KR20100016082A - Color filter, liquid crystal display device and hardening composition to be used in the production of the same - Google Patents
Color filter, liquid crystal display device and hardening composition to be used in the production of the same Download PDFInfo
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- KR20100016082A KR20100016082A KR1020097022747A KR20097022747A KR20100016082A KR 20100016082 A KR20100016082 A KR 20100016082A KR 1020097022747 A KR1020097022747 A KR 1020097022747A KR 20097022747 A KR20097022747 A KR 20097022747A KR 20100016082 A KR20100016082 A KR 20100016082A
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- 239000000203 mixture Substances 0.000 title claims abstract description 174
- 239000004973 liquid crystal related substance Substances 0.000 title claims description 45
- 238000004519 manufacturing process Methods 0.000 title description 21
- 230000003287 optical effect Effects 0.000 claims abstract description 21
- 150000001875 compounds Chemical class 0.000 claims description 184
- 239000000178 monomer Substances 0.000 claims description 143
- 229920000642 polymer Polymers 0.000 claims description 128
- 125000004432 carbon atom Chemical group C* 0.000 claims description 84
- 238000000034 method Methods 0.000 claims description 80
- 230000015572 biosynthetic process Effects 0.000 claims description 78
- 239000002253 acid Substances 0.000 claims description 73
- 125000000217 alkyl group Chemical group 0.000 claims description 68
- 239000002270 dispersing agent Substances 0.000 claims description 51
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 49
- 229920001577 copolymer Polymers 0.000 claims description 47
- 125000003118 aryl group Chemical group 0.000 claims description 45
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 45
- 125000001424 substituent group Chemical group 0.000 claims description 41
- 230000002378 acidificating effect Effects 0.000 claims description 32
- 239000010419 fine particle Substances 0.000 claims description 31
- 229910052751 metal Inorganic materials 0.000 claims description 30
- 239000002184 metal Substances 0.000 claims description 30
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 29
- 239000002904 solvent Substances 0.000 claims description 29
- 125000005647 linker group Chemical group 0.000 claims description 28
- 239000007787 solid Substances 0.000 claims description 28
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 24
- 239000003505 polymerization initiator Substances 0.000 claims description 24
- 239000003086 colorant Substances 0.000 claims description 23
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 22
- 125000002947 alkylene group Chemical group 0.000 claims description 21
- 229910052757 nitrogen Inorganic materials 0.000 claims description 20
- JOYRKODLDBILNP-UHFFFAOYSA-N urethane group Chemical group NC(=O)OCC JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 claims description 20
- 239000006229 carbon black Substances 0.000 claims description 19
- 125000003545 alkoxy group Chemical group 0.000 claims description 17
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 claims description 17
- 239000012860 organic pigment Substances 0.000 claims description 17
- 125000005843 halogen group Chemical group 0.000 claims description 16
- 125000000623 heterocyclic group Chemical group 0.000 claims description 16
- 239000003795 chemical substances by application Substances 0.000 claims description 15
- XSQUKJJJFZCRTK-UHFFFAOYSA-N urea group Chemical group NC(=O)N XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims description 15
- 238000010168 coupling process Methods 0.000 claims description 13
- 230000008878 coupling Effects 0.000 claims description 12
- 238000005859 coupling reaction Methods 0.000 claims description 12
- 125000000962 organic group Chemical group 0.000 claims description 11
- 125000003700 epoxy group Chemical group 0.000 claims description 10
- 125000005370 alkoxysilyl group Chemical group 0.000 claims description 7
- 125000004122 cyclic group Chemical group 0.000 claims description 5
- 229910052760 oxygen Inorganic materials 0.000 claims description 4
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 claims description 4
- 239000001257 hydrogen Substances 0.000 claims description 3
- 229910052739 hydrogen Inorganic materials 0.000 claims description 3
- 229910052717 sulfur Inorganic materials 0.000 claims description 3
- 229910052727 yttrium Inorganic materials 0.000 claims description 2
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 1
- -1 metal complex salts Chemical class 0.000 description 202
- 229940048053 acrylate Drugs 0.000 description 120
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 111
- 239000006185 dispersion Substances 0.000 description 106
- 229920005989 resin Polymers 0.000 description 92
- 239000011347 resin Substances 0.000 description 92
- 239000000049 pigment Substances 0.000 description 91
- 239000002245 particle Substances 0.000 description 58
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 56
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 54
- 239000000758 substrate Substances 0.000 description 53
- 238000000576 coating method Methods 0.000 description 50
- 229920002554 vinyl polymer Polymers 0.000 description 50
- 239000011248 coating agent Substances 0.000 description 49
- 239000007788 liquid Substances 0.000 description 45
- 239000000243 solution Substances 0.000 description 44
- 239000010408 film Substances 0.000 description 38
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 36
- 229910052802 copper Inorganic materials 0.000 description 36
- 239000010949 copper Substances 0.000 description 36
- QTUVQQKHBMGYEH-UHFFFAOYSA-N 2-(trichloromethyl)-1,3,5-triazine Chemical compound ClC(Cl)(Cl)C1=NC=NC=N1 QTUVQQKHBMGYEH-UHFFFAOYSA-N 0.000 description 35
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 34
- 238000001179 sorption measurement Methods 0.000 description 34
- 239000000126 substance Substances 0.000 description 33
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 30
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 28
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 28
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 28
- 238000004040 coloring Methods 0.000 description 27
- 239000004926 polymethyl methacrylate Substances 0.000 description 26
- 238000007334 copolymerization reaction Methods 0.000 description 25
- 230000008569 process Effects 0.000 description 24
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 23
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 22
- 238000002360 preparation method Methods 0.000 description 22
- 239000010432 diamond Substances 0.000 description 21
- 229910003460 diamond Inorganic materials 0.000 description 21
- 150000002148 esters Chemical class 0.000 description 21
- 239000000463 material Substances 0.000 description 20
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 19
- 238000011161 development Methods 0.000 description 19
- 230000018109 developmental process Effects 0.000 description 19
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 19
- 235000019241 carbon black Nutrition 0.000 description 18
- 239000011159 matrix material Substances 0.000 description 18
- 239000011521 glass Substances 0.000 description 17
- 239000004094 surface-active agent Substances 0.000 description 17
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 16
- 229910001128 Sn alloy Inorganic materials 0.000 description 16
- QCEUXSAXTBNJGO-UHFFFAOYSA-N [Ag].[Sn] Chemical compound [Ag].[Sn] QCEUXSAXTBNJGO-UHFFFAOYSA-N 0.000 description 16
- 230000000694 effects Effects 0.000 description 16
- 125000004434 sulfur atom Chemical group 0.000 description 16
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 15
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 15
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 15
- 229940114077 acrylic acid Drugs 0.000 description 15
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 15
- 239000004593 Epoxy Substances 0.000 description 14
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 14
- 239000003513 alkali Substances 0.000 description 14
- 125000003277 amino group Chemical group 0.000 description 14
- 125000003710 aryl alkyl group Chemical group 0.000 description 14
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 14
- 239000011976 maleic acid Substances 0.000 description 14
- FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 description 13
- FBPFZTCFMRRESA-JGWLITMVSA-N D-glucitol Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-JGWLITMVSA-N 0.000 description 13
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 13
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 13
- 239000000600 sorbitol Substances 0.000 description 13
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 12
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 12
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 12
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 12
- AOJOEFVRHOZDFN-UHFFFAOYSA-N benzyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1=CC=CC=C1 AOJOEFVRHOZDFN-UHFFFAOYSA-N 0.000 description 12
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 12
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 12
- 125000000524 functional group Chemical group 0.000 description 12
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 12
- 238000006116 polymerization reaction Methods 0.000 description 12
- 229920001451 polypropylene glycol Polymers 0.000 description 12
- 238000003786 synthesis reaction Methods 0.000 description 12
- 125000003396 thiol group Chemical group [H]S* 0.000 description 12
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 11
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 11
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 11
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 11
- 150000001408 amides Chemical class 0.000 description 11
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 11
- 238000006243 chemical reaction Methods 0.000 description 11
- 125000001624 naphthyl group Chemical group 0.000 description 11
- 229920001223 polyethylene glycol Polymers 0.000 description 11
- 230000035945 sensitivity Effects 0.000 description 11
- 239000004925 Acrylic resin Substances 0.000 description 10
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 10
- 239000002202 Polyethylene glycol Substances 0.000 description 10
- 239000004793 Polystyrene Substances 0.000 description 10
- 230000006872 improvement Effects 0.000 description 10
- 229920003145 methacrylic acid copolymer Polymers 0.000 description 10
- 239000011859 microparticle Substances 0.000 description 10
- 229920000647 polyepoxide Polymers 0.000 description 10
- 229920002223 polystyrene Polymers 0.000 description 10
- 239000000047 product Substances 0.000 description 10
- 229910052709 silver Inorganic materials 0.000 description 10
- 239000004332 silver Substances 0.000 description 10
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 9
- 229920000178 Acrylic resin Polymers 0.000 description 9
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 9
- RWRDLPDLKQPQOW-UHFFFAOYSA-N Pyrrolidine Chemical compound C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 description 9
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- 229910052946 acanthite Inorganic materials 0.000 description 9
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 9
- 238000007259 addition reaction Methods 0.000 description 9
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical compound C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 9
- 239000000975 dye Substances 0.000 description 9
- 238000005516 engineering process Methods 0.000 description 9
- 239000003822 epoxy resin Substances 0.000 description 9
- 238000011156 evaluation Methods 0.000 description 9
- 239000001530 fumaric acid Substances 0.000 description 9
- 229920000578 graft copolymer Polymers 0.000 description 9
- 150000002430 hydrocarbons Chemical group 0.000 description 9
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 9
- 150000003254 radicals Chemical class 0.000 description 9
- 229940056910 silver sulfide Drugs 0.000 description 9
- XUARKZBEFFVFRG-UHFFFAOYSA-N silver sulfide Chemical compound [S-2].[Ag+].[Ag+] XUARKZBEFFVFRG-UHFFFAOYSA-N 0.000 description 9
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 9
- 239000001052 yellow pigment Substances 0.000 description 9
- HIXDQWDOVZUNNA-UHFFFAOYSA-N 2-(3,4-dimethoxyphenyl)-5-hydroxy-7-methoxychromen-4-one Chemical compound C=1C(OC)=CC(O)=C(C(C=2)=O)C=1OC=2C1=CC=C(OC)C(OC)=C1 HIXDQWDOVZUNNA-UHFFFAOYSA-N 0.000 description 8
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 8
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 8
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 8
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 8
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 8
- 238000005119 centrifugation Methods 0.000 description 8
- 125000002603 chloroethyl group Chemical group [H]C([*])([H])C([H])([H])Cl 0.000 description 8
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 8
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 8
- 239000000976 ink Substances 0.000 description 8
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 8
- 150000002739 metals Chemical class 0.000 description 8
- 229940117841 methacrylic acid copolymer Drugs 0.000 description 8
- 239000011259 mixed solution Substances 0.000 description 8
- 239000002736 nonionic surfactant Substances 0.000 description 8
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 8
- 125000000542 sulfonic acid group Chemical group 0.000 description 8
- 229920005992 thermoplastic resin Polymers 0.000 description 8
- 238000012546 transfer Methods 0.000 description 8
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 7
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 7
- 125000003668 acetyloxy group Chemical group [H]C([H])([H])C(=O)O[*] 0.000 description 7
- 239000000654 additive Substances 0.000 description 7
- 229910045601 alloy Inorganic materials 0.000 description 7
- 239000000956 alloy Substances 0.000 description 7
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 7
- 150000004056 anthraquinones Chemical class 0.000 description 7
- 239000011324 bead Substances 0.000 description 7
- 235000013339 cereals Nutrition 0.000 description 7
- 239000007795 chemical reaction product Substances 0.000 description 7
- 239000000460 chlorine Substances 0.000 description 7
- 229910052801 chlorine Inorganic materials 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 7
- 230000001976 improved effect Effects 0.000 description 7
- 239000003112 inhibitor Substances 0.000 description 7
- 239000003999 initiator Substances 0.000 description 7
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 7
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical class N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 7
- 125000000565 sulfonamide group Chemical group 0.000 description 7
- 239000010936 titanium Substances 0.000 description 7
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 6
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 6
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- QECVIPBZOPUTRD-UHFFFAOYSA-N N=S(=O)=O Chemical group N=S(=O)=O QECVIPBZOPUTRD-UHFFFAOYSA-N 0.000 description 6
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical group OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 6
- GLUUGHFHXGJENI-UHFFFAOYSA-N Piperazine Chemical compound C1CNCCN1 GLUUGHFHXGJENI-UHFFFAOYSA-N 0.000 description 6
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 6
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 6
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 6
- 229920006243 acrylic copolymer Polymers 0.000 description 6
- 125000004423 acyloxy group Chemical group 0.000 description 6
- 150000001412 amines Chemical class 0.000 description 6
- 125000000751 azo group Chemical group [*]N=N[*] 0.000 description 6
- ZYGHJZDHTFUPRJ-UHFFFAOYSA-N benzo-alpha-pyrone Natural products C1=CC=C2OC(=O)C=CC2=C1 ZYGHJZDHTFUPRJ-UHFFFAOYSA-N 0.000 description 6
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 6
- 229910052794 bromium Inorganic materials 0.000 description 6
- 229910052799 carbon Inorganic materials 0.000 description 6
- 125000004093 cyano group Chemical group *C#N 0.000 description 6
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 6
- 125000003754 ethoxycarbonyl group Chemical group C(=O)(OCC)* 0.000 description 6
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 6
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 6
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 6
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 description 6
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 6
- KZNICNPSHKQLFF-UHFFFAOYSA-N succinimide Chemical compound O=C1CCC(=O)N1 KZNICNPSHKQLFF-UHFFFAOYSA-N 0.000 description 6
- 239000006228 supernatant Substances 0.000 description 6
- XKXIQBVKMABYQJ-UHFFFAOYSA-M tert-butyl carbonate Chemical compound CC(C)(C)OC([O-])=O XKXIQBVKMABYQJ-UHFFFAOYSA-M 0.000 description 6
- 229910052719 titanium Inorganic materials 0.000 description 6
- MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 description 5
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 5
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 5
- RZVHIXYEVGDQDX-UHFFFAOYSA-N 9,10-anthraquinone Chemical group C1=CC=C2C(=O)C3=CC=CC=C3C(=O)C2=C1 RZVHIXYEVGDQDX-UHFFFAOYSA-N 0.000 description 5
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 5
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 5
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 5
- 239000004721 Polyphenylene oxide Substances 0.000 description 5
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 5
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 5
- DZBUGLKDJFMEHC-UHFFFAOYSA-N acridine Chemical compound C1=CC=CC2=CC3=CC=CC=C3N=C21 DZBUGLKDJFMEHC-UHFFFAOYSA-N 0.000 description 5
- FZEYVTFCMJSGMP-UHFFFAOYSA-N acridone Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3NC2=C1 FZEYVTFCMJSGMP-UHFFFAOYSA-N 0.000 description 5
- 125000002723 alicyclic group Chemical group 0.000 description 5
- 125000005907 alkyl ester group Chemical group 0.000 description 5
- 125000004429 atom Chemical group 0.000 description 5
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 5
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 5
- 150000001735 carboxylic acids Chemical class 0.000 description 5
- 239000012986 chain transfer agent Substances 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- GWVMLCQWXVFZCN-UHFFFAOYSA-N isoindoline Chemical compound C1=CC=C2CNCC2=C1 GWVMLCQWXVFZCN-UHFFFAOYSA-N 0.000 description 5
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 5
- 239000011572 manganese Substances 0.000 description 5
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 5
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 5
- 229920000728 polyester Polymers 0.000 description 5
- 229920000570 polyether Polymers 0.000 description 5
- 229920001296 polysiloxane Polymers 0.000 description 5
- 229920002635 polyurethane Polymers 0.000 description 5
- 239000004814 polyurethane Substances 0.000 description 5
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 5
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 5
- FYNROBRQIVCIQF-UHFFFAOYSA-N pyrrolo[3,2-b]pyrrole-5,6-dione Chemical compound C1=CN=C2C(=O)C(=O)N=C21 FYNROBRQIVCIQF-UHFFFAOYSA-N 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- 150000003440 styrenes Chemical class 0.000 description 5
- KDYFGRWQOYBRFD-UHFFFAOYSA-N succinic acid Chemical compound OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 5
- 238000001308 synthesis method Methods 0.000 description 5
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 5
- 239000011135 tin Substances 0.000 description 5
- 150000003852 triazoles Chemical class 0.000 description 5
- 229920001567 vinyl ester resin Polymers 0.000 description 5
- 125000006828 (C2-C7) alkoxycarbonyl group Chemical group 0.000 description 4
- WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 4
- UZKWTJUDCOPSNM-UHFFFAOYSA-N 1-ethenoxybutane Chemical compound CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 4
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 4
- 125000004200 2-methoxyethyl group Chemical group [H]C([H])([H])OC([H])([H])C([H])([H])* 0.000 description 4
- XLLXMBCBJGATSP-UHFFFAOYSA-N 2-phenylethenol Chemical compound OC=CC1=CC=CC=C1 XLLXMBCBJGATSP-UHFFFAOYSA-N 0.000 description 4
- UJOBWOGCFQCDNV-UHFFFAOYSA-N 9H-carbazole Chemical compound C1=CC=C2C3=CC=CC=C3NC2=C1 UJOBWOGCFQCDNV-UHFFFAOYSA-N 0.000 description 4
- WBYWAXJHAXSJNI-SREVYHEPSA-N Cinnamic acid Chemical compound OC(=O)\C=C/C1=CC=CC=C1 WBYWAXJHAXSJNI-SREVYHEPSA-N 0.000 description 4
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 4
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 4
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 4
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 4
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 4
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 4
- 206010047571 Visual impairment Diseases 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 4
- 235000011054 acetic acid Nutrition 0.000 description 4
- 150000008065 acid anhydrides Chemical class 0.000 description 4
- 150000001298 alcohols Chemical class 0.000 description 4
- 125000001931 aliphatic group Chemical group 0.000 description 4
- 150000008064 anhydrides Chemical class 0.000 description 4
- LFYJSSARVMHQJB-QIXNEVBVSA-N bakuchiol Chemical compound CC(C)=CCC[C@@](C)(C=C)\C=C\C1=CC=C(O)C=C1 LFYJSSARVMHQJB-QIXNEVBVSA-N 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 4
- 150000001733 carboxylic acid esters Chemical class 0.000 description 4
- 229930016911 cinnamic acid Natural products 0.000 description 4
- 235000013985 cinnamic acid Nutrition 0.000 description 4
- XCJYREBRNVKWGJ-UHFFFAOYSA-N copper(II) phthalocyanine Chemical compound [Cu+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 XCJYREBRNVKWGJ-UHFFFAOYSA-N 0.000 description 4
- 239000011258 core-shell material Substances 0.000 description 4
- 235000001671 coumarin Nutrition 0.000 description 4
- 229960000956 coumarin Drugs 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 4
- 235000014113 dietary fatty acids Nutrition 0.000 description 4
- 239000000539 dimer Substances 0.000 description 4
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 4
- 229940116333 ethyl lactate Drugs 0.000 description 4
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 4
- 229930195729 fatty acid Natural products 0.000 description 4
- 239000000194 fatty acid Substances 0.000 description 4
- 229910052731 fluorine Inorganic materials 0.000 description 4
- 239000011737 fluorine Substances 0.000 description 4
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 4
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical class I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 4
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 4
- 239000012948 isocyanate Substances 0.000 description 4
- 150000002513 isocyanates Chemical class 0.000 description 4
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 4
- WBYWAXJHAXSJNI-UHFFFAOYSA-N methyl p-hydroxycinnamate Natural products OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- JESXATFQYMPTNL-UHFFFAOYSA-N mono-hydroxyphenyl-ethylene Natural products OC1=CC=CC=C1C=C JESXATFQYMPTNL-UHFFFAOYSA-N 0.000 description 4
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 4
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 4
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 4
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 4
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 4
- 125000001644 phenoxazinyl group Chemical group C1(=CC=CC=2OC3=CC=CC=C3NC12)* 0.000 description 4
- 229920001610 polycaprolactone Polymers 0.000 description 4
- 239000004632 polycaprolactone Substances 0.000 description 4
- 229920000139 polyethylene terephthalate Polymers 0.000 description 4
- 239000005020 polyethylene terephthalate Substances 0.000 description 4
- 230000000379 polymerizing effect Effects 0.000 description 4
- 239000001054 red pigment Substances 0.000 description 4
- 238000011160 research Methods 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- 125000000467 secondary amino group Chemical group [H]N([*:1])[*:2] 0.000 description 4
- 238000012719 thermal polymerization Methods 0.000 description 4
- 229910052718 tin Inorganic materials 0.000 description 4
- DMFAHCVITRDZQB-UHFFFAOYSA-N 1-propoxypropan-2-yl acetate Chemical compound CCCOCC(C)OC(C)=O DMFAHCVITRDZQB-UHFFFAOYSA-N 0.000 description 3
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 description 3
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 3
- WYGWHHGCAGTUCH-UHFFFAOYSA-N 2-[(2-cyano-4-methylpentan-2-yl)diazenyl]-2,4-dimethylpentanenitrile Chemical compound CC(C)CC(C)(C#N)N=NC(C)(C#N)CC(C)C WYGWHHGCAGTUCH-UHFFFAOYSA-N 0.000 description 3
- HCLJOFJIQIJXHS-UHFFFAOYSA-N 2-[2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOCCOC(=O)C=C HCLJOFJIQIJXHS-UHFFFAOYSA-N 0.000 description 3
- FDSUVTROAWLVJA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OCC(CO)(CO)COCC(CO)(CO)CO FDSUVTROAWLVJA-UHFFFAOYSA-N 0.000 description 3
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 3
- KEPGNQLKWDULGD-UHFFFAOYSA-N 3-(3-prop-2-enoyloxypropoxy)propyl prop-2-enoate Chemical compound C=CC(=O)OCCCOCCCOC(=O)C=C KEPGNQLKWDULGD-UHFFFAOYSA-N 0.000 description 3
- OFNISBHGPNMTMS-UHFFFAOYSA-N 3-methylideneoxolane-2,5-dione Chemical compound C=C1CC(=O)OC1=O OFNISBHGPNMTMS-UHFFFAOYSA-N 0.000 description 3
- 229920002126 Acrylic acid copolymer Polymers 0.000 description 3
- 239000004342 Benzoyl peroxide Substances 0.000 description 3
- YZGQDNOIGFBYKF-UHFFFAOYSA-N Ethoxyacetic acid Chemical compound CCOCC(O)=O YZGQDNOIGFBYKF-UHFFFAOYSA-N 0.000 description 3
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical group C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 3
- 101100175482 Glycine max CG-3 gene Proteins 0.000 description 3
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 3
- 239000004372 Polyvinyl alcohol Substances 0.000 description 3
- XBDQKXXYIPTUBI-UHFFFAOYSA-N Propionic acid Chemical compound CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 3
- WTKZEGDFNFYCGP-UHFFFAOYSA-N Pyrazole Chemical compound C=1C=NNC=1 WTKZEGDFNFYCGP-UHFFFAOYSA-N 0.000 description 3
- CZPWVGJYEJSRLH-UHFFFAOYSA-N Pyrimidine Chemical compound C1=CN=CN=C1 CZPWVGJYEJSRLH-UHFFFAOYSA-N 0.000 description 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 3
- 239000006087 Silane Coupling Agent Substances 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 3
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 3
- HSZUHSXXAOWGQY-UHFFFAOYSA-N [2-methyl-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(C)(COC(=O)C=C)COC(=O)C=C HSZUHSXXAOWGQY-UHFFFAOYSA-N 0.000 description 3
- FHLPGTXWCFQMIU-UHFFFAOYSA-N [4-[2-(4-prop-2-enoyloxyphenyl)propan-2-yl]phenyl] prop-2-enoate Chemical compound C=1C=C(OC(=O)C=C)C=CC=1C(C)(C)C1=CC=C(OC(=O)C=C)C=C1 FHLPGTXWCFQMIU-UHFFFAOYSA-N 0.000 description 3
- 125000000641 acridinyl group Chemical group C1(=CC=CC2=NC3=CC=CC=C3C=C12)* 0.000 description 3
- 150000003926 acrylamides Chemical class 0.000 description 3
- 230000000996 additive effect Effects 0.000 description 3
- 150000005215 alkyl ethers Chemical class 0.000 description 3
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 3
- 125000004104 aryloxy group Chemical group 0.000 description 3
- 125000003785 benzimidazolyl group Chemical group N1=C(NC2=C1C=CC=C2)* 0.000 description 3
- XJHABGPPCLHLLV-UHFFFAOYSA-N benzo[de]isoquinoline-1,3-dione Chemical compound C1=CC(C(=O)NC2=O)=C3C2=CC=CC3=C1 XJHABGPPCLHLLV-UHFFFAOYSA-N 0.000 description 3
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 3
- 239000012965 benzophenone Substances 0.000 description 3
- 229960003328 benzoyl peroxide Drugs 0.000 description 3
- 235000019400 benzoyl peroxide Nutrition 0.000 description 3
- 239000011230 binding agent Substances 0.000 description 3
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 3
- 229940106691 bisphenol a Drugs 0.000 description 3
- 229920001400 block copolymer Polymers 0.000 description 3
- 230000000903 blocking effect Effects 0.000 description 3
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 3
- 125000002843 carboxylic acid group Chemical group 0.000 description 3
- 239000002131 composite material Substances 0.000 description 3
- 239000011246 composite particle Substances 0.000 description 3
- 229940075557 diethylene glycol monoethyl ether Drugs 0.000 description 3
- PPSZHCXTGRHULJ-UHFFFAOYSA-N dioxazine Chemical compound O1ON=CC=C1 PPSZHCXTGRHULJ-UHFFFAOYSA-N 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 125000006575 electron-withdrawing group Chemical group 0.000 description 3
- 230000006870 function Effects 0.000 description 3
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 229910002804 graphite Inorganic materials 0.000 description 3
- 239000010439 graphite Substances 0.000 description 3
- 229920001519 homopolymer Polymers 0.000 description 3
- WJRBRSLFGCUECM-UHFFFAOYSA-N hydantoin Chemical compound O=C1CNC(=O)N1 WJRBRSLFGCUECM-UHFFFAOYSA-N 0.000 description 3
- 229940091173 hydantoin Drugs 0.000 description 3
- 125000002883 imidazolyl group Chemical group 0.000 description 3
- 125000001841 imino group Chemical group [H]N=* 0.000 description 3
- 150000002736 metal compounds Chemical class 0.000 description 3
- 229910044991 metal oxide Inorganic materials 0.000 description 3
- 150000004706 metal oxides Chemical class 0.000 description 3
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 3
- 125000001484 phenothiazinyl group Chemical group C1(=CC=CC=2SC3=CC=CC=C3NC12)* 0.000 description 3
- XKJCHHZQLQNZHY-UHFFFAOYSA-N phthalimide Chemical compound C1=CC=C2C(=O)NC(=O)C2=C1 XKJCHHZQLQNZHY-UHFFFAOYSA-N 0.000 description 3
- 229910052697 platinum Inorganic materials 0.000 description 3
- 229920000233 poly(alkylene oxides) Polymers 0.000 description 3
- 229920002451 polyvinyl alcohol Polymers 0.000 description 3
- 235000011118 potassium hydroxide Nutrition 0.000 description 3
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 3
- USPWKWBDZOARPV-UHFFFAOYSA-N pyrazolidine Chemical compound C1CNNC1 USPWKWBDZOARPV-UHFFFAOYSA-N 0.000 description 3
- DNXIASIHZYFFRO-UHFFFAOYSA-N pyrazoline Chemical compound C1CN=NC1 DNXIASIHZYFFRO-UHFFFAOYSA-N 0.000 description 3
- PBMFSQRYOILNGV-UHFFFAOYSA-N pyridazine Chemical compound C1=CC=NN=C1 PBMFSQRYOILNGV-UHFFFAOYSA-N 0.000 description 3
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 3
- 125000000714 pyrimidinyl group Chemical group 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- 238000007342 radical addition reaction Methods 0.000 description 3
- 239000007870 radical polymerization initiator Substances 0.000 description 3
- 230000007261 regionalization Effects 0.000 description 3
- 229910000077 silane Inorganic materials 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 3
- 229940014800 succinic anhydride Drugs 0.000 description 3
- 229960002317 succinimide Drugs 0.000 description 3
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 3
- 150000003568 thioethers Chemical class 0.000 description 3
- 150000003573 thiols Chemical class 0.000 description 3
- 125000005409 triarylsulfonium group Chemical group 0.000 description 3
- 125000003258 trimethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])[*:1] 0.000 description 3
- 125000003837 (C1-C20) alkyl group Chemical group 0.000 description 2
- 125000006527 (C1-C5) alkyl group Chemical group 0.000 description 2
- 125000004191 (C1-C6) alkoxy group Chemical group 0.000 description 2
- 125000004209 (C1-C8) alkyl group Chemical group 0.000 description 2
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 description 2
- BVOMRRWJQOJMPA-UHFFFAOYSA-N 1,2,3-trithiane Chemical compound C1CSSSC1 BVOMRRWJQOJMPA-UHFFFAOYSA-N 0.000 description 2
- GJZFGDYLJLCGHT-UHFFFAOYSA-N 1,2-diethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=C(CC)C(CC)=CC=C3SC2=C1 GJZFGDYLJLCGHT-UHFFFAOYSA-N 0.000 description 2
- JIHQDMXYYFUGFV-UHFFFAOYSA-N 1,3,5-triazine Chemical class C1=NC=NC=N1 JIHQDMXYYFUGFV-UHFFFAOYSA-N 0.000 description 2
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 2
- 125000000355 1,3-benzoxazolyl group Chemical group O1C(=NC2=C1C=CC=C2)* 0.000 description 2
- DZSVIVLGBJKQAP-UHFFFAOYSA-N 1-(2-methyl-5-propan-2-ylcyclohex-2-en-1-yl)propan-1-one Chemical compound CCC(=O)C1CC(C(C)C)CC=C1C DZSVIVLGBJKQAP-UHFFFAOYSA-N 0.000 description 2
- FUWDFGKRNIDKAE-UHFFFAOYSA-N 1-butoxypropan-2-yl acetate Chemical compound CCCCOCC(C)OC(C)=O FUWDFGKRNIDKAE-UHFFFAOYSA-N 0.000 description 2
- GXZPMXGRNUXGHN-UHFFFAOYSA-N 1-ethenoxy-2-methoxyethane Chemical compound COCCOC=C GXZPMXGRNUXGHN-UHFFFAOYSA-N 0.000 description 2
- YAOJJEJGPZRYJF-UHFFFAOYSA-N 1-ethenoxyhexane Chemical compound CCCCCCOC=C YAOJJEJGPZRYJF-UHFFFAOYSA-N 0.000 description 2
- OSSNTDFYBPYIEC-UHFFFAOYSA-N 1-ethenylimidazole Chemical compound C=CN1C=CN=C1 OSSNTDFYBPYIEC-UHFFFAOYSA-N 0.000 description 2
- LIPRQQHINVWJCH-UHFFFAOYSA-N 1-ethoxypropan-2-yl acetate Chemical compound CCOCC(C)OC(C)=O LIPRQQHINVWJCH-UHFFFAOYSA-N 0.000 description 2
- XLPJNCYCZORXHG-UHFFFAOYSA-N 1-morpholin-4-ylprop-2-en-1-one Chemical compound C=CC(=O)N1CCOCC1 XLPJNCYCZORXHG-UHFFFAOYSA-N 0.000 description 2
- JLIDVCMBCGBIEY-UHFFFAOYSA-N 1-penten-3-one Chemical compound CCC(=O)C=C JLIDVCMBCGBIEY-UHFFFAOYSA-N 0.000 description 2
- MEKOFIRRDATTAG-UHFFFAOYSA-N 2,2,5,8-tetramethyl-3,4-dihydrochromen-6-ol Chemical compound C1CC(C)(C)OC2=C1C(C)=C(O)C=C2C MEKOFIRRDATTAG-UHFFFAOYSA-N 0.000 description 2
- CISIJYCKDJSTMX-UHFFFAOYSA-N 2,2-dichloroethenylbenzene Chemical compound ClC(Cl)=CC1=CC=CC=C1 CISIJYCKDJSTMX-UHFFFAOYSA-N 0.000 description 2
- OXBLVCZKDOZZOJ-UHFFFAOYSA-N 2,3-Dihydrothiophene Chemical compound C1CC=CS1 OXBLVCZKDOZZOJ-UHFFFAOYSA-N 0.000 description 2
- VXQBJTKSVGFQOL-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethyl acetate Chemical compound CCCCOCCOCCOC(C)=O VXQBJTKSVGFQOL-UHFFFAOYSA-N 0.000 description 2
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 2
- INQDDHNZXOAFFD-UHFFFAOYSA-N 2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOC(=O)C=C INQDDHNZXOAFFD-UHFFFAOYSA-N 0.000 description 2
- UHFFVFAKEGKNAQ-UHFFFAOYSA-N 2-benzyl-2-(dimethylamino)-1-(4-morpholin-4-ylphenyl)butan-1-one Chemical compound C=1C=C(N2CCOCC2)C=CC=1C(=O)C(CC)(N(C)C)CC1=CC=CC=C1 UHFFVFAKEGKNAQ-UHFFFAOYSA-N 0.000 description 2
- HXLLCROMVONRRO-UHFFFAOYSA-N 2-butoxyethenylbenzene Chemical compound CCCCOC=CC1=CC=CC=C1 HXLLCROMVONRRO-UHFFFAOYSA-N 0.000 description 2
- SBYMUDUGTIKLCR-UHFFFAOYSA-N 2-chloroethenylbenzene Chemical compound ClC=CC1=CC=CC=C1 SBYMUDUGTIKLCR-UHFFFAOYSA-N 0.000 description 2
- XUDBVJCTLZTSDC-UHFFFAOYSA-N 2-ethenylbenzoic acid Chemical compound OC(=O)C1=CC=CC=C1C=C XUDBVJCTLZTSDC-UHFFFAOYSA-N 0.000 description 2
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 2
- CTHJQRHPNQEPAB-UHFFFAOYSA-N 2-methoxyethenylbenzene Chemical compound COC=CC1=CC=CC=C1 CTHJQRHPNQEPAB-UHFFFAOYSA-N 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- WXUAQHNMJWJLTG-UHFFFAOYSA-N 2-methylbutanedioic acid Chemical compound OC(=O)C(C)CC(O)=O WXUAQHNMJWJLTG-UHFFFAOYSA-N 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- BTOVVHWKPVSLBI-UHFFFAOYSA-N 2-methylprop-1-enylbenzene Chemical compound CC(C)=CC1=CC=CC=C1 BTOVVHWKPVSLBI-UHFFFAOYSA-N 0.000 description 2
- KXGZUQYKCPPYRL-UHFFFAOYSA-N 2-nonan-5-ylidenebutanedioic acid Chemical compound CCCCC(CCCC)=C(CC(O)=O)C(O)=O KXGZUQYKCPPYRL-UHFFFAOYSA-N 0.000 description 2
- NMUIIYJWWOPNIP-UHFFFAOYSA-N 2-pentan-3-ylidenebutanedioic acid Chemical compound CCC(CC)=C(C(O)=O)CC(O)=O NMUIIYJWWOPNIP-UHFFFAOYSA-N 0.000 description 2
- FMFHUEMLVAIBFI-UHFFFAOYSA-N 2-phenylethenyl acetate Chemical compound CC(=O)OC=CC1=CC=CC=C1 FMFHUEMLVAIBFI-UHFFFAOYSA-N 0.000 description 2
- KUDUQBURMYMBIJ-UHFFFAOYSA-N 2-prop-2-enoyloxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC(=O)C=C KUDUQBURMYMBIJ-UHFFFAOYSA-N 0.000 description 2
- GYXGAEAOIFNGAE-UHFFFAOYSA-N 2-propan-2-ylidenebutanedioic acid Chemical compound CC(C)=C(C(O)=O)CC(O)=O GYXGAEAOIFNGAE-UHFFFAOYSA-N 0.000 description 2
- RSEBUVRVKCANEP-UHFFFAOYSA-N 2-pyrroline Chemical compound C1CC=CN1 RSEBUVRVKCANEP-UHFFFAOYSA-N 0.000 description 2
- KGIGUEBEKRSTEW-UHFFFAOYSA-N 2-vinylpyridine Chemical compound C=CC1=CC=CC=N1 KGIGUEBEKRSTEW-UHFFFAOYSA-N 0.000 description 2
- IWTYTFSSTWXZFU-UHFFFAOYSA-N 3-chloroprop-1-enylbenzene Chemical compound ClCC=CC1=CC=CC=C1 IWTYTFSSTWXZFU-UHFFFAOYSA-N 0.000 description 2
- KSLINXQJWRKPET-UHFFFAOYSA-N 3-ethenyloxepan-2-one Chemical compound C=CC1CCCCOC1=O KSLINXQJWRKPET-UHFFFAOYSA-N 0.000 description 2
- CCTFMNIEFHGTDU-UHFFFAOYSA-N 3-methoxypropyl acetate Chemical compound COCCCOC(C)=O CCTFMNIEFHGTDU-UHFFFAOYSA-N 0.000 description 2
- CEBRPXLXYCFYGU-UHFFFAOYSA-N 3-methylbut-1-enylbenzene Chemical compound CC(C)C=CC1=CC=CC=C1 CEBRPXLXYCFYGU-UHFFFAOYSA-N 0.000 description 2
- ZTHJQCDAHYOPIK-UHFFFAOYSA-N 3-methylbut-2-en-2-ylbenzene Chemical compound CC(C)=C(C)C1=CC=CC=C1 ZTHJQCDAHYOPIK-UHFFFAOYSA-N 0.000 description 2
- AYKYXWQEBUNJCN-UHFFFAOYSA-N 3-methylfuran-2,5-dione Chemical compound CC1=CC(=O)OC1=O AYKYXWQEBUNJCN-UHFFFAOYSA-N 0.000 description 2
- XMIIGOLPHOKFCH-UHFFFAOYSA-N 3-phenylpropionic acid Chemical compound OC(=O)CCC1=CC=CC=C1 XMIIGOLPHOKFCH-UHFFFAOYSA-N 0.000 description 2
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 2
- ZEHOVWPIGREOPO-UHFFFAOYSA-N 4,5,6,7-tetrachloro-2-[2-(4,5,6,7-tetrachloro-1,3-dioxoinden-2-yl)quinolin-8-yl]isoindole-1,3-dione Chemical compound O=C1C(C(=C(Cl)C(Cl)=C2Cl)Cl)=C2C(=O)N1C(C1=N2)=CC=CC1=CC=C2C1C(=O)C2=C(Cl)C(Cl)=C(Cl)C(Cl)=C2C1=O ZEHOVWPIGREOPO-UHFFFAOYSA-N 0.000 description 2
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 2
- 125000004172 4-methoxyphenyl group Chemical group [H]C1=C([H])C(OC([H])([H])[H])=C([H])C([H])=C1* 0.000 description 2
- IKHGUXGNUITLKF-UHFFFAOYSA-N Acetaldehyde Chemical group CC=O IKHGUXGNUITLKF-UHFFFAOYSA-N 0.000 description 2
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 2
- 238000006596 Alder-ene reaction Methods 0.000 description 2
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 2
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- 101150012716 CDK1 gene Proteins 0.000 description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 2
- RGHNJXZEOKUKBD-SQOUGZDYSA-N D-gluconic acid Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C(O)=O RGHNJXZEOKUKBD-SQOUGZDYSA-N 0.000 description 2
- 241000721047 Danaus plexippus Species 0.000 description 2
- IEPRKVQEAMIZSS-UHFFFAOYSA-N Di-Et ester-Fumaric acid Natural products CCOC(=O)C=CC(=O)OCC IEPRKVQEAMIZSS-UHFFFAOYSA-N 0.000 description 2
- IEPRKVQEAMIZSS-WAYWQWQTSA-N Diethyl maleate Chemical compound CCOC(=O)\C=C/C(=O)OCC IEPRKVQEAMIZSS-WAYWQWQTSA-N 0.000 description 2
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 2
- IMROMDMJAWUWLK-UHFFFAOYSA-N Ethenol Chemical compound OC=C IMROMDMJAWUWLK-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- MZNHUHNWGVUEAT-XBXARRHUSA-N Hexyl crotonate Chemical compound CCCCCCOC(=O)\C=C\C MZNHUHNWGVUEAT-XBXARRHUSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- SIKJAQJRHWYJAI-UHFFFAOYSA-N Indole Chemical compound C1=CC=C2NC=CC2=C1 SIKJAQJRHWYJAI-UHFFFAOYSA-N 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- FFOPEPMHKILNIT-UHFFFAOYSA-N Isopropyl butyrate Chemical compound CCCC(=O)OC(C)C FFOPEPMHKILNIT-UHFFFAOYSA-N 0.000 description 2
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 description 2
- LSDPWZHWYPCBBB-UHFFFAOYSA-N Methanethiol Chemical compound SC LSDPWZHWYPCBBB-UHFFFAOYSA-N 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 2
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical group C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000004677 Nylon Substances 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000004115 Sodium Silicate Substances 0.000 description 2
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 2
- 229920002359 Tetronic® Polymers 0.000 description 2
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical group C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 2
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 2
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 2
- WYGWHHGCAGTUCH-ISLYRVAYSA-N V-65 Substances CC(C)CC(C)(C#N)\N=N\C(C)(C#N)CC(C)C WYGWHHGCAGTUCH-ISLYRVAYSA-N 0.000 description 2
- 235000010724 Wisteria floribunda Nutrition 0.000 description 2
- SEEVRZDUPHZSOX-WPWMEQJKSA-N [(e)-1-[9-ethyl-6-(2-methylbenzoyl)carbazol-3-yl]ethylideneamino] acetate Chemical compound C=1C=C2N(CC)C3=CC=C(C(\C)=N\OC(C)=O)C=C3C2=CC=1C(=O)C1=CC=CC=C1C SEEVRZDUPHZSOX-WPWMEQJKSA-N 0.000 description 2
- YMOONIIMQBGTDU-VOTSOKGWSA-N [(e)-2-bromoethenyl]benzene Chemical compound Br\C=C\C1=CC=CC=C1 YMOONIIMQBGTDU-VOTSOKGWSA-N 0.000 description 2
- CQHKDHVZYZUZMJ-UHFFFAOYSA-N [2,2-bis(hydroxymethyl)-3-prop-2-enoyloxypropyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(CO)COC(=O)C=C CQHKDHVZYZUZMJ-UHFFFAOYSA-N 0.000 description 2
- YPCHGLDQZXOZFW-UHFFFAOYSA-N [2-[[4-methyl-3-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]carbonylamino]phenyl]carbamoyloxymethyl]-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound CC1=CC=C(NC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C)C=C1NC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C YPCHGLDQZXOZFW-UHFFFAOYSA-N 0.000 description 2
- 238000002835 absorbance Methods 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 239000003463 adsorbent Substances 0.000 description 2
- 230000002776 aggregation Effects 0.000 description 2
- 230000001476 alcoholic effect Effects 0.000 description 2
- 150000001336 alkenes Chemical class 0.000 description 2
- 125000003342 alkenyl group Chemical group 0.000 description 2
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 2
- 150000001346 alkyl aryl ethers Chemical class 0.000 description 2
- 150000001350 alkyl halides Chemical class 0.000 description 2
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium peroxydisulfate Substances [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 description 2
- VAZSKTXWXKYQJF-UHFFFAOYSA-N ammonium persulfate Chemical compound [NH4+].[NH4+].[O-]S(=O)OOS([O-])=O VAZSKTXWXKYQJF-UHFFFAOYSA-N 0.000 description 2
- 229910001870 ammonium persulfate Inorganic materials 0.000 description 2
- 125000005577 anthracene group Chemical group 0.000 description 2
- 229910052787 antimony Inorganic materials 0.000 description 2
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- QMKYBPDZANOJGF-UHFFFAOYSA-N benzene-1,3,5-tricarboxylic acid Chemical compound OC(=O)C1=CC(C(O)=O)=CC(C(O)=O)=C1 QMKYBPDZANOJGF-UHFFFAOYSA-N 0.000 description 2
- MYONAGGJKCJOBT-UHFFFAOYSA-N benzimidazol-2-one Chemical compound C1=CC=CC2=NC(=O)N=C21 MYONAGGJKCJOBT-UHFFFAOYSA-N 0.000 description 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical class C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 2
- 239000004305 biphenyl Substances 0.000 description 2
- 235000010290 biphenyl Nutrition 0.000 description 2
- 238000007664 blowing Methods 0.000 description 2
- 239000001055 blue pigment Substances 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- MPMBRWOOISTHJV-UHFFFAOYSA-N but-1-enylbenzene Chemical compound CCC=CC1=CC=CC=C1 MPMBRWOOISTHJV-UHFFFAOYSA-N 0.000 description 2
- GKRVGTLVYRYCFR-UHFFFAOYSA-N butane-1,4-diol;2-methylidenebutanedioic acid Chemical compound OCCCCO.OC(=O)CC(=C)C(O)=O.OC(=O)CC(=C)C(O)=O GKRVGTLVYRYCFR-UHFFFAOYSA-N 0.000 description 2
- FUSUHKVFWTUUBE-UHFFFAOYSA-N buten-2-one Chemical compound CC(=O)C=C FUSUHKVFWTUUBE-UHFFFAOYSA-N 0.000 description 2
- XUPYJHCZDLZNFP-UHFFFAOYSA-N butyl butanoate Chemical compound CCCCOC(=O)CCC XUPYJHCZDLZNFP-UHFFFAOYSA-N 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 229910052791 calcium Inorganic materials 0.000 description 2
- 239000011575 calcium Substances 0.000 description 2
- 150000001728 carbonyl compounds Chemical class 0.000 description 2
- HNEGQIOMVPPMNR-IHWYPQMZSA-N citraconic acid Chemical compound OC(=O)C(/C)=C\C(O)=O HNEGQIOMVPPMNR-IHWYPQMZSA-N 0.000 description 2
- 229940018557 citraconic acid Drugs 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 239000011162 core material Substances 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- 210000002858 crystal cell Anatomy 0.000 description 2
- GHVNFZFCNZKVNT-UHFFFAOYSA-N decanoic acid Chemical compound CCCCCCCCCC(O)=O GHVNFZFCNZKVNT-UHFFFAOYSA-N 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 2
- JBSLOWBPDRZSMB-BQYQJAHWSA-N dibutyl (e)-but-2-enedioate Chemical compound CCCCOC(=O)\C=C\C(=O)OCCCC JBSLOWBPDRZSMB-BQYQJAHWSA-N 0.000 description 2
- JBSLOWBPDRZSMB-FPLPWBNLSA-N dibutyl (z)-but-2-enedioate Chemical compound CCCCOC(=O)\C=C/C(=O)OCCCC JBSLOWBPDRZSMB-FPLPWBNLSA-N 0.000 description 2
- XSBSXJAYEPDGSF-UHFFFAOYSA-N diethyl 3,5-dimethyl-1h-pyrrole-2,4-dicarboxylate Chemical compound CCOC(=O)C=1NC(C)=C(C(=O)OCC)C=1C XSBSXJAYEPDGSF-UHFFFAOYSA-N 0.000 description 2
- IEPRKVQEAMIZSS-AATRIKPKSA-N diethyl fumarate Chemical compound CCOC(=O)\C=C\C(=O)OCC IEPRKVQEAMIZSS-AATRIKPKSA-N 0.000 description 2
- 229940028356 diethylene glycol monobutyl ether Drugs 0.000 description 2
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 2
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 2
- LDCRTTXIJACKKU-ONEGZZNKSA-N dimethyl fumarate Chemical compound COC(=O)\C=C\C(=O)OC LDCRTTXIJACKKU-ONEGZZNKSA-N 0.000 description 2
- 229960004419 dimethyl fumarate Drugs 0.000 description 2
- LDCRTTXIJACKKU-ARJAWSKDSA-N dimethyl maleate Chemical compound COC(=O)\C=C/C(=O)OC LDCRTTXIJACKKU-ARJAWSKDSA-N 0.000 description 2
- VFHVQBAGLAREND-UHFFFAOYSA-N diphenylphosphoryl-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 VFHVQBAGLAREND-UHFFFAOYSA-N 0.000 description 2
- UKMSUNONTOPOIO-UHFFFAOYSA-N docosanoic acid Chemical compound CCCCCCCCCCCCCCCCCCCCCC(O)=O UKMSUNONTOPOIO-UHFFFAOYSA-N 0.000 description 2
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000004185 ester group Chemical group 0.000 description 2
- HQPMKSGTIOYHJT-UHFFFAOYSA-N ethane-1,2-diol;propane-1,2-diol Chemical compound OCCO.CC(O)CO HQPMKSGTIOYHJT-UHFFFAOYSA-N 0.000 description 2
- FJKIXWOMBXYWOQ-UHFFFAOYSA-N ethenoxyethane Chemical compound CCOC=C FJKIXWOMBXYWOQ-UHFFFAOYSA-N 0.000 description 2
- AFIQVBFAKUPHOA-UHFFFAOYSA-N ethenyl 2-methoxyacetate Chemical compound COCC(=O)OC=C AFIQVBFAKUPHOA-UHFFFAOYSA-N 0.000 description 2
- MEGHWIAOTJPCHQ-UHFFFAOYSA-N ethenyl butanoate Chemical compound CCCC(=O)OC=C MEGHWIAOTJPCHQ-UHFFFAOYSA-N 0.000 description 2
- UIWXSTHGICQLQT-UHFFFAOYSA-N ethenyl propanoate Chemical compound CCC(=O)OC=C UIWXSTHGICQLQT-UHFFFAOYSA-N 0.000 description 2
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical class OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 2
- 150000004665 fatty acids Chemical class 0.000 description 2
- 230000002349 favourable effect Effects 0.000 description 2
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 2
- 235000011187 glycerol Nutrition 0.000 description 2
- 239000001056 green pigment Substances 0.000 description 2
- 150000004820 halides Chemical class 0.000 description 2
- NGAZZOYFWWSOGK-UHFFFAOYSA-N heptan-3-one Chemical compound CCCCC(=O)CC NGAZZOYFWWSOGK-UHFFFAOYSA-N 0.000 description 2
- MNWFXJYAOYHMED-UHFFFAOYSA-N heptanoic acid Chemical compound CCCCCCC(O)=O MNWFXJYAOYHMED-UHFFFAOYSA-N 0.000 description 2
- JTHNLKXLWOXOQK-UHFFFAOYSA-N hex-1-en-3-one Chemical compound CCCC(=O)C=C JTHNLKXLWOXOQK-UHFFFAOYSA-N 0.000 description 2
- KETWBQOXTBGBBN-UHFFFAOYSA-N hex-1-enylbenzene Chemical compound CCCCC=CC1=CC=CC=C1 KETWBQOXTBGBBN-UHFFFAOYSA-N 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- XLSMFKSTNGKWQX-UHFFFAOYSA-N hydroxyacetone Chemical compound CC(=O)CO XLSMFKSTNGKWQX-UHFFFAOYSA-N 0.000 description 2
- 125000005462 imide group Chemical group 0.000 description 2
- 125000001041 indolyl group Chemical group 0.000 description 2
- 230000005764 inhibitory process Effects 0.000 description 2
- 239000001023 inorganic pigment Substances 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- GJRQTCIYDGXPES-UHFFFAOYSA-N iso-butyl acetate Natural products CC(C)COC(C)=O GJRQTCIYDGXPES-UHFFFAOYSA-N 0.000 description 2
- MLFHJEHSLIIPHL-UHFFFAOYSA-N isoamyl acetate Chemical compound CC(C)CCOC(C)=O MLFHJEHSLIIPHL-UHFFFAOYSA-N 0.000 description 2
- FGKJLKRYENPLQH-UHFFFAOYSA-M isocaproate Chemical compound CC(C)CCC([O-])=O FGKJLKRYENPLQH-UHFFFAOYSA-M 0.000 description 2
- LDHQCZJRKDOVOX-IHWYPQMZSA-N isocrotonic acid Chemical compound C\C=C/C(O)=O LDHQCZJRKDOVOX-IHWYPQMZSA-N 0.000 description 2
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 2
- OQAGVSWESNCJJT-UHFFFAOYSA-N isovaleric acid methyl ester Natural products COC(=O)CC(C)C OQAGVSWESNCJJT-UHFFFAOYSA-N 0.000 description 2
- 239000010977 jade Substances 0.000 description 2
- 239000011133 lead Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 125000005397 methacrylic acid ester group Chemical group 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- MPHUYCIKFIKENX-UHFFFAOYSA-N methyl 2-ethenylbenzoate Chemical compound COC(=O)C1=CC=CC=C1C=C MPHUYCIKFIKENX-UHFFFAOYSA-N 0.000 description 2
- XJRBAMWJDBPFIM-UHFFFAOYSA-N methyl vinyl ether Chemical compound COC=C XJRBAMWJDBPFIM-UHFFFAOYSA-N 0.000 description 2
- 125000006366 methylene oxy carbonyl group Chemical group [H]C([H])([*:1])OC([*:2])=O 0.000 description 2
- 125000005699 methyleneoxy group Chemical group [H]C([H])([*:1])O[*:2] 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 239000003607 modifier Substances 0.000 description 2
- OMNKZBIFPJNNIO-UHFFFAOYSA-N n-(2-methyl-4-oxopentan-2-yl)prop-2-enamide Chemical compound CC(=O)CC(C)(C)NC(=O)C=C OMNKZBIFPJNNIO-UHFFFAOYSA-N 0.000 description 2
- RQAKESSLMFZVMC-UHFFFAOYSA-N n-ethenylacetamide Chemical compound CC(=O)NC=C RQAKESSLMFZVMC-UHFFFAOYSA-N 0.000 description 2
- ZQXSMRAEXCEDJD-UHFFFAOYSA-N n-ethenylformamide Chemical compound C=CNC=O ZQXSMRAEXCEDJD-UHFFFAOYSA-N 0.000 description 2
- KKFHAJHLJHVUDM-UHFFFAOYSA-N n-vinylcarbazole Chemical compound C1=CC=C2N(C=C)C3=CC=CC=C3C2=C1 KKFHAJHLJHVUDM-UHFFFAOYSA-N 0.000 description 2
- BDJRBEYXGGNYIS-UHFFFAOYSA-N nonanedioic acid Chemical compound OC(=O)CCCCCCCC(O)=O BDJRBEYXGGNYIS-UHFFFAOYSA-N 0.000 description 2
- 229920001778 nylon Polymers 0.000 description 2
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 2
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 150000004010 onium ions Chemical class 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 150000004866 oxadiazoles Chemical class 0.000 description 2
- JCGNDDUYTRNOFT-UHFFFAOYSA-N oxolane-2,4-dione Chemical compound O=C1COC(=O)C1 JCGNDDUYTRNOFT-UHFFFAOYSA-N 0.000 description 2
- 125000005702 oxyalkylene group Chemical group 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- UCUUFSAXZMGPGH-UHFFFAOYSA-N penta-1,4-dien-3-one Chemical class C=CC(=O)C=C UCUUFSAXZMGPGH-UHFFFAOYSA-N 0.000 description 2
- 229940038597 peroxide anti-acne preparations for topical use Drugs 0.000 description 2
- 150000002978 peroxides Chemical class 0.000 description 2
- JRKICGRDRMAZLK-UHFFFAOYSA-L persulfate group Chemical group S(=O)(=O)([O-])OOS(=O)(=O)[O-] JRKICGRDRMAZLK-UHFFFAOYSA-L 0.000 description 2
- LCPDWSOZIOUXRV-UHFFFAOYSA-N phenoxyacetic acid Chemical compound OC(=O)COC1=CC=CC=C1 LCPDWSOZIOUXRV-UHFFFAOYSA-N 0.000 description 2
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 2
- WLJVNTCWHIRURA-UHFFFAOYSA-N pimelic acid Chemical compound OC(=O)CCCCCC(O)=O WLJVNTCWHIRURA-UHFFFAOYSA-N 0.000 description 2
- 239000004014 plasticizer Substances 0.000 description 2
- 229920001485 poly(butyl acrylate) polymer Polymers 0.000 description 2
- USHAGKDGDHPEEY-UHFFFAOYSA-L potassium persulfate Chemical compound [K+].[K+].[O-]S(=O)(=O)OOS([O-])(=O)=O USHAGKDGDHPEEY-UHFFFAOYSA-L 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 230000001737 promoting effect Effects 0.000 description 2
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 2
- 239000001057 purple pigment Substances 0.000 description 2
- 125000003373 pyrazinyl group Chemical group 0.000 description 2
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 2
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 2
- ZVJHJDDKYZXRJI-UHFFFAOYSA-N pyrroline Natural products C1CC=NC1 ZVJHJDDKYZXRJI-UHFFFAOYSA-N 0.000 description 2
- 125000000168 pyrrolyl group Chemical group 0.000 description 2
- IZMJMCDDWKSTTK-UHFFFAOYSA-N quinoline yellow Chemical compound C1=CC=CC2=NC(C3C(C4=CC=CC=C4C3=O)=O)=CC=C21 IZMJMCDDWKSTTK-UHFFFAOYSA-N 0.000 description 2
- 125000002943 quinolinyl group Chemical group N1=C(C=CC2=CC=CC=C12)* 0.000 description 2
- 238000010526 radical polymerization reaction Methods 0.000 description 2
- 229920005604 random copolymer Polymers 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000000376 reactant Substances 0.000 description 2
- 238000006722 reduction reaction Methods 0.000 description 2
- 239000011342 resin composition Substances 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- 239000000565 sealant Substances 0.000 description 2
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 2
- 235000017557 sodium bicarbonate Nutrition 0.000 description 2
- 229910000029 sodium carbonate Inorganic materials 0.000 description 2
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 2
- 229910052911 sodium silicate Inorganic materials 0.000 description 2
- 125000006850 spacer group Chemical group 0.000 description 2
- 239000003381 stabilizer Substances 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 239000001384 succinic acid Substances 0.000 description 2
- 150000005846 sugar alcohols Polymers 0.000 description 2
- 229940124530 sulfonamide Drugs 0.000 description 2
- 150000003456 sulfonamides Chemical class 0.000 description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- 125000005931 tert-butyloxycarbonyl group Chemical group [H]C([H])([H])C(OC(*)=O)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- CIHOLLKRGTVIJN-UHFFFAOYSA-N tert‐butyl hydroperoxide Chemical compound CC(C)(C)OO CIHOLLKRGTVIJN-UHFFFAOYSA-N 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- 150000003536 tetrazoles Chemical group 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 2
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 2
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 2
- 229940096522 trimethylolpropane triacrylate Drugs 0.000 description 2
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 2
- KOZCZZVUFDCZGG-UHFFFAOYSA-N vinyl benzoate Chemical compound C=COC(=O)C1=CC=CC=C1 KOZCZZVUFDCZGG-UHFFFAOYSA-N 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
- WRXCBRHBHGNNQA-UHFFFAOYSA-N (2,4-dichlorobenzoyl) 2,4-dichlorobenzenecarboperoxoate Chemical compound ClC1=CC(Cl)=CC=C1C(=O)OOC(=O)C1=CC=C(Cl)C=C1Cl WRXCBRHBHGNNQA-UHFFFAOYSA-N 0.000 description 1
- VMHYWKBKHMYRNF-UHFFFAOYSA-N (2-chlorophenyl)-phenylmethanone Chemical compound ClC1=CC=CC=C1C(=O)C1=CC=CC=C1 VMHYWKBKHMYRNF-UHFFFAOYSA-N 0.000 description 1
- CKGKXGQVRVAKEA-UHFFFAOYSA-N (2-methylphenyl)-phenylmethanone Chemical compound CC1=CC=CC=C1C(=O)C1=CC=CC=C1 CKGKXGQVRVAKEA-UHFFFAOYSA-N 0.000 description 1
- HGXJDMCMYLEZMJ-UHFFFAOYSA-N (2-methylpropan-2-yl)oxy 2,2-dimethylpropaneperoxoate Chemical compound CC(C)(C)OOOC(=O)C(C)(C)C HGXJDMCMYLEZMJ-UHFFFAOYSA-N 0.000 description 1
- NMHPKVDFYDXHHV-UHFFFAOYSA-N (2-methylpropan-2-yl)oxy 7,7-dimethyloctaneperoxoate Chemical compound CC(C)(C)CCCCCC(=O)OOOC(C)(C)C NMHPKVDFYDXHHV-UHFFFAOYSA-N 0.000 description 1
- QBYIENPQHBMVBV-HFEGYEGKSA-N (2R)-2-hydroxy-2-phenylacetic acid Chemical compound O[C@@H](C(O)=O)c1ccccc1.O[C@@H](C(O)=O)c1ccccc1 QBYIENPQHBMVBV-HFEGYEGKSA-N 0.000 description 1
- ZORJPNCZZRLEDF-UHFFFAOYSA-N (3-methoxy-3-methylbutoxy)carbonyloxy (3-methoxy-3-methylbutyl) carbonate Chemical compound COC(C)(C)CCOC(=O)OOC(=O)OCCC(C)(C)OC ZORJPNCZZRLEDF-UHFFFAOYSA-N 0.000 description 1
- URBLVRAVOIVZFJ-UHFFFAOYSA-N (3-methylphenyl)-phenylmethanone Chemical compound CC1=CC=CC(C(=O)C=2C=CC=CC=2)=C1 URBLVRAVOIVZFJ-UHFFFAOYSA-N 0.000 description 1
- KEOLYBMGRQYQTN-UHFFFAOYSA-N (4-bromophenyl)-phenylmethanone Chemical compound C1=CC(Br)=CC=C1C(=O)C1=CC=CC=C1 KEOLYBMGRQYQTN-UHFFFAOYSA-N 0.000 description 1
- WXPWZZHELZEVPO-UHFFFAOYSA-N (4-methylphenyl)-phenylmethanone Chemical compound C1=CC(C)=CC=C1C(=O)C1=CC=CC=C1 WXPWZZHELZEVPO-UHFFFAOYSA-N 0.000 description 1
- OAKFFVBGTSPYEG-UHFFFAOYSA-N (4-prop-2-enoyloxycyclohexyl) prop-2-enoate Chemical compound C=CC(=O)OC1CCC(OC(=O)C=C)CC1 OAKFFVBGTSPYEG-UHFFFAOYSA-N 0.000 description 1
- 125000000008 (C1-C10) alkyl group Chemical group 0.000 description 1
- 125000004400 (C1-C12) alkyl group Chemical group 0.000 description 1
- 125000006273 (C1-C3) alkyl group Chemical group 0.000 description 1
- 125000006274 (C1-C3)alkoxy group Chemical group 0.000 description 1
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 description 1
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 description 1
- 239000001124 (E)-prop-1-ene-1,2,3-tricarboxylic acid Substances 0.000 description 1
- DNIAPMSPPWPWGF-GSVOUGTGSA-N (R)-(-)-Propylene glycol Chemical class C[C@@H](O)CO DNIAPMSPPWPWGF-GSVOUGTGSA-N 0.000 description 1
- FGTUGLXGCCYKPJ-SPIKMXEPSA-N (Z)-but-2-enedioic acid 2-[2-(2-hydroxyethoxy)ethoxy]ethanol Chemical compound OC(=O)\C=C/C(O)=O.OC(=O)\C=C/C(O)=O.OCCOCCOCCO FGTUGLXGCCYKPJ-SPIKMXEPSA-N 0.000 description 1
- FFJCNSLCJOQHKM-CLFAGFIQSA-N (z)-1-[(z)-octadec-9-enoxy]octadec-9-ene Chemical compound CCCCCCCC\C=C/CCCCCCCCOCCCCCCCC\C=C/CCCCCCCC FFJCNSLCJOQHKM-CLFAGFIQSA-N 0.000 description 1
- SORHAFXJCOXOIC-CCAGOZQPSA-N (z)-4-[2-[(z)-3-carboxyprop-2-enoyl]oxyethoxy]-4-oxobut-2-enoic acid Chemical compound OC(=O)\C=C/C(=O)OCCOC(=O)\C=C/C(O)=O SORHAFXJCOXOIC-CCAGOZQPSA-N 0.000 description 1
- MJYFYGVCLHNRKB-UHFFFAOYSA-N 1,1,2-trifluoroethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(F)(F)CF MJYFYGVCLHNRKB-UHFFFAOYSA-N 0.000 description 1
- NALFRYPTRXKZPN-UHFFFAOYSA-N 1,1-bis(tert-butylperoxy)-3,3,5-trimethylcyclohexane Chemical compound CC1CC(C)(C)CC(OOC(C)(C)C)(OOC(C)(C)C)C1 NALFRYPTRXKZPN-UHFFFAOYSA-N 0.000 description 1
- HSLFISVKRDQEBY-UHFFFAOYSA-N 1,1-bis(tert-butylperoxy)cyclohexane Chemical compound CC(C)(C)OOC1(OOC(C)(C)C)CCCCC1 HSLFISVKRDQEBY-UHFFFAOYSA-N 0.000 description 1
- BEQKKZICTDFVMG-UHFFFAOYSA-N 1,2,3,4,6-pentaoxepane-5,7-dione Chemical compound O=C1OOOOC(=O)O1 BEQKKZICTDFVMG-UHFFFAOYSA-N 0.000 description 1
- VDYWHVQKENANGY-UHFFFAOYSA-N 1,3-Butyleneglycol dimethacrylate Chemical compound CC(=C)C(=O)OC(C)CCOC(=O)C(C)=C VDYWHVQKENANGY-UHFFFAOYSA-N 0.000 description 1
- YHMYGUUIMTVXNW-UHFFFAOYSA-N 1,3-dihydrobenzimidazole-2-thione Chemical compound C1=CC=C2NC(S)=NC2=C1 YHMYGUUIMTVXNW-UHFFFAOYSA-N 0.000 description 1
- WNXJIVFYUVYPPR-UHFFFAOYSA-N 1,3-dioxolane Chemical compound C1COCO1 WNXJIVFYUVYPPR-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 1
- DKEGCUDAFWNSSO-UHFFFAOYSA-N 1,8-dibromooctane Chemical compound BrCCCCCCCCBr DKEGCUDAFWNSSO-UHFFFAOYSA-N 0.000 description 1
- BYEMOPAVGULHAT-UHFFFAOYSA-N 1-(2-methylphenyl)propan-1-ol Chemical compound CCC(O)C1=CC=CC=C1C BYEMOPAVGULHAT-UHFFFAOYSA-N 0.000 description 1
- OGBWMWKMTUSNKE-UHFFFAOYSA-N 1-(2-methylprop-2-enoyloxy)hexyl 2-methylprop-2-enoate Chemical compound CCCCCC(OC(=O)C(C)=C)OC(=O)C(C)=C OGBWMWKMTUSNKE-UHFFFAOYSA-N 0.000 description 1
- ONBQEOIKXPHGMB-VBSBHUPXSA-N 1-[2-[(2s,3r,4s,5r)-3,4-dihydroxy-5-(hydroxymethyl)oxolan-2-yl]oxy-4,6-dihydroxyphenyl]-3-(4-hydroxyphenyl)propan-1-one Chemical compound O[C@@H]1[C@H](O)[C@@H](CO)O[C@H]1OC1=CC(O)=CC(O)=C1C(=O)CCC1=CC=C(O)C=C1 ONBQEOIKXPHGMB-VBSBHUPXSA-N 0.000 description 1
- HNAGHMKIPMKKBB-UHFFFAOYSA-N 1-benzylpyrrolidine-3-carboxamide Chemical compound C1C(C(=O)N)CCN1CC1=CC=CC=C1 HNAGHMKIPMKKBB-UHFFFAOYSA-N 0.000 description 1
- XXCVIFJHBFNFBO-UHFFFAOYSA-N 1-ethenoxyoctane Chemical compound CCCCCCCCOC=C XXCVIFJHBFNFBO-UHFFFAOYSA-N 0.000 description 1
- OVGRCEFMXPHEBL-UHFFFAOYSA-N 1-ethenoxypropane Chemical compound CCCOC=C OVGRCEFMXPHEBL-UHFFFAOYSA-N 0.000 description 1
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 description 1
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 1
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 description 1
- IBLKWZIFZMJLFL-UHFFFAOYSA-N 1-phenoxypropan-2-ol Chemical compound CC(O)COC1=CC=CC=C1 IBLKWZIFZMJLFL-UHFFFAOYSA-N 0.000 description 1
- QWWTXMUURQLKOT-UHFFFAOYSA-N 1-phenoxypropan-2-yl acetate Chemical compound CC(=O)OC(C)COC1=CC=CC=C1 QWWTXMUURQLKOT-UHFFFAOYSA-N 0.000 description 1
- KUIZKZHDMPERHR-UHFFFAOYSA-N 1-phenylprop-2-en-1-one Chemical compound C=CC(=O)C1=CC=CC=C1 KUIZKZHDMPERHR-UHFFFAOYSA-N 0.000 description 1
- VOBUAPTXJKMNCT-UHFFFAOYSA-N 1-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound CCCCCC(OC(=O)C=C)OC(=O)C=C VOBUAPTXJKMNCT-UHFFFAOYSA-N 0.000 description 1
- FENFUOGYJVOCRY-UHFFFAOYSA-N 1-propoxypropan-2-ol Chemical compound CCCOCC(C)O FENFUOGYJVOCRY-UHFFFAOYSA-N 0.000 description 1
- HFZLSTDPRQSZCQ-UHFFFAOYSA-N 1-pyrrolidin-3-ylpyrrolidine Chemical compound C1CCCN1C1CNCC1 HFZLSTDPRQSZCQ-UHFFFAOYSA-N 0.000 description 1
- KGRVJHAUYBGFFP-UHFFFAOYSA-N 2,2'-Methylenebis(4-methyl-6-tert-butylphenol) Chemical compound CC(C)(C)C1=CC(C)=CC(CC=2C(=C(C=C(C)C=2)C(C)(C)C)O)=C1O KGRVJHAUYBGFFP-UHFFFAOYSA-N 0.000 description 1
- VBHXIMACZBQHPX-UHFFFAOYSA-N 2,2,2-trifluoroethyl prop-2-enoate Chemical compound FC(F)(F)COC(=O)C=C VBHXIMACZBQHPX-UHFFFAOYSA-N 0.000 description 1
- HQOVXPHOJANJBR-UHFFFAOYSA-N 2,2-bis(tert-butylperoxy)butane Chemical compound CC(C)(C)OOC(C)(CC)OOC(C)(C)C HQOVXPHOJANJBR-UHFFFAOYSA-N 0.000 description 1
- PIZHFBODNLEQBL-UHFFFAOYSA-N 2,2-diethoxy-1-phenylethanone Chemical compound CCOC(OCC)C(=O)C1=CC=CC=C1 PIZHFBODNLEQBL-UHFFFAOYSA-N 0.000 description 1
