apparatus for cleaning the substrate W using a chemical liquid, a rinse liquid, and a dry gas will be described as an example. However, the technical idea of the present invention is not limited thereto, and the present invention may be applied to all kinds of apparatuses that perform a process while rotating the substrate W, such as an etching process.

1 is a plan view schematically showing a substrate processing apparatus 1 according to a preferred embodiment of the present invention. Referring to FIG. 1, the substrate processing apparatus 1 has a fluid supply unit 10, a container 20, a lifting unit 30, and a spin head 40. The fluid supply unit 10 supplies the processing liquid or the processing gas for processing the substrate to the substrate W. FIG. The spin head 40 supports the substrate W and rotates the substrate W during the process. The container 20 prevents the chemical liquid used in the process and the fume generated during the process from splashing out or spilling out. The elevating unit 30 elevates the spin head 40 or the vessel 20 up and down, and changes the relative height between the vessel 20 and the spin head 40 in the vessel 20.

The fluid supply unit 10 has an upper nozzle member 100a and a lower nozzle member 100b. The upper nozzle member 100a supplies the processing liquid or the processing gas to the upper surface of the substrate W placed on the spin head 40, and the lower nozzle member 100b lower surface of the substrate W placed on the spin head 40. Treatment liquid or treatment gas is supplied. The substrate W is placed on the spin head 40 so as to be spaced from the upper surface of the spin head 40 by a predetermined distance, and the lower nozzle member 100b is treated as a space between the spin head 40 and the substrate W. Supply liquid or process gas.

The upper nozzle member 100a has a chemical liquid supply nozzle 120a, a rinse liquid supply nozzle 140a, and a dry gas supply nozzle 160a. The chemical liquid supply nozzle 120a supplies a plurality of types of chemical liquids to the substrate W. FIG. The chemical liquid supply nozzle 120a has a plurality of injectors 121, a support bar 122, and a bar mover 125. The injectors 121 are disposed on one side of the vessel 20. The injector 121 is connected to a chemical storage unit (not shown) to receive the chemical liquid from the chemical storage unit. Each injector 121 is connected to a chemical storage unit for storing different types of chemical liquid. The injectors 121 are arranged side by side in one direction. Each injector 121 has a protrusion 121a protruding upward, and a groove (not shown) may be formed at the side surface of the protrusion 121a. The chemical liquid may be sulfuric acid, nitric acid, ammonia, hydrofluoric acid, or the like, or a mixed liquid of these and deionized water. Discharge ports are formed at the end of each injector 121.

The support bar 122 engages with any one of the plurality of injectors 121 and moves it to the top of the substrate W placed on the spin head 40. The support bar 122 has an elongated rod shape, and the support bar 122 is disposed such that its longitudinal direction is perpendicular to the direction in which the injectors 121 are arranged. The lower surface of the support bar 122 is provided with a holder (not shown) for engagement with the injector 121, the holder is provided with arms (not shown) that can be inserted into the groove formed in the projection (121a) of the injector 121 Have Arms may be provided in a structure that can be rotated or moved in the direction toward the groove of the protrusion 121a from the outside of the protrusion 121a.

The bar mover 125 linearly moves the support bar 122 between the upper position of the substrate W placed on the spin head 40 and the upper position of the injectors 121. The bar mover 125 has a bracket 123, a guide rail 124, and a driver (not shown). The guide rail 124 extends in a straight line from the outside of the injectors 121 to the outside of the vessel 20 through the injector 121 and the vessel 20. The bracket 123 is coupled to the guide rail 124 so as to be movable along the guide rail 124, and the support bar 122 is fixedly coupled to the bracket 123. The driver provides a driving force for linearly moving the bracket 123. The linear movement of the bracket 123 may be made by an assembly having a motor and a screw. Optionally, the linear movement of the bracket 123 can be accomplished by an assembly with a belt, a pulley and a motor. Optionally, the linear movement of the bracket 123 may be made by a linear motor.

The rinse liquid supply nozzle 140a is disposed at the other side of the vessel 20, and the dry gas supply nozzle 160a is disposed at the other side of the vessel 20. The rinse liquid supply nozzle 140a has an injector 141, a support bar 142, and a driver 144. The injector 141 is fixedly coupled to one end of the support bar 142. The other end of the support bar 142 is fixedly coupled to a rotating shaft (not shown) rotated by the driver 144. The injector 141 receives a rinse liquid from a rinse liquid storage unit (not shown). The dry gas supply nozzle 160a has a structure generally similar to the rinse liquid supply nozzle 140a. The dry gas supply nozzle 160a supplies isopropyl alcohol and nitrogen gas. The nitrogen gas may be heated nitrogen gas.