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 1
- GQHTUMJGOHRCHB-UHFFFAOYSA-N 2,3,4,6,7,8,9,10-octahydropyrimido[1,2-a]azepine Chemical compound C1CCCCN2CCCN=C21 GQHTUMJGOHRCHB-UHFFFAOYSA-N 0.000 description 1
- MJCJFUJXVGIUOD-UHFFFAOYSA-N 2,3-dimethylbutane-1,2,3-tricarboxylic acid Chemical compound OC(=O)C(C)(C)C(C)(C(O)=O)CC(O)=O MJCJFUJXVGIUOD-UHFFFAOYSA-N 0.000 description 1
- QWQNFXDYOCUEER-UHFFFAOYSA-N 2,3-ditert-butyl-4-methylphenol Chemical compound CC1=CC=C(O)C(C(C)(C)C)=C1C(C)(C)C QWQNFXDYOCUEER-UHFFFAOYSA-N 0.000 description 1
- BUZAXYQQRMDUTM-UHFFFAOYSA-N 2,4,4-trimethylpentan-2-yl prop-2-enoate Chemical compound CC(C)(C)CC(C)(C)OC(=O)C=C BUZAXYQQRMDUTM-UHFFFAOYSA-N 0.000 description 1
- RICRAVHJCLFPFF-UHFFFAOYSA-N 2,4,6-tris(chloromethyl)-1,3,5-triazine Chemical compound ClCC1=NC(CCl)=NC(CCl)=N1 RICRAVHJCLFPFF-UHFFFAOYSA-N 0.000 description 1
- CCZNFGBAORROPB-UHFFFAOYSA-N 2,4,6-tris(dibromomethyl)-1,3,5-triazine Chemical compound BrC(Br)C1=NC(C(Br)Br)=NC(C(Br)Br)=N1 CCZNFGBAORROPB-UHFFFAOYSA-N 0.000 description 1
- LNRJBPCTMHMOFA-UHFFFAOYSA-N 2,4,6-tris(dichloromethyl)-1,3,5-triazine Chemical compound ClC(Cl)C1=NC(C(Cl)Cl)=NC(C(Cl)Cl)=N1 LNRJBPCTMHMOFA-UHFFFAOYSA-N 0.000 description 1
- URJAUSYMVIZTHC-UHFFFAOYSA-N 2,4,6-tris(tribromomethyl)-1,3,5-triazine Chemical compound BrC(Br)(Br)C1=NC(C(Br)(Br)Br)=NC(C(Br)(Br)Br)=N1 URJAUSYMVIZTHC-UHFFFAOYSA-N 0.000 description 1
- DXUMYHZTYVPBEZ-UHFFFAOYSA-N 2,4,6-tris(trichloromethyl)-1,3,5-triazine Chemical compound ClC(Cl)(Cl)C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 DXUMYHZTYVPBEZ-UHFFFAOYSA-N 0.000 description 1
- QZZJTWAHFMBFSX-UHFFFAOYSA-N 2,4-bis(trichloromethyl)-1,3,5-triazine Chemical compound ClC(Cl)(Cl)C1=NC=NC(C(Cl)(Cl)Cl)=N1 QZZJTWAHFMBFSX-UHFFFAOYSA-N 0.000 description 1
- BRKORVYTKKLNKX-UHFFFAOYSA-N 2,4-di(propan-2-yl)thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C(C)C)=CC(C(C)C)=C3SC2=C1 BRKORVYTKKLNKX-UHFFFAOYSA-N 0.000 description 1
- BTJPUDCSZVCXFQ-UHFFFAOYSA-N 2,4-diethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC(CC)=C3SC2=C1 BTJPUDCSZVCXFQ-UHFFFAOYSA-N 0.000 description 1
- LCHAFMWSFCONOO-UHFFFAOYSA-N 2,4-dimethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC(C)=C3SC2=C1 LCHAFMWSFCONOO-UHFFFAOYSA-N 0.000 description 1
- DMWVYCCGCQPJEA-UHFFFAOYSA-N 2,5-bis(tert-butylperoxy)-2,5-dimethylhexane Chemical compound CC(C)(C)OOC(C)(C)CCC(C)(C)OOC(C)(C)C DMWVYCCGCQPJEA-UHFFFAOYSA-N 0.000 description 1
- JGBAASVQPMTVHO-UHFFFAOYSA-N 2,5-dihydroperoxy-2,5-dimethylhexane Chemical compound OOC(C)(C)CCC(C)(C)OO JGBAASVQPMTVHO-UHFFFAOYSA-N 0.000 description 1
- 150000003923 2,5-pyrrolediones Chemical class 0.000 description 1
- JONNRYNDZVEZFH-UHFFFAOYSA-N 2-(2-butoxypropoxy)propyl acetate Chemical compound CCCCOC(C)COC(C)COC(C)=O JONNRYNDZVEZFH-UHFFFAOYSA-N 0.000 description 1
- WWFGWFOXPLGSBE-UHFFFAOYSA-N 2-(2-carboxypropan-2-yldiazenyl)-2,3-dimethylbutanoic acid Chemical compound CC(C)C(C)(C(O)=O)N=NC(C)(C)C(O)=O WWFGWFOXPLGSBE-UHFFFAOYSA-N 0.000 description 1
- GBOJZXLCJZDBKO-UHFFFAOYSA-N 2-(2-chlorophenyl)-2-[2-(2-chlorophenyl)-4,5-diphenylimidazol-2-yl]-4,5-diphenylimidazole Chemical compound ClC1=CC=CC=C1C1(C2(N=C(C(=N2)C=2C=CC=CC=2)C=2C=CC=CC=2)C=2C(=CC=CC=2)Cl)N=C(C=2C=CC=CC=2)C(C=2C=CC=CC=2)=N1 GBOJZXLCJZDBKO-UHFFFAOYSA-N 0.000 description 1
- FPZWZCWUIYYYBU-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethyl acetate Chemical compound CCOCCOCCOC(C)=O FPZWZCWUIYYYBU-UHFFFAOYSA-N 0.000 description 1
- HZMXJTJBSWOCQB-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethyl prop-2-enoate Chemical compound COCCOCCOC(=O)C=C HZMXJTJBSWOCQB-UHFFFAOYSA-N 0.000 description 1
- GYQVIILSLSOFDA-UHFFFAOYSA-N 2-(2-methylphenyl)-2-[2-(2-methylphenyl)-4,5-diphenylimidazol-2-yl]-4,5-diphenylimidazole Chemical compound CC1=CC=CC=C1C1(C2(N=C(C(=N2)C=2C=CC=CC=2)C=2C=CC=CC=2)C=2C(=CC=CC=2)C)N=C(C=2C=CC=CC=2)C(C=2C=CC=CC=2)=N1 GYQVIILSLSOFDA-UHFFFAOYSA-N 0.000 description 1
- FNHQLSVILKHZNI-UHFFFAOYSA-N 2-(2-nitrophenyl)-2-[2-(2-nitrophenyl)-4,5-diphenylimidazol-2-yl]-4,5-diphenylimidazole Chemical compound [O-][N+](=O)C1=CC=CC=C1C1(C2(N=C(C(=N2)C=2C=CC=CC=2)C=2C=CC=CC=2)C=2C(=CC=CC=2)[N+]([O-])=O)N=C(C=2C=CC=CC=2)C(C=2C=CC=CC=2)=N1 FNHQLSVILKHZNI-UHFFFAOYSA-N 0.000 description 1
- JQMHKLIYLYQITD-UHFFFAOYSA-N 2-(2-phenylethenyl)-1,3,4-oxadiazole Chemical compound N=1N=COC=1C=CC1=CC=CC=C1 JQMHKLIYLYQITD-UHFFFAOYSA-N 0.000 description 1
- NNZJWOOLGPPUKX-UHFFFAOYSA-N 2-(2-phenylethenyl)-5-(trichloromethyl)-1,3,4-oxadiazole Chemical compound O1C(C(Cl)(Cl)Cl)=NN=C1C=CC1=CC=CC=C1 NNZJWOOLGPPUKX-UHFFFAOYSA-N 0.000 description 1
- XMNIXWIUMCBBBL-UHFFFAOYSA-N 2-(2-phenylpropan-2-ylperoxy)propan-2-ylbenzene Chemical compound C=1C=CC=CC=1C(C)(C)OOC(C)(C)C1=CC=CC=C1 XMNIXWIUMCBBBL-UHFFFAOYSA-N 0.000 description 1
- UFBBZQDFWTVNGP-UHFFFAOYSA-N 2-(2-propoxypropoxy)propyl acetate Chemical compound CCCOC(C)COC(C)COC(C)=O UFBBZQDFWTVNGP-UHFFFAOYSA-N 0.000 description 1
- WJKHYAJKIXYSHS-UHFFFAOYSA-N 2-(4-chlorophenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C1=CC(Cl)=CC=C1C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 WJKHYAJKIXYSHS-UHFFFAOYSA-N 0.000 description 1
- QRHHZFRCJDAUNA-UHFFFAOYSA-N 2-(4-methoxyphenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C1=CC(OC)=CC=C1C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 QRHHZFRCJDAUNA-UHFFFAOYSA-N 0.000 description 1
- MPNIGZBDAMWHSX-UHFFFAOYSA-N 2-(4-methylphenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C1=CC(C)=CC=C1C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 MPNIGZBDAMWHSX-UHFFFAOYSA-N 0.000 description 1
- XLQIRWWNVOTDQS-UHFFFAOYSA-N 2-(7-oxabicyclo[4.1.0]hepta-1(6),2,4-trien-4-yl)-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound ClC(Cl)(Cl)C1=NC(C(Cl)(Cl)Cl)=NC(C=2C=C3OC3=CC=2)=N1 XLQIRWWNVOTDQS-UHFFFAOYSA-N 0.000 description 1
- OXQGTIUCKGYOAA-UHFFFAOYSA-N 2-Ethylbutanoic acid Chemical compound CCC(CC)C(O)=O OXQGTIUCKGYOAA-UHFFFAOYSA-N 0.000 description 1
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 1
- RFCQDOVPMUSZMN-UHFFFAOYSA-N 2-Naphthalenethiol Chemical compound C1=CC=CC2=CC(S)=CC=C21 RFCQDOVPMUSZMN-UHFFFAOYSA-N 0.000 description 1
- MCNPOZMLKGDJGP-QPJJXVBHSA-N 2-[(e)-2-(4-methoxyphenyl)ethenyl]-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C1=CC(OC)=CC=C1\C=C\C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 MCNPOZMLKGDJGP-QPJJXVBHSA-N 0.000 description 1
- APJRQJNSYFWQJD-GGWOSOGESA-N 2-[(e)-but-2-enoyl]oxyethyl (e)-but-2-enoate Chemical compound C\C=C\C(=O)OCCOC(=O)\C=C\C APJRQJNSYFWQJD-GGWOSOGESA-N 0.000 description 1
- APJRQJNSYFWQJD-GLIMQPGKSA-N 2-[(z)-but-2-enoyl]oxyethyl (z)-but-2-enoate Chemical compound C\C=C/C(=O)OCCOC(=O)\C=C/C APJRQJNSYFWQJD-GLIMQPGKSA-N 0.000 description 1
- JDSQBDGCMUXRBM-UHFFFAOYSA-N 2-[2-(2-butoxypropoxy)propoxy]propan-1-ol Chemical compound CCCCOC(C)COC(C)COC(C)CO JDSQBDGCMUXRBM-UHFFFAOYSA-N 0.000 description 1
- WFSMVVDJSNMRAR-UHFFFAOYSA-N 2-[2-(2-ethoxyethoxy)ethoxy]ethanol Chemical compound CCOCCOCCOCCO WFSMVVDJSNMRAR-UHFFFAOYSA-N 0.000 description 1
- XSZBRHHUQAOBTR-UHFFFAOYSA-N 2-[2-(2-methoxypropoxy)propoxy]propyl acetate Chemical compound COC(C)COC(C)COC(C)COC(C)=O XSZBRHHUQAOBTR-UHFFFAOYSA-N 0.000 description 1
- YJGHMLJGPSVSLF-UHFFFAOYSA-N 2-[2-(2-octanoyloxyethoxy)ethoxy]ethyl octanoate Chemical compound CCCCCCCC(=O)OCCOCCOCCOC(=O)CCCCCCC YJGHMLJGPSVSLF-UHFFFAOYSA-N 0.000 description 1
- MCNPOZMLKGDJGP-UHFFFAOYSA-N 2-[2-(4-methoxyphenyl)ethenyl]-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C1=CC(OC)=CC=C1C=CC1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 MCNPOZMLKGDJGP-UHFFFAOYSA-N 0.000 description 1
- HWSSEYVMGDIFMH-UHFFFAOYSA-N 2-[2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOCCOC(=O)C(C)=C HWSSEYVMGDIFMH-UHFFFAOYSA-N 0.000 description 1
- VRIWPZCNGVKMOF-UHFFFAOYSA-N 2-[2-[2-[2-(2-hydroxyethoxy)ethoxy]ethoxy]ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOCCOCCOCCO VRIWPZCNGVKMOF-UHFFFAOYSA-N 0.000 description 1
- VIYWVRIBDZTTMH-UHFFFAOYSA-N 2-[4-[2-[4-[2-(2-methylprop-2-enoyloxy)ethoxy]phenyl]propan-2-yl]phenoxy]ethyl 2-methylprop-2-enoate Chemical compound C1=CC(OCCOC(=O)C(=C)C)=CC=C1C(C)(C)C1=CC=C(OCCOC(=O)C(C)=C)C=C1 VIYWVRIBDZTTMH-UHFFFAOYSA-N 0.000 description 1
- HDDQXUDCEIMISH-UHFFFAOYSA-N 2-[[4-[1,2,2-tris[4-(oxiran-2-ylmethoxy)phenyl]ethyl]phenoxy]methyl]oxirane Chemical compound C1OC1COC(C=C1)=CC=C1C(C=1C=CC(OCC2OC2)=CC=1)C(C=1C=CC(OCC2OC2)=CC=1)C(C=C1)=CC=C1OCC1CO1 HDDQXUDCEIMISH-UHFFFAOYSA-N 0.000 description 1
- XGYZGXHSCJSEBK-UHFFFAOYSA-N 2-[[4-[3,5-dimethyl-4-(oxiran-2-ylmethyl)phenyl]-2,6-dimethylphenyl]methyl]oxirane Chemical group CC1=CC(C=2C=C(C)C(CC3OC3)=C(C)C=2)=CC(C)=C1CC1CO1 XGYZGXHSCJSEBK-UHFFFAOYSA-N 0.000 description 1
- IGZBSJAMZHNHKE-UHFFFAOYSA-N 2-[[4-[bis[4-(oxiran-2-ylmethoxy)phenyl]methyl]phenoxy]methyl]oxirane Chemical compound C1OC1COC(C=C1)=CC=C1C(C=1C=CC(OCC2OC2)=CC=1)C(C=C1)=CC=C1OCC1CO1 IGZBSJAMZHNHKE-UHFFFAOYSA-N 0.000 description 1
- 125000000022 2-aminoethyl group Chemical group [H]C([*])([H])C([H])([H])N([H])[H] 0.000 description 1
- FGTYTUFKXYPTML-UHFFFAOYSA-N 2-benzoylbenzoic acid Chemical compound OC(=O)C1=CC=CC=C1C(=O)C1=CC=CC=C1 FGTYTUFKXYPTML-UHFFFAOYSA-N 0.000 description 1
- RXJXDPDHNAYULH-UHFFFAOYSA-N 2-benzyl-2-(dimethylamino)-4-morpholin-4-yl-1-phenylbutan-1-one Chemical compound C=1C=CC=CC=1CC(C(=O)C=1C=CC=CC=1)(N(C)C)CCN1CCOCC1 RXJXDPDHNAYULH-UHFFFAOYSA-N 0.000 description 1
- QEMUVGKPNFMGAZ-UHFFFAOYSA-N 2-benzylsulfanyl-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound ClC(Cl)(Cl)C1=NC(C(Cl)(Cl)Cl)=NC(SCC=2C=CC=CC=2)=N1 QEMUVGKPNFMGAZ-UHFFFAOYSA-N 0.000 description 1
- 125000006276 2-bromophenyl group Chemical group [H]C1=C([H])C(Br)=C(*)C([H])=C1[H] 0.000 description 1
- GPOGMJLHWQHEGF-UHFFFAOYSA-N 2-chloroethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCl GPOGMJLHWQHEGF-UHFFFAOYSA-N 0.000 description 1
- 125000004182 2-chlorophenyl group Chemical group [H]C1=C([H])C(Cl)=C(*)C([H])=C1[H] 0.000 description 1
- ZCDADJXRUCOCJE-UHFFFAOYSA-N 2-chlorothioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC=C3SC2=C1 ZCDADJXRUCOCJE-UHFFFAOYSA-N 0.000 description 1
- KRDXTHSSNCTAGY-UHFFFAOYSA-N 2-cyclohexylpyrrolidine Chemical compound C1CCNC1C1CCCCC1 KRDXTHSSNCTAGY-UHFFFAOYSA-N 0.000 description 1
- BFSVOASYOCHEOV-UHFFFAOYSA-N 2-diethylaminoethanol Chemical compound CCN(CC)CCO BFSVOASYOCHEOV-UHFFFAOYSA-N 0.000 description 1
- VUIWJRYTWUGOOF-UHFFFAOYSA-N 2-ethenoxyethanol Chemical compound OCCOC=C VUIWJRYTWUGOOF-UHFFFAOYSA-N 0.000 description 1
- VGZZAZYCLRYTNQ-UHFFFAOYSA-N 2-ethoxyethoxycarbonyloxy 2-ethoxyethyl carbonate Chemical compound CCOCCOC(=O)OOC(=O)OCCOCC VGZZAZYCLRYTNQ-UHFFFAOYSA-N 0.000 description 1
- YJQMXVDKXSQCDI-UHFFFAOYSA-N 2-ethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC=C3SC2=C1 YJQMXVDKXSQCDI-UHFFFAOYSA-N 0.000 description 1
- MIRQGKQPLPBZQM-UHFFFAOYSA-N 2-hydroperoxy-2,4,4-trimethylpentane Chemical compound CC(C)(C)CC(C)(C)OO MIRQGKQPLPBZQM-UHFFFAOYSA-N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- GWZMWHWAWHPNHN-UHFFFAOYSA-N 2-hydroxypropyl prop-2-enoate Chemical group CC(O)COC(=O)C=C GWZMWHWAWHPNHN-UHFFFAOYSA-N 0.000 description 1
- FLFWJIBUZQARMD-UHFFFAOYSA-N 2-mercapto-1,3-benzoxazole Chemical compound C1=CC=C2OC(S)=NC2=C1 FLFWJIBUZQARMD-UHFFFAOYSA-N 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- GDVIZLVBBHYJMF-UHFFFAOYSA-N 2-methoxy-2-phenoxyacetic acid Chemical compound COC(C(O)=O)OC1=CC=CC=C1 GDVIZLVBBHYJMF-UHFFFAOYSA-N 0.000 description 1
- XYKPEDAFWPOVCY-UHFFFAOYSA-N 2-methoxy-4,6-bis(tribromomethyl)-1,3,5-triazine Chemical compound COC1=NC(C(Br)(Br)Br)=NC(C(Br)(Br)Br)=N1 XYKPEDAFWPOVCY-UHFFFAOYSA-N 0.000 description 1
- GOTIJEQQGSMAIN-UHFFFAOYSA-N 2-methyl-4,6-bis(tribromomethyl)-1,3,5-triazine Chemical compound CC1=NC(C(Br)(Br)Br)=NC(C(Br)(Br)Br)=N1 GOTIJEQQGSMAIN-UHFFFAOYSA-N 0.000 description 1
- LETDRANQSOEVCX-UHFFFAOYSA-N 2-methyl-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound CC1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 LETDRANQSOEVCX-UHFFFAOYSA-N 0.000 description 1
- TURITJIWSQEMDB-UHFFFAOYSA-N 2-methyl-n-[(2-methylprop-2-enoylamino)methyl]prop-2-enamide Chemical compound CC(=C)C(=O)NCNC(=O)C(C)=C TURITJIWSQEMDB-UHFFFAOYSA-N 0.000 description 1
- YBKWKURHPIBUEM-UHFFFAOYSA-N 2-methyl-n-[6-(2-methylprop-2-enoylamino)hexyl]prop-2-enamide Chemical compound CC(=C)C(=O)NCCCCCCNC(=O)C(C)=C YBKWKURHPIBUEM-UHFFFAOYSA-N 0.000 description 1
- GDHSRTFITZTMMP-UHFFFAOYSA-N 2-methylidenebutanedioic acid;propane-1,2-diol Chemical compound CC(O)CO.OC(=O)CC(=C)C(O)=O.OC(=O)CC(=C)C(O)=O GDHSRTFITZTMMP-UHFFFAOYSA-N 0.000 description 1
- HHCHLHOEAKKCAB-UHFFFAOYSA-N 2-oxaspiro[3.5]nonane-1,3-dione Chemical compound O=C1OC(=O)C11CCCCC1 HHCHLHOEAKKCAB-UHFFFAOYSA-N 0.000 description 1
- HAZQZUFYRLFOLC-UHFFFAOYSA-N 2-phenyl-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound ClC(Cl)(Cl)C1=NC(C(Cl)(Cl)Cl)=NC(C=2C=CC=CC=2)=N1 HAZQZUFYRLFOLC-UHFFFAOYSA-N 0.000 description 1
- WLJVXDMOQOGPHL-PPJXEINESA-N 2-phenylacetic acid Chemical compound O[14C](=O)CC1=CC=CC=C1 WLJVXDMOQOGPHL-PPJXEINESA-N 0.000 description 1
- LVFFZQQWIZURIO-UHFFFAOYSA-N 2-phenylbutanedioic acid Chemical compound OC(=O)CC(C(O)=O)C1=CC=CC=C1 LVFFZQQWIZURIO-UHFFFAOYSA-N 0.000 description 1
- AGBXYHCHUYARJY-UHFFFAOYSA-N 2-phenylethenesulfonic acid Chemical compound OS(=O)(=O)C=CC1=CC=CC=C1 AGBXYHCHUYARJY-UHFFFAOYSA-N 0.000 description 1
- RCUOAHPSDFRHOR-UHFFFAOYSA-N 2-phenylsulfanyl-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound ClC(Cl)(Cl)C1=NC(C(Cl)(Cl)Cl)=NC(SC=2C=CC=CC=2)=N1 RCUOAHPSDFRHOR-UHFFFAOYSA-N 0.000 description 1
- VFZKVQVQOMDJEG-UHFFFAOYSA-N 2-prop-2-enoyloxypropyl prop-2-enoate Chemical compound C=CC(=O)OC(C)COC(=O)C=C VFZKVQVQOMDJEG-UHFFFAOYSA-N 0.000 description 1
- KTALPKYXQZGAEG-UHFFFAOYSA-N 2-propan-2-ylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C(C)C)=CC=C3SC2=C1 KTALPKYXQZGAEG-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- DOSGQNSHFPTAOA-UHFFFAOYSA-N 2-propyl-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound CCCC1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 DOSGQNSHFPTAOA-UHFFFAOYSA-N 0.000 description 1
- 125000001494 2-propynyl group Chemical group [H]C#CC([H])([H])* 0.000 description 1
- HXIQYSLFEXIOAV-UHFFFAOYSA-N 2-tert-butyl-4-(5-tert-butyl-4-hydroxy-2-methylphenyl)sulfanyl-5-methylphenol Chemical compound CC1=CC(O)=C(C(C)(C)C)C=C1SC1=CC(C(C)(C)C)=C(O)C=C1C HXIQYSLFEXIOAV-UHFFFAOYSA-N 0.000 description 1
- MGADZUXDNSDTHW-UHFFFAOYSA-N 2H-pyran Chemical compound C1OC=CC=C1 MGADZUXDNSDTHW-UHFFFAOYSA-N 0.000 description 1
- FRIBMENBGGCKPD-UHFFFAOYSA-N 3-(2,3-dimethoxyphenyl)prop-2-enal Chemical compound COC1=CC=CC(C=CC=O)=C1OC FRIBMENBGGCKPD-UHFFFAOYSA-N 0.000 description 1
- XYFRHHAYSXIKGH-UHFFFAOYSA-N 3-(5-methoxy-2-methoxycarbonyl-1h-indol-3-yl)prop-2-enoic acid Chemical compound C1=C(OC)C=C2C(C=CC(O)=O)=C(C(=O)OC)NC2=C1 XYFRHHAYSXIKGH-UHFFFAOYSA-N 0.000 description 1
- REEBWSYYNPPSKV-UHFFFAOYSA-N 3-[(4-formylphenoxy)methyl]thiophene-2-carbonitrile Chemical compound C1=CC(C=O)=CC=C1OCC1=C(C#N)SC=C1 REEBWSYYNPPSKV-UHFFFAOYSA-N 0.000 description 1
- MPAGVACEWQNVQO-UHFFFAOYSA-N 3-acetyloxybutyl acetate Chemical compound CC(=O)OC(C)CCOC(C)=O MPAGVACEWQNVQO-UHFFFAOYSA-N 0.000 description 1
- NTKBNCABAMQDIG-UHFFFAOYSA-N 3-butoxypropan-1-ol Chemical compound CCCCOCCCO NTKBNCABAMQDIG-UHFFFAOYSA-N 0.000 description 1
- HTZFLOOLLIJZEQ-UHFFFAOYSA-N 3-butyl-5-(dimethylamino)-3-phenyl-4-(1,3,5-triazin-2-ylamino)-4h-chromen-2-one Chemical compound C1=CC=C(N(C)C)C2=C1OC(=O)C(CCCC)(C=1C=CC=CC=1)C2NC1=NC=NC=N1 HTZFLOOLLIJZEQ-UHFFFAOYSA-N 0.000 description 1
- USICVVZOKTZACS-UHFFFAOYSA-N 3-butylpyrrole-2,5-dione Chemical compound CCCCC1=CC(=O)NC1=O USICVVZOKTZACS-UHFFFAOYSA-N 0.000 description 1
- LLPQEUFUXCVMSC-UHFFFAOYSA-N 3-chloro-5-(diethylamino)-3-phenyl-4-(1,3,5-triazin-2-ylamino)-4h-chromen-2-one Chemical compound C1=2C(N(CC)CC)=CC=CC=2OC(=O)C(Cl)(C=2C=CC=CC=2)C1NC1=NC=NC=N1 LLPQEUFUXCVMSC-UHFFFAOYSA-N 0.000 description 1
- UJTRCPVECIHPBG-UHFFFAOYSA-N 3-cyclohexylpyrrole-2,5-dione Chemical compound O=C1NC(=O)C(C2CCCCC2)=C1 UJTRCPVECIHPBG-UHFFFAOYSA-N 0.000 description 1
- JRXXEXVXTFEBIY-UHFFFAOYSA-N 3-ethoxypropanoic acid Chemical compound CCOCCC(O)=O JRXXEXVXTFEBIY-UHFFFAOYSA-N 0.000 description 1
- LTGIABFFKMIMIR-UHFFFAOYSA-N 3-phenyl-2-[5-(trichloromethyl)-1,3,4-oxadiazol-2-yl]prop-2-enenitrile Chemical compound O1C(C(Cl)(Cl)Cl)=NN=C1C(C#N)=CC1=CC=CC=C1 LTGIABFFKMIMIR-UHFFFAOYSA-N 0.000 description 1
- IYMZEPRSPLASMS-UHFFFAOYSA-N 3-phenylpyrrole-2,5-dione Chemical compound O=C1NC(=O)C(C=2C=CC=CC=2)=C1 IYMZEPRSPLASMS-UHFFFAOYSA-N 0.000 description 1
- FQMIAEWUVYWVNB-UHFFFAOYSA-N 3-prop-2-enoyloxybutyl prop-2-enoate Chemical compound C=CC(=O)OC(C)CCOC(=O)C=C FQMIAEWUVYWVNB-UHFFFAOYSA-N 0.000 description 1
- CYUZOYPRAQASLN-UHFFFAOYSA-N 3-prop-2-enoyloxypropanoic acid Chemical compound OC(=O)CCOC(=O)C=C CYUZOYPRAQASLN-UHFFFAOYSA-N 0.000 description 1
- JIGUICYYOYEXFS-UHFFFAOYSA-N 3-tert-butylbenzene-1,2-diol Chemical compound CC(C)(C)C1=CC=CC(O)=C1O JIGUICYYOYEXFS-UHFFFAOYSA-N 0.000 description 1
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 1
- XOJWAAUYNWGQAU-UHFFFAOYSA-N 4-(2-methylprop-2-enoyloxy)butyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCCOC(=O)C(C)=C XOJWAAUYNWGQAU-UHFFFAOYSA-N 0.000 description 1
- MKTOIPPVFPJEQO-UHFFFAOYSA-N 4-(3-carboxypropanoylperoxy)-4-oxobutanoic acid Chemical compound OC(=O)CCC(=O)OOC(=O)CCC(O)=O MKTOIPPVFPJEQO-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- BGNGWHSBYQYVRX-UHFFFAOYSA-N 4-(dimethylamino)benzaldehyde Chemical compound CN(C)C1=CC=C(C=O)C=C1 BGNGWHSBYQYVRX-UHFFFAOYSA-N 0.000 description 1
- KTZOPXAHXBBDBX-FCXRPNKRSA-N 4-[(e)-but-2-enoyl]oxybutyl (e)-but-2-enoate Chemical compound C\C=C\C(=O)OCCCCOC(=O)\C=C\C KTZOPXAHXBBDBX-FCXRPNKRSA-N 0.000 description 1
- VBNIYPOGDJUMEM-UHFFFAOYSA-N 4-[2-(4-methoxyphenyl)ethenyl]-6-(trichloromethyl)-1,3,5-triazin-2-amine Chemical compound C1=CC(OC)=CC=C1C=CC1=NC(N)=NC(C(Cl)(Cl)Cl)=N1 VBNIYPOGDJUMEM-UHFFFAOYSA-N 0.000 description 1
- ACQVEWFMUBXEMR-UHFFFAOYSA-N 4-bromo-2-fluoro-6-nitrophenol Chemical compound OC1=C(F)C=C(Br)C=C1[N+]([O-])=O ACQVEWFMUBXEMR-UHFFFAOYSA-N 0.000 description 1
- IRQWEODKXLDORP-UHFFFAOYSA-N 4-ethenylbenzoic acid Chemical compound OC(=O)C1=CC=C(C=C)C=C1 IRQWEODKXLDORP-UHFFFAOYSA-N 0.000 description 1
- NDWUBGAGUCISDV-UHFFFAOYSA-N 4-hydroxybutyl prop-2-enoate Chemical group OCCCCOC(=O)C=C NDWUBGAGUCISDV-UHFFFAOYSA-N 0.000 description 1
- JHWGFJBTMHEZME-UHFFFAOYSA-N 4-prop-2-enoyloxybutyl prop-2-enoate Chemical compound C=CC(=O)OCCCCOC(=O)C=C JHWGFJBTMHEZME-UHFFFAOYSA-N 0.000 description 1
- ZMGMDXCADSRNCX-UHFFFAOYSA-N 5,6-dihydroxy-1,3-diazepan-2-one Chemical group OC1CNC(=O)NCC1O ZMGMDXCADSRNCX-UHFFFAOYSA-N 0.000 description 1
- FVCSARBUZVPSQF-UHFFFAOYSA-N 5-(2,4-dioxooxolan-3-yl)-7-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C(C(OC2=O)=O)C2C(C)=CC1C1C(=O)COC1=O FVCSARBUZVPSQF-UHFFFAOYSA-N 0.000 description 1
- QBEAJGUCDQJJOV-UHFFFAOYSA-N 5-amino-3-methyl-3-phenyl-4-(1,3,5-triazin-2-ylamino)-4h-chromen-2-one Chemical compound C12=C(N)C=CC=C2OC(=O)C(C)(C=2C=CC=CC=2)C1NC1=NC=NC=N1 QBEAJGUCDQJJOV-UHFFFAOYSA-N 0.000 description 1
- UNPYQHQUDMGKJW-UHFFFAOYSA-N 6-trimethoxysilylhex-1-en-3-one Chemical compound CO[Si](OC)(OC)CCCC(=O)C=C UNPYQHQUDMGKJW-UHFFFAOYSA-N 0.000 description 1
- KDCGOANMDULRCW-UHFFFAOYSA-N 7H-purine Chemical group N1=CNC2=NC=NC2=C1 KDCGOANMDULRCW-UHFFFAOYSA-N 0.000 description 1
- YDTZWEXADJYOBJ-UHFFFAOYSA-N 9-(7-acridin-9-ylheptyl)acridine Chemical compound C1=CC=C2C(CCCCCCCC=3C4=CC=CC=C4N=C4C=CC=CC4=3)=C(C=CC=C3)C3=NC2=C1 YDTZWEXADJYOBJ-UHFFFAOYSA-N 0.000 description 1
- MTRFEWTWIPAXLG-UHFFFAOYSA-N 9-phenylacridine Chemical compound C1=CC=CC=C1C1=C(C=CC=C2)C2=NC2=CC=CC=C12 MTRFEWTWIPAXLG-UHFFFAOYSA-N 0.000 description 1
- GJCOSYZMQJWQCA-UHFFFAOYSA-N 9H-xanthene Chemical compound C1=CC=C2CC3=CC=CC=C3OC2=C1 GJCOSYZMQJWQCA-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Natural products CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 1
- 241000251468 Actinopterygii Species 0.000 description 1
- 229910017750 AgSn Inorganic materials 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- 235000021357 Behenic acid Nutrition 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- OQNJQBAJZIPASW-UHFFFAOYSA-N C(C)OC(=O)CC=1C(=C(C=CC1)C1=NC(=NC(=N1)C(Cl)(Cl)Cl)C(Cl)(Cl)Cl)N Chemical compound C(C)OC(=O)CC=1C(=C(C=CC1)C1=NC(=NC(=N1)C(Cl)(Cl)Cl)C(Cl)(Cl)Cl)N OQNJQBAJZIPASW-UHFFFAOYSA-N 0.000 description 1
- 125000003860 C1-C20 alkoxy group Chemical group 0.000 description 1
- GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 description 1
- LAKGQRZUKPZJDH-GLIMQPGKSA-N C\C=C/C(=O)OCC(CO)(CO)COC(=O)\C=C/C Chemical compound C\C=C/C(=O)OCC(CO)(CO)COC(=O)\C=C/C LAKGQRZUKPZJDH-GLIMQPGKSA-N 0.000 description 1
- 239000005632 Capric acid (CAS 334-48-5) Substances 0.000 description 1
- 239000005635 Caprylic acid (CAS 124-07-2) Substances 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- 229920002134 Carboxymethyl cellulose Polymers 0.000 description 1
- LZZYPRNAOMGNLH-UHFFFAOYSA-M Cetrimonium bromide Chemical compound [Br-].CCCCCCCCCCCCCCCC[N+](C)(C)C LZZYPRNAOMGNLH-UHFFFAOYSA-M 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 1
- 239000005751 Copper oxide Substances 0.000 description 1
- ORGPJDKNYMVLFL-UHFFFAOYSA-N Coumalic acid Chemical compound OC(=O)C=1C=CC(=O)OC=1 ORGPJDKNYMVLFL-UHFFFAOYSA-N 0.000 description 1
- RGHNJXZEOKUKBD-UHFFFAOYSA-N D-gluconic acid Natural products OCC(O)C(O)C(O)C(O)C(O)=O RGHNJXZEOKUKBD-UHFFFAOYSA-N 0.000 description 1
- MQIUGAXCHLFZKX-UHFFFAOYSA-N Di-n-octyl phthalate Natural products CCCCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCCC MQIUGAXCHLFZKX-UHFFFAOYSA-N 0.000 description 1
- PYGXAGIECVVIOZ-UHFFFAOYSA-N Dibutyl decanedioate Chemical compound CCCCOC(=O)CCCCCCCCC(=O)OCCCC PYGXAGIECVVIOZ-UHFFFAOYSA-N 0.000 description 1
- ORAWFNKFUWGRJG-UHFFFAOYSA-N Docosanamide Chemical compound CCCCCCCCCCCCCCCCCCCCCC(N)=O ORAWFNKFUWGRJG-UHFFFAOYSA-N 0.000 description 1
- 241000196324 Embryophyta Species 0.000 description 1
- XXRCUYVCPSWGCC-UHFFFAOYSA-N Ethyl pyruvate Chemical compound CCOC(=O)C(C)=O XXRCUYVCPSWGCC-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- HSRJKNPTNIJEKV-UHFFFAOYSA-N Guaifenesin Chemical compound COC1=CC=CC=C1OCC(O)CO HSRJKNPTNIJEKV-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- NQSMEZJWJJVYOI-UHFFFAOYSA-N Methyl 2-benzoylbenzoate Chemical compound COC(=O)C1=CC=CC=C1C(=O)C1=CC=CC=C1 NQSMEZJWJJVYOI-UHFFFAOYSA-N 0.000 description 1
- QRMHDGWGLNLHMN-UHFFFAOYSA-N Methyl methoxyacetate Chemical group COCC(=O)OC QRMHDGWGLNLHMN-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- CNCOEDDPFOAUMB-UHFFFAOYSA-N N-Methylolacrylamide Chemical compound OCNC(=O)C=C CNCOEDDPFOAUMB-UHFFFAOYSA-N 0.000 description 1
- UEEJHVSXFDXPFK-UHFFFAOYSA-N N-dimethylaminoethanol Chemical compound CN(C)CCO UEEJHVSXFDXPFK-UHFFFAOYSA-N 0.000 description 1
- NPKSPKHJBVJUKB-UHFFFAOYSA-N N-phenylglycine Chemical compound OC(=O)CNC1=CC=CC=C1 NPKSPKHJBVJUKB-UHFFFAOYSA-N 0.000 description 1
- LRYAPECLTRYCTR-UHFFFAOYSA-N NC(=O)C=C.NC(=O)C=C.NC(=O)C=C.NCCNCCN Chemical compound NC(=O)C=C.NC(=O)C=C.NC(=O)C=C.NCCNCCN LRYAPECLTRYCTR-UHFFFAOYSA-N 0.000 description 1
- 241000047703 Nonion Species 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- YDMUKYUKJKCOEE-SPIKMXEPSA-N OC(=O)\C=C/C(O)=O.OC(=O)\C=C/C(O)=O.OCC(CO)(CO)CO Chemical compound OC(=O)\C=C/C(O)=O.OC(=O)\C=C/C(O)=O.OCC(CO)(CO)CO YDMUKYUKJKCOEE-SPIKMXEPSA-N 0.000 description 1
- BEAWHIRRACSRDJ-UHFFFAOYSA-N OCC(CO)(CO)CO.OC(=O)CC(=C)C(O)=O.OC(=O)CC(=C)C(O)=O Chemical compound OCC(CO)(CO)CO.OC(=O)CC(=C)C(O)=O.OC(=O)CC(=C)C(O)=O BEAWHIRRACSRDJ-UHFFFAOYSA-N 0.000 description 1
- 108091034117 Oligonucleotide Proteins 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 240000007594 Oryza sativa Species 0.000 description 1
- 235000007164 Oryza sativa Nutrition 0.000 description 1
- ZCQWOFVYLHDMMC-UHFFFAOYSA-N Oxazole Chemical compound C1=COC=N1 ZCQWOFVYLHDMMC-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- AMFGWXWBFGVCKG-UHFFFAOYSA-N Panavia opaque Chemical compound C1=CC(OCC(O)COC(=O)C(=C)C)=CC=C1C(C)(C)C1=CC=C(OCC(O)COC(=O)C(C)=C)C=C1 AMFGWXWBFGVCKG-UHFFFAOYSA-N 0.000 description 1
- DIQMPQMYFZXDAX-UHFFFAOYSA-N Pentyl formate Chemical compound CCCCCOC=O DIQMPQMYFZXDAX-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 229920003081 Povidone K 30 Polymers 0.000 description 1
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 1
- NRCMAYZCPIVABH-UHFFFAOYSA-N Quinacridone Chemical compound N1C2=CC=CC=C2C(=O)C2=C1C=C1C(=O)C3=CC=CC=C3NC1=C2 NRCMAYZCPIVABH-UHFFFAOYSA-N 0.000 description 1
- IWYDHOAUDWTVEP-UHFFFAOYSA-N R-2-phenyl-2-hydroxyacetic acid Natural products OC(=O)C(O)C1=CC=CC=C1 IWYDHOAUDWTVEP-UHFFFAOYSA-N 0.000 description 1
- 229920000297 Rayon Polymers 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- HUGQNTGOVJKASF-UHFFFAOYSA-N S.[I+] Chemical compound S.[I+] HUGQNTGOVJKASF-UHFFFAOYSA-N 0.000 description 1
- 244000028419 Styrax benzoin Species 0.000 description 1
- 235000000126 Styrax benzoin Nutrition 0.000 description 1
- 235000008411 Sumatra benzointree Nutrition 0.000 description 1
- YSMRWXYRXBRSND-UHFFFAOYSA-N TOTP Chemical compound CC1=CC=CC=C1OP(=O)(OC=1C(=CC=CC=1)C)OC1=CC=CC=C1C YSMRWXYRXBRSND-UHFFFAOYSA-N 0.000 description 1
- 241000534944 Thia Species 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- OKKRPWIIYQTPQF-UHFFFAOYSA-N Trimethylolpropane trimethacrylate Chemical compound CC(=C)C(=O)OCC(CC)(COC(=O)C(C)=C)COC(=O)C(C)=C OKKRPWIIYQTPQF-UHFFFAOYSA-N 0.000 description 1
- 239000007877 V-601 Substances 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- GQPVFBDWIUVLHG-UHFFFAOYSA-N [2,2-bis(hydroxymethyl)-3-(2-methylprop-2-enoyloxy)propyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(CO)(CO)COC(=O)C(C)=C GQPVFBDWIUVLHG-UHFFFAOYSA-N 0.000 description 1
- ULQMPOIOSDXIGC-UHFFFAOYSA-N [2,2-dimethyl-3-(2-methylprop-2-enoyloxy)propyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(C)(C)COC(=O)C(C)=C ULQMPOIOSDXIGC-UHFFFAOYSA-N 0.000 description 1
- TUOBEAZXHLTYLF-UHFFFAOYSA-N [2-(hydroxymethyl)-2-(prop-2-enoyloxymethyl)butyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(CC)COC(=O)C=C TUOBEAZXHLTYLF-UHFFFAOYSA-N 0.000 description 1
- JUDXBRVLWDGRBC-UHFFFAOYSA-N [2-(hydroxymethyl)-3-(2-methylprop-2-enoyloxy)-2-(2-methylprop-2-enoyloxymethyl)propyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(CO)(COC(=O)C(C)=C)COC(=O)C(C)=C JUDXBRVLWDGRBC-UHFFFAOYSA-N 0.000 description 1
- LAKGQRZUKPZJDH-GGWOSOGESA-N [2-[[(e)-but-2-enoyl]oxymethyl]-3-hydroxy-2-(hydroxymethyl)propyl] (e)-but-2-enoate Chemical compound C\C=C\C(=O)OCC(CO)(CO)COC(=O)\C=C\C LAKGQRZUKPZJDH-GGWOSOGESA-N 0.000 description 1
- VZTQQYMRXDUHDO-UHFFFAOYSA-N [2-hydroxy-3-[4-[2-[4-(2-hydroxy-3-prop-2-enoyloxypropoxy)phenyl]propan-2-yl]phenoxy]propyl] prop-2-enoate Chemical compound C=1C=C(OCC(O)COC(=O)C=C)C=CC=1C(C)(C)C1=CC=C(OCC(O)COC(=O)C=C)C=C1 VZTQQYMRXDUHDO-UHFFFAOYSA-N 0.000 description 1
- SWHLOXLFJPTYTL-UHFFFAOYSA-N [2-methyl-3-(2-methylprop-2-enoyloxy)-2-(2-methylprop-2-enoyloxymethyl)propyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(C)(COC(=O)C(C)=C)COC(=O)C(C)=C SWHLOXLFJPTYTL-UHFFFAOYSA-N 0.000 description 1
- YAAUVJUJVBJRSQ-UHFFFAOYSA-N [3-(3-sulfanylpropanoyloxy)-2-[[3-(3-sulfanylpropanoyloxy)-2,2-bis(3-sulfanylpropanoyloxymethyl)propoxy]methyl]-2-(3-sulfanylpropanoyloxymethyl)propyl] 3-sulfanylpropanoate Chemical compound SCCC(=O)OCC(COC(=O)CCS)(COC(=O)CCS)COCC(COC(=O)CCS)(COC(=O)CCS)COC(=O)CCS YAAUVJUJVBJRSQ-UHFFFAOYSA-N 0.000 description 1
- IRXUPISPXFFGEO-UHFFFAOYSA-N [B+3].S Chemical compound [B+3].S IRXUPISPXFFGEO-UHFFFAOYSA-N 0.000 description 1
- CYKMNKXPYXUVPR-UHFFFAOYSA-N [C].[Ti] Chemical compound [C].[Ti] CYKMNKXPYXUVPR-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 1
- 150000008062 acetophenones Chemical class 0.000 description 1
- 125000005595 acetylacetonate group Chemical group 0.000 description 1
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Natural products CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 229940091181 aconitic acid Drugs 0.000 description 1
- 150000001251 acridines Chemical class 0.000 description 1
- 125000005396 acrylic acid ester group Chemical group 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 125000002252 acyl group Chemical group 0.000 description 1
- 238000012644 addition polymerization Methods 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 230000003113 alkalizing effect Effects 0.000 description 1
- 150000003973 alkyl amines Chemical class 0.000 description 1
- 125000005336 allyloxy group Chemical group 0.000 description 1
- XNCRUNXWPDJHGV-UHFFFAOYSA-N alpha-Methyl-cinnamic acid Chemical compound OC(=O)C(C)=CC1=CC=CC=C1 XNCRUNXWPDJHGV-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 235000011114 ammonium hydroxide Nutrition 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- UYJXRRSPUVSSMN-UHFFFAOYSA-P ammonium sulfide Chemical compound [NH4+].[NH4+].[S-2] UYJXRRSPUVSSMN-UHFFFAOYSA-P 0.000 description 1
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 description 1
- 239000003945 anionic surfactant Substances 0.000 description 1
- 230000003466 anti-cipated effect Effects 0.000 description 1
- 229940053200 antiepileptics fatty acid derivative Drugs 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 150000001491 aromatic compounds Chemical class 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- VUEDNLCYHKSELL-UHFFFAOYSA-N arsonium Chemical class [AsH4+] VUEDNLCYHKSELL-UHFFFAOYSA-N 0.000 description 1
- 150000008378 aryl ethers Chemical class 0.000 description 1
- 125000005160 aryl oxy alkyl group Chemical group 0.000 description 1
- 125000005110 aryl thio group Chemical group 0.000 description 1
- 235000010323 ascorbic acid Nutrition 0.000 description 1
- 229960005070 ascorbic acid Drugs 0.000 description 1
- 239000011668 ascorbic acid Substances 0.000 description 1
- 229940116226 behenic acid Drugs 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- JGFLAAWSLCPCDY-UHFFFAOYSA-N benzene;cyclopenta-1,3-diene;iron Chemical compound [Fe].C1C=CC=C1.C1=CC=CC=C1 JGFLAAWSLCPCDY-UHFFFAOYSA-N 0.000 description 1
- NXDHWROSQCDBTJ-UHFFFAOYSA-N benzimidazol-2-one;2,3-dihydroisoindol-1-one Chemical compound C1=CC=C2C(=O)NCC2=C1.C1=CC=CC2=NC(=O)N=C21 NXDHWROSQCDBTJ-UHFFFAOYSA-N 0.000 description 1
- 125000005605 benzo group Chemical group 0.000 description 1
- 229940049706 benzodiazepine Drugs 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- 229960002130 benzoin Drugs 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 150000008366 benzophenones Chemical class 0.000 description 1
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical group C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 1
- NGHOLYJTSCBCGC-VAWYXSNFSA-N benzyl cinnamate Chemical group C=1C=CC=CC=1/C=C/C(=O)OCC1=CC=CC=C1 NGHOLYJTSCBCGC-VAWYXSNFSA-N 0.000 description 1
- 230000001588 bifunctional effect Effects 0.000 description 1
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 description 1
- HSUIVCLOAAJSRE-UHFFFAOYSA-N bis(2-methoxyethyl) benzene-1,2-dicarboxylate Chemical compound COCCOC(=O)C1=CC=CC=C1C(=O)OCCOC HSUIVCLOAAJSRE-UHFFFAOYSA-N 0.000 description 1
- YGWAFVKXCAQAGJ-UHFFFAOYSA-N bis(2-methylpentan-2-yl) 4-[3,4-bis(2-methylpentan-2-ylperoxycarbonyl)benzoyl]benzene-1,2-dicarboperoxoate Chemical compound C1=C(C(=O)OOC(C)(C)CCC)C(C(=O)OOC(C)(C)CCC)=CC=C1C(=O)C1=CC=C(C(=O)OOC(C)(C)CCC)C(C(=O)OOC(C)(C)CCC)=C1 YGWAFVKXCAQAGJ-UHFFFAOYSA-N 0.000 description 1
- ZFMQKOWCDKKBIF-UHFFFAOYSA-N bis(3,5-difluorophenyl)phosphane Chemical compound FC1=CC(F)=CC(PC=2C=C(F)C=C(F)C=2)=C1 ZFMQKOWCDKKBIF-UHFFFAOYSA-N 0.000 description 1
- HECGKCOICWUUJU-UHFFFAOYSA-N bis(diphenylphosphanylmethyl)-phenylphosphane Chemical compound C=1C=CC=CC=1P(C=1C=CC=CC=1)CP(C=1C=CC=CC=1)CP(C=1C=CC=CC=1)C1=CC=CC=C1 HECGKCOICWUUJU-UHFFFAOYSA-N 0.000 description 1
- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 description 1
- FAMJVEVTWNPFSF-UHFFFAOYSA-N bis[2-(2-hydroxypropan-2-yl)-4-propan-2-ylphenyl]methanone Chemical compound CC(O)(C)C1=CC(C(C)C)=CC=C1C(=O)C1=CC=C(C(C)C)C=C1C(C)(C)O FAMJVEVTWNPFSF-UHFFFAOYSA-N 0.000 description 1
- LZZMTLWFWQRJIS-UHFFFAOYSA-N bis[2-(4-propan-2-ylphenyl)propan-2-yl] 4-[3,4-bis[2-(4-propan-2-ylphenyl)propan-2-ylperoxycarbonyl]benzoyl]benzene-1,2-dicarboperoxoate Chemical compound C1=CC(C(C)C)=CC=C1C(C)(C)OOC(=O)C1=CC=C(C(=O)C=2C=C(C(C(=O)OOC(C)(C)C=3C=CC(=CC=3)C(C)C)=CC=2)C(=O)OOC(C)(C)C=2C=CC(=CC=2)C(C)C)C=C1C(=O)OOC(C)(C)C1=CC=C(C(C)C)C=C1 LZZMTLWFWQRJIS-UHFFFAOYSA-N 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 239000004841 bisphenol A epoxy resin Substances 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical class OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 125000005619 boric acid group Chemical group 0.000 description 1
- 244000309464 bull Species 0.000 description 1
- OZQCLFIWZYVKKK-UHFFFAOYSA-N butane-1,3-diol 2-methylidenebutanedioic acid Chemical compound CC(O)CCO.OC(=O)CC(=C)C(O)=O.OC(=O)CC(=C)C(O)=O OZQCLFIWZYVKKK-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- OBNCKNCVKJNDBV-UHFFFAOYSA-N butanoic acid ethyl ester Natural products CCCC(=O)OCC OBNCKNCVKJNDBV-UHFFFAOYSA-N 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- CREMABGTGYGIQB-UHFFFAOYSA-N carbon carbon Chemical compound C.C CREMABGTGYGIQB-UHFFFAOYSA-N 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 150000004651 carbonic acid esters Chemical group 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 239000001768 carboxy methyl cellulose Substances 0.000 description 1
- 235000010948 carboxy methyl cellulose Nutrition 0.000 description 1
- 239000008112 carboxymethyl-cellulose Substances 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 210000004027 cell Anatomy 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- ILGSNOOABSFVDL-UHFFFAOYSA-N cerium;n-hydroxy-n-phenylnitrous amide Chemical compound [Ce].O=NN(O)C1=CC=CC=C1 ILGSNOOABSFVDL-UHFFFAOYSA-N 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- OEYIOHPDSNJKLS-UHFFFAOYSA-N choline Chemical compound C[N+](C)(C)CCO OEYIOHPDSNJKLS-UHFFFAOYSA-N 0.000 description 1
- 229960001231 choline Drugs 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- GTZCVFVGUGFEME-IWQZZHSRSA-N cis-aconitic acid Chemical compound OC(=O)C\C(C(O)=O)=C\C(O)=O GTZCVFVGUGFEME-IWQZZHSRSA-N 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000011362 coarse particle Substances 0.000 description 1
- 229940126142 compound 16 Drugs 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 229910000431 copper oxide Inorganic materials 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 150000004775 coumarins Chemical class 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 150000003983 crown ethers Chemical class 0.000 description 1
- SPTHWAJJMLCAQF-UHFFFAOYSA-M ctk4f8481 Chemical compound [O-]O.CC(C)C1=CC=CC=C1C(C)C SPTHWAJJMLCAQF-UHFFFAOYSA-M 0.000 description 1
- 150000003950 cyclic amides Chemical group 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- UKJLNMAFNRKWGR-UHFFFAOYSA-N cyclohexatrienamine Chemical group NC1=CC=C=C[CH]1 UKJLNMAFNRKWGR-UHFFFAOYSA-N 0.000 description 1
- 125000004956 cyclohexylene group Chemical group 0.000 description 1
- PESYEWKSBIWTAK-UHFFFAOYSA-N cyclopenta-1,3-diene;titanium(2+) Chemical class [Ti+2].C=1C=C[CH-]C=1.C=1C=C[CH-]C=1 PESYEWKSBIWTAK-UHFFFAOYSA-N 0.000 description 1
- 229960002887 deanol Drugs 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- PNOXNTGLSKTMQO-UHFFFAOYSA-L diacetyloxytin Chemical compound CC(=O)O[Sn]OC(C)=O PNOXNTGLSKTMQO-UHFFFAOYSA-L 0.000 description 1
- 125000004663 dialkyl amino group Chemical group 0.000 description 1
- 125000005520 diaryliodonium group Chemical group 0.000 description 1
- 239000012954 diazonium Substances 0.000 description 1
- 150000001989 diazonium salts Chemical class 0.000 description 1
- 150000001991 dicarboxylic acids Chemical class 0.000 description 1
- PUFGCEQWYLJYNJ-UHFFFAOYSA-N didodecyl benzene-1,2-dicarboxylate Chemical compound CCCCCCCCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCCCCCCC PUFGCEQWYLJYNJ-UHFFFAOYSA-N 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- 229940019778 diethylene glycol diethyl ether Drugs 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- UYAAVKFHBMJOJZ-UHFFFAOYSA-N diimidazo[1,3-b:1',3'-e]pyrazine-5,10-dione Chemical compound O=C1C2=CN=CN2C(=O)C2=CN=CN12 UYAAVKFHBMJOJZ-UHFFFAOYSA-N 0.000 description 1
- 239000012972 dimethylethanolamine Substances 0.000 description 1
- OREAFAJWWJHCOT-UHFFFAOYSA-N dimethylmalonic acid Chemical compound OC(=O)C(C)(C)C(O)=O OREAFAJWWJHCOT-UHFFFAOYSA-N 0.000 description 1
- 239000002612 dispersion medium Substances 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- KGGOIDKBHYYNIC-UHFFFAOYSA-N ditert-butyl 4-[3,4-bis(tert-butylperoxycarbonyl)benzoyl]benzene-1,2-dicarboperoxoate Chemical compound C1=C(C(=O)OOC(C)(C)C)C(C(=O)OOC(C)(C)C)=CC=C1C(=O)C1=CC=C(C(=O)OOC(C)(C)C)C(C(=O)OOC(C)(C)C)=C1 KGGOIDKBHYYNIC-UHFFFAOYSA-N 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 150000002118 epoxides Chemical class 0.000 description 1
- DAOJMFXILKTYRL-UHFFFAOYSA-N ethane-1,2-diol;2-methylidenebutanedioic acid Chemical compound OCCO.OC(=O)CC(=C)C(O)=O.OC(=O)CC(=C)C(O)=O DAOJMFXILKTYRL-UHFFFAOYSA-N 0.000 description 1
- NHOGGUYTANYCGQ-UHFFFAOYSA-N ethenoxybenzene Chemical class C=COC1=CC=CC=C1 NHOGGUYTANYCGQ-UHFFFAOYSA-N 0.000 description 1
- XJELOQYISYPGDX-UHFFFAOYSA-N ethenyl 2-chloroacetate Chemical compound ClCC(=O)OC=C XJELOQYISYPGDX-UHFFFAOYSA-N 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- GLHBZXAMBGYQJO-UHFFFAOYSA-N ethyl 2-[4-[4,6-bis(trichloromethyl)-1,3,5-triazin-2-yl]-3-bromo-n-(2-ethoxy-2-oxoethyl)anilino]acetate Chemical compound BrC1=CC(N(CC(=O)OCC)CC(=O)OCC)=CC=C1C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 GLHBZXAMBGYQJO-UHFFFAOYSA-N 0.000 description 1
- WNIHNYUROPJCLW-UHFFFAOYSA-N ethyl 2-ethoxy-2-methylpropanoate Chemical compound CCOC(=O)C(C)(C)OCC WNIHNYUROPJCLW-UHFFFAOYSA-N 0.000 description 1
- WHRLOJCOIKOQGL-UHFFFAOYSA-N ethyl 2-methoxypropanoate Chemical compound CCOC(=O)C(C)OC WHRLOJCOIKOQGL-UHFFFAOYSA-N 0.000 description 1
- FJAKCEHATXBFJT-UHFFFAOYSA-N ethyl 2-oxobutanoate Chemical compound CCOC(=O)C(=O)CC FJAKCEHATXBFJT-UHFFFAOYSA-N 0.000 description 1
- XPKFLEVLLPKCIW-UHFFFAOYSA-N ethyl 4-(diethylamino)benzoate Chemical class CCOC(=O)C1=CC=C(N(CC)CC)C=C1 XPKFLEVLLPKCIW-UHFFFAOYSA-N 0.000 description 1
- RBVLUTAXWVILBT-UHFFFAOYSA-N ethyl prop-2-eneperoxoate Chemical compound CCOOC(=O)C=C RBVLUTAXWVILBT-UHFFFAOYSA-N 0.000 description 1
- 229940117360 ethyl pyruvate Drugs 0.000 description 1
- UKFXDFUAPNAMPJ-UHFFFAOYSA-N ethylmalonic acid Chemical compound CCC(C(O)=O)C(O)=O UKFXDFUAPNAMPJ-UHFFFAOYSA-N 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 1
- 125000003709 fluoroalkyl group Chemical group 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- DWXAVNJYFLGAEF-UHFFFAOYSA-N furan-2-ylmethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1=CC=CO1 DWXAVNJYFLGAEF-UHFFFAOYSA-N 0.000 description 1
- 239000000174 gluconic acid Substances 0.000 description 1
- 235000012208 gluconic acid Nutrition 0.000 description 1
- VANNPISTIUFMLH-UHFFFAOYSA-N glutaric anhydride Chemical compound O=C1CCCC(=O)O1 VANNPISTIUFMLH-UHFFFAOYSA-N 0.000 description 1
- 125000003827 glycol group Chemical group 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 125000004836 hexamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- ACCCMOQWYVYDOT-UHFFFAOYSA-N hexane-1,1-diol Chemical compound CCCCCC(O)O ACCCMOQWYVYDOT-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000001093 holography Methods 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 239000000852 hydrogen donor Substances 0.000 description 1
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 235000019239 indanthrene blue RS Nutrition 0.000 description 1
- UHOKSCJSTAHBSO-UHFFFAOYSA-N indanthrone blue Chemical compound C1=CC=C2C(=O)C3=CC=C4NC5=C6C(=O)C7=CC=CC=C7C(=O)C6=CC=C5NC4=C3C(=O)C2=C1 UHOKSCJSTAHBSO-UHFFFAOYSA-N 0.000 description 1
- 125000003454 indenyl group Chemical group C1(C=CC2=CC=CC=C12)* 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- PZOUSPYUWWUPPK-UHFFFAOYSA-N indole Natural products CC1=CC=CC2=C1C=CN2 PZOUSPYUWWUPPK-UHFFFAOYSA-N 0.000 description 1
- RKJUIXBNRJVNHR-UHFFFAOYSA-N indolenine Natural products C1=CC=C2CC=NC2=C1 RKJUIXBNRJVNHR-UHFFFAOYSA-N 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- MGFYSGNNHQQTJW-UHFFFAOYSA-N iodonium Chemical compound [IH2+] MGFYSGNNHQQTJW-UHFFFAOYSA-N 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 229940117955 isoamyl acetate Drugs 0.000 description 1
- PXZQEOJJUGGUIB-UHFFFAOYSA-N isoindolin-1-one Chemical compound C1=CC=C2C(=O)NCC2=C1 PXZQEOJJUGGUIB-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000004816 latex Substances 0.000 description 1
- 229920000126 latex Polymers 0.000 description 1
- QDLAGTHXVHQKRE-UHFFFAOYSA-N lichenxanthone Natural products COC1=CC(O)=C2C(=O)C3=C(C)C=C(OC)C=C3OC2=C1 QDLAGTHXVHQKRE-UHFFFAOYSA-N 0.000 description 1
- CDOSHBSSFJOMGT-UHFFFAOYSA-N linalool Chemical compound CC(C)=CCCC(C)(O)C=C CDOSHBSSFJOMGT-UHFFFAOYSA-N 0.000 description 1
- 238000010551 living anionic polymerization reaction Methods 0.000 description 1
- 229920002521 macromolecule Polymers 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229960002510 mandelic acid Drugs 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 239000008204 material by function Substances 0.000 description 1
- 230000028161 membrane depolarization Effects 0.000 description 1
- HNEGQIOMVPPMNR-NSCUHMNNSA-N mesaconic acid Chemical compound OC(=O)C(/C)=C/C(O)=O HNEGQIOMVPPMNR-NSCUHMNNSA-N 0.000 description 1
- AUHZEENZYGFFBQ-UHFFFAOYSA-N mesitylene Substances CC1=CC(C)=CC(C)=C1 AUHZEENZYGFFBQ-UHFFFAOYSA-N 0.000 description 1
- 125000001827 mesitylenyl group Chemical group [H]C1=C(C(*)=C(C([H])=C1C([H])([H])[H])C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 239000011817 metal compound particle Substances 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- RMIODHQZRUFFFF-UHFFFAOYSA-N methoxyacetic acid Chemical compound COCC(O)=O RMIODHQZRUFFFF-UHFFFAOYSA-N 0.000 description 1
- YDKNBNOOCSNPNS-UHFFFAOYSA-N methyl 1,3-benzoxazole-2-carboxylate Chemical compound C1=CC=C2OC(C(=O)OC)=NC2=C1 YDKNBNOOCSNPNS-UHFFFAOYSA-N 0.000 description 1
- YVWPDYFVVMNWDT-UHFFFAOYSA-N methyl 2-ethoxypropanoate Chemical compound CCOC(C)C(=O)OC YVWPDYFVVMNWDT-UHFFFAOYSA-N 0.000 description 1
- LPEKGGXMPWTOCB-UHFFFAOYSA-N methyl 2-hydroxypropionate Chemical group COC(=O)C(C)O LPEKGGXMPWTOCB-UHFFFAOYSA-N 0.000 description 1
- AKWHOGIYEOZALP-UHFFFAOYSA-N methyl 2-methoxy-2-methylpropanoate Chemical compound COC(=O)C(C)(C)OC AKWHOGIYEOZALP-UHFFFAOYSA-N 0.000 description 1
- XPIWVCAMONZQCP-UHFFFAOYSA-N methyl 2-oxobutanoate Chemical compound CCC(=O)C(=O)OC XPIWVCAMONZQCP-UHFFFAOYSA-N 0.000 description 1
- BDJSOPWXYLFTNW-UHFFFAOYSA-N methyl 3-methoxypropanoate Chemical compound COCCC(=O)OC BDJSOPWXYLFTNW-UHFFFAOYSA-N 0.000 description 1
- CWKLZLBVOJRSOM-UHFFFAOYSA-N methyl pyruvate Chemical compound COC(=O)C(C)=O CWKLZLBVOJRSOM-UHFFFAOYSA-N 0.000 description 1
- HNEGQIOMVPPMNR-UHFFFAOYSA-N methylfumaric acid Natural products OC(=O)C(C)=CC(O)=O HNEGQIOMVPPMNR-UHFFFAOYSA-N 0.000 description 1
- ZIYVHBGGAOATLY-UHFFFAOYSA-N methylmalonic acid Chemical compound OC(=O)C(C)C(O)=O ZIYVHBGGAOATLY-UHFFFAOYSA-N 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 150000002763 monocarboxylic acids Chemical class 0.000 description 1
- 125000002950 monocyclic group Chemical group 0.000 description 1
- 150000004712 monophosphates Chemical class 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- ZIUHHBKFKCYYJD-UHFFFAOYSA-N n,n'-methylenebisacrylamide Chemical compound C=CC(=O)NCNC(=O)C=C ZIUHHBKFKCYYJD-UHFFFAOYSA-N 0.000 description 1
- BZFWSDQZPYVFHP-UHFFFAOYSA-N n,n-dimethyl-4-methylsulfanylaniline Chemical compound CSC1=CC=C(N(C)C)C=C1 BZFWSDQZPYVFHP-UHFFFAOYSA-N 0.000 description 1
- UUORTJUPDJJXST-UHFFFAOYSA-N n-(2-hydroxyethyl)prop-2-enamide Chemical compound OCCNC(=O)C=C UUORTJUPDJJXST-UHFFFAOYSA-N 0.000 description 1
- QYZFTMMPKCOTAN-UHFFFAOYSA-N n-[2-(2-hydroxyethylamino)ethyl]-2-[[1-[2-(2-hydroxyethylamino)ethylamino]-2-methyl-1-oxopropan-2-yl]diazenyl]-2-methylpropanamide Chemical compound OCCNCCNC(=O)C(C)(C)N=NC(C)(C)C(=O)NCCNCCO QYZFTMMPKCOTAN-UHFFFAOYSA-N 0.000 description 1
- YQCFXPARMSSRRK-UHFFFAOYSA-N n-[6-(prop-2-enoylamino)hexyl]prop-2-enamide Chemical compound C=CC(=O)NCCCCCCNC(=O)C=C YQCFXPARMSSRRK-UHFFFAOYSA-N 0.000 description 1
- BNTUIAFSOCHRHV-UHFFFAOYSA-N n-ethyl-n-phenylprop-2-enamide Chemical compound C=CC(=O)N(CC)C1=CC=CC=C1 BNTUIAFSOCHRHV-UHFFFAOYSA-N 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- AWIZFKXFPHTRHN-UHFFFAOYSA-N naphtho[2,3-f]quinoline Chemical compound C1=CC=C2C3=CC4=CC=CC=C4C=C3C=CC2=N1 AWIZFKXFPHTRHN-UHFFFAOYSA-N 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 230000000269 nucleophilic effect Effects 0.000 description 1
- ZWLPBLYKEWSWPD-UHFFFAOYSA-N o-toluic acid Chemical compound CC1=CC=CC=C1C(O)=O ZWLPBLYKEWSWPD-UHFFFAOYSA-N 0.000 description 1
- 229960002446 octanoic acid Drugs 0.000 description 1
- 229920002114 octoxynol-9 Polymers 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 1
- WCPAKWJPBJAGKN-UHFFFAOYSA-N oxadiazole Chemical compound C1=CON=N1 WCPAKWJPBJAGKN-UHFFFAOYSA-N 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 125000002971 oxazolyl group Chemical group 0.000 description 1
- 150000002923 oximes Chemical class 0.000 description 1
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 1
- KOOHRIRWWIYFRH-UHFFFAOYSA-N oxolan-2-one;prop-2-enoic acid Chemical compound OC(=O)C=C.O=C1CCCO1 KOOHRIRWWIYFRH-UHFFFAOYSA-N 0.000 description 1
- CKMXAIVXVKGGFM-UHFFFAOYSA-N p-cumic acid Chemical compound CC(C)C1=CC=C(C(O)=O)C=C1 CKMXAIVXVKGGFM-UHFFFAOYSA-N 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- FZUGPQWGEGAKET-UHFFFAOYSA-N parbenate Chemical compound CCOC(=O)C1=CC=C(N(C)C)C=C1 FZUGPQWGEGAKET-UHFFFAOYSA-N 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 1
- 125000005327 perimidinyl group Chemical group N1C(=NC2=CC=CC3=CC=CC1=C23)* 0.000 description 1
- DGBWPZSGHAXYGK-UHFFFAOYSA-N perinone Chemical compound C12=NC3=CC=CC=C3N2C(=O)C2=CC=C3C4=C2C1=CC=C4C(=O)N1C2=CC=CC=C2N=C13 DGBWPZSGHAXYGK-UHFFFAOYSA-N 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 150000003009 phosphonic acids Chemical group 0.000 description 1
- XYFCBTPGUUZFHI-UHFFFAOYSA-O phosphonium Chemical compound [PH4+] XYFCBTPGUUZFHI-UHFFFAOYSA-O 0.000 description 1
- 150000004714 phosphonium salts Chemical class 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 150000003021 phthalic acid derivatives Chemical class 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229940110337 pigment blue 1 Drugs 0.000 description 1
- CLYVDMAATCIVBF-UHFFFAOYSA-N pigment red 224 Chemical compound C=12C3=CC=C(C(OC4=O)=O)C2=C4C=CC=1C1=CC=C2C(=O)OC(=O)C4=CC=C3C1=C42 CLYVDMAATCIVBF-UHFFFAOYSA-N 0.000 description 1
- 229940067265 pigment yellow 138 Drugs 0.000 description 1
- IUGYQRQAERSCNH-UHFFFAOYSA-N pivalic acid Chemical compound CC(C)(C)C(O)=O IUGYQRQAERSCNH-UHFFFAOYSA-N 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920001983 poloxamer Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920006149 polyester-amide block copolymer Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920001228 polyisocyanate Polymers 0.000 description 1
- 239000005056 polyisocyanate Substances 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- 229920000259 polyoxyethylene lauryl ether Polymers 0.000 description 1
- 239000000244 polyoxyethylene sorbitan monooleate Substances 0.000 description 1
- 235000010482 polyoxyethylene sorbitan monooleate Nutrition 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 150000007519 polyprotic acids Polymers 0.000 description 1
- 229920000053 polysorbate 80 Polymers 0.000 description 1
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 1
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000004321 preservation Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 239000011164 primary particle Substances 0.000 description 1
- NARVIWMVBMUEOG-UHFFFAOYSA-N prop-1-en-2-ol Chemical group CC(O)=C NARVIWMVBMUEOG-UHFFFAOYSA-N 0.000 description 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
- BWJUFXUULUEGMA-UHFFFAOYSA-N propan-2-yl propan-2-yloxycarbonyloxy carbonate Chemical compound CC(C)OC(=O)OOC(=O)OC(C)C BWJUFXUULUEGMA-UHFFFAOYSA-N 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- CYIRLFJPTCUCJB-UHFFFAOYSA-N propyl 2-methoxypropanoate Chemical compound CCCOC(=O)C(C)OC CYIRLFJPTCUCJB-UHFFFAOYSA-N 0.000 description 1
- ILPVOWZUBFRIAX-UHFFFAOYSA-N propyl 2-oxopropanoate Chemical compound CCCOC(=O)C(C)=O ILPVOWZUBFRIAX-UHFFFAOYSA-N 0.000 description 1
- 229940116423 propylene glycol diacetate Drugs 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000005297 pyrex Substances 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- 229940030966 pyrrole Drugs 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 125000002294 quinazolinyl group Chemical group N1=C(N=CC2=CC=CC=C12)* 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 235000009566 rice Nutrition 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 239000011540 sensing material Substances 0.000 description 1
- 230000001235 sensitizing effect Effects 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 239000011257 shell material Substances 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 229920005573 silicon-containing polymer Polymers 0.000 description 1
- 229910000108 silver(I,III) oxide Inorganic materials 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 235000017550 sodium carbonate Nutrition 0.000 description 1
- FQENQNTWSFEDLI-UHFFFAOYSA-J sodium diphosphate Chemical compound [Na+].[Na+].[Na+].[Na+].[O-]P([O-])(=O)OP([O-])([O-])=O FQENQNTWSFEDLI-UHFFFAOYSA-J 0.000 description 1
- 235000011121 sodium hydroxide Nutrition 0.000 description 1
- 235000019795 sodium metasilicate Nutrition 0.000 description 1
- 229940048086 sodium pyrophosphate Drugs 0.000 description 1
- 235000019794 sodium silicate Nutrition 0.000 description 1
- KZOJQMWTKJDSQJ-UHFFFAOYSA-M sodium;2,3-dibutylnaphthalene-1-sulfonate Chemical compound [Na+].C1=CC=C2C(S([O-])(=O)=O)=C(CCCC)C(CCCC)=CC2=C1 KZOJQMWTKJDSQJ-UHFFFAOYSA-M 0.000 description 1
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000003335 steric effect Effects 0.000 description 1
- 125000000547 substituted alkyl group Chemical group 0.000 description 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 1
- 150000003464 sulfur compounds Chemical class 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- HIFJUMGIHIZEPX-UHFFFAOYSA-N sulfuric acid;sulfur trioxide Chemical compound O=S(=O)=O.OS(O)(=O)=O HIFJUMGIHIZEPX-UHFFFAOYSA-N 0.000 description 1
- 230000008093 supporting effect Effects 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- JZFHXRUVMKEOFG-UHFFFAOYSA-N tert-butyl dodecaneperoxoate Chemical compound CCCCCCCCCCCC(=O)OOC(C)(C)C JZFHXRUVMKEOFG-UHFFFAOYSA-N 0.000 description 1
- BWSZXUOMATYHHI-UHFFFAOYSA-N tert-butyl octaneperoxoate Chemical compound CCCCCCCC(=O)OOC(C)(C)C BWSZXUOMATYHHI-UHFFFAOYSA-N 0.000 description 1
- 229940073455 tetraethylammonium hydroxide Drugs 0.000 description 1
- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 description 1
- 235000019818 tetrasodium diphosphate Nutrition 0.000 description 1
- 239000001577 tetrasodium phosphonato phosphate Substances 0.000 description 1
- VLLMWSRANPNYQX-UHFFFAOYSA-N thiadiazole Chemical compound C1=CSN=N1.C1=CSN=N1 VLLMWSRANPNYQX-UHFFFAOYSA-N 0.000 description 1
- 125000000101 thioether group Chemical group 0.000 description 1
- JOUDBUYBGJYFFP-FOCLMDBBSA-N thioindigo Chemical compound S\1C2=CC=CC=C2C(=O)C/1=C1/C(=O)C2=CC=CC=C2S1 JOUDBUYBGJYFFP-FOCLMDBBSA-N 0.000 description 1
- 229930192474 thiophene Natural products 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 125000005424 tosyloxy group Chemical group S(=O)(=O)(C1=CC=C(C)C=C1)O* 0.000 description 1
- GTZCVFVGUGFEME-UHFFFAOYSA-N trans-aconitic acid Natural products OC(=O)CC(C(O)=O)=CC(O)=O GTZCVFVGUGFEME-UHFFFAOYSA-N 0.000 description 1
- 230000002463 transducing effect Effects 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- URAYPUMNDPQOKB-UHFFFAOYSA-N triacetin Chemical compound CC(=O)OCC(OC(C)=O)COC(C)=O URAYPUMNDPQOKB-UHFFFAOYSA-N 0.000 description 1
- 229960002622 triacetin Drugs 0.000 description 1
- PWBHRVGYSMBMIO-UHFFFAOYSA-M tributylstannanylium;acetate Chemical compound CCCC[Sn](CCCC)(CCCC)OC(C)=O PWBHRVGYSMBMIO-UHFFFAOYSA-M 0.000 description 1
- JLGLQAWTXXGVEM-UHFFFAOYSA-N triethylene glycol monomethyl ether Chemical compound COCCOCCOCCO JLGLQAWTXXGVEM-UHFFFAOYSA-N 0.000 description 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
- 239000013638 trimer Substances 0.000 description 1
- PZJJKWKADRNWSW-UHFFFAOYSA-N trimethoxysilicon Chemical group CO[Si](OC)OC PZJJKWKADRNWSW-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 150000003673 urethanes Chemical class 0.000 description 1
- 229940005605 valeric acid Drugs 0.000 description 1
- ZTWTYVWXUKTLCP-UHFFFAOYSA-N vinylphosphonic acid Chemical compound OP(O)(=O)C=C ZTWTYVWXUKTLCP-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/201—Filters in the form of arrays
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133502—Antiglare, refractive index matching layers
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
Landscapes
- Physics & Mathematics (AREA)
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Abstract
본 발명은 착색 화소 형성용 경화성 조성물에 의해 형성되고, CIE표색계에 있어서 C광원에서의 색순도가 NTSC방식의 3원색 색도점의 면적(100)에 대하여 65%이상인 착색 화소와 차광부 형성용 경화성 조성물에 의해 형성되고 광학 농도(OD값)가 4.5이상이고, 폭 5∼15㎛의 차광부를 갖고, 컬러 필터 콘트라스트비가 5000이상인 컬러 필터에 관한 것이다.The present invention is formed of a curable composition for forming colored pixels, wherein the color purity in the C light source is 65% or more with respect to the area 100 of the three primary color chromaticity points of the NTSC system, and the curable composition for forming the light shielding portion. And a light filter having an optical density (OD value) of 4.5 or more, a width of 5 to 15 µm, and a color filter contrast ratio of 5000 or more.
Description
본 발명은 액정표시소자(LCD)나 고체촬상소자(CCD, CMOS 등) 등에 사용되는 컬러 필터, 그것을 구비한 액정표시장치 및 컬러 필터의 착색 화소나 차광부의 형성에 적합한 경화성 조성물에 관한 것이다. The present invention relates to a color filter used for a liquid crystal display device (LCD), a solid state image pickup device (CCD, CMOS, etc.), a liquid crystal display device having the same, and a curable composition suitable for forming colored pixels or light blocking portions of a color filter.
컬러 필터는 액정 디스플레이나 고체촬상소자에 불가결한 구성 부품이다.The color filter is an essential component of a liquid crystal display or a solid state image pickup device.
액정 디스플레이(LCD)용 컬러 필터 용도에 있어서는 대형 TV생산을 위해 기판 사이즈가 확대되고 있고, 대형 기판을 사용했을 경우의 생산성 향상을 위해서, 슬릿 방식 등으로의 도포에서의 수율이 높고, 저에너지로 노광할 수 있고, 또한 넓은 현상 래티튜드가 요구되고 있다. 또한, TV용도의 액정 디스플레이에서는 종래의 노트북, 모니터 용도의 것에 비하여, 보다 고도한 화질이 요구되고 있다. 즉, 콘트라스트 및 색순도의 향상이다.In the use of color filters for liquid crystal displays (LCDs), substrate sizes have been expanded for large-scale TV production, and in order to improve productivity when large-sized substrates are used, the yield in application to a slit method or the like is high, and exposure is performed at low energy. In addition, a wide development latitude is required. In addition, in the liquid crystal display for TV use, higher image quality is demanded compared with the conventional notebook and monitor use. That is, the contrast and the color purity are improved.
콘트라스트 향상을 위해서, 컬러 필터의 제작에 사용되는 경화성 조성물에 관해서는 사용하는 착색제(유기 안료 등)의 입자 사이즈로서, 보다 미소한 것이 요구되고 있다.(예를 들면, 특허문헌 1 참조.) 이에 따라서, 안료 분산을 위한 분산 제 첨가량이 증가하는 경향이 있다. 또한 색순도 향상을 위해서, 경화성 조성물의 고형분 중에 차지하는 착색제(유기 안료)의 함유율로서는 보다 높은 것이 요구되고 있다. 따라서, 경화성 조성물 중의 고형분 중에 차지하는 광중합 개시제 및 광중합성 모노머 및 알칼리 가용성을 부여하기 위한 알칼리 가용성 수지 성분의 함유율이 감소하는 경향에 있는다.In order to improve contrast, a finer one is required as the particle size of a colorant (organic pigment, etc.) to be used for the curable composition used for the production of a color filter. (See Patent Document 1, for example.) Therefore, the amount of dispersant added for pigment dispersion tends to increase. Moreover, in order to improve color purity, higher content is calculated | required as content rate of the coloring agent (organic pigment) in solid content of a curable composition. Therefore, there exists a tendency for the content rate of the photoinitiator, photopolymerizable monomer, and alkali-soluble resin component for giving alkali solubility to solid content in curable composition to fall.
이 때문에, 안료 분산성 향상을 목적으로 해서 각종 신규 분산제가 제안되고 있고, 예를 들면 리빙 음이온 중합의 아민계 고분자 분산제(예를 들면, 특허문헌 2참조.)나 양이온성 그래프트 폴리머(예를 들면, 특허문헌 3참조.) 등이 제안되어 있지만, 실용상 충분한 레벨이라고는 말하기 어렵다.For this reason, various novel dispersants have been proposed for the purpose of improving pigment dispersibility, for example, an amine polymer dispersant for living anionic polymerization (see, for example, Patent Document 2) and a cationic graft polymer (for example, (See Patent Document 3).
또한 고색순도 실현을 위해서, 화소를 구성하는 RGB의 색도를 고색순도로 규정하고 있는 기술이 제안되어 있지만(예를 들면, 특허문헌 4, 5 참조.), 각각의 착색 패턴의 색순도는 향상하지만 실용상 충분한 콘트라스트와 현상 프로세스에서의 넓은 래티튜드를 실현하지는 않는다.Moreover, although the technique which prescribes chromaticity of RGB which comprises a pixel as a high color purity is proposed in order to implement | achieve high color purity (for example, refer patent document 4, 5), the color purity of each coloring pattern improves, but is practical. It does not realize sufficient contrast and wide latitude in the development process.
한편 최적인 콘트라스트를 실현할 목적으로 블랙 매트릭스의 차광성을 향상시키는 제안도 이루어져 있고, 차폐 효과를 크게 함으로써 외광의 반사를 감소시켜, 표시 콘트라스트를 향상하는 것을 목적으로 하여, OD값을 4이상으로 하는 블랙 매트릭스 형성 기술이 제안되지만(예를 들면, 특허문헌 6참조.), 보다 차폐 효과가 큰 차폐층의 개발이 요구되고 있는 것이 현재의 상태이다.On the other hand, proposals have been made to improve the light blocking property of the black matrix for the purpose of realizing the optimum contrast, and the OD value is set to 4 or more for the purpose of reducing the reflection of external light by increasing the shielding effect and improving the display contrast. Although black matrix formation technology is proposed (for example, refer patent document 6), it is a present state that development of the shielding layer with a larger shielding effect is calculated | required.
특허문헌 1: 일본특허공개 2005-316439공보Patent Document 1: Japanese Patent Laid-Open No. 2005-316439
특허문헌 2: 일본특허공개 2005-283950공보Patent Document 2: Japanese Patent Application Laid-Open No. 2005-283950
특허문헌 3: 일본특허공개 2006-52410공보Patent Document 3: Japanese Patent Laid-Open No. 2006-52410
특허문헌 4: 일본특허공개 2001-228322공보Patent Document 4: Japanese Patent Application Laid-Open No. 2001-228322
특허문헌 5: 일본특허공개 2002-107525공보Patent Document 5: Japanese Patent Application Laid-Open No. 2002-107525
특허문헌 6: 일본특허공개 2005-281386공보Patent Document 6: Japanese Patent Application Laid-Open No. 2005-281386
본 발명은 상기의 종래 기술의 모든 결점을 개량하기 위해서 이루어진 것으로서, 본 발명의 목적은 착색 화소의 색순도와 차광부의 색농도가 높고, 고콘트라스트를 실현하는 컬러 필터 및 상기 컬러 필터를 구비하는 액정표시장치를 제공하는 것에 있다.SUMMARY OF THE INVENTION The present invention has been made to improve all the above-mentioned drawbacks of the prior art, and an object of the present invention is to provide a color filter having a high color purity of a colored pixel and a high color concentration of a light shielding portion, and to achieve high contrast and a liquid crystal comprising the color filter. It is to provide a display device.
본 발명의 또 다른 목적은 상기 본 발명의 컬러 필터의 형성에 유용한 색순도가 높은 착색 화소를 형성할 수 있는 화소 형성용 경화성 조성물 및 색농도가 높은 차광부를 형성할 수 있는 차광부 형성용 경화성 조성물을 제공하는 것에 있다.Still another object of the present invention is to provide a curable composition for forming a pixel capable of forming a colored pixel having a high color purity useful for forming the color filter of the present invention, and a curable composition for forming a light shielding portion capable of forming a light shield having a high color concentration. It is to offer.
본 발명자는 예의 연구를 행한 결과, 특정한 분산제를 이용하여 제작된 착색 화소와 특정 차광제를 이용하여 형성된 차광부를 구비함으로써 콘트라스트가 우수한 컬러 필터가 얻어지는 것을 찾아내고, 본 발명을 완성하였다.MEANS TO SOLVE THE PROBLEM As a result of earnestly research, the inventors found out that the color filter excellent in contrast was obtained by providing the colored pixel produced using the specific dispersing agent, and the light shielding part formed using the specific light-shielding agent, and completed this invention.
본 발명의 구성은 이하에 나타내는 바와 같다.The structure of this invention is as showing below.
<1> 착색 화소 형성용 경화성 조성물에 의해 형성되고, CIE 표색계에 있어서 C광원에서의 색순도가 NTSC방식의 3원색 색도점의 면적(100)에 대하여 65%이상인 착색 화소와 차광부 형성용 경화성 조성물에 의해 형성되고, 광학 농도(OD값)가 4.5이상이고, 폭 5∼15㎛의 차광부를 갖고, 컬러 필터 콘트라스트비가 5000이상인 컬러 필터.It is formed with the curable composition for <1> colored pixel formation, The curable composition for colored pixels and light-shielding part formation whose color purity in C light source is 65% or more with respect to the area 100 of the three primary color chromaticity point of NTSC system in CIE color system. And a light filter having an optical density (OD value) of 4.5 or more, a light shielding portion having a width of 5 to 15 µm, and a color filter contrast ratio of 5000 or more.
<2> 상기 착색 화소부의 막두께가 1.5∼2.5㎛의 범위인 것을 특징으로 하는 <1>기재의 컬러 필터.The film thickness of the <2> above-mentioned colored pixel part is 1.5-2.5 micrometers, The color filter as described in <1> description.
<3> 상기 차광부의 광학 농도가 4.8이상이고, 또한 그 막두께가 0.3∼1.0㎛의 범위인 것을 특징으로 하는 <1>기재의 컬러 필터.<3> The color filter according to <1>, wherein the optical density of the light shielding portion is 4.8 or more and the film thickness is in the range of 0.3 to 1.0 µm.
<4> 상기 착색 화소 형성용 경화성 조성물이 하기 일반식(D-A)으로 나타내어지는 중합 개시제를 함유하는 것을 특징으로 하는 <1>기재의 컬러 필터.<4> The color filter according to <1>, wherein the curable composition for forming colored pixels contains a polymerization initiator represented by the following General Formula (D-A).