Lower nozzle member 100b has a spray head (180 in FIG. 4). The spray head 180 has a head (182 of FIG. 5) and an insert (184 of FIG. 5). The head 182 has a convex shape upward and protrudes upward from the spin head 40. The head portion 182 is formed with a plurality of discharge holes 182. The discharge ports inject any one of the plurality of chemical liquids, a rinse liquid, a dry gas such as isopropyl alcohol vapor or nitrogen gas. The insertion portion 184 is smaller than the lower end of the head 182 and has a constant diameter in the longitudinal direction, and extends downward from the head 182. The insertion part 184 is inserted into the through hole formed in the center of the spin head 40.

The chemical liquid, the rinse liquid, and the dry gas supplied from the upper nozzle member 100a and the lower nozzle member 100b are spread from the upper or lower center of the substrate W to the edge region by the rotation of the spin head 40. The substrate W is cleaned.

2 is a cross-sectional view of the container, Figure 3 is a perspective view of the container cut in the longitudinal direction. Referring to FIGS. 2 and 3, the container 20 has a space 32 in which an upper portion is opened and a substrate W is processed, and a spin head 40 is disposed in the space 32. The rotating shaft 42 for supporting and rotating the spin head 40 is fixedly coupled to the lower surface of the spin head 40. The axis of rotation 42 projects out of the vessel 20 through an opening formed in the bottom surface of the vessel 20. The rotating shaft 42 is fixedly coupled with a driver 44 such as a motor that provides a rotational force thereto.

3 is a cut perspective view showing the internal structure of the container 20. 2 and 3, the container 20 has a structure capable of separating and recovering the chemical liquids used in the process. This makes it possible to reuse the chemicals. The vessel 20 has a plurality of recovery bins 220, 240, 260. Each recovery container 220, 240, 260 recovers different types of treatment liquids from among treatment liquids used in the process. In this embodiment, the vessel 20 has three recovery bins. Each recovery container is referred to as an internal recovery container 220, an intermediate recovery container 240, and an external recovery container 260.

The inner recovery container 220 is provided in an annular ring shape surrounding the spin head 40, and the intermediate recovery container 240 is provided in an annular ring shape surrounding the internal recovery container 220, and the external recovery container 260 is provided. ) Is provided in an annular ring shape surrounding the intermediate recovery container 240. Each recovery bin 220, 240, 260 has an inlet 227, 247, 267 in the vessel 20 that communicates with the space 42 in the vessel. Each inlet 227, 247, 267 is provided in a ring shape around the spin head 40. Chemical liquids injected into the substrate W and used in the process are introduced into the recovery containers 220, 240, and 260 through the inlets 227, 247, and 267 by centrifugal force due to the rotation of the substrate W. FIG. The inlet port 267 of the outer container 260 is provided in the vertical upper portion of the inlet 247 of the intermediate container 240, the inlet 247 of the intermediate container 240 is the inlet of the internal container 220. 227 is provided at the vertical top. That is, the inlet ports 227, 247, and 267 of the inner recovery container 220, the intermediate recovery container 240, and the external recovery container 260 are provided to have different heights from each other.

The inner recovery container 220 has an outer wall 222, a bottom wall 224, an inner wall 226, and a guide wall 228. The outer wall 222, the bottom wall 224, the inner wall 226, and the guide wall 228 each have a ring shape. The outer wall 222 has an inclined wall 222a inclined downward in a direction away from the spin head 40 and a vertical wall 222b extending vertically downward from its lower end. The bottom wall 224 extends horizontally from the lower end of the vertical wall 222b toward the spin head 40. The end of the bottom wall 222b extends to the same position as the top of the inclined wall 222a. The inner wall 226 extends vertically upward from the inner end of the bottom wall 224. The inner wall 226 extends to a position such that an upper end thereof is spaced apart from the upper end of the inclined wall 222a by a predetermined distance. The space spaced in the vertical direction between the inner wall 226 and the inclined wall 222a functions as the inlet 227 of the inner recovery container 220 described above.

The inner wall 226 is formed with a plurality of openings 223 in a ring arrangement. Each of the openings 223 is provided in a slit shape. The opening 223 serves as an exhaust port through which gas introduced into the inner recovery container 220 is discharged to the outside through the space below in the spin head 40. The discharge pipe 225 is coupled to the bottom wall 224. The treatment liquid introduced through the inner recovery container 220 is discharged to the system for regeneration of the external chemical liquid through the discharge pipe 225.

The guide wall 228 has an inclined wall 228a inclined downward in a direction away from the spin head 40 from the top of the inner wall 226 and a vertical wall 228b extending vertically downward from the bottom thereof. . The lower end of the vertical wall 228b is located at a distance from the bottom wall 224. The guide wall 228 guides the treatment liquid introduced through the inlet 227 to smoothly flow into the space 229 surrounded by the outer wall 222, the bottom wall 224, and the inner wall 226.

The intermediate recovery container 240 has an outer wall 242, a bottom wall 244, an inner wall 246, and a protruding wall 248. The outer wall 242, the bottom wall 244, and the inner wall 246 of the intermediate waste container 240 are generally similar to the outer wall 222, bottom wall 224, and inner wall 226 of the inner waste container 220. Although having a shape, the intermediate recovery container 240 has a larger size than the internal recovery container 220 to surround the internal recovery container 220. The upper end of the inclined wall 242a of the outer wall 242 of the intermediate recovery container 240 and the upper end of the inclined wall 222a of the outer wall 222 of the inner recovery container 220 are positioned to be spaced apart by a predetermined distance in the vertical direction. The spaced space functions as the inlet 247 of the intermediate recovery container 240. The protruding wall 248 extends vertically downward from the end of the bottom wall 244. The upper end of the inner wall 246 of the intermediate recovery container 240 is in contact with the end of the bottom wall 224 of the internal recovery container 220. The inner wall 246 of the intermediate recovery container 240 is provided with slit-shaped exhaust ports 243 for discharging gas in a ring arrangement. The discharge pipe 245 is coupled to the bottom wall 244, and the treatment liquid introduced through the intermediate recovery container 240 is discharged to the system for regeneration of the external chemical liquid through the discharge pipe 245.

The outer recovery container 260 has an outer wall 262 and a bottom wall 264. The outer wall 262 of the outer recovery container 260 has a shape similar to the outer wall 242 of the intermediate recovery container 240, but the intermediate recovery container 240 so that the outer recovery container 260 surrounds the intermediate recovery container 240. It has a large size compared to). The upper end of the inclined wall 262a of the outer wall 262 of the outer recovery container 260 and the upper end of the inclined wall 242b of the outer wall 242 of the intermediate recovery container 240 are positioned to be spaced apart by a predetermined distance in the vertical direction. The spaced space functions as an inlet 267 of the external recovery container 260. The bottom wall 264 has a generally disc shape and has an opening in which a rotation axis 42 is inserted in the center thereof. The discharge pipe 265 is coupled to the bottom wall 264, and the treatment liquid introduced through the external recovery container 260 is discharged through the discharge pipe 265 to the system for regenerating the external chemical liquid. The outer recovery container 260 functions as an outer wall of the entire container 20. An exhaust pipe 263 is coupled to the bottom wall 264 of the external recovery container 260, and the gas introduced into the external recovery container 260 is exhausted to the outside through the exhaust pipe 263. In addition, the gas flowing out through the exhaust port 223 provided on the inner wall 226 of the inner recovery container 220 and the exhaust port 243 provided on the inner wall 246 of the intermediate recovery container 240 is supplied to the outer recovery container 260. It is exhausted to the outside through the connected exhaust pipe 263. The exhaust pipe 263 is installed to protrude a predetermined length upward from the bottom wall 264.

The lifting unit 30 linearly moves the container 20 in the vertical direction. As the vessel 20 moves up and down, the relative height of the vessel 20 relative to the spin head 40 changes. The lifting unit 30 has a bracket 32, a moving shaft 34, and a driver 36. The bracket 32 is fixedly installed on the outer wall of the container 20, and the bracket 32 is fixedly coupled to the moving shaft 34 which is moved in the vertical direction by the driver 36. The spin head 40 is lowered so that the spin head 40 protrudes above the vessel 20 when the substrate W is placed on the spin head 40 or lifted from the spin head 40. In addition, when the process is in progress, the height of the container 20 is adjusted to allow the processing liquid to flow into the predetermined recovery containers 220, 240, and 260 according to the type of processing liquid supplied to the substrate W. Contrary to the above, the lifting unit 30 may move the spin head 40 in the vertical direction.

Next, the structure of the spin head 40 will be described with reference to FIGS. 4 to 6. 4 and 5 are plan views of the spin head, and FIG. 6 is a cross-sectional view of the spin head 40 taken along the line I-I of FIG. The spin head 40 has a body 300, support pins 400, and chuck pins 500.