상기 일반식(D-A) 중 R1, R2은 각각 독립적으로 수소 원자, 알킬기, 아릴기,또는 하기 일반식(D-A-1) 또는 일반식(D-A-2)로 나타내어지는 치환기를 나타낸다. R3, R4는 각각 독립적으로 수소 원자, 할로겐 원자, 알킬기, 또는 알콕시기를 나타낸다. X, Y는 각각 독립적으로 -Cl, -Br을 나타내고, m, n은 0, 1 또는 2를 나타낸다.In said general formula (DA), R <1> , R <2> respectively independently represents a hydrogen atom, an alkyl group, an aryl group, or the substituent represented by the following general formula (DA-1) or general formula (DA-2). R 3 and R 4 each independently represent a hydrogen atom, a halogen atom, an alkyl group, or an alkoxy group. X and Y each independently represent -Cl and -Br, and m and n each represent 0, 1 or 2.
상기 일반식(D-A-1) 및 일반식(D-A-2) 중 R5, R6, R7은 각각 독립적으로 알킬기 또는 아릴기를 나타낸다.R <5> , R <6> , R <7> in the said general formula (DA-1) and general formula (DA-2) respectively independently represents an alkyl group or an aryl group.
<5> 착색제, 하기 일반식(1)로 나타내어지는 화합물, 하기 일반식(I)로 나타내어지는 단량체로부터 유래하는 공중합 단위를 포함하는 중합체, 및 하기 일반식(a)로 나타내어지는 구조 단위를 포함하는 중합체로 이루어지는 군에서 선택되고, 산가 20∼300mg/g이고, 또한 중량평균분자량이 3,000∼100,000의 범위에 있는 1종이상의 고분자 분산제, 중합성 화합물, 중합 개시제 및 용제를 함유하고, CIE표색계에 있어서 C광원에서의 색순도가 NTSC방식의 3원색 색도점의 면적(100)에 대하여 65%이상인 착색 화소를 형성할 수 있는 컬러 필터 착색 화소 형성용 경화성 조성물.<5> A coloring agent, the compound represented by the following general formula (1), the polymer containing the copolymerization unit derived from the monomer represented by the following general formula (I), and the structural unit represented by the following general formula (a) A polymer dispersant, a polymerizable compound, a polymerization initiator and a solvent selected from the group consisting of polymers having an acid value of 20 to 300 mg / g and having a weight average molecular weight in the range of 3,000 to 100,000, The curable composition for forming a color filter colored pixel which can form colored pixels whose color purity in the C light source is 65% or more with respect to the area 100 of the three primary color chromaticity points of the NTSC system.
상기 일반식(1) 중 A1은 유기색소 구조, 복소환 구조, 산성기, 염기성 질소 원자를 갖는 기, 우레아기, 우레탄기, 배위성 산소 원자를 갖는 기, 탄소수 4개이상의 탄화수소기, 알콕시실릴기, 에폭시기, 이소시아네이트기, 및 수산기에서 선택되는 부위를 적어도 1종 포함하는 1가의 유기기를 나타낸다. n개의 A1은 같거나 달라도 좋다.In general formula (1), A 1 is an organic pigment structure, a heterocyclic structure, an acidic group, a group having a basic nitrogen atom, a urea group, a urethane group, a group having a coordinating oxygen atom, a hydrocarbon group having 4 or more carbon atoms, alkoxy The monovalent organic group containing at least 1 sort (s) of site | parts chosen from a silyl group, an epoxy group, an isocyanate group, and a hydroxyl group is shown. n pieces A 1 may be the same or different.
R1은 (m+n)가의 유기 연결기를 나타내고, 여기서, m은 1∼8을 나타내고, n 은 2∼9를 나타내고, 3<(m+n)<10이다. 또한, R2는 단일 결합 또는 2가의 유기 연결 기를 나타낸다. P1은 고분자 골격을 나타낸다.R <1> represents a (m + n) valent organic coupling group, where m represents 1-8, n represents 2-9, and 3 <(m + n) <10. In addition, R 2 represents a single bond or a divalent organic linking group. P 1 represents a polymer skeleton.
상기 일반식(I) 중 R01은 수소 원자 또는 치환 또는 무치환의 알킬기를 나타낸다. R02은 알킬렌기를 나타낸다. W는 -CO-, -C(=O)O-, -CONH-, -OC(=O)- 또는 페닐렌기를 나타낸다. X는 -O-, -S-, -C(=O)O-, -CONH-, -C(=O)S-, -NHCONH-, -NHC(=O)O-, -NHC(=O)S-, -OC(=O)-, -OCONH-, -NHCO-에서 선택되는 어느 하나를 나타낸다. Y는 NR03, O, S에서 선택되는 어느 하나를 나타내고, R03은 수소 원자, 알킬기 또는 아릴기를 나타낸다. 식 중 N과 Y는 서로 연결해서 환상 구조를 형성한다. m1, n1은 각각 독립적으로 0 또는 1이다.R 01 in General Formula (I) represents a hydrogen atom or a substituted or unsubstituted alkyl group. R 02 represents an alkylene group. W represents -CO-, -C (= 0) O-, -CONH-, -OC (= 0)-or a phenylene group. X is -O-, -S-, -C (= O) O-, -CONH-, -C (= O) S-, -NHCONH-, -NHC (= O) O-, -NHC (= O ) S-, -OC (= O)-, -OCONH-, or -NHCO-. Y represents any one selected from NR 03 , O and S, and R 03 represents a hydrogen atom, an alkyl group or an aryl group. In the formula, N and Y are connected to each other to form a cyclic structure. m1 and n1 are 0 or 1 each independently.
상기 일반식(a) 중 R1a는 수소 또는 메틸기를 나타내고, R2a는 알킬렌기를 나타내고, Z1은 질소 함유 복소환 구조를 나타낸다.In said general formula (a), R <1a> represents a hydrogen or a methyl group, R <2a> represents an alkylene group, Z <1> represents a nitrogen-containing heterocyclic structure.
<6> 상기 중합 개시제가 하기 일반식(D-A)로 나타내어지는 화합물을 포함하는 것을 특징으로 하는 <5>기재의 컬러 필터 착색 화소 형성용 경화성 조성물.<6> Curable composition for color filter coloring pixel formation of <5> description characterized by the said polymerization initiator containing the compound represented by the following general formula (D-A).
상기 일반식(D-A) 중 R1, R2는 각각 독립적으로 수소 원자, 알킬기, 아릴기,또는 하기 일반식(D-A-1) 또는 일반식(D-A-2)로 나타내어지는 치환기를 나타낸다. R3, R4는 각각 독립적으로 수소 원자, 할로겐 원자, 알킬기 또는 알콕시기를 나타낸다. X, Y는 각각 독립적으로 -Cl, -Br을 나타내고, m, n은 0, 1 또는 2를 나타낸다.R 1 and R 2 in the general formula (DA) each independently represent a hydrogen atom, an alkyl group, an aryl group, or a substituent represented by the following general formula (DA-1) or general formula (DA-2). R 3 and R 4 each independently represent a hydrogen atom, a halogen atom, an alkyl group or an alkoxy group. X and Y each independently represent -Cl and -Br, and m and n each represent 0, 1 or 2.
상기 일반식(D-A-1) 및 일반식(D-A-2) 중 R5, R6, R7은 각각 독립적으로 알킬기 또는 아릴기를 나타낸다.R <5> , R <6> , R <7> in the said general formula (DA-1) and general formula (DA-2) respectively independently represents an alkyl group or an aryl group.
<7> 중합성 화합물, 중합 개시제 및 차광제로서 카본 블랙을 고형분 환산으로 40∼80질량% 함유하고, 광학 농도(OD값)가 4.5이상인 차광부를 형성할 수 있는 컬러 필터 차광부 형성용 경화성 조성물.<7> Curable composition for forming a color filter light-shielding portion that contains 40 to 80 mass% of carbon black in terms of solid content as a polymerizable compound, a polymerization initiator, and a light-shielding agent, and can form a light-shielding portion having an optical density (OD value) of 4.5 or more. .
<8> 중합성 화합물, 중합 개시제, 및 차광제로서 금속 미립자를 고형분 환산으로 50∼90질량% 함유하고, 광학 농도(OD값)가 4.5이상의 차광부를 형성할 수 있는 컬러 필터 차광부 형성용 경화성 조성물.<8> Curable for forming the color filter light shielding part which can contain 50-90 mass% of metal microparticles in conversion of solid content as a polymeric compound, a polymerization initiator, and a light shielding agent, and can form a light shielding part whose optical density (OD value) is 4.5 or more. Composition.
<9> <5> 또는 <6>에 기재된 착색 화소 형성용 조성물과 <7> 또는 <8>에 기재된 차광부 형성용 조성물에 의해 형성된 것을 특징으로 하는 <1>∼<4> 중 어느 하나에 기재된 컬러 필터.<9> Formed by the composition for colored pixel formation as described in <5> or <6>, and the composition for light-shielding part formation as described in <7> or <8>, In either <1>-<4> characterized by the above-mentioned. The color filter described.
<10> <1>∼<4> 및 <9> 중 어느 하나에 기재된 컬러 필터를 구비한 액정표시장치.<10> The liquid crystal display device provided with the color filter in any one of <1>-<4> and <9>.
<11> RGB-LED 광원을 백라이트로서 구비하는 <10>기재의 액정표시장치.<11> The liquid crystal display device described in <10> provided with a RGB-LED light source.
본 발명은 상기 고분자 분산제의 기능에 의해, 고콘트라스트 실현을 위하여 안료 입자를 미세화하여도 안료분산 안정성이 양호해서, 장기간 보존할 수 있고, 고콘트라스트로 고색순도의 착색 화소가 형성된다. 또한, 차광부에 사용하는 경화성 조성물의 기능에 의해, 박층으로 차폐 효과가 큰 차광부를 형성할 수 있으므로, 슬릿 도포로의 적성이 있고, 이물, 도포 얼룩, 도포 라인이 없는 고성능의 착색 화소부가 형성되므로, 차광층의 큰 차광 효과와 아울러 광누설이 없는 고콘트라스트이고 색재현성이 양호한 컬러 필터를 제공할 수 있어 고선명으로 시인성이 양호한 표시 장치를 얻을 수 있다.According to the function of the polymer dispersant, the pigment dispersion stability is good even if the pigment particles are miniaturized in order to achieve high contrast, which can be stored for a long time, and colored pixels of high color purity are formed with high contrast. Moreover, since the light shielding part with a large shielding effect can be formed in a thin layer by the function of the curable composition used for a light shielding part, it has aptitude to slit application | coating and a high performance colored pixel part without a foreign material, application | coating spot | dye, and an application line is formed. Therefore, it is possible to provide a color filter having a large light blocking effect of the light shielding layer, high contrast without light leakage, and good color reproducibility, thereby providing a display device with high visibility and good visibility.
또한, 착색 화소 영역이 고색순도라도 고광투과성이기 때문에 소비 전력이 작아도 되는 환경에 쉽게 표시 장치를 제공할 수 있다.In addition, since the colored pixel region has high light transmittance even with high color purity, the display device can be easily provided in an environment where power consumption may be small.
또한, 착색 화소, 차광부를 형성하는 경화성 조성물이 고감도로 경화할 수 있기 때문에, 스루풋이 크고, 수율이 양호해서 생산성이 높아 저렴한 컬러 필터를 제공할 수 있다.Moreover, since the curable composition which forms a colored pixel and a light shielding part can be hardened | cured with high sensitivity, a throughput is large, a yield is favorable, and productivity is high, and a cheap color filter can be provided.
또한, 본 발명의 바람직한 형태에서는 본 발명의 컬러 필터와 아울러 백라이트에 RGB-LED광원을 사용한 표시장치로 함으로써 고색재현성이 한층 더 향상하고, 고색순도이고 고콘트라스트의 컬러 필터 기술을 더욱 효과적으로 발휘할 수 있다.In addition, in a preferred embodiment of the present invention, by using the display device using the RGB-LED light source as well as the color filter of the present invention, high color reproducibility can be further improved, and high color purity and high contrast color filter technology can be more effectively exhibited. .
(발명의 효과)(Effects of the Invention)
본 발명에 의하면, 착색 화소의 색순도와 차광부의 색농도가 높고, 고콘트라스트를 실현하는 컬러 필터 및 상기 컬러 필터를 구비하는 액정표시장치를 제공할 수 있다.According to the present invention, it is possible to provide a color filter having a high color purity of a colored pixel and a color concentration of a light shielding portion, which realizes high contrast, and a liquid crystal display device having the color filter.
또한, 본 발명에 의하면, 상기 본 발명의 컬러 필터의 형성에 유용한 색순도가 높은 착색 화소를 형성할 수 있는 화소 형성용 경화성 조성물 및 차폐 효과가 높은 차광부를 형성할 수 있는 차광부 형성용 경화성 조성물을 제공할 수 있다.Moreover, according to this invention, the curable composition for pixel formation which can form the colored pixel with high color purity useful for formation of the said color filter of this invention, and the curable composition for light shielding part formation which can form the light shielding part with high shielding effect are provided. Can provide.
이하, 본 발명의 컬러 필터, 표시 장치 및 컬러 필터의 형성에 유용한 착색 화소 형성용 경화성 조성물, 차광부 형성용 경화성 조성물에 대해서 상세하게 설명한다.EMBODIMENT OF THE INVENTION Hereinafter, the curable composition for colored pixel formation and the curable composition for light shielding part formation useful for formation of the color filter, a display apparatus, and a color filter of this invention are demonstrated in detail.
[컬러 필터][Color filter]
본 발명의 컬러 필터는 CIE표색계에 있어서 착색 화소 형성용 경화성 조성물에 의해 형성되고, C광원에서의 색순도가 NTSC 방식의 3원색 색도점의 면적(100)에 대하여 65%이상인 착색 화소와 차광부 형성용 경화성 조성물에 의해 형성되고, 광 학 농도(OD값)가 4.5이상이고, 폭 5∼15㎛의 차광부를 갖고, 각 단색층의 콘트라스트비가 5000이상인 것을 특징으로 한다.The color filter of the present invention is formed by the curable composition for forming colored pixels in a CIE color system, and the colored pixels and the light shielding portion having a color purity of 65% or more with respect to the area 100 of the three primary color chromaticity points of the NTSC system are obtained. It is formed of the curable composition for optical use, has an optical density (OD value) of 4.5 or more, has a light shielding portion of 5 to 15 µm in width, and the contrast ratio of each monochromatic layer is 5000 or more.
여기서, 착색 화소의 색순도란 CIE표색계에 있어서, NTSC방식의 3원색 색도점의 면적(100)에 대하여, 그 색도(지금의 경우에는 RGB의 컬러 필터)의 크기를 나타낸 것을 의미하고, JIS-Z-8701에 준거하고, 시판의 측색 색도계를 이용하여, 측정할 수 있다. 본 발명에 있어서 착색 화소의 백라이트의 C광원으로 측정한 색순도는 65%이상인 것을 필요로 하고, 70%이상인 것이 보다 바람직하다. 이러한 색순도는 예를 들면, 소정의 파장에서의 흡광도가 큰 착색제를 사용하는 방법, 단위면적당의 착색제 함유량을 크게 하는 방법 등에 의해 달성할 수 있다. 또한, 불요한 파장에 있어서의 흡광도가 큰 착색제의 사용은 색순도 향상의 관점으로부터는 바람직하지 않다고 할 수 있다.Here, the color purity of the colored pixel means that the chromaticity (in this case, RGB color filter) is represented with respect to the area 100 of the three primary color chromaticity points of the NTSC system in the CIE color system, and is JIS-Z. Based on -8701, it can measure using a commercially available side colorimeter. In the present invention, the color purity measured by the C light source of the backlight of the colored pixel needs to be 65% or more, and more preferably 70% or more. Such color purity can be achieved by, for example, a method of using a colorant having a high absorbance at a predetermined wavelength, a method of increasing the colorant content per unit area, and the like. Moreover, it can be said that use of the coloring agent with large absorbance in an unnecessary wavelength is not preferable from a viewpoint of color purity improvement.
본 발명의 컬러 필터에 있어서의 착색 화소는 착색제를 고농도로 함유하고, 고발색으로 막두께가 얇은 착색 패턴으로 이루어지는 것이 바람직하고, 착색 화소의 막두께는 2.5㎛이하인 것이 바람직하고, 더욱 바람직하게는 2.0㎛이하인 것이 바람직하다. 막두께는 화소로서 바람직한 색순도를 달성할 수 있는 한에 있어서 얇으면 얇을수록 좋지만, 피막 형성성, 현상성, 화소의 균일성 등을 고려하면, 1.0 ㎛이상인 것이 바람직하고, 1.4㎛이상인 것이 보다 바람직하다.It is preferable that the colored pixel in the color filter of this invention contains a coloring agent in high concentration, and consists of a coloring pattern with high color development and a thin film thickness, It is preferable that the film thickness of a colored pixel is 2.5 micrometers or less, More preferably, It is preferable that it is 2.0 micrometers or less. The thinner the thinner the better, as long as it can achieve the desired color purity as the pixel, but considering the film formability, developability, and uniformity of the pixel, the film thickness is preferably 1.0 μm or more, more preferably 1.4 μm or more. Do.
이러한 색순도, 콘트라스트를 실현할 수 있는 착색 화소는 이하에 상세히 설명하는 착색 화소 형성용 경화성 조성물에 의해 형성된다.The colored pixel which can implement such color purity and contrast is formed by the curable composition for colored pixel formation demonstrated in detail below.
[착색 화소 형성용 경화성 조성물]Curable Composition for Colored Pixel Formation
본 발명의 컬러 필터의 착색 화소 형성용으로서 사용되는 경화성 조성물은 감방사선성 조성물이고, 특히 광에 의한 경화에 적합하고, (A-1) 착색제, (B) 고분자 분산제, (C) 중합성 화합물, (D) 광중합 개시제 및 (E) 용제를 함유하고, 소망에 의해 그 밖의 성분을 함유하고 있어도 좋다.The curable composition used for forming the colored pixel of the color filter of the present invention is a radiation-sensitive composition, and is particularly suitable for curing by light, and includes (A-1) a colorant, (B) a polymer dispersant, and (C) a polymerizable compound. , (D) photoinitiator and (E) solvent are contained, and other components may be included as desired.
<(A-1) 착색제><(A-1) Colorant>
여기서, 착색제로서 사용되는 안료는 무기안료이어도 유기안료이어도 좋지만, 고투과율인 것이 바람직한 것을 고려하면, 되도록이면 입자 사이즈가 작은 것의 사용이 바람직하고, 평균 입자 사이즈는 10∼100nm인 것이 바람직하고, 더욱 바람직하게는 10∼50nm의 범위이다. 본 발명의 경화성 조성물에 있어서는 후술하는 특정한 (B) 고분자 분산제를 사용하기 때문에, 착색제의 사이즈가 작을 경우이어도 안료 분산성, 분산 안정성이 양호하기 때문에, 얇아도 색순도가 우수한 착색 화소를 형성할 수 있다.Here, although the pigment used as a coloring agent may be an inorganic pigment or an organic pigment, considering that it is preferable that it is high transmittance | permeability, use of a thing with a small particle size is preferable as much as possible, It is preferable that average particle size is 10-100 nm, Furthermore, Preferably it is the range of 10-50 nm. In the curable composition of this invention, since the specific (B) polymer dispersing agent mentioned later is used, even if the size of a coloring agent is small, since pigment dispersibility and dispersion stability are favorable, the coloring pixel excellent in color purity can be formed even if it is thin. .
화소 형성용의 착색제로서 사용할 수 있는 무기 안료로서는 금속 산화물, 금속 착염 등으로 나타내어지는 금속 화합물을 열거할 수 있고, 구체적으로는 철, 코발트, 알루미늄, 카드뮴, 납, 구리, 티타늄, 마그네슘, 크롬, 아연, 안티몬 등의 금속 산화물 및 상기 금속의 복합 산화물 등을 열거할 수 있다.Examples of the inorganic pigments that can be used as colorants for pixel formation include metal compounds represented by metal oxides, metal complex salts, and the like. Specifically, iron, cobalt, aluminum, cadmium, lead, copper, titanium, magnesium, chromium, And metal oxides such as zinc and antimony, and complex oxides of the above metals.
또한, 유기 안료로서는 예를 들면,In addition, as an organic pigment, for example,
C.I.피그먼트 옐로우 11, 24, 31, 53, 83, 93, 99, 108, 109, 110, 138, 139, 147, 150, 151, 154, 155, 167, 180, 185, 199;C.I. Pigment Yellow 11, 24, 31, 53, 83, 93, 99, 108, 109, 110, 138, 139, 147, 150, 151, 154, 155, 167, 180, 185, 199;
C.I.피그먼트 오렌지 36, 38, 43, 71;C.I. Pigment Orange 36, 38, 43, 71;
C.I.피그먼트 레드 81, 105, 122, 149, 150, 155, 171, 175, 176, 177, 209, 220, 224, 242, 254, 255, 264, 270;C.I. Pigment Red 81, 105, 122, 149, 150, 155, 171, 175, 176, 177, 209, 220, 224, 242, 254, 255, 264, 270;
C.I.피그먼트 바이올렛 19, 23, 32, 37, 39;C.I. pigment violet 19, 23, 32, 37, 39;
C.I.피그먼트 블루 1, 2, 15, 15:1, 15:3, 15:6, 16, 22, 60, 66;Pigment Blue 1, 2, 15, 15: 1, 15: 3, 15: 6, 16, 22, 60, 66;
C.I.피그먼트 그린 7, 36, 37;C.I. Pigment Green 7, 36, 37;
C.I.피그먼트 브라운 25, 28;C.I. Pigment Brown 25, 28;
C.I.피그먼트 블랙 1C.I. Pigment Black 1
등을 들 수 있다.Etc. can be mentioned.
본 발명에 있어서는 특별히 한정되는 것은 아니지만, 하기의 안료가 보다 바람직하다.Although it does not specifically limit in this invention, The following pigment is more preferable.
C.I.피그먼트 옐로우 11, 24, 108, 109, 110, 138, 139, 150, 151, 154, 167, 180, 185,Pigment Yellow 11, 24, 108, 109, 110, 138, 139, 150, 151, 154, 167, 180, 185,
C.I.피그먼트 오렌지 36, 71,Pigment Orange 36, 71,
C.I.피그먼트 레드 122, 150, 171, 175, 177, 209, 224, 242, 254, 255, 264,Pigment Red 122, 150, 171, 175, 177, 209, 224, 242, 254, 255, 264,
C.I.피그먼트 바이올렛 19, 23, 37,C.I. Pigment Violet 19, 23, 37,
C.I.피그먼트 블루 15:1, 15:3, 15:6, 16, 22, 60, 66,Pigment Blue 15: 1, 15: 3, 15: 6, 16, 22, 60, 66,
C.I. 피그먼트 그린 7, 36, 37;C.I. Pigment green 7, 36, 37;
이들 유기 안료는 단독 또는 색순도를 높이기 위해 여러가지가 조합되어 사용될 수 있다. 조합의 구체예를 이하에 나타낸다.These organic pigments may be used alone or in various combinations to increase color purity. The specific example of a combination is shown below.
예를 들면, 적색의 안료로서, 안트라퀴논계 안료, 페릴렌계 안료, 디케토피롤로피롤계 안료 단독 또는 그들의 적어도 1종과 비스 아조계 황색 안료, 이소인돌린계 황색 안료, 퀴노프탈론계 황색 안료 또는 페릴렌계 적색 안료의 혼합 등을 사용할 수 있다. 예를 들면, 안트라퀴논계 안료로서는 C.I.피그먼트 레드 177이 열거되고, 페릴렌계 안료로서는 C.I.피그먼트 레드 155, C.I.피그먼트 레드 224가 열거되고, 디케토피롤로피롤계 안료로서는 C.I.피그먼트 레드 254가 열거되고, 색재현성의 점에서 C.I.피그먼트 옐로우 139와의 혼합이 바람직하다. 또한, 적색 안료와 황색 안료의 질량비는 충분한 색순도를 얻는 것, 및 NTSC목표 색상으로부터의 어긋남을 억제하는 관점으로부터, 100:5∼100:50이 바람직하다. 특히, 상기 질량비로서는 100:10∼100:30의 범위가 최적이다. 또한, 적색 안료끼리의 조합의 경우에는 색도에 따라서 조정할 수 있다.For example, as a red pigment, an anthraquinone pigment, a perylene pigment, a diketopyrrolopyrrole pigment alone or at least one of them, a bis azo yellow pigment, an isoindolin yellow pigment, and a quinophthalone yellow pigment Or a mixture of perylene-based red pigments can be used. For example, CI pigment red 177 is listed as an anthraquinone pigment, CI pigment red 155 and CI pigment red 224 are listed as a perylene pigment, and CI pigment red 254 is a diketopyrrolopyrrole pigment. It is enumerated and mixing with CI pigment yellow 139 is preferable at the point of color reproducibility. In addition, the mass ratio of the red pigment and the yellow pigment is preferably 100: 5 to 100: 50 from the viewpoint of obtaining sufficient color purity and suppressing the deviation from the NTSC target color. Especially as said mass ratio, the range of 100: 10-100: 30 is optimal. In addition, in the case of the combination of red pigments, it can adjust according to chromaticity.
또한, 녹색의 안료로서는 할로겐화 프탈로시아닌계 안료를 단독으로, 또는 이것과 비스 아조계 황색 안료, 퀴노프탈론계 황색 안료, 아조메틴계 황색 안료 또는 이소인돌린계 황색 안료의 혼합을 사용할 수 있다. 예를 들면, 이러한 예로서는 C.I.피그먼트 그린 7, 36, 37과 C.I.피그먼트 옐로우 83, C.I.피그먼트 옐로우 138, C.I.피그먼트 옐로우 139, C.I.피그먼트 옐로우 150, C.I.피그먼트 옐로우 180 또는 C.I.피그먼트 옐로우 185와의 혼합이 바람직하다. 녹색 안료와 황색 안료의 질량비는 충분한 색순도를 얻는 것 및 NTSC목표 색상으로부터의 어긋남을 억제하는 관점으로부터, 100:5∼100:150이 바람직하다. 질량비로서는 100:30∼100:120의 범위가 특히 바람직하다.As the green pigment, a halogenated phthalocyanine pigment alone or a mixture of this and a bis azo yellow pigment, a quinophthalone yellow pigment, an azomethine yellow pigment or an isoindolin yellow pigment can be used. For example, CI Pigment Green 7, 36, 37 and CI Pigment Yellow 83, CI Pigment Yellow 138, CI Pigment Yellow 139, CI Pigment Yellow 150, CI Pigment Yellow 180 or CI Pigment Yellow Mixing with 185 is preferred. The mass ratio of the green pigment and the yellow pigment is preferably 100: 5 to 100: 150 from the viewpoint of obtaining sufficient color purity and suppressing the deviation from the NTSC target color. As mass ratio, the range of 100: 30-100: 120 is especially preferable.
청색의 안료로서는 프탈로시아닌계 안료를 단독으로 또는 이것과 디옥사진계 자색 안료의 혼합을 사용할 수 있다. 예를 들면, C.I.피그먼트 블루 15:6과 C.I.피그먼트 바이올렛 23의 혼합이 바람직하다. 청색 안료와 자색 안료의 질량비는 100:0∼100:50이 바람직하고, 보다 바람직하게는 100:5∼100:30이다.As a blue pigment, a phthalocyanine type pigment can be used individually or the mixture of this and a dioxazine type purple pigment can be used. For example, a mixture of C.I. Pigment Blue 15: 6 and C.I.Pigment Violet 23 is preferred. As for mass ratio of a blue pigment and a purple pigment, 100: 0-100: 50 are preferable, More preferably, it is 100: 5-100: 30.
본 발명의 착색 화소 형성용 경화성 조성물 중에 있어서의 (A-1) 착색제(안료)의 함유량으로서는 상기 조성물의 전체 고형분(질량)에 대하여, 25∼75질량%가 바람직하고, 32∼70질량%가 보다 바람직하다. (A-1) 착색제(안료)의 함유량이 상기범위내이면 색농도가 충분히 우수한 색특성을 확보하는데도 유효하다.As content of the (A-1) coloring agent (pigment) in the curable composition for coloring pixel formation of this invention, 25-75 mass% is preferable with respect to the total solid (mass) of the said composition, and 32-70 mass% More preferred. (A-1) If content of a coloring agent (pigment) is in the said range, it is effective also in ensuring the color characteristic excellent in color concentration sufficiently.
<(B) 고분자 분산제><(B) Polymer Dispersant>
본 발명에 있어서의 (B) 고분자 분산제는 산가 20∼300mg/g이고, 또한 중량평균 분자량이 3,000∼100,000의 범위에 있는 수지인 것을 필요로 한다. 이러한 특정한 고분자 분산제를 이하, 단지 「(B) 분산 수지」라고 칭할 경우가 있다.The polymer dispersing agent (B) in the present invention needs to have an acid value of 20 to 300 mg / g and a weight average molecular weight in the range of 3,000 to 100,000. Such a specific polymer dispersing agent may only be called "(B) dispersion resin" below.
본 발명에 있어서의 (B) 분산 수지는 상기 (A-1) 착색제로서 열거된 안료의 분산제, 또는 후술하는 차광부 형성용 경화성 조성물에 있어서, 차광제(블랙 매트릭스 형성용 안료)의 분산제로서 기능할 수 있는 화합물이다.(B) dispersion resin in this invention functions as a dispersing agent of the light-shielding agent (pigment for black matrix formation) in the dispersing agent of the pigment listed as said (A-1) coloring agent, or the curable composition for light-shielding part formation mentioned later. It is a compound which can be.
(B) 분산 수지는 상술한 바와 같이, 특정한 산가를 가질 필요가 있기 때문에 산성기를 갖는 고분자 화합물인 것이 바람직하다.(B) Since dispersion resin needs to have specific acid value as mentioned above, it is preferable that it is a high molecular compound which has an acidic group.
이 고분자 화합물의 고분자 골격으로서는 비닐 모노머의 중합체 또는 공중합체, 에스테르계 폴리머, 에테르계 폴리머, 우레탄계 폴리머, 아미드계 폴리머, 에폭시계 폴리머, 실리콘계 폴리머, 및 이들의 변성물, 또는 공중합체[예를 들면, 폴 리에테르/폴리우레탄 공중합체, 폴리에테르/비닐 모노머의 중합체의 공중합체 등 (랜덤 공중합체, 블록 공중합체, 그래프트 공중합체 중 어느 하나라도 좋다.)을 포함한다.]로 이루어지는 군에서 선택되는 적어도 1종이 바람직하고, 비닐 모노머의 중합체 또는 공중합체, 에스테르계 폴리머, 에테르계 폴리머, 우레탄계 폴리머, 및 이들의 변성물 또는 공중합체로 이루어지는 군에서 선택되는 적어도 1종이 보다 바람직하고, 비닐 모노머의 중합체 또는 공중합체가 특히 바람직하다.Examples of the polymer skeleton of the polymer compound include polymers or copolymers of vinyl monomers, ester polymers, ether polymers, urethane polymers, amide polymers, epoxy polymers, silicone polymers, and modified products thereof or copolymers [for example, , A copolymer of a polyether / polyurethane copolymer, a polymer of a polyether / vinyl monomer, or the like (random copolymer, block copolymer, or graft copolymer may be used). At least 1 sort (s) is preferable, At least 1 sort (s) chosen from the group which consists of a polymer or copolymer of a vinyl monomer, an ester type polymer, an ether type polymer, a urethane type polymer, and these modified | denatured products or a copolymer is more preferable, Particular preference is given to polymers or copolymers.
또한, 상기와 같은 고분자 골격에 산성기를 도입하는 방법으로서는 예를 들면, 상기의 고분자 골격을 중합할 때에 산성기를 함유하는 모노머를 공중합하는 방법이나 또한 상기의 고분자 골격을 중합 후에 고분자 반응에 의해 도입하는 방법이 열거된다.Moreover, as a method of introducing an acidic group into the above-mentioned polymer skeleton, the method of copolymerizing the monomer containing an acidic group when superposing | polymerizing the said polymer skeleton, and also introduce | transducing the said polymer skeleton by superposition | polymerization after superposition | polymerization is mentioned, for example. The method is listed.
산성기를 함유하는 모노머로서는 예를 들면, (메타)아크릴산, 크로톤산, 이타콘산, 말레산, 푸말산, 신남산, 아크릴산 다이머, 비닐 벤조산, 스티렌 술폰산, 2-아크릴아미드-2-메틸프로판술폰산, 인산모노(메타)아크릴로일에틸에스테르, 또는 2-히드록시에틸메타크릴레이트 등의 알콜성 수산기 함유 모노머와 무수 말레산, 무수 프탈산 등의 환상 산무수물 등을 반응시킴으로써 얻어지는 모노머 등이 열거된다.As a monomer containing an acidic group, for example, (meth) acrylic acid, crotonic acid, itaconic acid, maleic acid, fumaric acid, cinnamic acid, acrylic acid dimer, vinyl benzoic acid, styrene sulfonic acid, 2-acrylamide-2-methylpropanesulfonic acid, And monomers obtained by reacting an alcoholic hydroxyl group-containing monomer such as mono (meth) acryloylethyl ester or 2-hydroxyethyl methacrylate with cyclic acid anhydrides such as maleic anhydride and phthalic anhydride.
이들 중에서도 바람직한 모노머의 예로서는 (메타)아크릴산, 2-히드록시에틸 메타크릴레이트 등의 알콜성 수산기 함유 모노머와 무수 말레산, 무수 프탈산 등의 환상 산무수물 등을 반응시킴으로써 얻어지는 모노머 등이 열거된다. 여기서 사용하는 환상 산무수물로서는 예를 들면, 무수 이타콘산, 무수 말레산, 무수 프탈산, 무수 숙신산, 무수 글루타르산, 무수 트리멜리트산 등이 열거되지만, 특히 무수 프탈산, 무수 숙신산 등이 바람직하다.Among these, as an example of a preferable monomer, the monomer etc. which are obtained by making alcoholic hydroxyl group containing monomers, such as (meth) acrylic acid and 2-hydroxyethyl methacrylate, cyclic acid anhydrides, such as maleic anhydride and a phthalic anhydride, etc. are mentioned, etc. are mentioned. Examples of the cyclic acid anhydride used herein include itaconic anhydride, maleic anhydride, phthalic anhydride, succinic anhydride, glutaric anhydride, trimellitic anhydride, and the like, but phthalic anhydride and succinic anhydride are particularly preferable.
또한, 산성기를 갖는 고분자 화합물은 또한 비닐 모노머 성분을 공중합하여 이루어지는 것이어도 좋다.In addition, the high molecular compound which has an acidic group may be what copolymerizes a vinyl monomer component further.
상기 비닐 모노머로서는 특별히 제한되지 않지만, 예를 들면, (메타)아크릴산 에스테르류, 크로톤산 에스테르류, 비닐에스테르류, 말레산 디에스테르류, 푸말산 디에스테르류, 이타콘산 디에스테르류, (메타)아크릴아미드류, 비닐에테르류, 비닐알콜의 에스테르류, 스티렌류, (메타)아크릴로니트릴 등이 바람직하다.Although it does not restrict | limit especially as said vinyl monomer, For example, (meth) acrylic acid ester, crotonic acid ester, vinyl ester, maleic acid diester, fumaric acid diester, itaconic acid diester, (meth) Acrylamides, vinyl ethers, esters of vinyl alcohol, styrenes, (meth) acrylonitrile and the like are preferable.
이러한 비닐 모노머로서는 예를 들면, 이하와 같은 화합물이 열거된다.As such a vinyl monomer, the following compounds are mentioned, for example.
(메타)아크릴산 에스테르류의 예로서는 (메타)아크릴산 메틸, (메타)아크릴산 에틸, (메타)아크릴산 n-프로필, (메타)아크릴산 이소프로필, (메타)아크릴산 n-부틸, (메타)아크릴산 이소부틸, (메타)아크릴산 t-부틸, (메타)아크릴산 n-헥실, (메타)아크릴산 시클로헥실, (메타)아크릴산 t-부틸시클로헥실, (메타)아크릴산 2-에틸헥실, (메타)아크릴산 t-옥틸, (메타)아크릴산 도데실, (메타)아크릴산 옥타데실, (메타)아크릴산 아세톡시에틸, (메타)아크릴산 페닐, (메타)아크릴산 2-히드록시에틸, (메타)아크릴산 2-메톡시에틸, (메타)아크릴산 2-에톡시에틸, (메타)아크릴산 2-(2-메톡시에톡시)에틸, (메타)아크릴산 3-페녹시-2-히드록시프로필, (메타)아크릴산 벤질, (메타)아크릴산 디에틸렌글리콜모노메틸에테르, (메타)아크릴산 디에틸렌글리콜모노에틸에테르, (메타)아크릴산 트리에틸렌글리콜모노메틸에테르, (메타)아크릴산 트리에틸렌글리콜모노에틸에테르, (메타)아크릴산 폴리에틸 렌글리콜모노메틸에테르, (메타)아크릴산 폴리에틸렌글리콜모노에틸에테르, (메타)아크릴산 β-페녹시에톡시에틸, (메타)아크릴산 노닐페녹시폴리에틸렌글리콜, (메타)아크릴산 디시클로펜테닐, (메타)아크릴산 디시클로펜테닐옥시에틸, (메타)아크릴산 트리플루오로에틸, (메타)아크릴산 옥타플루오로펜틸, (메타)아크릴산 퍼플루오로옥틸에틸, (메타)아크릴산 디시클로펜타닐, (메타)아크릴산 트리브로모페닐, (메타)아크릴산 트리브로모페닐옥시에틸 등이 열거된다.Examples of (meth) acrylic acid esters include methyl (meth) acrylate, ethyl (meth) acrylate, n-propyl (meth) acrylate, isopropyl (meth) acrylate, n-butyl (meth) acrylate, isobutyl (meth) acrylate, T-butyl (meth) acrylate, n-hexyl (meth) acrylate, cyclohexyl (meth) acrylate, t-butylcyclohexyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, t-octyl (meth) acrylate, (Meth) acrylate dodecyl, (meth) acrylate octadecyl, (meth) acrylate acetoxyethyl, (meth) acrylate phenyl, (meth) acrylate 2-hydroxyethyl, (meth) acrylate 2-methoxyethyl, (meth) 2-ethoxyethyl), 2- (2-methoxyethoxy) ethyl (meth) acrylate, 3-phenoxy-2-hydroxypropyl (meth) acrylate, benzyl (meth) acrylate, (meth) acrylic acid di Ethylene glycol monomethyl ether, (meth) acrylic acid diethylene glycol monoethyl ether, (meth Triethylene glycol monomethyl ether (acrylate), triethylene glycol monoethyl ether (meth) acrylate, polyethylene glycol monomethyl ether (meth) acrylate, polyethylene glycol monoethyl ether (meth) acrylate, β-phenoxy (meth) acrylate Ethoxyethyl, nonylphenoxypolyethylene glycol (meth) acrylate, dicyclopentenyl (meth) acrylate, dicyclopentenyloxyethyl (meth) acrylate, trifluoroethyl (meth) acrylate, fluorofluoro (meth) acrylate Pentyl, perfluorooctylethyl (meth) acrylate, dicyclopentanyl (meth) acrylate, tribromophenyl (meth) acrylate, tribromophenyloxyethyl (meth) acrylate, and the like.
크로톤산 에스테르류의 예로서는 크로톤산 부틸 및 크로톤산 헥실 등이 열거된다.Examples of crotonic acid esters include butyl crotonate and hexyl crotonate.
비닐에스테르류의 예로서는 비닐아세테이트, 비닐프로피오네이트, 비닐부티레이트, 비닐메톡시아세테이트, 및 벤조산 비닐 등이 열거된다.Examples of vinyl esters include vinyl acetate, vinyl propionate, vinyl butyrate, vinyl methoxy acetate, vinyl benzoate, and the like.
말레산 디에스테르류의 예로서는 말레산 디메틸, 말레산 디에틸, 및 말레산 디부틸 등이 열거된다.Examples of maleic acid diesters include dimethyl maleate, diethyl maleate, dibutyl maleate and the like.
푸말산 디에스테르류의 예로서는 푸말산 디메틸, 푸말산 디에틸, 및 푸말산 디부틸 등이 열거된다.Examples of fumaric acid diesters include dimethyl fumarate, diethyl fumarate, dibutyl fumarate and the like.
이타콘산 디에스테르류의 예로서는 이타콘산 디메틸, 이타콘산 디에틸, 및 이타콘산 디부틸 등이 열거된다.Examples of itaconic acid diesters include dimethyl itaconic acid, diethyl itaconic acid, dibutyl itaconic acid, and the like.
(메타)아크릴아미드류로서는 (메타)아크릴아미드, N-메틸(메타)아크릴아미드, N-에틸(메타)아크릴아미드, N-프로필(메타)아크릴아미드, N-이소프로필(메타)아크릴아미드, N-n-부틸아크릴(메타)아미드, N-t-부틸(메타)아크릴아미드, N-시클로헥실(메타)아크릴아미드, N-(2-메톡시에틸)(메타)아크릴아미드, N,N-디메틸(메 타)아크릴아미드, N,N-디에틸(메타)아크릴아미드, N-페닐(메타)아크릴아미드, N-벤질(메타)아크릴아미드, (메타)아크릴로일모르포린, 디아세톤아크릴아미드 등이 열거된다.As (meth) acrylamide, (meth) acrylamide, N-methyl (meth) acrylamide, N-ethyl (meth) acrylamide, N-propyl (meth) acrylamide, N-isopropyl (meth) acrylamide, Nn-butylacryl (meth) amide, Nt-butyl (meth) acrylamide, N-cyclohexyl (meth) acrylamide, N- (2-methoxyethyl) (meth) acrylamide, N, N-dimethyl (meth Ta) acrylamide, N, N-diethyl (meth) acrylamide, N-phenyl (meth) acrylamide, N-benzyl (meth) acrylamide, (meth) acryloyl morpholine, diacetone acrylamide, and the like. Listed.
스티렌류의 예로서는 스티렌, 메틸스티렌, 디메틸스티렌, 트리메틸스티렌, 에틸스티렌, 이소프로필스티렌, 부틸스티렌, 히드록시스티렌, 메톡시스티렌, 부톡시스티렌, 아세톡시스티렌, 클로로스티렌, 디클로로스티렌, 브로모스티렌, 클로로메틸스티렌, 산성 물질에 의해 탈보호 가능한 기(예를 들면 t-Boc 등)로 보호된 히드록시스티렌, 비닐벤조산 메틸, 및 α-메틸스티렌 등이 열거된다.Examples of styrenes include styrene, methyl styrene, dimethyl styrene, trimethyl styrene, ethyl styrene, isopropyl styrene, butyl styrene, hydroxy styrene, methoxy styrene, butoxy styrene, acetoxy styrene, chloro styrene, dichloro styrene and bromostyrene And chloromethylstyrene, hydroxystyrene protected with a group deprotectable by an acidic substance (for example, t-Boc, etc.), methyl vinylbenzoate, α-methylstyrene, and the like.
비닐에테르류의 예로서는 메틸비닐에테르, 부틸비닐에테르, 헥실비닐에테르, 및 메톡시에틸비닐에테르 등이 열거된다.Examples of vinyl ethers include methyl vinyl ether, butyl vinyl ether, hexyl vinyl ether, methoxyethyl vinyl ether, and the like.
상기의 화합물 이외에도 (메타)아크릴로니트릴, 비닐기가 치환된 복소환식 기(예를 들면, 비닐피리딘, 비닐피롤리돈, 비닐카르바졸 등), N-비닐포름아미드, N-비닐아세트아미드, N-비닐이미다졸, 비닐카프로락톤 등도 사용할 수 있다.In addition to the above compounds, (meth) acrylonitrile, a heterocyclic group substituted with a vinyl group (for example, vinylpyridine, vinylpyrrolidone, vinylcarbazole, etc.), N-vinylformamide, N-vinylacetamide, N -Vinylimidazole, vinyl caprolactone, etc. can also be used.
또한, 예를 들면 우레탄기, 우레아기, 술폰아미드기, 페놀기, 이미드기 등의 관능기를 갖는 비닐모노머도 사용할 수 있다. 이러한 우레탄기 또는 우레아기를 갖는 단량체로서는 예를 들면, 이소시아네이트기와 수산기, 또는 아미노기의 부가반응을 이용하고, 적당하게 합성하는 것이 가능하다. 구체적으로는 이소시아네이트기 함유 모노머와 수산기를 1개 함유하는 화합물 또는 1급 또는 2급 아미노기를 1개 함유하는 화합물의 부가반응, 또는 수산기 함유 모노머 또는 1급 또는 2급 아미노기 함유 모노머와 모노이소시아네이트의 부가반응 등에 의해 적당하게 합성할 수 있다.Moreover, the vinyl monomer which has functional groups, such as a urethane group, a urea group, a sulfonamide group, a phenol group, and an imide group, can also be used, for example. As a monomer which has such a urethane group or a urea group, it is possible to synthesize | combine suitably using addition reaction of an isocyanate group, a hydroxyl group, or an amino group, for example. Specifically, addition reaction of an isocyanate group-containing monomer and a compound containing one hydroxyl group or a compound containing one primary or secondary amino group, or addition of a hydroxyl group-containing monomer or a primary or secondary amino group-containing monomer and a monoisocyanate It can synthesize | combine suitably by reaction or the like.
또한, 하기에 나타나 있는 바와 같은 중합성 올리고머를 비닐 모노머로 간주해서 사용해도 된다.In addition, you may consider and use a polymeric oligomer as shown below as a vinyl monomer.
중합성 올리고머(이하,「매크로 모노머」라고 칭하는 경우가 있음)는 에틸렌성 불포화 이중 결합을 갖는 기를 말단에 갖는 올리고머이다. 본 발명에 있어서는 상기 중합성 올리고머 중에서도 상기 올리고머의 양쪽 말단의 한쪽에만 상기 에틸렌성 불포화 이중결합을 갖는 기를 갖는 것이 바람직하다.The polymerizable oligomer (hereinafter, sometimes referred to as "macro monomer") is an oligomer having a terminal having an ethylenically unsaturated double bond at its terminal. In this invention, it is preferable to have the group which has the said ethylenically unsaturated double bond only in one of the both ends of the said oligomer among the said polymerizable oligomers.
상기 중합성 올리고머의 분자량으로서는 폴리스티렌 환산의 수평균 분자량(Mn)이 1000∼20000인 것이 바람직하고, 2000∼15000인 것이 보다 바람직하다. 상기 수평균 분자량이 1000미만이면 분산제로서의 입체 반발 효과가 충분하지 않을 경우가 있고, 20000을 초과하면, 입체 효과에 의해, 착색제(안료)로의 흡착에 시간을 필요로 하는 경우가 있다.As molecular weight of the said polymerizable oligomer, it is preferable that the number average molecular weight (Mn) of polystyrene conversion is 1000-20000, and it is more preferable that it is 2000-15000. When the said number average molecular weight is less than 1000, the steric repulsion effect as a dispersing agent may not be enough, and when it exceeds 20000, time may be needed for adsorption to a coloring agent (pigment) by a steric effect.
상기 올리고머로서는 일반적으로는 예를 들면, 알킬(메타)아크릴레이트, 스티렌, 아크릴로니트릴, 아세트산 비닐 및 부타디엔에서 선택된 적어도 1종의 모노머로 형성된 단독 중합체 또는 공중합체 등이 열거되고, 이들 중에서도 알킬(메타)아크릴레이트의 단독 중합체 또는 공중합체, 폴리스티렌 등이 바람직하다. 본 발명에 있어서, 이들의 올리고머는 치환기로 치환되어 있어도 좋고, 상기 치환기로서는 특별히 제한은 없지만, 예를 들면, 수산기, 할로겐 원자 등이 열거된다.As said oligomer, the homopolymer or copolymer formed from the at least 1 sort (s) of monomer chosen from alkyl (meth) acrylate, styrene, acrylonitrile, vinyl acetate, butadiene generally is mentioned, for example, Alkyl ( Preference is given to homopolymers or copolymers of meta) acrylates, polystyrenes and the like. In this invention, these oligomers may be substituted by the substituent and there is no restriction | limiting in particular as said substituent, For example, a hydroxyl group, a halogen atom, etc. are mentioned.
상기의 비닐 모노머는 1종만으로 중합시켜도 좋고, 2종 이상을 병용해서 공중합시켜도 좋고, 이러한 라디칼 중합체는 각각 해당하는 비닐 모노머를 공지의 방 법으로 상법에 따라서 중합시킴으로써 얻어진다.Said vinyl monomer may be superposed | polymerized only by 1 type, and may be copolymerized in combination of 2 or more types, and these radical polymers are obtained by superposing | polymerizing the corresponding vinyl monomer in a well-known method according to a conventional method, respectively.
예를 들면, 이들 비닐 모노머, 및 연쇄이동제를 적당한 용매 중에 용해하고, 여기에 라디칼 중합 개시제를 첨가하고, 약 50℃∼220℃에서, 용액 중으로 중합시키는 방법(용액 중합법)을 이용해서 얻어진다.For example, these vinyl monomers and a chain transfer agent are melt | dissolved in a suitable solvent, and a radical polymerization initiator is added to this, and it is obtained using the method (solution polymerization method) which superposes | polymerizes in solution at about 50 degreeC-220 degreeC. .
용액 중합법에서 사용되는 적당한 용매의 예로서는 사용하는 단량체, 및 생성하는 공중합체의 용해성에 따라서 임의로 선택할 수 있다. 예를 들면, 메탄올, 에탄올, 프로판올, 이소프로판올, 프로필렌글리콜모노메틸에테르, 프로필렌글리콜모노메틸에테르아세테이트, 아세톤, 메틸에틸케톤, 메틸이소부틸케톤, 메톡시프로필아세테이트, 락트산 에틸, 아세트산 에틸, 아세토니트릴, 테트라히드로푸란, 디메틸포름아미드, 클로로포름, 톨루엔이 열거된다. 이들의 용매는 2종 이상을 혼합해서 사용해도 좋다.As an example of a suitable solvent used by the solution polymerization method, it can select arbitrarily according to the solubility of the monomer to be used and the copolymer to produce | generate. For example, methanol, ethanol, propanol, isopropanol, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, acetone, methyl ethyl ketone, methyl isobutyl ketone, methoxypropyl acetate, ethyl lactate, ethyl acetate, acetonitrile, Tetrahydrofuran, dimethylformamide, chloroform, toluene. You may use these solvent in mixture of 2 or more type.
또한, 라디칼 중합 개시제로서는 2, 2'-아조비스(이소부티로니트릴)(AIBN), 2,2'-아조비스-(2,4'-디메틸발레로니트릴)과 같은 아조 화합물, 벤조일퍼옥시드와 같은 과산화물, 및 과황산 칼륨, 과황산 암모늄과 같은 과황산염 등을 이용할 수 있다.Moreover, as a radical polymerization initiator, azo compounds, such as 2,2'- azobis (isobutyronitrile) (AIBN), 2,2'- azobis- (2,4'- dimethylvaleronitrile), and benzoyl peroxide Peroxides, and persulfates, such as potassium persulfate and ammonium persulfate, etc. can be used.
본 발명에 있어서의 (B) 분산 수지는 상술한 바와 같이, 산가가 20∼300mg/g의 범위인 것을 필요로 하고, 바람직하게는 30∼250mg/g의 범위이고, 보다 바람직하게는 30∼200mg/g의 범위이다.As described above, the dispersion resin (B) in the present invention needs to have an acid value in the range of 20 to 300 mg / g, preferably in the range of 30 to 250 mg / g, and more preferably 30 to 200 mg. range of / g.
(B) 분산 수지의 산가가 이 범위이면 (A) 안료(안료)의 분산성, 분산 안정성이 우수하고, 또한 알칼리 현상성도 우수하다.If the acid value of (B) dispersion resin is this range, it is excellent in the dispersibility and dispersion stability of (A) pigment (pigment), and also excellent in alkali developability.
또한, (B) 분산 수지의 중량평균 분자량은 3,000∼100,000의 범위인 것을 필요로 하고, 바람직하게는 3,000∼70,000의 범위이고, 보다 바람직하게는 5,000∼50,000의 범위이다.Moreover, the weight average molecular weight of (B) dispersion resin needs to be the range of 3,000-100,000, Preferably it is the range of 3,000-70,000, More preferably, it is the range of 5,000-50,000.
(B) 분산 수지의 중량평균 분자량이 이 범위이면, (A-1) 착색제나 후술하는 (A-2) 차광제로서 사용되는 안료의 분산 시간의 단축, 및 분산물의 경시 안정성의 관점에서 바람직하다.If the weight average molecular weight of (B) dispersion resin is this range, it is preferable from a viewpoint of shortening of the dispersion time of the pigment used as a coloring agent (A-1) and the (A-2) light-shielding agent mentioned later, and stability with time of a dispersion. .
또한, 본 발명에 있어서의 (B) 분산 수지로서는 안료 흡착성기를 고분자 말단에 2∼100개 갖는 고분자 화합물, 또는 질소 함유 복소환을 갖고, 또한 에틸렌성 불포화기를 갖는 단량체를 공중합 단위로서 포함하는 고분자 화합물인 것이 바람직하다.Moreover, as (B) dispersion resin in this invention, the high molecular compound which has 2-100 polymer pigment adsorption groups in a polymer terminal, or the high molecular compound which has a nitrogen-containing heterocycle and also has the monomer which has an ethylenically unsaturated group as a copolymerization unit Is preferably.
이하, 이 2개의 고분자 화합물에 대해서 구체적으로 설명한다.Hereinafter, these two high molecular compounds are demonstrated concretely.
(B) 분산 수지로서의 안료 흡착성기를 고분자 말단에 2∼100개 갖는 고분자 화합물로서는 상술한 바와 같은 특정의 산가 및 중량평균 분자량을 갖고, 또한 안료 흡착성기를 고분자 말단에 2∼100개 갖는 고분자 화합물이면, 특별히 제한되지 않지만, 이하의 것이 바람직하다.(B) As the polymer compound having 2 to 100 pigment-adsorbent groups as the dispersing resin at the polymer terminal, the polymer compound has a specific acid value and weight average molecular weight as described above, and has 2 to 100 pigment-adsorbent groups at the polymer terminal, Although it does not restrict | limit especially, the following are preferable.
즉, 안료 흡착성기를 고분자 말단에 4∼70개 갖는 고분자 화합물이 바람직하고, 또한 안료 흡착성기를 고분자 말단에 5∼50개 갖는 고분자 화합물이 바람직하다. 또한 안료 흡착기로서는 유기색소 구조, 복소환 구조, 산성기, 염기성기 등이 바람직하다. 이들 중에서도 후술의 일반식(1)로 나타내어지는 고분자 화합물인 것이 바람직하다.That is, the polymer compound which has 4-70 pigment | dye adsorption groups in a polymer terminal is preferable, and the polymer compound which has 5-50 pigment | dye adsorption groups in a polymer terminal is preferable. As the pigment adsorber, an organic pigment structure, a heterocyclic structure, an acidic group, a basic group and the like are preferable. Among these, it is preferable that it is a high molecular compound represented by General formula (1) mentioned later.
(B) 분산 수지로서의 질소 함유 복소환을 갖고, 또한, 에틸렌성 불포화기를 갖는 단량체를 공중합 단위로서 포함하는 고분자 화합물로서는 상술한 바와 같은 특정의 산가 및 중량평균 분자량을 가짐과 아울러, 질소 함유 복소환을 갖고, 또한, 에틸렌성 불포화기를 갖는 단량체를 공중합 단위로서 포함하는 고분자 화합물이면, 특별히 제한되지 않지만, 이하의 질소 함유 복소환을 갖는 것이 바람직하다.(B) A polymer compound having a nitrogen-containing heterocycle as a dispersion resin and containing a monomer having an ethylenically unsaturated group as a copolymerization unit has a specific acid value and a weight average molecular weight as described above, and a nitrogen-containing heterocycle Although it does not restrict | limit especially if it is a high molecular compound which has a monomer which has a monomer which has an ethylenically unsaturated group as a copolymerization unit, It is preferable to have the following nitrogen containing heterocycle.
바람직한 질소 함유 복소환으로서는 피롤, 피롤린, 피롤리딘, 피라졸, 피라졸린, 피라졸리딘, 이미다졸, 트리아졸, 피리딘, 피페리딘, 모르포린, 피리다진, 피리미딘, 피페라진, 트리아진, 이소인돌린, 이소인돌리논, 벤즈이미다졸론, 벤조티아졸, 숙신이미드, 프탈이미드, 나프탈이미드, 히단토인, 카르바졸이 열거된다.Preferred nitrogen-containing heterocycles include pyrrole, pyrroline, pyrrolidine, pyrazole, pyrazoline, pyrazolidine, imidazole, triazole, pyridine, piperidine, morpholine, pyridazine, pyrimidine, piperazine, tri Azine, isoindolin, isoindolinone, benzimidazolone, benzothiazole, succinimide, phthalimide, naphthalimide, hydantoin and carbazole.
그 중에서도 후술하는 일반식(I)로 나타내어지는 단량체로부터 유래하는 공중합단위를 포함하는 중합체, 또는 일반식(a)로 나타내어지는 구조 단위를 포함하는 중합체인 것이 바람직하다.Especially, it is preferable that it is a polymer containing the copolymerization unit derived from the monomer represented by general formula (I) mentioned later, or the polymer containing the structural unit represented by general formula (a).
이하, 본 발명에 있어서의 (B) 분산 수지로서 바람직한 (B-1) 일반식(1)로 나타내어지는 고분자 화합물, (B-2) 일반식(I)로 나타내어지는 단량체로부터 유래하는 공중합 단위를 포함하는 중합체, 및 (B-3) 일반식(a)로 나타내어지는 구조 단위를 포함하는 중합체에 관하여 설명한다.Hereinafter, the copolymer unit derived from the high molecular compound represented by (B-1) general formula (1) preferable as (B) dispersion resin in this invention, and the monomer represented by (B-2) general formula (I) The polymer containing and the polymer containing the structural unit represented by (B-3) general formula (a) are demonstrated.
[(B-1) 일반식(1)로 나타내어지는 고분자 화합물: (B-1) 특정 분산 수지][(B-1) Polymer compound represented by General Formula (1): (B-1) Specific Dispersion Resin]
우선, 하기 일반식(1)로 나타내어지는 고분자 화합물(이하, 적당하게 「(B-1) 특정 분산 수지」라고 칭한다.)에 관하여 설명한다.First, the high molecular compound represented by following General formula (1) (Hereinafter, it calls suitably "(B-1) specific dispersion resin.") Is demonstrated.
상기 일반식(1) 중 A1은 유기색소 구조, 복소환 구조, 산성기, 염기성 질소 원자를 갖는 기, 우레아기, 우레탄기, 배위성 산소 원자를 갖는 기, 탄소수 4개이상의 탄화수소기, 알콕시실릴기, 에폭시기, 이소시아네이트기, 및 수산기에서 선택되는 부위를 적어도 1종 포함하는 1가의 유기기를 나타낸다. n개의 A1은 같거나 달라도 좋다.In general formula (1), A 1 is an organic pigment structure, a heterocyclic structure, an acidic group, a group having a basic nitrogen atom, a urea group, a urethane group, a group having a coordinating oxygen atom, a hydrocarbon group having 4 or more carbon atoms, alkoxy The monovalent organic group containing at least 1 sort (s) of site | parts chosen from a silyl group, an epoxy group, an isocyanate group, and a hydroxyl group is shown. n pieces A 1 may be the same or different.
즉, 상기 A1은 유기색소 구조, 복소환 구조와 같은 안료에 대한 흡착 능력을 갖는 구조나 산성기, 염기성 질소 원자를 갖는 기, 우레아기, 우레탄기, 배위성 산소 원자를 갖는 기, 탄소수 4개이상의 탄화수소기, 알콕시실릴기, 에폭시기, 이소시아네이트기, 및 수산기와 같이 안료에 대한 흡착 능력을 갖는 관능기를 적어도 1종 포함하는 1가의 유기기를 나타낸다.That is, A 1 is a structure having an adsorption capacity for an organic pigment structure, a pigment such as a heterocyclic structure, an acid group, a group having a basic nitrogen atom, a urea group, a urethane group, a group having a coordinating oxygen atom, and having 4 carbon atoms. The monovalent organic group containing at least 1 sort (s) of functional group which has the adsorption capacity with respect to a pigment, such as more than a hydrocarbon group, an alkoxy silyl group, an epoxy group, an isocyanate group, and a hydroxyl group, is shown.
또한, 이하, 이 안료에 대한 흡착 능력을 갖는 부위(상기 구조 및 관능기)를 적당하게, 「흡착 부위」라고 총칭하여 설명한다.In addition, the site | part (the said structure and functional group) which has the adsorption | suction ability with respect to this pigment is demonstrated generally as a "adsorption site | part" generically.
상기 흡착 부위는 1개의 A1 중에 적어도 1종 포함되어 있으면 좋고, 2종 이상을 포함하고 있어도 좋다.The adsorption sites are good if it contains at least one member in one of A 1, may contain two or more kinds.
또한, 본 발명에 있어서,「흡착 부위를 적어도 1종 포함하는 1가의 유기기」는 상술의 흡착 부위와 1∼200개의 탄소 원자, 0∼20개의 질소 원자, 0∼100개의 산소 원자, 1∼400개의 수소 원자, 및 0∼40개의 황 원자로 이루어지는 유기 연결기가 결합해서 이루어지는 1가의 유기기이다. 또한, 흡착 부위 자체가 1가의 유기기를 구성할 수 있을 경우에는 흡착 부위 바로 그것이 A1으로 나타내어지는 1가의 유기기이어도 좋다.In the present invention, the "monovalent organic group containing at least one adsorption site" includes the adsorption site described above, 1 to 200 carbon atoms, 0 to 20 nitrogen atoms, 0 to 100 oxygen atoms, and 1 to 1 carbon atoms. It is a monovalent organic group which combines the organic coupling group which consists of 400 hydrogen atoms and 0-40 sulfur atoms. In addition, when the adsorption site itself can constitute a monovalent organic group, the adsorption site may be the monovalent organic group represented by A 1 .
우선, 상기 A1을 구성하는 흡착 부위에 대해서 이하에 설명한다.First, it will be described below adsorption sites constituting the A 1.
상기「유기색소 구조」로서는 예를 들면, 프탈로시아닌계, 불용성 아조계, 아조레이크계, 안트라퀴논계, 퀴나크리돈계, 디옥사진계, 디케토피롤로피롤계, 안트라피리딘계, 안트안트렌계, 인단트론계, 플라반트론계, 페리논계, 페릴렌계, 티오인디고계의 색소 구조가 바람직한 예로서 열거되고, 프탈로시아닌계, 아조레이크계, 안트라퀴논계, 디옥사진계, 디케토피롤로피롤계의 색소 구조가 보다 바람직하고, 프탈로시아닌계, 안트라퀴논계, 디케토피롤로피롤계의 색소 구조가 특히 바람직하다.Examples of the "organic pigment structure" include phthalocyanine, insoluble azo, azolake, anthraquinone, quinacridone, dioxazine, diketopyrrolopyrrole, anthrapyridine, ananthrene, and indanthrone. , Flavanetron, perinone, perylene-based, thioindigo-based pigment structures are listed as preferred examples, and phthalocyanine-based, azolake-based, anthraquinone-based, dioxazine-based, diketopyrrolopyrrole-based pigment structures are more preferred. In particular, a dye structure of phthalocyanine, anthraquinone and diketopyrrolopyrrole is particularly preferable.
또한, 상기 「복소환 구조」로서는 예를 들면, 티오펜, 푸란, 크산텐, 피롤, 피로인, 피롤리딘, 디옥솔란, 피라졸, 피라졸린, 피라졸리딘, 이미다졸, 옥사졸, 티아졸, 옥사디아졸, 트리아졸, 티아디아졸, 피란, 피리딘, 피페리딘, 디옥산, 모르포린, 피리다진, 피리미딘, 피페라진, 트리아진, 트리티안, 이소인돌린, 이소인돌리논, 벤즈이미다졸론, 벤조티아졸, 숙신이미드, 프탈이미드, 나프탈이미드, 히단토인, 인돌, 퀴놀린, 카르바졸, 아크리딘, 아크리돈, 안트라퀴논이 바람직한 예로서 열거되고, 피롤린, 피롤리딘, 피라졸, 피라졸린, 피라졸리딘, 이미다졸, 트리 아졸, 피리딘, 피페리딘, 모르포린, 피리다진, 피리미딘, 피페라진, 트리아진, 이소인돌린, 이소인돌리논, 벤즈이미다졸론, 벤조티아졸, 숙신이미드, 프탈이미드, 나프탈이미드, 히단토인, 카르바졸, 아크리딘, 아크리돈, 안트라퀴논이 보다 바람직하다.Moreover, as said "heterocyclic structure", for example, thiophene, furan, xanthene, pyrrole, pyroline, pyrrolidine, dioxolane, pyrazole, pyrazoline, pyrazolidine, imidazole, oxazole, thia Sol, oxadiazole, triazole, thiadiazole, pyran, pyridine, piperidine, dioxane, morpholine, pyridazine, pyrimidine, piperazine, triazine, trithiane, isoindolin, isoindolinone Benzimidazolone, benzothiazole, succinimide, phthalimide, naphthalimide, hydantoin, indole, quinoline, carbazole, acridine, acridon, anthraquinone are listed as preferred examples, Pyrroline, pyrrolidine, pyrazole, pyrazoline, pyrazolidine, imidazole, triazole, pyridine, piperidine, morpholine, pyridazine, pyrimidine, piperazine, triazine, isoindolin, isoin Dolanone, benzimidazolone, benzothiazole, succinimide, phthalimide, naphthalimide, hydantoin, carba More preferred are sol, acridine, acridon and anthraquinone.
또한, 상기 「유기색소 구조」또는「복소환 구조」는 치환기를 더 갖고 있어도 좋고, 상기 치환기로서는 예를 들면, 메틸기, 에틸기 등의 탄소수 1∼20개의 알킬기, 페닐기, 나프틸기 등의 탄소수 6∼16개의 아릴기, 수산기, 아미노기, 카르복실기, 술폰아미드기, N-술포닐아미드기, 아세톡시기 등의 탄소수 1∼6개의 아실옥시기, 메톡시기, 에톡시기 등의 탄소수 1∼20개의 알콕시기, 염소, 브롬 등의 할로겐 원자, 메톡시카르보닐기, 에톡시카르보닐기, 시클로헥실옥시카르보닐기 등의 탄소수 2∼7개의 알콕시카르보닐기, 시아노기, t-부틸카보네이트 등의 탄산에스테르기 등이 열거된다. 여기서, 이들의 치환기는 하기의 구조 단위 또는 상기 구조 단위가 조합되어 구성되는 연결기를 통하여 유기색소 구조 또는 복소환과 결합하고 있어도 좋다.The "organic pigment structure" or "heterocyclic structure" may further have a substituent, and as said substituent, for example, C6-C20 alkyl groups, such as a methyl group and an ethyl group, a phenyl group, a naphthyl group, etc. C1-C20 alkoxy groups, such as C1-C6 acyloxy, methoxy, and ethoxy groups, such as 16 aryl groups, a hydroxyl group, an amino group, a carboxyl group, a sulfonamide group, an N-sulfonylamide group, an acetoxy group, etc. And carbonate ester groups such as alkoxycarbonyl groups having 2 to 7 carbon atoms, cyano group and t-butyl carbonate, such as halogen atoms such as chlorine and bromine, methoxycarbonyl group, ethoxycarbonyl group and cyclohexyloxycarbonyl group. Here, these substituents may be couple | bonded with the organic pigment | dye structure or heterocycle through the coupling group which the following structural unit or the said structural unit combines.
상기「산성기」로서, 예를 들면 카르복실산기, 술폰산기, 모노황산 에스테르 기, 인산기, 모노인산 에스테르기, 붕산기가 바람직한 예로서 열거되고, 카르복실 산기, 술폰산기, 모노황산 에스테르기, 인산기, 모노인산 에스테르기가 보다 바람직하고, 카르복실산기, 술폰산기, 인산기가 특히 바람직하다.As said "acidic group", a carboxylic acid group, a sulfonic acid group, a monosulfate ester group, a phosphoric acid group, a monophosphate ester group, a boric acid group is mentioned as a preferable example, for example, a carboxylic acid group, a sulfonic acid group, a monosulfonic acid ester group, a phosphoric acid group , Monophosphate ester group is more preferable, and a carboxylic acid group, a sulfonic acid group, and a phosphoric acid group are especially preferable.
또한, 상기「염기성 질소 원자를 갖는 기」로서, 예를 들면 아미노기(-NH2), 치환 이미노기(-NHR8, -NR9R10, 여기서, R8, R9, 및 R10은 각각 독립적으로 탄소수 1∼20개의 알킬기, 탄소수 6개이상의 아릴기, 탄소수 7개이상의 아랄킬기를 나타낸다.), 하기 식(a1)로 나타내어지는 구아니딜기, 하기 식(a2)로 나타내어지는 아미디닐기 등이 바람직한 예로서 열거된다.Further, as the "group having a basic nitrogen atom", for example, an amino group (-NH 2), substituted imino group (-NHR 8, -NR 9 R 10 , where, R 8, R 9, and R 10 are each Independently an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 or more carbon atoms, an aralkyl group having 7 or more carbon atoms), a guanidyl group represented by the following formula (a1), and an amidinyl group represented by the following formula (a2): And the like are listed as preferred examples.
식(a1) 중 R11 및 R12는 각각 독립적으로 탄소수 1∼20개의 알킬기, 탄소수 6개이상의 아릴기, 탄소수 7개이상의 아랄킬기를 나타낸다.In formula (a1), R 11 and R 12 each independently represent an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 or more carbon atoms, and an aralkyl group having 7 or more carbon atoms.
식(a2) 중, R13 및 R14은 각각 독립적으로 탄소수 1∼20개의 알킬기, 탄소수 6개이상의 아릴기, 탄소수 7개이상의 아랄킬기를 나타낸다.In formula (a2), R <13> and R <14> respectively independently represents a C1-C20 alkyl group, a C6 or more aryl group, and a C7 or more aralkyl group.
이들 중에서도 아미노기(-NH2), 치환 이미노기(-NHR8, -NR9R10, 여기서, R8, R9, 및 R10은 각각 독립적으로 탄소수 1∼10개의 알킬기, 페닐기, 벤질기를 나타낸다.), 상기 식(a1)로 나타내어지는 구아니딜기[식(a1) 중 R11 및 R12는 각각 독립적 으로, 탄소수 1∼10개의 알킬기, 페닐기, 벤질기를 나타낸다.], 상기 식(a2)로 나타내어지는 아미디닐기[식(a2) 중 R13 및 R14는 각각 독립적으로 탄소수 1개∼10개의 알킬기, 페닐기, 벤질기를 나타낸다.] 등이 보다 바람직하다.Among these, an amino group (-NH 2 ), a substituted imino group (-NHR 8 , -NR 9 R 10 , wherein R 8 , R 9 , and R 10 each independently represent an alkyl group having 1 to 10 carbon atoms, a phenyl group, and a benzyl group .), Guanidyl group represented by said formula (a1) (In formula (a1), R <11> and R <12> represents a C1-C10 alkyl group, a phenyl group, and a benzyl group each independently.), The said formula (a2) More preferred are an amidinyl group (wherein R 13 and R 14 in the formula (a2) each independently represents an alkyl group having 1 to 10 carbon atoms, a phenyl group, or a benzyl group).
특히, 아미노기(-NH2), 치환 이미노기(-NHR8, -NR9R10, 여기서, R8, R9, 및 R10은 각각 독립적으로, 탄소수 1∼5개의 알킬기, 페닐기, 벤질기를 나타낸다.), 상기 식(a1)로 나타내어지는 구아니딜기[식(a1) 중 R11 및 R12는 각각 독립적으로 탄소수 1∼5개의 알킬기, 페닐기, 벤질기를 나타낸다.], 상기 식(a2)로 나타내어지는 아미디닐기[식(a2) 중 R13 및 R14는 각각 독립적으로 탄소수 1∼5개의 알킬기, 페닐기, 벤질기를 나타낸다.] 등이 바람직하게 사용된다.In particular, the amino group (-NH 2 ), substituted imino group (-NHR 8 , -NR 9 R 10 , wherein R 8 , R 9 , and R 10 each independently represent an alkyl group having 1 to 5 carbon atoms, a phenyl group, and a benzyl group. The guanidyl group represented by said formula (a1) (In formula (a1), R <11> and R <12> represents a C1-C5 alkyl group, a phenyl group, and a benzyl group each independently.), The said formula (a2) The amidinyl group (R <13> and R <14> in a formula (a2) respectively independently represent a C1-C5 alkyl group, a phenyl group, and a benzyl group.) Etc. are used preferably.
상기「우레아기」로서, 예를 들면 -NR15CONR16R17(여기서, R15, R16, 및 R17은 각각 독립적으로 수소 원자 또는 탄소수 1∼20개의 알킬기, 탄소수 6개이상의 아릴기, 탄소수 7개이상의 아랄킬기를 나타낸다.)이 바람직한 예로서 열거되고, -NR15CONHR17(여기서, R15 및 R17은 각각 독립적으로 수소 원자 또는 탄소수 1∼10개의 알킬기, 탄소수 6개이상의 아릴기, 탄소수 7개이상의 아랄킬기를 나타낸다.) 이 보다 바람직하고, -NHCONHR17(여기서, R17은 수소 원자 또는 탄소수 1∼10개의 알킬기, 탄소수 6개이상의 아릴기, 탄소수 7개이상의 아랄킬기를 나타낸다.)이 특히 바람직하다.As said "urea group", for example, -NR 15 CONR 16 R 17 (wherein R 15 , R 16 , and R 17 are each independently a hydrogen atom or an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 or more carbon atoms, Aralkyl groups having 7 or more carbon atoms are listed as preferred examples, and -NR 15 CONHR 17 (wherein R 15 and R 17 are each independently a hydrogen atom or an alkyl group having 1 to 10 carbon atoms and an aryl group having 6 or more carbon atoms). And aralkyl groups having 7 or more carbon atoms. More preferably, -NHCONHR 17 (wherein R 17 represents a hydrogen atom or an alkyl group having 1 to 10 carbon atoms, an aryl group having 6 or more carbon atoms, or an aralkyl group having 7 or more carbon atoms). .) Is particularly preferred.
상기 「우레탄기」로서, 예를 들면, -NHCOOR18, -NR19COOR20, -OCONHR21, -OCONR22R23(여기서, R18, R19, R20, R21, R22 및 R23은 각각 독립적으로 탄소수 1∼20개의 알킬기, 탄소수 6개이상의 아릴기, 탄소수 7개이상의 아랄킬기를 나타낸다.) 등이 바람직한 예로서 열거되고, -NHCOOR18 , -OCONHR21(여기서, R18, R21은 각각 독립적으로 탄소수 1∼20개의 알킬기, 탄소수 6개이상의 아릴기, 탄소수 7개이상의 아랄킬기를 나타낸다.) 등이 보다 바람직하고, -NHCOOR18, -OCONHR21(여기서, R18, R21은 각각 독립적으로 탄소수 1∼10개의 알킬기, 탄소수 6개이상의 아릴기, 탄소수 7개이상의 아랄킬기를 나타낸다.) 등이 특히 바람직하다.As said "urethane group", for example, -NHCOOR 18 , -NR 19 COOR 20 , -OCONHR 21 , -OCONR 22 R 23 (here, R 18 , R 19 , R 20 , R 21 , R 22 and R 23 Each independently represents an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 or more carbon atoms, an aralkyl group having 7 or more carbon atoms, and the like. Examples thereof include -NHCOOR 18 , -OCONHR 21 (wherein R 18 , R 21 each independently represent an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 or more carbon atoms, an aralkyl group having 7 or more carbon atoms, and the like. More preferably, -NHCOOR 18 or -OCONHR 21 (wherein R 18 and R 21 And each independently represent an alkyl group having 1 to 10 carbon atoms, an aryl group having 6 or more carbon atoms, an aralkyl group having 7 or more carbon atoms), and the like.
상기 「배위성 산소 원자를 갖는 기」로서는 예를 들면, 아세틸아세토나토 기, 크라운 에테르 등이 열거된다.As said "group which has coordinating oxygen atom", an acetylacetonato group, a crown ether, etc. are mentioned, for example.
상기 「탄소수 4개이상의 탄화수소기」로서는 탄소수 4개이상의 알킬기, 탄소수 6개이상의 아릴기, 탄소수 7개이상의 아랄킬기 등이 바람직한 예로서 열거되고, 탄소수 4∼20개의 알킬기, 탄소수 6∼20개의 아릴기, 탄소수 7∼20개의 아랄킬기 등이 보다 바람직하고, 탄소수 4∼15개의 알킬기(예를 들면, 옥틸기, 도데실기등), 탄소수 6∼15개의 아릴기(예를 들면, 페닐기, 나프틸기 등), 탄소수 7∼15개의 아랄킬기(예를 들면, 벤질기 등) 등이 특히 바람직하다.Examples of the "hydrocarbon group having 4 or more carbon atoms" include alkyl groups having 4 or more carbon atoms, aryl groups having 6 or more carbon atoms, aralkyl groups having 7 or more carbon atoms, and the like, and examples thereof include alkyl groups having 4 to 20 carbon atoms and aryl having 6 to 20 carbon atoms. Group, a C7-20 aralkyl group, etc. are more preferable, a C4-15 alkyl group (for example, an octyl group, a dodecyl group, etc.), a C6-C15 aryl group (for example, a phenyl group, a naphthyl group) And aralkyl groups having 7 to 15 carbon atoms (e.g., benzyl groups).
상기「알콕시실릴기」로서는 예를 들면, 트리메톡시실릴기, 트리에톡시실릴기 등이 열거된다.As said "alkoxy silyl group", a trimethoxy silyl group, a triethoxy silyl group, etc. are mentioned, for example.
상기 흡착 부위와 결합하는 유기 연결기로서는 단일 결합 또는 1개∼100개의 탄소 원자, 0개∼10개의 질소 원자, 0개∼50개의 산소 원자, 1개∼200개의 수소 원자, 및 0개∼20개의 황원자로 이루어지는 유기 연결기가 바람직하고, 이 유기 연결기는 무치환이어도 치환기를 더 갖고 있어도 좋다.As the organic linking group bonded to the adsorption site, a single bond or 1 to 100 carbon atoms, 0 to 10 nitrogen atoms, 0 to 50 oxygen atoms, 1 to 200 hydrogen atoms, and 0 to 20 atoms The organic coupling group which consists of a sulfur atom is preferable, and this organic coupling group may be unsubstituted, or may have a substituent further.
이 유기 연결기의 구체적인 예로서, 하기의 구조 단위 또는 상기 구조 단위가 조합되어 구성되는 기를 들 수 있다.As a specific example of this organic coupling group, group which the following structural unit or the said structural unit combines is comprised.
상기 유기 연결기가 치환기를 가질 경우, 상기 치환기로서는 예를 들면, 메틸기, 에틸기 등의 탄소수 1∼20개의 알킬기, 페닐기, 나프틸기 등의 탄소수 6∼16개의 아릴기, 수산기, 아미노기, 카르복실기, 술폰아미드기, N-술포닐아미드기, 아세톡시기 등의 탄소수 1∼6개의 아실옥시기, 메톡시기, 에톡시기 등의 탄소수 1∼6개의 알콕시기, 염소, 브롬 등의 할로겐 원자, 메톡시카르보닐기, 에톡시카르보닐기, 시클로헥실옥시카르보닐기 등의 탄소수 2∼7개의 알콕시카르보닐기, 시아노기, t-부틸카보네이트 등의 탄산 에스테르기 등이 열거된다.When the organic linking group has a substituent, the substituent includes, for example, an alkyl group having 1 to 20 carbon atoms, such as a methyl group and an ethyl group, an aryl group having 6 to 16 carbon atoms, such as a phenyl group and a naphthyl group, a hydroxyl group, an amino group, a carboxyl group, and a sulfonamide. C1-C6 acyloxy groups, such as group, N-sulfonylamide group, and acetoxy group, C1-C6 alkoxy groups, such as a methoxy group and an ethoxy group, halogen atoms, such as chlorine and a bromine, methoxycarbonyl group, Carbonic acid ester groups, such as a C2-C7 alkoxycarbonyl group, a cyano group, t-butyl carbonate, such as an ethoxy carbonyl group and a cyclohexyloxycarbonyl group, etc. are mentioned.
상기 중에서는 상기 A1로서, 유기색소 구조, 복소환 구조, 산성기, 염기성 질소 원자를 갖는 기, 우레아기, 및 탄소수 4개이상의 탄화수소기에서 선택되는 부위를 적어도 1종 포함하는 1가의 유기기인 것이 바람직하다.The Among as the A 1, an organic dye structure, a heterocyclic structure, an acidic group, a basic nitrogen group having atom, a urea group, and the carbon number of the monovalent organic group containing at least one type of the site selected from at least four hydrocarbon group It is preferable.
상기 A1로서는 하기 일반식(4)로 나타내어지는 1가의 유기기인 것이 보다 바람직하다.As to the A 1 it is more preferably a monovalent organic group is represented by formula (4).
상기 일반식(4) 중 B1은 상기 흡착 부위(즉, 유기색소 구조, 복소환 구조, 산성기, 염기성 질소 원자를 갖는 기, 우레아기, 우레탄기, 배위성 산소 원자를 갖는 기, 탄소수 4개이상의 탄화수소기, 알콕시실릴기, 에폭시기, 이소시아네이트기, 및 수산기에서 선택되는 부위)를 나타내고, R24은 단일 결합 또는 (a+1)가의 유기 연결기를 나타낸다. a는 1∼10의 정수를 나타내고, a개의 B1은 같거나 달라도 좋다.In Formula (4), B 1 represents the adsorption site (ie, an organic pigment structure, a heterocyclic structure, an acid group, a group having a basic nitrogen atom, a urea group, a urethane group, a group having a coordinating oxygen atom, and 4 carbon atoms). Or more hydrocarbon groups, alkoxysilyl groups, epoxy groups, isocyanate groups, and hydroxyl groups), and R 24 represents a single bond or an (a + 1) valence organic linking group. a represents the integer of 1-10, and a B <1> may be same or different.
상기 B1로 나타내어지는 흡착 부위로서는 상술의 일반식(1)의 A1을 구성하는 흡착 부위와 동일한 것이 열거되고, 바람직한 예도 동일하다.As the adsorption sites represented by the B 1 is open to the same as the adsorption sites constituting the A 1 in the general formula (1) described above, the same preferable examples.
그 중에서도, 유기색소 구조, 복소환 구조, 산성기, 염기성 질소 원자를 갖는 기, 우레아기, 및 탄소수 4개이상의 탄화수소기에서 선택되는 부위가 바람직하다.Especially, the site | part selected from an organic pigment | dye structure, a heterocyclic structure, an acidic group, the group which has a basic nitrogen atom, a urea group, and a C4 or more hydrocarbon group is preferable.
R24는 단일 결합 또는(a+1)가의 유기 연결기를 나타내고, a는 1∼10을 나타낸다. 바람직하게는 a는 1∼7이고, 보다 바람직하게는 a는 1∼5이며, 특히 바람직하게는 a는 1∼3이다.R <24> represents a single bond or (a + 1) valent organic coupling group, and a represents 1-10. Preferably a is 1-7, More preferably, a is 1-5, Especially preferably, a is 1-3.
(a+1)가의 유기 연결기로서는 1개∼100개의 탄소 원자, 0개∼10개의 질소 원자, 0개∼50개의 산소 원자, 1개∼200개의 수소 원자, 및 0개∼20개의 황 원자로 이루어지는 기가 포함되고, 무치환이어도 치환기를 더 갖고 있어도 좋다.The (a + 1) valent organic linking group is composed of 1 to 100 carbon atoms, 0 to 10 nitrogen atoms, 0 to 50 oxygen atoms, 1 to 200 hydrogen atoms, and 0 to 20 sulfur atoms. A group is contained and may be unsubstituted or may have a substituent further.
상기 (a+1)가의 유기 연결기는 구체적인 예로서, 하기의 구조 단위 또는 상기 구조 단위가 조합되어 구성되는 기(환구조를 형성하고 있어도 좋다)를 들 수 있다.Specific examples of the (a + 1) valent organic linking group include groups (which may form a ring structure) formed by combining the following structural units or the structural units.
R24로서는 단일 결합, 또는 1개∼50개의 탄소 원자, 0개∼8개의 질소 원자, 0개∼25개의 산소 원자, 1개∼100개의 수소 원자, 및 0개∼10개의 황 원자로 이루어지는 (a+1)가의 유기 연결기가 바람직하고, 단일 결합 또는 1개∼30개의 탄소 원자, 0개∼6개의 질소 원자, 0개∼15개의 산소 원자, 1개∼50개의 수소 원자, 및 0 개∼7개의 황 원자로 이루어지는 (a+1)가의 유기 연결기가 보다 바람직하고, 단일 결합, 또는 1개∼10개의 탄소 원자, 0개∼5개의 질소 원자, 0개∼10개의 산소 원자, 1개∼30개의 수소 원자, 및 0개∼5개의 황 원자로 이루어지는 (a+1)가의 유기 연결기가 특히 바람직하다.R 24 is a single bond or composed of 1 to 50 carbon atoms, 0 to 8 nitrogen atoms, 0 to 25 oxygen atoms, 1 to 100 hydrogen atoms, and 0 to 10 sulfur atoms (a Preferred organic linkage groups are a single bond or 1 to 30 carbon atoms, 0 to 6 nitrogen atoms, 0 to 15 oxygen atoms, 1 to 50 hydrogen atoms, and 0 to 7 carbon atoms. (A + 1) valent organic linkage group which consists of two sulfur atoms is more preferable, and is a single bond or 1-10 carbon atoms, 0-5 nitrogen atoms, 0-10 oxygen atoms, 1-30 Particularly preferred is an organic linking group having a hydrogen atom and a (a + 1) valence of 0 to 5 sulfur atoms.
상기 중 (a+1)가의 유기 연결기가 치환기를 가질 경우, 상기 치환기로서는 예를 들면, 메틸기, 에틸기 등의 탄소수 1∼20개의 알킬기, 페닐기, 나프틸기 등의 탄소수 6∼16개의 아릴기, 수산기, 아미노기, 카르복실기, 술폰아미드기, N-술포닐아미드기, 아세톡시기 등의 탄소수 1∼6개의 아실옥시기, 메톡시기, 에톡시기 등의 탄소수 1∼6개의 알콕시기, 염소, 브롬 등의 할로겐 원자, 메톡시카르보닐기, 에톡시카르보닐기, 시클로헥실옥시카르보닐기 등의 탄소수 2∼7개의 알콕시카르보닐기, 시아노기, t-부틸카보네이트 등의 탄산 에스테르기 등이 열거된다.When the (a + 1) valent organic linking group has a substituent, the substituent includes, for example, an alkyl group having 1 to 20 carbon atoms, such as a methyl group and an ethyl group, an aryl group having 6 to 16 carbon atoms, such as a phenyl group and a naphthyl group, and a hydroxyl group. And alkoxy groups having 1 to 6 carbon atoms, such as amino, carboxyl, sulfonamide, N-sulfonylamide and acetoxy groups, and alkoxy groups having 1 to 6 carbon atoms such as methoxy and ethoxy groups, such as chlorine and bromine. Carbonate ester groups, such as a C2-C7 alkoxycarbonyl group, a cyano group, t-butyl carbonate, etc., such as a halogen atom, a methoxycarbonyl group, an ethoxycarbonyl group, and a cyclohexyloxycarbonyl group, are mentioned.
상기 일반식(1) 중 R2는 단일 결합 또는 2가의 유기 연결기를 나타낸다. n개의 R2는 같거나 달라도 좋다.In General Formula (1), R 2 represents a single bond or a divalent organic linking group. n R 2 may be the same or different.
2가의 유기 연결기로서는 1개∼100개의 탄소 원자, 0개∼10개의 질소 원자, 0개∼50개의 산소 원자, 1개∼200개의 수소 원자, 및 0개∼20개의 황 원자로 이루어지는 기가 포함되고, 무치환이어도 치환기를 더 갖고 있어도 좋다.The divalent organic linking group includes a group consisting of 1 to 100 carbon atoms, 0 to 10 nitrogen atoms, 0 to 50 oxygen atoms, 1 to 200 hydrogen atoms, and 0 to 20 sulfur atoms, Even if unsubstituted, it may have a substituent further.
상기 2가의 유기 연결기는 구체적인 예로서, 하기의 구조 단위 또는 상기 구조 단위가 조합되어 구성되는 기를 들 수 있다.Specific examples of the divalent organic linking group include the following structural units or groups in which the structural units are combined.
R2로서는 단일 결합, 또는 1개∼50개의 탄소 원자, 0개∼8개의 질소 원자, 0개∼25개의 산소 원자, 1개∼100개의 수소 원자, 및 0개∼10개의 황 원자로 이루어지는 2가의 유기 연결기가 바람직하고, 단일 결합 또는 1개∼30개의 탄소 원자, 0개∼6개의 질소 원자, 0개∼15개의 산소 원자, 1개∼50개의 수소 원자, 및 0개∼7개의 황 원자로 이루어지는 2가의 유기 연결기가 보다 바람직하고, 단일 결합 또는 1개∼10개의 탄소 원자, 0개∼5개의 질소 원자, 0개∼10개의 산소 원자, 1개∼30개의 수소 원자, 및 0개∼5개의 황 원자로 이루어지는 2가의 유기 연결기가 특히 바람직하다.R 2 is a single bond or a divalent compound consisting of 1 to 50 carbon atoms, 0 to 8 nitrogen atoms, 0 to 25 oxygen atoms, 1 to 100 hydrogen atoms, and 0 to 10 sulfur atoms. Organic linkages are preferred and consist of a single bond or from 1 to 30 carbon atoms, 0 to 6 nitrogen atoms, 0 to 15 oxygen atoms, 1 to 50 hydrogen atoms, and 0 to 7 sulfur atoms Divalent organic linking groups are more preferable, and are a single bond or 1-10 carbon atoms, 0-5 nitrogen atoms, 0-10 oxygen atoms, 1-30 hydrogen atoms, and 0-5 Particularly preferred is a divalent organic linking group consisting of sulfur atoms.
상기 중, 2가의 유기 연결기가 치환기를 가질 경우, 상기 치환기로서는 예를 들면 메틸기, 에틸기 등의 탄소수 1개∼20개의 알킬기, 페닐기, 나프틸기 등의 탄소수 6개∼16개의 아릴기, 수산기, 아미노기, 카르복실기, 술폰아미드기, N-술포닐 아미드기, 아세톡시기 등의 탄소수 1개∼6개의 아실옥시기, 메톡시기, 에톡시기 등의 탄소수 1개∼6개의 알콕시기, 염소, 브롬 등의 할로겐 원자, 메톡시카르보닐기, 에톡시카르보닐기, 시클로헥실옥시카르보닐기 등의 탄소수 2개∼7개의 알콕시카르보닐기, 시아노기, t-부틸카보네이트 등의 탄산 에스테르기 등이 열거된다.In the above, when the divalent organic linking group has a substituent, the substituent includes, for example, an alkyl group having 1 to 20 carbon atoms, such as a methyl group and an ethyl group, an aryl group having 6 to 16 carbon atoms, such as a phenyl group and a naphthyl group, a hydroxyl group, and an amino group. And alkoxy groups having 1 to 6 carbon atoms such as carboxyl group, sulfonamide group, N-sulfonyl amide group, acetoxy group, and alkoxy group having 1 to 6 carbon atoms such as methoxy group and ethoxy group, chlorine and bromine Carbonate ester groups, such as a C2-C7 alkoxycarbonyl group, a cyano group, t-butyl carbonate, etc., such as a halogen atom, a methoxycarbonyl group, an ethoxycarbonyl group, and a cyclohexyloxycarbonyl group, are mentioned.
상기 일반식(1) 중 R1은 (m+n)가의 유기 연결기를 나타낸다. m+n은 3∼10을 만족시킨다.R <1> in the said General formula (1) represents a (m + n) valent organic coupling group. m + n satisfies 3-10.
상기 R1로 나타내어지는 (m+n)가의 유기 연결기로서는 1개∼100개의 탄소 원자, 0개∼10개의 질소 원자, 0개∼50개의 산소 원자, 1개∼200개의 수소 원자, 및 0개∼20개의 황 원자로 이루어지는 기가 포함되고, 무치환이어도 치환기를 더 갖고 있어도 좋다.Examples of the (m + n) valent organic linking group represented by R 1 include 1 to 100 carbon atoms, 0 to 10 nitrogen atoms, 0 to 50 oxygen atoms, 1 to 200 hydrogen atoms, and 0 The group which consists of -20 sulfur atoms is contained, and even if it is unsubstituted, it may have a substituent further.
상기 (m+n)가의 유기 연결기는 구체적인 예로서, 하기의 구조 단위 또는 상기 구조 단위가 조합되어 구성되는 기(환구조를 형성하고 있어도 좋음)를 들 수 있다.Specific examples of the (m + n) valent organic linking group include the following structural units or groups (which may form a ring structure) formed by combining the structural units.
(m+n)가의 유기 연결기로서는 1개∼60개의 탄소 원자, 0개∼10개의 질소 원자, 0개∼40개의 산소 원자, 1개∼120개의 수소 원자, 및 0개∼10개의 황 원자로 이루어지는 기가 바람직하고, 1개∼50개의 탄소 원자, 0개∼10개의 질소 원자, 0개∼30개의 산소 원자, 1개∼100개의 수소 원자, 및 0개∼7개의 황 원자로 이루어지 는 기가 보다 바람직하고, 1개∼40개의 탄소 원자, 0개∼8개의 질소 원자, 0개∼20개의 산소 원자, 1개∼80개의 수소 원자, 및 0개∼5개의 황 원자로 이루어지는 기가 특히 바람직하다.The (m + n) valent organic linking group is composed of 1 to 60 carbon atoms, 0 to 10 nitrogen atoms, 0 to 40 oxygen atoms, 1 to 120 hydrogen atoms, and 0 to 10 sulfur atoms. A group is preferable, and group which consists of 1-50 carbon atoms, 0-10 nitrogen atoms, 0-30 oxygen atoms, 1-100 hydrogen atoms, and 0-7 sulfur atoms is more preferable. And a group consisting of 1 to 40 carbon atoms, 0 to 8 nitrogen atoms, 0 to 20 oxygen atoms, 1 to 80 hydrogen atoms, and 0 to 5 sulfur atoms.
상기 중, (m+n)가의 유기 연결기가 치환기를 가질 경우, 상기 치환기로서는 예를 들면 메틸기, 에틸기 등의 탄소수 1개∼20개의 알킬기, 페닐기, 나프틸기 등의 탄소수 6개∼16개의 아릴기, 수산기, 아미노기, 카르복실기, 술폰아미드기, N-술포닐아미드기, 아세톡시기 등의 탄소수 1개∼6개의 아실옥시기, 메톡시기, 에톡시기 등의 탄소수 1개∼6개의 알콕시기, 염소, 브롬 등의 할로겐 원자, 메톡시카르보닐기, 에톡시카르보닐기, 시클로헥실옥시카르보닐기 등의 탄소수 2개∼7개의 알콕시 카르보닐기, 시아노기, t-부틸카보네이트 등의 탄산 에스테르기 등이 열거된다.In the above, when the (m + n) valent organic linking group has a substituent, the substituent may be, for example, an alkyl group having 1 to 20 carbon atoms such as a methyl group or an ethyl group, or an aryl group having 6 to 16 carbon atoms such as a phenyl group or a naphthyl group. C1-C6 alkoxy groups, such as a C1-C6 acyloxy group, such as a hydroxyl group, an amino group, a carboxyl group, a sulfonamide group, an N-sulfonylamide group, an acetoxy group, a methoxy group, an ethoxy group, chlorine And carbonate ester groups such as a C2-7 alkoxycarbonyl group, a cyano group, t-butyl carbonate, such as a halogen atom such as bromine, a methoxycarbonyl group, an ethoxycarbonyl group, and a cyclohexyloxycarbonyl group.
상기 R1로 나타내어지는 (m+n)가의 유기 연결기의 구체적인 예[구체예(1)∼(17)]를 이하에 나타낸다. 단, 본 발명에 있어서는 이들에 제한되는 것은 아니다.Specific examples (specific examples (1) to (17)) of the (m + n) valent organic linking group represented by R 1 are shown below. However, in this invention, it is not limited to these.
상기의 구체예 중에서도 원료의 입수성, 합성의 용이성, 각종 용매로의 용해성의 관점으로부터, 가장 바람직한 (m+n)가의 유기 연결기는 하기의 기이다.Among the above specific examples, the most preferred (m + n) -valent organic linking group is from the viewpoints of availability of raw materials, ease of synthesis, and solubility in various solvents.
상기 일반식(1) 중 m은 1∼8을 나타낸다. m으로서는 1∼5가 바람직하고, 1∼4가 보다 바람직하고, 1∼3이 특히 바람직하다.M in the said General formula (1) represents 1-8. As m, 1-5 are preferable, 1-4 are more preferable, and 1-3 are especially preferable.
또한, 상기 일반식(1) 중 n은 2∼9를 나타낸다. n으로서는 2∼8이 바람직하고, 2∼7이 보다 바람직하고, 3∼6이 특히 바람직하다.In addition, in said General formula (1), n represents 2-9. As n, 2-8 are preferable, 2-7 are more preferable, and 3-6 are especially preferable.
상기 일반식(1) 중 P1은 고분자 골격을 나타내고, 공지의 폴리머 등으로부터 목적 등에 따라 선택할 수 있다. m개의 P1은 같거나 달라도 좋다.In General Formula (1), P 1 represents a polymer skeleton and can be selected from known polymers according to the purpose and the like. m P 1 may be the same or different.
폴리머 중에서도 고분자 골격을 구성하기 위해서는 비닐 모노머의 중합체 또는 공중합체, 에스테르계 폴리머, 에테르계 폴리머, 우레탄계 폴리머, 아미드계 폴리머, 에폭시계 폴리머, 실리콘계 폴리머, 및 이들의 변성물, 또는 공중합체[예를 들면, 폴리에테르/폴리우레탄 공중합체, 폴리에테르/비닐모노머의 중합체의 공중합체 등(랜덤 공중합체, 블록 공중합체, 그래프트 공중합체 중 어느 하나이어도 좋다)을 포함한다.]으로 이루어지는 군에서 선택되는 적어도 1종이 바람직하고, 비닐 모노머의 중합체 또는 공중합체, 에스테르계 폴리머, 에테르계 폴리머, 우레탄계 폴리머, 및 이들의 변성물 또는 공중합체로 이루어지는 군에서 선택되는 적어도 1종이 보다 바람직하고, 비닐 모노머의 중합체 또는 공중합체가 특히 바람직하다.Among the polymers, polymers or copolymers of vinyl monomers, ester-based polymers, ether-based polymers, urethane-based polymers, amide-based polymers, epoxy-based polymers, silicone-based polymers, and modified substances or copolymers thereof may be used. For example, a copolymer of a polyether / polyurethane copolymer, a polymer of a polyether / vinyl monomer, or the like (random copolymer, block copolymer, graft copolymer may be used), or the like. At least 1 sort (s) is preferable, At least 1 sort (s) chosen from the group which consists of a polymer or copolymer of a vinyl monomer, an ester type polymer, an ether type polymer, a urethane type polymer, and these modified | denatured products or a copolymer is more preferable, and a polymer of a vinyl monomer Or copolymers are particularly preferred.
또한, 상기 폴리머는 유기 용매에 가용인 것이 바람직하다. 유기 용매와의 친화성이 낮으면, 예를 들면 안료분산제로서 사용했을 경우, 분산매와의 친화성이 약해지고, 분산 안정화에 충분한 흡착층을 확보할 수 없게 되는 경우가 있다.In addition, the polymer is preferably soluble in an organic solvent. When the affinity with an organic solvent is low, when used as a pigment dispersant, for example, affinity with a dispersion medium may become weak and it may become impossible to ensure the adsorption layer sufficient for dispersion stabilization.
상기 비닐 모노머로서는 특별히 제한되지 않지만, 예를 들면, (메타)아크릴산 에스테르류, 크로톤산 에스테르류, 비닐에스테르류, 말레산 디에스테르류, 푸말산 디에스테르류, 이타콘산 디에스테르류, (메타)아크릴아미드류, 스티렌류, 비닐에테르류, 비닐케톤류, 올레핀류, 말레이미드류, (메타)아크릴로니트릴, 산성기를 갖는 비닐 모노머 등이 바람직하다.Although it does not restrict | limit especially as said vinyl monomer, For example, (meth) acrylic acid ester, crotonic acid ester, vinyl ester, maleic acid diester, fumaric acid diester, itaconic acid diester, (meth) Acrylamides, styrenes, vinyl ethers, vinyl ketones, olefins, maleimides, (meth) acrylonitrile and vinyl monomers having an acidic group are preferable.
이하, 이들의 비닐 모노머의 바람직한 예에 관하여 설명한다.Hereinafter, the preferable example of these vinyl monomers is demonstrated.
(메타)아크릴산 에스테르류의 예로서는 (메타)아크릴산 메틸, (메타)아크릴산 에틸, (메타)아크릴산 n-프로필, (메타)아크릴산 이소프로필, (메타)아크릴산 n-부틸, (메타)아크릴산 이소부틸, (메타)아크릴산 t-부틸, (메타)아크릴산 아밀, (메타)아크릴산 n-헥실, (메타)아크릴산 시클로헥실, (메타)아크릴산 t-부틸시클로헥실, (메타)아크릴산 2-에틸헥실, (메타)아크릴산 t-옥틸, (메타)아크릴산 도데실, (메타)아크릴산 옥타데실, (메타)아크릴산 아세톡시에틸, (메타)아크릴산 페닐, (메타)아크릴산 2-히드록시에틸, (메타)아크릴산-2-히드록시프로필, (메타)아크릴산-3-히드록시프로필, (메타)아크릴산-4-히드록시부틸, (메타)아크릴산 2-메톡 시에틸, (메타)아크릴산 2-에톡시에틸, (메타)아크릴산 2-(2-메톡시에톡시)에틸, (메타)아크릴산 3-페녹시-2-히드록시프로필, (메타)아크릴산-2-클로로에틸, (메타)아크릴산 글리시딜, (메타)아크릴산-3,4-에폭시시클로헥실메틸, (메타)아크릴산 비닐, (메타)아크릴산-2-페닐비닐, (메타)아크릴산-1-프로페닐, (메타)아크릴산 알릴, (메타)아크릴산-2-알릴옥시에틸, (메타)아크릴산 프로파르길, (메타)아크릴산 벤질, (메타)아크릴산 디에틸렌글리콜모노메틸에테르, (메타)아크릴산 디에틸렌글리콜모노에틸에테르, (메타)아크릴산 트리에틸렌글리콜모노메틸에테르, (메타)아크릴산 트리에틸렌글리콜모노에틸에테르, (메타)아크릴산 폴리에틸렌글리콜모노메틸에테르, (메타)아크릴산 폴리에틸렌글리콜모노에틸에테르, (메타)아크릴산 β-페녹시에톡시에틸, (메타)아크릴산 노닐페녹시폴리에틸렌글리콜, (메타)아크릴산 디시클로펜테닐, (메타)아크릴산 디시클로펜테닐옥시에틸, (메타)아크릴산 트리플루오로에틸, (메타)아크릴산 옥타플루오로펜틸, (메타)아크릴산 퍼플루오로옥틸에틸, (메타)아크릴산 디시클로펜타닐, (메타)아크릴산 트리브로모페닐, (메타)아크릴산 트리브로모페닐옥시에틸, (메타)아크릴산-γ-부티로락톤 등이 열거된다.Examples of (meth) acrylic acid esters include methyl (meth) acrylate, ethyl (meth) acrylate, n-propyl (meth) acrylate, isopropyl (meth) acrylate, n-butyl (meth) acrylate, isobutyl (meth) acrylate, T-butyl (meth) acrylate, amyl (meth) acrylate, n-hexyl (meth) acrylate, cyclohexyl (meth) acrylate, t-butylcyclohexyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, (meth) T-octyl acrylate, dodecyl (meth) acrylate, octadecyl (meth) acrylate, acetoxy (meth) acrylate, phenyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, (meth) acrylic acid-2 -Hydroxypropyl, (meth) acrylic acid-3-hydroxypropyl, (meth) acrylic acid-4-hydroxybutyl, (meth) acrylic acid 2-methoxyethyl, (meth) acrylic acid 2-ethoxyethyl, (meth) 2- (2-methoxyethoxy) ethyl acrylate, 3-phenoxy-2-hydroxypropyl (meth) acrylate, ( 2-chloroethyl methacrylate, glycidyl (meth) acrylate, -3,4-epoxycyclohexylmethyl (meth) acrylic acid, vinyl (meth) acrylate, 2-phenylvinyl (meth) acrylate, (meth) -1-propenyl acrylate, allyl (meth) acrylate, 2-allyl oxyethyl (meth) acrylate, propargyl (meth) acrylate, benzyl (meth) acrylate, diethylene glycol monomethyl ether (meth) acrylate, ( (Meth) acrylic acid diethylene glycol monoethyl ether, (meth) acrylic acid triethylene glycol monomethyl ether, (meth) acrylic acid triethylene glycol monoethyl ether, (meth) acrylic acid polyethylene glycol monomethyl ether, (meth) acrylic acid polyethylene glycol monoethyl ether Ether, (meth) acrylic acid (beta) -phenoxy ethoxyethyl, (meth) acrylic-acid nonylphenoxy polyethylene glycol, (meth) acrylic-acid dicyclopentenyl, (meth) acrylic-acid dicyclopentenyloxyethyl, (meth) a Trifluoroethyl acrylate, octafluoropentyl (meth) acrylate, perfluorooctylethyl (meth) acrylate, dicyclopentanyl (meth) acrylate, tribromophenyl (meth) acrylate, tribromophenyl (meth) acrylate Oxyethyl, (meth) acrylic acid-γ-butyrolactone, and the like.
크로톤산 에스테르류의 예로서는 크로톤산 부틸, 및 크로톤산 헥실 등이 열거된다.Examples of crotonic acid esters include butyl crotonate, hexyl crotonate, and the like.
비닐에스테르류의 예로서는 비닐아세테이트, 비닐클로로아세테이트, 비닐프로피오네이트, 비닐부티레이트, 비닐메톡시아세테이트, 및 벤조산 비닐 등이 열거된다.Examples of vinyl esters include vinyl acetate, vinyl chloroacetate, vinyl propionate, vinyl butyrate, vinyl methoxy acetate, vinyl benzoate and the like.
말레산 디에스테르류의 예로서는 말레산 디메틸, 말레산 디에틸, 및 말레산 디부틸 등이 열거된다.Examples of maleic acid diesters include dimethyl maleate, diethyl maleate, dibutyl maleate and the like.
푸말산 디에스테르류의 예로서는 푸말산 디메틸, 푸말산 디에틸, 및 푸말산 디부틸 등이 열거된다.Examples of fumaric acid diesters include dimethyl fumarate, diethyl fumarate, dibutyl fumarate and the like.
이타콘산 디에스테르류의 예로서는 이타콘산 디메틸, 이타콘산 디에틸, 및 이타콘산 디부틸 등이 열거된다.Examples of itaconic acid diesters include dimethyl itaconic acid, diethyl itaconic acid, dibutyl itaconic acid, and the like.
(메타)아크릴아미드류로서는 (메타)아크릴아미드, N-메틸(메타)아크릴아미드, N-에틸(메타)아크릴아미드, N-프로필(메타)아크릴아미드, N-이소프로필(메타)아크릴아미드, N-n-부틸아크릴(메타)아미드, N-t-부틸(메타)아크릴아미드, N-시클로헥실(메타)아크릴아미드, N-(2-메톡시에틸)(메타)아크릴아미드, N,N-디메틸(메타)아크릴아미드, N,N-디에틸(메타)아크릴아미드, N-페닐(메타)아크릴아미드, N-니트로페닐아크릴아미드, N-에틸-N-페닐아크릴아미드, N-벤질(메타)아크릴아미드, (메타)아크릴로일모르포린, 디아세톤아크릴아미드, N-메틸올아크릴아미드, N-히드록시에틸아크릴아미드, 비닐(메타)아크릴아미드, N,N-디알릴(메타)아크릴아미드, N-알릴(메타)아크릴아미드 등이 열거된다.As (meth) acrylamide, (meth) acrylamide, N-methyl (meth) acrylamide, N-ethyl (meth) acrylamide, N-propyl (meth) acrylamide, N-isopropyl (meth) acrylamide, Nn-butylacryl (meth) amide, Nt-butyl (meth) acrylamide, N-cyclohexyl (meth) acrylamide, N- (2-methoxyethyl) (meth) acrylamide, N, N-dimethyl (meth Acrylamide, N, N-diethyl (meth) acrylamide, N-phenyl (meth) acrylamide, N-nitrophenyl acrylamide, N-ethyl-N-phenyl acrylamide, N-benzyl (meth) acrylamide , (Meth) acryloyl morpholine, diacetone acrylamide, N-methylol acrylamide, N-hydroxyethyl acrylamide, vinyl (meth) acrylamide, N, N- diallyl (meth) acrylamide, N -Allyl (meth) acrylamide, etc. are mentioned.
스티렌류의 예로서는 스티렌, 메틸스티렌, 디메틸스티렌, 트리메틸스티렌, 에틸스티렌, 이소프로필스티렌, 부틸스티렌, 히드록시스티렌, 메톡시스티렌, 부톡시스티렌, 아세톡시스티렌, 클로로스티렌, 디클로로스티렌, 브로모스티렌, 클로로메틸스티렌, 산성 물질에 의해 탈보호 가능한 기(예를 들면 t-Boc 등)로 보호된 히드록시스티렌, 비닐벤조산 메틸, 및 α-메틸스티렌 등이 열거된다.Examples of styrenes include styrene, methyl styrene, dimethyl styrene, trimethyl styrene, ethyl styrene, isopropyl styrene, butyl styrene, hydroxy styrene, methoxy styrene, butoxy styrene, acetoxy styrene, chloro styrene, dichloro styrene and bromostyrene And chloromethylstyrene, hydroxystyrene protected with a group deprotectable by an acidic substance (for example, t-Boc, etc.), methyl vinylbenzoate, α-methylstyrene, and the like.
비닐에테르류의 예로서는 메틸비닐에테르, 에틸비닐에테르, 2-클로로에틸비 닐에테르, 히드록시에틸비닐에테르, 프로필비닐에테르, 부틸비닐에테르, 헥실비닐에테르, 옥틸비닐에테르, 메톡시에틸비닐에테르 및 페닐비닐에테르 등이 열거된다.Examples of vinyl ethers include methyl vinyl ether, ethyl vinyl ether, 2-chloroethyl vinyl ether, hydroxyethyl vinyl ether, propyl vinyl ether, butyl vinyl ether, hexyl vinyl ether, octyl vinyl ether, methoxyethyl vinyl ether, and phenyl Vinyl ethers and the like.
비닐케톤류의 예로서는 메틸비닐케톤, 에틸비닐케톤, 프로필비닐케톤, 페닐 비닐케톤 등이 열거된다.Examples of vinyl ketones include methyl vinyl ketone, ethyl vinyl ketone, propyl vinyl ketone, and phenyl vinyl ketone.
올레핀류의 예로서는 에틸렌, 프로필렌, 이소부틸렌, 부타디엔, 이소프렌 등이 열거된다.Examples of the olefins include ethylene, propylene, isobutylene, butadiene, isoprene and the like.
말레이미드류의 예로서는 말레이미드, 부틸말레이미드, 시클로헥실말레이미드, 페닐말레이미드 등이 열거된다.Examples of maleimide include maleimide, butyl maleimide, cyclohexyl maleimide, phenyl maleimide and the like.
(메타)아크릴로니트릴, 비닐기가 치환된 복소환식 기(예를 들면, 비닐피리딘, N-비닐피롤리돈, 비닐카르바졸 등), N-비닐포름아미드, N-비닐아세트아미드, N-비닐이미다졸, 비닐카프로락톤 등도 사용할 수 있다.(Meth) acrylonitrile, a heterocyclic group substituted with a vinyl group (for example, vinylpyridine, N-vinylpyrrolidone, vinylcarbazole, etc.), N-vinylformamide, N-vinylacetamide, N-vinyl Imidazole, vinyl caprolactone, etc. can also be used.
상기의 화합물 이외에도, 예를 들면, 우레탄기, 우레아기, 술폰아미드기, 페놀기, 이미드기 등의 관능기를 갖는 비닐 모노머도 사용할 수 있다. 이러한 우레탄기, 또는 우레아기를 갖는 단량체로서는 예를 들면, 이소시아네이트기와 수산기 또는 아미노기의 부가 반응을 이용하여 적당하게 합성하는 것이 가능하다. 구체적으로는 이소시아네이트기 함유 모노머와 수산기를 1개 함유하는 화합물 또는 1급 또는 2급 아미노기를 1개 함유하는 화합물의 부가 반응, 또는 수산기 함유 모노머 또는 1급 또는 2급 아미노기 함유 모노머와 모노이소시아네이트의 부가 반응 등에 의해 적당하게 합성할 수 있다.In addition to the above compounds, vinyl monomers having functional groups such as urethane groups, urea groups, sulfonamide groups, phenol groups, and imide groups can also be used. As a monomer which has such a urethane group or a urea group, it is possible to synthesize | combine suitably using the addition reaction of an isocyanate group, a hydroxyl group, or an amino group, for example. Specifically, addition reaction of an isocyanate group-containing monomer and a compound containing one hydroxyl group or a compound containing one primary or secondary amino group, or addition of a hydroxyl group-containing monomer or a primary or secondary amino group-containing monomer and a monoisocyanate It can synthesize | combine suitably by reaction or the like.
상기 산성기를 갖는 비닐 모노머의 예로서는 카르복실기를 갖는 비닐 모노머 나 술폰산기를 갖는 비닐 모노머가 열거된다.Examples of the vinyl monomer having an acidic group include a vinyl monomer having a carboxyl group and a vinyl monomer having a sulfonic acid group.
카르복실기를 갖는 비닐 모노머로서, (메타)아크릴산, 비닐벤조산, 말레산, 말레산 모노알킬에스테르, 푸말산, 이타콘산, 크로톤산, 신남산, 아크릴산 다이머 등이 열거된다. 또한, 2-히드록시에틸(메타)아크릴레이트 등의 수산기를 갖는 단량체와 무수 말레산이나 무수 프탈산, 시클로헥산디카르복실산 무수물과 같은 환상 무수물의 부가 반응물, ω-카르복시-폴리카프로락톤모노(메타)아크릴레이트 등도 이용할 수 있다. 또한 카르복실기의 전구체로서 무수 말레산, 무수 이타콘산, 무수 시트라콘산 등의 무수물 함유 모노머를 사용해도 좋다. 또한, 이들 중에서는 공중합성이나 코스트, 용해성 등의 관점으로부터 (메타)아크릴산이 특히 바람직하다.Examples of the vinyl monomer having a carboxyl group include (meth) acrylic acid, vinylbenzoic acid, maleic acid, maleic acid monoalkyl esters, fumaric acid, itaconic acid, crotonic acid, cinnamic acid, acrylic acid dimers, and the like. Furthermore, the addition reaction product of the monomer which has hydroxyl groups, such as 2-hydroxyethyl (meth) acrylate, and cyclic anhydrides, such as maleic anhydride, phthalic anhydride, and cyclohexane dicarboxylic anhydride, (omega)-carboxy- polycaprolactone mono ( Meth) acrylate etc. can also be used. Moreover, you may use anhydride containing monomers, such as maleic anhydride, itaconic anhydride, a citraconic acid anhydride, as a precursor of a carboxyl group. Moreover, in these, (meth) acrylic acid is especially preferable from a viewpoint of copolymerizability, cost, and solubility.
또한, 술폰산기를 갖는 비닐모노머로서, 2-아크릴아미드-2-메틸프로판술폰산등이 열거되고, 인산기를 갖는 비닐 모노머로서, 인산 모노(2-아크릴로일옥시에틸에스테르), 인산 모노(1-메틸-2-아크릴로일옥시에틸에스테르) 등이 열거된다.Examples of the vinyl monomer having a sulfonic acid group include 2-acrylamide-2-methylpropanesulfonic acid and the like, and examples of the vinyl monomer having a phosphoric acid group include monophosphate (2-acryloyloxyethyl ester) and mono (1-methyl phosphate). 2-acryloyloxyethyl ester) etc. are mentioned.
또한, 산성기를 갖는 비닐 모노머로서, 페놀성 히드록실기를 함유하는 비닐 모노머나 술폰아미드기를 함유하는 비닐 모노머 등도 이용할 수 있다.Moreover, as a vinyl monomer which has an acidic group, the vinyl monomer containing a phenolic hydroxyl group, the vinyl monomer containing a sulfonamide group, etc. can also be used.
상기 일반식(1)로 나타내어지는 고분자 화합물 중에서도 하기 일반식(2)로 나타내어지는 고분자 화합물이 바람직하다.Among the high molecular compounds represented by the general formula (1), the high molecular compounds represented by the following general formula (2) are preferable.
상기 일반식(2)에 있어서, A2는 유기색소 구조, 복소환 구조, 산성기, 염기 성 질소 원자를 갖는 기, 우레아기, 우레탄기, 배위성 산소 원자를 갖는 기, 탄소수 4개이상의 탄화수소기, 알콕시실릴기, 에폭시기, 이소시아네이트기, 및 수산기에서 선택되는 부위를 적어도 1종 포함하는 1가의 유기기를 나타낸다. n개의 A2는 같거나 달라도 좋다.In the general formula (2), A 2 is an organic pigment structure, a heterocyclic structure, an acidic group, a group having a basic nitrogen atom, a urea group, a urethane group, a group having a coordinating oxygen atom, a hydrocarbon having 4 or more carbon atoms. The monovalent organic group containing at least 1 sort (s) of site | parts chosen from group, an alkoxy silyl group, an epoxy group, an isocyanate group, and a hydroxyl group is shown. n pieces of A 2 may be the same or different.
또한, A2는 상기 일반식(1)에 있어서의 상기 A1과 동일한 의미이며, 바람직한 형태도 동일하다.In addition, A <2> is synonymous with said A <1> in the said General formula (1), and its preferable aspect is also the same.
상기 일반식(2)에 있어서, R4, R5은 각각 독립적으로 단일 결합 또는 2가의 유기 연결기를 나타낸다. n개의 R4는 같거나 달라도 좋다. 또한, m개의 R5은 같거나 달라도 좋다.In the said General formula (2), R <4> , R <5> represents a single bond or a bivalent organic coupling group each independently. n R 4 may be the same or different. In addition, m pieces of R 5 may be the same or different.
R4, R5로 나타내어지는 2가의 유기 연결기로서는 상기 일반식(1)의 R2로 나타내어지는 2가의 유기 연결기로서 열거된 것과 동일한 것이 사용되고, 바람직한 형태도 동일하다.As the divalent organic linking group represented by R 4 , R 5 , the same ones listed as the divalent organic linking group represented by R 2 in General Formula (1) are used, and the preferred form thereof is also the same.
상기 일반식(2)에 있어서, R3은 (m+n)가의 유기 연결기를 나타낸다. m+n은 3∼10을 만족시킨다.In the said General formula (2), R <3> represents the (m + n) valent organic coupling group. m + n satisfies 3-10.
상기 R3로 나타내어지는 (m+n)가의 유기 연결기로서는 1개∼60개의 탄소 원자, 0개∼10개의 질소 원자, 0개∼50개의 산소 원자, 1개∼100개의 수소 원자, 및 0개∼20개의 황 원자로 이루어지는 기가 포함되고, 무치환이어도 치환기를 더 갖고 있어도 좋다.Examples of the (m + n) valent organic linking group represented by R 3 include 1 to 60 carbon atoms, 0 to 10 nitrogen atoms, 0 to 50 oxygen atoms, 1 to 100 hydrogen atoms, and 0 The group which consists of -20 sulfur atoms is contained, and even if it is unsubstituted, it may have a substituent further.
상기 R3로 나타내어지는 (m+n)가의 유기 연결기로서, 구체적으로는 상기 일반식(1)의 R1로 나타내어지는 (m+n)가의 유기 연결기로서 열거된 것과 동일한 것이 사용되고, 바람직한 형태도 동일하다.As the (m + n) valent organic linking group represented by the above R 3 , specifically, the same as those listed as the (m + n) valent organic linking group represented by R 1 of the general formula (1) is used, and a preferred form is also shown. same.
상기 일반식(2) 중 m은 1∼8을 나타낸다. m으로서는 1∼5가 바람직하고, 1∼4가 보다 바람직하고, 1∼3이 특히 바람직하다.M shows 1-8 in the said General formula (2). As m, 1-5 are preferable, 1-4 are more preferable, and 1-3 are especially preferable.
또한, 상기 일반식(2) 중 n은 2∼9를 나타낸다. n으로서는 2∼8이 바람직하고, 2∼7이 보다 바람직하고, 3∼6이 특히 바람직하다.In addition, in said General formula (2), n represents 2-9. As n, 2-8 are preferable, 2-7 are more preferable, and 3-6 are especially preferable.
또한, 일반식(2) 중의 P2는 고분자 골격을 나타내고, 공지의 폴리머 등으로부터 목적 등에 따라 선택할 수 있다. m개의 P2는 같거나 달라도 좋다. 폴리머의 바람직한 형태에 대해서는 상기 일반식(1)에 있어서의 P1과 같다.In addition, P <2> in General formula (2) shows a polymer skeleton, and can be selected from a well-known polymer etc. according to the objective. m P 2 may be the same or different. About a preferable aspect of a polymer, it is the same as P <1> in the said General formula (1).
상기 일반식(2)로 나타내어지는 고분자 화합물 중, 이하에 나타내는 R3, R4, R5, P2, m, 및 n을 모두 만족시키는 것이 가장 바람직하다.It is most preferable to satisfy all of R <3> , R <4> , R <5> , P <2> , m, and n shown below among the high molecular compounds represented by the said General formula (2).
R3: 상기 구체예(1), (2), (10), (11), (16) 또는 (17)R 3 : the above specific examples (1), (2), (10), (11), (16) or (17)
R4: 단일 결합 또는 하기의 구조 단위 또는 상기 구조 단위가 조합되어 구성되는「1개∼10개의 탄소 원자, 0개∼5개의 질소 원자, 0개∼10개의 산소 원자, 1개 ∼30개의 수소 원자, 및 0개∼5개의 황 원자」로 이루어지는 2가의 유기 연결기(치환기를 갖고 있어도 좋고, 상기 치환기로서는 예를 들면, 메틸기, 에틸기 등의 탄소수 1개∼20개의 알킬기, 페닐기, 나프틸기 등의 탄소수 6개∼16개의 아릴기, 수산기, 아미노기, 카르복실기, 술폰아미드기, N-술포닐아미드기, 아세톡시기 등의 탄소수 1개∼6개의 아실옥시기, 메톡시기, 에톡시기 등의 탄소수 1개∼6개의 알콕시기, 염소, 브롬 등의 할로겐 원자, 메톡시카르보닐기, 에톡시카르보닐기, 시클로헥실옥시카르보닐기 등의 탄소수 2개∼7개의 알콕시카르보닐기, 시아노기, t-부틸카보네이트 등의 탄산 에스테르기 등이 열거된다.)R 4 : "1 to 10 carbon atoms, 0 to 5 nitrogen atoms, 0 to 10 oxygen atoms, 1 to 30 hydrogens constituted by a single bond or the following structural unit or a combination of the above structural units Atom, and 0-5 sulfur atoms "(which may have a substituent, for example, a C1-C20 alkyl group, such as a methyl group and an ethyl group, a phenyl group, a naphthyl group, etc.) C1-C6 acyloxy, methoxy, ethoxy group, such as a C6-C16 aryl group, a hydroxyl group, an amino group, a carboxyl group, a sulfonamide group, N-sulfonylamide group, an acetoxy group, etc. Carbonic esters, such as a C2-C7 alkoxycarbonyl group, a cyano group, t-butyl carbonate, such as a halogen atom, such as a C6-C6 alkoxy group, chlorine, and bromine, a methoxycarbonyl group, an ethoxycarbonyl group, and a cyclohexyloxycarbonyl group, etc. The like are listed.)
R5: 단일 결합, 에틸렌기, 프로필렌기, 하기 기(a), 또는 하기 기(b)R 5 : single bond, ethylene group, propylene group, the following group (a), or the following group (b)
또한, 하기 기 중, R12은 수소 원자 또는 메틸기를 나타내고, l은 1 또는 2를 나타낸다.In addition, in the following group, R <12> represents a hydrogen atom or a methyl group, and l represents 1 or 2.
P2: 비닐 모노머의 중합체 또는 공중합체, 에스테르계 폴리머, 에테르계 폴리머, 우레탄계 폴리머 및 이들의 변성물P 2 : polymer or copolymer of vinyl monomer, ester polymer, ether polymer, urethane polymer and modified products thereof
m: 1 ∼3m: 1 to 3
n: 3 ∼6n: 3 to 6
(합성 방법)(Synthesis method)
상기 일반식(1)로 나타내어지는 고분자 화합물(일반식(2)로 나타내어지는 것을 포함함)은 특별히 제한되지 않지만, 하기 방법 등에 의해 합성할 수 있다.The polymer compound represented by the general formula (1) (including those represented by the general formula (2)) is not particularly limited, but may be synthesized by the following method or the like.
1. 카르복실기, 히드록실기, 아미노기 등에서 선택되는 관능기를 말단에 도입한 폴리머와 복수의 상기 흡착 부위를 갖는 산 할라이드, 복수의 상기 흡착 부위를 갖는 알킬 할라이드, 또는 복수의 상기 흡착 부위를 갖는 이소시아네이트 등을 고분자 반응시키는 방법.1.A polymer incorporating a functional group selected from a carboxyl group, a hydroxyl group, an amino group, and the like with an acid halide having a plurality of the adsorption sites, an alkyl halide having a plurality of the adsorption sites, or an isocyanate having a plurality of the adsorption sites Method of reacting the polymer.
2. 말단에 탄소-탄소 이중 결합을 도입한 폴리머와 복수의 상기 흡착 부위를 갖는 메르캅탄을 마이클 부가 반응시키는 방법.2. The method of Michael addition-reacting the polymer which introduce | transduced the carbon-carbon double bond at the terminal, and the mercaptan which has several said adsorption site | parts.
3. 말단에 탄소-탄소 이중 결합을 도입한 폴리머와 상기 흡착 부위를 갖는 메르캅탄을 라디칼 발생제 존재 하에서 반응시키는 방법.3. A method in which a polymer having a carbon-carbon double bond introduced at its end and a mercaptan having the adsorption site are reacted in the presence of a radical generator.
4. 말단에 복수의 메르캅탄을 도입한 폴리머와 탄소-탄소 이중 결합과 상기흡착 부위를 갖는 화합물을 라디칼 발생제 존재 하에서 반응시키는 방법.4. A method of reacting a polymer having a plurality of mercaptans introduced at its terminal, a compound having a carbon-carbon double bond and the adsorption site in the presence of a radical generator.
5. 복수의 상기 흡착 부위를 갖는 메르캅탄 화합물 존재 하에서, 비닐 모노머를 라디칼 중합시키는 방법.5. A method of radically polymerizing a vinyl monomer in the presence of a mercaptan compound having a plurality of said adsorption sites.
상기 중 본 발명에 있어서의 (B-1)특정 분산 수지는 합성상의 용이성으로부터, 2, 3, 4, 5의 합성 방법이 바람직하고, 3, 4, 5의 합성 방법이 보다 바람직하다. 특히, (B-1)특정 분산 수지가 일반식(2)로 나타내어지는 구조를 가질 경우, 합성상의 용이함으로부터, 5의 합성 방법으로 합성하는 것이 가장 바람직하다.Among the above-mentioned, the synthesis method of 2, 3, 4, 5 is preferable, and, as for (B-1) specific dispersion resin in this invention, the synthesis method of 3, 4, 5 is more preferable. In particular, when (B-1) specific dispersion resin has a structure represented by General formula (2), it is most preferable to synthesize | combine by the synthesis method of 5 from the ease of synthesis.
상기 5의 합성 방법으로서, 보다 구체적으로는 하기 일반식(3)으로 나타내어지는 화합물 존재 하에서, 비닐 모노머를 라디칼 중합시키는 방법이 바람직하다.As said synthesis | combining method of said 5, More specifically, the method of radically polymerizing a vinyl monomer in presence of a compound represented by following General formula (3) is preferable.
상기 일반식(3)에 있어서, R6, R7, A3, m, 및 n은 각각 상기 일반식(2)에 있어서의 R3, R4, A2, m, 및 n과 동일한 의미이며, 그 바람직한 형태도 동일하다.In the general formula (3), R 6 , R 7 , A 3 , m, and n are the same meanings as R 3 , R 4 , A 2 , m, and n in the general formula (2), respectively. The preferable form is also the same.
상기 일반식(3)으로 나타내어지는 화합물은 이하의 방법 등으로 합성할 수 있지만, 합성상의 용이성으로부터, 하기 7의 방법이 보다 바람직하다.Although the compound represented by the said General formula (3) can be synthesize | combined with the following method etc., the method of following 7 is more preferable from the ease of synthesis.
6. 복수의 상기 흡착 부위를 갖는 할라이드 화합물로부터 메르캅탄 화합물로 변환하는 방법(티오 요소와 반응시켜 가수분해하는 방법, NaSH와 직접 반응시키는 방법, CH3COSNa와 반응시켜 가수분해시키는 방법 등이 열거된다.)6. Methods for converting a halide compound having a plurality of the above adsorption sites into a mercaptan compound (methods of hydrolysis by reacting with thiourea, methods of directly reacting with NaSH, methods of hydrolysis by reacting with CH 3 COSNa, and the like are listed. do.)
7. 1분자 중에 3∼10개의 메르캅토기를 갖는 화합물과 상기 흡착 부위를 갖고, 또한 메르캅토기와 반응가능한 관능기를 갖는 화합물을 부가 반응시키는 방법7. Method for addition-reacting a compound having 3 to 10 mercapto groups in one molecule and a compound having the above adsorption site and having a functional group capable of reacting with a mercapto group
상기 합성 방법 7에 있어서의「메르캅토기와 반응 가능한 관능기」로서는 산 할라이드, 알킬할라이드, 이소시아네이트, 탄소-탄소 이중 결합 등이 바람직하게 열거된다.As a "functional group which can react with a mercapto group" in the said synthesis method 7, an acid halide, an alkyl halide, an isocyanate, a carbon-carbon double bond, etc. are mentioned preferably.
「메르캅토기와 반응 가능한 관능기」가 탄소-탄소 이중 결합이고, 부가 반응이 라디칼 부가 반응인 것이 특히 바람직하다. 또한, 탄소-탄소 이중 결합으로서는 메르캅토기와의 반응성의 점에서, 1치환 또는 2치환의 비닐기가 보다 바람직하다.It is especially preferable that "the functional group which can react with a mercapto group" is a carbon-carbon double bond, and an addition reaction is a radical addition reaction. Moreover, as a carbon-carbon double bond, a mono- or bi-substituted vinyl group is more preferable at the point of the reactivity with a mercapto group.
1분자 중에 3∼10개의 메르캅토기를 갖는 화합물의 구체적인 예[구체예(18)∼(34)]로서는 이하의 화합물이 열거된다.The following compounds are mentioned as a specific example [specific examples (18)-(34)] of the compound which has 3-10 mercapto groups in 1 molecule.
상기 중에서도 원료의 입수성, 합성의 용이성, 각종 용매로의 용해성의 관점으로부터, 특히 바람직한 화합물은 이하의 화합물이다.Among the above, especially preferable compounds are the following compounds from the viewpoints of availability of raw materials, ease of synthesis, and solubility in various solvents.
상기 흡착 부위를 갖고, 또한 탄소-탄소 이중 결합을 갖는 화합물(구체적으로는 유기색소 구조, 복소환 구조, 산성기, 염기성 질소 원자를 갖는 기, 우레아기, 우레탄기, 배위성 산소 원자를 갖는 기, 탄소수 4개이상의 탄화수소기, 알콕시실릴기, 에폭시기, 이소시아네이트기, 및 수산기에서 선택되는 부위를 적어도 1종 갖고, 또한, 탄소-탄소 이중 결합을 갖는 화합물)로서는 특별히 제한되지 않지만, 이하와 같은 것이 열거된다.A compound having the above adsorption site and having a carbon-carbon double bond (specifically, an organic pigment structure, a heterocyclic structure, an acid group, a group having a basic nitrogen atom, a urea group, a urethane group, a group having a coordinating oxygen atom) , A compound having at least one moiety selected from a hydrocarbon group having 4 or more carbon atoms, an alkoxysilyl group, an epoxy group, an isocyanate group, and a hydroxyl group, and also having a carbon-carbon double bond) is not particularly limited. Listed.
상기 「1분자 중에 3∼10개의 메르캅토기를 갖는 화합물 」과 「상기 흡착 부위를 갖고, 또한 탄소-탄소 이중 결합을 갖는 화합물」의 라디칼 부가 반응 생성물은 예를 들면, 상기의 「1분자 중에 3∼10개의 메르캅토기를 갖는 화합물」 및 「상기 흡착 부위를 갖고, 또한 탄소-탄소 이중 결합을 갖는 화합물」을 적당한 용매 중에 용해하고, 여기에 라디칼 발생제를 첨가하고, 약 50℃∼100℃에서 부가시키는 방법(티올-엔 반응법)을 이용해서 얻어진다.The radical addition reaction products of the above-mentioned "compounds having 3 to 10 mercapto groups in one molecule" and "compounds having said adsorption site and having carbon-carbon double bonds" are, for example, in the above "molecules." Compound having 3 to 10 mercapto groups " and " a compound having the above adsorption site and having a carbon-carbon double bond " are dissolved in a suitable solvent, and a radical generator is added thereto, to about 50 ° C to 100 It is obtained using the method (thiol-ene reaction method) added at ° C.
상기 티올-엔 반응법에서 사용되는 적당한 용매의 예로서는 사용하는「1분자 중에 3∼10개의 메르캅토기를 갖는 화합물」, 「상기 흡착 부위를 갖고, 또한 탄소-탄소 이중 결합을 갖는 화합물」, 및 「생성하는 라디칼 부가 반응 생성물」의 용해성에 따라 임의로 선택할 수 있다.Examples of suitable solvents used in the thiol-ene reaction method include "compounds having 3 to 10 mercapto groups in one molecule", "compounds having said adsorption sites and having carbon-carbon double bonds", and It can select arbitrarily according to the solubility of "the radical addition reaction product to produce | generate."
예를 들면, 메탄올, 에탄올, 프로판올, 이소프로판올, 프로필렌글리콜모노메 틸에테르, 프로필렌글리콜모노메틸에테르아세테이트, 아세톤, 메틸에틸케톤, 메틸이소부틸케톤, 메톡시프로필아세테이트, 락트산 에틸, 아세트산 에틸, 아세토니트릴, 테트라히드로푸란, 디메틸포름아미드, 클로로포름, 톨루엔이 열거된다. 이들의 용매는 2종 이상을 혼합해서 사용해도 좋다.For example, methanol, ethanol, propanol, isopropanol, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, acetone, methyl ethyl ketone, methyl isobutyl ketone, methoxypropyl acetate, ethyl lactate, ethyl acetate, acetonitrile , Tetrahydrofuran, dimethylformamide, chloroform, toluene. You may use these solvent in mixture of 2 or more type.
또한, 라디칼 발생제로서는 2,2'-아조비스(이소부티로니트릴)(AIBN), 2,2'-아조비스-(2,4'-디메틸발레로니트릴), 2,2'-아조비스이소부티르산 디메틸과 같은 아조 화합물, 벤조일퍼옥시드와 같은 과산화물, 및 과황산 칼륨, 과황산 암모늄과 같은 과황산염 등등을 이용할 수 있다.Moreover, 2,2'- azobis (isobutyronitrile) (AIBN), 2,2'- azobis- (2,4'- dimethylvaleronitrile), 2,2'- azobis as a radical generator Azo compounds such as dimethyl isobutyrate, peroxides such as benzoylperoxide, and persulfates such as potassium persulfate, ammonium persulfate, and the like.
상기 5의 합성 방법에서 사용되는 비닐 모노머로서는 특별히 제한되지 않지만, 예를 들면, 상기 일반식(1)의 P1로 나타내어지는 고분자 골격을 얻을 때에 사용되는 비닐 모노머와 동일한 것이 사용된다.Although it does not restrict | limit especially as a vinyl monomer used by the said synthesis | combination method of 5, For example, the same thing as the vinyl monomer used when obtaining the polymer skeleton represented by P <1> of the said General formula (1) is used.
상기의 비닐 모노머는 1종만으로 중합시켜도 좋고, 2종 이상을 병용해서 공중합시켜도 좋다.Said vinyl monomer may be superposed | polymerized only by 1 type, and may copolymerize 2 or more types together.
또한, (B-1)특정 분산 수지는 1종 이상의 산성기를 갖는 비닐 모노머와 1종이상의 산성기를 갖지 않는 비닐 모노머를 공중합 시키는 것이 보다 바람직하다.Moreover, it is more preferable that (B-1) specific dispersion resin copolymerizes the vinyl monomer which has 1 or more types of acidic groups, and the vinyl monomer which does not have 1 or more types of acidic groups.
[(B-2) 일반식(I)로 나타내어지는 단량체로부터 유래하는 공중합 단위를 포함하는 중합체: (B-2) 특정 분산 수지][A polymer containing a copolymerization unit derived from the monomer represented by (B-2) General formula (I): (B-2) specific dispersion resin]
다음에 하기 일반식(I)로 나타내어지는 단량체로부터 유래하는 공중합 단위를 포함하는 중합체(이하, 적당하게, 「(B-2) 특정 분산 수지」라고 칭한다.)에 관 하여 설명한다.Next, it demonstrates about the polymer (Hereinafter, it calls suitably "(B-2) specific dispersion resin.") Containing the copolymer unit derived from the monomer represented by following General formula (I).
일반식(I)에 있어서, R01은 수소 원자 또는 치환 또는 무치환의 알킬기를 나타낸다. R02는 알킬렌기를 나타낸다. W는 -CO-, -C(=O)O-, -CONH-, -OC(=O)- 또는 페닐렌기를 나타낸다. X는 -O-, -S-, -C(=O)O-, -CONH-, -C(=O)S-, -NHCONH-, -NHC(=O)O-, -NHC(=O)S-, -OC(=O)-, -OCONH- 또는 -NHCO-을 나타낸다. Y는 -NR03-, -O-, -S- 또는 -N=을 나타내고, 이것과 인접하는 원자단을 통하여 N원자와 연결해서 환상 구조를 형성한다. R03은 수소 원자, 알킬기 또는 아릴기를 나타낸다. m1 및 n1은 각각 독립적으로 0 또는 1을 나타낸다.In General Formula (I), R 01 represents a hydrogen atom or a substituted or unsubstituted alkyl group. R 02 represents an alkylene group. W represents -CO-, -C (= 0) O-, -CONH-, -OC (= 0)-or a phenylene group. X is -O-, -S-, -C (= O) O-, -CONH-, -C (= O) S-, -NHCONH-, -NHC (= O) O-, -NHC (= O ) S-, -OC (= O)-, -OCONH- or -NHCO-. Y is -NR 03 - it represents a -O-, -S- or -N =, in connection with the N atom via an atomic group adjacent to it to form a cyclic structure. R 03 represents a hydrogen atom, an alkyl group or an aryl group. m1 and n1 each independently represent 0 or 1.
이하, 본 발명에 있어서의 (B-2) 특정 분산 수지의 필수적인 공중합 단위가 되는 일반식(I)로 나타내어지는 단량체에 대해서 상세하게 설명한다.Hereinafter, the monomer represented by general formula (I) used as an essential copolymerization unit of (B-2) specific dispersion resin in this invention is demonstrated in detail.
일반식(I)에 있어서, R01은 수소 원자 또는 치환 또는 무치환의 알킬기를 나타낸다.In General Formula (I), R 01 represents a hydrogen atom or a substituted or unsubstituted alkyl group.
R01로 나타내어지는 알킬기로서는 탄소수 1∼12개의 알킬기가 바람직하고, 탄소수 1∼8개의 알킬기가 보다 바람직하고, 탄소수 1∼4개의 알킬기가 특히 바람직하다.As an alkyl group represented by R <01> , a C1-C12 alkyl group is preferable, A C1-C8 alkyl group is more preferable, A C1-C4 alkyl group is especially preferable.
R01로 나타내어지는 알킬기가 치환 알킬기일 경우, 도입 가능한 치환기로서는 예를 들면, 히드록시기, 알콕시기, 아릴옥시기, 아실옥시기, 할로겐기 등이 열거된다.When the alkyl group represented by R 01 is a substituted alkyl group, examples of the substituent that can be introduced include a hydroxy group, an alkoxy group, an aryloxy group, an acyloxy group, a halogen group and the like.
R01로 나타내어지는 바람직한 알킬기로서 구체적으로는 메틸기, 에틸기, 프로필기, n-부틸기, i-부틸기, t-부틸기, n-헥실기, 시클로헥실기, 2-히드록시에틸기, 3-히드록시프로필기, 2-히드록시프로필기, 2-메톡시에틸기 등이 열거된다.Specific examples of the preferred alkyl group represented by R 01 include methyl group, ethyl group, propyl group, n-butyl group, i-butyl group, t-butyl group, n-hexyl group, cyclohexyl group, 2-hydroxyethyl group, 3- Hydroxypropyl group, 2-hydroxypropyl group, 2-methoxyethyl group, etc. are mentioned.
R02은 알킬렌기를 나타낸다.R 02 represents an alkylene group.
R02로 나타내어지는 알킬렌기로서는 탄소수 1∼12개의 알킬렌기가 바람직하고, 탄소수 1∼8개의 알킬렌기가 보다 바람직하고, 탄소수 1∼4개의 알킬렌기가 특히 바람직하다.As an alkylene group represented by R <02> , a C1-C12 alkylene group is preferable, A C1-C8 alkylene group is more preferable, A C1-C4 alkylene group is especially preferable.
R02로 나타내어지는 알킬렌기는 도입 가능할 경우에는 치환기를 갖고 있어도 좋고, 상기 치환기로서는 예를 들면, 히드록시기, 알콕시기, 아릴옥시기, 아실옥시기 등이 열거된다.When the alkylene group represented by R 02 can be introduced, it may have a substituent, and examples of the substituent include a hydroxy group, an alkoxy group, an aryloxy group, an acyloxy group, and the like.
R02로 나타내어지는 바람직한 알킬렌기로서 구체적으로는 메틸렌기, 에틸렌기, 프로필렌기, 트리메틸렌기, 테트라메틸렌기 등이 열거된다.Specific examples of the preferred alkylene group represented by R 02 include methylene group, ethylene group, propylene group, trimethylene group, tetramethylene group and the like.
W는 -CO-, -C(=O)O-, -CONH-, -OC(=O)- 또는 페닐렌기를 나타내고, -C(=O)O- 또는 -CONH-인 것이 바람직하다.W represents -CO-, -C (= 0) O-, -CONH-, -OC (= 0)-or a phenylene group, and it is preferable that it is -C (= 0) O- or -CONH-.
Y는 -NR03-, -O-, -S- 또는 -N=을 나타내고, 이것과 인접하는 원자단을 통하여 N원자와 연결해서 환상 구조를 형성한다.Y is -NR 03 - it represents a -O-, -S- or -N =, in connection with the N atom via an atomic group adjacent to it to form a cyclic structure.
R03은 수소 원자, 알킬기, 또는 아릴기를 나타내고, 수소 원자 또는 메틸기인 것이 바람직하다.R <03> represents a hydrogen atom, an alkyl group, or an aryl group, and it is preferable that it is a hydrogen atom or a methyl group.
Y로서는 -S-, -NH- 또는 -N=인 것이 특히 바람직하다.As Y, it is especially preferable that it is -S-, -NH-, or -N =.
Y가 이것과 인접하는 원자단을 통하여 N원자와 연결해서 형성하는 환상 구조로서는 이미다졸환, 피리미딘환, 트리아졸환, 테트라졸환, 티아졸환, 옥사졸환 등의 단환 구조, 및 벤즈이미다졸환, 벤즈티아졸환, 벤즈옥사졸환, 푸린환, 퀴나졸린환, 페리미딘환 등의 축합환 구조가 열거되고, 안료와의 친화성의 점으로부터, 축합환 구조인 것이 바람직하다. 또한, 축합환 구조 중 벤즈이미다졸환, 벤즈티아졸환, 및 벤즈옥사졸환이 특히 바람직하게 열거된다.As a cyclic structure which Y connects with N atom through the atom group adjacent to this, monocyclic structures, such as an imidazole ring, a pyrimidine ring, a triazole ring, a tetrazole ring, a thiazole ring, an oxazole ring, and a benzimidazole ring, benz Condensed ring structures, such as a thiazole ring, a benzoxazole ring, a purine ring, a quinazoline ring, a perimidine ring, are mentioned, It is preferable that it is a condensed ring structure from affinity with a pigment. Moreover, a benzimidazole ring, a benzthiazole ring, and a benzoxazole ring are especially preferable among condensed ring structures.
X는 -O-, -S-, -C(=O)O-, -CONH-, -C(=O)S-, -NHCONH-, -NHC(=O)O-, -NHC(=O)S-, -OC(=O)-, -OCONH- 또는 -NHCO-을 나타낸다.X is -O-, -S-, -C (= O) O-, -CONH-, -C (= O) S-, -NHCONH-, -NHC (= O) O-, -NHC (= O ) S-, -OC (= O)-, -OCONH- or -NHCO-.
X로서는 -O-, -S-, -CONH-, -NHCONH-, 및 -NHC(=O)S-가 특히 바람직하다.As X, -O-, -S-, -CONH-, -NHCONH-, and -NHC (= O) S- are especially preferable.
m1 및 n1은 각각 독립적으로 0 또는 1을 나타내고, m1 및 n1이 함께 1인 것이 특히 바람직하다.m1 and n1 each independently represent 0 or 1, and it is particularly preferable that m1 and n1 together are 1.
일반식(I)로 나타내어지는 단량체의 바람직한 구체예(단량체 M-1∼단량체 M-18)를 이하에 열거하지만, 본 발명은 이들에 제한되는 것은 아니다.Although the specific example (monomer M-1-monomer M-18) of the monomer represented by general formula (I) is enumerated below, this invention is not limited to these.
본 발명에 있어서의 (B-2) 특정 분산 수지는 안료의 분산 안정성 부여의 관점으로부터, 상기 일반식(I)로 나타내어지는 단량체로부터 유래하는 공중합 단위와 함께, 말단에 에틸렌성 불포화 결합을 갖는 중합성 올리고머로부터 유래하는 공중합 단위를 더 포함하는 그래프트 공중합체인 것이 특히 바람직하다.(B-2) specific dispersion resin in this invention is a superposition | polymerization which has an ethylenically unsaturated bond at the terminal with the copolymerization unit derived from the monomer represented by the said General formula (I) from a viewpoint of the dispersion stability provision of a pigment. It is especially preferable that it is a graft copolymer which further contains the copolymerization unit derived from an oligomer.
이러한 말단에 에틸렌성 불포화 결합을 갖는 중합성 올리고머는 소정의 분자량을 갖는 화합물이기 때문에 매크로 모노머라고도 불린다. 이하의 설명에서는 본 발명에 있어서의 「말단에 에틸렌성 불포화 결합을 갖는 중합성 올리고머」를 적당하게 「중합성 올리고머」또는 「매크로 모노머」라고 칭할 경우가 있다.The polymerizable oligomer having an ethylenically unsaturated bond at such terminal is also called a macromonomer because it is a compound having a predetermined molecular weight. In the following description, the "polymerizable oligomer which has an ethylenically unsaturated bond at the terminal" in this invention may be called "polymerizable oligomer" or "macro monomer" suitably.
본 발명에 있어서 소망에 의해 사용되는 중합성 올리고머는 폴리머 쇄부분과 그 말단의 에틸렌성 불포화 이중 결합을 갖는 중합 가능한 관능기의 부분으로 이루어진다. 이러한 에틸렌성 불포화 이중 결합을 갖는 기는 폴리머쇄의 한 쪽의 말단에만 갖는 것이 소망의 그래프트 중합체를 얻는다고 하는 관점으로부터 바람직하다. 에틸렌성 불포화 이중 결합을 갖는 기로서는 (메타)아크릴로일기, 비닐기가 바람직하고, 특히 (메타)아크릴로일기가 바람직하다.The polymerizable oligomer used as desired in this invention consists of a polymer chain part and the part of the polymerizable functional group which has the ethylenically unsaturated double bond at the terminal. It is preferable from the viewpoint of obtaining the desired graft polymer that the group having such an ethylenically unsaturated double bond has only one end of the polymer chain. As a group which has an ethylenically unsaturated double bond, a (meth) acryloyl group and a vinyl group are preferable, and a (meth) acryloyl group is especially preferable.
또한, 이 매크로 모노머는 폴리스티렌 환산의 수평균 분자량(Mn)이 1000∼10000의 범위에 있는 것이 바람직하고, 특히, 2000∼9000의 범위가 바람직하다.Moreover, it is preferable that the number average molecular weight (Mn) of polystyrene conversion of this macromonomer exists in the range of 1000-10000, and the range of 2000-9000 is especially preferable.
상기 폴리머쇄의 부분은 알킬(메타)아크릴레이트, 스티렌 및 그 유도체, 아크릴로니트릴, 아세트산 비닐 및 부타디엔으로 이루어지는 군에서 선택되는 적어도 1종의 모노머로 형성되는 단독 중합체 또는 공중합체, 또는 폴리에틸렌옥시드, 폴리프로필렌옥시드, 폴리카프로락톤인 것이 일반적이다.Part of the polymer chain is a homopolymer or copolymer formed of at least one monomer selected from the group consisting of alkyl (meth) acrylates, styrene and derivatives thereof, acrylonitrile, vinyl acetate and butadiene, or polyethylene oxide , Polypropylene oxide and polycaprolactone are common.
상기 중합성 올리고머는 하기 일반식(II)로 나타내어지는 올리고머인 것이 바람직하다.It is preferable that the said polymerizable oligomer is an oligomer represented by the following general formula (II).
일반식(II) 중 R11 및 R13은 각각 독립적으로 수소 원자 또는 메틸기를 나타낸다.In General Formula (II), R 11 and R 13 each independently represent a hydrogen atom or a methyl group.
R12는 탄소 원자수 1∼12개의 알킬렌기를 포함하는 연결기를 나타내고, 상기 연결기는 탄소 원자수 1∼12개의 알킬렌기이어도 좋고, 복수의 그 알킬렌기가 에스테르 결합, 에테르 결합, 아미드 결합 등을 통하여 연결된 것 이어도 좋다. R12로서 바람직하게는 탄소 원자수 1∼4개의 알킬렌기, 또는 탄소수 1∼4개의 알킬렌기가 에스테르 결합을 통하여 연결된 기이다. R12는 나타내어지는 알킬렌기는 치환기(예를 들면, 수산기)를 더 갖고 있어도 좋다.R 12 represents a linking group containing an alkylene group having 1 to 12 carbon atoms, and the linking group may be an alkylene group having 1 to 12 carbon atoms, and a plurality of the alkylene groups may represent an ester bond, an ether bond, an amide bond, or the like. It may be connected through. R 12 is preferably an alkylene group having 1 to 4 carbon atoms or an alkylene group having 1 to 4 carbon atoms connected via an ester bond. The alkylene group represented by R 12 may further have a substituent (for example, a hydroxyl group).
Y11은 치환기를 갖지 않는 페닐기, 탄소 원자수 1∼4개의 알킬기를 1개 갖는 페닐기 또는 -COOR14를 나타낸다. 여기서, R14는 탄소 원자수 1∼6개의 알킬기, 페닐기 또는 탄소 원자수 7∼10개의 아릴알킬기를 나타낸다. Y11은 바람직하게는 페닐기 또는 -COOR14이고, 여기서, 단, R14는 탄소 원자수 1∼12개의 알킬기를 나타낸다.Y 11 represents a phenyl group having no substituent, a phenyl group having one alkyl group having 1 to 4 carbon atoms, or —COOR 14 . Here, R <14> represents a C1-C6 alkyl group, a phenyl group, or a C7-C10 arylalkyl group. Y 11 is preferably a phenyl group or -COOR 14 , wherein R 14 represents an alkyl group having 1 to 12 carbon atoms.
q는 20∼200의 정수를 나타낸다.q represents the integer of 20-200.
본 발명에 있어서 (B-2) 특정 분산 수지의 합성에 사용할 수 있는 중합성 올리고머(매크로 모노머)의 바람직한 예로서는 폴리메틸(메타)아크릴레이트, 폴리-n-부틸(메타)아크릴레이트 및 폴리-i-부틸(메타)아크릴레이트, 폴리스티렌의 분자 말단의 1개에 (메타)아크릴로일기가 결합한 폴리머를 열거할 수 있다. 시장에서 입수할 수 있는 이러한 중합성 올리고머로서는 편말단 메타크릴로일화 폴리스티렌 올리고머(Mn=6000, 상품명: AS-6, Toagosei Co., Ltd. 제작), 편말단 메타크릴로일화 폴리메틸메타크릴레이트 올리고머(Mn=6000, 상품명: AA-6, Toagosei Co., Ltd. 제 작) 및 편말단 메타크릴로일화 폴리-n-부틸아크릴레이트 올리고머(Mn=6000, 상품명:AB-6, Toagosei Co., Ltd. 제작)를 들 수 있다.In the present invention, preferred examples of the polymerizable oligomer (macro monomer) that can be used for the synthesis of the specific dispersion resin (B-2) include polymethyl (meth) acrylate, poly-n-butyl (meth) acrylate, and poly-i. -Butyl (meth) acrylate and the polymer which the (meth) acryloyl group couple | bonded with one of the molecular terminal of polystyrene can be mentioned. Such polymerizable oligomers available on the market include single-ended methacryloylated polystyrene oligomers (Mn = 6000, trade name: AS-6, manufactured by Toagosei Co., Ltd.), single-ended methacryloylated polymethylmethacrylates. Oligomer (Mn = 6000, trade name: AA-6, manufactured by Toagosei Co., Ltd.) and single-ended methacryloylated poly-n-butylacrylate oligomer (Mn = 6000, trade name: AB-6, Toagosei Co. , Ltd.).
본 발명에 따른 (B-2) 특정 분산 수지는 특정한 산가를 얻기 위해서, 산기를 갖는 단량체로부터 유래하는 공중합 단위를 더 포함하는 것이 바람직하다.It is preferable that the (B-2) specific dispersion resin which concerns on this invention further contains the copolymerization unit derived from the monomer which has an acidic radical, in order to acquire specific acid value.
산기를 갖는 단량체로서는 아크릴산, 메타크릴산, 크로톤산, α-클로로아크릴산, 신남산 등의 불포화 모노카르복실산류; 말레산, 무수 말레산, 푸말산, 이타콘산, 무수 이타콘산, 시트라콘산, 무수 시트라콘산, 메사콘산 등의 불포화 디카르복실산 또는 그 무수물류; 3가이상의 불포화 다가 카르복실산 또는 그 무수물류; 숙신산 모노(2-아크릴로일옥시에틸), 숙신산 모노(2-메타크릴로일옥시에틸), 프탈산 모노(2-아크릴로일옥시에틸), 프탈산 모노(2-메타크릴로일옥시에틸) 등의 2가이상의 다가 카르복실산의 모노[(메타)아크릴로일옥시알킬]에스테르류; ω-카르복시-폴리카프로락톤모노아크릴레이트, ω-카르복시-폴리카프로락톤모노메타크릴레이트 등의 양쪽 말단 카르복시 폴리머의 모노(메타)아크릴레이트류 등을 들 수 있다.As a monomer which has an acidic radical, Unsaturated monocarboxylic acids, such as acrylic acid, methacrylic acid, crotonic acid, (alpha)-chloroacrylic acid, cinnamic acid; Unsaturated dicarboxylic acids or anhydrides thereof such as maleic acid, maleic anhydride, fumaric acid, itaconic acid, itaconic anhydride, citraconic acid, citraconic anhydride and mesaconic acid; Trivalent or higher unsaturated polyvalent carboxylic acid or anhydrides thereof; Succinic acid mono (2-acryloyloxyethyl), succinic acid mono (2-methacryloyloxyethyl), phthalic acid mono (2-acryloyloxyethyl), phthalic acid mono (2-methacryloyloxyethyl) Mono [(meth) acryloyloxyalkyl] esters of divalent or higher polyhydric carboxylic acid; mono (meth) acrylates of both terminal carboxy polymers such as? -carboxy-polycaprolactone monoacrylate and? -carboxy-polycaprolactone monomethacrylate.
본 발명에 따른 (B-2)특정 분산 수지는 그 효과를 손상하지 않는 범위에 있어서, 중합가능한 비닐 모노머를 공중합 성분으로서 더 포함하고 있어도 좋다.(B-2) specific dispersion resin which concerns on this invention may further contain the polymerizable vinyl monomer as a copolymerization component in the range which does not impair the effect.
여기서 사용가능한 비닐 모노머로서는 특별히 제한되지 않지만, 예를 들면(메타)아크릴산 에스테르류, 크로톤산 에스테르류, 비닐에스테르류, 말레산 디에스테르류, 푸말산 디에스테르류, 이타콘산 디에스테르류, (메타)아크릴아미드류, 비닐에테르류, 비닐알콜의 에스테르류, 스티렌류, (메타)아크릴로니트릴 등이 바람직하다. 이러한 비닐 모노머의 구체예로서는 예를 들면, 이하와 같은 화합물이 열거 된다.Although it does not restrict | limit especially as a vinyl monomer which can be used here, For example, (meth) acrylic acid ester, crotonic acid ester, vinyl ester, maleic acid diester, fumaric acid diester, itaconic acid diester, (meth ) Acrylamides, vinyl ethers, esters of vinyl alcohol, styrenes, (meth) acrylonitrile and the like are preferable. As a specific example of such a vinyl monomer, the following compounds are mentioned, for example.
본 발명에 따른 (B-2) 특정 분산 수지의 바람직한 형태로서는 상기 일반식(1)로 나타내어지는 단량체로부터 유래하는 공중합 단위를 2∼50질량%로 포함하고, 또한, 말단에 에틸렌성 불포화 결합을 갖는 중합성 올리고머로부터 유래하는 공중합단위를 10∼90질량%, 산기를 갖는 단량체로부터 유래하는 공중합 단위를 1∼30질량%, 비닐 모노머로부터 유래하는 공중합 단위를 0∼20질량% 포함하는 공중합체를 바람직하게 들 수 있다.As a preferable aspect of the (B-2) specific dispersion resin which concerns on this invention, the copolymerization unit derived from the monomer represented by the said General formula (1) is contained in 2-50 mass%, and ethylenically unsaturated bond is added to the terminal. Copolymer containing 10-90 mass% of copolymerization units derived from the polymerizable oligomer which has, and 1-30 mass% of copolymerization units derived from the monomer which has an acidic radical, and 0-20 mass% of copolymerization units derived from a vinyl monomer. Preferred is mentioned.