The support pin 400 supports the rear edge of the substrate W so that the substrate W is spaced apart from the upper surface of the body 300 by a predetermined distance. The support pins 400 all have the same shape and size. The support pin 400 has an upper portion 420 that gradually increases in diameter downward, and a lower portion 440 extending downward therefrom and having the same diameter. A screw thread is formed on the outer circumferential surface of the lower portion 440 to screw the screw groove 324 formed on the upper plate 320. Between the lower portion 440 and the thread is provided with a locking portion 480 of a larger diameter than the lower portion 440. The lower surface of the locking portion 480 is in close contact with the upper surface of the body 300. The locking portion 480 limits the length of the support pins 400 to be inserted into the body 300 so that the heights of the support pins 400 are all the same.

The chuck pin 500 is installed on the body 300 to protrude upward from the upper surface of the body 300 in the edge region of the body 300. About six chuck pins 500 may be provided. The chuck pin 500 supports the side of the substrate W so that the substrate W does not deviate laterally from the home position when the spin head 40 is rotated. The chuck pins 500 all have the same shape and size. The chuck pin 500 has a support 520, a central portion 540, a fastening portion 560, and a locking portion 580. The support portion 520 has a shape in which the diameter gradually decreases downwardly from the flat top surface and then gradually increases in diameter downwardly. Therefore, the support 520 has a recess 522 concave inward when viewed from the front. The recessed portion 522 is in contact with the side of the substrate W placed on the support pin 400. The central portion 540 extends downward from the lower end of the support 520 to the same diameter. The fastening part 560 extends downward from the support part 520 and extends horizontally bent toward the center of the substrate. The lower surface of the fastening part 560 is provided with a groove 561 corresponding to the thread 341 formed on the outer side of the upper surface of the rotating plate 340 for coupling with the rotating plate 340. At this time, the groove 561 of the chuck pin 500 is formed in an arc shape corresponding to the screw thread 341. The locking portion 580 extends outward from the central portion 540 and is provided in a ring shape. The engaging portion 580 is in close contact with the upper surface of the body 300, so that the chuck pins 500 all protrude to the same height.

The body 300 has an upper plate 320, a rotating plate 340, and a fastening member 360. Top plate 320 has a top surface that is provided in a generally circular shape when viewed from the top. The rotating plate 340 is disposed below the upper plate 320 and provides a space in which the driving members 600 and 700 are disposed. The upper plate 320 is formed with screw grooves 324 to which the support pins 400 are fixed. In addition, pin holes 322 into which the chuck pins 500 are inserted are formed in the edge region of the upper plate 320. Each pin hole 322 is formed in a slit shape. The pinhole 322 is formed such that its longitudinal direction is along the radial direction of the upper plate 320. The width of the pin hole 322 is equal to or slightly wider than the diameter of the central portion 540 of the chuck pin 500, and the length of the pin hole 322 guides the movement of the chuck pin 500 in the radial direction. It is formed as long as possible. The length of the pin hole 322 may be provided shorter than the diameter of the locking portion 580 of the chuck pin 500. In the center of the upper plate 320 and the rotating plate 340, a through hole 326 into which the above-described injection head 180 is inserted is formed.

7 and 8 are views for showing a coupling structure of the upper plate 320 and the rotating plate 340. 7 and 8 are plan and bottom views of the rotating plate of the spin head. Referring to FIGS. 7 and 8, since the upper plate 320 is exposed to the chemical liquid during the process, the upper plate 320 is made of a material resistant to corrosion of the chemical liquid. In addition, the rotary plate 340 is made of a material resistant to heat so that a high temperature chemical solution is supplied to the substrate W so that the set position of the chuck pin 500 is not shifted due to thermal expansion of the rotary plate 340 during the process. That is, in the present invention, the upper plate 320 is made of a material resistant to corrosion than the rotating plate 340, and the rotating plate 340 is made of a material having a smaller thermal deformation than the upper plate 320. According to one example, the top plate 320 is made of polyvinyl chloride, the rotating plate 340 is made of aluminum. The upper plate 320 and the rotating plate 340 are coupled by the fastening member 360.

5, an opening is formed in the center of the rotating plate 340, and teeth 343 are formed at the end of the opening toward the center of the rotating plate 340. In addition, the driving member 600 includes a motor 610 and a pinion 620. When the pinion 620 is engaged with the teeth 343 and the motor 610 is driven, the rotating plate 340 rotates. .