이하에, 본 발명의 착색 패턴형성용 조성물에 바람직하게 사용할 수 있는 (B-2) 특정 분산 수지의 구체예[예시 화합물 1∼예시 화합물 16]을 그 중량평균 분자량과 함께 열거하지만, 본 발명은 이들에 한정되는 것은 아니다.Although the specific example [Example compound 1-Example compound 16] of (B-2) specific dispersion resin which can be preferably used for the composition for coloring pattern formation of this invention is listed with the weight average molecular weight, this invention is It is not limited to these.
예시 화합물(1): 상기 단량체 M-2/메타크릴산/말단 메타크릴로일화 폴리메틸메타크릴레이트 공중합체(10/25/65질량%, 중량평균 분자량 50000, 산가 163mg/g)Exemplary compound (1): monomer M-2 / methacrylic acid / terminal methacryloylated polymethyl methacrylate copolymer (10/25/65 mass%, weight average molecular weight 50000, acid value 163 mg / g)
예시 화합물(2): 상기 단량체 M-2/메타크릴산/말단 메타크릴로일화 폴리메틸메타크릴레이트 공중합체(10/15/75질량%, 중량평균 분자량 35000, 산가 98mg/g)Exemplary compound (2): the monomer M-2 / methacrylic acid / terminal methacryloylated polymethyl methacrylate copolymer (10/15/75 mass%, weight average molecular weight 35000, acid value 98 mg / g)
예시 화합물(3): 상기 단량체 M-3/메타크릴산/메타크릴산2-히드록시에틸/말단 메타크릴로일화 폴리메틸메타크릴레이트 공중합체(5/5/10/80질량%, 중량평균 분자량 40000, 산가 33mg/g)Exemplary compound (3): monomer M-3 / methacrylic acid / methacrylic acid 2-hydroxyethyl / terminal methacryloylated polymethyl methacrylate copolymer (5/5/10/80 mass%, weight average Molecular weight 40000, acid value 33mg / g)
예시 화합물(4): 상기 단량체 M-3/메타크릴산/메타크릴산 벤질 공중합체/말단 메타크릴로일화 폴리메틸메타크릴레이트 공중합체(15/10/10/65질량%, 중량평균 분자량 60000, 산가 65mg/g)Exemplary compound (4): monomer M-3 / methacrylic acid / methacrylic acid benzyl copolymer / terminal methacryloylated polymethyl methacrylate copolymer (15/10/10/65 mass%, weight average molecular weight 60000 , Acid value 65mg / g)
예시 화합물(5): 상기 단량체 M-4/메타크릴산/말단 메타크릴로일화 폴리메틸메타크릴레이트 공중합체(10/30/60질량%, 중량평균 분자량 80000, 산가 195mg/g)Exemplary compound (5): the monomer M-4 / methacrylic acid / terminal methacryloylated polymethyl methacrylate copolymer (10/30/60 mass%, weight average molecular weight 80000, acid value 195 mg / g)
예시 화합물(6): 상기 단량체 M-4/메타크릴산/말단 메타크릴로일화 폴리메틸메타크릴레이트 공중합체(10/15/75질량%, 중량평균 분자량 20000, 산가 98mg/g)Exemplary compound (6): monomer M-4 / methacrylic acid / terminal methacryloylated polymethyl methacrylate copolymer (10/15/75 mass%, weight average molecular weight 20000, acid value 98 mg / g)
예시 화합물(7): 상기 단량체 M-5/아크릴산/말단 메타크릴로일화 폴리메틸메타크릴레이트 공중합체(25/15/60질량%, 중량평균 분자량 60000, 산가 117mg/g)Exemplary compound (7): the monomer M-5 / acrylic acid / terminal methacryloylated polymethyl methacrylate copolymer (25/15/60 mass%, weight average molecular weight 60000, acid value 117 mg / g)
예시 화합물(8): 상기 단량체 M-5/아크릴산/말단 메타크릴로일화 폴리 부틸아크릴레이트 공중합체(15/5/80질량%, 중량평균 분자량 45000, 산가 39mg/g)Exemplary compound (8): monomer M-5 / acrylic acid / terminal methacryloylated polybutylacrylate copolymer (15/5/80 mass%, weight average molecular weight 45000, acid value 39 mg / g)
예시 화합물(9): 상기 단량체 M-6/아크릴산/메타크릴산 2-히드록시에틸/말단 메타크릴로일화 폴리메틸메타크릴레이트 공중합체(15/10/5/70질량%, 중량평균 분자량 80000, 산가 78mg/g)Exemplary compound (9): monomer M-6 / acrylic acid / methacrylic acid 2-hydroxyethyl / terminal methacryloylated polymethyl methacrylate copolymer (15/10/5/70% by mass, weight average molecular weight 80000 , Acid value 78mg / g)
예시 화합물(10): 상기 단량체 M-6/아크릴산/말단 메타크릴로일화 폴리메틸메타크릴레이트 공중합체(12/18/70질량%, 중량평균 분자량 50000, 산가 140mg/g)Exemplary compound (10): monomer M-6 / acrylic acid / terminal methacryloylated polymethyl methacrylate copolymer (12/18/70 mass%, weight average molecular weight 50000, acid value 140 mg / g)
예시 화합물(11): 상기 단량체 M-7/메타크릴산/말단 메타크릴로일화 폴리메틸메타크릴레이트 공중합체(10/18/72질량%, 중량평균 분자량 15000, 산가 117mg/g)Exemplary compound (11): monomer M-7 / methacrylic acid / terminal methacryloylated polymethyl methacrylate copolymer (10/18/72 mass%, weight average molecular weight 15000, acid value 117 mg / g)
예시 화합물(12): 상기 단량체 M-7/메타크릴산/메타크릴산 벤질/메톡시폴리에틸렌글리콜메타크릴레이트 공중합체(10/10/50/30질량%, 중량평균 분자량 50000, 산가 65mg/g)Exemplary compound (12): monomer M-7 / methacrylic acid / benzyl methacrylate / methoxypolyethylene glycol methacrylate copolymer (10/10/50/30 mass%, weight average molecular weight 50000, acid value 65 mg / g )
예시 화합물(13): 상기 단량체 M-10/아크릴산/메타크릴산 2-히드록시에틸/말단 메타크릴로일화 폴리스티렌 공중합체(5/35/10/50질량%, 중량평균 분자량 20000, 산가 272mg/g)Exemplary compound (13): monomer M-10 / acrylic acid / methacrylic acid 2-hydroxyethyl / terminal methacryloylated polystyrene copolymer (5/35/10/50 mass%, weight average molecular weight 20000, acid value 272 mg / g)
예시 화합물(14): 상기 단량체 M-10/메타크릴산/말단 메타크릴로일화 폴리메틸메타크릴레이트 공중합체(10/12/78질량%, 중량평균 분자량 10000, 산가 78mg/g)Exemplary compound (14): the monomer M-10 / methacrylic acid / terminal methacryloylated polymethylmethacrylate copolymer (10/12/78 mass%, weight average molecular weight 10000, acid value 78 mg / g)
예시 화합물(15): 상기 단량체 M-10/아크릴산/메톡시폴리에틸렌글리콜메타크릴레이트 공중합체(15/3/82질량%, 중량평균 분자량 15000, 산가 23mg/g)Exemplary compound (15): the monomer M-10 / acrylic acid / methoxypolyethylene glycol methacrylate copolymer (15/3/82% by mass, weight average molecular weight 15000, acid value 23 mg / g)
예시 화합물(16): 상기 단량체 M-13/메타크릴산/말단 메타크릴로일화 폴리메틸메타크릴레이트 공중합체(10/25/65질량%, 중량평균 분자량 20000, 산가 163mg/g)Exemplary compound (16): the monomer M-13 / methacrylic acid / terminal methacryloylated polymethylmethacrylate copolymer (10/25/65 mass%, weight average molecular weight 20000, acid value 163 mg / g)
[(B-3) 일반식(a)로 나타내어지는 구조 단위를 포함하는 중합체: (B-3) 특정 분산 수지][(B-3) Polymer containing structural unit represented by general formula (a): (B-3) Specific Dispersion Resin]
이어서, 하기 일반식(a)로 나타내어지는 구조 단위를 포함하는 중합체(이하, 적당하게 「(B-3) 특정 분산 수지」라고 칭한다.)에 관하여 설명한다.Next, the polymer (hereinafter, referred to as "(B-3) specific dispersion resin" suitably ") containing the structural unit represented by the following general formula (a) is demonstrated.
일반식(a)에 있어서, R1a는 수소 또는 메틸기를 나타내고, R2a는 알킬렌기를 나타내고, Z1은 질소 함유 복소환 구조를 나타낸다.In General Formula (a), R 1a represents hydrogen or a methyl group, R 2a represents an alkylene group, and Z 1 represents a nitrogen-containing heterocyclic structure.
R2a로 나타내어지는 알킬렌기로서는 메틸렌기, 에틸렌기, 트리메틸렌기, 테트라메틸렌기, 헥사메틸렌기, 2-히드록시프로필렌기, 메틸렌옥시기, 에틸렌옥시기, 메틸렌옥시카르보닐기, 메틸렌티오기 등이 열거되고, 그 중에서도 메틸렌기, 메틸 렌옥시기, 메틸렌옥시카르보닐기, 메틸렌티오기가 바람직하다.Examples of the alkylene group represented by R 2a include a methylene group, an ethylene group, trimethylene group, tetramethylene group, hexamethylene group, 2-hydroxypropylene group, methyleneoxy group, ethyleneoxy group, methyleneoxycarbonyl group, methylenethio group and the like. Among them, a methylene group, a methyleneoxy group, a methyleneoxycarbonyl group, and a methylenethio group are preferable.
상기 일반식(a) 중 Z1은 질소 함유 복소환 구조를 나타내고, 구체적으로는 예를 들면, 피리딘환, 피라진환, 피리미딘환, 피롤환, 이미다졸환, 트리아졸환, 테트라졸환, 인돌환, 퀴놀린환, 아크리딘환, 페노티아진환, 페녹사진환, 아크리돈환, 안트라퀴논환, 벤즈이미다졸 구조, 벤즈트리아졸 구조, 벤즈티아졸 구조, 환상 아미드 구조, 환상 우레아 구조, 및 환상 이미드 구조를 갖는 것이 열거된다.Z 1 in the general formula (a) represents a nitrogen-containing heterocyclic structure, and specifically, for example, a pyridine ring, a pyrazine ring, a pyrimidine ring, a pyrrole ring, an imidazole ring, a triazole ring, a tetrazole ring, an indole ring , Quinoline ring, acridine ring, phenothiazine ring, phenoxazine ring, acridon ring, anthraquinone ring, benzimidazole structure, benztriazole structure, benzthiazole structure, cyclic amide structure, cyclic urea structure, and cyclic imide It is enumerated that it has a de structure.
이들 중, Z1로 나타내어지는 질소 함유 복소환 구조로서는 하기 일반식(b) 또는 일반식(c)로 나타내어지는 구조인 것이 바람직하다.Among these, the nitrogen-containing heterocyclic structure represented by Z 1 is preferably a structure represented by the following General Formula (b) or (c).
상기 일반식(b) 중 X1은 단일 결합, 알킬렌기(예를 들면, 메틸렌기, 에틸렌기, 프로필렌기, 트리메틸렌기, 테트라메틸렌기 등), -O-, -S-, -NR- 및 -C(=O)-로 이루어지는 군에서 선택되는 것 중 어느 하나이다. 또한, 여기서, R는 수소 원자 또는 알킬기를 나타내고, R이 알킬기를 나타낼 경우의 알킬기로서는 예를 들면, 메틸기, 에틸기, n-프로필기, i-프로필기, n-부틸기, t-부틸기, n-헥실기, n-옥틸기, 2-에틸헥실기, n-옥타데실기 등이 열거된다.In Formula (b), X 1 represents a single bond, an alkylene group (for example, methylene group, ethylene group, propylene group, trimethylene group, tetramethylene group, etc.), -O-, -S-, -NR- And -C (= O)-. Here, R represents a hydrogen atom or an alkyl group, and as an alkyl group in the case where R represents an alkyl group, for example, methyl group, ethyl group, n-propyl group, i-propyl group, n-butyl group, t-butyl group, n-hexyl group, n-octyl group, 2-ethylhexyl group, n-octadecyl group, etc. are mentioned.
이들 중, X1은 단일 결합, 메틸렌기, -O-, -C(=O)-이 바람직하고, -C(=O)-이 특히 바람직하다.Of these, X 1 is a single bond, a methylene group, -O-, -C (= O) - , and is preferably, -C (= O) - is particularly preferred.
상기 일반식(b) 및 일반식(c) 중 환 A, 환 B, 및 환 C는 각각 독립적으로 방향환을 나타낸다. 상기 방향환으로서는 예를 들면, 벤젠환, 나프탈렌환, 인덴환, 아즐렌환, 플루오렌환, 안트라센환, 피리딘환, 피라진환, 피리미딘환, 피롤환, 이미다졸환, 인돌환, 퀴놀린환, 아크리딘환, 페노티아진환, 페녹사진환, 아크리돈환, 안트라퀴논환 등이 열거되고, 그 중에서도, 벤젠환, 나프탈렌환, 안트라센환, 피리딘환, 페녹사진환, 아크리딘환, 페노티아진환, 페녹사진환, 아크리돈환, 안트라퀴논환이 바람직하고, 벤젠환, 나프탈렌환, 피리딘환이 특히 바람직하다.Rings A, Ring B, and Ring C in the general formulas (b) and (c) each independently represent an aromatic ring. Examples of the aromatic ring include a benzene ring, naphthalene ring, indene ring, azlene ring, fluorene ring, anthracene ring, pyridine ring, pyrazine ring, pyrimidine ring, pyrrole ring, imidazole ring, indole ring, quinoline ring, Acridine ring, phenothiazine ring, phenoxazine ring, acridon ring, anthraquinone ring, etc. are mentioned, Among these, a benzene ring, a naphthalene ring, anthracene ring, a pyridine ring, a phenoxazine ring, an acridine ring, a phenothiazine ring , Phenoxazine ring, acridon ring and anthraquinone ring are preferable, and a benzene ring, a naphthalene ring and a pyridine ring are particularly preferable.
일반식(a)로 나타내어지는 구조 단위의 바람직한 구체예[예시 구조 단위(M'-1)∼(M'-7)]를 이하에 열거하지만, 본 발명은 이들에 제한되는 것은 아니다.Preferable specific examples of the structural unit represented by the general formula (a) (example structural units (M'-1) to (M'-7)) are listed below, but the present invention is not limited thereto.
상기 일반식(a)로 나타내어지는 구조 단위는 (B-3) 특정 분산 수지 중에 2∼50질량% 포함되는 것이 바람직하고, 4∼30질량% 포함되는 것이 보다 바람직하고, 5∼20질량% 포함되는 것이 특히 바람직하다.It is preferable that 2-50 mass% is contained in (B-3) specific dispersion resin, and, as for the structural unit represented by the said General formula (a), it is more preferable that 4-30 mass% is included, and 5-20 mass% is included It is especially preferable.
본 발명에 있어서의 (B-3) 특정 분산 수지는 상기 일반식(a)로 나타내어지는 구조 단위에 더하여, 말단에 에틸렌성 불포화 이중 결합을 갖는 중합성 올리고머를 공중합 단위로서 더 포함하는 그래프트 공중합체인 것이 특히 바람직하다.In addition to the structural unit represented by the said General formula (a), the specific dispersion resin (B-3) in this invention is a graft copolymer which further contains as a copolymerization unit the polymerizable oligomer which has an ethylenically unsaturated double bond at the terminal. Is particularly preferred.
이러한 말단에 에틸렌성 불포화 이중 결합을 갖는 중합성 올리고머는 싱술의 (B-2) 특정 분산 수지에 있어서 공중합 성분으로서 사용되는 중합성 올리고머와 같은 것이 열거되고, 그 바람직한 형태(일반식(II)로 나타내어지는 올리고머)나 바람직한 예(구체예)도 동일하다.The polymerizable oligomer which has an ethylenically unsaturated double bond in such terminal is mentioned the same thing as the polymeric oligomer used as a copolymerization component in the specific (B-2) dispersion resin of single use, and the preferable form (In general formula (II)) The oligomer shown) and the preferable example (specific example) are also the same.
본 발명에 있어서의 (B-3) 특정 분산 수지는 특정한 산가를 얻기 위해서, 또 한 산기를 갖는 단량체(구조 단위)를 공중합 성분으로서 포함하는 것이 바람직하다.It is preferable that (B-3) specific dispersion resin in this invention contains the monomer (structural unit) which has an acidic group as a copolymerization component in order to acquire a specific acid value.
산기를 갖는 단량체로서는 (메타)아크릴산, p-비닐벤조산, 말레산, 푸말산, 이타콘산, (메타)아크릴산 2-히드록시에틸의 무수 숙신산 부가체, (메타)아크릴산 2-히드록시에틸의 무수 프탈산 부가체 등이 열거된다.Examples of the monomer having an acid group include (meth) acrylic acid, p-vinylbenzoic acid, maleic acid, fumaric acid, itaconic acid, succinic anhydride adduct of 2-hydroxyethyl (meth) acrylate, and anhydrous 2-hydroxyethyl (meth) acrylate. Phthalic acid adducts and the like.
본 발명에 있어서의 (B-3) 특정 분산 수지는 그 효과를 손상하지 않는 범위에 있어서, 공중합 가능한 비닐 모노머를 공중합 성분으로서 더 포함하고 있어도 좋다.(B-3) specific dispersion resin in this invention may further contain the copolymerizable vinyl monomer as a copolymerization component in the range which does not impair the effect.
여기서 사용가능한 비닐 모노머로서는 상술의 (B-2) 특정 분산 수지에 있어서 공중합 성분으로서 사용되는 비닐 모노머와 동일한 것이 열거되고, 그 바람직한 예도 동일하다.As a vinyl monomer which can be used here, the thing similar to the vinyl monomer used as a copolymerization component in above-mentioned (B-2) specific dispersion resin is mentioned, The preferable example is also the same.
또한, 본 발명에 따른 특정 분산 수지의 바람직한 형태로서는 상기 일반식(a)로 나타내어지는 구조 단위를 2∼50질량%로 포함하고, 또한 말단에 에틸렌성 불포화 이중 결합을 갖는 중합성 올리고머를 10∼90질량%, 산기를 갖는 구조 단위를 1∼30질량%, 비닐 모노머를 0∼20질량% 포함하는 공중합체를 바람직하게 들 수 있다.Moreover, as a preferable aspect of specific dispersion resin which concerns on this invention, the polymerizable oligomer which contains the structural unit represented by the said General formula (a) in 2-50 mass%, and has ethylenically unsaturated double bond in the terminal is 10-. The copolymer containing 1-30 mass% of structural units which have 90 mass% and an acidic radical, and 0-20 mass% of vinyl monomers is mentioned preferably.
이하에, 본 발명의 착색 패턴 형성용 조성물에 적합하게 사용할 수 있는 (B-3) 특정 분산 수지의 구체예[예시 화합물(I)∼(XV)]를 그 중량평균 분자량과 함께 열거하지만, 본 발명은 이들에 한정되는 것은 아니다.Although the specific example [example compound (I)-(XV)] of (B-3) specific dispersion resin which can be used suitably for the composition for coloring pattern formation of this invention is listed together with the weight average molecular weight, The invention is not limited to these.
예시 화합물(I): 상기 예시 구조 단위(M'-1)를 형성할 수 있는 단량체/메타 크릴산/말단 메타크릴로일화 폴리메틸메타크릴레이트 공중합체(공중합비=10/4/86질량%, 중량평균 분자량 50000, 산가 26mg/g)Exemplary Compound (I): Monomer / methacrylic acid / terminal methacryloylated polymethyl methacrylate copolymer capable of forming the exemplary structural unit (M′-1) (copolymerization ratio = 10/4/86% by mass) , Weight average molecular weight 50000, acid value 26mg / g)
예시 화합물(II): 상기 예시 구조 단위(M'-1)를 형성할 수 있는 단량체/메타크릴산/말단 메타크릴로일화 폴리메틸메타크릴레이트 공중합체(10/33/57질량%, 중량평균 분자량 30000, 산가 214mg/g)Exemplary Compound (II): Monomer / methacrylic acid / terminal methacryloylated polymethylmethacrylate copolymer (10/33/57% by mass, weight average) capable of forming the exemplary structural unit (M′-1) Molecular weight 30000, acid value 214 mg / g)
예시 화합물(III): 상기 예시 구조 단위(M'-1)를 형성할 수 있는 단량체/메타크릴산/메타크릴산 2-히드록시에틸/말단 메타크릴로일화 폴리메틸메타크릴레이트 공중합체(5/28/10/57질량%, 중량평균 분자량 40000, 산가 182mg/g)Exemplary Compound (III): Monomer / methacrylic acid / methacrylic acid 2-hydroxyethyl / terminal methacryloylated polymethylmethacrylate copolymer capable of forming the exemplary structural unit (M′-1) (5) / 28/10/57 mass%, weight average molecular weight 40000, acid value 182 mg / g)
예시 화합물(IV): 상기 예시 구조 단위(M'-1)를 형성할 수 있는 단량체/메타크릴산/메타크릴산 벤질 공중합체/말단 메타크릴로일화 폴리메틸메타크릴레이트 공중합체(15/5/10/70질량%, 중량평균 분자량 60000, 산가 33mg/g)Exemplary Compound (IV): Monomer / methacrylic acid / methacrylic acid benzyl copolymer / terminal methacryloylated polymethylmethacrylate copolymer capable of forming the above exemplary structural unit (M′-1) (15/5) / 10/70 mass%, weight average molecular weight 60000, acid value 33 mg / g)
예시 화합물(V): 상기 예시 구조 단위(M'-5)를 형성할 수 있는 단량체/메타크릴산/말단 메타크릴로일화 폴리메틸메타크릴레이트 공중합체(20/20/60질량%, 중량평균 분자량 80000, 산가 130mg/g)Exemplary Compound (V): Monomer / methacrylic acid / terminal methacryloylated polymethylmethacrylate copolymer (20/20/60% by mass, weight average) capable of forming the exemplary structural unit (M′-5) Molecular weight 80000, acid value 130mg / g)
예시 화합물(VI): 상기 예시 구조 단위(M'-5)를 형성할 수 있는 단량체/메타크릴산/말단 메타크릴로일화 폴리메틸메타크릴레이트 공중합체(10/20/70질량%, 중량평균 분자량 30000, 산가 130mg/g)Exemplary Compound (VI): Monomer / methacrylic acid / terminal methacryloylated polymethylmethacrylate copolymer (10/20/70% by mass, weight average) capable of forming the exemplary structural unit (M′-5) Molecular weight 30000, acid value 130mg / g)
예시 화합물(VII): 상기 예시 구조 단위(M'-5)를 형성할 수 있는 단량체/아크릴산/말단 메타크릴로일화 폴리메틸메타크릴레이트 공중합체(25/20/55질량%, 중량평균 분자량 60000, 산가 156mg/g)Exemplary Compound (VII): Monomer / acrylic acid / terminal methacryloylated polymethylmethacrylate copolymer (25/20/55% by mass, weight average molecular weight 60000) capable of forming the above exemplary structural unit (M′-5) , Acid value 156 mg / g)
예시 화합물(VIII): 상기 예시 구조 단위(M'-5)를 형성할 수 있는 단량체/아크릴산/말단 메타크릴로일화 폴리 부틸아크릴레이트 공중합체(15/15/70질량%, 중량평균 분자량 40000, 산가 117mg/g)Exemplary Compound (VIII): Monomer / acrylic acid / terminal methacryloylated polybutylacrylate copolymer (15/15/70% by mass, weight average molecular weight 40000) capable of forming the exemplary structural unit (M′-5) Acid value 117 mg / g)
예시 화합물(IX): 상기 예시 구조 단위(M'-5)를 형성할 수 있는 단량체/아크릴산/메타크릴산 2-히드록시에틸/말단 메타크릴로일화 폴리메틸메타크릴레이트 공중합체(15/5/5/75질량%, 중량평균 분자량 80000, 산가 39mg/g)Exemplary Compound (IX): Monomer / acrylic acid / methacrylic acid 2-hydroxyethyl / terminal methacryloylated polymethylmethacrylate copolymer (15/5) capable of forming the above exemplary structural unit (M′-5) / 5/75 mass%, weight average molecular weight 80000, acid value 39 mg / g)
예시 화합물(X): 상기 예시 구조 단위(M'-6)를 형성할 수 있는 단량체/메타크릴산/말단 메타크릴로일화 폴리메틸메타크릴레이트 공중합체(12/17/71질량%, 중량평균 분자량 50000, 산가 110mg/g)Exemplary Compound (X): Monomer / methacrylic acid / terminal methacryloylated polymethylmethacrylate copolymer (12/17/71 mass%, weight average) capable of forming the exemplary structural unit (M′-6) Molecular Weight 50000, Acid Value 110mg / g)
예시 화합물(XI): 상기 예시 구조 단위(M'-6)를 형성할 수 있는 단량체/메타크릴산/말단 메타크릴로일화 폴리메틸메타크릴레이트 공중합체(10/12/78질량%, 중량평균 분자량 20000, 산가 78mg/g)Exemplary Compound (XI): Monomer / methacrylic acid / terminal methacryloylated polymethylmethacrylate copolymer (10/12/78% by mass, weight average) capable of forming the exemplary structural unit (M′-6) Molecular Weight 20000, Acid Value 78mg / g)
예시 화합물(XII): 상기 예시 구조 단위(M'-6)를 형성할 수 있는 단량체/메타크릴산/메타크릴산 벤질/메톡시폴리에틸렌글리콜메타크릴레이트 공중합체(10/10/50/30질량%, 중량평균 분자량 35000, 산가 65mg/g)Exemplary Compound (XII): Monomer / methacrylic acid / benzyl methacrylate / methoxypolyethyleneglycol methacrylate copolymer (10/10/50/30 mass) capable of forming the exemplary structural unit (M′-6) %, Weight average molecular weight 35000, acid value 65 mg / g)
예시 화합물(XIII): 상기 예시 구조 단위(M'-6)를 형성할 수 있는 단량체/아크릴산/메타크릴산 2-히드록시에틸/말단 메타크릴로일화 폴리스티렌 공중합체(5/5/10/80질량%, 중량평균 분자량 20000, 산가 39mg/g)Exemplary Compound (XIII): Monomer / acrylic acid / methacrylic acid 2-hydroxyethyl / terminal methacryloylated polystyrene copolymer capable of forming the exemplary structural unit (M′-6) (5/5/10/80) Mass%, weight average molecular weight 20000, acid value 39 mg / g)
예시 화합물(XIV): 상기 예시 구조 단위(M'-7)를 형성할 수 있는 단량체/메타크릴산/메타크릴산 메틸/말단 메타크릴로일화 폴리메틸메타크릴레이트 공중합 체(8/12/10/70질량%, 중량평균 분자량 70000, 산가 78mg/g)Exemplary Compound (XIV): Monomer / methacrylic acid / methyl methacrylate / terminal methacryloylated polymethylmethacrylate copolymer (8/12/10) capable of forming the exemplary structural unit (M′-7) / 70 mass%, weight average molecular weight 70000, acid value 78 mg / g)
예시 화합물(XV): 상기 예시 구조 단위(M'-7)를 형성할 수 있는 단량체/아크릴산/메톡시폴리에틸렌글리콜메타크릴레이트 공중합체(15/20/65질량%, 중량평균 분자량 15000, 산가 156mg/g)Exemplary Compound (XV): Monomer / acrylic acid / methoxypolyethyleneglycol methacrylate copolymer (15/20/65 mass%, weight average molecular weight 15000, acid value 156 mg) capable of forming the exemplary structural unit (M′-7) / g)
본 발명에 있어서의 (B-3) 특정 분산 수지인 상기와 같은 공중합체는 상기 일반식(a)로 나타내어지는 구성단위가 될 수 있는 단량체, 소망에 의해 병용되는 중합성 올리고머나 다른 모노머를, 용매 중에서 라디칼 중합시킴으로써 얻을 수 있다. 이 라디칼 중합에는 (B-2) 특정 분산 수지를 합성할 때에 사용되는 것과 동일한 라디칼 중합 개시제나 연쇄이동제가 사용된다.As the above-mentioned copolymer which is (B-3) specific dispersion resin in this invention, the monomer which can be a structural unit represented by the said General formula (a), the polymerizable oligomer and other monomer used together as desired, It can obtain by radical polymerization in a solvent. In this radical polymerization, the same radical polymerization initiator and chain transfer agent used when synthesize | combining (B-2) specific dispersion resin are used.
본 발명의 착색 화소 형성용 경화성 조성물 중에 있어서의 (B) 고분자 분산제의 함유량으로서는 상기 조성물의 전체 고형분(질량)에 대하여, 5∼35질량%가 바람직하고, 10∼30질량%가 보다 바람직하다. (B) 고분자 분산제의 함유량이 상기 범위내이면, (A-1) 착색제로서 사용되는 안료의 분산 시간을 짧게 할 수 있고, 또한 분산 후의 안정성이 길게 유지되기 때문에 바람직하다.As content of the (B) polymer dispersing agent in the curable composition for colored pixel formation of this invention, 5-35 mass% is preferable with respect to the total solid (mass) of the said composition, and 10-30 mass% is more preferable. When content of the (B) polymer dispersing agent is in the said range, since the dispersion time of the pigment used as a (A-1) coloring agent can be shortened and stability after dispersion is kept long, it is preferable.
[다른 분산제][Other Dispersants]
본 발명의 착색 패턴 형성용 조성물은 (B) 분산 수지 이외에, 종래부터 공지된 분산제(안료 분산제)를 병용할 수도 있다.The composition for coloring pattern formation of this invention can also use together a conventionally well-known dispersing agent (pigment dispersing agent) other than (B) dispersion resin.
공지의 분산제(안료 분산제)로서는 고분자 분산제[예를 들면, 폴리아미드아민과 그 염, 고분자량 불포화산 에스테르, 변성 폴리우레탄, 변성 폴리에스테르, 변성 폴리(메타)아크릴레이트, (메타)아크릴계 공중합체], 및 폴리옥시에틸렌알킬 인산 에스테르, 폴리옥시에틸렌알킬아민, 알카놀아민, 안료 유도체 등을 들 수 있다.Known dispersants (pigment dispersants) include polymer dispersants [eg, polyamideamines and salts thereof, high molecular weight unsaturated acid esters, modified polyurethanes, modified polyesters, modified poly (meth) acrylates, (meth) acrylic copolymers. And polyoxyethylene alkyl phosphate esters, polyoxyethylene alkylamines, alkanolamines, pigment derivatives, and the like.
고분자 분산제는 그 구조로부터 직쇄상 고분자, 말단변성형 고분자, 그래프트형 고분자, 블록형 고분자로 더 분류할 수 있다.Polymeric dispersants may be further classified into linear polymers, terminal modified polymers, graft polymers, and block polymers from the structure thereof.
고분자 분산제는 안료의 표면에 흡착하고, 재응집을 방지하도록 작용한다. 그를 위해서 안료 표면으로의 앵커 부위를 갖는 말단 변성형 고분자, 그래프트형 고분자, 블록형 고분자가 바람직한 구조로서 들 수 있다. 한편, 안료 유도체는 안료 표면을 개질함으로써 고분자 분산제의 흡착을 촉진시키는 효과를 갖는다.The polymeric dispersant adsorbs on the surface of the pigment and acts to prevent reagglomeration. For that purpose, the terminal-modified polymer, the graft polymer, and the block polymer having an anchor portion to the pigment surface are mentioned as preferable structures. On the other hand, the pigment derivative has the effect of promoting the adsorption of the polymer dispersant by modifying the pigment surface.
본 발명에 사용할 수 있는 공지의 분산제(안료 분산제)의 구체예로서는 BYK Chemie사 제작「Disperbyk-107(카르복실산 에스테르), 130(폴리아미드), 161, 162, 163, 164, 165, 166, 170(고분자 공중합물)」, EFKA사 제작「EFKA4047, 4050, 4010, 4165(폴리우레탄계), EFKA4330, 4340(블록 공중합체), 4400, 4402(변성 폴리아크릴레이트), 5010(폴리에스테르아미드), 6220(지방산 폴리에스테르), 6745(프탈로시아닌 유도체), 6750(아조 안료 유도체)」, Ajinomoto Fine-Techno Co., Ltd. 제작「아지스퍼 PB821, PB822」, Kyoeisha Chemical Co., Ltd. 제작 「플로렌 TG-710(우레탄 올리고머)」, 「폴리플로우 No.50E, No.300(아크릴계 공중합체)」, Kusumoto Chemicals, Ltd. 제작 「디스파론# 7004(폴리에테르에스테르), DA-703-50, DA-705, DA-725」, Kao Corporation 제작「이뮬겐 920, 930, 935, 985(폴리옥시에틸렌노닐페닐에테르)」, 「아세타민 86(스테알릴아민아세테테이트)」, The Lubrizol Corporation 제작 「솔스퍼스 5000(프탈로시아닌 유도체), 22000(아조 안 료 유도체), 13240(폴리에스테르아민), 3000, 17000, 27000(말단부에 기능부를 갖는 고분자), 24000, 28000, 32000, 38500(그래프트형 고분자)」, Nikko Chemicals Co.,Ltd.제작「닛콜 T106(폴리옥시에틸렌소르비탄모노올레이트), MYS-IEX(폴리옥시에틸렌모노스테아레이트)」등이 열거된다.As a specific example of the well-known dispersing agent (pigment dispersing agent) which can be used for this invention, "Disperbyk-107 (carboxylic acid ester), 130 (polyamide), 161, 162, 163, 164, 165, 166, 170 by BYK Chemie company (Polymer copolymer) "," EFKA4047, 4050, 4010, 4165 (polyurethane type), EFKA4330, 4340 (block copolymer), 4400, 4402 (modified polyacrylate), 5010 (polyesteramide), 6220 by EFKA company (Fatty acid polyester), 6745 (phthalocyanine derivative), 6750 (azo pigment derivative) ”, Ajinomoto Fine-Techno Co., Ltd. `` Azisper PB821, PB822 '', Kyoeisha Chemical Co., Ltd. Production "Florene TG-710 (urethane oligomer)", "polyflow No.50E, No.300 (acrylic copolymer)", Kusumoto Chemicals, Ltd. Production "Disparon # 7004 (polyether ester), DA-703-50, DA-705, DA-725", Kao Corporation make "Imulgen 920, 930, 935, 985 (polyoxyethylene nonyl phenyl ether)" `` Acetamine 86 (stearylylamine acetate) '', `` Solpers 5000 (phthalocyanine derivative), 22000 (azo pigment derivative), 13240 (polyesteramine), 3000, 17000, 27000 (terminal part) produced by The Lubrizol Corporation Polymers having functional parts), 24000, 28000, 32000, 38500 (grafted polymers), Nikko Ts (polyoxyethylene sorbitan monooleate), and MYS-IEX (polyoxyethylene) manufactured by Nikko Chemicals Co., Ltd. Monostearate) "and the like.
상기한 바와 같은 공지의 분산제는 필요에 따라서 (B) 분산 수지에 대하여, 10∼100질량%, 즉 1/10∼1/1(등량)의 범위로 사용할 수 있다.The above-mentioned well-known dispersing agent can be used in 10-100 mass%, 1 / 10-1 / 1 (equivalent amount) with respect to (B) dispersion resin as needed.
<(C) 중합성 화합물><(C) polymeric compound>
본 발명의 착색 화소 형성용 경화성 조성물은 (C) 중합성 화합물을 함유한다.The curable composition for coloring pixel formation of this invention contains the (C) polymeric compound.
본 발명에 사용할 수 있는 중합성 화합물은 적어도 1개의 에틸렌성 불포화 이중 결합을 갖는 부가 중합성 화합물이며, 말단 에틸렌성 불포화 결합을 적어도 1개, 바람직하게는 2개이상 갖는 화합물에서 선택된다. 이러한 화합물군은 그 산업 분야에 있어서 널리 알려지는 것이고, 본 발명에 있어서는 이들을 특별하게 한정 없이 사용할 수 있다. 이들은 예를 들면, 모노머, 프리폴리머, 즉 2량체, 3량체 및 올리고머, 또는 그들의 혼합물 및 그들의 공중합체 등의 화학적 형태를 가진다.모노머 및 그 공중합체의 예로서는 불포화 카르복실산(예를 들면, 아크릴산, 메타크릴산, 이타콘산, 크로톤산, 이소크로톤산, 말레산 등)이나 그 에스테르류, 아미드류가 열거되고, 바람직하게는 불포화 카르복실산과 지방족 다가 알콜 화합물의 에스테르, 불포화 카르복실산과 지방족 다가 아민 화합물의 아미드류가 사용된다. 또한, 히드록실기나 아미노기, 메르캅토기 등의 친핵성 치환기를 갖는 불포화 카르복 실산 에스테르 또는 아미드류와 단관능 또는 다관능 이소시아네이트류 또는 에폭시류와의 부가 반응 생성물, 및 단관능 또는 다관능의 카르복실산과의 탈수 축합 반응 생성물 등도 바람직하게 사용된다. 또한, 이소시아네이트기나 에폭시기 등의 친전자성 치환기를 갖는 불포화 카르복실산 에스테르 또는 아미드류와 단관능 또는 다관능의 알콜류, 아민류, 티올류와의 부가 반응물, 또한 할로겐기나 토실옥시기 등의 탈리성 치환기를 갖는 불포화 카르복실산 에스테르 또는 아미드류와 단관능 또는 다관능의 알콜류, 아민류, 티올류와의 치환 반응물도 바람직하다. 또한, 다른 예로서, 상기의 불포화 카르복실산 대신에, 불포화 포스폰산, 스티렌, 비닐에테르 등으로 치환된 화합물군을 사용하는 것도 가능하다.The polymerizable compound which can be used in the present invention is an addition polymerizable compound having at least one ethylenically unsaturated double bond, and is selected from compounds having at least one, preferably two or more terminal ethylenically unsaturated bonds. Such compound groups are widely known in the industrial field, and in the present invention, these can be used without particular limitation. These have, for example, chemical forms such as monomers, prepolymers, ie dimers, trimers and oligomers, or mixtures thereof and copolymers thereof. Examples of monomers and their copolymers include unsaturated carboxylic acids (e.g. acrylic acid, Methacrylic acid, itaconic acid, crotonic acid, isocrotonic acid, maleic acid, etc.), esters thereof, and amides thereof, and preferably esters of unsaturated carboxylic acids and aliphatic polyhydric alcohol compounds, unsaturated carboxylic acids and aliphatic polyamines. Amides of the compounds are used. Furthermore, addition reaction products of unsaturated carboxylic acid esters or amides having nucleophilic substituents such as hydroxyl groups, amino groups, and mercapto groups with monofunctional or polyfunctional isocyanates or epoxies, and monofunctional or polyfunctional The dehydration condensation reaction product with carboxylic acid, etc. are also used preferably. In addition, addition reaction products of unsaturated carboxylic acid esters or amides having electrophilic substituents such as isocyanate groups and epoxy groups with monofunctional or polyfunctional alcohols, amines and thiols, and desorption substituents such as halogen groups and tosyloxy groups Substituted reactants of unsaturated carboxylic acid esters or amides with monofunctional or polyfunctional alcohols, amines and thiols are also preferable. As another example, it is also possible to use a compound group substituted with unsaturated phosphonic acid, styrene, vinyl ether or the like instead of the above unsaturated carboxylic acid.
지방족 다가 알콜 화합물과 불포화 카르복실산의 에스테르의 모노머의 구체예로서는 아크릴산 에스테르로서, 에틸렌글리콜디아크릴레이트, 트리에틸렌글리콜 디아크릴레이트, 1,3-부탄디올디아크릴레이트, 테트라메틸렌글리콜디아크릴레이트, 프로필렌글리콜디아크릴레이트, 네오펜틸글리콜디아크릴레이트, 트리메틸올프로판트리아크릴레이트, 트리메틸올프로판트리(아크릴로일옥시프로필)에테르, 트리메틸올에탄트리아크릴레이트, 헥산디올디아크릴레이트, 1,4-시클로헥산디올디아크릴레이트, 테트라에틸렌글리콜디아크릴레이트, 펜타에리스리톨디아크릴레이트, 펜타에리스리톨트리아크릴레이트, 펜타에리스리톨테트라아크릴레이트, 디펜타에리스리톨디아크릴레이트, 디펜타에리스리톨헥사아크릴레이트, 소르비톨트리아크릴레이트, 소르비톨테트라아크릴레이트, 소르비톨펜타아크릴레이트, 소르비톨헥사아크릴레이트, 트리(아크릴로일옥시에틸)이소시아누레이트, 폴리에스테르아크릴레이트 올리고 머, 이소시아누르산 EO변성 트리아크릴레이트 등이 있다.As an example of the monomer of the ester of an aliphatic polyhydric alcohol compound and an unsaturated carboxylic acid, it is an acrylic ester, Ethylene glycol diacrylate, a triethylene glycol diacrylate, 1, 3- butanediol diacrylate, tetramethylene glycol diacrylate, and propylene Glycol diacrylate, neopentyl glycol diacrylate, trimethylol propane triacrylate, trimethylol propane tri (acryloyloxypropyl) ether, trimethylol ethane triacrylate, hexanediol diacrylate, 1,4-cyclo Hexanediol diacrylate, tetraethylene glycol diacrylate, pentaerythritol diacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol diacrylate, dipentaerythritol hexaacrylate, sorbitol triacrylate, Sor And the like toll tetraacrylate, sorbitol pentaacrylate, sorbitol hexaacrylate, tri (acryloyloxyethyl) isocyanurate, polyester acrylate oligonucleotide hairpins, isocyanuric acid EO modified triacrylate.
메타크릴산 에스테르로서는 테트라메틸렌글리콜디메타크릴레이트, 트리에틸렌글리콜디메타크릴레이트, 네오펜틸글리콜디메타크릴레이트, 트리메틸올프로판트리메타크릴레이트, 트리메틸올에탄트리메타크릴레이트, 에틸렌글리콜디메타크릴레이트, 1,3-부탄디올디메타크릴레이트, 헥산디올디메타크릴레이트, 펜타에리스리톨 디메타크릴레이트, 펜타에리스리톨트리메타크릴레이트, 펜타에리스리톨테트라메타크릴레이트, 디펜타에리스리톨디메타크릴레이트, 디펜타에리스리톨헥사메타크릴레이트, 소르비톨트리메타크릴레이트, 소르비톨테트라메타크릴레이트, 비스[p-(3-메타크릴옥시-2-히드록시프로폭시)페닐]디메틸메탄, 비스-[p-(메타크릴옥시에톡시)페닐]디메틸메탄 등이 있다.As methacrylic acid ester, tetramethylene glycol dimethacrylate, triethylene glycol dimethacrylate, neopentyl glycol dimethacrylate, trimethylol propane trimethacrylate, trimethylol ethane trimethacrylate, ethylene glycol dimethacryl Latex, 1,3-butanediol dimethacrylate, hexanediol dimethacrylate, pentaerythritol dimethacrylate, pentaerythritol trimethacrylate, pentaerythritol tetramethacrylate, dipentaerythritol dimethacrylate, dipenta Erythritol hexamethacrylate, sorbitol trimethacrylate, sorbitol tetramethacrylate, bis [p- (3-methacryloxy-2-hydroxypropoxy) phenyl] dimethylmethane, bis- [p- (methacryloxy Ethoxy) phenyl] dimethylmethane and the like.
이타콘산 에스테르로서는 에틸렌글리콜디이타코네이트, 프로필렌글리콜디이타코네이트, 1, 3-부탄디올디이타코네이트, 1,4-부탄디올디이타코네이트, 테트라메틸렌글리콜디이타코네이트, 펜타에리스리톨디이타코네이트, 소르비톨테트라이타코네이트 등이 있다. 크로톤산 에스테르로서는 에틸렌글리콜디크로토네이트, 테트라메틸렌글리콜디크로토네이트, 펜타에리스리톨디크로토네이트, 소르비톨테트라크로토네이트 등이 있다. 이소크로톤산 에스테르로서는 에틸렌글리콜디이소크로토네이트, 펜타에리스리톨디이소크로토네이트, 소르비톨테트라이소크로토네이트 등이 있다. 말레산 에스테르로서는 에틸렌글리콜디말레이트, 트리에틸렌글리콜디말레이트, 펜타에리스리톨디말레이트, 소르비톨테트라말레이트 등이 있다.As itaconic acid ester, ethylene glycol diitaconate, propylene glycol diitaconate, 1, 3- butanediol diitaconate, 1, 4- butanediol diitaconate, tetramethylene glycol diitaconate, pentaerythritol diitaconate, sorbitol tetraitaco Nate and the like. Examples of the crotonic acid esters include ethylene glycol dicrotonate, tetramethylene glycol dicrotonate, pentaerythritol dicrotonate, sorbitol tetracrotonate, and the like. Examples of isocrotonic acid esters include ethylene glycol diisocrotonate, pentaerythritol diisocrotonate, and sorbitol tetraisocrotonate. Examples of the maleic acid ester include ethylene glycol dimaleate, triethylene glycol dimaleate, pentaerythritol dimaleate, sorbitol tetramalate and the like.
그 밖의 에스테르의 예로서, 예를 들면 일본특허공고 소51-47334, 일본특허 공개 소57-196231 기재의 지방족 알콜계 에스테르류나 일본특허공개 소59-5240, 일본 특허공개 소59-5241, 일본특허공개 평2-226149 기재의 방향족계 골격을 갖는 것, 일본특허공개 평1-165613 기재의 아미노기를 함유하는 것 등도 바람직하게 사용할 수 있다. 또한 상술의 에스테르 모노머는 혼합물로서도 사용할 수 있다.As examples of other esters, for example, aliphatic alcohol esters described in Japanese Patent Publication No. 51-47334, Japanese Patent Publication No. 57-196231, Japanese Patent Publication No. 59-5240, Japanese Patent Publication No. 59-5241, and Japanese Patent The thing which has an aromatic skeleton of Unexamined-Japanese-Patent 2-226149, the thing containing the amino group of Unexamined-Japanese-Patent No. 1-165613, etc. can also be used preferably. In addition, the above-mentioned ester monomer can be used also as a mixture.
또한, 지방족 다가 아민 화합물과 불포화 카르복실산의 아미드의 모노머의 구체예로서는 메틸렌비스-아크릴아미드, 메틸렌비스-메타크릴아미드, 1,6-헥사메틸렌비스-아크릴아미드, 1,6-헥사메틸렌비스-메타크릴아미드, 디에틸렌트리아민트리스아크릴아미드, 크실릴렌비스아크릴아미드, 크실릴렌비스메타크릴아미드 등이 있는다. 그 밖의 바람직한 아미드계 모노머의 예로서는 일본특허공고 소54-21726 기재의 시클로헥실렌 구조를 갖는 것을 들 수 있다.Moreover, as an example of the monomer of the amide of an aliphatic polyhydric amine compound and an unsaturated carboxylic acid, methylenebis- acrylamide, methylenebis-methacrylamide, 1, 6- hexamethylenebis- acrylamide, 1, 6- hexamethylene bis- Methacrylamide, diethylenetriamine trisacrylamide, xylylenebisacrylamide, xylylenebismethacrylamide and the like. As an example of another preferable amide monomer, what has a cyclohexylene structure of Unexamined-Japanese-Patent No. 54-21726 is mentioned.
또한, 이소시아네이트와 수산기의 부가 반응을 이용하여 제조되는 우레탄계 부가 중합성 화합물도 바람직하고, 그러한 구체예로서는 예를 들면, 일본특허공고 소48-41708호 공보 중에 기재되어 있는 1분자에 2개이상의 이소시아네이트기를 갖는 폴리이소시아네이트 화합물에, 하기 일반식(V)로 나타내어지는 수산기를 함유하는 비닐모노머를 부가시킨 1분자 중에 2개이상의 중합성 비닐기를 함유하는 비닐 우레탄 화합물 등이 열거된다.Moreover, the urethane type addition polymerizable compound manufactured using addition reaction of an isocyanate and a hydroxyl group is also preferable, As such a specific example, 2 or more isocyanate groups per molecule are described, for example in Unexamined-Japanese-Patent No. 48-41708. The vinyl urethane compound etc. which contain 2 or more polymerizable vinyl groups in 1 molecule which added the vinyl monomer containing the hydroxyl group represented by following General formula (V) to the polyisocyanate compound which have is mentioned.
CH2=C(R4)COOCH2CH(R5)OH (V)CH 2 = C (R 4 ) COOCH 2 CH (R 5 ) OH (V)
(단, R4 및 R5은 H 또는 CH3을 나타낸다.)(Wherein R 4 and R 5 represent H or CH 3 ).
또한, 일본특허공개 소51-37193호, 일본특허공고 평2-32293호, 일본특허공고 평2-16765호에 기재되어 있는 바와 같은 우레탄 아크릴레이트류나 일본특허공고 소58-49860호, 일본특허공고 소56-17654호, 일본특허공고 소62-39417호, 일본특허공고 소62-39418호 기재의 에틸렌옥시드계 골격을 갖는 우레탄화합물류도 바람직하다. 또한, 일본특허공개 소63-277653호, 일본특허공개 소63-260909호, 일본특허공개 평1-105238호에 기재된 분자내에 아미노 구조나 술피드 구조를 갖는 부가 중합성 화합물류를 사용함으로써는 감광 스피드가 매우 우수한 광중합성 조성물을 얻을 수 있다.Furthermore, urethane acrylates and Japanese Patent Publications No. 58-49860 and Japanese Patent Publications as described in Japanese Patent Application Laid-open No. 51-37193, Japanese Patent Application Laid-Open No. 2-32293, and Japanese Patent Application Laid-open No. Hei 2-16765. Also preferred are urethane compounds having an ethylene oxide skeleton described in Japanese Patent Application Laid-Open No. 56-17654, Japanese Patent Publication No. 62-39417, and Japanese Patent Publication No. 62-39418. Furthermore, by using addition polymerizable compounds having an amino structure or sulfide structure in the molecules described in Japanese Patent Application Laid-Open No. 63-277653, Japanese Patent Application Laid-Open No. 63-260909, and Japanese Patent Application Laid-open No. Hei 1-105238. The photopolymerizable composition which is very excellent in speed can be obtained.
그 밖의 예로서는 일본특허공개 소48-64183호, 일본특허공고 소49-43191호, 일본특허공고 소52-30490호, 각 공보에 기재되어 있는 바와 같은 폴리에스테르아크릴레이트류, 에폭시 수지와 (메타)아크릴산을 반응시킨 에폭시아크릴레이트류 등의 다관능의 아크릴레이트나 메타크릴레이트를 들 수 있다. 또한, 일본특허공고 소46-43946호, 일본특허공고 평1-40337호, 일본특허공고 평1-40336호 기재의 특정한 불포화 화합물이나 일본특허공개 평2-25493호 기재의 비닐포스폰산계 화합물 등도 들 수 있다. 또한, 어느 경우에는 일본특허공개 소61-22048호 기재의 퍼플루오로알킬 기를 함유하는 구조가 바람직하게 사용된다. 또한, 일본 접착 협회지 vol.20, No.7, 300∼308페이지(1984년)에 광경화성 모노머 및 올리고머로서 소개되어 있는 것도 사용할 수 있다.Other examples include polyester acrylates, epoxy resins, and (meth) as described in Japanese Patent Application Laid-Open No. 48-64183, Japanese Patent Publication No. 49-43191, and Japanese Patent Publication No. 52-30490; Polyfunctional acrylates and methacrylates, such as epoxy acrylate which made acrylic acid react, are mentioned. Moreover, the specific unsaturated compound of Unexamined-Japanese-Patent No. 46-43946, Unexamined-Japanese-Patent No. 1-40337, Unexamined-Japanese-Patent No. 1-40336, the vinyl phosphonic acid type-compound of Unexamined-Japanese-Patent No. 2-25493, etc. are also mentioned. Can be mentioned. In either case, a structure containing a perfluoroalkyl group described in JP-A-61-22048 is preferably used. Moreover, the thing introduce | transduced as a photocurable monomer and oligomer can also be used by Japanese adhesion association vol.20, No. 7, page 300-308 (1984).
이들 중합성 화합물에 대해서, 그 구조, 단독 사용인지 병용인지, 첨가량 등의 사용 방법의 상세한 것은 최종적인 감재의 성능 설계에 따라서 임의로 설정할 수 있다. 예를 들면, 다음과 같은 관점에서 선택된다.About these polymeric compounds, the detail of usage methods, such as the structure, single use, combined use, and addition amount, can be arbitrarily set according to the performance design of a final sensing material. For example, it selects from the following viewpoints.
감도의 점에서는 1분자당의 불포화기 함량이 많은 구조가 바람직하고, 대부분의 경우, 2관능이상이 바람직하다. 또한, 화상부 즉, 경화막의 강도를 높게 하기 위해서는 3관능이상의 것이 좋고, 또한 다른 관능수·다른 중합성기(예를 들면 아크릴산 에스테르, 메타크릴산 에스테르, 스티렌계 화합물, 비닐에테르계 화합물)의 것을 병용함으로써 감도와 강도의 양쪽을 조절하는 방법도 유효하다. 경화 감도의 관점으로부터, (메타)아크릴산 에스테르 구조를 2개이상 함유하는 화합물을 사용하는 것이 바람직하고, 3개이상 함유하는 화합물을 사용하는 것이 보다 바람직하고, 4개이상 함유하는 화합물을 사용하는 것이 가장 바람직하다. 또한, 경화 감도 및 미노광부의 현상성의 관점에서는 EO변성체를 함유하는 것이 바람직하다. 또한, 경화 감도, 및 노광부 강도의 관점에서는 우레탄 결합을 함유하는 것이 바람직하다.In terms of sensitivity, a structure having a high content of unsaturated groups per molecule is preferable, and in most cases, bifunctional or more is preferable. In order to increase the strength of the burned part, that is, the cured film, a trifunctional or more functional thing is preferable, and another functional water and another polymerizable group (e.g., acrylic acid ester, methacrylic acid ester, styrene compound, vinyl ether compound) By using together, the method of adjusting both sensitivity and intensity is also effective. From the viewpoint of curing sensitivity, it is preferable to use a compound containing two or more (meth) acrylic acid ester structures, more preferably to use a compound containing three or more, and to use a compound containing four or more. Most preferred. Moreover, it is preferable to contain an EO modified body from a hardening sensitivity and the developability of an unexposed part. Moreover, it is preferable to contain a urethane bond from a viewpoint of hardening sensitivity and exposure part strength.
또한, 중합성층 중의 다른 성분(예를 들면, 바인더 폴리머, 개시제, 착색제(안료, 염료 등)과의 상용성, 분산성에 대하여도 부가 중합 화합물의 선택·사용법은 중요한 요인이며, 예를 들면, 저순도 화합물의 사용이나, 2종 이상의 병용에 의해 상용성을 향상시킬 수 있는 경우가 있다. 또한, 기판이나 후술의 오버코트층 등의 밀착성을 향상시킬 목적으로 특정한 구조를 선택할 수도 있다.In addition, the selection and use of the addition polymerization compound are also important factors in terms of compatibility and dispersibility with other components (eg, binder polymers, initiators, colorants (pigments, dyes, etc.)) in the polymerizable layer. Compatibility may be improved by the use of a purity compound and 2 or more types of combined use A specific structure can also be selected in order to improve adhesiveness, such as a board | substrate and an overcoat layer mentioned later.
이상의 관점으로부터, 비스페놀A 디아크릴레이트, 비스페놀A 디아크릴레이트EO변성체, 트리메틸올프로판트리아크릴레이트, 트리메틸올프로판트리(아크릴로일옥시프로필)에테르, 트리메틸올에탄트리아크릴레이트, 테트라에틸렌글리콜디아크릴레이트, 펜타에리스리톨디아크릴레이트, 펜타에리스리톨트리아크릴레이트, 펜타에리 스리톨테트라아크릴레이트, 디펜타에리스리톨테트라아크릴레이트, 디펜타에리스리톨펜타아크릴레이트, 디펜타에리스리톨헥사아크릴레이트, 소르비톨트리아크릴레이트, 소르비톨테트라아크릴레이트, 소르비톨펜타아크릴레이트, 소르비톨헥사아크릴레이트, 트리(아크릴로일옥시에틸)이소시아누레이트, 펜타에리스리톨테트라아크릴레이트 EO변성체, 디펜타에리스리톨헥사아크릴레이트 EO변성체 등이 바람직한 것으로서 열거되고, 또한 시판품으로서는 우레탄 올리고머 UAS-10, UAB-140(Nippon Paper Chemicals Co., Ltd. 제작), DPHA(Nippon Kayaku Co., Ltd. 제작), UA-306H, UA-306T, UA-306I, AH-600, T-600, AI-600(Kyoeisha Chemicals Co., Ltd. 제작)이 바람직하다.From the above viewpoints, bisphenol A diacrylate, bisphenol A diacrylate EO modified substance, trimethylol propane triacrylate, trimethylol propane tri (acryloyloxypropyl) ether, trimethylol ethane triacrylate, and tetraethylene glycol di Acrylate, pentaerythritol diacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, sorbitol triacrylate, sorbitol Tetraacrylate, sorbitol pentaacrylate, sorbitol hexaacrylate, tri (acryloyloxyethyl) isocyanurate, pentaerythritol tetraacrylate EO modification, dipentaerythritol hexaacrylate EO modification, etc. are preferable. The commercially available products include urethane oligomers UAS-10, UAB-140 (manufactured by Nippon Paper Chemicals Co., Ltd.), DPHA (manufactured by Nippon Kayaku Co., Ltd.), UA-306H, UA-306T, and UA-306I. , AH-600, T-600, and AI-600 (manufactured by Kyoeisha Chemicals Co., Ltd.) are preferred.
그 중에서도 비스페놀A 디아크릴레이트 EO변성체, 펜타에리스리톨트리아크릴레이트, 펜타에리스리톨테트라아크릴레이트, 디펜타에리스리톨펜타아크릴레이트, 디펜타에리스리톨헥사아크릴레이트, 트리(아크릴로일옥시에틸)이소시아누레이트, 펜타에리스리톨테트라아크릴레이트 EO변성체, 디펜타에리스리톨헥사아크릴레이트 EO변성체 등이 시판품으로서는 DPHA(Nippon Kayaku Co., Ltd. 제작), UA-306H, UA-306T, UA-306I, AH-600, T-600, AI-600(Kyoeisha Chemicals Co., Ltd. 제작)이 보다 바람직하다.Among these, bisphenol A diacrylate EO modified product, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, tri (acryloyloxyethyl) isocyanurate, Pentaerythritol tetraacrylate EO modifier, dipentaerythritol hexaacrylate EO modifier, etc. are commercially available products such as DPHA (manufactured by Nippon Kayaku Co., Ltd.), UA-306H, UA-306T, UA-306I, AH-600, T-600 and AI-600 (made by Kyoeisha Chemicals Co., Ltd.) are more preferable.
(C) 중합성 화합물의 함유량은 본 발명의 착색 화소 형성용 경화성 조성물의 전체 고형분 중 5∼50질량%인 것이 바람직하고, 7∼40질량%인 것이 보다 바람직하고, 10∼35질량%인 것이 더욱 바람직하다.(C) It is preferable that content of a polymeric compound is 5-50 mass% in the total solid of the curable composition for colored pixel formation of this invention, It is more preferable that it is 7-40 mass%, It is 10-35 mass% More preferred.
<(D) 광중합 개시제><(D) Photoinitiator>
본 발명의 착색 화소 형성용 경화성 조성물은 (D) 광중합 개시제를 함유한다.The curable composition for coloring pixel formation of this invention contains the (D) photoinitiator.
본 발명에 있어서의 광중합 개시제는 광에 의해 분해하고, 상기 (C) 중합성 화합물의 중합을 개시, 촉진하는 화합물이며, 파장 300∼500nm의 영역에 흡수를 갖는 것이 바람직하다. 또한, 광중합 개시제는 단독으로 또는 2종이상을 병용해서 사용할 수 있다.The photoinitiator in this invention is a compound which decomposes | disassembles with light and starts and accelerates superposition | polymerization of the said (C) polymeric compound, It is preferable to have absorption in the area | region of wavelength 300-500 nm. In addition, a photoinitiator can be used individually or in combination of 2 or more types.
광중합 개시제로서는 예를 들면, 유기 할로겐화 화합물, 옥사디아졸 화합물, 카르보닐 화합물, 케탈 화합물, 벤조인 화합물, 아크리딘 화합물, 유기과산화 화합물, 아조 화합물, 쿠마린 화합물, 아지드 화합물, 메탈로센 화합물, 헥사아릴비이미다졸 화합물, 유기붕산 화합물, 디술폰산 화합물, 옥심 에스테르 화합물, 오늄염화합물, 아실포스핀(옥시드)화합물이 열거된다.Examples of the photopolymerization initiator include organic halogenated compounds, oxadiazole compounds, carbonyl compounds, ketal compounds, benzoin compounds, acridine compounds, organic peroxide compounds, azo compounds, coumarin compounds, azide compounds, and metallocene compounds. And hexaarylbiimidazole compounds, organic boric acid compounds, disulfonic acid compounds, oxime ester compounds, onium salt compounds and acylphosphine (oxide) compounds.
유기 할로겐화 화합물로서는 구체적으로는 Wakabayashi 등, 「Bull Chem.Soc Japan」42, 2924(1969), 미국특허 제3,905,815호 명세서, 일본특허공고 소46-4605호, 일본특허공개 소48-36281호, 일본특허공개 소55-32070호, 일본특허공개 소60-239736호, 일본특허공개 소61-169835호, 일본특허공개 소61-169837호, 일본특허공개 소62-58241호, 일본특허공개 소62-212401호, 일본특허공개 소63-70243호, 일본 특허공개 소63-298339호, M.P.Hutt "Journal of Heterocyclic Chemistry" 1(No3),(1970)」등에 기재된 화합물이 열거되고, 특히, 트리할로메틸기가 치환된 옥사졸 화합물, s-트리아진 화합물이 열거된다.Specific examples of the organic halogenated compound include Wakabayashi et al., "Bull Chem. Soc Japan" 42, 2924 (1969), US Patent No. 3,905,815, Japanese Patent Publication No. 46-4605, Japanese Patent Publication No. 48-36281, Japan Japanese Patent Laid-Open No. 55-32070, Japanese Patent Laid-Open No. 60-239736, Japanese Patent Laid-Open No. 61-169835, Japanese Patent Laid-Open No. 61-169837, Japanese Patent Laid-Open No. 62-58241, Japanese Patent Laid-Open No. 62- 212401, Japanese Patent Laid-Open No. 63-70243, Japanese Patent Laid-Open No. 63-298339, MPHutt "Journal of Heterocyclic Chemistry" 1 (No3), (1970), and the like. The oxazole compound in which the methyl group was substituted, and the s-triazine compound are mentioned.
이하, 본 발명에 있어서의 바람직한 중합 개시제인 s-트리아진 화합물에 대 해서 상세하게 설명한다.Hereinafter, the s-triazine compound which is a preferable polymerization initiator in this invention is demonstrated in detail.
s-트리아진 화합물로서, 보다 바람직하게는 적어도 하나의 모노, 디, 또는 트리 할로겐 치환 메틸기가 s-트리아진환에 결합한 s-트리아진 유도체, 구체적으로는 예를 들면, 2,4,6-트리스(모노클로로메틸)-s-트리아진, 2,4,6-트리스(디클로로 메틸)-s-트리아진, 2,4,6-트리스(트리클로로메틸)-s-트리아진, 2-메틸-4,6-비스(트리클로로메틸)-s-트리아진, 2-n-프로필-4,6-비스(트리클로로메틸)-s-트리아진, 2-(α,α,β-트리클로로에틸)-4,6-비스(트리클로로메틸)-s-트리아진, 2-페닐-4,6-비스(트리클로로메틸)-s-트리아진, 2-(p-메톡시페닐)-4,6-비스(트리클로로메틸)-s-트리아진, 2-(3,4-에폭시페닐)-4,6-비스(트리클로로메틸)-s-트리아진, 2-(p-클로로페닐)-4,6-비스(트리클로로메틸)-s-트리아진, 2-[1-(p-메톡시페닐)-2,4-부타디에닐]-4,6-비스(트리클로로메틸)-s-트리아진, 2-스티릴-4,6-비스(트리클로로메틸)-s-트리아진, 2-(p-메톡시스티릴)-4,6-비스(트리클로로메틸)-s-트리아진, 2-(p-i-프로필옥시스티릴)-4,6-비스(트리클로로메틸)-s-트리아진, 2-(p-톨릴)-4,6-비스(트리클로로메틸)-s-트리아진, 2-(4-나톡시나프틸)-4,6-비스(트리클로로메틸)-s-트리아진, 2-페닐티오-4,6-비스(트리클로로메틸)-s-트리아진, 2-벤질티오-4,6-비스(트리클로로메틸)-s-트리아진, 4-(o-브로모-p-N,N-(디에톡시카르보닐아미노)-페닐)-2,6-디(트리클로로메틸)-s-트리아진, 2,4,6-트리스(디브로모메틸)-s-트리아진, 2,4,6-트리스(트리브로모메틸)-s-트리아진, 2-메틸-4,6-비스(트리브로모메틸)-s-트리아진, 2-메톡시-4,6-비스(트리브로모메틸)-s-트리아진 등이 열거된다.As the s-triazine compound, more preferably an s-triazine derivative in which at least one mono, di, or tri halogen-substituted methyl group is bonded to the s-triazine ring, specifically, for example, 2,4,6-tris (Monochloromethyl) -s-triazine, 2,4,6-tris (dichloromethyl) -s-triazine, 2,4,6-tris (trichloromethyl) -s-triazine, 2-methyl- 4,6-bis (trichloromethyl) -s-triazine, 2-n-propyl-4,6-bis (trichloromethyl) -s-triazine, 2- (α, α, β-trichloroethyl ) -4,6-bis (trichloromethyl) -s-triazine, 2-phenyl-4,6-bis (trichloromethyl) -s-triazine, 2- (p-methoxyphenyl) -4, 6-bis (trichloromethyl) -s-triazine, 2- (3,4-epoxyphenyl) -4,6-bis (trichloromethyl) -s-triazine, 2- (p-chlorophenyl)- 4,6-bis (trichloromethyl) -s-triazine, 2- [1- (p-methoxyphenyl) -2,4-butadienyl] -4,6-bis (trichloromethyl) -s Triazine, 2-styryl-4,6-bis (tree Roromethyl) -s-triazine, 2- (p-methoxystyryl) -4,6-bis (trichloromethyl) -s-triazine, 2- (pi-propyloxystyryl) -4,6 -Bis (trichloromethyl) -s-triazine, 2- (p-tolyl) -4,6-bis (trichloromethyl) -s-triazine, 2- (4-nathoxynaphthyl) -4, 6-bis (trichloromethyl) -s-triazine, 2-phenylthio-4,6-bis (trichloromethyl) -s-triazine, 2-benzylthio-4,6-bis (trichloromethyl) -s-triazine, 4- (o-bromo-pN, N- (diethoxycarbonylamino) -phenyl) -2,6-di (trichloromethyl) -s-triazine, 2,4,6 -Tris (dibromomethyl) -s-triazine, 2,4,6-tris (tribromomethyl) -s-triazine, 2-methyl-4,6-bis (tribromomethyl) -s -Triazine, 2-methoxy-4,6-bis (tribromomethyl) -s-triazine and the like.
할로메틸-s-트리아진계 화합물의 광중합 개시제로서는 또한, 일본특허공개 평11-323057호 공보에 기재된 하기 일반식(D-A)로 나타내어지는 바와 같은 4-(p-아미노페닐)-2,6-디-할로메틸-s-트리아진 화합물, 일본특허공고 소59-1281호 공보에 기재된 하기 일반식(D-B)로 나타내어지는 바와 같은 비닐-할로메틸-s-트리아진 화합물, 및 일본특허공개 소53-133428호 공보에 기재된 하기 일반식(D-C)로 나타내어지는 2-(나프토-1-일)-4,6-비스-할로메틸-s-트리아진 화합물 등이 바람직한 것으로서 열거된다.As a photoinitiator of a halomethyl-s-triazine type compound, 4- (p-aminophenyl) -2,6-di as represented by the following general formula (DA) of Unexamined-Japanese-Patent No. 11-323057 also is mentioned. -Halomethyl-s-triazine compound, vinyl-halomethyl-s-triazine compound as represented by the following general formula (DB) described in Japanese Patent Publication No. 59-1281, and Japanese Patent Publication No. 53- 2- (naphtho-1-yl) -4,6-bis-halomethyl-s-triazine compound represented by the following general formula (DC) described in 133428 is listed as a preferable thing.
상기 일반식(D-A) 중 R1, R2는 각각 독립적으로 수소 원자, 알킬기, 아릴기,또는 하기 일반식(D-A-1) 또는 일반식(D-A-2)로 나타내어지는 치환기를 나타낸다. R3, R4는 각각 독립적으로 수소 원자, 할로겐 원자, 알킬기, 또는 알콕시기를 나타낸다. X, Y는 각각 독립적으로 -Cl, -Br을 나타내고, m, n은 0, 1 또는 2를 나타낸다.R 1 and R 2 in the general formula (DA) each independently represent a hydrogen atom, an alkyl group, an aryl group, or a substituent represented by the following general formula (DA-1) or general formula (DA-2). R 3 and R 4 each independently represent a hydrogen atom, a halogen atom, an alkyl group, or an alkoxy group. X and Y each independently represent -Cl and -Br, and m and n each represent 0, 1 or 2.
상기 일반식(D-A-1) 및 일반식(D-A-2) 중, R5, R6, R7은 각각 독립적으로, 알 킬기 또는 아릴기를 나타낸다.In said general formula (DA-1) and general formula (DA-2), R <5> , R <6> , R <7> respectively independently represents an alkyl group or an aryl group.
상기 일반식(D-A)∼일반식(D-A-2)에 있어서, R1∼R7로 나타내어지는 알킬기, 아릴기는 또한 치환기를 갖는 것이어도 좋고, 도입 가능한 치환기의 예로서는 페닐기 등의 아릴기, 할로겐 원자, 알콕시기, 카르보알콕시기, 카르보아릴옥시기, 아실기, 니트로기, 디알킬아미노기, 또는 술포닐유도체 등이 열거된다.In the general formulas (DA) to (DA-2), the alkyl group and the aryl group represented by R 1 to R 7 may further have a substituent, and examples of the substituent that can be introduced include aryl groups such as phenyl groups and halogen atoms And an alkoxy group, a carboalkoxy group, a carboaryloxy group, an acyl group, a nitro group, a dialkylamino group, or a sulfonyl derivative.
일반식(D-A)에 있어서, R1과 R2가 그것과 결합하고 있는 질소 원자와 함께 비금속 원자로 이루어지는 환구조를 형성해도 좋고, 그 경우 형성되는 환구조로서는 이하에 나타내어지는 것이 열거된다.In general formula (DA), you may form the ring structure which consists of a nonmetallic atom with the nitrogen atom which R <1> and R <2> couple | bond with it, and what is shown below is mentioned as a ring structure formed in that case.
상기 일반식(D-A)로 나타내어지는 화합물의 구체예로서는 4-[p-N,N-디(에톡시카르보닐메틸)아미노페닐]-2,6-디(트리클로로메틸)-s-트리아진, 4-[o-메틸-p-N,N-디(에톡시카르보닐메틸)아미노페닐]-2,6-디(트리클로로메틸)-s-트리아진, 4-[p-N,N-디(클로로에틸)아미노페닐]-2,6-디(트리클로로메틸)-s-트리아진, 4-[o-메틸-p-N,N-디(클로로에틸)아미노페닐]-2,6-디(트리클로로메틸)-s-트리아진, 4-(p-N-클로로에틸아미노페닐)-2,6-디(트리클로로메틸)-s-트리아진, 4-(p-N-에톡시카르보닐메틸아미노페닐)-2,6-디(트리클로로메틸)-s-트리아진, 4-[p-N,N-디(페닐)아미노페닐]-2,6-디(트리클로로메틸)-s-트리아진, 4-(p-N-클로로에틸카르보닐아미노페닐)-2,6-디(트리클로로메틸)-s-트리아진, 4-[p-N-(p-메톡시페닐)카르보닐아미노페닐 ]2,6-디(트리클로로메틸)-s-트리아진, 4-[m-N,N-디(에톡시카르보닐메틸)아미노페닐]-2,6-디(트리클로로메틸)-s-트리아진, 4-[m-브로모-p-N,N-디(에톡시카르보닐메틸)아미노페닐]-2,6-디(트리클로로메틸)-s-트리아진, 4-[m-클로로-p-N,N-디(에톡시카르보닐메틸)아미노페닐]-2,6-디(트리클로로메틸)-s-트리아진, 4-[m-플루오로-p-N,N-디(에톡시카르보닐메틸)아미노페닐]-2,6-디(트리클로로메틸)-s-트리아진, 4- [o-브로모-p-N,N-디(에톡시카르보닐메틸)아미노페닐]-2,6-디(트리클로로메틸)-s-트리아진, 4-[o-클로로-p-N,N-디(에톡시카르보닐메틸)아미노페닐-2,6-디(트리클로로메틸)-s-트리아진,Specific examples of the compound represented by the general formula (DA) include 4- [pN, N-di (ethoxycarbonylmethyl) aminophenyl] -2,6-di (trichloromethyl) -s-triazine, 4- [o-methyl-pN, N-di (ethoxycarbonylmethyl) aminophenyl] -2,6-di (trichloromethyl) -s-triazine, 4- [pN, N-di (chloroethyl) amino Phenyl] -2,6-di (trichloromethyl) -s-triazine, 4- [o-methyl-pN, N-di (chloroethyl) aminophenyl] -2,6-di (trichloromethyl)- s-triazine, 4- (pN-chloroethylaminophenyl) -2,6-di (trichloromethyl) -s-triazine, 4- (pN-ethoxycarbonylmethylaminophenyl) -2,6- Di (trichloromethyl) -s-triazine, 4- [pN, N-di (phenyl) aminophenyl] -2,6-di (trichloromethyl) -s-triazine, 4- (pN-chloroethyl Carbonylaminophenyl) -2,6-di (trichloromethyl) -s-triazine, 4- [pN- (p-methoxyphenyl) carbonylaminophenyl] 2,6-di (trichloromethyl)- s-triazine, 4- [mN, N-di (ethoxycarbonylmethyl) Minophenyl] -2,6-di (trichloromethyl) -s-triazine, 4- [m-bromo-pN, N-di (ethoxycarbonylmethyl) aminophenyl] -2,6-di ( Trichloromethyl) -s-triazine, 4- [m-chloro-pN, N-di (ethoxycarbonylmethyl) aminophenyl] -2,6-di (trichloromethyl) -s-triazine, 4 -[m-fluoro-pN, N-di (ethoxycarbonylmethyl) aminophenyl] -2,6-di (trichloromethyl) -s-triazine, 4- [o-bromo-pN, N -Di (ethoxycarbonylmethyl) aminophenyl] -2,6-di (trichloromethyl) -s-triazine, 4- [o-chloro-pN, N-di (ethoxycarbonylmethyl) aminophenyl -2,6-di (trichloromethyl) -s-triazine,
4-[o-플루오로-p-N,N-디(에톡시카르보닐메틸)아미노페닐]-2,6-디(트리클로로메틸)-s-트리아진, 4-[o-브로모-p-N,N-디(클로로에틸)아미노페닐]-2,6-디(트리클로로메틸)-s-트리아진, 4-[o-클로로-p-N,N-디(클로로에틸)아미노페닐]-2,6-디(트리클로로메틸)-s-트리아진, 4-[o-플루오로-p-N,N-디(클로로에틸)아미노페닐]-2,6-디(트리클로로메틸)-s-트리아진, 4-[m-브로모-p-N,N-디(클로로에틸)아미노페닐]-2,6-디(트리클로로메틸)-s-트리아진, 4-[m-클로로-p-N,N-디(클로로에틸)아미노페닐]-2,6-디(트리클로로메틸)-s-트리아진, 4-[m-플루오로-p-N,N-디(클로로에틸)아미노페닐]-2,6-디(트리클로로메틸)-s-트리아진, 4-(m-브로모-p-N-에톡시카르보닐메틸아미노페닐)-2,6-디(트리클로로메틸)-s-트리아진, 4-(m-클로로-p-N-에톡시카르보닐메틸아미노페닐)-2,6-디(트리클로로메틸)-s-트리아진, 4-(m-플루오로-p-N-에톡시카르보닐메틸아미노페닐)-2,6-디(트리클로로메틸)-s-트리아진, 4-(o-브로모-p-N-에톡시카르보닐메틸아미노페닐)-2,6-디(트리클로로메틸)-s-트리아진, 4-(o-클로로-p-N-에톡시카 르보닐메틸아미노페닐)-2,6-디(트리클로로메틸)-s-트리아진, 4-(o-플루오로-p-N-에톡시카르보닐메틸아미노페닐)-2,6-디(트리클로로메틸)-s-트리아진, 4-(m-브로모-p-N-클로로에틸아미노페닐)-2,6-디(트리클로로메틸)-s-트리아진, 4-(m-클로로-p-N-클로로에틸아미노페닐)-2,6-디(트리클로로메틸)-s-트리아진, 4-(m-플루오로-p-N-클로로에틸아미노페닐)-2,6-디(트리클로로메틸)-s-트리아진, 4-(o-브로모-p-N-클로로에틸아미노페닐)-2,6-디(트리클로로메틸)-s-트리아진, 4-(o-클로로-p-N-클로로에틸아미노페닐)-2,6-디(트리클로로메틸)-s-트리아진, 4-(o-플루오로-p-N-클로로에틸 아미노페닐)-2,6-디(트리클로로메틸)-s-트리아진 등이 열거된다.4- [o-fluoro-pN, N-di (ethoxycarbonylmethyl) aminophenyl] -2,6-di (trichloromethyl) -s-triazine, 4- [o-bromo-pN, N-di (chloroethyl) aminophenyl] -2,6-di (trichloromethyl) -s-triazine, 4- [o-chloro-pN, N-di (chloroethyl) aminophenyl] -2,6 -Di (trichloromethyl) -s-triazine, 4- [o-fluoro-pN, N-di (chloroethyl) aminophenyl] -2,6-di (trichloromethyl) -s-triazine, 4- [m-bromo-pN, N-di (chloroethyl) aminophenyl] -2,6-di (trichloromethyl) -s-triazine, 4- [m-chloro-pN, N-di ( Chloroethyl) aminophenyl] -2,6-di (trichloromethyl) -s-triazine, 4- [m-fluoro-pN, N-di (chloroethyl) aminophenyl] -2,6-di ( Trichloromethyl) -s-triazine, 4- (m-bromo-pN-ethoxycarbonylmethylaminophenyl) -2,6-di (trichloromethyl) -s-triazine, 4- (m- Chloro-pN-ethoxycarbonylmethylaminophenyl) -2,6-di (trichloromethyl) -s-triazine, 4- (m-fluoro-pN- Oxycarbonylmethylaminophenyl) -2,6-di (trichloromethyl) -s-triazine, 4- (o-bromo-pN-ethoxycarbonylmethylaminophenyl) -2,6-di (trichloro Rhomethyl) -s-triazine, 4- (o-chloro-pN-ethoxycarbonylmethylaminophenyl) -2,6-di (trichloromethyl) -s-triazine, 4- (o-fluoro -pN-ethoxycarbonylmethylaminophenyl) -2,6-di (trichloromethyl) -s-triazine, 4- (m-bromo-pN-chloroethylaminophenyl) -2,6-di ( Trichloromethyl) -s-triazine, 4- (m-chloro-pN-chloroethylaminophenyl) -2,6-di (trichloromethyl) -s-triazine, 4- (m-fluoro-pN -Chloroethylaminophenyl) -2,6-di (trichloromethyl) -s-triazine, 4- (o-bromo-pN-chloroethylaminophenyl) -2,6-di (trichloromethyl)- s-triazine, 4- (o-chloro-pN-chloroethylaminophenyl) -2,6-di (trichloromethyl) -s-triazine, 4- (o-fluoro-pN-chloroethyl aminophenyl ) -2,6-di (trichloromethyl ) -s-triazine and the like.
일반식(D-B) 중 Q3은 Br 또는 Cl을 나타내고, P는 -CQ3, -NH2, -NHR, -N(R)2 또는 -OR(여기서, R은 페닐기 또는 알킬기)을 나타낸다. W는 또한 치환기를 갖고 있어도 좋은 방향족환, 복소환 또는 하기 일반식(D-B-1)로 나타내어지는 치환기를 나타내고, 일반식(D-B-1) 중 Z는 -O- 또는 -S-이며, R은 페닐기 또는 알킬기를 나타낸다. n은 0∼2의 정수이다.In General Formula (DB), Q 3 represents Br or Cl, and P represents -CQ 3 , -NH 2 , -NHR, -N (R) 2 or -OR (where R represents a phenyl group or an alkyl group). W also represents an aromatic ring which may have a substituent, a substituent represented by the following general formula (DB-1), or in general formula (DB-1), Z is -O- or -S-, and R is A phenyl group or an alkyl group is represented. n is an integer of 0-2.
상기 일반식(D-B)로 나타내어지는 화합물의 구체적인 예로서는 2,4-비스(트 리클로로메틸)-6-p-메톡시스티릴-s-트리아진, 2,4-비스(트리클로로메틸)-6-(1-p-디메틸아미노페닐-1,3-부타디에닐)-s-트리아진, 2-트리클로로메틸-4-아미노-6-p-메톡시스티릴-s-트리아진 등이 열거된다.Specific examples of the compound represented by the general formula (DB) include 2,4-bis (trichloromethyl) -6-p-methoxystyryl-s-triazine and 2,4-bis (trichloromethyl)- 6- (1-p-dimethylaminophenyl-1,3-butadienyl) -s-triazine, 2-trichloromethyl-4-amino-6-p-methoxystyryl-s-triazine and the like Listed.
일반식(D-C) 중 X, Y는 각각 독립적으로 -Br 또는 -Cl을 나타내고, m, n은 0∼3의 정수이다. R'은 상기 일반식(D-C-1)로 나타내어지는 치환기이고, 여기서, R1은 수소 원자 또는 -ORc을 나타내고, 여기서 Rc는 알킬기, 시클로알킬기, 알케닐기또는 아릴기를 나타낸다. R2는 -Cl, -Br, 알킬기, 알케닐기, 아릴기 또는 알콕시기를 나타낸다.In General Formula (DC), X and Y respectively independently represent -Br or -Cl, and m and n are integers of 0-3. R 'is a substituent represented by the general formula (DC-1), wherein R 1 represents a hydrogen atom or -OR c , where R c represents an alkyl group, a cycloalkyl group, an alkenyl group or an aryl group. R 2 represents —Cl, —Br, an alkyl group, an alkenyl group, an aryl group or an alkoxy group.
상기 일반식(D-C)로 나타내어지는 화합물의 구체적인 예로서는 2-(나프토-1-일)-4,6-비스-트리클로로메틸-s-트리아진, 2-(4-메톡시-나프토-1-일)-4,6-비스-트리클로로메틸-s-트리아진, 2-(4-에톡시-나프토-1-일)-4,6-비스-트리클로로메틸-s-트리아진, 2-(4-부톡시-나프토-1-일)-4,6-비스-트리클로로메틸-s-트리아진, 2-[4-(2-메톡시에틸)-나프토-1-일]-4,6-비스-트리클로로메틸-s-트리아진, 2-[4-(2-에톡 시에틸)-나프토-1-일]-4,6-비스-트리클로로메틸-s-트리아진, 2-[4-(2-부톡시에틸)-나프토-1-일]-4,6-비스-트리클로로메틸-s-트리아진, 2-(2-메톡시-나프토-1-일)-4,6-비스-트리클로로메틸-s-트리아진, 2-(6-메톡시-5-메틸-나프토-2-일)-4,6-비스-트리클로로메틸-s-트리아진, 2-(6-메톡시-나프토-2-일)-4,6-비스-트리클로로메틸-s-트리아진, 2-(5-메톡시-나프토-1-일)-4,6-비스-트리클로로메틸-s-트리아진, 2-(4,7-디메톡시-나프토-1-일)-4,6-비스-트리클로로메틸-s-트리아진, 2-(6-에톡시-나프토-2-일)-4,6-비스-트리클로로메틸-s-트리아진, 2-(4,5-디메톡시-나프토-1-일)-4,6-비스-트리클로로메틸-s-트리아진 등이 열거된다.Specific examples of the compound represented by the general formula (DC) include 2- (naphtho-1-yl) -4,6-bis-trichloromethyl-s-triazine and 2- (4-methoxy-naphtho- 1-yl) -4,6-bis-trichloromethyl-s-triazine, 2- (4-ethoxy-naphtho-1-yl) -4,6-bis-trichloromethyl-s-triazine , 2- (4-butoxy-naphtho-1-yl) -4,6-bis-trichloromethyl-s-triazine, 2- [4- (2-methoxyethyl) -naphtho-1- Il] -4,6-bis-trichloromethyl-s-triazine, 2- [4- (2-ethoxyethyl) -naphtho-1-yl] -4,6-bis-trichloromethyl-s -Triazine, 2- [4- (2-butoxyethyl) -naphtho-1-yl] -4,6-bis-trichloromethyl-s-triazine, 2- (2-methoxy-naphtho -1-yl) -4,6-bis-trichloromethyl-s-triazine, 2- (6-methoxy-5-methyl-naphtho-2-yl) -4,6-bis-trichloromethyl -s-triazine, 2- (6-methoxy-naphtho-2-yl) -4,6-bis-trichloromethyl-s-triazine, 2- (5-methoxy-naphtho-1- Il) -4,6-bis-trichloromethyl-s-triazine , 2- (4,7-dimethoxy-naphtho-1-yl) -4,6-bis-trichloromethyl-s-triazine, 2- (6-ethoxy-naphtho-2-yl)- 4,6-bis-trichloromethyl-s-triazine, 2- (4,5-dimethoxy-naphtho-1-yl) -4,6-bis-trichloromethyl-s-triazine and the like do.
옥사디아졸 화합물로서는 2-트리클로로메틸-5-스티릴-1,3,4-옥사디아졸, 2-트리클로로메틸-5-(시아노스티릴)-1,3,4-옥사디아졸, 2-트리클로로메틸-5-(나프토-1-일)-1,3,4-옥사디아졸, 2-트리클로로메틸-5-(4-스티릴)스티릴-1,3,4-옥사디아졸등이 열거된다.Examples of the oxadiazole compounds include 2-trichloromethyl-5-styryl-1,3,4-oxadiazole, 2-trichloromethyl-5- (cyanostyryl) -1,3,4-oxadiazole, 2-trichloromethyl-5- (naphtho-1-yl) -1,3,4-oxadiazole, 2-trichloromethyl-5- (4-styryl) styryl-1,3,4- Oxadiazole and the like.
또한, 다른 트리아진계 개시제의 바람직한 예로서, 이하에 나타내는 일반식(D-D)로 나타내어지는 화합물이 열거된다.Moreover, the compound represented by general formula (D-D) shown below is mentioned as a preferable example of another triazine type initiator.
일반식(D-D) 중 R1은 수소 원자, 히드록시기, 탄소수 1∼3개의 알킬기 또는 탄소수 1∼3개의 알콕시기를 나타내고, m은 1∼3의 정수이다. 여기서, m이 2 또는 3일 경우, 복수 존재하는 R1은 서로 같거나 달라도 좋다.R <1> represents a hydrogen atom, a hydroxyl group, a C1-C3 alkyl group, or a C1-C3 alkoxy group in general formula (DD), and m is an integer of 1-3. Here, when m is 2 or 3, two or more R <1> may mutually be same or different.
일반식(D-D)로 나타내어지는 화합물의 구체예로서는 예를 들면, 1,3-비스트리클로로메틸-5-벤조옥솔란트리아진, 1,3-비스트리클로로메틸-5-(5-메틸벤조옥솔란)트리아진, 1,3-비스트리클로로메틸-5-(6-메톡시벤조옥솔란) 트리아진 등이 열거된다.As a specific example of a compound represented by general formula (DD), for example, 1, 3-bistrichloromethyl-5-benzooxolatriazine, 1,3-bistrichloromethyl-5- (5-methylbenzo jade Solan) triazine, 1,3-bistrichloromethyl-5- (6-methoxybenzooxolane) triazine and the like.
카르보닐 화합물로서는 벤조페논, 미힐러케톤, 2-메틸벤조페논, 3-메틸벤조페논, 4-메틸벤조페논, 2-클로로벤조페논, 4-브로모벤조페논, 2-카르복시벤조페논 등의 벤조페논 유도체, 2,2-디메톡시-2-페닐아세토페논, 2,2-디에톡시아세토페논, 1-히드록시시클로헥실페닐케톤, α-히드록시-2-메틸페닐프로파논, 1-히드록시-1-메틸에틸-(p-이소프로필페닐)케톤, 1-히드록시-1-(p-도데실페닐)케톤, 2-메틸-1-(4'-(메틸티오)페닐)-2-모르폴리노-1-프로파논, 2-벤질-2-디메틸아미노-1-(4-모르폴리노페닐)-부타논-1,2,4,6-트리메틸벤조일-디페닐-포스핀옥시드, 1,1,1-트리클로로메틸-(p-부틸페닐)케톤, 2-벤질-2-디메틸아미노-4-몰포리노부티로페논 등의 아세토페논 유도체, 티오크산톤, 2-에틸티오크산톤, 2-이소프로필티오크산톤, 2-클로로티오크산톤, 2,4-디메틸티오크산톤, 2,4-디에틸티옥산톤, 2,4-디이소프로필티오크산톤 등의 티오크산톤 유도체, p-디메틸아미노벤조산 에틸, p-디에틸아미노벤조산 에틸 등의 벤조산 에스테르 유도체 등을 들 수 있다.As the carbonyl compound, benzos such as benzophenone, Michler's ketone, 2-methylbenzophenone, 3-methylbenzophenone, 4-methylbenzophenone, 2-chlorobenzophenone, 4-bromobenzophenone, and 2-carboxybenzophenone Phenone derivatives, 2,2-dimethoxy-2-phenylacetophenone, 2,2-diethoxyacetophenone, 1-hydroxycyclohexylphenylketone, α-hydroxy-2-methylphenylpropane, 1-hydroxy- 1-methylethyl- (p-isopropylphenyl) ketone, 1-hydroxy-1- (p-dodecylphenyl) ketone, 2-methyl-1- (4 '-(methylthio) phenyl) -2-mor Polyno-1-propaneone, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butanone-1,2,4,6-trimethylbenzoyl-diphenyl-phosphineoxide, 1 Acetophenone derivatives such as 1,1-trichloromethyl- (p-butylphenyl) ketone, 2-benzyl-2-dimethylamino-4-morpholinobutyrophenone, thioxanthone, 2-ethyl thioxanthone, 2-isopropyl thioxanthone, 2-chloro thioxanthone, 2,4-dimethyl thioxanthone, 2,4-diethyl Thioxanthone, and the like can be mentioned 2,4-diisopropyl thioxanthone, etc. of thioxanthone derivatives, p- dimethylaminobenzoic acid ethyl, p--diethylamino-benzoic acid ethyl ester derivatives such as the acid.
케탈 화합물로서는 벤질디메틸케탈, 벤질-β-메톡시에틸에틸아세탈 등을 들 수 있다.Benzyl dimethyl ketal, benzyl- (beta)-methoxyethyl ethyl acetal, etc. are mentioned as a ketal compound.
벤조인 화합물로서는 m-벤조인이소프로필에테르, 벤조인이소부틸에테르, 벤조인메틸에테르, 메틸 o-벤조일벤조에이트 등을 들 수 있다.Examples of the benzoin compound include m-benzoin isopropyl ether, benzoin isobutyl ether, benzoin methyl ether, methyl o-benzoylbenzoate and the like.
아크리딘 화합물로서는 9-페닐아크리딘, 1,7-비스(9-아크리디닐)헵탄 등을 들 수 있다.Examples of the acridine compound include 9-phenylacridine, 1,7-bis (9-acridinyl) heptane, and the like.
유기 과산화 화합물로서는 예를 들면, 트리메틸시클로헥사논퍼옥시드, 아세틸아세톤퍼옥시드, 1,1-비스(tert-부틸퍼옥시)-3,3,5-트리메틸시클로헥산, 1,1-비스(tert-부틸퍼옥시)시클로헥산, 2,2-비스(tert-부틸퍼옥시)부탄, tert-부틸히드로퍼옥시드, 쿠멘히드로퍼옥시드, 디이소프로필벤젠히드로퍼옥시드, 2,5-디메틸헥산-2,5-디히드로퍼옥시드, 1,1,3,3-테트라메틸부틸히드로퍼옥시드, tert-부틸쿠밀퍼옥시드, 디쿠밀퍼옥시드, 2,5-디메틸-2,5-디(tert-부틸퍼옥시)헥산, 2,5-옥사노일퍼옥시드, 과산화숙신산, 과산화벤조일, 2,4-디클로로벤조일퍼옥시드, 디이소프로필퍼옥시디카보네이트, 디-2-에틸헥실퍼옥시디카보네이트, 디-2-에톡시에틸퍼옥시디카보네이트, 디메톡시이소프로필퍼옥시카보네이트, 디(3-메틸-3-메톡시부틸)퍼옥시디카보네이트, tert-부틸퍼옥시아세테이트, tert-부틸퍼옥시피발레이트, tert-부틸퍼옥시네오데카노에이트, tert-부틸퍼옥시옥타노에이트, tert-부틸퍼옥시라울레이트, tert-카보네이트, 3,3',4,4'-테트라-(t-부틸퍼옥시카르보닐)벤조페논, 3,3',4,4'-테트라-(t-헥실퍼옥시카르보닐)벤조페논, 3,3',4,4'-테트라-(p-이소프로필쿠밀퍼옥시카르보닐)벤조페논, 카르보닐디(t-부틸퍼옥시 이수소 이프탈레이트), 카르보닐디(t-헥실퍼옥시 이수소 이프탈레이트) 등이 열거된다.Examples of the organic peroxide compound include trimethylcyclohexanone peroxide, acetylacetone peroxide, 1,1-bis (tert-butylperoxy) -3,3,5-trimethylcyclohexane, 1,1-bis (tert -Butyl peroxy) cyclohexane, 2,2-bis (tert-butylperoxy) butane, tert-butylhydroperoxide, cumene hydroperoxide, diisopropylbenzenehydroperoxide, 2,5-dimethylhexane-2 , 5-dihydroperoxide, 1,1,3,3-tetramethylbutylhydroperoxide, tert-butylcumylperoxide, dicumylperoxide, 2,5-dimethyl-2,5-di (tert-butyl Peroxy) hexane, 2,5-oxanoyl peroxide, succinic peroxide, benzoyl peroxide, 2,4-dichlorobenzoyl peroxide, diisopropylperoxydicarbonate, di-2-ethylhexyl peroxydicarbonate, di-2- Ethoxyethylperoxydicarbonate, dimethoxyisopropylperoxycarbonate, di (3-methyl-3-methoxybutyl) peroxydicarbonate, tert-butylperoxyacetate , tert-butylperoxy pivalate, tert-butylperoxy neodecanoate, tert-butylperoxyoctanoate, tert-butylperoxylaurate, tert-carbonate, 3,3 ', 4,4'- Tetra- (t-butylperoxycarbonyl) benzophenone, 3,3 ', 4,4'-tetra- (t-hexylperoxycarbonyl) benzophenone, 3,3', 4,4'-tetra- (p-isopropylcumylperoxycarbonyl) benzophenone, carbonyldi (t-butylperoxy dihydrogen phthalate), carbonyldi (t-hexylperoxy dihydrogen phthalate), and the like.
아조 화합물로서는 예를 들면, 일본특허공개 평8-108621호 공보에 기재된 아 조 화합물 등을 들 수 있다.As an azo compound, the azo compound etc. of Unexamined-Japanese-Patent No. 8-108621 are mentioned, for example.
쿠마린 화합물로서는 예를 들면, 3-메틸-5-아미노-((s-트리아진-2-일)아미노)-3-페닐쿠마린, 3-클로로-5-디에틸아미노-((s-트리아진-2-일)아미노)-3-페닐쿠마린, 3-부틸-5-디메틸아미노-((s-트리아진-2-일)아미노)-3-페닐쿠마린 등을 들 수 있다.Examples of the coumarin compound include 3-methyl-5-amino-((s-triazin-2-yl) amino) -3-phenylcoumarin and 3-chloro-5-diethylamino-((s-triazine 2-yl) amino) -3-phenylcoumarin, 3-butyl-5-dimethylamino-((s-triazin-2-yl) amino) -3-phenylcoumarin, etc. are mentioned.
아지드 화합물로서는 미국특허 제2848328호 명세서, 미국특허 제2852379호 명세서 및 미국특허 제2940853호 명세서에 기재된 유기 아지드 화합물, 2,6-비스(4-아지드벤질리덴)-4-에틸시클로헥사논(BAC-E) 등이 열거된다.Examples of the azide compound include the organic azide compounds described in US Patent No. 2848328, US Patent No. 2852379, and US Patent No. 2940853, and 2,6-bis (4-azidebenzylidene) -4-ethylcyclohexa Rice (BAC-E) and the like.
메탈로센 화합물로서는 일본특허공개 소59-152396호 공보, 일본특허공개 소61-151197호 공보, 일본특허공개 소63-41484호 공보, 일본특허공개 평2-249호 공보, 일본특허공개 평2-4705호 공보, 일본특허공개 평5-83588호 공보 기재의 여러가지의 티타노센 화합물, 예를 들면, 디-시클로펜타디에닐-Ti-비스-페닐, 디-시클로펜타디에닐-Ti-비스-2,6-디플루오로페니-1-일, 디-시클로펜타디에닐-Ti-비스-2,4-디-플루오로페니-1-일, 디-시클로펜타디에닐-Ti-비스-2,4,6-트리플루오로페니-1-일, 디-시클로펜타디에닐-Ti-비스-2,3,5,6-테트라플루오로페니-1-일, 디-시클로펜타디에닐-Ti-비스-2,3,4,5,6-펜타플루오로페니-1-일, 디-메틸시클로펜타디에닐-Ti-비스-2,6-디플루오로페니-1-일, 디-메틸시클로펜타디에닐-Ti-비스-2,4,6-트리플루오로페니-1-일, 디-메틸시클로펜타디에닐-Ti-비스-2, 3,5,6-테트라플루오로페니-1-일, 디-메틸시클로펜타디에닐-Ti-비스-2,3,4,5,6-펜타플루오로페니-1-일, 일본특허공개 평1-304453호 공보, 일본특허공개 평1-152109호 공보 기재의 철-아레인 착체 등이 열거된다.As a metallocene compound, Unexamined-Japanese-Patent No. 59-152396, Unexamined-Japanese-Patent No. 61-151197, Unexamined-Japanese-Patent No. 63-41484, Unexamined-Japanese-Patent No. 2-249, Unexamined-Japanese-Patent No. 2 Various titanocene compounds disclosed in JP-A-4705 and JP-A-5-83588, for example, di-cyclopentadienyl-Ti-bis-phenyl, di-cyclopentadienyl-Ti-bis- 2,6-difluoropheni-1-yl, di-cyclopentadienyl-Ti-bis-2,4-di-fluorophenni-1-yl, di-cyclopentadienyl-Ti-bis-2 , 4,6-trifluoropheni-1-yl, di-cyclopentadienyl-Ti-bis-2,3,5,6-tetrafluoropheni-1-yl, di-cyclopentadienyl-Ti -Bis-2,3,4,5,6-pentafluoropheni-1-yl, di-methylcyclopentadienyl-Ti-bis-2,6-difluoropheni-1-yl, di-methyl Cyclopentadienyl-Ti-bis-2,4,6-trifluoropheni-1-yl, di-methylcyclopentadienyl-Ti-bis-2, 3,5,6-tetra Fluoropheni-1-yl, di-methylcyclopentadienyl-Ti-bis-2,3,4,5,6-pentafluoropheni-1-yl, Japanese Patent Laid-Open No. 1-304453, Japan The iron-alein complexes of Unexamined-Japanese-Patent No. 1-52109 are mentioned.
헥사아릴비이미다졸 화합물로서는 예를 들면, 일본특허공고 평6-29285호 공보, 미국특허 제3,479,185호, 동 제4,311,783호, 동 제4,622,286호 등의 각 명세서에 기재된 각종 화합물, 구체적으로는 2,2'-비스(o-클로로페닐)-4,4',5,5'-테트라페닐비이미다졸, 2,2'-비스(o-브로모페닐))4,4',5,5'-테트라페닐비이미다졸, 2,2'-비스(o,p-디클로로페닐)-4,4',5,5'-테트라페닐비이미다졸, 2,2'-비스(o-클로로페닐)-4,4',5,5'-테트라(m-메톡시페닐)비이미다졸, 2,2'-비스(o,o'-디클로로페닐)-4,4',5,5'-테트라페닐비이미다졸, 2,2'-비스(o-니트로페닐)-4,4',5,5'-테트라페닐비이미다졸, 2,2'-비스(o-메틸페닐)-4,4',5,5'-테트라페닐비이미다졸, 2,2'-비스(o-트리플루오로페닐)-4,4',5,5'-테트라페닐비이미다졸 등이 열거된다.As a hexaaryl biimidazole compound, the various compounds described in each specification, such as Unexamined-Japanese-Patent No. 6-29285, US Patent 3,479,185, 4,311,783, 4,622,286, specifically, 2, 2'-bis (o-chlorophenyl) -4,4 ', 5,5'-tetraphenylbiimidazole, 2,2'-bis (o-bromophenyl)) 4,4', 5,5 ' -Tetraphenylbiimidazole, 2,2'-bis (o, p-dichlorophenyl) -4,4 ', 5,5'-tetraphenylbiimidazole, 2,2'-bis (o-chlorophenyl) -4,4 ', 5,5'-tetra (m-methoxyphenyl) biimidazole, 2,2'-bis (o, o'-dichlorophenyl) -4,4', 5,5'-tetra Phenylbiimidazole, 2,2'-bis (o-nitrophenyl) -4,4 ', 5,5'-tetraphenylbiimidazole, 2,2'-bis (o-methylphenyl) -4,4' , 5,5'-tetraphenylbiimidazole, 2,2'-bis (o-trifluorophenyl) -4,4 ', 5,5'-tetraphenylbiimidazole, etc. are mentioned.
유기 붕산염 화합물로서는 예를 들면, 일본특허공개 소62-143044호, 일본특허공개 소62-150242호, 일본특허공개 평9-188685호, 일본특허공개 평9-188686호, 일본특허공개 평9-188710호, 일본특허공개 2000-131837, 일본특허공개 2002-107916, 일본특허 제2764769호, 일본특허출원 2000-310808호 등의 각 공보, 및 Kunz, Martin "Rad Tech'98. Proceeding April 19-22, 1998, Chicago" 등에 기재되는 유기 붕산염, 일본특허공개 평6-157623호 공보, 일본특허공개 평6-175564호 공보, 일본특허공개 평6-175561호 공보에 기재된 유기 붕소 술포늄 착체 또는 유기 붕소 요오드 술포늄 착체, 일본특허공개 평6-175554호 공보, 일본특허공개 평6-175553호 공보에 기재된 유기 붕소 요오드늄 착체, 일본특허공개 평9-188710호 공보에 기재된 유기 붕소 포스포늄 착체, 일본특허공개 평6-348011호 공보, 일본특허 공개 평7-128785호 공보, 일본특허공개 평7-140589호 공보, 일본특허공개 평7-306527호 공보, 일본특허공개 평7-292014호 공보 등의 유기 붕소 천이금속 배위착체 등이 구체예로서 열거된다.As the organic borate compound, for example, Japanese Patent Laid-Open No. 62-143044, Japanese Patent Laid-Open No. 62-150242, Japanese Patent Laid-Open No. 9-188685, Japanese Patent Laid-Open No. 9-188686, and Japanese Patent Laid-Open No. 9- 188710, Japanese Patent Laid-Open No. 2000-131837, Japanese Patent Laid-Open No. 2002-107916, Japanese Patent No. 2764769, Japanese Patent Application No. 2000-310808, etc., and Kunz, Martin "Rad Tech'98. Proceeding April 19-22 , An organic boron sulfonium complex or organic boron described in Japanese Patent Application Laid-Open No. 6-157623, Japanese Patent Application Laid-Open No. 6-175564, Japanese Patent Application Laid-Open No. 6-175561, etc. Iodine sulfonium complex, organoboron iodonium complex described in JP-A-6-175554, JP-A-6-175553, organoboron phosphonium complex described in JP-A-9-188710, Japan Japanese Patent Laid-Open No. 6-348011, Japanese Patent Laid-Open No. 7-128785 , And Japanese Patent Publication No. Hei 7-140589 discloses, in Japanese Patent Publication No. Hei 7-306527 discloses, in Japanese Patent Publication No. 7-292014 discloses the like of the organic boron transition metal coordination complexes are exemplified as specific examples.
디술폰 화합물로서는 일본특허공개 소61-166544호 공보, 일본특허출원 2001-132318호 명세서 등에 기재되는 화합물 등이 열거된다.As a disulfone compound, the compound etc. which are described in Unexamined-Japanese-Patent No. 61-166544, the specification of Unexamined-Japanese-Patent No. 2001-132318, etc. are mentioned.
옥심 에스테르 화합물로서는 J.C.S. Perkin II(1979)1653-1660), J.C.S. Perkin II(1979)156-162, Journal of Photopolymer Science and Technology(1995) 202-232, 일본특허공개 2000-66385호 공보 기재의 화합물, 일본특허공개 2000-80068호 공보, 일본특허공표 2004-534797호 공보 기재의 화합물 등이 열거된다. 구체예로서는 Chiba Specialty Chemicals K.K. 제작의 일가큐어 OXE-01, OXE-02 등이 바람직하다.As an oxime ester compound, it is J.C.S. Perkin II (1979) 1653-1660), J.C.S. Perkin II (1979) 156-162, Journal of Photopolymer Science and Technology (1995) 202-232, Japanese Patent Laid-Open No. 2000-66385, Japanese Patent Laid-Open No. 2000-80068, Japanese Patent Laid-Open No. 2004-534797 The compound of the publication, etc. are mentioned. Specific examples thereof include Chiba Specialty Chemicals K.K. Production monovalent OXE-01, OXE-02, etc. are preferable.
오늄염 화합물로서는 예를 들면, S.I.Schlesinger, Photogr.Sci.Eng., 18, 387(1974), T.S.Bal et al, Polymer, 21, 423(1980)에 기재된 디아조늄염, 미국특허 제4,069,055호 명세서, 일본특허공개 평4-365049호 등에 기재된 암모늄염, 미국특허 제4,069,055호, 동 4,069,056호의 각 명세서에 기재된 포스포늄염, 유럽특허 제104,143호, 미국특허 제339,049호, 동 제410,201호의 각 명세서, 일본특허공개 평2-150848호, 일본특허공개 평2-296514호의 각 공보에 기재된 요오드늄염 등이 열거된다.As an onium salt compound, for example, the diazonium salt described in SISchlesinger, Photogr. Sci. Eng., 18, 387 (1974), TSBal et al, Polymer, 21, 423 (1980), US Pat. No. 4,069,055 , Ammonium salts described in Japanese Patent Application Laid-Open No. 4-365049 and the like, phosphonium salts described in the US Patent Nos. 4,069,055 and 4,069,056, European Patents 104,143, US Patents 339,049, and 410,201, respectively The iodonium salt etc. which were described in each of Unexamined-Japanese-Patent No. 2-150848 and Unexamined-Japanese-Patent No. 2-296514 are mentioned.
본 발명에 바람직하게 사용할 수 있는 요오드늄염은 디아릴요오드늄염이고, 안정성의 관점으로부터, 알킬기, 알콕시기, 아릴옥시기 등의 전자 공급성기로 2개 이상 치환되어 있는 것이 바람직하다. 또한, 그 밖의 바람직한 술포늄염의 형태로서, 트리아릴술포늄염의 1개의 치환기가 쿠마린, 안트라퀴논 구조를 갖고, 300nm 이상으로 흡수를 갖는 요오드늄염 등이 바람직하다.The iodonium salt which can be preferably used in the present invention is a diaryl iodonium salt, and from the viewpoint of stability, it is preferable that two or more of the iodonium salts are substituted with an electron-supply group such as an alkyl group, an alkoxy group or an aryloxy group. Moreover, as a form of another preferable sulfonium salt, the iodonium salt etc. which one substituent of a triarylsulfonium salt has a coumarin and anthraquinone structure, and has absorption in 300 nm or more are preferable.
본 발명에 바람직하게 사용할 수 있는 술포늄염으로서는 유럽특허 제370,693호, 동 390,214호, 동 233,567호, 동 297,443호, 동 297,442호, 미국특허 제4,933,377호, 동 161,811호, 동 410,201호, 동 339,049호, 동 4,760,013호, 동 4,734,444호, 동 2,833,827호, 독일국 특허 제2,904,626호, 동 3,604,580호, 동 3,604,581호의 각 명세서에 기재된 술포늄염이 열거되고, 안정성의 감도점으로부터 바람직하게는 전자 흡인성기로 치환되어 있는 것이 바람직하다. 전자 흡인성기로서는 하멧값이 0보다 큰 것이 바람직하다. 바람직한 전자 흡인성기로서는 할로겐 원자, 카르복실산 등이 열거된다.The sulfonium salts that can be preferably used in the present invention include European Patent Nos. 370,693, 390,214, 233,567, 297,443, 297,442, 4,933,377, 161,811, 410,201, 339,049 4,760,013, 4,734,444, 2,833,827, German Patent Nos. 2,904,626, 3,604,580, 3,604,581, and the sulfonium salts described in the specifications, and are preferably substituted with electron withdrawing groups from the sensitivity point of stability. It is preferable that it is done. As an electron withdrawing group, a thing with a Hammett value larger than zero is preferable. Preferred electron withdrawing groups include halogen atoms, carboxylic acids and the like.
또한, 그 밖의 바람직한 술포늄염으로서는 트리아릴술포늄염의 1개의 치환기가 쿠마린, 안트라퀴논 구조를 갖고, 300nm이상에서 흡수를 갖는 술포늄염이 열거된다. 다른 바람직한 술포늄염으로서는 트리아릴술포늄염이 알릴옥시기, 아릴티오기를 치환기로 갖는 300nm이상에서 흡수를 갖는 술포늄염이 열거된다.Moreover, as another preferable sulfonium salt, the sulfonium salt in which one substituent of a triarylsulfonium salt has a coumarin and anthraquinone structure, and has absorption in 300 nm or more is mentioned. As another preferable sulfonium salt, the sulfonium salt which has absorption in 300 nm or more in which a triaryl sulfonium salt has an allyloxy group and an arylthio group as a substituent is mentioned.
또한, 오늄염 화합물로서는 J.V.Crivello et al, Macromolecules, 10(6), 1307(1977), J.V.Crivello et al, J.Polymer Sci., Polymer Chem.Ed., 17, 1047(1979)에 기재된 셀레노늄염, C.S.Wen et al, Teh, Proc.Conf.Rad.Curing ASIA, p478 Tokyo, Oct(1988)에 기재된 아르소늄염 등의 오늄염 등이 열거된다.Moreover, as an onium salt compound, the selenoids described in JVCrivello et al, Macromolecules, 10 (6), 1307 (1977), JVCrivello et al, J. Polymer Sci., Polymer Chem. Ed., 17, 1047 (1979). Onium salts, such as an nium salt, an arsonium salt as described in CSWen et al, Teh, Proc. Conf. Rad. Curing ASIA, p478 Tokyo, Oct (1988), etc. are mentioned.
아실포스핀(옥시드) 화합물로서는 Chiba Specialty Chemicals K.K. 제작의 일가큐어 819, 다로큐어 4265, 다로큐어 TPO 등이 열거된다.As the acylphosphine (oxide) compound, Chiba Specialty Chemicals K.K. Production of monocure 819, Tarocure 4265, Tarocure TPO, and the like.
본 발명에 사용되는 (D) 광중합 개시제로서는 노광 감도의 관점으로부터, 트리할로메틸트리아진계 화합물, 벤질디메틸케탈 화합물, α-히드록시케톤 화합물, α-아미노케톤 화합물, 아실포스핀계 화합물, 포스핀옥시드계 화합물, 메탈로센 화합물, 옥심계 화합물, 트리아릴이미다졸 다이머, 오늄계 화합물, 벤조티아졸계 화합물, 벤조페논계 화합물, 아세토페논계 화합물 및 그 유도체, 시클로펜타디엔-벤젠-철 착체 및 그 염, 할로메틸옥사디아졸 화합물, 3-아릴치환 쿠마린 화합물로 이루어지는 군에서 선택되는 화합물이 바람직하다.As (D) photoinitiator used for this invention, from a viewpoint of exposure sensitivity, a trihalomethyl triazine type compound, the benzyl dimethyl ketal compound, the (alpha)-hydroxy ketone compound, the (alpha)-amino ketone compound, the acyl phosphine type compound, and a phosphine jade Seed compound, metallocene compound, oxime compound, triarylimidazole dimer, onium compound, benzothiazole compound, benzophenone compound, acetophenone compound and derivatives thereof, cyclopentadiene-benzene-iron complex And a salt, a halomethyloxadiazole compound, or a compound selected from the group consisting of a 3-aryl substituted coumarin compound is preferable.
더욱 바람직하게는 트리할로메틸트리아진계 화합물, α-아미노케톤 화합물, 아실포스핀계 화합물, 포스핀옥시드계 화합물, 옥심계 화합물, 트리아릴이미다졸 다이머, 오늄계 화합물, 벤조페논계 화합물, 아세토페논계 화합물이고, 트리할로메틸트리아진계 화합물, α-아미노케톤 화합물, 옥심계 화합물, 트리아릴이미다졸다이머, 벤조페논계 화합물로 이루어지는 군에서 선택되는 적어도 1종의 화합물이 가장 바람직하다.More preferably, trihalomethyl triazine compound, α-amino ketone compound, acyl phosphine compound, phosphine oxide compound, oxime compound, triarylimidazole dimer, onium compound, benzophenone compound, aceto It is a phenone type compound, At least 1 sort (s) of compound chosen from the group which consists of a trihalomethyl triazine compound, the (alpha)-amino ketone compound, an oxime type compound, a triaryl imidazole dimer, and a benzophenone type compound is the most preferable.
본 발명의 경화성 조성물에 함유되는 (D) 광중합 개시제의 함유량은 경화성 조성물의 전체 고형분에 대하여 0.1∼50질량%인 것이 바람직하고, 보다 바람직하게는 0.5∼30질량%, 특히 바람직하게는 1∼20질량%이다. 이 범위에서, 양호한 감도와 패턴형성성이 얻어진다.It is preferable that content of the (D) photoinitiator contained in the curable composition of this invention is 0.1-50 mass% with respect to the total solid of a curable composition, More preferably, it is 0.5-30 mass%, Especially preferably, it is 1-20. Mass%. In this range, good sensitivity and pattern formability are obtained.
<(E) 용제><(E) solvent>
본 발명의 착색 화소 형성용 경화성 조성물은 일반적으로 용제를 이용하여 조제할 수 있다.Generally the curable composition for colored pixel formation of this invention can be prepared using a solvent.
용제로서는 에스테르류, 예를 들면 아세트산 에틸, 아세트산-n-부틸, 아세트산 이소부틸, 포름산 아밀, 아세트산 이소아밀, 아세트산 이소부틸, 프로피온산 부틸, 부티르산 이소프로필, 부티르산 에틸, 부티르산 부틸, 알킬에스테르류, 락트산 메틸, 락트산 에틸, 옥시아세트산 메틸, 옥시아세트산 에틸, 옥시아세트산 부틸, 메톡시아세트산 메틸, 메톡시아세트산 에틸, 메톡시아세트산 부틸, 에톡시아세트산 메틸, 에톡시아세트산 에틸, 및 3-옥시프로피온산 메틸, 3-옥시프로피온산 에틸 등의 3-옥시프로피온산 알킬에스테르류(예를 들면, 3-메톡시프로피온산 메틸, 3-메톡시프로피온산 에틸, 3-에톡시프로피온산 메틸, 3-에톡시프로피온산 에틸 등), 2-옥시프로피온산 메틸, 2-옥시프로피온산 에틸, 2-옥시프로피온산 프로필 등의 2-옥시프로피온산 알킬에스테르류(예를 들면, 2-메톡시프로피온산 메틸, 2-메톡시프로피온산 에틸, 2-메톡시프로피온산 프로필, 2-에톡시프로피온산 메틸, 2-에톡시프로피온산 에틸, 2-옥시-2-메틸프로피온산 메틸, 2-옥시-2-메틸프로피온산 에틸, 2-메톡시-2-메틸프로피온산 메틸, 2-에톡시-2-메틸프로피온산 에틸 등), 및 피루브산 메틸, 피루브산 에틸, 피루브산 프로필, 아세트아세트산 메틸, 아세트아세트산 에틸, 2-옥소부탄산 메틸, 2-옥소부탄산 에틸, 1,3-부탄디올디아세테이트 등;Examples of the solvent include esters such as ethyl acetate, n-butyl acetate, isobutyl acetate, amyl formate, isoamyl acetate, isobutyl acetate, butyl propionate, isopropyl butyrate, ethyl butyrate, butyl butyrate, alkyl esters, and lactic acid Methyl, ethyl lactate, methyl oxyacetic acid, ethyl oxyacetic acid, butyl oxyacetate, methoxyacetic acid methyl, methoxyacetic acid ethyl, methoxyacetic acid butyl, ethoxyacetic acid methyl, ethoxyacetic acid ethyl, and 3-oxypropionate methyl, 3 3-oxypropionic acid alkyl esters such as ethyl oxypropionate (for example, 3-methoxypropionate methyl, 3-methoxypropionate ethyl, 3-ethoxypropionate methyl, 3-ethoxypropionate, etc.), 2- 2-oxypropionate alkyl esters such as methyl oxypropionate, ethyl 2-oxypropionate and propyl 2-oxypropionate Leu (eg, methyl 2-methoxypropionate, ethyl 2-methoxypropionate, propyl 2-methoxypropionate, methyl 2-ethoxypropionate, ethyl 2-ethoxypropionate, methyl 2-oxy-2-methylpropionate) , Ethyl 2-oxy-2-methylpropionate, methyl 2-methoxy-2-methylpropionate, ethyl 2-ethoxy-2-methylpropionate, and the like), and methyl pyruvate, ethyl pyruvate, propyl pyruvate, methyl acetic acid, acet Ethyl acetate, methyl 2-oxobutanoate, ethyl 2-oxobutanoate, 1,3-butanediol diacetate and the like;
에테르류, 예를 들면 디에틸렌글리콜디메틸에테르, 테트라히드로푸란, 에틸렌글리콜모노메틸에테르, 에틸렌글리콜모노에틸에테르, 메틸셀로솔브아세테이트, 에틸셀로솔브아세테이트, 디에틸렌글리콜모노메틸에테르, 디에틸렌글리콜모노에틸에테르, 디에틸렌글리콜모노부틸에테르, 프로필렌글리콜메틸에테르아세테이트, 프 로필렌글리콜에틸에테르아세테이트, 프로필렌글리콜프로필에테르아세테이트, 디에틸렌글리콜디에틸에테르, 디에틸렌글리콜모노에틸에테르아세테이트, 디에틸렌글리콜모노부틸에테르, 디에틸렌글리콜모노부틸에테르아세테이트, 프로필렌글리콜 n-프로필에테르아세테이트, 프로필렌글리콜디아세테이트, 프로필렌글리콜 n-부틸에테르 아세테이트, 프로필렌글리콜페닐에테르, 프로필렌글리콜페닐에테르아세테이트, 디프로필렌글리콜모노메틸에테르아세테이트, 디프로필렌글리콜 n-프로필에테르아세테이트, 디프로필렌글리콜 n-부틸에테르아세테이트, 트리프로필렌글리콜모노 n-부틸에테르, 트리프로필렌글리콜메틸에테르아세테이트 등;Ethers such as diethylene glycol dimethyl ether, tetrahydrofuran, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, methyl cellosolve acetate, ethyl cellosolve acetate, diethylene glycol monomethyl ether, diethylene glycol Monoethyl ether, diethylene glycol monobutyl ether, propylene glycol methyl ether acetate, propylene glycol ethyl ether acetate, propylene glycol propyl ether acetate, diethylene glycol diethyl ether, diethylene glycol monoethyl ether acetate, diethylene glycol mono Butyl ether, diethylene glycol monobutyl ether acetate, propylene glycol n-propyl ether acetate, propylene glycol diacetate, propylene glycol n-butyl ether acetate, propylene glycol phenyl ether, propylene glycol phenyl ether acetate, deep Propylene glycol monomethyl ether acetate, dipropylene glycol n- propyl ether acetate, dipropylene glycol n- butyl ether acetate, tripropylene glycol n- butyl ether, tripropylene glycol methyl ether acetate and the like;
케톤류, 예를 들면 아세톤, 메틸에틸케톤, 시클로헥사논, 2-헵타논, 3-헵타논 등;Ketones such as acetone, methyl ethyl ketone, cyclohexanone, 2-heptanone, 3-heptanone and the like;
알콜류, 예를 들면 에탄올, 이소프로필알콜, 프로필렌글리콜메틸에테르, 프로필렌글리콜 모노 n-프로필 에테르, 프로필렌글리콜 모노 n-부틸에테르,Alcohols such as ethanol, isopropyl alcohol, propylene glycol methyl ether, propylene glycol mono n-propyl ether, propylene glycol mono n-butyl ether,
방향족 탄화수소류, 예를 들면 톨루엔, 크실렌 등이 열거된다.Aromatic hydrocarbons such as toluene, xylene and the like.
이들 중 3-에톡시프로피온산 메틸, 3-에톡시프로피온산 에틸, 에틸셀로솔브아세테이트, 락트산 에틸, 디에틸렌글리콜디메틸에테르, 아세트산 부틸, 3-메톡시프로피온산 메틸, 2-헵타논, 시클로헥사논, 에틸카르비톨아세테이트, 부틸카르비톨아세테이트, 프로필렌글리콜메틸에테르, 프로필렌글리콜메틸에테르아세테이트, 프로필렌글리콜에틸에테르아세테이트 등이 바람직하다.Of these, 3-ethoxypropionate methyl, 3-ethoxypropionate ethyl, ethyl cellosolve acetate, ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, 2-heptanone, cyclohexanone, Ethyl carbitol acetate, butyl carbitol acetate, propylene glycol methyl ether, propylene glycol methyl ether acetate, propylene glycol ethyl ether acetate and the like are preferable.
용제는 단독으로 사용하는 것 이외에 2종 이상을 조합시켜서 사용해도 좋다.You may use a solvent in combination of 2 or more type other than using independently.
[차광부 및 차광부 형성용 경화성 조성물][Curable Compositions for Shading the Shading Part and Shading Part]
다음에, 본 발명의 컬러 필터에 있어서의 차광부(블랙 매트릭스)에 관하여 설명한다.Next, the light shielding part (black matrix) in the color filter of this invention is demonstrated.
차광부는 광학 농도(OD값)가 4.5이상 8.0이하로 하는 것이 바람직하고, 4.8이상 더욱 바람직하게는 5.0∼7.0이라고 하는 것이 보다 바람직하다. 광학 농도가 4.5미만이면, 콘트라스트 저하 등 표시 장치의 표시 품위가 저하한다. 또한, 여기서 말하는 광학 농도란 실시예 기재의 방법으로 측정한 광학 농도(OD값)을 말한다.The light shielding portion preferably has an optical density (OD value) of 4.5 or more and 8.0 or less, and more preferably 4.8 or more, and more preferably 5.0 to 7.0. If the optical density is less than 4.5, the display quality of the display device such as contrast decreases. In addition, the optical density here means the optical density (OD value) measured by the method of Example description.
또한, 차광부는 폭 5∼15㎛인 것이 고개구율화에 의한 명도 확보의 관점으로부터 바람직하다. 차광부의 두께는 0.2∼1.5㎛, 보다 바람직하게는 0.3∼1.0㎛이며, 더욱 바람직하게는 0.3∼0.8㎛의 범위이다. 이 두께의 범위에 있어서, 차광부를 설치한 기판의 요철, 즉 차광부의 형성 영역, 비형성 영역의 단차가 적절하게 유지되어, 차광부 형성 후에 BRG의 착색 화소를 이 상에 형성할 때에도 높은 정밀도로 화소의 형성을 행할 수 있다.In addition, it is preferable that a light shielding part is 5-15 micrometers in width from a viewpoint of ensuring the brightness by high aperture ratio. The thickness of a light shielding part is 0.2-1.5 micrometers, More preferably, it is 0.3-1.0 micrometer, More preferably, it is the range of 0.3-0.8 micrometer. Within this thickness range, irregularities of the substrate on which the light shielding portion is provided, that is, the step difference between the formation region and the non-forming region of the light shielding portion are appropriately maintained, and high accuracy is achieved even when a colored pixel of BRG is formed thereon after the light shielding portion is formed. Pixel can be formed.
[차광부 형성용 경화성 조성물]Curable Composition For Shading Part Formation
본 발명의 컬러 필터에 있어서의 차광부는 (A-2) 차광제, (B) 고분자 분산제, (C) 중합성 화합물, (D) 중합 개시제 및 (E) 용제를 함유하고, 차광제로서 카본 블랙을 고형분 환산으로 40∼80질량%, 또는 금속계 미립자를 50∼90질량% 함유하는 컬러 필터 차광부 형성용 경화성 조성물에 의해 형성된다.The light shielding part in the color filter of this invention contains (A-2) light-shielding agent, (B) polymer dispersing agent, (C) polymeric compound, (D) polymerization initiator, and (E) solvent, and it is carbon black as a light-shielding agent It is formed with the curable composition for color filter light-shielding part formation which contains 40-80 mass% or 50-90 mass% of metal type microparticles | fine-particles in conversion of solid content.
<(A-2) 차광제><(A-2) Shading Agent>
여기서, (A-2) 차광제로서는 카본 블랙, 티타늄 블랙, 금속 미립자, 금속 산화물, 황화물의 미립자 등이 바람직하게 열거된다.Here, as the light-shielding agent (A-2), carbon black, titanium black, metal fine particles, metal oxides, sulfide fine particles and the like are preferably listed.
이들은 필요에 따라서, 단독 또는 복수종 조합하여 사용된다. 예를 들면, 카본 블랙 단독, 금속 미립자 단독, 양자의 조합, 또는 이들에 다른 착색 안료나 티타늄 카본을 더 병용하는 형태 등이 열거된다.These are used individually or in combination of multiple types as needed. For example, carbon black alone, metal microparticles | fine-particles, a combination of both, or the form which uses another coloring pigment and titanium carbon further together are mentioned.
차광용의 재료로서는 종래부터 흑색 착색제로서, 가시광선 영역을 차폐하는 안료가 적어도 2종이상 병용해서 사용되어 왔다. 이들의 안료로서는 일본특허공개 2005-17716호 공보[0038]∼[0040]나 일본특허공개 2005-17521호 공보[0080]∼[0088]에 기재된 안료를 들 수 있고, 이들의 안료를 사용한 차광층의 형성은 일본특허공개 평 7-271020 등에 개시되어 있다. 그러나, 안료를 차광층에 사용했을 경우는 충분한 차폐성을 얻을 수 없었다.As a material for light shielding, at least 2 or more types of pigments which shield the visible light region have been used in combination as a black colorant in the past. As these pigments, the pigments of Unexamined-Japanese-Patent No. 2005-17716 [0038]-[0040], and the Unexamined-Japanese-Patent No. 2005-17521-[0080]-[0088] are mentioned, The light-shielding layer using these pigments is mentioned. The formation of is disclosed in Japanese Patent Laid-Open No. 7-271020 and the like. However, when the pigment was used for the light shielding layer, sufficient shielding was not obtained.
차광 효과를 크게 하기 위해서 일본특허공개 2000-147240, 일본특허공개 2000-143985, 일본특허공개 2005-338328, 일본특허공개 2006-154849 등에서는 카본 블랙, 티타늄 블랙, 또는 흑연 등이 차광 재료의 바람직한 것으로서 개발되어 왔다. 본 발명에 있어서는 차광성이나 코스트의 관점으로부터, 카본 블랙은 차광 재료의 하나로서 바람직한 것이다.In order to increase the light shielding effect, in Japanese Patent Application Laid-Open No. 2000-147240, Japanese Patent Application Laid-Open 2000-143985, Japanese Patent Application Laid-Open 2005-338328, Japanese Patent Application Laid-Open 2006-154849 and the like, carbon black, titanium black, graphite, and the like are preferred as light-shielding materials. Has been developed. In the present invention, carbon black is preferred as one of the light shielding materials from the viewpoint of light shielding properties and cost.
카본 블랙의 예로서는 피그먼트 블랙 7(카본 블랙)이 바람직하다. 카본 블랙으로서는 예를 들면, Mitsubishi Chemicals Corporation 제작의 카본 블랙#2400, #2350, #2300, #2200, #1000, #980, #970, #960, #950, #900, #850, MCF88, #650, MA600, MA7, MA8, MA11, MA100, MA220, IL30B, IL31B, IL7B, IL11B, IL52B, #4000, #4010, #55, #52, #50, #47, #45, #44, #40, #33, #32, #30, #20, #10, #5, CF9, #3050, #3150, #3250, #3750, #3950, 다이아몬드 블랙A, 다이아몬드 블랙N220M, 다 이아몬드 블랙N234, 다이아몬드 블랙I, 다이아몬드 블랙LI, 다이아몬드 블랙II, 다이아몬드 블랙N339, 다이아몬드 블랙SH, 다이아몬드 블랙SHA, 다이아몬드 블랙LH, 다이아몬드 블랙H, 다이아몬드 블랙HA, 다이아몬드 블랙SF, 다이아몬드 블랙N550M, 다이아몬드 블랙E, 다이아몬드 블랙G, 다이아몬드 블랙R, 다이아몬드 블랙N760M, 다이아몬드 블랙LP; Degussa사 제작의 카본 블랙 Color Black FW200, Color Black FW2, Color Black FW1, Color Black FW18, Color Black S170, Color Black S160, Special Black 6, Special Black 5, Special Black 4, Special Black 4A, Printex U, Printex V, Printex 140U, Printex 140V; Cabot사 제작의 카본 블랙 REGAL 400, REGAL 400R, REGAL XC72, VULCAN XC72R, MOGUL L, MONARCH 1400, MONARCH 1000, 블랙 PEARLS1400; Asahi Carbon Co., Ltd. 제작의 카본 블랙 SUNBLACK 900, 동 910, 동 930, 동 960, 동 970 등을 들 수 있다. 또한, 전기 저항을 크게 하기 위해서 이들을 고분자 화합물로 피복한 것도 바람직한 것이다. 이들의 카본 블랙의 바람직한 단일 입자의 크기는 10∼100nm, 보다 바람직하게는 10∼50nm이다.As an example of carbon black, pigment black 7 (carbon black) is preferable. As carbon black, carbon black # 2400, # 2350, # 2300, # 2200, # 1000, # 980, # 970, # 960, # 950, # 900, # 850, MCF88, # made by Mitsubishi Chemicals Corporation 650, MA600, MA7, MA8, MA11, MA100, MA220, IL30B, IL31B, IL7B, IL11B, IL52B, # 4000, # 4010, # 55, # 52, # 50, # 47, # 45, # 44, # 40 , # 33, # 32, # 30, # 20, # 10, # 5, CF9, # 3050, # 3150, # 3250, # 3750, # 3950, Diamond Black A, Diamond Black N220M, Diamond Black N234, Diamond Black I, Diamond Black LI, Diamond Black II, Diamond Black N339, Diamond Black SH, Diamond Black SHA, Diamond Black LH, Diamond Black H, Diamond Black HA, Diamond Black SF, Diamond Black N550M, Diamond Black E, Diamond Black G, diamond black R, diamond black N760M, diamond black LP; Carbon Black Color Black FW200, Color Black FW2, Color Black FW1, Color Black FW18, Color Black S170, Color Black S160, Special Black 6, Special Black 5, Special Black 4, Special Black 4A, Printex U, Printex V, Printex 140U, Printex 140V; Carbon black REGAL 400, REGAL 400R, REGAL XC72, VULCAN XC72R, MOGUL L, MONARCH 1400, MONARCH 1000, black PEARLS1400 manufactured by Cabot; Asahi Carbon Co., Ltd. Carbon black SUNBLACK 900, copper 910, copper 930, copper 960, copper 970 etc. of the production are mentioned. It is also preferable to coat these with a high molecular compound in order to increase the electrical resistance. The preferred size of single particles of these carbon blacks is 10 to 100 nm, more preferably 10 to 50 nm.
티타늄 블랙의 예로서는 TiO2, TiO, TiN이나 이들의 혼합물이 바람직하다. 시판품으로서, Mitsubishi Material Corporation 제작(상품명) 12S나 13M이 열거된다. 티타늄 블랙의 평균 입자 지름은 10∼100nm가 바람직하다.As an example of titanium black, TiO 2 , TiO, TiN or a mixture thereof is preferable. As a commercial item, Mitsubishi Material Corporation make (brand name) 12S and 13M are mentioned. As for the average particle diameter of titanium black, 10-100 nm is preferable.
흑연의 예로서는 컬러 필터용의 차광 재료로서는 장경이 1㎛이하의 흑연을 사용함으로써 차광 패턴의 윤곽 형상이 균일해지고, 샤프니스(sharpness)가 양호해진다. 20nm이상 500nm이하가 더욱 바람직하다. 또한 100nm이하의 입자지름을 갖는 입자의 존재 비율이 70%이상인 것이 바람직하다.As an example of graphite, by using graphite having a long diameter of 1 µm or less as the light shielding material for color filters, the contour shape of the light shielding pattern becomes uniform and the sharpness is good. 20 nm or more and 500 nm or less are more preferable. Moreover, it is preferable that the existence ratio of the particle | grains which have a particle diameter of 100 nm or less is 70% or more.
상술의 티타늄 블랙도 금속계 미립자이지만, 더욱 높은 차광성을 얻는 것으로서, 일본특허공개 2005-17322, 일본특허공개 2005-179632, 일본특허공개 2005-263920 등에 은 등의 금속입자 또는 금속을 갖는 입자(이하,「금속계 미립자」라고 하는 경우가 있다.)가 개발되어 있다.The above-mentioned titanium black is also metal fine particles, but as a result of obtaining higher light shielding properties, particles having metals or metals such as silver or the like (hereinafter referred to as JP 2005-17322, JP 2005-179632, JP 2005-263920, etc.) And "metal-based fine particles" may be developed.
이들의 금속계 미립자를 구성하는 바람직한 금속의 예로서는 구리, 은, 금, 백금, 팔라듐, 니켈, 주석, 코발트, 로듐, 이리듐, 철, 칼슘, 루테늄, 오스뮴, 망간, 몰리브덴, 텅스텐, 니오브, 탄탈, 비스무트, 안티몬, 및 이들의 합금에서 선택되는 적어도 1종을 들 수 있다. 더욱 바람직한 금속은 구리, 은, 금, 백금, 팔라듐, 주석, 칼슘, 및 이들의 합금에서 선택되는 적어도 1종이며, 특히 바람직한 금속은 구리, 은, 금, 백금, 주석 및 이들의 합금에서 선택되는 적어도 1종이며, 금속 이외의 다른 원소와의 화합물도 바람직한 것이다. 금속과 다른 원소의 화합물로서는 금속의 산화물, 황화물, 황산염, 탄산염 등이 열거되고, 금속 화합물 입자로서는 이들의 입자가 바람직하다. 그 중에서도, 색조나 미립자 형성의 용이성으로부터, 황화물의 입자가 바람직하다. 또한 금속, 그 합금, 및 금속 화합물과는 병용해도 좋고, 2종 이상이어도 좋다. 이들 중에서도 특히 은 또는 그 합금 및 이들의 황화물이 차폐 효과가 높아 바람직한 것이다. 합금의 예로서는 은 주석 합금이 바람직한 예로서 열거된다.Examples of preferred metals constituting these metallic fine particles include copper, silver, gold, platinum, palladium, nickel, tin, cobalt, rhodium, iridium, iron, calcium, ruthenium, osmium, manganese, molybdenum, tungsten, niobium, tantalum, bismuth , Antimony, and at least one selected from these alloys. More preferred metals are at least one selected from copper, silver, gold, platinum, palladium, tin, calcium, and alloys thereof, and particularly preferred metals are selected from copper, silver, gold, platinum, tin and alloys thereof It is at least 1 type, and a compound with other elements other than a metal is also preferable. Examples of the compound of the metal and other elements include oxides of metals, sulfides, sulfates, carbonates, and the like, and as the metal compound particles, these particles are preferable. Especially, the particle | grains of a sulfide are preferable from the ease of color tone and microparticle formation. Moreover, you may use together with a metal, its alloy, and a metal compound, and 2 or more types may be sufficient as it. Among them, silver or alloys thereof and sulfides thereof are particularly preferred because of their high shielding effect. As an example of an alloy, silver tin alloy is listed as a preferable example.
또한, 금속과 금속 화합물이 결합해서 1개 입자가 된 복합 입자도 바람직한 것이고, 예를 들면 입자의 내부와 표면에서 조성이 다른 것, 2종의 입자가 합일된 것 등을 들 수 있다. 구체예로서는 은과 황화은의 복합 미립자, 은과 산화동(II)의 복합 미립자 등이 바람직하다.Moreover, the composite particle which the metal and the metal compound couple | bonded and became one particle is also preferable, For example, the thing from which a composition differs in the inside and the surface of particle | grain, the thing of two types of particle | grains, etc. are mentioned. As a specific example, composite fine particles of silver and silver sulfide, composite fine particles of silver and copper oxide (II), and the like are preferable.
또한, 금속계 미립자는 코어 셸(core shell)형의 복합 입자(코어 셸 입자)라도 좋다. 코어 셸형의 복합 입자(코어 셸 입자)란 코어 재료의 표면을 셸 재료로 코팅한 것이고, 그 구체예로서, 일본특허공개 2006-18210호 공보의 단락번호[0024]∼[0027]에 기재된 코어 셸 미립자가 열거된다.The metal-based fine particles may be core shell composite particles (core shell particles). The core shell type composite particles (core shell particles) are those obtained by coating the surface of a core material with a shell material, and specific examples thereof include core shells described in paragraphs [0024] to [0027] of JP 2006-18210A. Particulates are listed.
이들 금속계 미립자는 흑농도가 높고, 소량으로 또는 박막으로 우수한 차광 성능을 발현할 수 있음과 아울러 높은 열안정성을 가지므로, 흑농도를 손상시키지 않고 고온(예를 들면, 200도 이상)에서의 열처리가 가능해서, 안정적으로 고도의 차광성을 확보할 수 있다. 예를 들면, 고도의 차광성이 요구되어, 일반적으로 베이킹 처리가 실시되는 컬러 필터용의 차광막(소위, 블랙 매트릭스) 등에 바람직하다.Since these metallic fine particles have high black concentration, can exhibit excellent light shielding performance in a small amount or thin film, and have high thermal stability, heat treatment at high temperature (for example, 200 degrees or more) without damaging black concentration It is possible to ensure a high degree of light shielding stably. For example, a high light shielding property is required and it is generally preferable for a light shielding film (so-called black matrix) or the like for a color filter subjected to a baking treatment.
본 발명에 있어서의 금속계 미립자는 시판하는 것을 사용할 수 있는 것 이외에, 금속 이온의 화학적 환원법, 무전해 도금법, 금속의 증발법 등에 의해 조제하는 것이 가능하다. 예를 들면, 막대 형상의 은미립자는 구형 은미립자를 종입자로 하고 그 후에 은염을 더 첨가하고, 세틸트리메틸암모늄브로마이드 등의 계면활성제의 존재 하에서 아스코르브산 등 비교적 환원력의 약한 환원제를 사용함으로써, 은 막대나 와이어가 얻어진다. 이것은 Advanced Materials 2002, 14, 80-82에 기재되어 있다. 또한, 동일한 기재가 Materials Chemistry and Physics 2004, 84, 197-204, Advanced Functional Materials 2004, 14, 183-189에 있다.In addition to the commercially available metal fine particles in the present invention, the metal-based fine particles can be prepared by chemical reduction of metal ions, electroless plating, evaporation of metals, or the like. For example, the rod-shaped silver fine particles are spherical silver fine particles as seed particles, and then silver salt is further added, and a relatively reducing power such as ascorbic acid is used in the presence of a surfactant such as cetyltrimethylammonium bromide, thereby reducing silver. Bars or wires are obtained. This is described in Advanced Materials 2002, 14, 80-82. The same substrate is also found in Materials Chemistry and Physics 2004, 84, 197-204, Advanced Functional Materials 2004, 14, 183-189.
본 발명에 있어서, 금속계 미립자의 수평균 입자지름은 5∼100nm가 바람직하 고, 5∼80nm가 더욱 바람직하고, 5∼50nm가 특히 바람직하다. 입자의 수평균 입자경이 100nm이하이면, 표면 평활성이 양호하고, 또한, 조대 입자에 의한 피쉬 아이도 적어지는 이점이 있다.In the present invention, the number average particle diameter of the metallic fine particles is preferably 5 to 100 nm, more preferably 5 to 80 nm, and particularly preferably 5 to 50 nm. If the number average particle diameter of the particles is 100 nm or less, the surface smoothness is good, and there is an advantage that the fish eye due to the coarse particles is also reduced.
본 발명의 차광부 형성용 경화성 조성물에 있어서의 금속계 미립자의 함유량으로서는 예를 들면, 컬러 필터의 제작시 등, 포스트 베이킹 시에 금속계 미립자 등이 융착하는 것을 방지하는 것을 고려하고, 한편 차광 효과를 생각하면, 형성된 차광부 형성용 경화성 조성물의 전체 고형분에 대하여 50∼90질량% 정도, 바람직하게는 50∼85질량%가 되도록 조절하는 것이 바람직하다.As content of the metal microparticles | fine-particles in the curable composition for light shielding part formation of this invention, considering preventing metal microparticles | fine-particles etc. at the time of post-baking, such as at the time of preparation of a color filter, for example, considers the light-shielding effect If it is lower, it is preferable to adjust so that it may be about 50-90 mass% with respect to the total solid of the curable composition for light shielding part formation formed, Preferably it is 50-85 mass%.
또한, 금속계 미립자의 함유량은 평균 입자 지름에 의한 광학 농도의 변동을 고려해서 행하는 것이 바람직하다. 또한 사용하는 금속계 미립자에 따라서는 색상 보정을 위해서 상기의 안료, 카본 등을 병용할 수도 있다.In addition, it is preferable to perform content of metal type microparticles | fine-particles in consideration of the fluctuation | variation of the optical density by an average particle diameter. In addition, depending on the metallic fine particles to be used, the above-described pigment, carbon and the like may be used in combination for color correction.
본 발명의 차광부 형성용 경화성 조성물에 있어서는 차광부 형성용 경화성 조성물의 전체 고형분 중 차광제로서, 카본 블랙을 40∼80질량% 또는 금속계 미립자를 50∼90질량% 함유하는 것이 바람직하다.In the curable composition for forming a light shielding portion of the present invention, it is preferable to contain 40 to 80 mass% of carbon black or 50 to 90 mass% of metal-based fine particles as the light shielding agent in the total solid of the curable composition for forming a light shielding portion.
<(B) 분산제><(B) Dispersant>
본 발명에 있어서의 금속계 미립자는 안정한 분산 상태로 존재하고 있는 것이 바람직하고, 예를 들면 콜로이드 상태인 것이 보다 바람직하다. 콜로이드 상태의 경우에는 예를 들면, 금속계 미립자가 실질적으로 미립자 상태로 분산되어 있는 것이 바람직하다. 여기서, 실질적으로 분산되어 있다란 1차 입자가 응집 또는 연응집하지 않고 각각 독립적으로 분산되어 있는 상태를 말한다.It is preferable that the metallic microparticles | fine-particles in this invention exist in stable dispersion state, for example, it is more preferable that it is a colloidal state. In the case of the colloidal state, for example, it is preferable that the metal-based fine particles are substantially dispersed in the fine particle state. Here, substantially dispersed means a state in which primary particles are dispersed independently without agglomeration or soft aggregation.
금속계 미립자를 분산시킬 때의 분산제나 조성물에 배합해도 좋은 첨가제로서는 일본특허공개 2005-17322호 공보의 단락번호[0027]∼[0031]에 기재된 분산제나 첨가제가 본 발명에 있어서도 바람직한 것으로서 열거된다.As an additive which may be mix | blended with the dispersing agent and composition at the time of disperse | distributing metal type microparticles | fine-particles, the dispersing agent and additive of Paragraph No. [0027]-[0031] of Unexamined-Japanese-Patent No. 2005-17322 are mentioned as a preferable thing also in this invention.
여기서 사용되는 분산제는 상기 착색 화소 형성용 경화성 조성물로 열거한 특정 분산 수지, 즉 (B) 산가 20∼300mg/g이고, 또한, 중량평균 분자량이 3,000∼100,000의 범위에 있는 고분자 분산제, 보다 구체적으로는 특정 수지 분산 수지(B-1)∼분산 수지(B-3)로서 열거된 분산 수지가 바람직하게 사용되고, 차광부 형성용 경화성 조성물에 있어서의 바람직한 형태도 또한 상기한 것과 동일하다.The dispersing agent used here is a specific dispersing resin listed as said curable composition for colored pixel formation, ie, the polymeric dispersing agent which has an acid value of 20-300 mg / g, and a weight average molecular weight is in the range of 3,000-100,000, More specifically, The dispersion resin enumerated as specific resin dispersion resin (B-1)-dispersion resin (B-3) is used preferably, and the preferable aspect in curable composition for light shielding part formation is also the same as that mentioned above.
금속계 미립자의 분산제로서는 카르복실기, OH기, 술폰산기, 인산기, 아미노기, 카르보닐기, 티올기, 폴리옥시알킬렌부 등의 친수 부분과 페닐기(나프탈렌환 등을 포함함), 지환, 알킬기 및 이들의 치환된 기 등의 친유 부분을 아울러 지니는 화합물 등이 분산제로서 일반적이지만, 예를 들면, 시판품으로서는 이하에 예시하는 화합물이 사용가능하다. 단, 이들의 화합물에 한정되는 것은 아니다.Examples of the dispersant for the metal-based fine particles include hydrophilic moieties such as a carboxyl group, an OH group, a sulfonic acid group, a phosphoric acid group, an amino group, a carbonyl group, a thiol group, and a polyoxyalkylene moiety, and a phenyl group (including a naphthalene ring), an alicyclic ring, an alkyl group, and substituted groups thereof. Although the compound etc. which carry lipophilic part etc. are common as a dispersing agent, For example, the compound illustrated below can be used as a commercial item. However, it is not limited to these compounds.
EFKA-1101, 1120, 1125, 4008, 4009, 4046, 4047, 4520, 4010, 4015, 4020, 4050, 4055, 4060, 4080, 4300, 4330, 4400, 4401, 4402, 4403, 4406, 4800, 5010, 5044, 5244, 5054, 5055, 5063, 5064, 5065, 5066, 5070, 5207(이상 EFKA ADDITIVES사 제작),EFKA-1101, 1120, 1125, 4008, 4009, 4046, 4047, 4520, 4010, 4015, 4020, 4050, 4055, 4060, 4080, 4300, 4330, 4400, 4401, 4402, 4403, 4406, 4800, 5010, 5044, 5244, 5054, 5055, 5063, 5064, 5065, 5066, 5070, 5207 (more than EFKA ADDITIVES company),
Anti-Terra-U, Anti-Terra-U100, Anti-Terra-204, Anti-Terra-205, Anti-Terra-P, Disperbyk-101, 102, 103, 106, 108, 109, 110, 111, 112, 151, P-104, P-104S, P105, 220S, 203, 204, 205, 9075, 9076, 9077(이상 BYK사 제작),Anti-Terra-U, Anti-Terra-U100, Anti-Terra-204, Anti-Terra-205, Anti-Terra-P, Disperbyk-101, 102, 103, 106, 108, 109, 110, 111, 112, 151, P-104, P-104S, P105, 220S, 203, 204, 205, 9075, 9076, 9077 (by BYK company),
Disparlon 7301, 325, 374, 234, 1220, 2100, 2200, KS260, KS273N, 1210, 2150, KS860, KS873N, 7004, 1813, 1860, 1401, 1200, 550, EDAPLAN470, 472, 480, 482, K-SPERSE131, 152, 152MS(이상 Kusumoto Chemicals, Ltd. 제작),Disparlon 7301, 325, 374, 234, 1220, 2100, 2200, KS260, KS273N, 1210, 2150, KS860, KS873N, 7004, 1813, 1860, 1401, 1200, 550, EDAPLAN470, 472, 480, 482, K-SPERSE131 , 152, 152MS (more than Kusumoto Chemicals, Ltd.),
솔스퍼스 3000, 5000, 9000, 12000, 13240, 13940, 17000, 22000, 24000, 26000, 28000 등(AVECIA사 제작),Solspers 3000, 5000, 9000, 12000, 13240, 13940, 17000, 22000, 24000, 26000, 28000, etc. (manufactured by AVECIA),
카리본 B, 동 L-400, 엘레미놀 MBN-1, 산스펄 PS-2, 동 PS-8, 이오 네트 S-20(Sanyo Chemical Industries, Ltd. 제작),Caribbean B, Copper L-400, Eleminol MBN-1, Sanspur PS-2, Copper PS-8, Ionet S-20 (manufactured by Sanyo Chemical Industries, Ltd.),
디스퍼스 에이드 6, 디스퍼스 에이드 8, 디스퍼스 에이드 15, 디스퍼스 에이드 9100(San Nopco Limited 제작) 등이 사용가능하다.Disperse Ade 6, Disperse Ade 8, Disperse Ade 15, Disperse Ade 9100 (manufactured by San Nopco Limited) and the like can be used.
이들 특정 분산 수지는 단독으로 사용해도 좋고, 2종 이상을 병용해도 좋다.These specific dispersion resins may be used independently and may use 2 or more types together.
분산제의 첨가량은 안료(차광제)에 대하여 3∼30질량부, 바람직하게는 5∼20질량부이다.The addition amount of a dispersing agent is 3-30 mass parts with respect to a pigment (light-shielding agent), Preferably it is 5-20 mass parts.
또한 필요에 따라서, 본 발명에 따른 특정 분산 수지의 이외에, 고분자 분산제를 사용할 수 있다. 고분자 분산제를 사용함으로써 분산 안정성, 보존성이 향상한다. 분산제로서 사용할 수 있는 분산 수지에 대해서는 예를 들면, 「안료의 사전」(이토세이시로 편, (주)아사쿠라 서원 발행, 2000년)에 기재되어 있다.If necessary, in addition to the specific dispersion resin according to the present invention, a polymer dispersant may be used. By using a polymeric dispersant, dispersion stability and preservation property improve. About the dispersion resin which can be used as a dispersing agent, it is described, for example in "the dictionary of pigments" (Itosei Shiro edition, Asakura Co., Ltd., 2000).
<(C-2) 중합성 화합물><(C-2) polymeric compound>
차광부 형성용 경화성 조성물에 있어서의 중합성 화합물로서는 상기 착색 화소 형성용 경화성 조성물에 있어서 사용된 중합성 화합물도 바람직한 것으로서 열거되지만, 특히 이하에 나타내는 것이 바람직하다.As a polymeric compound in the curable composition for light shielding part formation, although the polymeric compound used in the said curable composition for colored pixel formation is also listed as a preferable thing, what is shown below is especially preferable.
본 발명의 차광부 형성용 경화성 조성물에 있어서의 중합성 화합물로서는 에틸렌성 불포화 이중결합을 2개이상 갖고, 광의 조사에 의해 부가 중합하는 모노머 또는 올리고머인 것이 바람직하다. 그러한, 모노머 및 올리고머로서는 분자 중에 적어도 1개의 부가 중합가능한 에틸렌성 불포화기를 갖고, 비점이 상압에서 100℃이상인 화합물을 들 수 있다. 그 예로서는 폴리에틸렌글리콜모노(메타)아크릴레이트, 폴리프로필렌글리콜모노(메타)아크릴레이트 및 페녹시에틸(메타)아크릴레이트 등의 단관능 아크릴레이트나 단관능 메타크릴레이트; 폴리에틸렌글리콜디(메타)아크릴레이트, 폴리프로필렌글리콜 디(메타)아크릴레이트, 트리메틸올에탄트리아크릴레이트, 트리메틸올프로판트리(메타)아크릴레이트, 트리메틸올프로판디아크릴레이트, 네오펜틸글리콜디(메타)아크릴레이트, 펜타에리스리톨테트라(메타)아크릴레이트, 펜타에리스리톨트리(메타)아크릴레이트, 디펜타에리스리톨헥사(메타)아크릴레이트, 디펜타에리스리톨펜타(메타)아크릴레이트, 헥산디올디(메타)아크릴레이트, 트리메틸올프로판트리(아크릴로일옥시프로필)에테르, 트리(아크릴로일옥시에틸)이소시아누레이트, 트리(아크릴로일옥시에틸)시아누레이트, 글리세린트리(메타)아크릴레이트; 트리메틸올프로판이나 글리세린 등의 다관능 알콜에 에틸렌옥시드 또는 프로필렌 옥시드를 부가한 후 (메타)아크릴레이트화한 것 등의 다관능 아크릴레이트나 다관능 메타크릴레이트를 들 수 있다.As a polymeric compound in the curable composition for light-shielding part formation of this invention, it is preferable that it is a monomer or oligomer which has two or more ethylenically unsaturated double bonds and add-polymerizes by light irradiation. As such a monomer and an oligomer, the compound which has at least 1 addition-polymerizable ethylenically unsaturated group in a molecule, and whose boiling point is 100 degreeC or more at normal pressure is mentioned. Examples thereof include monofunctional acrylates and monofunctional methacrylates such as polyethylene glycol mono (meth) acrylate, polypropylene glycol mono (meth) acrylate, and phenoxyethyl (meth) acrylate; Polyethylene glycol di (meth) acrylate, polypropylene glycol di (meth) acrylate, trimethylol ethane triacrylate, trimethylolpropane tri (meth) acrylate, trimethylolpropanediacrylate, neopentyl glycol di (meth) Acrylate, pentaerythritol tetra (meth) acrylate, pentaerythritol tri (meth) acrylate, dipentaerythritol hexa (meth) acrylate, dipentaerythritol penta (meth) acrylate, hexanediol di (meth) acrylate, Trimethylolpropane tri (acryloyloxypropyl) ether, tri (acryloyloxyethyl) isocyanurate, tri (acryloyloxyethyl) cyanurate, glycerin tri (meth) acrylate; And polyfunctional acrylates and polyfunctional methacrylates such as those obtained by adding ethylene oxide or propylene oxide to polyfunctional alcohols such as trimethylolpropane and glycerin and then (meth) acrylated.
또한, 산성 다관능 광경화성 화합물도 바람직한 화합물이다. 산성 다관능 광경화성 화합물로서는 (1) 수산기와 함께 3개이상의 광경화성 관능기를 갖는 모노머 또는 올리고머를 2염기산 무수물로 변성함으로써 카르복실기를 도입한 것, (2) 수 산기와 함께 3개이상의 광경화성 관능기를 갖는 모노머 또는 올리고머에, 글리시딜기 또는 이소시아네이트기와 COOH기를 아울러 가지는 화합물 등을 부가함으로써 카르복실기를 도입한 것, 또는 (3) 3개이상의 광경화성 관능기를 갖는 방향족 화합물을 농황산이나 발연 황산으로 변성함으로써 술폰산기를 도입한 것 등을 사용할 수 있다. 또한, 산성 다관능 광경화성 화합물 그 자체인 모노머를 반복단위로서 포함하는 올리고머를 산성 다관능 광경화성 화합물로서 사용해도 좋다.Acidic polyfunctional photocurable compounds are also preferred compounds. As the acidic polyfunctional photocurable compound, (1) a monomer or oligomer having three or more photocurable functional groups together with a hydroxyl group is introduced into a dibasic anhydride to introduce a carboxyl group, and (2) three or more photocurable groups together with a hydroxyl group. A carboxyl group is introduced by adding a glycidyl group or a compound having an isocyanate group and a COOH group to a monomer or oligomer having a functional group, or (3) an aromatic compound having three or more photocurable functional groups is modified with concentrated sulfuric acid or fuming sulfuric acid. The thing which introduce | transduced a sulfonic acid group etc. can be used by this. Moreover, you may use the oligomer which contains the monomer which is an acidic polyfunctional photocurable compound itself as a repeating unit, as an acidic polyfunctional photocurable compound.
산성 다관능 광경화성 화합물의 예로서는 하기 일반식(i), 일반식(ii)로 나타내어지는 것이 바람직하다. 또한, 일반식(i) 및 일반식(ii)에 있어서, T 또는 G가 옥시알킬렌기의 경우에는 탄소 원자측의 말단이 R, X 및 W에 결합한다.As an example of an acidic polyfunctional photocurable compound, it is preferable to represent with the following general formula (i) and general formula (ii). In General Formulas (i) and (ii), when T or G is an oxyalkylene group, the terminal on the carbon atom side is bonded to R, X and W.
일반식(i) 중 R은 (메타)아크릴로일옥시기를 나타내고, X는 -COOH기, -OPO3H2기를 나타낸다. T는 옥시알킬렌기를 나타내고, 여기서 알킬렌기의 탄소수는 1∼4개이다. n은 0∼20이다.In the general formula (i) R represents an acryloyloxy group in a (meth) acrylate, X represents a group -COOH, -OPO 3 H 2. T represents an oxyalkylene group, wherein the alkylene group has 1 to 4 carbon atoms. n is 0-20.