9 is a cross-sectional view of the spin head cut along the line I-I of FIG. 4 according to another embodiment. Referring to FIG. 9, an opening is formed in the center of the rotating plate 340, and a tooth 344 is formed on the lower surface of the opening side of the rotating plate 340 instead of the end of the opening. In addition, the driving member 700 is provided with a motor 710 and a pinion (720), it is located on the lower surface of the rotating plate 340. When the pinion 720 meshes with the teeth 344 to drive the motor 710, the rotating plate 340 rotates.

In this way, the driving members 600 and 700 move the chuck pin 500 between the support position and the standby position. The support position is a position where the chuck pins 500 are in contact with the side of the substrate W during the process, and the standby position provides a larger space than the substrate W so that the substrate W can be placed on the spin head 40. That's where it is. Thus, the support position is a position closer to the center of the body 300 than the standby position.

Referring to FIG. 7, when the rotating plate 340 rotates counterclockwise by the driving of the driving members 600 and 700, the grooves 561 of the screw 341 and the chuck pin 500 formed on the rotating plate 340. ) Are interlocked with each other so that the chuck pins 500 move toward the center of the rotating plate 340 (ie, toward the support position). On the contrary, when the rotating plate 340 is rotated in the clockwise direction by the driving of the driving members 600 and 700, the chuck pins 500 simultaneously move in the opposite direction to the center of the rotating plate 340 (that is, toward the standby position). Move). Of course, the direction of rotation of the rotating plate 340 and the direction of movement of the chuck pins 500 may be reversed by reversing the directions of the thread 341 and the groove 561.

Thus, when the rotating plate 340 rotates, all the chuck pins 500 are in contact with the side of the substrate at the same time. Therefore, the position of the substrate is stable, and it is possible to prevent the force from being concentrated on some chuck pins 500. In addition, even when the substrate is rotated at a high speed, the chuck pins 500 can be held in a supporting position in contact with the side of the substrate without being eccentric by centrifugal force.

Although described with reference to the embodiments above, those skilled in the art will understand that the present invention can be variously modified and changed without departing from the spirit and scope of the invention as set forth in the claims below. Could be.

1 is a plan view schematically showing a substrate processing apparatus of the present invention;

2 is a cross-sectional view showing a container of the present invention,

3 is a perspective view of a longitudinally cut container showing the interior of the container of FIG. 2, FIG.

4 and 5 are plan views of the spin head,

6 is a cross-sectional view of the spin head cut along the line I-I of FIG. 4;

7 and 8 are plan and bottom views of the rotating plate of the spin head,

9 is a cross-sectional view of the spin head cut along the line I-I of FIG. 4 according to another embodiment.

<Explanation of symbols for the main parts of the drawings>

10 fluid supply unit 20 container

30: lifting unit 40: spin head

100a: upper nozzle member 100b: lower nozzle member

220: internal recovery container 240: intermediate recovery container

260: external recovery container 300: body

320: top plate 340: rotating plate

360: fastening member 400: support pin

500: chuck pin 600: drive member

Claims (10)

A rotating plate having a spiral thread formed outside the upper surface thereof; And And a plurality of chuck pins protruding from the upper side of the rotating plate to support the side of the substrate, the groove being formed on the lower surface to engage the thread. The method of claim 1, The groove of the chuck pin is a spin head, characterized in that formed in an arc shape to correspond to the thread. The method according to claim 1 or 2, A plurality of grooves of the chuck pin is formed, the spin head, characterized in that the plurality of meshing with the thread. The method of claim 1, And a top plate having slits formed at positions corresponding to the chuck pins so that the plurality of chuck pins linearly move in the radial direction when the rotating plate rotates. The method of claim 1, In the center of the rotary plate further includes an opening formed with a tooth toward the center of the rotary plate, And a pinion provided to engage the teeth, and a motor for rotating the pinion to rotate the rotating plate. The method of claim 1, A tooth is formed at the lower end of the rotating plate, And a pinion provided in the lower portion of the rotating plate so as to engage with the teeth for rotating the rotating plate, and a motor for rotating the pinion. The method of claim 1, And a support pin fixed to the top plate and provided to protrude upward from the top plate to support the bottom surface of the substrate. A rotating plate for rotating motion; And A plurality of chuck pins simultaneously supporting a side of the substrate and simultaneously linearly moving between a support position for supporting the side of the substrate by a rotational movement of the rotating plate and a standby position further radially farther from the center of the substrate than the support position; Spin head containing. The method of claim 8, And a top plate having slits formed at positions corresponding to the chuck pins so that the plurality of chuck pins linearly move in the radial direction when the rotating plate rotates. The method of claim 8, And a support pin fixed to the top plate and provided to protrude upward from the top plate to support the bottom surface of the substrate.

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