일반식(ii) 중 W는 일반식(i)에 있어서의 R 또는 X를 나타내고, 6개의 W 중 3개이상의 W가 R이다. G는 일반식(i)에 있어서의 T와 동일한 의미이다. Z는 -O- 또 는 -OC=ONH(CH2)qNHCOO-를 나타낸다. p는 0∼20이고, q는 1∼8이다. 1분자 내에 복수 존재하는 R, X, T, G은 각각 같거나 달라도 좋다.)In general formula (ii), W represents R or X in general formula (i), and three or more W of six W is R. G is synonymous with T in General formula (i). Z represents -O- or -OC = ONH (CH 2 ) qNHCOO-. p is 0-20 and q is 1-8. A plurality of R, X, T, and G present in one molecule may be the same or different.)
일반식(i) 및 일반식(ii)로 나타내어지는 산성 다관능 광경화성 화합물의 시판품으로서는 예를 들면, Toagosei Co., Ltd. 제품의 카르복실기 함유 3관능 아크릴레이트인 TO-756, 및 카르복실기 함유 5관능 아크릴레이트인 TO-1382 등이 열거된다.As a commercial item of the acidic polyfunctional photocurable compound represented by General formula (i) and General formula (ii), Toagosei Co., Ltd., for example. TO-756 which is a carboxyl group-containing trifunctional acrylate of a product, TO-1382 which is a carboxyl group-containing 5-functional acrylate, etc. are mentioned.
또한, 일본특허공고 소48-41708호 공보, 일본특허공고 소50-6034호 공보 및 일본특허공개 소51-37193호 공보에 기재되어 있는 우레탄아크릴레이트류; 일본특허공개 소48-64183호 공보, 일본특허공고 소49-43191호 공보 및 일본특허공고 소52-30490호 공보에 기재되어 있는 폴리에스테르아크릴레이트류; 에폭시 수지와 (메타)아크릴산의 반응 생성물인 에폭시아크릴레이트류 등의 다관능 아크릴레이트나 메타크릴레이트를 들 수 있다. 이들 중에서, 트리메틸올프로판트리(메타)아크릴레이트, 펜타에리스리톨테트라(메타)아크릴레이트, 디펜타에리스리톨헥사(메타)아크릴레이트, 디펜타에리스리톨펜타(메타)아크릴레이트, 상기 카르복실기 함유 5관능 아크릴레이트 등이 바람직하다. 또한 이 밖에, 일본특허공개 평11-133600호 공보에 기재된 「중합성 화합물 B」도 바람직한 것으로서 들 수 있다.Urethane acrylates described in JP-A-48-41708, JP-A-50-6034, and JP-A-51-37193; Polyester acrylates described in JP-A-48-64183, JP-A-49-43191 and JP-A-52-30490; Polyfunctional acrylates and methacrylates, such as epoxy acrylates which are reaction products of an epoxy resin and (meth) acrylic acid, are mentioned. Among them, trimethylolpropane tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol hexa (meth) acrylate, dipentaerythritol penta (meth) acrylate, the carboxyl group-containing 5-functional acrylate and the like This is preferred. In addition, "polymerizable compound B" described in Unexamined-Japanese-Patent No. 11-133600 is also mentioned as a preferable thing.
차광부 형성용 경화성 조성물에 있어서의 중합성 화합물의 함유량으로서는 본 발명의 차광부 형성용 경화성 조성물의 전체 고형분 중 5∼50질량%인 것이 바람직하고, 7∼40질량%인 것이 보다 바람직하고, 10∼35질량%인 것이 더욱 바람직하 다.As content of the polymeric compound in the curable composition for light-shielding part formation, it is preferable that it is 5-50 mass% in the total solid of the curable composition for light-shielding part formation of this invention, It is more preferable that it is 7-40 mass%, 10 More preferably, it is -35 mass%.
차광부 형성용 경화성 조성물에 사용되는 (D) 중합 개시제, (E) 용제 등은 상기한 착색 화소 형성용 경화성 조성물에 있어서의 것과 동일하고 바람직한 함유량도 동일하다.The (D) polymerization initiator, the (E) solvent, etc. which are used for the curable composition for light shielding part formation are the same as that in the curable composition for colored pixel formation mentioned above, and its preferable content is also the same.
또한, 본 발명의 착색 화소 형성용 경화성 조성물, 차광부 형성용 경화성 조성물에는 상기 필수 성분에 더해, 목적에 따라서 각종 공지의 첨가제를 사용할 수 있다.Moreover, in addition to the said essential component, various well-known additives can be used for the curable composition for colored pixel formation and the curable composition for light shielding part formation of this invention according to the objective.
이하, 그러한 첨가제에 대해서 상술한다.Hereinafter, such an additive is explained in full detail.
<알칼리 가용성 수지><Alkali Soluble Resin>
본 발명의 상기 각 경화성 조성물에 있어서는 피막 특성 향상 등의 목적으로, 바인더 폴리머로서 알칼리 가용성 수지를 사용할 수 있다.In each said curable composition of this invention, alkali-soluble resin can be used as a binder polymer for the purpose of a film characteristic improvement, etc.
본 발명에서 사용하는 알칼리 가용성 수지로서는 선상 유기 고분자 중합체이고, 분자(바람직하게는 아크릴계 공중합체, 스티렌계 공중합체를 주쇄로 하는 분자) 중에 적어도 1개의 알칼리 가용성을 촉진하는 기(예를 들면, 카르복실기, 인 산기, 술폰산기, 히드록실기 등)를 갖는 알칼리 가용성 수지 중에서 적당하게 선택할 수 있다.As alkali-soluble resin used by this invention, it is a linear organic high molecular polymer, group which promotes at least 1 alkali solubility in a molecule | numerator (preferably an acryl-type copolymer, the molecule which has a styrene-type copolymer as main chain) (for example, a carboxyl group) , Phosphoric acid group, sulfonic acid group, hydroxyl group, etc.) can be suitably selected from alkali-soluble resin.
상기 알칼리 가용성 수지로서 보다 바람직한 것은 측쇄에 카르복실산을 갖는 폴리머, 예를 들면, 일본특허공개 소59-44615호, 일본특허공고 소54-34327호, 일본 특허공고 소58-12577호, 일본특허공고 소54-25957호, 일본특허공개 소59-53836호, 일본특허공개 소59-71048호의 각 공보에 기재되어 있는 바와 같은, 메타크릴산 공 중합체, 아크릴산 공중합체, 이타콘산 공중합체, 크로톤산 공중합체, 말레산 공중합체, 부분 에스테르화 말레산 공중합체 등, 및 측쇄에 카르복실산을 갖는 산성 셀룰로오스 유도체, 수산기를 갖는 폴리머에 산무수물을 부가시킨 것 등의 아크릴계 공중합체의 것이 열거된다.More preferred as the alkali-soluble resin are polymers having a carboxylic acid in the side chain, for example, Japanese Patent Application Laid-Open No. 59-44615, Japanese Patent Publication No. 54-34327, Japanese Patent Publication No. 58-12577, and Japanese Patent. Methacrylic acid copolymers, acrylic acid copolymers, itaconic acid copolymers, crotonic acid, as described in Japanese Patent Application Laid-Open Nos. 54-25957, JP-A-59-53836 and JP-A-59-71048. Examples thereof include copolymers, maleic acid copolymers, partially esterified maleic acid copolymers, and acrylic copolymers such as acidic cellulose derivatives having a carboxylic acid in the side chain and an acid anhydride added to a polymer having a hydroxyl group.
산가로서는 20∼200mgKOH/g, 바람직하게는 30∼180mgKOH/g, 더 바람직하게는50∼150mgKOH/g의 범위의 것이 바람직하다.As acid value, 20-200 mgKOH / g, Preferably it is 30-180 mgKOH / g, More preferably, the thing of the range of 50-150 mgKOH / g is preferable.
알칼리 가용성 수지의 구체적인 구성 단위에 대해서는 특히 (메타)아크릴산과 이것과 공중합가능한 다른 단량체의 공중합체가 바람직하다. 상기 (메타)아크릴산과 공중합 가능한 다른 단량체로서는 알킬(메타)아크릴레이트, 아릴(메타)아크릴레이트, 비닐 화합물 등이 열거된다. 여기서, 알킬기 및 아릴기의 수소 원자는 치환기로 치환되어 있어도 좋다.About the specific structural unit of alkali-soluble resin, the copolymer of (meth) acrylic acid and another monomer copolymerizable with this is especially preferable. As another monomer copolymerizable with the said (meth) acrylic acid, an alkyl (meth) acrylate, an aryl (meth) acrylate, a vinyl compound, etc. are mentioned. Here, the hydrogen atom of an alkyl group and an aryl group may be substituted by the substituent.
상기 알킬(메타)아크릴레이트 및 아릴(메타)아크릴레이트로서는 CH2=C(R1)(COOR3)[여기서, R1은 수소 원자 또는 탄소수 1∼5개의 알킬기를 나타내고, R2는 탄소수 6∼10개의 방향족 탄화수소환을 나타내고, R3은 탄소수 1∼8개의 알킬기 또는 탄소수 6∼12개의 아랄킬기를 나타낸다.] 구체적으로는 메틸(메타)아크릴레이트, 에틸(메타)아크릴레이트, 프로필(메타)아크릴레이트, 부틸(메타)아크릴레이트, 이소부틸(메타)아크릴레이트, 펜틸(메타)아크릴레이트, 헥실(메타)아크릴레이트, 옥틸(메타)아크릴레이트, 페닐(메타)아크릴레이트, 벤질(메타)아크릴레이트, 톨릴(메타)아크릴레이트, 나프틸(메타)아크릴레이트, 시클로헥실(메타)아크릴레이 트, 히드록시알킬(메타)아크릴레이트(알킬은 탄소수 1∼8개의 알킬기), 히드록시글리시딜메타크릴레이트, 테트라히드로푸르푸릴 메타크릴레이트 등을 들 수 있다.The alkyl (meth) acrylate and aryl (meth) acrylates Examples of CH 2 = C (R 1) (COOR 3) [ wherein, R 1 is a hydrogen atom or a C1-5 alkyl group, R 2 is C 6 It represents -10 aromatic hydrocarbon rings, and R <3> represents a C1-C8 alkyl group or a C6-C12 aralkyl group.] Specifically, methyl (meth) acrylate, ethyl (meth) acrylate, and propyl (meth) ) Acrylate, butyl (meth) acrylate, isobutyl (meth) acrylate, pentyl (meth) acrylate, hexyl (meth) acrylate, octyl (meth) acrylate, phenyl (meth) acrylate, benzyl (meth) ) Acrylate, tolyl (meth) acrylate, naphthyl (meth) acrylate, cyclohexyl (meth) acrylate, hydroxyalkyl (meth) acrylate (alkyl is an alkyl group having 1 to 8 carbon atoms), hydroxyglycol Cydyl methacrylate, tet And the like dihydro furfuryl methacrylate.
또한, 분자 측쇄에 폴리알킬렌옥시드쇄를 갖는 수지도 바람직한 것이다. 상기 폴리알킬렌옥시드쇄로서는 폴리에틸렌옥시드쇄, 폴리프로필렌옥시드쇄, 폴리테트라메틸렌글리콜쇄 또는 이들의 병용도 가능하고, 말단은 수소 원자 또는 직쇄 또는 분기의 알킬기이다.Moreover, the resin which has a polyalkylene oxide chain in a molecular side chain is also preferable. As said polyalkylene oxide chain, a polyethylene oxide chain, a polypropylene oxide chain, a polytetramethylene glycol chain, or these combination can also be used, The terminal is a hydrogen atom or a linear or branched alkyl group.
폴리에틸렌옥시드쇄, 폴리프로필렌옥시드쇄의 반복단위는 1∼20이 바람직하고, 2∼12가 보다 바람직하다. 이들의 측쇄에 폴리알킬렌옥시드쇄를 갖는 아크릴계 공중합체는 예를 들면, 폴리에틸렌글리콜모노(메타)아크릴레이트, 폴리프로필렌글리콜모노(메타)아크릴레이트, 폴리(에틸렌글리콜-프로필렌글리콜)모노(메타)아크릴레이트 등 및 이들의 말단 OH기를 알킬 봉쇄한 화합물, 예를 들면 메톡시폴리에틸렌글리콜모노(메타)아크릴레이트, 에톡시폴리프로필렌글리콜모노(메타)아크릴레이트, 메톡시폴리(에틸렌글리콜-프로필렌글리콜)모노(메타)아크릴레이트 등을 공중합 성분으로 하는 아크릴계 공중합체이다.1-20 are preferable and, as for the repeating unit of a polyethylene oxide chain and a polypropylene oxide chain, 2-12 are more preferable. Examples of the acrylic copolymer having a polyalkylene oxide chain in these side chains include polyethylene glycol mono (meth) acrylate, polypropylene glycol mono (meth) acrylate, and poly (ethylene glycol-propylene glycol) mono (meth). Acrylate etc. and the compound which alkyl-blocked these terminal OH groups, for example, methoxy polyethyleneglycol mono (meth) acrylate, ethoxy polypropylene glycol mono (meth) acrylate, methoxy poly (ethylene glycol propylene glycol) It is an acryl-type copolymer which uses mono (meth) acrylate etc. as a copolymerization component.
상기 비닐 화합물로서는 CH2=CR1R2[여기서, R1은 수소 원자 또는 탄소수 1∼5개의 알킬기를 나타내고, R2는 탄소수 6∼10개의 방향족 탄화수소환을 나타내고, R3 은 탄소수 1∼8개의 알킬기 또는 탄소수 6∼12개의 아랄킬기를 나타낸다.] 구체적으로는 스티렌, α-메틸스티렌, 비닐톨루엔, 아크릴로니트릴, 비닐아세테이트, N-비닐피롤리든, 폴리스티렌 매크로 모노머, 폴리메틸메타크릴레이트 매크로 모노머 등을 들 수 있다.As the vinyl compound, CH 2 = CR 1 R 2 [wherein R 1 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, R 2 represents an aromatic hydrocarbon ring having 6 to 10 carbon atoms, and R 3 represents 1 to 8 carbon atoms Alkyl group or aralkyl group having 6 to 12 carbon atoms.] Specifically, styrene, α-methylstyrene, vinyltoluene, acrylonitrile, vinyl acetate, N-vinylpyrrolidone, polystyrene macromonomer, polymethylmethacrylate A macromonomer etc. are mentioned.
공중합 가능한 다른 단량체는 1종 단독으로 또는 2종이상을 조합시켜서 사용할 수 있다. 이들 중에서는 특히, 벤질(메타)아크릴레이트/(메타)아크릴산 공중합체나 벤질(메타)아크릴레이트/(메타)아크릴산/다른 모노머로 이루어지는 다원 공중합체가 바람직하다.The other monomer copolymerizable can be used individually by 1 type or in combination of 2 or more types. Among these, in particular, a multipart copolymer composed of a benzyl (meth) acrylate / (meth) acrylic acid copolymer and benzyl (meth) acrylate / (meth) acrylic acid / other monomers is preferable.
아크릴계 수지는 앞서 서술한 바와 같이 20∼200mgKOH/g의 범위의 산가를 갖는다. 산가가 200을 넘었을 경우, 아크릴계 수지가 알칼리에 대한 용해성이 지나치게 커져서 현상 적정 범위(현상 래티튜드)가 좁아진다. 한편, 20미만으로 지나치게 작으면, 알칼리에 대한 용해성이 작아 현상에 시간이 지나치게 걸려서 바람직하지 않다.As described above, the acrylic resin has an acid value in the range of 20 to 200 mgKOH / g. When the acid value is more than 200, the acrylic resin has an excessive solubility in alkali, resulting in a narrow development development range (developing latitude). On the other hand, if it is too small (less than 20), the solubility in alkali is small and the development takes too long, which is not preferable.
또한, 아크릴계 수지의 질량평균 분자량 Mw(GPC법으로 측정된 폴리스티렌 환산 값)은 컬러 레지스트를 도포 등의 공정상 사용하기 쉬운 점도 범위를 실현하기 위해서, 또한 막강도를 확보하기 위해서, 2,000∼100,000인 것이 바람직하고, 보다 바람직하게는 3,000∼50,000이다.In addition, the mass average molecular weight Mw (polystyrene conversion value measured by GPC method) of acrylic resin is 2,000-100,000 in order to realize the viscosity range which is easy to use in the process of apply | coating a color resist, and to ensure film strength. It is preferable, More preferably, it is 3,000-50,000.
또한, 본 발명에 있어서의 경화성 조성물의 가교 효율을 향상시키기 위해서, 중합성기를 알칼리 가용성 수지에 갖는 수지를 단독 또는 중합성기를 갖지 않는 알칼리 가용성 수지와 병용해도 좋고, 아릴기, (메타)아크릴기, 아릴옥시알킬기 등을 측쇄에 함유한 폴리머 등이 유용하다. 중합성 이중 결합을 갖는 알칼리 가용성 수지는 알칼리 현상액에서의 현상이 가능하며, 또한 광경화성과 열경화성을 구비한 것이다. 이들 중합성기를 함유하는 폴리머의 예를 이하에 나타내지만, 1분자 중에 COOH기, OH기 등의 알칼리 가용성기와 탄소 탄소간 불포화 결합을 포함하는 것이면 하기에 한정되지 않는다.Moreover, in order to improve the crosslinking efficiency of the curable composition in this invention, you may use together resin which has a polymeric group in alkali-soluble resin alone or with alkali-soluble resin which does not have a polymeric group, and an aryl group and a (meth) acryl group Polymers containing an aryloxyalkyl group and the like in the side chain are useful. Alkali-soluble resin which has a polymerizable double bond can develop in alkaline developing solution, and is equipped with photocurability and thermosetting. Although the example of the polymer containing these polymerizable groups is shown below, if the molecule contains an unsaturated bond between alkali-soluble groups, such as a COOH group and an OH group, and a carbon carbon, it will not be limited to the following.
(1) 미리 이소시아네이트기와 OH기를 반응시켜, 미반응의 이소시아네이트기를 1개 잔존시키고, 또한 (메타)아크릴로일기를 적어도 1개 포함하는 화합물과 카르복실기를 포함하는 아크릴 수지의 반응에 의해 얻어지는 우레탄 변성된 중합성 이중 결합 함유 아크릴 수지,(1) urethane-modified by reacting an isocyanate group and an OH group in advance, leaving one unreacted isocyanate group, and also reacting a compound containing at least one (meth) acryloyl group with an acrylic resin containing a carboxyl group. Polymerizable double bond-containing acrylic resin,
(2) 카르복실기를 포함하는 아크릴 수지와 분자내에 에폭시기 및 중합성 이중결합을 함께 갖는 화합물의 반응에 의해 얻어지는 불포화기 함유 아크릴 수지,(2) an unsaturated group-containing acrylic resin obtained by reaction of an acrylic resin containing a carboxyl group with a compound having an epoxy group and a polymerizable double bond together in a molecule,
(3) 산펜던트형 에폭시아크릴레이트 수지,(3) acid pendant epoxy acrylate resin,
(4) OH기를 포함하는 아크릴 수지와 중합성 이중 결합을 갖는 2염기산 무수물을 반응시킨 중합성 이중 결합 함유 아크릴수지.(4) A polymerizable double bond-containing acrylic resin obtained by reacting an acrylic resin containing an OH group with a dibasic acid anhydride having a polymerizable double bond.
상기 중, 특히 (1) 및 (2)의 수지가 바람직하다.Among the above, resin of (1) and (2) is especially preferable.
구체예로서, OH기를 갖는 예를 들면, 2-히드록시에틸아크릴레이트와 COOH기를 함유하는 예를 들면, 메타크릴산과 이들과 공중합 가능한 아크릴계 또는 비닐계화합물 등의 모노머의 공중합체에, OH기에 대하여 반응성을 갖는 에폭시 환과 탄소간 불포화 결합기를 갖는 화합물(예를 들면, 글리시딜아크릴레이트 등의 화합물)을 반응시켜서 얻어지는 화합물 등을 사용할 수 있다. OH기와의 반응에서는 에폭시환 이외에 산무수물, 이소시아네이트기, 아크릴로일기를 갖는 화합물도 사용할 수 있다.Specific examples include copolymers of monomers such as, for example, methacrylic acid and an acrylic or vinyl compound copolymerizable with, for example, 2-hydroxyethyl acrylate having a OH group and a COOH group, with respect to the OH group. Compounds obtained by reacting a reactive epoxy ring with a compound having a carbon-to-carbon unsaturated bond group (for example, a compound such as glycidyl acrylate) can be used. In reaction with an OH group, the compound which has an acid anhydride, an isocyanate group, and an acryloyl group can also be used besides an epoxy ring.
또한, 일본특허공개 평6-102669호 공보, 일본특허공개 평6-1938호 공보에 기 재된 에폭시환을 갖는 화합물에 아크릴산과 같은 불포화 카르복실산을 반응시켜서 얻어지는 화합물에 포화 또는 불포화 다염기산 무수물을 반응시켜서 얻어지는 반응물도 사용할 수 있다.Further, a saturated or unsaturated polybasic acid anhydride is reacted with a compound obtained by reacting an unsaturated carboxylic acid such as acrylic acid with a compound having an epoxy ring described in JP-A-6-102669 and JP-A-6-1938. The reactant obtained by making it available can also be used.
COOH기와 같은 알칼리 가용화기와 탄소간 불포화기를 함께 갖는 화합물로서, 예를 들면 다이야날 NR시리즈(Mitsubishi Rayon Co., Ltd. 제작); Photomer 6173(COOH기 함유 Polyurethane acrylic oligomer, Diamond Shamrock Co.Ltd., 제작); 비스 코트 R-264, KS 레지스트106(모두 Osaka Organic Chemical Indusry Ltd. 제작); 사이크로마 P시리즈, 프락셀 CF200시리즈(모두 Daicel Chemical Industries, Ltd.제작); Ebecryl3800(Daicel UCB Co., Ltd. 제작) 등이 열거된다.As a compound which has an alkali solubilizer and a carbon-to-carbon unsaturated group together, such as a COOH group, For example, Diamond NR series (made by Mitsubishi Rayon Co., Ltd.); Photomer 6173 (COOH group-containing polyurethane acrylic oligomer, manufactured by Diamond Shamrock Co. Ltd.); Bis coat R-264, KS resist 106 (all manufactured by Osaka Organic Chemical Indusry Ltd.); Cychrom P Series, Fraxel CF200 Series (all manufactured by Daicel Chemical Industries, Ltd.); Ebecryl 3800 (manufactured by Daicel UCB Co., Ltd.) and the like.
알칼리 가용성 수지의 첨가량으로서는 본 발명의 경화성 조성물의 전체 고형분 중 3∼30질량%의 범위인 것이 바람직하고, 5∼20질량%가 보다 바람직하다.As addition amount of alkali-soluble resin, it is preferable that it is the range of 3-30 mass% in the total solid of the curable composition of this invention, and 5-20 mass% is more preferable.
레지스트의 조제시에는 상기 알칼리 가용성 수지에 더하여, 하기의 에폭시 수지도 첨가하는 것이 더욱 바람직하다. 에폭시 수지로서는 비스페놀 A형, 크레졸 노볼락형, 비페닐형, 지환식 에폭시 화합물 등의 에폭시환을 분자 중에 2개이상 갖는 화합물이다.It is more preferable to add the following epoxy resin in addition to the said alkali-soluble resin at the time of preparation of a resist. As an epoxy resin, it is a compound which has 2 or more epoxy rings in a molecule | numerator, such as bisphenol-A, cresol novolak-type, a biphenyl type, and an alicyclic epoxy compound.
예를 들면, 비스페놀 A형으로서는 에포토토 YD-115, YD-118T, YD-127, YD-128, YD-134, YD-8125, YD-7011R, ZX-1059, YDF-8170, YDF-170 등(이상, Tohto Kasei Co., Ltd. 제작), 데나콜 EX-1101, EX-1102, EX-1103 등(이상 Nagase Chemicals Ltd. 제작), 프락셀 GL-61, GL-62, G101, G102(이상 Daicel Chemical Industries, Ltd. 제작) 등이 열거되고, 그 밖에도 이들과 유사한 비스페놀 F형, 비스페놀 S형 에폭시 수지도 사용가능한 것으로서 들 수 있다.For example, as bisphenol A, Efototo YD-115, YD-118T, YD-127, YD-128, YD-134, YD-8125, YD-7011R, ZX-1059, YDF-8170, YDF-170 (Above, manufactured by Tohto Kasei Co., Ltd.), Denacol EX-1101, EX-1102, EX-1103 (above produced by Nagase Chemicals Ltd.), Fraxel GL-61, GL-62, G101, G102 ( The above-mentioned Daicel Chemical Industries, Ltd. make) etc. are mentioned, In addition, bisphenol F type and bisphenol S type epoxy resin similar to these are mentioned as usable.
또한 Ebecryl 3700, 3701, 600(이상 Daicel UCB Co., Ltd. 제작) 등의 에폭시아크릴레이트도 사용가능하다. 크레졸 노볼락형으로서는 에포토토 YDPN-638, YDPN-701, YDPN-702, YDPN-703, YDPN-704 등(이상 Tohto Kasei Co., Ltd. 제작), 데나콜 EM-125 등(이상 Nagase Chemicals Ltd. 제작), 비페닐형으로서는 3,5,3',5'-테트라메틸-4,4'-디글리시딜비페닐 등, 지환식 에폭시 화합물로서는 셀록사이드 2021, 2081, 2083, 2085, 에포리드 GT-301, GT-302, GT-401, GT-403, EHPE-3150(이상 Daicel Chemical Industries, Ltd. 제작), 산토토 ST-3000, ST-4000, ST-5080, ST-5100 등(이상 Tohto Kasei Co., Ltd. 제작), Epiclon 430, 동 673, 동 695, 동 850S, 동 4032(이상 Dainippon Ink Corporation 제작) 등을 들 수 있다. 또한, 1,1,2,2-테트라키스(p-글리시딜옥시페닐)에탄, 트리스(p-글리시딜옥시페닐)메탄, 트리글리시딜트리스(히드록시에틸)이소시아누레이트, o-프탈산디글리시딜에스테르, 테레프탈산디글리시딜에스테르, 그 외에 아민형 에폭시 수지인 에포토토 YH-434, YH-434L, 비스페놀A형 에폭시 수지의 골격 중에 다이머 산을 변성 한 글리시딜 에스테르 등도 사용할 수 있다.In addition, epoxy acrylates such as Ebecryl 3700, 3701, 600 (produced by Daicel UCB Co., Ltd.) can also be used. As the cresol novolak type, Efototo YDPN-638, YDPN-701, YDPN-702, YDPN-703, YDPN-704, etc. (above manufactured by Tohto Kasei Co., Ltd.), Denacol EM-125, etc. (above Nagase Chemicals Ltd.) and 3,5,3 ', 5'-tetramethyl-4,4'-diglycidyl biphenyl, such as biphenyl type, include ceoxide 2021, 2081, 2083, 2085 and epoxide as alicyclic epoxy compounds. Lead GT-301, GT-302, GT-401, GT-403, EHPE-3150 (above produced by Daicel Chemical Industries, Ltd.), Santoto ST-3000, ST-4000, ST-5080, ST-5100, etc. ( Tohto Kasei Co., Ltd.), Epiclon 430, 673, 695, 850S, 4032 (above Dainippon Ink Corporation), etc. are mentioned. 1,1,2,2-tetrakis (p-glycidyloxyphenyl) ethane, tris (p-glycidyloxyphenyl) methane, triglycidyltris (hydroxyethyl) isocyanurate, o Diglycidyl esters of phthalic acid, diglycidyl esters of terephthalic acid, and glycidyl esters in which the dimer acid is modified in the skeleton of an amine epoxy resin, efototo YH-434, YH-434L, or a bisphenol A epoxy resin. Etc. can also be used.
이 중에서 바람직한 것은「분자량/에폭시환의 수」가 100이상이고, 보다 바람직한 것은 130∼500이다. 「분자량/에폭시환의 수」가 작으면 경화성이 높고, 경화시의 수축이 크고, 또 지나치게 크면 경화성이 부족되고, 신뢰성이 떨어지게 되거나, 평탄성이 악화된다.Among these, "molecular weight / number of epoxy rings" is preferably 100 or more, more preferably 130 to 500. If the "molecular weight / number of epoxy rings" is small, the curability is high, the shrinkage at the time of curing is too large, and if too large, the curability is insufficient, the reliability is deteriorated, or the flatness is deteriorated.
구체적인 바람직한 화합물로서는 에포토토 YD-115, 118T, 127, YDF-170, YDPN-638, YDPN-701, 프락셀 GL-61, GL-6,2,3,5,3',5'-테트라메틸-4,4'디글리시딜 비페닐, 셀록사이드 2021, 2081, 에포리드 GT-302, GT-403, EHPE-3150 등이 열거된다.Specific preferred compounds include Efototo YD-115, 118T, 127, YDF-170, YDPN-638, YDPN-701, Fraxel GL-61, GL-6,2,3,5,3 ', 5'-tetramethyl -4,4 'diglycidyl biphenyl, ceoxide 2021, 2081, eporide GT-302, GT-403, EHPE-3150, etc. are mentioned.
또한, 고색 순도 작성을 위해서 안료농도를 크게 하면 도포액의 틱소성이 일반적으로 커지고, 이 때문에 도포 후의 막두께 불균일이 발생되기 쉽고, 또한 특히 슬릿 코트법에서는 건조까지 액을 레벨링하여 균일한 두께의 도막을 형성하는 것이 중요하다. 이 때문에, 상기 착색 감광성 수지 조성물 중에 적절한 계면활성제를 함유시키는 것이 바람직하다.In addition, when the pigment concentration is increased to create high color purity, the thixotropy of the coating liquid is generally increased, and thus, the film thickness non-uniformity after coating is likely to occur, and in particular, in the slit coat method, the liquid is leveled to dry to give uniform thickness. It is important to form a coating film. For this reason, it is preferable to contain an appropriate surfactant in the said colored photosensitive resin composition.
상기 계면활성제로서는 일본특허공개 2003-337424호 공보, 일본특허공개 평11-133600호 공보에 개시되어 있는 계면활성제가 바람직한 것으로서 열거된다.As said surfactant, surfactant disclosed by Unexamined-Japanese-Patent No. 2003-337424 and Unexamined-Japanese-Patent No. 11-133600 is mentioned as a preferable thing.
도포성을 향상시키기 위한 계면활성제로서는 비이온계 계면활성제, 불소계 계면활성제, 실리콘계 계면활성제 등이 첨가된다.As surfactant for improving applicability | paintability, a nonionic surfactant, a fluorine-type surfactant, a silicone type surfactant, etc. are added.
비이온계 계면활성제로서는 예를 들면, 폴리옥시에틸렌글리콜류, 폴리옥시프로필렌글리콜류, 폴리옥시에틸렌알킬에테르류, 폴리옥시에틸렌알킬아릴에테르류, 폴리옥시에틸렌알킬에스테르류, 폴리옥시프로필렌알킬에테르류, 폴리옥시프로필렌 알킬아릴에테르류, 폴리옥시프로필렌알킬에스테르류, 소르비탄알킬에스테르류, 모노글리세리드알킬에스테르류 등의 비이온계 계면활성제가 바람직하다.As nonionic surfactant, polyoxyethylene glycol, polyoxypropylene glycol, polyoxyethylene alkyl ether, polyoxyethylene alkyl aryl ether, polyoxyethylene alkyl ester, polyoxypropylene alkyl ether, for example. And nonionic surfactants such as polyoxypropylene alkylaryl ethers, polyoxypropylene alkyl esters, sorbitan alkyl esters, and monoglyceride alkyl esters are preferable.
구체적으로는 폴리옥시에틸렌글리콜, 폴리옥시프로필렌글리콜 등의 폴리옥시알킬렌글리콜류; 폴리옥시에틸렌라우릴에테르, 폴리옥시프로필렌스테아릴에테르, 폴리옥시에틸렌올레일에테르 등의 폴리옥시알킬렌알킬에테르류; 폴리옥시에틸렌옥 틸페닐에테르, 폴리옥시에틸렌폴리스티릴화 에테르, 폴리옥시에틸렌트리벤질페닐에테르, 폴리옥시에틸렌-프로필렌폴리스티릴화 에테르, 폴리옥시에틸렌노닐페닐에테르 등의 폴리옥시에틸렌아릴에테르류; 폴리옥시에틸렌디라울레이트, 폴리옥시에틸렌디스테아레이트 등의 폴리옥시알킬렌디알킬에스테르, 소르비탄지방산 에스테르, 폴리옥시알킬렌소르비탄 지방산 에스테르류 등의 비이온계 계면활성제가 있다.Specifically, Polyoxyalkylene glycol, such as polyoxyethylene glycol and polyoxypropylene glycol; Polyoxyalkylene alkyl ethers such as polyoxyethylene lauryl ether, polyoxypropylene stearyl ether and polyoxyethylene oleyl ether; Polyoxyethylene aryl ethers such as polyoxyethylene octylphenyl ether, polyoxyethylene polythiylated ether, polyoxyethylene tribenzylphenyl ether, polyoxyethylene-propylene polytyrylated ether and polyoxyethylene nonylphenyl ether; And nonionic surfactants such as polyoxyalkylenedialkyl esters such as polyoxyethylenedilaurate and polyoxyethylene distearate, sorbitan fatty acid esters and polyoxyalkylene sorbitan fatty acid esters.
이들의 구체예는 예를 들면, 아데카 플루로닉 시리즈, 아데카놀 시리즈, 테트로닉 시리즈(이상 ADEKA주 제작), 이뮬겐 시리즈, 레오돌 시리즈(이상 Kao Corporation제작), 엘레미놀 시리즈, 노니폴 시리즈, 옥타폴 시리즈, 도데카폴 시리즈, 뉴폴 시리즈(이상 Sanyo Chemical Industries, Ltd.제작), 파이오닌 시리즈(이상, TAKEMOTO OIL & FAT Co., Ltd.제작), 닛산노니온 시리즈(이상 NOF Corporation 제작) 등이다. 이들의 시판되어 있는 것이 적당하게 사용될 수 있다. 바람직한 HLB값은 8∼20, 더욱 바람직하게는10∼17이다.Specific examples of these include, for example, the Adeka Pluronic series, the Adecanol series, the Tetronic series (above ADEKA Corporation), the Emulgen series, the Leodol series (manufactured by Kao Corporation), the Eleminol series, Noni Pole series, Octapol series, Dodekapol series, Newpole series (more than Sanyo Chemical Industries, Ltd.), pionein series (more than, TAKEMOTO OIL & FAT Co., Ltd.), Nissan nonion series (more than NOF Corporation Production). Those commercially available can be used suitably. Preferable HLB value is 8-20, More preferably, it is 10-17.
불소계 계면활성제로서는 말단, 주쇄 및 측쇄 중 적어도 어느 하나의 부위에 플루오로알킬 또는 플루오로알킬렌기를 갖는 화합물을 바람직하게 사용할 수 있다.As the fluorine-based surfactant, a compound having a fluoroalkyl or a fluoroalkylene group in at least one of terminal, main chain and side chain can be preferably used.
구체적 시판품으로서는 예를 들면 메가팩 F142D, 동 F172, 동 F173, 동 F176, 동 F177, 동 F183, 동 780, 동 781, 동 R30, 동 R08(Dainippon Ink Corporation 제작), 플루오라드 FC-135, 동 FC-170C, 동 FC-430, 동 FC-431(Sumitomo 3M Co., Ltd. 제작), 서프론 S-112, 동 S-113, 동 S-131, 동 S-141, 동 S-145, 동 S-382, 동 SC-101, 동 SC-102, 동 SC-103, 동 SC-104, 동 SC-105, 동 SC-106(Asahi Glass Co., Ltd. 제작), 에프톱 EF351, 동 352, 동 801, 동 802(JEMCO Corporation. 제작) 등이다.As a specific commercial item, Megapack F142D, copper F172, copper F173, copper F176, copper F177, copper F183, copper 780, copper 781, copper R30, copper R08 (made by Dainippon Ink Corporation), fluoride FC-135, copper FC-170C, copper FC-430, copper FC-431 (manufactured by Sumitomo 3M Co., Ltd.), Supron S-112, copper S-113, copper S-131, copper S-141, copper S-145, East S-382, East SC-101, East SC-102, East SC-103, East SC-104, East SC-105, East SC-106 (manufactured by Asahi Glass Co., Ltd.), F-Top EF351, Copper 352, 801, 802 (manufactured by JEMCO Corporation.), And the like.
실리콘계 계면활성제로서는 예를 들면 도레이 실리콘 DC3PA, 동 DC7PA, 동 SH11PA, 동 SH21PA, 동 SH28PA, 동 SH29PA, 동 SH30PA, 동 SH-190, 동 SH-193, 동 SZ-6032, 동 SF-8428, 동 DC-57, 동 DC-190(이상, Daw Corning Toray Silicone Co., Ltd. 제작), TSF-4440, TSF-4300, TSF-4445, TSF-4446, TSF-4460, TSF-4452(이상, GE Toshiba Silicone Co., Ltd. 제작) 등을 들 수 있다.As silicone type surfactant, Toray silicon DC3PA, copper DC7PA, copper SH11PA, copper SH21PA, copper SH28PA, copper SH29PA, copper SH30PA, copper SH-190, copper SH-193, copper SZ-6032, copper SF-8428, copper DC-57, Copper DC-190 (above, manufactured by Daw Corning Toray Silicone Co., Ltd.), TSF-4440, TSF-4300, TSF-4445, TSF-4446, TSF-4460, TSF-4452 (above, GE Toshiba Silicone Co., Ltd.) etc. are mentioned.
이들 계면활성제는 레지스트액 100중량부에 대하여, 바람직하게는 5중량부이하, 보다 바람직하게는 2중량부이하로 사용된다. 계면활성제의 양이 5중량부를 초과하는 경우에는 도포 건조에서의 표면 거침이 발생되기 쉬워 평활성이 악화되기 쉬워진다.These surfactant is used with respect to 100 weight part of resist liquids, Preferably it is 5 weight part or less, More preferably, it is used 2 weight part or less. When the amount of the surfactant exceeds 5 parts by weight, surface roughness in coating drying tends to occur, and smoothness tends to deteriorate.
또한, 미경화부의 알칼리 용해성을 촉진하고, 광경화성 조성물의 현상성을 더욱 도모하는 경우에는 유기 카르복실산, 바람직하게는 분자량 1000이하의 저분자량 유기 카르복실산의 첨가를 행할 수 있다. 구체적으로는 예를 들면, 포름산, 아세트산, 프로피온산, 부티르산, 발레르산, 피발산, 카프릭산, 디에틸아세트산, 에난트산, 카프릴산 등의 지방족 모노카르복실산; 옥살산, 말론산, 숙신산, 글루타르산, 아디프산, 피멜산, 스베린산, 아젤라인산, 세바신산, 브라실릭산, 메틸말론산, 에틸말론산, 디메틸말론산, 메틸숙신산, 테트라메틸숙신산, 시트라콘산 등의 지방족 디카르복실산; 트리카르바릴산, 아코니트산, 캄포론산 등의 지방족 트리카르복실산; 벤조산, 톨루익산, 쿠민산, 헤멜리트산, 메시틸렌산 등의 방향족 모노카르복실산; 프탈산, 이소프탈산, 테레프탈산, 트리멜리트산, 트리메신산, 멜로판산, 피 로멜리트산 등의 방향족 폴리카르복실산; 페닐아세트산, 페녹시아세트산, 메톡시페녹시아세트산, 히드로아트로프산, 히드로신남산, 만델산, 페닐숙신산, 아트로프산, 신남산, 신남산 메틸, 신남산 벤질, 신나밀리덴아세트산, 쿠말산, 움벨산 등의 그 밖의 카르복실산이 열거된다.In addition, when promoting alkali solubility of an uncured part and further aiming at developability of a photocurable composition, addition of organic carboxylic acid, Preferably low molecular weight organic carboxylic acid with a molecular weight of 1000 or less can be performed. Specific examples include aliphatic monocarboxylic acids such as formic acid, acetic acid, propionic acid, butyric acid, valeric acid, pivalic acid, capric acid, diethyl acetic acid, enanthic acid and caprylic acid; Oxalic acid, malonic acid, succinic acid, glutaric acid, adipic acid, pimelic acid, sublinic acid, azelaic acid, sebacic acid, brassic acid, methylmalonic acid, ethylmalonic acid, dimethylmalonic acid, methyl succinic acid, tetramethylsuccinic acid Aliphatic dicarboxylic acids such as citraconic acid; Aliphatic tricarboxylic acids such as tricarbaric acid, aconitic acid and camphoronic acid; Aromatic monocarboxylic acids such as benzoic acid, toluic acid, cuminic acid, hemelic acid and mesitylene acid; Aromatic polycarboxylic acids such as phthalic acid, isophthalic acid, terephthalic acid, trimellitic acid, trimesic acid, melanoic acid and pyromellitic acid; Phenylacetic acid, phenoxyacetic acid, methoxyphenoxyacetic acid, hydroatroic acid, hydrocinnamic acid, mandelic acid, phenylsuccinic acid, atroic acid, cinnamic acid, methyl cinnamic acid, cinnamic acid benzyl, cinnamildeacetic acid, coumalic acid And other carboxylic acids such as umbelic acid.
<알콕시실란 화합물><Alkoxysilane Compound>
본 발명의 각 경화성 조성물에는 기판과의 밀착성 향상이라고 한 관점으로부터, 알콕시실란 화합물, 그 중에서도 실란커플링제를 병용하는 것이 바람직하다.It is preferable to use together an alkoxysilane compound and a silane coupling agent together in each curable composition of this invention from a viewpoint of adhesive improvement with a board | substrate.
실란커플링제는 무기 재료와 화학결합 가능한 가수 분해성기로서 알콕시실릴기를 갖는 것이 바람직하고, 유기 수지와의 사이에서 상호 작용 또는 결합 형성해서 친화성을 나타내는 (메타)아크릴로일, 페닐, 메르캅토, 에폭시실란인 것이 바람직하고, 그 중에서도 (메타)아크릴로일프로필트리메톡시실란인 것이 보다 바람직하다.The silane coupling agent preferably has an alkoxysilyl group as a hydrolyzable group that can be chemically bonded to an inorganic material, and (meth) acryloyl, phenyl, mercapto, which exhibit affinity by interacting or forming a bond with an organic resin, It is preferable that it is an epoxy silane, and it is more preferable that it is (meth) acryloylpropyl trimethoxysilane especially.
실란커플링제를 사용할 경우의 첨가량으로서는 본 발명의 경화성 조성물의 전체 고형분 중 0.2∼5.0질량%의 범위인 것이 바람직하고, 0.5∼3.0질량%가 보다 바람직하다.As addition amount at the time of using a silane coupling agent, it is preferable that it is the range of 0.2-5.0 mass% in the total solid of the curable composition of this invention, and 0.5-3.0 mass% is more preferable.
<공증감제>Notary sensitizer
본 발명의 각 경화성 조성물은 소망에 의해 공증감제를 함유하는 것도 바람직하다. 본 발명에 있어서 공증감제는 증감 색소나 개시제의 활성 방사선에 대한 감도를 한층 향상시키거나 또는 산소에 의한 중합성 화합물의 중합 저해를 억제하는 등의 작용을 갖는다.It is also preferable that each curable composition of this invention contains a sensitizer as desired. In the present invention, the sensitizer has an action of further improving the sensitivity of the sensitizing dye and the initiator to the actinic radiation or suppressing the inhibition of polymerization of the polymerizable compound by oxygen.
이러한 공증감제의 예로서는 아민류, 예를 들면 M. R. Sander 등 저「Journal of Polymer Society」제10권 3173쪽(1972), 일본특허공고 소44-20189호 공보, 일본특허공개 소51-82102호 공보, 일본특허공개 소52-134692호 공보, 일본특허공개 소59-138205호 공보, 일본특허공개 소60-84305호 공보, 일본특허공개 소62-18537호 공보, 일본특허공개 소64-33104호 공보, Research Disclosure 33825호 기재의 화합물 등이 열거되고, 구체적으로는 트리에탄올아민, p-디메틸아미노벤조산 에틸에스테르, p-포르밀디메틸아닐린, p-메틸티오디메틸아닐린 등이 열거된다.Examples of such a sensitizer include amines such as MR Sander et al., Journal of Polymer Society, Vol. 10, page 3173 (1972), Japanese Patent Publication No. 44-20189, Japanese Patent Publication No. 51-82102, Japan Japanese Patent Laid-Open No. 52-134692, Japanese Patent Laid-Open No. 59-138205, Japanese Patent Laid-Open No. 60-84305, Japanese Patent Laid-Open No. 62-18537, Japanese Patent Laid-Open No. 64-33104, Research The compound of Disclosure 33825, etc. are mentioned, Specifically, triethanolamine, p-dimethylaminobenzoic acid ethyl ester, p-formyldimethylaniline, p-methylthiodimethylaniline, etc. are mentioned.
공증감제의 다른 예로서는 티올 및 술피드류 예를 들면, 일본특허공개 소53-702호 공보, 일본특허공고 소55-500806호 공보, 일본특허공개 평5-142772호 공보 기재의 티올 화합물, 일본특허공개 소56-75643호 공보의 2황화 화합물 등이 열거되고, 구체적으로는 2-메르캅토벤조티아졸, 2-메르캅토벤조옥사졸, 2-메르캅토벤조이미다졸, 2-메르캅토-4(3H)-퀴나졸린, β-메르캅토나프탈렌 등이 열거된다.As other examples of the sensitizer, thiols and sulfides, for example, thiol compounds disclosed in Japanese Patent Application Laid-Open No. 53-702, Japanese Patent Application Laid-Open No. 55-500806, Japanese Patent Application Laid-Open No. 5-142772, and Japanese Patent The bisulphide compounds of Unexamined-Japanese-Patent No. 56-75643, etc. are mentioned, Specifically, 2-mercaptobenzothiazole, 2-mercaptobenzoxazole, 2-mercaptobenzoimidazole, 2-mercapto-4 ( 3H) -quinazolin, β-mercaptonaphthalene, and the like.
또한, 공증감제의 다른 예로서는 아미노산 화합물(예, N-페닐글리신 등), 일본특허공고 소48-42965호 공보 기재의 유기 금속 화합물(예, 트리부틸주석아세테이트 등), 일본특허공고 소55-34414호 공보 기재의 수소 공여체, 일본특허공개 평6-308727호 공보 기재의 황 화합물(예, 트리티안 등) 등이 열거된다.Other examples of the co-sensitizer include amino acid compounds (e.g., N-phenylglycine), organometallic compounds (e.g., tributyltin acetate, etc.) described in JP-A-48-42965, JP-A-55-34414 Hydrogen donors described in Japanese Patent Application Laid-Open, sulfur compounds described in Japanese Patent Application Laid-Open No. 6-308727 (for example, trithiane and the like), and the like are listed.
이들 공증감제의 함유량은 중합 성장 속도와 연쇄 이동의 밸런스에 의한 경화 속도의 향상의 관점으로부터, 경화성 조성물의 전체 고형분의 질량에 대하여, 0.1∼30질량%의 범위가 바람직하고, 1∼25질량%의 범위가 보다 바람직하고, 0.5∼20질량%의 범위가 더욱 바람직하다.As for content of these co-sensitizers, the range of 0.1-30 mass% is preferable with respect to the mass of the total solid of a curable composition from a viewpoint of the improvement of the hardening rate by the balance of a polymerization growth rate and a chain transfer, and is 1-25 mass% The range of is more preferable, and the range of 0.5-20 mass% is further more preferable.
<중합 금지제><Polymerization inhibitor>
본 발명에 있어서는 경화성 조성물의 제조 중 또는 보존 중에 있어서 중합가능한 에틸렌성 불포화 이중 결합을 갖는 화합물의 불요한 열중합을 저지하기 위해서 소량의 열중합 방지제를 첨가하는 것이 바람직하다.In the present invention, it is preferable to add a small amount of thermal polymerization inhibitor in order to prevent unnecessary thermal polymerization of the compound having a polymerizable ethylenically unsaturated double bond during the preparation or storage of the curable composition.
본 발명에 사용할 수 있는 열중합 방지제로서는 하이드로퀴논, p-메톡시페놀, 디-t-부틸-p-크레졸, 피로갈롤, t-부틸카테콜, 벤조퀴논, 4,4'-티오비스(3-메틸-6-t-부틸페놀), 2,2'-메틸렌비스(4-메틸-6-t-부틸 페놀), N-니트로소페닐히드록시아민 제일 세륨염 등이 열거된다.Examples of the thermal polymerization inhibitor that can be used in the present invention include hydroquinone, p-methoxyphenol, di-t-butyl-p-cresol, pyrogallol, t-butylcatechol, benzoquinone, 4,4'-thiobis (3 -Methyl-6-t-butylphenol), 2,2'-methylenebis (4-methyl-6-t-butyl phenol), N-nitrosophenylhydroxyamine cerium salt, etc. are mentioned.
열중합 방지제의 첨가량은 전체 조성물의 질량에 대하여 약 0.01질량%∼약 5질량%가 바람직하다. 또한, 필요에 따라서 산소에 의한 중합저해를 방지하기 위해서 베헨산이나 베헨산 아미드와 같은 고급 지방산 유도체 등을 첨가하고, 도포 후의 건조의 과정에서 감광층의 표면에 편재시켜도 좋다. 고급 지방산 유도체의 첨가량은 전체 조성물의 약 0.5질량%∼약 10질량%가 바람직하다.As for the addition amount of a thermal polymerization inhibitor, about 0.01 mass%-about 5 mass% are preferable with respect to the mass of the whole composition. Moreover, in order to prevent the polymerization inhibition by oxygen, you may add higher fatty acid derivatives, such as behenic acid and behenic acid amide, as needed, and may make it localize on the surface of the photosensitive layer in the drying process after application | coating. The amount of the higher fatty acid derivative added is preferably about 0.5% by mass to about 10% by mass of the total composition.
<기타 첨가제><Other additives>
또한, 본 발명에 있어서는 경화 피막의 물성을 개량하기 위해서 무기 충전제나, 가소제, 감광층 표면의 잉크 착육성을 향상시킬 수 있는 감지화제 등의 공지의 첨가제를 첨가해도 된다.In addition, in this invention, in order to improve the physical property of a cured film, you may add well-known additives, such as an inorganic filler, a plasticizer, and a sensing agent which can improve the ink developability of the photosensitive layer surface.
가소제로서는 예를 들면, 디옥틸프탈레이트, 디도데실프탈레이트, 트리에틸렌글리콜디카프릴레이트, 디메틸글리콜프탈레이트, 트리크레실포스페이트, 디옥틸아디페이트, 디부틸세바케이트, 트리아세틸글리세린 등이 있고, 결합제를 사용했을 경우, 에틸렌성 불포화 이중 결합을 갖는 화합물과 결합제의 합계 질량에 대하여 10질량%이하 첨가할 수 있다.Examples of the plasticizer include dioctyl phthalate, didodecyl phthalate, triethylene glycol dicaprylate, dimethyl glycol phthalate, tricresyl phosphate, dioctyl adipate, dibutyl sebacate, triacetyl glycerin and the like, When it does, 10 mass% or less can be added with respect to the total mass of a compound and an binder which have an ethylenically unsaturated double bond.
상기 본 발명의 경화성 조성물은 고감도로 경화하고, 또한, 보존 안정성도 양호하다. 또한, 경화성 조성물을 적용하는 기판 등의 경질 재료 표면으로의 높은 밀착성을 나타낸다. 따라서, 본 발명의 경화성 조성물은 3차원 광조형이나 홀로그래피, 컬러 필터로 한 화상 형성 재료나 잉크, 도료, 접착제, 코팅제 등의 분야에 있어서 바람직하게 사용할 수 있다.The curable composition of the present invention is cured with high sensitivity, and storage stability is also good. Moreover, high adhesiveness to hard material surfaces, such as a board | substrate to which a curable composition is applied, is shown. Therefore, the curable composition of this invention can be used suitably in the field | areas of the image forming material, ink, coating material, adhesive agent, and coating agent which used three-dimensional optical shaping | molding, holography, and a color filter.
[컬러 필터 및 그 제조 방법][Color filter and its manufacturing method]
다음에, 본 발명의 컬러 필터 및 그 제조 방법에 관하여 설명한다.Next, the color filter of this invention and its manufacturing method are demonstrated.
본 발명의 컬러 필터는 지지체 상에 본 발명의 착색 화소 형성용 경화성 조성물을 사용하여 이루어지는 착색 패턴(착색 화소)과 차광부 형성용 경화성 조성물 을 이용하여 형성된 차광부(블랙 매트릭스)를 갖는 것을 특징으로 한다.The color filter of this invention has a coloring pattern (color pixel) which uses the curable composition for colored pixel formation of this invention, and the light shielding part (black matrix) formed using the curable composition for light shielding part formation on a support body, It is characterized by the above-mentioned. do.
이하, 본 발명의 컬러 필터에 대해서, 그 제조 방법을 통해서 상술한다.Hereinafter, the color filter of this invention is explained in full detail through the manufacturing method.
지지체 상에, 본 발명의 상기 각 경화성 조성물을 도포해서 경화성 조성물층을 형성하는 공정(이하, 적당하게 「경화성 조성물층 형성 공정 」이라고 약칭한다.)과 상기 경화성 조성물층을 마스크를 통하여 노광하는 공정(이하, 적당하게 「노광 공정」이라고 약칭한다.)과 노광 후의 상기 경화성 조성물층을 현상해서 착색 패턴을 형성하는 공정(이하, 적당하게 「현상 공정」이라고 약칭한다.)을 포함한다. 이 각 공정은 착색 화소를 형성할 경우도 차광부를 형성할 경우도 같다. 일반적으로는 우선, 차광부를 형성하고, 그 후에 RGB의 각 색상의 착색 화소를 형성한 다.The process of apply | coating each said curable composition of this invention on a support body, and forming a curable composition layer (henceforth abbreviated as "curable composition layer formation process suitably"), and the process of exposing the said curable composition layer through a mask. (Hereinafter, abbreviated as "exposure process" suitably.) And the process of developing the said curable composition layer after exposure, and forming a coloring pattern (henceforth abbreviated as "development process" suitably.). Each of these processes is the same as when forming a color pixel or when forming a light shielding part. Generally, first, a light shielding portion is formed, and then colored pixels of each color of RGB are formed.
이하, 본 발명의 제조 방법에 있어서의 각 공정에 관하여 설명한다.Hereinafter, each process in the manufacturing method of this invention is demonstrated.
<경화성 조성물층 형성 공정><Curable composition layer forming step>
경화성 조성물층 형성 공정에서는 지지체 상에 본 발명의 경화성 조성물을 도포해서 경화성 조성물층을 형성한다.In the curable composition layer forming step, the curable composition of the present invention is applied onto a support to form a curable composition layer.
본 공정에 사용할 수 있는 지지체로서는 예를 들면, 액정표시소자 등에 사용되는 무알칼리 유리, 소다 유리, 파이렉스(등록상표) 유리, 석영 유리 및 이들에 투명 도전막을 부착시킨 것이나, 고체 촬상 소자 등에 사용되는 광전 변환 소자 기판, 예를 들면, 실리콘 기판 등이 열거된다. 또한, 플라스틱 기판도 가능하다. 이들의 기판은 우선, 각 화소를 격리하도록 격자상 등에 차광부를 형성하고, 격자가 빈 부분에 착색 화소가 형성된다.Examples of the support that can be used in the present step include alkali-free glass, soda glass, pyrex (registered glass), quartz glass, and the like that have a transparent conductive film attached thereto, or are used in solid-state imaging devices. Photoelectric conversion element substrates, such as a silicon substrate, are mentioned. Plastic substrates are also possible. These substrates first form a light shielding portion on a grid or the like so as to isolate each pixel, and a colored pixel is formed in a portion where the grid is empty.
또한, 이들의 지지체 상에는 필요에 의해, 상부의 층과의 밀착 개량, 물질의 확산 방지 또는 기판 표면의 평탄화를 위해서 언더코팅층을 형성해도 좋다.Moreover, on these support bodies, you may form an undercoat layer as needed for the improvement of close_contact | adherence with the upper layer, the prevention of the diffusion of a substance, or the planarization of a board | substrate surface.
지지체 상으로의 본 발명의 경화성 조성물의 도포 방법으로서는 슬릿 도포, 잉크젯법, 회전 도포, 캐스팅 도포, 롤 도포, 스크린 인쇄법 등의 각종의 도포 방법을 적용할 수 있다.As a coating method of the curable composition of this invention on a support body, various coating methods, such as a slit coating, an inkjet method, a spin coating, casting coating, a roll coating, and a screen printing method, can be applied.
또한, 지지체상에 경화성 조성물 막을 형성하는 방법으로서는 상기 도포 방법이외에 미리 가지지체 상에 상기 방법에 의하여 도포해서 형성한 도막을 기판 상에 전사하는 방법을 적용할 수도 있다.Moreover, as a method of forming a curable composition film | membrane on a support body, the method of transferring the coating film formed by apply | coating by the said method on the support body in advance and forming on a board | substrate other than the said application method can also be applied.
전사 방법에 관해서는 일본특허공개 2006-23696호 공보의 단락번호[0023], [0036]∼[0051]이나, 일본특허공개 2006-47592호 공보의 단락번호[0096]∼[0108]에 기재된 제작 방법을 본 발명에 있어서도 바람직하게 사용할 수 있다.Regarding the transfer method, paragraphs [0023], [0036] to [0051] of JP-A-2006-23696 and paragraphs [0096] to [0108] of JP-A-2006-47592 are prepared. The method can also be preferably used in the present invention.
경화성 조성물의 도포막 두께는 형성하는 차광부, 착색 화소의 두께의 설계값에 의해 적시, 조제되지만, 일반적으로는 0.1∼10㎛가 바람직하고, 본 발명에 있어서는 착색층은 1.5∼2.5㎛, 차광부는 0.3∼1.0㎛의 범위인 것이 보다 바람직하다.Although the coating film thickness of a curable composition is prepared timely by the design value of the light shielding part to form and the thickness of a colored pixel, 0.1-10 micrometers is preferable generally, and in this invention, a colored layer is 1.5-2.5 micrometers, light-shielding As for a part, it is more preferable that it is the range of 0.3-1.0 micrometer.
기판 상에 도포된 경화성 조성물 층의 건조(프리 베이크)는 핫플레이트, 오븐 등에서 50℃∼140℃의 온도에서 10∼300초로 행할 수 있다.Drying (pre-baking) of the curable composition layer applied on the substrate can be performed at a temperature of 50 ° C to 140 ° C in a hot plate, oven, or the like for 10 to 300 seconds.
<노광 공정>Exposure process
노광 공정에서는 상기 경화성 조성물층 형성 공정에 있어서 형성된 경화성 조성물층을 소정의 마스크 패턴을 갖는 마스크를 통하여 노광한다.In an exposure process, the curable composition layer formed in the said curable composition layer formation process is exposed through the mask which has a predetermined mask pattern.
본 공정에 있어서의 노광은 도포막의 패턴 노광은, 소정의 마스크 패턴을 통하여 노광하고, 광조사된 도포막 부분만을 경화시켜, 현상액으로 현상하고, 각 색(3색 또는 4색)의 화소로 이루어지는 패턴상 피막을 형성함으로써 행할 수 있다.노광시에 사용할 수 있는 방사선으로서는 특히, g선, h선, i선 등의 자외선이 바람직하게 사용된다. 조사량은 5∼1500mJ/cm2가 바람직하고, 10∼1000mJ/cm2가 보다 바람직하고, 10∼500mJ/cm2가 가장 바람직하다.The exposure in this step is performed by exposing a pattern of the coating film through a predetermined mask pattern, curing only the irradiated coating film portion, developing with a developing solution, and forming pixels of each color (three or four colors). It can be performed by forming a patterned film. As radiation which can be used at the time of exposure, especially ultraviolet rays, such as g line | wire, h line | wire, i line | wire, are used preferably. Dose 5~1500mJ / cm 2 are preferred, 10~1000mJ / cm 2, and more preferably, 10~500mJ / cm 2 is most preferred.
본 발명의 컬러 필터가 액정표시소자용인 경우에는 상기 범위 중에서 5∼200mJ/cm2가 바람직하고, 10∼150mJ/cm2가 보다 바람직하고, 10∼100mJ/cm2가 가장 바람직하다. 노광기는 프록시미티 방식의 노광기라도 미러 프로젝션 방식이라도 또한 스텝퍼 방식이라도 사용가능하다.When the color filter of this invention is for liquid crystal display elements, 5-200 mJ / cm <2> is preferable in the said range, 10-150 mJ / cm <2> is more preferable, 10-100 mJ / cm <2> is the most preferable. The exposure machine can be a proximity exposure machine, a mirror projection system, or a stepper system.
또한, 본 발명의 컬러 필터가 고체 촬상 소자용인 경우에는 상기 범위 중에서 30∼1500mJ/cm2가 바람직하고, 50∼1000mJ/cm2가 보다 바람직하고, 80∼500mJ/cm2가 가장 바람직하다. 이 경우에는 i선의 스텝퍼 방식의 노광기가 바람직하다.Moreover, when the color filter of this invention is for a solid-state image sensor, 30-1500mJ / cm <2> is preferable in the said range, 50-1000mJ / cm <2> is more preferable, 80-500mJ / cm <2> is the most preferable. In this case, an i-line stepper exposure machine is preferable.
<현상 공정>Development Process
이어서, 알칼리 현상 처리를 행함으로써, 상기 노광에 의해 광미조사 부분을 알칼리 수용액에 용출시켜, 광경화한 부분만이 남는다. 현상액으로서는 고체촬상소자용인 경우에는 하지(下地)의 회로 등에 데미지를 일으키지 않는 유기 알칼리 현상액이 바람직하다. 액정표시장치용의 컬러 필터의 경우에는 무기 알칼리 현상액이 사용된다. 현상 온도로서는 보통 20℃∼30℃이고, 현상 시간은 20∼90초이다.Subsequently, by performing an alkali developing process, the tailings irradiation part is eluted in aqueous alkali solution by the said exposure, and only the part which photocured remains. As a developing solution, an organic alkali developing solution which does not cause damage to a circuit of an underlayer etc. in the case of a solid-state image sensor is preferable. In the case of a color filter for a liquid crystal display device, an inorganic alkali developer is used. As image development temperature, it is 20 degreeC-30 degreeC normally, and developing time is 20 to 90 second.
현상액에 사용하는 알칼리제로서는 예를 들면, 수산화 나트륨, 수산화 칼륨, 탄산 나트륨, 탄산 수소나트륨, 규산 나트륨, 메타규산 나트륨, 암모니아수, 에틸아민, 디에틸아민, 디메틸에탄올아민, 테트라메틸암모늄히드록시드, 테트라에틸암모늄히드록시드, 콜린, 피롤, 피페리딘, 1,8-디아자비시클로-[5,4,0]-7-운데센 등의 유기 알칼리성 화합물이 열거되고, 이들의 알칼리제를 농도가 0.001∼10질량%, 바람직하게는 0.01∼1질량%가 되도록 순수로 희석한 알칼리성 수용액이 현상액으로서 바람직하게 사용된다. 또한, 이러한 알칼리성 수용액으로 이루어지는 현상액을 사용했을 경우에는 일반적으로 현상 후 순수로 세정(린스)한다.As an alkali chemicals used for a developing solution, sodium hydroxide, potassium hydroxide, sodium carbonate, sodium hydrogen carbonate, sodium silicate, sodium metasilicate, ammonia water, ethylamine, diethylamine, dimethylethanolamine, tetramethylammonium hydroxide, Organic alkaline compounds such as tetraethylammonium hydroxide, choline, pyrrole, piperidine, 1,8-diazabicyclo- [5,4,0] -7-undecene, and these alkalizing agents The alkaline aqueous solution diluted with pure water so that it may be 0.001-10 mass%, Preferably it is 0.01-1 mass% is used suitably as a developing solution. In addition, when the developing solution which consists of such alkaline aqueous solution is used, it is generally wash | cleaned (rinse) with pure water after image development.
이어서, 잉여의 현상액을 세정 제거하고, 건조를 실시한 후에 가열 처리(포스트 베이킹)를 행한다. 이와 같이 각 색마다에 상기 공정을 순차적으로 반복하여 경화 피막을 제조할 수 있다.Subsequently, the excess developer is washed off and dried, followed by heat treatment (post baking). Thus, a cured film can be manufactured by repeating the said process for every color sequentially.
이것에 의해 컬러 필터가 얻어진다.As a result, a color filter is obtained.
포스트 베이킹은 경화를 완전한 것으로 하기 위한 현상 후의 가열 처리이고, 통상 100℃∼240℃의 열경화 처리를 행한다. 기판이 유리 기판 또는 실리콘 기판의 경우에는 상기 온도 범위 중에서도 200℃∼240℃가 바람직하다.Post-baking is the heat processing after image development to make hardening perfect, and the thermosetting process of 100 degreeC-240 degreeC is normally performed. When a board | substrate is a glass substrate or a silicon substrate, 200 degreeC-240 degreeC is preferable also in the said temperature range.
이 포스트 베이킹 처리는 현상 후의 도포막을 상기 조건이 되도록 핫플레이트나 컨벡션 오븐(열풍 순환식 건조기), 고주파 가열기 등의 가열 수단을 이용하여, 연속식 또는 배치식으로 행할 수 있다.This post-baking process can be performed continuously or batchwise using heating means, such as a hotplate, a convection oven (hot air circulation type dryer), and a high frequency heater, so that the coating film after image development may be said conditions.
또한, 본 발명의 제조 방법에 있어서는 상술한 경화성 조성물층 형성 공정, 노광 공정, 및 현상 공정을 행한 후에, 필요에 의해, 형성된 차광부나 착색 화소를 가열 및/또는 노광에 의해 경화하는 경화 공정을 포함하고 있어도 좋다.Moreover, the manufacturing method of this invention includes the hardening process of hardening the light shielding part and colored pixel which were formed by heating and / or exposure as needed after performing the above-mentioned curable composition layer formation process, exposure process, and image development process. You may do it.
이상에서 설명한 경화성 조성물층 형성 공정, 노광 공정, 및 현상 공정(또한 필요에 의해 경화 공정)을 행하고, 우선, 차광부를 형성한 후, 착색 화소의 형성을 위해 소망의 색상수만큼 이들의 공정을 반복함으로써, 차광부와 소망의 색상으로 이루어지는 착색 화소를 구비한 컬러 필터가 제작된다.The curable composition layer forming step, the exposure step, and the developing step (also a curing step if necessary) described above are performed. First, after forming the light shielding portion, these steps are repeated by the desired number of colors to form the colored pixels. Thereby, the color filter provided with the light shielding part and the coloring pixel which consists of a desired color is manufactured.
<컬러 필터를 구비한 액정표시장치><Liquid crystal display device with color filter>
본 발명의 표시장치로서는 액정표시장치, 플라즈마 디스플레이 표시장치, EL 표시장치, CRT 표시장치 등의 표시장치 등을 말한다. 표시장치의 정의나 각 표시장치의 설명은 예를 들면「전자 디스플레이 디바이스(사사키 아키오 저, Kogyo Chosakai Publishing, Inc. 1990년 발행)」, 「디스플레이 디바이스(이부키 스기아키 저, Sangyo-Tosho Publishing Co., Ltd. 1989년 발행)」등에 기재되어 있다.The display device of the present invention refers to a display device such as a liquid crystal display device, a plasma display display device, an EL display device, a CRT display device, and the like. For the definition of the display device and the description of each display device, see, for example, "Electronic display device (Akio Sasaki by Kogyo Chosakai Publishing, Inc. 1990)", "Display device (by Ibuki Sugiaki, Sangyo-Tosho Publishing Co. Ltd.). , Ltd., issued in 1989).
본 발명의 표시장치 중 액정표시장치가 특히 바람직하다. 액정표시장치에 대해서는 예를 들면 「차세대 액정 디스플레이 기술(우치다 타쯔오 편집, Kogyo Chosakai Publishing, Inc. 1994년 발행)」에 기재되어 있다. 본 발명을 적용할 수 있는 액정표시장치에 특별히 제한은 없고, 예를 들면 상기의 「차세대 액정 디스플레이 기술」에 기재되어 있는 각종 방식의 액정표시장치에 적용할 수 있다.Among the display devices of the present invention, liquid crystal display devices are particularly preferable. The liquid crystal display device is described, for example, in "next-generation liquid crystal display technology (Tatsuo Uchida editing, Kogyo Chosakai Publishing, Inc. 1994)." There is no restriction | limiting in particular in the liquid crystal display device which can apply this invention, For example, it can apply to the liquid crystal display device of various systems described in said "next-generation liquid crystal display technology."
본 발명은 이들 중에서 특히 컬러 TFT방식의 액정표시장치에 대하여 유효하다. 컬러 TFT방식의 액정표시장치에 대해서는 예를 들면, 「컬러 TFT액정 디스플레이(Kyoritsu Shuppan Co., Ltd. 1996년 발행)」에 기재되어 있다. 또한 본 발명은 IPS 등의 횡전계 구동 방식, MVA 등의 화소 분할 방식 등의 시야각이 확대된 액정표시장치나 STN, TN, VA, IPS, OCS, FFS, 및 R-OCB 등에도 적용할 수 있다. 이들의 방식에 대해서는 예를 들면 「EL, PDP, LCD디스플레이-기술과 시장의 최신동향-(도레이 리서치 센터 조사 연구 부문 2001년 발행)」의 43페이지에 기재되어 있다. 액정표시장치는 컬러 필터 이외에 전극 기판, 편광 필름, 위상차 필름, 백라이트, 스페이서, 시야각 보장 필름 등 각종 부재로 구성되다. 본 발명의 차광막을 갖는 기판은 이들 공지의 부재로 구성되는 액정표시장치에 적용할 수 있다.Among these, the present invention is particularly effective for a color TFT type liquid crystal display device. The liquid crystal display device of the color TFT system is described, for example, in "Color TFT liquid crystal display (Kyoritsu Shuppan Co., Ltd. issued in 1996)". In addition, the present invention can be applied to liquid crystal display devices having an enlarged viewing angle such as lateral electric field driving methods such as IPS and pixel division methods such as MVA, STN, TN, VA, IPS, OCS, FFS, and R-OCB. . These methods are described, for example, on page 43 of EL, PDP, LCD Display Technology and the Latest Trends in the Market (Published by Toray Research Center Research, 2001). In addition to the color filter, the liquid crystal display is composed of various members such as an electrode substrate, a polarizing film, a retardation film, a backlight, a spacer, a viewing angle guarantee film, and the like. The substrate having the light shielding film of the present invention can be applied to a liquid crystal display device composed of these known members.
이들의 부재에 대해서는 예를 들면, 「'94액정 디스플레이 주변 재료·케미 컬즈의 시장(토켄타로우, CMC Publishing Co., Ltd. 1994년 발행)」, 「2003 액정 관련 시장의 현재의 상태와 장래 전망(하권)(오모테료 요시, Fuji Kimer Research Institute 2003년 발행)」에 기재되어 있다.For the absence of these materials, for example, the "94 market of liquid crystal display peripheral materials and chemicals (Token Taro, CMC Publishing Co., Ltd. 1994 issuance)", "the current state and future of the liquid crystal related market in 2003" Prospect (the lower volume) (Omoteryo Yoshi, Fuji Kimer Research Institute, 2003).
백라이트에 관해서는 SID meeting Digest 1380(2005)(A.Konno et.al)이나, 월간 디스플레이 2005년 12월호의 18∼24페이지(시마 야스히로), 동 25∼30페이지(야기 타카아키) 등에 기재되어 있지만, 본 발명의 컬러 필터는 종래 공지의 냉음극관의 3파장관과 조합시켰을 때에 높은 콘트라스트를 실현할 수 있지만, 적색, 녹색, 청색 LED광원(RGB-LED)을 백라이트로 함으로써 휘도가 높고, 또한 색순도가 높은 색재현성의 양호한 액정표시장치를 제공할 수 있다.Backlights are described in SID meeting Digest 1380 (2005) (A.Konno et.al), pages 18-24 (Shima Yasuhiro), pages 25-30 (Yagi Takaaki), etc. The color filter of the present invention can realize high contrast when it is combined with the three-wavelength tube of a conventionally known cold cathode tube, but the luminance is high and the color purity is high by using a red, green, and blue LED light source (RGB-LED) as a backlight. A good liquid crystal display device having high color reproducibility can be provided.
본 발명과 같은 조성물을 사용해서 형성된 고광학 농도의 블랙 매트릭스 그것은 백라이트를 차광하고, 각 착색 화소부의 투과광을 샤프하게 해서 고정채에 시인하는 효과(쉐도우 효과)가 있다. 차광부의 OD값이 낮을 경우, 흑색 표시 시에 칠흑(漆黑)이 되지 않고, 시인 화상이 희미해진 것이 된다.The black matrix of high optical density formed using the composition like this invention has the effect (shadow effect) which light-shields a backlight, makes the transmitted light of each colored pixel part sharp, and visually recognizes it as a fixed color. When the OD value of the light shielding portion is low, the black image does not become black at the time of black display, and the visual image is blurred.
한편, 착색 화소부(이하 화소부)의 편극 소거(depolarization)가 낮으면, 화소내의 산란에 의해 백라이트가 차폐되지 않고 미광(迷光)이 생기고, 투과해서 소위 「광누설」, 「색누설」의 현상이 발생한다.(=저콘트라스트) 이 때에는 흑색 표시를 해도 화면전체가 착색되어 보인다. 예를 들면, 적색 화소부의 콘트라스트가 낮은 경우에는 붉으스럼하게 보이고, 청색 화소부의 콘트라스트가 낮을 경우에는 푸르스름하게 보이거나 하여 색재현성이 불량했다. 이 때문에 화소부의 콘트라스트를 향상시키는 것이 기대되어 요구되고 있었다.On the other hand, when the depolarization of the colored pixel portion (hereinafter referred to as the pixel portion) is low, the backlight is not shielded by scattering in the pixel, and stray light is generated, and the light is transmitted through the so-called "light leakage" and "color leakage". A phenomenon occurs. (= Low contrast) At this time, the entire screen is colored even when black display is performed. For example, when the contrast of the red pixel portion is low, it appears reddish, and when the contrast of the blue pixel portion is low, it appears bluish and poor in color reproducibility. For this reason, the improvement of the contrast of a pixel part was anticipated and requested | required.
본 발명에 있어서는 앞서 서술한 바와 같이 특정한 고분자 분산제를 포함하는 경화성 조성물의 사용에 의해, 착색 화소부에 사용하는 안료 미립자를 고분산시킬 수 있고, 이것에 의해 화소부의 콘트라스트 향상을 달성했다. 이 콘트라스트 향상과 차광부에 있어서의 고 OD값을 양립해서 처음으로, 본 발명과 같은 표시장치 전체로서 보았을 경우에도 충분한 효과의 발현이 달성되고, 표시장치로서의 더욱 높은 콘트라스트를 실현한 것이다.In the present invention, as described above, the use of the curable composition containing a specific polymer dispersant enables high dispersion of the pigment fine particles used in the colored pixel portion, thereby achieving contrast improvement in the pixel portion. When both the contrast improvement and the high OD value in the light shielding portion are compatible, the expression of a sufficient effect can be achieved even when viewed as an entire display device as the present invention for the first time, thereby realizing a higher contrast as the display device.
즉, 차광부를 고 OD값으로 함으로써, 차광부로 백라이트의 투과를 억제함과 아울러, 착색 화소부에서 차광부에 입사한 미광도 차단하는 효과를 발견하고, 화소부와 차광부의 상승 효과로 색재현성이 매우 양호해서 고정채한 표시장치를 얻은 것이다.That is, by setting the light shielding portion to a high OD value, it is possible to suppress the transmission of the backlight to the light shielding portion and to block the stray light incident on the light shielding portion from the colored pixel portion, and to realize color reproduction by the synergistic effect of the pixel portion and the light shielding portion. This was very good and a fixed display device was obtained.
또한, 표시장치로서는 보다 자연스러운 색재현이 요구되고 있다. 이 때문에 색재현성의 지표인 CRT와 동등한 대 NTSC비 70%정도를 더욱 향상시키는 것이 기대되고 있지만, 본 발명의 컬러 필터와 RGB-LED를 백라이트에 사용함으로써 색재현성이 대폭적으로 향상할 수 있다.In addition, as a display device, more natural color reproduction is required. For this reason, although it is expected to improve about 70% of NTSC ratio equivalent to CRT which is an index of color reproducibility, color reproducibility can be improved significantly by using the color filter and RGB-LED of this invention for a backlight.
또한, 한편으로 액정표시장치에 요구되는 성능은 화상의 응답 속도의 향상이다. 응답 속도의 향상을 위해 액정의 배향 속도의 개량이 이루어지고 있다. 한편 셀의 구조면에서는 액정층의 두께 저감이 코스트 다운의 점에서도 필요하다. 액정층의 두께 저감에 필요한 또 하나의 기술은, 화소부와 차광부의 경계 부분에서의 액정의 배향 흐트러짐을 작게 하는 것이다. 이것을 위해서는 경계부분에서의 단차를 작게 하는 것이 요구된다. 경계부의 흐트러짐을 저감함으로써 화소부와 차광부 의 시인성도 향상한다. 본 발명의 착색층은 적당한 알칼리 가용성과 소수성을 가지므로 각 착색 화소의 중합부가 평탄하게 되기 쉬운 것이다. 특히, 차광부의 두께가 작으면, 이 효과는 현저하고, 본 발명의 차광부와 조합시키면 차광부의 패턴의 직선성과 BM 상에서의 각 착색부의 중첩에 의한 평탄화가 양호해진다. 평탄성이 양호해지면 액정층을 박층화하거나, 투명전극 ITO를 부설하기 전에 평탄화층을 부여할 필요가 없어지고, 공정의 합리화 나아가서는 코스트 다운, 양산성에 공헌할 수 있는 것이다. 본 발명의 또 하나의 특징인 박층의 차광층의 실현이고, 이것과 조합함으로써 본 발명의 큰 요소인 착색부의 고콘트라스트 성능을 유감없이 발휘할 수 있다.On the other hand, the performance required for the liquid crystal display device is an improvement in the response speed of the image. In order to improve the response speed, the alignment speed of the liquid crystal has been improved. On the other hand, in terms of the structure of the cell, the thickness reduction of the liquid crystal layer is also necessary in terms of cost down. Another technique required for reducing the thickness of the liquid crystal layer is to reduce the orientation disturbance of the liquid crystal at the boundary portion between the pixel portion and the light shielding portion. For this purpose, it is required to reduce the step at the boundary portion. By reducing the disturbance of the boundary portion, the visibility of the pixel portion and the light shielding portion is also improved. Since the colored layer of this invention has moderate alkali solubility and hydrophobicity, the superposition | polymerization part of each colored pixel tends to become flat. In particular, when the thickness of the light shielding portion is small, this effect is remarkable, and when combined with the light shielding portion of the present invention, flatness due to the linearity of the pattern of the light shielding portion and the overlapping of each colored portion on the BM becomes good. If the flatness is good, there is no need to thin the liquid crystal layer or to provide a flattening layer before laying the transparent electrode ITO, and it can contribute to the rationalization of the process and the cost down and mass production. It is the realization of the thin light shielding layer which is another characteristic of this invention, and when combined with this, the high contrast performance of the coloring part which is a big element of this invention can be exhibited without regret.
(실시예)(Example)
이하, 본 발명을 실시예에 의해 더욱 구체적으로 설명하지만, 이하의 실시예에 한정되는 것은 아니다. 또한, 특별히 언급하지 않는 한, 「%」,「부」는 질량 기준이다.Hereinafter, although an Example demonstrates this invention further more concretely, it is not limited to a following example. In addition, "%" and "part" are mass references | standards unless there is particular notice.
[실시예 1]Example 1
<1. 차광용 경화성 조성물의 조제><1. Preparation of Shading Curable Composition>
1-1. 은주석 합금부를 갖는 입자의 분산액(분산액 K-1)의 조제1-1. Preparation of dispersion (dispersion liquid K-1) of particles having a silver tin alloy portion
순수 1000ml에 아세트산 은(I) 23.1g, 아세트산 주석(II) 65.1g, 글루콘산54g, 피롤린산 나트륨 45g, 폴리에틸렌글리콜(분자량 3,000) 2g, 및 PVP-K30(ISP·Japan Co., Ltd. 제작; 폴리비닐피롤리돈 폴리머) 5g을 용해하고, 용액 1을 얻었다. 별도, 순수 500ml에 히드록시 아세톤 46.1g을 용해하고, 용액 2를 얻었다.To 1,000 ml of pure water, acetic acid was added to 23.1 g of acetic acid (I), 65.1 g of tin (II) acetate, 54 g of gluconic acid, 45 g of sodium pyrophosphate, 2 g of polyethylene glycol (molecular weight: 3,000) and PVP- 5 g of polyvinylpyrrolidone polymer) was dissolved to obtain a solution 1. Separately, 46.1 g of hydroxy acetone was dissolved in 500 ml of pure water, and Solution 2 was obtained.
상기에서 얻은 용액 1을 25℃로 유지하면서 격렬하게 교반하면서, 이것에 상기의 용액 2를 2분간 걸쳐서 첨가하고, 완만하게 6시간 교반을 계속했다. 혼합액이 흑색으로 변화되고, 은주석 합금부를 갖는 금속 입자(이하,「은주석 합금부 함유 입자」라고 하는 경우가 있다.)가 얻어졌다. 이어서, 이 혼합액을 원심분리해서 은 주석 합금부 함유 입자를 침전시켰다. 원심 분리는 150ml의 액량으로 소구분하고, 탁상 원심 분리기 H-103n(Ipros Corporation 제작)을 이용하여 회전수 2,000r.p.m.으로 30분간 행했다. 상청액을 버려서 전체 액량을 150ml로 하고 이것에 순수 1350ml을 첨가하고, 15분간 교반해서 은주석 합금부 함유 입자를 다시 분산시켰다. 이 재분산액을 상기와 같은 방법으로 원심 분리해서 은주석 합금부 함유 입자를 침전시켰다. 이 조작(순수의 첨가와 원심분리)을 2회 반복해서 은주석 합금부 함유 입자를 세정했다. The solution 2 was added to this over 2 minutes, stirring vigorously, maintaining solution 1 obtained above at 25 degreeC, and stirring was continued for 6 hours gently. The liquid mixture changed to black, and metal particles (hereinafter, referred to as "silver tin alloy portion-containing particles") having silver tin alloy portions were obtained. Next, this mixed solution was centrifuged to precipitate the silver tin alloy portion-containing particles. The centrifugation was subdivided into a liquid amount of 150 ml, and was carried out for 30 minutes at a rotational speed of 2,000 r.p.m. using a tabletop centrifuge H-103n (manufactured by Ipros Corporation). The supernatant liquid was discarded to make the total liquid amount to 150 ml, 1350 ml of pure water was added thereto, and stirred for 15 minutes to disperse the silver-tin alloy portion-containing particles again. The redispersion was centrifuged in the same manner as described above to precipitate the silver tin alloy portion-containing particles. This operation (addition of pure water and centrifugation) was repeated twice to wash the silver tin alloy portion-containing particles.
상기에서 얻어진 은주석 합금부 함유 입자를 다시 분산액으로 하고, 이 분산액에 대하여 원심분리를 더 행하고, 은주석 합금부 함유 입자를 다시 침전시켰다. 원심분리는 상기와 동일한 조건으로 행했다. 원심분리한 후, 상기와 동일하게 상청액을 버려서 전체 액량을 150ml로 하고, 이것에 순수 850ml 및 노르말프로필알콜 500ml를 첨가하고, 15분간 더 교반해서 은주석 합금부 함유 입자를 다시 분산시켰다.The silver tin alloy part containing particle | grains obtained above were made into a dispersion liquid, centrifugation was further performed with respect to this dispersion liquid, and the silver tin alloy part containing particle was precipitated again. Centrifugation was performed on the same conditions as the above. After centrifugation, the supernatant was discarded in the same manner as described above to make the total liquid amount to 150 ml, 850 ml of pure water and 500 ml of normal propyl alcohol were added thereto, and the mixture was further stirred for 15 minutes to further disperse the silver-tin alloy portion-containing particles.
다시 상기와 동일하게 하여 원심분리를 행하고, 은주석 합금부 함유 입자를 침전시킨 후, 상기와 동일하게 상청액을 버려서 액량을 150ml로 하고, 이것에 순수150ml 및 노르말 프로필 알콜1200ml을 첨가해서 15분간 더 교반하고, 은주석 합금 부 함유 입자를 다시 분산시켰다. 그리고 다시, 원심분리를 행했다. 이 때의 원심분리의 조건은 시간을 90분으로 연장시킨 것 이외는 상기와 동일하다. 그 후에 상청액을 버려서 전체 액량을 70ml로 하고, 이것에 노르말 프로필 알콜 30ml을 첨가했다. 이것을 아이거 밀(아이거 밀 M-50형(메디아: 직경 0.65mm 지르코니아 비즈 130g, Eiger Japan Co., Ltd. 제작)을 이용하여 6시간 분산시키고, 은주석 합금부 함유 입자(은주석 입자 농도 25질량%, PVP-K30 잔량 1.0질량%)의 분산액(분산액 K-1)을 조제했다.In the same manner as above, centrifugation was carried out, and the silver-tin alloy part-containing particles were precipitated, and then the supernatant was discarded in the same manner as above to make 150 ml of liquid, and 150 ml of pure water and 1200 ml of normal propyl alcohol were added thereto for 15 minutes. It stirred and disperse | distributed the silver tin alloy part containing particle again. And again, centrifugation was performed. The conditions for centrifugation at this time were the same as above except that the time was extended to 90 minutes. Thereafter, the supernatant was discarded to make the total liquid amount 70 ml, and 30 ml of normal propyl alcohol was added thereto. This was dispersed for 6 hours using an Eiger mill (Eiger Mill M-50 type (media: 130 g of diameter 0.65 mm zirconia beads, manufactured by Eiger Japan Co., Ltd.), and the silver tin alloy portion-containing particles (silver tin particle concentration of 25 masses). %, The dispersion liquid (dispersion liquid K-1) of PVP-K30 residual amount 1.0 mass%) was prepared.
상기에서 얻어진 은주석 합금부 함유 입자를 Hitachi Ltd. 제작의 HD-2300과 Noran사 제작의 EDS(에너지 분산형 X선 분석 장치)를 이용하여 분석한 바, AgSn 합금(2θ=39.5°)과 Sn금속(2θ=30.5°)으로 이루어지는 복합체인 것이 X선 산란에 의해 확인되었다. 여기서, 괄호내의 숫자는 각각의 (III)면의 산란각이다. 또한, 이 분산액 K-1 중의 은주석 합금부 함유 입자의 수평균 입자 지름은 약 40nm이었다.Silver-tin alloy part containing particle | grains obtained above were made into Hitachi Ltd. The composite was composed of AgSn alloy (2θ = 39.5 °) and Sn metal (2θ = 30.5 °) as analyzed using HD-2300 manufactured by Eran (Energy Dispersive X-ray Analyzer) manufactured by Noran. It was confirmed by line scattering. Here, the number in parentheses is the scattering angle of each (III) plane. In addition, the number average particle diameter of the silver tin alloy part containing particle | grains in this dispersion liquid K-1 was about 40 nm.
상기 수평균 입자 지름은 투과형 전자 현미경 JEM-2010(JEOL Ltd. 제작, 배율 10만배, 가속 전압 200kV)에 의해 얻어진 사진을 이용하여 이하와 같이 하여 행했다. 입자 100개를 선택하고, 각각의 입자상과 같은 면적의 원의 직경을 입자 지름으로 하여 100개의 입자의 입자 지름의 평균값을 수평균 입자 지름으로 했다.The said number average particle diameter was performed as follows using the photograph obtained by transmission electron microscope JEM-2010 (made by JEOL Ltd., magnification 100,000 times, acceleration voltage 200kV). 100 particles were selected and the average value of the particle diameters of 100 particles was taken as the number average particle diameter with the diameter of the circle having the same area as that of each particle as the particle diameter.
1-2. 황화은 미립자를 갖는 입자의 분산액(분산액 K-2)의 조제1-2. Preparation of dispersion (dispersion liquid K-2) of particles having silver sulfide fine particles
디에틸아미노에탄올 100ml에 아세트산은 25.2g을 용해했다(용액 3). 별도 에탄올 100ml에 황화 암모늄 25.8g을 용해했다(용액 4). 25℃로 유지한 용액 3을 격 렬하게 교반하면서, 이것에 용액 4를 첨가했다. 그 후 완만하게 15분간 교반을 계속했다. 혼합액이 흑색으로 변화되어서 황화은이 생성되었다. 그 후 8시간 정지해서 황화은을 침전시켜서 상청액을 버렸다. 이어서, 메틸에틸케톤 100ml을 가하여 15분간 교반한 후 8시간 정지해서 황화은을 침전시켜서 상청액을 버렸다. 이 조작을 다시 반복했다. 이렇게 해서 얻어진 황화은 슬러리에 메틸에틸케톤을 가해 전체량을 50ml로 했다. 이 황화은 분산액을 직경 0.3mm의 지르코니아 비즈 40g과 함께 용량 100ml의 유리병에 넣어서 페인트 셰이커로 6시간 분산시켰다. 분산 후 유리 비즈를 제거하고, 황화은 미립자 분산액 K-2을 얻었다. 얻어진 액량은 47mL, 황화은 양은 17.2g이었다. 이 미립자를 투과형 전자 현미경 관찰하면 평균 입자 지름은 약20nm이었다.25.2 g of acetic acid was dissolved in 100 ml of diethylaminoethanol (solution 3). 25.8 g of ammonium sulfide was dissolved in 100 ml of ethanol separately (solution 4). Solution 4 was added to this, stirring solution 3 kept at 25 degreeC vigorously. Then, stirring was continued gently for 15 minutes. The mixed solution turned black, producing silver sulfide. After stopping for 8 hours, silver sulfide was precipitated and the supernatant was discarded. Subsequently, 100 ml of methyl ethyl ketone was added thereto, stirred for 15 minutes, and then stopped for 8 hours to precipitate silver sulfide to discard the supernatant. This operation was repeated again. Methyl ethyl ketone was added to the silver sulfide slurry obtained in this way, and the total amount was 50 ml. This silver sulfide dispersion was put into a 100 ml glass bottle with 40 g of 0.3 mm diameter zirconia beads and dispersed in a paint shaker for 6 hours. The glass beads were removed after dispersion to obtain a silver sulfide fine particle dispersion K-2. The amount of liquid obtained was 47 mL and the amount of silver sulfide was 17.2 g. When the microparticles | fine-particles were observed with the transmission electron microscope, the average particle diameter was about 20 nm.
1-3. 카본 블랙 분산액(K-3)의 조제1-3. Preparation of Carbon Black Dispersion (K-3)
하기 처방으로 카본 블랙 분산액 K-3을 조제했다.Carbon black dispersion liquid K-3 was prepared by the following prescription.
·카본 블랙(Degussa사 제작, 컬러 블랙 FW2) … 26.7부Carbon black (manufactured by Degussa, color black FW2); Part 26.7
·분산제(Kusumoto Chemicals, Ltd. 제작, 디스파론 DA7500 산가 26 아민가40) … 3.3부Dispersant (manufactured by Kusumoto Chemicals, Ltd., Disparon DA7500 acid number 26 amine number 40). Part 3.3
·벤질메타크릴레이트/메타크릴산(=72/28몰비) 공중합체,Benzyl methacrylate / methacrylic acid (= 72/28 molar ratio) copolymer,
Mw10000 , 프로필렌글리콜모노메틸에테르아세테이트의 50wt% 용액 … 10부 Mw10000, 50 wt% solution of propylene glycol monomethyl ether acetate. Part 10
·프로필렌글리콜모노메틸에테르아세테이트 … 60부Propylene glycol monomethyl ether acetate... 60 copies
상기 조성물을 3000rpm의 조건으로 호모지나이저를 이용하여 1시간 교반했 다. 얻어진 혼합 용액을 0.3mm 지르코니아 비즈를 사용한 비즈 분산기(상품명:디스퍼맷, GETZMANN사 제작)로 8시간 미분산 처리를 실시하고, 분산물을 얻었다.The composition was stirred for 1 hour using a homogenizer at 3000 rpm. The obtained mixed solution was microdispersed for 8 hours using the bead disperser (brand name: dispermat, the GETZMANN company make) using 0.3 mm zirconia beads, and the dispersion was obtained.
1-4. 차광용 경화성 조성물의 조제1-4. Preparation of light-shielding curable composition
얻어진 차광용 분산액을 이용하여, 하기 표 1의 처방으로 경화성 조성물을 조제했다. 표 중의 숫자는 질량비를 나타낸다.The curable composition was prepared by the prescription of following Table 1 using the obtained light-shielding dispersion liquid. The numbers in the table represent the mass ratios.
표 중에 사용한 각 화합물의 상세한 것은 이하에 나타내는 바와 같다.The detail of each compound used in the table is as showing below.
·화합물 C-1: 상기 화학식(JS-1) 중 a=1, b=13, c=30, d=12, e=44인 화합물을 나타낸다. 또한, 표 중의 숫자는 공중합 질량%를 나타낸다.Compound C-1: a compound having a = 1, b = 13, c = 30, d = 12, e = 44 in the formula (JS-1). In addition, the number in a table | surface shows copolymerization mass%.
·수지 용액 C-2: 벤질메타크릴레이트/메타크릴산(=85/15몰비) 공중합체, (Mw 10000, 프로필렌글리콜모노메틸에테르아세테이트의 50wt% 용액)Resin solution C-2: Benzyl methacrylate / methacrylic acid (= 85/15 molar ratio) copolymer, (Mw 10000, 50 wt% solution of propylene glycol monomethyl ether acetate)
·UV경화성 수지 C-3: 상품명 사이크로머 P ACA-250 Daicel Chemical Industries, Ltd. 제작UV curable resin C-3: trade name Cymer P ACA-250 Daicel Chemical Industries, Ltd. making
[측쇄에 지환, COOH기, 아크릴로일기가 있는 아크릴계 공중합체, 프로필렌글리콜모노메틸에테르아세테이트 용액(고형분: 50질량%)][Acrylic copolymer having alicyclic, COOH group, acryloyl group in the side chain, propylene glycol monomethyl ether acetate solution (solid content: 50% by mass)]
·중합성 화합물 C-4: 디펜타에리스리톨펜타·헥사아크릴레이트Polymerizable compound C-4: dipentaerythritol pentahexahexaacrylate
(상품명 DPHA Nippon Kayaku Co., Ltd. 제작)(Product name DPHA Nippon Kayaku Co., Ltd. production)
·중합성 화합물 C-5: 상품명 TO-1382 Toagosei Co., Ltd. 제작Polymerizable Compound C-5: trade name TO-1382 Toagosei Co., Ltd. making
디펜타에리스리톨펜타아크릴레이트의 말단 OH기의 일부를 COOH기에 치환한 5관능의 아크릴로일기를 갖는 모노머가 주성분.The monomer which has a 5-functional acryloyl group which substituted a part of terminal OH group of dipentaerythritol pentaacrylate with COOH group is a main component.
·개시제 C-6: 상품명 「일가큐어 379」Chiba Specialty Chemicals K.K. 제작Initiator C-6: trade name "Ilgacure 379" by Chiba Specialty Chemicals K.K. making
·개시제 C-7: 상품명 「OXE-02」Chiba Specialty Chemicals K.K. 제작Initiator C-7: trade name "OXE-02" Chiba Specialty Chemicals K.K. making
·계면활성제 C-8: 상품명 「메가팩 R30」Dainippon Ink Corporation 제작Surfactant C-8: Product name "Megapack R30" produced by Dainippon Ink Corporation
·용제: MEK=메틸에틸케톤Solvent: MEK = methylethyl ketone
PGMEA=프로필렌글리콜모노메틸에테르아세테이트 PGMEA = propylene glycol monomethyl ether acetate
EEP=3-에톡시에틸프로피오네이트 EEP = 3-Ethoxyethyl Propionate
<2-1. 도포에 의한 블랙 매트릭스(BM)의 형성><2-1. Formation of Black Matrix (BM) by Application>
얻어진 차광용 경화성 조성물 CK-2∼CK-4을 유리 기판(Corining Incorporated 제작 밀레니엄 0.7mm두께)에 슬릿 간격 100㎛, 도포 유효폭 500mm의 슬릿 헤드를 구비한 슬릿 도포장치를 이용하여, 슬릿 도포 적성의 평가를 행했다. 포스트 베이킹 후의 막두께가 0.5㎛∼1.5㎛이 되도록 슬릿과 유리 기판간의 간격, 토출량을 조절하고, 도포 속도 100mm/초로 도포했다.The obtained shading curable compositions CK-2 to CK-4 were used on a glass substrate (0.7 mm thickness of Corining Incorporated) using a slit coating apparatus having a slit head having a slit interval of 100 µm and a coating effective width of 500 mm. Evaluation was performed. The space | interval between a slit and a glass substrate, and discharge amount were adjusted so that the film thickness after post-baking might be 0.5 micrometer-1.5 micrometers, and it apply | coated at the application | coating speed | rate 100 mm / sec.
이어서, 핫플레이트를 이용하여, 100℃에서 120초간 가열(프리 베이킹 처리)을 행한 후, HITACHI 노광기 LE5565(전 파장)을 이용하고, 선폭 10㎛의 마스크로 프록시미티 갭을 300㎛로 하여, 100mJ/cm2로 노광하였다(조도: 20mW/cm2).Subsequently, after heating (prebaking) at 100 degreeC for 120 second using a hotplate, 100mJ was made into 100 micrometers by using a HITACHI exposure machine LE5565 (full wavelength) and making a proximity gap 300 micrometers with the mask of 10 micrometers of line widths. It was exposed at / cm 2 (roughness: 20 mW / cm 2 ).
그 후에 수산화 칼륨계 현상액 CDK-1(Fuji Film Electronics Materials Co., Ltd. 제작)의 1.0% 현상액(25℃)으로 현상하고, 순수로 세정했다. 이어서 220℃의 크린 오븐에서 30분간 포스트 베이킹 처리하고, 착색 화소형성 영역의 개구가 90㎛×200㎛가 되도록 차광층의 선폭이 약 13㎛인 격자상 블랙 매트릭스 기판을 형성했다.Then, it developed with 1.0% developer (25 degreeC) of potassium hydroxide type developing solution CDK-1 (made by Fuji Film Electronics Materials Co., Ltd.), and wash | cleaned with pure water. Subsequently, it post-baked for 30 minutes in the 220 degreeC clean oven, and formed the grid | lattice-shaped black-matrix board | substrate whose line width of a light shielding layer is about 13 micrometers so that opening of a colored pixel formation area might be 90 micrometer x 200 micrometers.
<2-2. 전사에 의한 블랙 매트릭스(BM)의 형성><2-2. Formation of Black Matrix (BM) by Transfer>
2-2-1. 감광성 전사 재료의 제작2-2-1. Fabrication of Photosensitive Transfer Material
두께 75㎛의 폴리에틸렌테레프탈레이트 필름 가지지체(PET 가지지체) 상에 슬릿상 노즐을 이용하여, 하기의 열가소성 수지층용 도포액을 도포, 건조시켜서 열가소성 수지층을 형성했다.The following coating liquid for thermoplastic resin layers was apply | coated and dried using the slit-shaped nozzle on the 75-micrometer-thick polyethylene terephthalate film support body (PET support body), and the thermoplastic resin layer was formed.
[열가소성 수지층용 도포액의 처방][Prescription of Coating Liquid for Thermoplastic Resin Layer]
·메탄올 … 11.1부Methanol; Part 11.1
·프로필렌글리콜모노메틸에테르아세테이트 … 6.36부Propylene glycol monomethyl ether acetate... Part 6.36
·메틸에틸케톤 … 52.4부Methyl ethyl ketone. Part 52.4
·메틸메타크릴레이트/2-에틸헥실아크릴레이트/벤질메타크릴레이트/메타크릴산 공중합체(공중합비[몰비]=55/11.7/4.5/28.8, 중량평균 분자량=9만, Tg≒70℃) … 5.83부Methyl methacrylate / 2-ethylhexyl acrylate / benzyl methacrylate / methacrylic acid copolymer (copolymerization ratio [molar ratio] = 55 / 11.7 / 4.5 / 28.8, weight average molecular weight = 90,000, Tg ≒ 70 ° C) … Part 5.83
·스티렌/아크릴산 공중합체 … 13.6부Styrene / acrylic acid copolymer Part 13.6
(공중합비[몰비]=63/37, 중량평균 분자량=1만, Tg≒100℃)(Copolymerization ratio [molar ratio] = 63/37, weight average molecular weight = 10,000, Tg ≒ 100 ° C)
·2,2-비스[4-(메타크릴옥시폴리에톡시)페닐]프로판(Shin-Nakamura Chemical Co., Ltd.제작; 비스페놀A에 펜타에틸렌글리콜모노메타크릴레이트를 2당량 탈수 축합한 화합물) … 9.1부2,2-bis [4- (methacryloxypolyethoxy) phenyl] propane (manufactured by Shin-Nakamura Chemical Co., Ltd .; a compound in which bisphenol A is dehydrated and condensed with 2 equivalents of pentaethylene glycol monomethacrylate) … Part 9.1
·계면활성제 C-8 … 0.54부Surfactant C-8... 0.54part
이어서, 이 열가소성 수지층 상에 하기 처방의 중간층용 도포액을 더 도포하고, 건조시켜서 중간층을 적층했다. 이어서, 중간층 상에 차광용 경화성 조성물 CK-1을 도포하고, 건조시켜서 흑색의 감광성 조성물층을 더 적층했다. 이상과 같이 하여 PET 가지지체 상에 건조층 두께 14.6㎛의 열가소성 수지층과 건조층 두께 1.6㎛의 중간층과 광학 농도(OD)가 4.5가 되도록 감광성 조성물층을 형성하고, 감광성 조성물층의 표면에 보호 필름(두께 12㎛의 폴리프로필렌 필름)을 압착하고, 가지지체/열가소성 수지층/중간층/감광성 조성물 층의 적층 구조에 구성된 감광성 전사 재료를 제작했다. 이하, 이것을 BM용 감광성 전사 재료로 한다.Next, the coating liquid for intermediate | middle layers of the following prescription was further apply | coated on this thermoplastic resin layer, it was made to dry, and the intermediate | middle layer was laminated | stacked. Subsequently, light-shielding curable composition CK-1 was apply | coated on the intermediate | middle layer, it dried, and further laminated | stacked the black photosensitive composition layer. A photosensitive composition layer is formed on the PET support as described above so that the thermoplastic resin layer having a dry layer thickness of 14.6 μm, the intermediate layer having a dry layer thickness of 1.6 μm, and the optical density (OD) is 4.5, and is protected on the surface of the photosensitive composition layer. The film (polypropylene film of 12 micrometers in thickness) was crimped | bonded, and the photosensitive transfer material comprised in the laminated structure of the support body / thermoplastic resin layer / middle layer / photosensitive composition layer was produced. Hereinafter, this is used as the photosensitive transfer material for BM.
[중간층용 도포액의 처방][Prescription of Intermediate Layer Coating Liquid]
·폴리비닐알콜(PVA-105, Kuraray Co., Ltd. 제작) … 3.0부Polyvinyl alcohol (PVA-105, manufactured by Kuraray Co., Ltd.) Part 3.0
·카르복시메틸셀룰로오스(TC-5E, Shin-Etsu Chemical Co., Ltd. 제작) … 0.15부Carboxymethyl cellulose (TC-5E, manufactured by Shin-Etsu Chemical Co., Ltd.). 0.15part
·계면활성제 2(서프론 S-131, Seimi Chemical Co., Ltd.) … 0.01부Surfactant 2 (Supron S-131, Seimi Chemical Co., Ltd.) 0.01 part
·증류수 … 524부·Distilled water … 524 copies
·메탄올 … 429부Methanol; Part 429
2-2-2. 블랙 매트릭스(BM)의 형성2-2-2. Formation of Black Matrix (BM)
유리 기판(Corining Incorporated제작 밀레니엄 0.7mm두께)을, 25℃로 조온한 유리 세정제액을 샤워에 의해 20초간 블로잉하면서 나일론 모를 갖는 회전 브러시로 세정하고, 순수 샤워 세정 후, 실란 커플링 액(N-β(아미노 에틸)γ-아미노프로필트리메톡시실란 0.3질량% 수용액; 상품명:KBM603, Shin-Etsu Chemical Co., Ltd. 제작)을 샤워에 의해 20초간 블로잉하여 순수 샤워 세정했다. 그 후에 이 기판을 기판 예비 가열 장치에 의해 100℃에서 2분간 가열하고, 라미네이터로 보냈다.The glass substrate (0.7 mm thickness made by Corining Incorporated) was washed with a rotary brush having a nylon wool while blowing the glass cleaner liquid heated to 25 ° C. for 20 seconds by a shower, and after washing with pure water, the silane coupling liquid (N- 0.3 mass% aqueous solution of (beta) (amino ethyl) (gamma) -aminopropyl trimethoxysilane; brand name: KBM603 by Shin-Etsu Chemical Co., Ltd.) was blown with a shower for 20 second, and the pure water shower was wash | cleaned. Then, this board | substrate was heated at 100 degreeC for 2 minutes with the board | substrate preheating apparatus, and it sent to the laminator.
실란 커플링 처리 후의 유리 기판에, 상기에서 얻은 BM용 감광성 전사 재료로부터 보호 필름을 박리제거하고, 제거 후에 노출된 감광성 조성물 층의 표면과 상기 유리 기판의 표면이 접하도록 중첩하여, 라미네이터 LamicII형[Hitachi Plant Technologies, Ltd. 제작]을 이용하여, 고무 롤러 온도 130℃, 선압 100N/cm, 반송 속도 2.2m/분의 조건으로 라미네이트했다.The protective film is peeled off from the photosensitive transfer material for BM obtained above to the glass substrate after a silane coupling process, and it overlaps so that the surface of the photosensitive composition layer exposed after removal may contact the surface of the said glass substrate, and the laminator type LamicII [ Hitachi Plant Technologies, Ltd. Production] was laminated under the conditions of a rubber roller temperature of 130 ° C., a linear pressure of 100 N / cm, and a conveyance speed of 2.2 m / min.
이어서, PET 가지지체를 열가소성 수지층과의 계면에서 박리하고, 가지지체를 제거했다. 가지지체를 박리 후, 초고압 수은등을 구비한 프록시미티형 노광기(Hitachi High-Tech Engineering Corporation 제작)를 이용하여, 기판과 마스크(화상 패턴을 갖는 석영 노광 마스크)를 수직으로 세운 상태에서, 마스크면과 감광성 조성물층의 사이의 거리를 200㎛로 설정하고, 노광량 30mJ/cm2로 패턴 노광했다.Subsequently, the PET support was peeled off at the interface with the thermoplastic resin layer, and the support was removed. After peeling off the supporting member, the substrate surface and the mask (a quartz exposure mask having an image pattern) were vertically placed using a proximity exposure machine (manufactured by Hitachi High-Tech Engineering Corporation) equipped with an ultra-high pressure mercury lamp. The distance between the photosensitive composition layers was set to 200 micrometers, and pattern exposure was performed by exposure amount 30mJ / cm <2> .
다음에, 트리에탄올아민계 현상액(트리에탄올아민 30질량% 함유, 상품명: T-PD2, FujiFilm Corporation 제작)을 순수로 12배(T-PD2을 1질량부와 순수를 11질량부의 비율로 혼합)로 희석한 액(30℃)을 이용하여 50초간, 플랫 노즐로 압력0.04MPa로 하여 샤워 현상하고, 열가소성 수지층과 중간층을 제거했다. 이어서, 이 기판 상에 에어를 블로잉하여 액제거한 후, 순수를 샤워에 의해 10초간 블로잉하여 순수 샤워 세정을 행하고, 에어를 블로잉하여 기판상의 액고임을 감소시켰다.Next, the triethanolamine-based developer (containing 30% by mass of triethanolamine, trade name: T-PD2, manufactured by FujiFilm Corporation) was diluted with pure water 12 times (mixing 1 part by mass of T-PD2 with 11 parts by mass of pure water). Using one liquid (30 degreeC) for 50 second, it shower-developed by the flat nozzle at the pressure of 0.04 Mpa, and removed the thermoplastic resin layer and the intermediate | middle layer. Subsequently, air was blown onto the substrate to remove the liquid, and then pure water was blown by a shower for 10 seconds to perform pure shower cleaning, and air was blown to reduce the liquid level on the substrate.
이어서, 탄산 Na계 현상액(0.38mol/L의 탄산수소나트륨, 0.47mol/L의 탄산나트륨, 5질량%의 디부틸나프탈렌술폰산 나트륨, 음이온 계면활성제, 소포제, 및 안정제 함유; 상품명: T-CD1, FujiFilm Corporation 제작)을 순수로 5배로 희석한 액(29℃)을 이용하여 30초간, 콘형 노즐로 압력 0.15MPa로 샤워 현상을 행해서 감광성 조성물층을 현상 제거하고, 패턴상을 얻었다.Next, containing Na carbonate developer (0.38 mol / L sodium hydrogen carbonate, 0.47 mol / L sodium carbonate, 5 mass% sodium dibutylnaphthalenesulfonate, anionic surfactant, antifoamer, and stabilizer; brand name: T-CD1, FujiFilm Corporation) was shower-developed at a pressure of 0.15 MPa with a cone nozzle for 30 seconds using a solution diluted five times with pure water (29 ° C) to develop and remove the photosensitive composition layer, thereby obtaining a pattern image.
이어서, 세정제(인산염, 규산염, 비이온 계면활성제, 소포제, 및 안정제 함유; 상품명: T-SD1, FujiFilm Corporation 제작)를 순수로 10배로 희석한 액(33℃) 을 이용하여 20초간, 콘형 노즐로 압력 0.02MPa으로 샤워로 하여 블로잉하고, 또한 나일론모를 갖는 회전 브러시에 의해 패턴상을 문질러서 잔류물 제거를 행하여 블랙 매트릭스를 얻었다.Subsequently, with a cone-shaped nozzle for 20 seconds using a liquid (33 ° C) diluted 10-fold with a pure water (containing a phosphate, silicate, nonionic surfactant, antifoaming agent, and stabilizer; trade name: T-SD1, manufactured by FujiFilm Corporation). Blowing was performed by shower at a pressure of 0.02 MPa, and the residue was removed by rubbing the pattern image with a rotary brush having nylon wool to obtain a black matrix.
또한, 그 후에 블랙 매트릭스가 형성된 기판에 대하여, 양면으로부터 초고압수은 등으로 500mJ/cm2의 노광량으로 포스트 노광 후, 220℃에서 15분간 열처리(베이킹)를 행하고, 선폭 14㎛의 차광층을 형성한 블랙 매트릭스 기판을 제작했다.Subsequently, a post-exposure was performed on the substrate on which the black matrix was formed at an exposure amount of 500 mJ / cm 2 from both sides with ultra-high pressure mercury or the like, followed by heat treatment (baking) at 220 ° C. for 15 minutes to form a light shielding layer having a line width of 14 μm. A black matrix substrate was produced.
차광성의 측정은 투과 농도계 X-RITE 310T을 이용하여 비주얼 모드에서의 광학 농도(OD값)로 측정했다. 막두께는 포스트 베이킹 후의 기판을 ULVAC, Inc. 제작의 촉침식 막두께 측정기 DECTAC-3로 측정했다.The light-shielding property was measured by the optical density (OD value) in visual mode using the transmission density meter X-RITE 310T. The thickness of the substrate after the post-baking ULVAC, Inc. It measured with the produced stylus type film thickness measuring instrument DECTAC-3.
이하, 도포 및/또는 전사에 의해 블랙 매트릭스가 형성된 유리 기판을 「BM기판」이라고 칭하고, 얻어진 BM기판을 표 2에 정리했다.Hereinafter, the glass substrate in which the black matrix was formed by application | coating and / or transfer was called "BM board | substrate," and the obtained BM board | substrate was put together in Table 2.
<3. 착색 감광성 수지 조성물의 조제><3. Preparation of colored photosensitive resin composition>
3-1. 적색 경화성 조성물의 조제3-1. Preparation of Red Curable Composition
하기 RED분산액 조성 R-1을 3000rpm의 조건으로 호모지나이저를 이용하여 1시간 교반했다. 얻어진 혼합 용액을 0.3mm 지르코니아 비즈를 이용하여 비즈 분산기(상품명:디스퍼맷, GETZMANN사 제작)로 4시간 미분산 처리를 실시해 분산액 R-1을 얻었다.The following RED dispersion composition R-1 was stirred for 1 hour using a homogenizer on 3000 rpm conditions. The obtained mixed solution was microdispersed for 4 hours using the bead disperser (brand name: dispermat, the GETZMANN company make) using 0.3 mm zirconia beads, and dispersion liquid R-1 was obtained.
(RED R-1 분산액)(RED R-1 dispersion)
·Pigment Red 254(SEM 관찰에서의 평균 입자 지름 20nm) … 11부Pigment Red 254 (average particle diameter 20 nm in SEM observation). Part 11
·Pigment Red 177(SEM 관찰에서의 평균 입자 지름 18nm) … 4부Pigment Red 177 (average particle diameter 18 nm in SEM observation). Part 4
·분산 수지 A-1 … 5부Dispersion resin A-1. Part 5
[단량체 M-4/메타크릴산/말단 메타크릴로일화 폴리메틸메타크릴레이트 공중합체(10/15/75질량%, 중량평균 분자량 20000, 산가 98mg/g) 상기 분산 수지: 예시 화합물(6)][Monomer M-4 / methacrylic acid / terminal methacryloylated polymethyl methacrylate copolymer (10/15/75 mass%, weight average molecular weight 20000, acid value 98 mg / g) The said dispersion resin: Exemplary compound (6) ]
·분산제(상품명: Disperbyk-161, BYK-Chemie K.K. 제작) … 3부Dispersant (brand name: Disperbyk-161, manufactured by BYK-Chemie K.K.). Part Three
프로필렌글리콜모노메틸에테르아세테이트의 30%용액30% solution of propylene glycol monomethyl ether acetate
·알칼리가용성 수지: 벤질메타크릴레이트/메타크릴산공중합체 … 4부Alkali-soluble resin: benzyl methacrylate / methacrylic acid copolymer Part 4
=75/25[질량비]공중합체, 중량평균 분자량 Mw: 5000)의 프로필렌글리콜모노메틸에테르아세테이트 용액(고형분: 50질량%)Propylene glycol monomethyl ether acetate solution (solid content: 50 mass%) of = 75/25 [mass ratio] copolymer, weight average molecular weight Mw: 5000)
·용제 B: 프로필렌글리콜모노메틸에테르아세테이트 … 73부Solvent B: propylene glycol monomethyl ether acetate... Part 73
(RED CR-1 도포액)(RED CR-1 Coating Liquid)
·RED R-1의 분산액 … 100부Dispersion of RED R-1. 100 copies
·에폭시 수지: (상품명 EHPE3150 Daicel Chemical Industries, Ltd. 제작) … 2부Epoxy resin: (trade name: EHPE3150 produced by Daicel Chemical Industries, Ltd.). Part Two
·중합성 화합물: 디펜타에리스리톨펜타·헥사아크릴레이트 … 8부Polymerizable compound: dipentaerythritol pentahexahexa ... Part 8
·중합 개시제: 4-(o-브로모-p-N,N-디(에톡시카르보닐메틸)아미노-페닐)-2,6-디(트리클로로메틸)-s-트리아진 … 1부Polymerization initiator: 4- (o-bromo-p-N, N-di (ethoxycarbonylmethyl) amino-phenyl) -2,6-di (trichloromethyl) -s-triazine... chapter 1
·중합 개시제: 2-벤질-2-디메틸아미노-1-(4-모르폴리노페닐)-부타논-1 … 1부Polymerization initiator: 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butanone-1... chapter 1
·중합 개시제: 디에틸티옥산톤 … 0.5부Polymerization initiator: diethyl thioxanthone... 0.5 part
·중합 금지제: p-메톡시페놀 … 0.001부Polymerization inhibitor: p-methoxyphenol... 0.001 copies
·불소계 계면활성제(상품명: Megafac R30 Dainippon Ink Corporation 제작제) … 0.01부Fluorine-based surfactant (trade name: manufactured by Megafac R30 Dainippon Ink Corporation). 0.01 part
·비이온계 계면활성제(상품명: 테트로닉 R150 ADEKA 제작) … 0.2부Nonionic surfactant (trade name: manufactured by Tetronic R150 ADEKA)... 0.2 part
·용제: 프로필렌글리콜 n-부틸에테르아세테이트 … 30부Solvent: Propylene glycol n-butyl ether acetate Part 30
·용제: 프로필렌글리콜모노메틸에테르아세테이트 … 100부Solvent: Propylene glycol monomethyl ether acetate 100 copies
상기 조성을 혼합 교반하고, 경화성 착색 조성물의 CR-1 도포액을 얻었다.The said composition was mixed and stirred, and the CR-1 coating liquid of curable coloring composition was obtained.
3-2. 녹색 경화성 조성물의 조제3-2. Preparation of Green Curable Composition
실시예 1의 R-1 조성을 하기 G-1 분산액 조성으로 변경하여 분산물을 얻었다.The R-1 composition of Example 1 was changed to the following G-1 dispersion composition to obtain a dispersion.
(GREEN G-1 분산액)(GREEN G-1 dispersion)
·Pigment Green 36(SEM 관찰에서의 평균 입자지름 19nm) … 11부Pigment Green 36 (average particle diameter 19 nm in SEM observation). Part 11
·Pigment Yellow 150(SEM 관찰에서의 평균 입자지름 22nm) … 7부Pigment Yellow 150 (average particle diameter 22 nm in SEM observation). Part 7
·분산 수지 A-2 … 5부Dispersion resin A-2. Part 5
[예시 구조 단위(M'-6)을 형성할 수 있는 단량체/메타크릴산/말단 메타크릴로일화 폴리메틸메타크릴레이트 공중합체(12/17/71질량%, 중량평균 분자량 50000, 산가 110mg/g) 상기 분산 수지: 예시 화합물(X)]EXAMPLES Monomer / methacrylic acid / terminal methacryloylated polymethyl methacrylate copolymer (12/17/71 mass%, weight average molecular weight 50000, acid value 110 mg / which can form structural unit (M'-6) g) said dispersion resin: exemplary compound (X)];
·분산제(상품명: Disperbyk-161, BYK-Chemie K.K.제작 30% 용액) … 3부Dispersant (brand name: Disperbyk-161, BYK-Chemie K.K. 30% solution). Part Three
·알칼리 가용성 수지: 벤질메타크릴레이트/메타크릴산 공중합체 … 4부=85/15[질량비] 공중합체, 중량평균 분자량 Mw: 5000)의 프로필렌글리콜모노메틸에테르아세테이트 용액(고형분: 50질량%)Alkali-soluble resin: benzyl methacrylate / methacrylic acid copolymer 4 parts = 85/15 [mass ratio] copolymer, the weight average molecular weight Mw: 5000) propylene glycol monomethyl ether acetate solution (solid content: 50 mass%)
·용제: 프로필렌글리콜모노메틸에테르아세테이트 … 70부Solvent: Propylene glycol monomethyl ether acetate 70 copies
(GREEN CG-1 도포액)(GREEN CG-1 coating liquid)
·GREEN G-1 분산액 … 100부· GREEN G-1 dispersion... 100 copies
·에폭시 수지: (상품명 EHPE3150, Daicel Chemical Industries, Ltd. 제작) … 2부Epoxy resin: (trade name EHPE3150, manufactured by Daicel Chemical Industries, Ltd.). Part Two
·중합성 화합물: 디펜타에리스리톨펜타·헥사아크릴레이트 … 6부Polymerizable compound: dipentaerythritol pentahexahexa ... Part 6
·중합성 화합물: 펜타에리스리톨의 테트라(에톡시아크릴레이트) … 2부Polymerizable compound: tetra (ethoxyacrylate) of pentaerythritol; Part Two
·중합 개시제: 1, 3-비스트리할로메틸-5-벤조옥솔란트리아민 … 2부Polymerization initiator: 1,3-bistrihalomethyl-5-benzooxolatritriamine... Part Two
·중합 개시제: 2-벤질-2-디메틸아미노-1-(4-모르폴리노페닐)-부타논-1 … 1부Polymerization initiator: 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butanone-1... chapter 1
·중합 개시제: 디에틸티옥산톤 … 0.5부Polymerization initiator: diethyl thioxanthone... 0.5 part
·중합 금지제: p-메톡시페놀 … 0.001부Polymerization inhibitor: p-methoxyphenol... 0.001 copies
·불소계 계면활성제(상품명: Megafac R08 Dainippon Ink Corporation 제작제) … 0.02부Fluorine-based surfactant (trade name: manufactured by Megafac R08 Dainippon Ink Corporation). 0.02part
·비이온계 계면활성제(상품명: 이뮬겐 A-60, Kao Corporation 제작) … 0.5부Nonionic surfactant (trade name: Emulgen A-60, manufactured by Kao Corporation)... 0.5 part
·용제: 프로필렌글리콜모노메틸에테르아세테이트 … 120부Solvent: Propylene glycol monomethyl ether acetate 120 copies
·용제: 프로필렌글리콜 n-프로필에테르아세테이트 … 30부Solvent: Propylene glycol n-propyl ether acetate Part 30
상기 조성을 혼합 교반하고, 경화성 착색 조성물 CG-1의 도포액을 얻었다.The said composition was mixed and stirred, and the coating liquid of curable coloring composition CG-1 was obtained.
3-3. 녹색 경화성 조성물의 조제3-3. Preparation of Green Curable Composition
상기 3-2. 녹색 경화성 조성물의 조제에 있어서, (GREEN CG-1 도포액)에 사용한 중합 개시제: 1,3-비스트리할로메틸-5-벤조옥솔란트리아민을 중합 개시제: 4-(o-브로모-p-N,N-디(에톡시카르보닐메틸)아미노-페닐)-2,6-디(트리클로로메틸)-s-트리아진으로 변경한 것 이외는 CG-1도포액과 동일하게 조제하여 본 발명에 따른 착색 화소 형성용 경화성 조성물(GREEN CG-2 도포액)을 얻었다.Said 3-2. In the preparation of the green curable composition, the polymerization initiator used for (GREEN CG-1 coating liquid): 1,3-bistrihalomethyl-5-benzooxolatritriamine is polymerized initiator: 4- (o-bromo- The present invention was prepared in the same manner as in the CG-1 coating solution except that pN, N-di (ethoxycarbonylmethyl) amino-phenyl) -2,6-di (trichloromethyl) -s-triazine was changed. The curable composition for coloring pixel formation (GREEN CG-2 coating liquid) which concerns on this was obtained.
3-4. 청색 경화성 조성물의 조제3-4. Preparation of Blue Curable Compositions
실시예 1의 R-1 조성을 하기 BLUE B-1 분산액 조성으로 변경하여 분산물을 얻었다.The R-1 composition of Example 1 was changed to the following BLUE B-1 dispersion composition to obtain a dispersion.
(BLUE B-1 분산액)(BLUE B-1 dispersion)
·Pigment Blue 15:6(SEM 관찰에서의 평균 입자 지름 15nm) … 14부Pigment Blue 15: 6 (average particle diameter 15 nm in SEM observation). Part 14
·Pigment Violet 23(SEM 관찰에서의 평균 입자 지름 23nm) … 1부Pigment Violet 23 (average particle diameter 23 nm in SEM observation). chapter 1
·분산 수지 A-3 … 5부Dispersion resin A-3. Part 5
[하기 합성예에서 얻어진 특정 분산 수지(B-1)에 속하는 분산 수지][Dispersion resin which belongs to specific dispersion resin (B-1) obtained by the following synthesis example]
·분산제(상품명: Disperbyk-161, BYK-Chemie K.K. 제작 30% 용액) … 3부Dispersant (trade name: Disperbyk-161, BYK-Chemie K.K. 30% solution). Part Three
·알칼리 가용성 수지: 벤질메타크릴레이트/메타크릴산 공중합체 … 4부Alkali-soluble resin: benzyl methacrylate / methacrylic acid copolymer Part 4
=80/20[질량비]공중합체, 중량평균 분자량 Mw:5000)의 프로필렌글리콜모노메틸에테르아세테이트 용액(고형분: 50질량%)= 80/20 [mass ratio] copolymer, the weight average molecular weight Mw: 5000) propylene glycol monomethyl ether acetate solution (solid content: 50 mass%)
·용제: 프로필렌글리콜모노메틸에테르아세테이트 … 73부Solvent: Propylene glycol monomethyl ether acetate Part 73
[합성예: 분산제 A-3의 합성]Synthesis Example Synthesis of Dispersant A-3
(1. 연쇄이동제 A3의 합성)(1.Synthesis of Chain Transfer Agent A3)
디펜타에리스리톨헥사키스(3-메르캅토프로피오네이트)[DPMP; Sakai Chemical Industry Co., Ltd. 제작] 7.83부, 및 하기의 흡착 부위를 갖고, 또한 탄소-탄소 이중 결합을 갖는 화합물(m-6) 4.55부를 프로필렌글리콜모노메틸에테르 28.90부에 용해시켜, 질소기류 하, 70℃에서 가열했다. 이것에 2, 2'-아조비스(2,4-디메틸발레로니트릴)[V-65, Wako Pure Chemical Industries, Ltd. 제작] 0.04부를 첨가해서 3시간 가열했다. 또한 V-65을 0.04부 가하여, 질소 기류 하, 70℃에서 3시간 반응시켰다. 실온까지 냉각함으로써 이하에 나타내는 본 발명에 따른 메르캅탄 화합물(연쇄이동제 A3)의 30% 용액을 얻었다.Dipentaerythritol hexakis (3-mercaptopropionate) [DPMP; Sakai Chemical Industry Co., Ltd. Preparation] 4.55 parts of compound (m-6) which has 7.83 parts and the following adsorption site, and has a carbon-carbon double bond was melt | dissolved in 28.90 parts of propylene glycol monomethyl ether, and it heated at 70 degreeC under nitrogen stream. 2,2'-azobis (2,4-dimethylvaleronitrile) [V-65, Wako Pure Chemical Industries, Ltd. Production] 0.04 parts were added and heated for 3 hours. Furthermore, 0.04 part of V-65 was added and it was made to react at 70 degreeC under nitrogen stream for 3 hours. By cooling to room temperature, a 30% solution of the mercaptan compound (chain transfer agent A3) according to the present invention shown below was obtained.
(2. 분산 수지의 합성)(2.Synthesis of Dispersion Resin)
상기한 바와 같이 해서 얻어진 연쇄이동제 A3의 30% 용액 4.99부, 메타크릴산 메틸 19.0부, 및 메타크릴산 1.0부, 프로필렌글리콜모노메틸에테르 4.66부의 혼합 용액을 질소 기류 하, 90℃에서 가열했다. 이 혼합 용액을 교반하면서, 2,2'-아조비스이소부티르산 디메틸[V-601, Wako Pure Chemical Industries, Ltd. 제작] 0.139부, 프로필렌글리콜모노메틸에테르 5.36부, 프로필렌글리콜모노메틸에테르 아세테이트 9.40부의 혼합 용액을 2.5시간 걸쳐서 적하했다. 적하 종료하고 나서, 90℃에서 2.5시간 반응시킨 후, 2,2'-아조비스이소부티르산 디메틸 0.046부, 프로필렌글리콜모노메틸에테르아세테이트 4.00부의 혼합 용액을 투입하고, 2시간 더 반응시켰다. 반응액에 프로필렌글리콜모노메틸에테르 1.52부, 프로필렌글리콜모노메틸에테르아세테이트 21.7부를 가하여, 실온까지 냉각함으로써 (B-1) 특정 분산 수지(A-3: 폴리스티렌 환산의 중량평균 분자량 24000)의 용액(특정 분산 수지 30질량%, 프로필렌글리콜모노메틸에테르 21질량%, 프로필렌글리콜모노메틸에테르아세테이트 49질량%)을 얻었다.The mixed solution of 4.99 parts of 30% solution of the chain transfer agent A3 obtained as mentioned above, 19.0 parts of methyl methacrylate, 1.0 part of methacrylic acid, and 4.66 parts of propylene glycol monomethyl ether was heated at 90 degreeC under nitrogen stream. While stirring the mixed solution, 2,2'-azobisisobutyric acid dimethyl [V-601, Wako Pure Chemical Industries, Ltd. Preparation] The mixed solution of 0.139 parts, 5.36 parts of propylene glycol monomethyl ether, and 9.40 parts of propylene glycol monomethyl ether acetate was dripped over 2.5 hours. After completion | finish of dripping, after making it react at 90 degreeC for 2.5 hours, the mixed solution of 0.046 parts of dimethyl 2,2'- azobisisobutyric acid and 4.00 parts of propylene glycol monomethyl ether acetate was thrown in, and it was made to react for 2 hours. 1.52 parts of propylene glycol monomethyl ether and 21.7 parts of propylene glycol monomethyl ether acetate were added to the reaction solution, followed by cooling to room temperature (B-1) solution of specific dispersion resin (A-3: weight average molecular weight 24000 in terms of polystyrene) (specific 30 mass% of dispersion resin, 21 mass% of propylene glycol monomethyl ether, and 49 mass% of propylene glycol monomethyl ether acetate) were obtained.
이 (B-1) 특정 분산 수지 A-3의 산가는 48mg/g이었다. 특정 분산 수지 A-3의 구조를 이하에 나타낸다.The acid value of this (B-1) specific dispersion resin A-3 was 48 mg / g. The structure of specific dispersion resin A-3 is shown below.
(BLUE CB-1 도포액)(BLUE CB-1 coating liquid)
·BLUE B-1분산액 … 100부BLUE B-1 dispersion. 100 copies
·알칼리 가용성 수지: 벤질메타크릴레이트/메타크릴산공중합체 … 6부Alkali-soluble resin: benzyl methacrylate / methacrylic acid copolymer Part 6
=80/20[질량비]공중합체, 중량평균 분자량 Mw:5000)의 프로필렌글리콜모노메틸에테르아세테이트 용액(고형분: 50질량%)= 80/20 [mass ratio] copolymer, the weight average molecular weight Mw: 5000) propylene glycol monomethyl ether acetate solution (solid content: 50 mass%)
·에폭시 수지: (상품명 셀록사이드 2080 Daicel Chemical Industries, Ltd. 제작) … 2부Epoxy resin: (brand name Celoxide 2080 Daicel Chemical Industries, Ltd.). Part Two
·UV경화성 수지:(상품명 사이크로머 P ACA-250 Daicel Chemical Industries, Ltd. 제작) … 4부UV curable resin: (trade name Cymer P ACA-250 produced by Daicel Chemical Industries, Ltd.) Part 4
측쇄에 지환, COOH기, 아크릴로일기가 있는 아크릴계 공중합체Acrylic copolymer with alicyclic, COOH, and acryloyl groups in the side chain
프로필렌글리콜모노메틸에테르아세테이트 용액(고형분: 50질량%)Propylene glycol monomethyl ether acetate solution (solid content: 50% by mass)
·중합성 화합물: 디펜타에리스리톨펜타·헥사아크릴레이트 … 12부Polymerizable compound: dipentaerythritol pentahexahexa ... Part 12
·중합 개시제:1-(9-에틸-6-(2-메틸벤조일)-9H-카르바졸-3-일)-1-(o-아세틸 옥심)에타논 … 3부Polymerization initiator: 1- (9-ethyl-6- (2-methylbenzoyl) -9H-carbazol-3-yl) -1- (o-acetyl oxime) ethanone Part Three
·중합 금지제: p-메톡시페놀 … 0.001부Polymerization inhibitor: p-methoxyphenol... 0.001 copies
·불소계 계면활성제(상품명: Megafac R08 Dainippon Ink Corporation 제작제) … 0.02부Fluorine-based surfactant (trade name: manufactured by Megafac R08 Dainippon Ink Corporation). 0.02part
·비이온계 계면활성제(상품명: 이뮬겐 A-60 Kao Corporation 제작) … 1.0부Nonionic surfactant (trade name: manufactured by Emulgen A-60 Kao Corporation); 1.0 part
·용제: 3-에톡시프로피온산 에틸 … 20부Solvent: 3-ethoxypropionate ethyl Part 20
·용제: 프로필렌글리콜모노메틸에테르아세테이트 … 150부Solvent: Propylene glycol monomethyl ether acetate 150 copies
상기 조성을 혼합 교반하고, 경화성 착색 조성물 CB-1의 도포액을 얻었다.The said composition was mixed and stirred, and the coating liquid of curable coloring composition CB-1 was obtained.
3-5. 청색 경화성 조성물의 조제3-5. Preparation of Blue Curable Compositions
상기 3-4. 청색 경화성 조성물의 조제에 있어서, (BLUE CB-1도포액)에 사용한 중합 개시제: 1-(9-에틸-6-(2-메틸벤조일)-9H-카르바졸-3-일)-1-(o-아세틸옥심)에탄온을 중합 개시제: 4-(o-브로모-p-N,N-디(에톡시카르보닐메틸)아미노-페닐)-2,6-디(트리클로로메틸)-s-트리아진으로 변경한 것 이외는 CB-1 도포액과 동일하게 하여 조제해서 본 발명에 따른 착색 화소 형성용 경화성 조성물(BLUE CB-2 도포액)을 얻었다.3-4. The polymerization initiator used for (BLUE CB-1 coating liquid) in the preparation of a blue curable composition: 1- (9-ethyl-6- (2-methylbenzoyl) -9H-carbazol-3-yl) -1- ( o-acetyloxime) ethanone polymerization initiator: 4- (o-bromo-pN, N-di (ethoxycarbonylmethyl) amino-phenyl) -2,6-di (trichloromethyl) -s-tri Except having changed into azine, it prepared similarly to CB-1 coating liquid and obtained the curable composition for colored pixel formation (BLUE CB-2 coating liquid) which concerns on this invention.
[비교예][Comparative Example]
<1. 적색 경화성 조성물의 조제><1. Preparation of Red Curable Composition>
RED R-1에서 분산 수지 A-1의 부분을 알칼리 가용성 수지로 변경하고, 즉 하기 RED 조성 R-2로 분산액을 작성했다.In RED R-1, the part of dispersion resin A-1 was changed to alkali-soluble resin, ie, the dispersion liquid was created with the following RED composition R-2.
(RED R-2 분산액)(RED R-2 Dispersion)
·Pigment Red 254(SEM 관찰에서의 평균 입자지름 20nm) … 11부Pigment Red 254 (average particle diameter 20 nm in SEM observation). Part 11
·Pigment Red 177(SEM 관찰에서의 평균 입자지름 18nm) … 4부Pigment Red 177 (average particle diameter 18 nm in SEM observation). Part 4
·분산제(상품명: Disperbyk-161, BYK-Chemie K.K.제작 30% 용액) … 3부Dispersant (brand name: Disperbyk-161, BYK-Chemie K.K. 30% solution). Part Three
·알칼리 가용성 수지: 벤질메타크릴레이트/메타크릴산 공중합체 … 14부=75/25[질량비] 공중합체, 중량평균 분자량 Mw: 5000)의 프로필렌글리콜모노메틸에테르아세테이트 용액(고형분: 50질량%)Alkali-soluble resin: benzyl methacrylate / methacrylic acid copolymer Propylene glycol monomethyl ether acetate solution (solid content: 50 mass%) of 14 parts = 75/25 [mass ratio] copolymer and a weight average molecular weight Mw: 5000)
·프로필렌글리콜모노메틸에테르아세테이트 … 68부Propylene glycol monomethyl ether acetate... Part 68
CR-1 조성에서 R-1의 대신에 R-2를 이용하여 비교용의 착색 화소 형성용 경화성 조성물(RED CR-3)을 조제했다.Instead of R-1 in CR-1 composition, the comparative curable composition for coloring pixel formation (RED CR-3) was prepared using R-2.
<2. 녹색 경화성 조성물의 조제><2. Preparation of Green Curable Composition>
GREEN G-1에서 분산 수지 A-2의 부분을 알칼리 가용성 수지로 변경하고, 즉 하기 조성 G-2로 분산액을 작성했다.The part of dispersion resin A-2 was changed to alkali-soluble resin in GREEN G-1, ie, the dispersion liquid was created with the following composition G-2.
(GREEN G-2 분산액)(GREEN G-2 dispersion)
·Pigment Green 36(SEM 관찰에서의 평균 입자 지름 19nm) … 11부Pigment Green 36 (average particle diameter 19 nm in SEM observation). Part 11
·Pigment Yellow 150(SEM 관찰에서의 평균 입자 지름 22nm) … 7부Pigment Yellow 150 (average particle diameter 22 nm in SEM observation). Part 7
·분산제(상품명: Disperbyk-161, BYK-Chemie K.K. 제작 30% 용액) … 3부Dispersant (trade name: Disperbyk-161, BYK-Chemie K.K. 30% solution). Part Three
·알칼리 가용성 수지: 벤질메타크릴레이트/메타크릴산 공중합체 … 14부Alkali-soluble resin: benzyl methacrylate / methacrylic acid copolymer Part 14
=85/15[질량비] 공중합체, 중량평균 분자량 Mw: 5000)의 프로필렌글리콜모노메틸에테르아세테이트 용액(고형분: 50질량%)Propylene glycol monomethyl ether acetate solution (solid content: 50 mass%) of = 85/15 [mass ratio] copolymer and a weight average molecular weight Mw: 5000)
·프로필렌글리콜모노메틸에테르아세테이트 … 68부Propylene glycol monomethyl ether acetate... Part 68
CG-1 조성에서 G-1의 대신에 G-2을 이용하여 비교용의 착색 화소 형성용 경화성 조성물(GREEN CG-3)을 조제했다.In the CG-1 composition, a curable composition for forming colored pixels for comparison (GREEN CG-3) was prepared using G-2 instead of G-1.
<3. 청색 경화성 조성물의 조제><3. Preparation of Blue Curable Composition>
BLUE B-1에서 분산 수지 A-3의 부분을 알칼리 가용성 수지로 변경하고, 즉 하기 조성 B-2로 분산액을 작성했다.The part of dispersion resin A-3 was changed to alkali-soluble resin in BLUE B-1, ie, the dispersion liquid was created with the following composition B-2.
(BLUE B-2 분산액)(BLUE B-2 dispersion)
·Pigment Blue 15:6(SEM 관찰에서의 평균 입자지름 15nm) … 14부Pigment Blue 15: 6 (average particle diameter 15 nm in SEM observation). Part 14
·Pigment Violet 23(SEM 관찰에서의 평균 입자지름 23nm) … 1부Pigment Violet 23 (average particle diameter 23 nm in SEM observation). chapter 1
·분산제(상품명: Disperbyk-161, BYK-Chemie K.K. 제작 30% 용액) … 3부Dispersant (trade name: Disperbyk-161, BYK-Chemie K.K. 30% solution). Part Three
·알칼리 가용성 수지: 벤질메타크릴레이트/메타크릴산공중합체 … 14부Alkali-soluble resin: benzyl methacrylate / methacrylic acid copolymer Part 14
=80/20[질량비] 공중합체, 중량평균 분자량 Mw: 5000)의 프로필렌글리콜모노메틸에테르아세테이트 용액(고형분: 50질량%)= 80/20 [mass ratio] copolymer, the weight average molecular weight Mw: 5000) propylene glycol monomethyl ether acetate solution (solid content: 50 mass%)
·프로필렌글리콜모노메틸에테르아세테이트 … 68부Propylene glycol monomethyl ether acetate... Part 68
CB-1 조성에서 B-1 대신에 B-2을 이용하여 비교용의 착색 화소 형성용 경화성 조성물(BLUE CB-3)을 조제했다.A curable composition for forming colored pixels for comparison (BLUE CB-3) was prepared by using B-2 instead of B-1 in the CB-1 composition.
<평가 결과><Evaluation result>
이하에 나타낸 바와 같이 단색으로 착색층을 형성하고, 상기 착색층(착색 화소에 상당)의 기판 상에서의 평가를 행하고, 결과를 표 3, 4에 나타냈다. 또한, 다색의 착색 화소를 형성한 컬러 필터의 평가 결과는 표 5에 정리했다.As shown below, the colored layer was formed in monochromatic color, evaluation of the said colored layer (equivalent to the colored pixel) on the board | substrate was performed, and the result was shown to Tables 3 and 4. In addition, the evaluation result of the color filter which formed the multi-colored coloring pixel was put together in Table 5.
<단색에서의 착색층의 형성><Formation of Colored Layer in Monochromatic>
슬릿 간격 100㎛, 도포 유효폭 500mm의 슬릿 헤드를 구비한 슬릿 도포 장치를 이용하여, 슬릿 도포 적성의 평가를 행했다. 통상의 방법으로 10장 유리 기판(폭 550mm, 길이 650mm, 두께 0.7mm) 상에 도포한 후에, 상기 슬릿 헤드를 공중에 5분간 대기시켜, 강제 건조시켰다. 대기 후 3초간 더미 디스펜스(dummy dispense)하고, 그대로 유리 기판에 단속으로 10장 슬릿 도포했다. 포스트 베이킹 후의 도막두께가 2㎛가 되도록 슬릿과 유리 기판간의 간격을 조절하고, 도포 속도 100mm/초로 경화성 조성물을 도포했다. 도포 후, 핫플레이트에서, 90℃, 60초간 프리베이킹한 후, 도포면의 라인상의 불균일의 개수를 나트륨 광원을 이용하여 육안으로 카운트하고, 이하의 기준으로 평가했다.Slit coating aptitude was evaluated using the slit coating apparatus provided with the slit head of 100 micrometers of slit spaces, and 500 mm of coating effective widths. After apply | coating on 10 glass substrates (width 550mm, length 650mm, thickness 0.7mm) by a conventional method, the said slit head was made to air hold for 5 minutes, and it forcedly dried. Dummy dispense was performed for 3 seconds after waiting, and 10 sheets of slit were applied to the glass substrate as it was intermittently. The space | interval between a slit and a glass substrate was adjusted so that the coating film thickness after postbaking might be set to 2 micrometers, and the curable composition was apply | coated at the application | coating speed | rate 100 mm / sec. After application, after prebaking at 90 ° C. for 60 seconds on a hot plate, the number of irregularities on the line of the application surface was visually counted using a sodium light source, and the following criteria were evaluated.
A: 도포면에 라인상의 불균일이 전혀 없는 것A: No nonuniformity in line on the coated surface
B: 라인상의 불균일이 1∼5개 관찰된 것B: 1-5 nonuniformity in a line was observed
C: 라인상의 얼룩이 6개이상 관찰된 것C: 6 or more spots on the line were observed
동시에 XY스테이지를 지닌 광학 현미경으로 10㎛이상의 크기의 이물의 유무를 관찰하고, 이물의 수를 계측하고, 기판 1장당의 수로 나타냈다.At the same time, the presence or absence of a foreign material having a size of 10 µm or more was observed with an optical microscope having an XY stage, the number of foreign materials was measured, and the number per substrate was shown.
콘트라스트는 후술하는 방법에 의해 측정했다.Contrast was measured by the method mentioned later.
표 3에서, 본 발명의 착색 화소 형성용 경화성 조성물을 이용하여 형성된 착색 패턴은 비교예에 대하여, 도포 불균일도 이물의 혼입도 없고, 고콘트라스트인 것이 판명된다. 또한 색순도, 휘도가 우수하고, 컬러 필터의 화소로서 바람직한 것이 확인되었다. 또한, 표 4의 결과로부터, 백라이트로서, RGB-LED를 사용하면 3파장관을 사용했을 경우와 비교하여, 색순도, 휘도의 향상을 한층 더 달성할 수 있는 것이 확인되었다.In Table 3, it turns out that the coloring pattern formed using the curable composition for colored pixel formation of this invention is a high contrast, without application | coating nonuniformity and mixing of a foreign material with respect to a comparative example. Moreover, it was confirmed that it was excellent in color purity and brightness | luminance, and is preferable as a pixel of a color filter. In addition, from the results in Table 4, it was confirmed that when RGB-LED is used as the backlight, improvement in color purity and luminance can be further achieved as compared with the case where three wavelength tubes are used.
<컬러 필터의 제작><Production of color filter>
얻어진 착색 경화성 조성물을 상기 BM기판의 BM형성면 측에, 단색의 착색층 형성과 동일한 공정으로 도포했다. 포스트 베이킹 후의 막두께가 1.5㎛∼3.0㎛가 되도록 슬릿과 BM기판간의 간격, 토출량을 조절하고, 도포 속도 100mm/초에서 도포했다. 이어서, 핫플레이트를 이용하여, 100℃에서 120초간 가열(프리 베이킹 처리)을 행한 후, HITACHI 노광기 LE 5565(전 파장)을 이용하여, 프록시미티 갭을 300㎛로 하여, 100mJ/cm2로 노광하였다(조도: 20mW/cm2). 그 후에 수산화 칼륨계 현상액CDK-1(Fuji Film Electronics Materials Co., Ltd.(주) 제작)의 1.0% 현상액(25℃)에서 현상하고, 순수로 세정했다. 이어서 220℃의 크린 오븐에서 30분간 포스트 베이킹 처리하여 열처리 완료의 적색 화소를 형성했다.The obtained colored curable composition was apply | coated to the BM formation surface side of the said BM board | substrate by the same process as formation of a monochromatic colored layer. The space | interval between a slit and a BM board | substrate and discharge amount were adjusted so that the film thickness after postbaking might be set to 1.5 micrometers-3.0 micrometers, and it apply | coated at the application | coating speed of 100 mm / sec. Subsequently, after heating (prebaking) at 100 degreeC for 120 second using a hotplate, it exposed at 100 mJ / cm <2> using a HITACHI exposure machine LE 5565 (full wavelength) with a proximity gap of 300 micrometers. (Roughness: 20 mW / cm 2 ). Then, it developed in 1.0% developing solution (25 degreeC) of potassium hydroxide type developing solution CDK-1 (made by Fuji Film Electronics Materials Co., Ltd.), and wash | cleaned with pure water. Subsequently, it post-baked for 30 minutes in the 220 degreeC clean oven, and formed the red pixel of the heat processing completion.
이어서, 녹색 화소부를 형성하고, 마찬가지로 청색 화소부를 형성해서 실시예 1의 컬러 필터를 얻었다.Next, the green pixel part was formed, the blue pixel part was similarly formed, and the color filter of Example 1 was obtained.
[실시예 2∼6]EXAMPLES 2-6
실시예 1에 있어서 사용한 차광부 형성용 경화성 조성물(BM-1), 및 각 색상의 화소 형성용 경화성 조성물을 하기 표 5에 나타낸 바와 같이 변경한 것 이외는 실시예 1과 동일하게 하여 실시예 2∼실시예 6의 컬러 필터를 얻었다. 얻어진 실시예 1∼실시예 6의 컬러 필터에 대해서 이하에 나타내는 평가를 행했다. 결과를 표 5에 나타낸다.Example 2 was carried out similarly to Example 1 except having changed the curable composition for light shielding part formation (BM-1) used in Example 1, and the curable composition for pixel formation of each color as shown in Table 5 below. The color filter of Example 6 was obtained. Evaluation shown below was performed about the color filter of obtained Example 1-Example 6. The results are shown in Table 5.
<착색부의 형태 관찰><Observing the shape of the coloring part>
컬러 필터 작성 과정에서, 현상 후 및 포스트 베이킹 후의 차광층 및 착색층의 패턴을 주사형 전자 현미경으로 관찰했다. 표 5에는 특별히 언급하지 않는 한 포스트 베이킹 후의 결과를 나타냈다. 각의 높이는 착색부 평탄면으로부터의 높이를 SEM사진으로 측정했다.In the color filter preparation process, the pattern of the light shielding layer and the colored layer after image development and post-baking was observed with the scanning electron microscope. In Table 5, the result after post-baking was shown unless there is particular notice. The height of the angle measured the height from the flat part of the coloring part by the SEM photograph.
<컬러 필터, 단색 기판의 콘트라스트 측정><Contrast Measurement of Color Filters and Monochromatic Substrates>
백라이트 유닛으로서 3파장 냉음극관 광원(Toshiba Lighting & Technology Corporation 제작 FWL18EX-N)에 확산판을 설치한 것을 사용하고, 2장의 편광판(Nitto Denko Corporation 제작 G1220DUN)의 사이에 상기의 R, G, B의 단색 기판을 설치하고, 편광판을 패럴렐 니콜(parallel nicole)에 설치했을 때에 통과하는 광의 색도의 Yp값을 크로스 니콜(cross nicole)에 설치했을 때에 통과하는 광의 색도의 Yc값으로 나누는 것으로 콘트라스트를 구했다. 색도의 측정에는 색채 휘도계(Topcon Corporation 제작 BM-5)을 사용했다.As the backlight unit, a diffuser plate was installed in a three-wavelength cold cathode light source (FWL18EX-N manufactured by Toshiba Lighting & Technology Corporation), and the above-mentioned R, G, and B components were used between two polarizing plates (G1220DUN manufactured by Nitto Denko Corporation). The contrast was calculated | required by providing a monochromatic board | substrate, and dividing the Yp value of the chromaticity of the light which passes when a polarizing plate is installed in parallel nicole by the Yc value of the chromaticity of the light which passes when it installs in a cross nicole. The chromaticity meter (BM-5 by Topcon Corporation) was used for the measurement of chromaticity.
<단색 기판의 색도 평가><Color Evaluation of Monochromatic Substrates>
광원을 적색 LED로서 FR1112H(Stanley Electric Co., Ltd.제작 칩형 LED), 녹색 LED로서 DG1112H(Stanley Electric Co., Ltd.제작 칩형 LED), 청색 LED로서 DB1112H(Stanley Electric Co., Ltd.제작 칩형 LED)를 이용하여 사이드 라이트 방식의 백라이트를 구성했다. 이 광원 및 상기의 3파장 냉음극 관광원을 이용하여, 상기의 MCPD-2000으로 색도를 계측하고, 색재현성을 평가했다.Light source is red LED as FR1112H (Stanley Electric Co., Ltd. chip type LED), green LED as DG1112H (Stanley Electric Co., Ltd. chip type LED), blue LED as DB1112H (Stanley Electric Co., Ltd. chip type LED was used to configure a side light type backlight. Using this light source and the said three-wavelength cold cathode tourism source, chromaticity was measured with said MCPD-2000 and color reproducibility was evaluated.
<액정표시장치의 제작과 시인성 평가><Production and visibility evaluation of liquid crystal display device>
상기에 의해 얻어진 컬러 필터 기판의 R, G, B화소 배열에 블랙 매트릭스 상에 ITO(Indium Tin Oxide)의 투명 전극을 스퍼터링에 의해 더 형성했다. 이어서, 일본특허공개 2006-64921호 공보의 실시예 1에 따라서 상기에서 형성한 ITO막 상의 분리벽(블랙 매트릭스) 상부에 상당하는 부분에 스페이서를 형성했다. 별도, 대향기판으로서 유리 기판을 준비하고, 컬러 필터 기판의 투명전극 상 및 대향기판 상에 각각 PVA모드용에 패터닝을 실시하고, 그 상에 폴리이미드 배향막(Nissan Chemical Industries, Ltd. 제작, 선에버 7492 베이킹 후 70nm)을 설치하고, 180℃에서 1시간 베이킹했다. 그 후에 컬러 필터의 화소군을 둘러싸도록 주위에 형성된 블랙 매트릭스 외부 프레임에 상당하는 위치에 자외선 경화 수지의 밀봉제를 디스펜서 방식에 의해 도포하고, PVA모드용 액정을 적하하고, 대향 기판과 접합시킨 후, 접합된 기판을 UV 조사한 후, 열처리해서 밀봉제를 경화시켰다. 이렇게 하여 얻은 액정 셀의 양면에, 편향판(Nitto Denko Corporation 제작, NPF-SEG1224DU)을 접합하였다. 이어서, 3파장 냉음극관 광원(Toshiba Lighting & Technology Corporation 제작, FWL18EX-N)에 확산판을 설치한 것을 상기 편광판이 설치된 액정 셀의 배면이 되는 측에 배치해 액정표시장치라 했다.A transparent electrode of indium tin oxide (ITO) was further formed on the black matrix by sputtering on the R, G, and B pixel arrays of the color filter substrate thus obtained. Subsequently, according to Example 1 of JP-A-2006-64921, a spacer was formed in the part corresponding to the upper part of the partition wall (black matrix) on the ITO membrane formed above. Separately, a glass substrate is prepared as an opposing substrate, and patterned for PVA mode on the transparent electrode and the opposing substrate of the color filter substrate, respectively, and a polyimide alignment film (manufactured by Nissan Chemical Industries, Ltd., Sun Everber) thereon. 70 nm after baking 7492) were installed and baked at 180 ° C for 1 hour. Thereafter, a sealant of an ultraviolet curable resin was applied to the position corresponding to the black matrix outer frame formed around the pixel group of the color filter by a dispenser method, the liquid crystal for PVA mode was dropped, and then bonded to the counter substrate. The bonded substrates were UV irradiated and then heat treated to cure the sealant. A deflection plate (NPF-SEG1224DU, manufactured by Nitto Denko Corporation) was bonded to both surfaces of the liquid crystal cell thus obtained. Subsequently, what provided the diffuser plate in the 3-wavelength cold-cathode light source (FWL18EX-N by Toshiba Lighting & Technology Corporation) was arrange | positioned on the side which becomes the back surface of the liquid crystal cell in which the said polarizing plate was installed, and was called the liquid crystal display device.
시인성의 평가는 전압을 인가해서 흑표시의 상태에서, 100배의 현미경으로 화면의 BM근방을 관찰하여 광누설을 관찰했다.In the evaluation of the visibility, light leakage was observed by applying a voltage and observing the BM on the screen with a microscope of 100 times in the state of black display.
표 5로부터 명백한 바와 같이, 본 발명의 차광부 형성용 경화성 조성물 및 착색 화소 형성용 경화성 조성물을 이용하여 차광부, 착색 화소를 형성한 실시예의 컬러 필터는 화소형상은 적절하고, 콘트라스트가 우수하고, 시인성이 우수한 화상을 형성할 수 있는 것이 확인되었다.As apparent from Table 5, the color filter of the Example which formed the light shielding part and the colored pixel using the curable composition for light shielding part formation, and the curable composition for colored pixel formation of this invention is suitable for pixel shape, and is excellent in contrast, It was confirmed that an image excellent in visibility could be formed.
또한, 실시예 3과 실시예 6의 대비에 의해, 중합 개시제로서 트리아진계 화합물을 사용함으로써 동일한 차광부를 가지면서도, 컬러 필터의 콘트라스트 및 시인성이 보다 향상하고, 콘트라스트가 높아 시인성이 양호한 액정표시장치가 얻어진다는 것이 확인된다.In addition, according to the contrast between Example 3 and Example 6, by using a triazine-based compound as the polymerization initiator, the liquid crystal display device having the same light shielding portion, the contrast and visibility of the color filter is more improved, and the contrast is high and the visibility is good. It is confirmed that it is obtained.
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KR20160082940A (en) * | 2013-11-13 | 2016-07-11 | 세키스이가가쿠 고교가부시키가이샤 | Liquid-crystal-display-element sealant, vertical conductive material, and liquid-crystal display element |
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US8982197B2 (en) | 2009-02-03 | 2015-03-17 | Lg Chem, Ltd. | Optical filter |
JP2010209160A (en) * | 2009-03-06 | 2010-09-24 | Fujifilm Corp | Pigment dispersion composition |
EP2426721B1 (en) * | 2009-04-27 | 2013-04-24 | DIC Corporation | Ink composition for forming light-shielding film for organic semiconductor element, method for forming light-shielding film, and organic transistor element having light-shielding film |
CN104317164B (en) | 2009-12-11 | 2018-03-30 | 富士胶片株式会社 | Black curable composition |
JP7429636B2 (en) * | 2018-03-07 | 2024-02-08 | ナガセケムテックス株式会社 | Metal fine particle dispersion |
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JP3590481B2 (en) * | 1996-08-07 | 2004-11-17 | サカタインクス株式会社 | Pigment dispersion and coating composition using the same |
JP3590279B2 (en) * | 1998-11-18 | 2004-11-17 | 富士フイルムアーチ株式会社 | Photopolymerizable composition for color filter |
JP2004163902A (en) * | 2002-08-30 | 2004-06-10 | Mitsubishi Chemicals Corp | Color liquid crystal display device and photosensitive color resin composition |
JP4528548B2 (en) * | 2003-04-18 | 2010-08-18 | 富士フイルム株式会社 | Light shielding film for display device |
JP2005240000A (en) * | 2003-06-23 | 2005-09-08 | Nippon Shokubai Co Ltd | Pigment dispersion composition and photosensitive resin composition |
JP4041814B2 (en) * | 2003-10-07 | 2008-02-06 | シャープ株式会社 | Color filter and liquid crystal display device including the same |
JP5030386B2 (en) * | 2005-03-03 | 2012-09-19 | 富士フイルム株式会社 | Light shielding film for display device, fine particle-containing composition for black material, material, substrate with light shielding film, color filter, liquid crystal display element, liquid crystal display device, and display device |
JP2006322982A (en) * | 2005-05-17 | 2006-11-30 | Hitachi Chem Co Ltd | Coloring composition, photosensitive coloring resin composition, sensitization liquid for forming coloring image, and method of manufacturing coloring image, method of manufacturing color filter, and color filter |
JP2007023216A (en) * | 2005-07-20 | 2007-02-01 | Hitachi Chem Co Ltd | Colored composition, photosensitive colored resin composition, photosensitive liquid for forming colored image, method for producing colored image, method for producing color filter and color filter |
JP2007071949A (en) * | 2005-09-05 | 2007-03-22 | Toppan Printing Co Ltd | Printed matter and method for producing the same |
JP2007079094A (en) * | 2005-09-14 | 2007-03-29 | Toyo Ink Mfg Co Ltd | Red coloring composition for color filter and color filter |
-
2008
- 2008-04-14 WO PCT/JP2008/057269 patent/WO2008133080A1/en active Application Filing
- 2008-04-14 CN CN2008800123786A patent/CN101657739B/en not_active Expired - Fee Related
- 2008-04-14 KR KR1020097022747A patent/KR20100016082A/en not_active Withdrawn
- 2008-04-16 TW TW97113726A patent/TW200905265A/en unknown
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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KR20160082940A (en) * | 2013-11-13 | 2016-07-11 | 세키스이가가쿠 고교가부시키가이샤 | Liquid-crystal-display-element sealant, vertical conductive material, and liquid-crystal display element |
Also Published As
Publication number | Publication date |
---|---|
CN101657739A (en) | 2010-02-24 |
WO2008133080A1 (en) | 2008-11-06 |
TW200905265A (en) | 2009-02-01 |
CN101657739B (en) | 2012-05-30 |
WO2008133080A9 (en) | 2009-05-22 |
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